JP2019523531A5 - - Google Patents
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- Publication number
- JP2019523531A5 JP2019523531A5 JP2019503740A JP2019503740A JP2019523531A5 JP 2019523531 A5 JP2019523531 A5 JP 2019523531A5 JP 2019503740 A JP2019503740 A JP 2019503740A JP 2019503740 A JP2019503740 A JP 2019503740A JP 2019523531 A5 JP2019523531 A5 JP 2019523531A5
- Authority
- JP
- Japan
- Prior art keywords
- frame
- electrode
- insert
- ion beam
- electrode assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 20
- 239000004020 conductor Substances 0.000 claims 9
- 150000002500 ions Chemical class 0.000 claims 8
- 239000000463 material Substances 0.000 claims 8
- 230000002441 reversible effect Effects 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000000696 magnetic material Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/228,158 | 2016-08-04 | ||
| US15/228,158 US9807864B1 (en) | 2016-08-04 | 2016-08-04 | Electrode, accelerator column and ion implantation apparatus including same |
| PCT/US2017/043277 WO2018026543A1 (en) | 2016-08-04 | 2017-07-21 | Electrode, accelerator column and ion implantation apparatus including same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019523531A JP2019523531A (ja) | 2019-08-22 |
| JP2019523531A5 true JP2019523531A5 (https=) | 2020-05-28 |
| JP7194100B2 JP7194100B2 (ja) | 2022-12-21 |
Family
ID=60142632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019503740A Active JP7194100B2 (ja) | 2016-08-04 | 2017-07-21 | 電極、加速器カラム及びそれらを含むイオン注入装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9807864B1 (https=) |
| JP (1) | JP7194100B2 (https=) |
| KR (1) | KR102448490B1 (https=) |
| CN (1) | CN109478487B (https=) |
| TW (1) | TWI749021B (https=) |
| WO (1) | WO2018026543A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NZ768892A (en) | 2018-04-30 | 2024-12-20 | Neutron Therapeutics Llc | Compact motor-driven insulated electrostatic particle accelerator |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3328618A (en) | 1965-09-13 | 1967-06-27 | High Voltage Engineering Corp | High-voltage acceleration tube with inserts for the electrodes |
| US5095208A (en) * | 1988-06-24 | 1992-03-10 | Hitachi, Ltd. | Charged particle generating device and focusing lens therefor |
| JPH03102800A (ja) * | 1989-09-18 | 1991-04-30 | Shimadzu Corp | 高周波多重極線型加速器 |
| JPH04294043A (ja) * | 1991-03-22 | 1992-10-19 | Matsushita Electron Corp | イオン注入機のチャージアップ制御装置 |
| JPH088097A (ja) * | 1994-06-20 | 1996-01-12 | Nissin High Voltage Co Ltd | 静電型イオン加速装置 |
| JPH10270196A (ja) * | 1997-03-25 | 1998-10-09 | Nissin High Voltage Co Ltd | イオン加速器用加速管 |
| JP3858682B2 (ja) | 2001-12-12 | 2006-12-20 | 信越半導体株式会社 | イオン注入装置の引出電極系およびイオン注入装置 |
| US20060043316A1 (en) * | 2003-06-10 | 2006-03-02 | Varian Semiconductor Equipment Associates, Inc. | Ion implanter having enhanced low energy ion beam transport |
| KR100538813B1 (ko) | 2004-07-31 | 2005-12-23 | 주식회사 하이닉스반도체 | 트랜지스터 파라미터의 균일도 확보를 위한 이온주입 장치및 그를 이용한 이온주입 방법 |
| US20070221862A1 (en) * | 2006-03-22 | 2007-09-27 | Wayne State University | Coupled Electrostatic Ion and Electron Traps for Electron Capture Dissociation - Tandem Mass Spectrometry |
| GB0703044D0 (en) * | 2007-02-16 | 2007-03-28 | Nordiko Technical Services Ltd | Apparatus |
| CN101296555A (zh) * | 2007-04-25 | 2008-10-29 | 和舰科技(苏州)有限公司 | 一种离子加速装置 |
| US9053895B2 (en) * | 2011-11-30 | 2015-06-09 | Fei Company | System for attachment of an electrode into a plasma source |
| CN108962708A (zh) * | 2013-11-14 | 2018-12-07 | 迈普尔平版印刷Ip有限公司 | 电极堆栈布置 |
| US9281165B1 (en) | 2014-08-26 | 2016-03-08 | Varian Semiconductor Equipment Associates, Inc. | Bias electrodes for tandem accelerator |
| CN205726638U (zh) | 2016-06-07 | 2016-11-23 | 中国工程物理研究院核物理与化学研究所 | 一种强流四极透镜离子加速管 |
-
2016
- 2016-08-04 US US15/228,158 patent/US9807864B1/en active Active
-
2017
- 2017-06-23 TW TW106121013A patent/TWI749021B/zh active
- 2017-07-21 CN CN201780045501.3A patent/CN109478487B/zh active Active
- 2017-07-21 WO PCT/US2017/043277 patent/WO2018026543A1/en not_active Ceased
- 2017-07-21 JP JP2019503740A patent/JP7194100B2/ja active Active
- 2017-07-21 KR KR1020197005409A patent/KR102448490B1/ko active Active
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