JP2020003575A5 - - Google Patents

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JP2020003575A5
JP2020003575A5 JP2018121189A JP2018121189A JP2020003575A5 JP 2020003575 A5 JP2020003575 A5 JP 2020003575A5 JP 2018121189 A JP2018121189 A JP 2018121189A JP 2018121189 A JP2018121189 A JP 2018121189A JP 2020003575 A5 JP2020003575 A5 JP 2020003575A5
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evaluation value
evaluation
detection method
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JP2018121189A
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JP7161322B2 (ja
JP2020003575A (ja
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Priority to KR1020190071377A priority patent/KR102535030B1/ko
Publication of JP2020003575A publication Critical patent/JP2020003575A/ja
Publication of JP2020003575A5 publication Critical patent/JP2020003575A5/ja
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JP2018121189A 2018-06-26 2018-06-26 検出方法、リソグラフィー方法、物品製造方法、光学装置および露光装置 Active JP7161322B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018121189A JP7161322B2 (ja) 2018-06-26 2018-06-26 検出方法、リソグラフィー方法、物品製造方法、光学装置および露光装置
KR1020190071377A KR102535030B1 (ko) 2018-06-26 2019-06-17 검출 방법, 리소그래피 방법, 물품 제조 방법, 광학 장치 및 노광 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018121189A JP7161322B2 (ja) 2018-06-26 2018-06-26 検出方法、リソグラフィー方法、物品製造方法、光学装置および露光装置

Publications (3)

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JP2020003575A JP2020003575A (ja) 2020-01-09
JP2020003575A5 true JP2020003575A5 (enrdf_load_stackoverflow) 2021-07-26
JP7161322B2 JP7161322B2 (ja) 2022-10-26

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JP2018121189A Active JP7161322B2 (ja) 2018-06-26 2018-06-26 検出方法、リソグラフィー方法、物品製造方法、光学装置および露光装置

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JP (1) JP7161322B2 (enrdf_load_stackoverflow)
KR (1) KR102535030B1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230042106A (ko) 2020-07-29 2023-03-27 어플라이드 머티어리얼스, 인코포레이티드 마스크리스 리소그래피 시스템들을 위한 프로세스, 시스템, 및 소프트웨어

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4329146B2 (ja) * 1999-02-04 2009-09-09 株式会社ニコン 位置検出装置及び方法、並びに露光装置
JP2002195912A (ja) * 2000-12-27 2002-07-10 Nikon Corp 光学特性計測方法及び装置、露光装置、並びにデバイス製造方法
JP5002100B2 (ja) * 2001-09-13 2012-08-15 キヤノン株式会社 焦点位置検出方法及び焦点位置検出装置
JP5007070B2 (ja) * 2006-05-25 2012-08-22 株式会社ナノシステムソリューションズ 露光装置
JP2009192271A (ja) * 2008-02-12 2009-08-27 Canon Inc 位置検出方法、露光装置、及びデバイス製造方法
US9046788B2 (en) * 2008-05-19 2015-06-02 International Business Machines Corporation Method for monitoring focus on an integrated wafer
CN101807012B (zh) * 2010-04-07 2011-12-21 芯硕半导体（中国）有限公司 一种直写光刻机的自动聚焦光路结构
JP2013205367A (ja) * 2012-03-29 2013-10-07 Nikon Corp 検査装置、検査方法、およびデバイス製造方法

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