JP2019531431A - ワイヤメッシュと薄い無孔膜パネルとを有するエンクロージャシステム - Google Patents
ワイヤメッシュと薄い無孔膜パネルとを有するエンクロージャシステム Download PDFInfo
- Publication number
- JP2019531431A JP2019531431A JP2019507290A JP2019507290A JP2019531431A JP 2019531431 A JP2019531431 A JP 2019531431A JP 2019507290 A JP2019507290 A JP 2019507290A JP 2019507290 A JP2019507290 A JP 2019507290A JP 2019531431 A JP2019531431 A JP 2019531431A
- Authority
- JP
- Japan
- Prior art keywords
- enclosure
- membrane
- panel
- mesh
- equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/28—Safety arrangements; Monitoring
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F41—WEAPONS
- F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
- F41H5/00—Armour; Armour plates
- F41H5/02—Plate construction
- F41H5/04—Plate construction composed of more than one layer
- F41H5/0442—Layered armour containing metal
- F41H5/0457—Metal layers in combination with additional layers made of fibres, fabrics or plastics
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42D—BLASTING
- F42D5/00—Safety arrangements
- F42D5/04—Rendering explosive charges harmless, e.g. destroying ammunition; Rendering detonation of explosive charges harmless
- F42D5/045—Detonation-wave absorbing or damping means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
- E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
- E04B1/62—Insulation or other protection; Elements or use of specified material therefor
- E04B1/92—Protection against other undesired influences or dangers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Ceramic Engineering (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Ventilation (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Treating Waste Gases (AREA)
- Building Environments (AREA)
- Panels For Use In Building Construction (AREA)
- Tents Or Canopies (AREA)
Abstract
Description
Claims (12)
- 後処理チャンバ機器からその作動中に放出される有害ガスの流出を最小にするためのエンクロージャであって、
収容される後処理チャンバ機器の外側エンベロープを画する構造フレームと、
抽出システムに接続されるように構成された出口と、
無孔膜層と組み合わせてメッシュ層が接続されたサブフレームを各々が含む複数のパネルであって、前記層が、互いに実質的に同一平面上にあり、該パネルが、使用時に、エンクロージャの外部で受けるものよりも、低いエンクロージャの内部圧力を維持し、それによってエンクロージャに存在するあらゆる有害ガスの不注意な流出を阻止することができるように近接方式で前記エンクロージャフレームに装着される複数のパネルと、を備えている、
ことを特徴とするエンクロージャ。 - 前記パネルのうちの1又は2以上が、前記エンクロージャフレームに着脱可能に装着されている、
請求項1に記載のエンクロージャ。 - 前記膜は、ゴム又はポリマーを含む、
請求項1又は2に記載のエンクロージャ。 - 前記無孔膜は、エンクロージャ内に収容された機器の壊滅的な故障時に破裂するように構成されている、
請求項1ないし3のいずれか1項に記載のエンクロージャ。 - 前記膜の厚みが、0.05から0.5mmの範囲にある、
請求項4に記載のエンクロージャ。 - 前記膜の前記厚みは、0.05から0.1mmの範囲にある、
請求項5に記載のエンクロージャ。 - 前記膜層は、エンクロージャ内に収容された機器の壊滅的な故障時に平面外にはためくように構成されている、
請求項1ないし3のいずれか1項に記載のエンクロージャ。 - 前記膜の厚みが、0.5から3mmの範囲にある、
請求項7に記載のエンクロージャ。 - 前記膜の前記厚みは、1から2mmの範囲にある、
請求項8に記載のエンクロージャ。 - 前記メッシュ層は、エンクロージャ内に収容された機器の壊滅的な故障時に形成される噴出物を閉じ込めるように構成されている、
請求項1ないし9のいずれか1項に記載のエンクロージャ。 - 前記メッシュ層は、ワイヤメッシュの2つのシートを有している、
請求項1ないし10のいずれか1項に記載のエンクロージャ。 - 前記膜層は、ワイヤメッシュの前記2つのシートの間に設けられている、
請求項11に記載のエンクロージャ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1613794.5A GB201613794D0 (en) | 2016-08-11 | 2016-08-11 | Enclosure system including wire mesh and thin non-porous membrane panels |
GB1613794.5 | 2016-08-11 | ||
PCT/GB2017/052354 WO2018029475A1 (en) | 2016-08-11 | 2017-08-09 | Enclosure system including wire mesh and thin non-porous membrane panels |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019531431A true JP2019531431A (ja) | 2019-10-31 |
JP7044759B2 JP7044759B2 (ja) | 2022-03-30 |
Family
ID=56985779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019507290A Active JP7044759B2 (ja) | 2016-08-11 | 2017-08-09 | ワイヤメッシュと薄い無孔膜パネルとを有するエンクロージャシステム |
Country Status (8)
Country | Link |
---|---|
US (1) | US11619233B2 (ja) |
EP (1) | EP3497336B1 (ja) |
JP (1) | JP7044759B2 (ja) |
KR (1) | KR102442899B1 (ja) |
CN (1) | CN109790844B (ja) |
GB (1) | GB201613794D0 (ja) |
TW (1) | TWI755416B (ja) |
WO (1) | WO2018029475A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3124235B1 (fr) * | 2021-07-20 | 2023-06-09 | Pfeiffer Vacuum | Pompe à vide |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4943809U (ja) * | 1972-07-21 | 1974-04-17 | ||
JPS5139675U (ja) * | 1974-09-20 | 1976-03-24 | ||
US4325309A (en) * | 1974-08-06 | 1982-04-20 | The United States Of America As Represented By The Secretary Of The Army | Blast suppressive shielding |
JP2005193628A (ja) * | 2004-01-09 | 2005-07-21 | Nippon Steel Composite Co Ltd | 耐衝撃、飛散防止複合材 |
JP2011530041A (ja) * | 2008-08-04 | 2011-12-15 | エドワーズ リミテッド | 真空ポンプ |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2111593A (en) | 1981-12-09 | 1983-07-06 | Imi Marston Ltd | Pressure relief apparatus |
GB2337805B (en) * | 1996-06-27 | 2000-03-15 | John Humphries Parkes | Explosion-suppressing barriers |
AU741018C (en) * | 1996-09-20 | 2002-08-08 | Dsm Ip Assets B.V. | Blast resistant and blast directing container assemblies |
US6119422A (en) | 1997-11-07 | 2000-09-19 | Fin-Pan, Inc. | Impact resistant building panels |
US6112689A (en) | 1999-06-25 | 2000-09-05 | Clear Image Concepts Llc | Sail body and method for making |
DE10348508A1 (de) * | 2003-10-18 | 2005-06-09 | Hauser, Stephan, Dr.-Ing. | Mobiler Munitionsbehälter |
US7021903B2 (en) * | 2003-12-31 | 2006-04-04 | The Boc Group, Inc. | Fore-line preconditioning for vacuum pumps |
US8910425B2 (en) | 2004-04-23 | 2014-12-16 | BS&B Safety Systems, Limited | Fatigue resistant pressure relief assembly |
US7984591B2 (en) | 2007-08-10 | 2011-07-26 | Fiberweb, Inc. | Impact resistant sheet material |
WO2009056616A1 (en) | 2007-10-31 | 2009-05-07 | Novo Nordisk A/S | Non-porous material as sterilization barrier |
CN201289356Y (zh) * | 2008-11-03 | 2009-08-12 | 徐建勇 | 用于爆破工程的橡胶防护毯 |
WO2011098764A2 (en) | 2010-02-15 | 2011-08-18 | Global Owl Limited | A blast protected unit and system |
DE102010046504A1 (de) | 2010-09-24 | 2012-03-29 | Hartmut Wibbeler | Hochwasserschutzwand |
CN202182221U (zh) | 2011-07-22 | 2012-04-04 | 中国石油化工股份有限公司 | 一种爆破片装置 |
CN102967192A (zh) * | 2012-11-23 | 2013-03-13 | 周咸领 | 一种多用途爆破防护物 |
WO2015000926A1 (en) | 2013-07-02 | 2015-01-08 | Dsm Ip Assets B.V. | Composite antiballistic radome walls and methods of making the same |
-
2016
- 2016-08-11 GB GBGB1613794.5A patent/GB201613794D0/en not_active Ceased
-
2017
- 2017-08-09 WO PCT/GB2017/052354 patent/WO2018029475A1/en unknown
- 2017-08-09 EP EP17758908.2A patent/EP3497336B1/en active Active
- 2017-08-09 JP JP2019507290A patent/JP7044759B2/ja active Active
- 2017-08-09 CN CN201780062953.2A patent/CN109790844B/zh active Active
- 2017-08-09 US US16/323,927 patent/US11619233B2/en active Active
- 2017-08-09 KR KR1020197003868A patent/KR102442899B1/ko active IP Right Grant
- 2017-08-11 TW TW106127315A patent/TWI755416B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4943809U (ja) * | 1972-07-21 | 1974-04-17 | ||
US4325309A (en) * | 1974-08-06 | 1982-04-20 | The United States Of America As Represented By The Secretary Of The Army | Blast suppressive shielding |
JPS5139675U (ja) * | 1974-09-20 | 1976-03-24 | ||
JP2005193628A (ja) * | 2004-01-09 | 2005-07-21 | Nippon Steel Composite Co Ltd | 耐衝撃、飛散防止複合材 |
JP2011530041A (ja) * | 2008-08-04 | 2011-12-15 | エドワーズ リミテッド | 真空ポンプ |
Also Published As
Publication number | Publication date |
---|---|
TWI755416B (zh) | 2022-02-21 |
JP7044759B2 (ja) | 2022-03-30 |
WO2018029475A1 (en) | 2018-02-15 |
US20190170142A1 (en) | 2019-06-06 |
CN109790844B (zh) | 2021-12-17 |
US11619233B2 (en) | 2023-04-04 |
EP3497336A1 (en) | 2019-06-19 |
TW201820429A (zh) | 2018-06-01 |
CN109790844A (zh) | 2019-05-21 |
KR20190037255A (ko) | 2019-04-05 |
GB201613794D0 (en) | 2016-09-28 |
EP3497336B1 (en) | 2020-10-07 |
KR102442899B1 (ko) | 2022-09-13 |
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