JP2019534482A5 - - Google Patents
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- Publication number
- JP2019534482A5 JP2019534482A5 JP2019524952A JP2019524952A JP2019534482A5 JP 2019534482 A5 JP2019534482 A5 JP 2019534482A5 JP 2019524952 A JP2019524952 A JP 2019524952A JP 2019524952 A JP2019524952 A JP 2019524952A JP 2019534482 A5 JP2019534482 A5 JP 2019534482A5
- Authority
- JP
- Japan
- Prior art keywords
- metrology
- tool
- lithography system
- integrated
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662421932P | 2016-11-14 | 2016-11-14 | |
| US62/421,932 | 2016-11-14 | ||
| PCT/US2017/047742 WO2018089076A1 (en) | 2016-11-14 | 2017-08-21 | Lithography systems with integrated metrology tools having enhanced functionalities |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019534482A JP2019534482A (ja) | 2019-11-28 |
| JP2019534482A5 true JP2019534482A5 (enExample) | 2020-10-01 |
| JP6877541B2 JP6877541B2 (ja) | 2021-05-26 |
Family
ID=62109931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019524952A Active JP6877541B2 (ja) | 2016-11-14 | 2017-08-21 | 一体型メトロロジツールを有する機能性が強化されたリソグラフィシステム |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10331050B2 (enExample) |
| JP (1) | JP6877541B2 (enExample) |
| KR (1) | KR102271217B1 (enExample) |
| CN (1) | CN109923480B (enExample) |
| SG (1) | SG11201903730XA (enExample) |
| TW (1) | TWI791470B (enExample) |
| WO (1) | WO2018089076A1 (enExample) |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002091248A1 (en) * | 2001-05-04 | 2002-11-14 | Therma-Wave, Inc. | Systems and methods for metrology recipe and model generation |
| US6756243B2 (en) * | 2001-10-30 | 2004-06-29 | Advanced Micro Devices, Inc. | Method and apparatus for cascade control using integrated metrology |
| US6978189B1 (en) * | 2002-05-28 | 2005-12-20 | Advanced Micro Devices, Inc. | Matching data related to multiple metrology tools |
| US7289864B2 (en) * | 2004-07-12 | 2007-10-30 | International Business Machines Corporation | Feature dimension deviation correction system, method and program product |
| US20060058979A1 (en) | 2004-09-14 | 2006-03-16 | Markle Richard J | Method and system for calibrating integrated metrology systems and stand-alone metrology systems that acquire wafer state data |
| JP4449697B2 (ja) * | 2004-10-26 | 2010-04-14 | 株式会社ニコン | 重ね合わせ検査システム |
| NL2008702A (en) * | 2011-05-25 | 2012-11-27 | Asml Netherlands Bv | Computational process control. |
| NL2009853A (en) * | 2011-12-23 | 2013-06-26 | Asml Netherlands Bv | Methods and apparatus for measuring a property of a substrate. |
| US9330985B2 (en) * | 2012-03-13 | 2016-05-03 | GlobalFoundries, Inc. | Automated hybrid metrology for semiconductor device fabrication |
| US9454072B2 (en) * | 2012-11-09 | 2016-09-27 | Kla-Tencor Corporation | Method and system for providing a target design displaying high sensitivity to scanner focus change |
| US9576861B2 (en) * | 2012-11-20 | 2017-02-21 | Kla-Tencor Corporation | Method and system for universal target based inspection and metrology |
| WO2016037003A1 (en) * | 2014-09-03 | 2016-03-10 | Kla-Tencor Corporation | Optimizing the utilization of metrology tools |
| CN112698551B (zh) * | 2014-11-25 | 2024-04-23 | 科磊股份有限公司 | 分析及利用景观 |
| JP6440498B2 (ja) | 2015-01-05 | 2018-12-19 | キヤノン株式会社 | リソグラフィシステム、リソグラフィ方法、および物品の製造方法 |
| WO2017146785A1 (en) | 2016-02-25 | 2017-08-31 | Kla-Tencor Corporation | Analyzing root causes of process variation in scatterometry metrology |
-
2017
- 2017-08-21 SG SG11201903730XA patent/SG11201903730XA/en unknown
- 2017-08-21 JP JP2019524952A patent/JP6877541B2/ja active Active
- 2017-08-21 WO PCT/US2017/047742 patent/WO2018089076A1/en not_active Ceased
- 2017-08-21 US US15/568,304 patent/US10331050B2/en active Active
- 2017-08-21 KR KR1020197016915A patent/KR102271217B1/ko active Active
- 2017-08-21 CN CN201780069251.7A patent/CN109923480B/zh active Active
- 2017-11-13 TW TW106139082A patent/TWI791470B/zh active
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