JP2019204058A5 - - Google Patents
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- JP2019204058A5 JP2019204058A5 JP2018100863A JP2018100863A JP2019204058A5 JP 2019204058 A5 JP2019204058 A5 JP 2019204058A5 JP 2018100863 A JP2018100863 A JP 2018100863A JP 2018100863 A JP2018100863 A JP 2018100863A JP 2019204058 A5 JP2019204058 A5 JP 2019204058A5
- Authority
- JP
- Japan
- Prior art keywords
- aberration
- evaluation method
- asymmetric
- prediction
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims description 26
- 230000004075 alteration Effects 0.000 claims description 22
- 238000011156 evaluation Methods 0.000 claims description 20
- 238000005286 illumination Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 6
- 238000005259 measurement Methods 0.000 claims 3
- 238000012854 evaluation process Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 206010010071 Coma Diseases 0.000 claims 1
- 230000005484 gravity Effects 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018100863A JP7054365B2 (ja) | 2018-05-25 | 2018-05-25 | 評価方法、露光方法、および物品製造方法 |
| US16/412,524 US10545413B2 (en) | 2018-05-25 | 2019-05-15 | Evaluation method, exposure method, and method for manufacturing an article |
| CN201910420978.6A CN110531587B (zh) | 2018-05-25 | 2019-05-21 | 评估方法、曝光方法和用于制造物品的方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018100863A JP7054365B2 (ja) | 2018-05-25 | 2018-05-25 | 評価方法、露光方法、および物品製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019204058A JP2019204058A (ja) | 2019-11-28 |
| JP2019204058A5 true JP2019204058A5 (enExample) | 2021-07-26 |
| JP7054365B2 JP7054365B2 (ja) | 2022-04-13 |
Family
ID=68614496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018100863A Active JP7054365B2 (ja) | 2018-05-25 | 2018-05-25 | 評価方法、露光方法、および物品製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10545413B2 (enExample) |
| JP (1) | JP7054365B2 (enExample) |
| CN (1) | CN110531587B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102767662B1 (ko) * | 2020-06-10 | 2025-02-18 | 삼성디스플레이 주식회사 | 개구율 계측 장치 및 이를 포함하는 표시 장치의 열화 보상 시스템 |
| JP7596106B2 (ja) * | 2020-09-28 | 2024-12-09 | キヤノン株式会社 | 情報処理装置、検査方法、プログラム、露光装置、決定方法、及び物品の製造方法 |
| US11893668B2 (en) | 2021-03-31 | 2024-02-06 | Leica Camera Ag | Imaging system and method for generating a final digital image via applying a profile to image information |
| US12254644B2 (en) | 2021-03-31 | 2025-03-18 | Leica Camera Ag | Imaging system and method |
| JP2022185871A (ja) * | 2021-06-03 | 2022-12-15 | キヤノン株式会社 | 露光方法、露光装置、および物品製造方法 |
| CN118613767A (zh) * | 2022-01-24 | 2024-09-06 | Asml荷兰有限公司 | 用于照射调整的方法和设备 |
| JP2024065681A (ja) * | 2022-10-31 | 2024-05-15 | キヤノン株式会社 | 露光方法、露光装置及び物品の製造方法 |
| JP2024065682A (ja) | 2022-10-31 | 2024-05-15 | キヤノン株式会社 | 露光方法、露光装置及び物品の製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2503451B2 (ja) * | 1985-12-26 | 1996-06-05 | 株式会社ニコン | 投影露光方法及び装置 |
| TW500987B (en) | 2000-06-14 | 2002-09-01 | Asm Lithography Bv | Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
| JP2006073584A (ja) * | 2004-08-31 | 2006-03-16 | Nikon Corp | 露光装置及び方法並びにデバイス製造方法 |
| JP5406437B2 (ja) | 2007-06-22 | 2014-02-05 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP4944690B2 (ja) * | 2007-07-09 | 2012-06-06 | キヤノン株式会社 | 位置検出装置の調整方法、位置検出装置、露光装置及びデバイス製造方法 |
| NL2008310A (en) * | 2011-04-05 | 2012-10-08 | Asml Netherlands Bv | Lithographic method and assembly. |
| JP6381188B2 (ja) * | 2013-08-13 | 2018-08-29 | キヤノン株式会社 | 露光装置およびデバイスの製造方法 |
| US9886543B2 (en) * | 2016-02-10 | 2018-02-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process |
-
2018
- 2018-05-25 JP JP2018100863A patent/JP7054365B2/ja active Active
-
2019
- 2019-05-15 US US16/412,524 patent/US10545413B2/en active Active
- 2019-05-21 CN CN201910420978.6A patent/CN110531587B/zh active Active
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