JP2019198066A - 埋め込み型境界リングを備えた結合共振器フィルタ - Google Patents
埋め込み型境界リングを備えた結合共振器フィルタ Download PDFInfo
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- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- WPPDFTBPZNZZRP-UHFFFAOYSA-N aluminum copper Chemical compound [Al].[Cu] WPPDFTBPZNZZRP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/583—Multiple crystal filters implemented with thin-film techniques comprising a plurality of piezoelectric layers acoustically coupled
- H03H9/584—Coupled Resonator Filters [CFR]
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0023—Balance-unbalance or balance-balance networks
- H03H9/0095—Balance-unbalance or balance-balance networks using bulk acoustic wave devices
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02118—Means for compensation or elimination of undesirable effects of lateral leakage between adjacent resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02125—Means for compensation or elimination of undesirable effects of parasitic elements
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02637—Details concerning reflective or coupling arrays
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/583—Multiple crystal filters implemented with thin-film techniques comprising a plurality of piezoelectric layers acoustically coupled
- H03H9/585—Stacked Crystal Filters [SCF]
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/587—Air-gaps
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
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- Crystallography & Structural Chemistry (AREA)
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Abstract
Description
本出願は、2018年3月28日に出願された仮特許出願第62/649,339号の利益を主張するものであり、当該仮特許出願の開示は、その全体が参照によりここで本明細書に組み込まれる。
本開示は、結合共振器フィルタに関し、特に、埋め込み型境界リングを含む結合共振器フィルタに関する。
Claims (20)
- 第1の圧電層と、前記第1の圧電層と接触する第1の電極とを含む第1の共振器と、
第2の圧電層と、前記第2の圧電層と接触する第2の電極とを含む第2の共振器と、
前記第1の共振器と前記第2の共振器との間の1つ以上の介在層であって、前記第1の共振器と前記第2の共振器とを音響的に結合させている前記1つ以上の介在層と、
前記第1の電極上の第1の境界リングと、
前記第2の電極上の第2の境界リングと
を含む、結合共振器フィルタ(CRF)。 - 前記第1の共振器及び前記第2の共振器はバルク弾性波(BAW)共振器である、請求項1に記載のCRF。
- 前記第1の電極は前記CRFの上面を形成する、請求項2に記載のCRF。
- 前記第2の圧電層は前記第2の電極と前記第1の共振器との間に存在する、請求項3に記載のCRF。
- 前記第2の共振器と前記CRFの底面との間に1つ以上の追加介在層を更に含む、請求項4に記載のCRF。
- 前記第2の電極は前記第2の圧電層と前記第1の共振器との間に存在する、請求項3に記載のCRF。
- 前記第1の圧電層上に第1の追加電極を更に含み、前記第1の圧電層が前記第1の電極と前記第1の追加電極との間に存在するようになっている、請求項1に記載のCRF。
- 前記第2の圧電層上に第2の追加電極を更に含み、前記第2の圧電層が前記第2の電極と前記第2の追加電極との間に存在するようになっている、請求項7に記載のCRF。
- 前記第2の圧電層は前記第2の電極と前記第1の共振器との間に存在する、請求項1に記載のCRF。
- 前記第2の電極は前記第2の圧電層と前記第1の共振器との間に存在する、請求項1に記載のCRF。
- 前記第1の境界リングは前記CRFの有効領域の外側縁に沿って設けられている、請求項1に記載のCRF。
- 前記第2の境界リングは前記CRFの前記有効領域の外側縁に沿って設けられている、請求項11に記載のCRF。
- 第1の圧電層と、前記第1の圧電層と接触する第1の電極とを含む第1の共振器と、
・第2の圧電層と、前記第2の圧電層と接触する第2の電極とを含む第2の共振器と、
・前記第1の共振器と前記第2の共振器との間の1つ以上の介在層であって、前記第1の共振器と前記第2の共振器とを音響的に結合させている前記1つ以上の介在層と、
・前記第1の電極上の第1の境界リングと、
・前記1つ以上の介在層のうちの第1の介在層上の第2の境界リングと
を含む、結合共振器フィルタ(CRF)。 - 前記第1の共振器及び前記第2の共振器はバルク弾性波(BAW)共振器である、請求項13に記載のCRF。
- 前記第1の電極は前記CRFの上面を形成する、請求項14に記載のCRF。
- 前記1つ以上の介在層のうちの少なくとも1つは、前記1つ以上の介在層のうちの前記第1の介在層と前記第1の共振器との間に存在する、請求項15に記載のCRF。
- 前記第2の共振器と前記CRFの底面との間に1つ以上の追加介在層を更に含む、請求項13に記載のCRF。
- 前記1つ以上の介在層のうちの前記第1の介在層は金属層である、請求項13に記載のCRF。
- 前記第1の境界リングは前記CRFの有効領域の外側縁に沿って設けられている、請求項13に記載のCRF。
- 前記第2の境界リングは前記CRFの前記有効領域の外側縁に沿って設けられている、請求項19に記載のCRF。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862649339P | 2018-03-28 | 2018-03-28 | |
US62/649,339 | 2018-03-28 | ||
US16/287,277 US11095267B2 (en) | 2018-03-28 | 2019-02-27 | Coupled resonator filter with embedded border ring |
US16/287,277 | 2019-02-27 |
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JP2019198066A true JP2019198066A (ja) | 2019-11-14 |
JP2019198066A5 JP2019198066A5 (ja) | 2022-03-31 |
JP7405513B2 JP7405513B2 (ja) | 2023-12-26 |
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JP (1) | JP7405513B2 (ja) |
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CN (1) | CN110324019A (ja) |
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US11509287B2 (en) | 2018-12-14 | 2022-11-22 | Qorvo Us, Inc. | Bi-polar border region in piezoelectric device |
Citations (4)
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US20120218056A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge |
US20120218058A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge and frame elements |
US20120218059A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Stacked bulk acoustic resonator comprising a bridge and an acoustic reflector along a perimeter of the resonator |
JP2013005446A (ja) * | 2011-06-16 | 2013-01-07 | Avago Technologies Wireless Ip (Singapore) Pte Ltd | 非圧電層を備えたバルク音響共振器 |
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JP5563739B2 (ja) * | 2008-02-20 | 2014-07-30 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタ、デュープレクサ、通信モジュール、および通信装置 |
US8456257B1 (en) | 2009-11-12 | 2013-06-04 | Triquint Semiconductor, Inc. | Bulk acoustic wave devices and method for spurious mode suppression |
KR101708893B1 (ko) | 2010-09-01 | 2017-03-08 | 삼성전자주식회사 | 체적 음향 공진기 구조 및 제조 방법 |
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US8575820B2 (en) * | 2011-03-29 | 2013-11-05 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Stacked bulk acoustic resonator |
US9853626B2 (en) | 2014-03-31 | 2017-12-26 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator comprising acoustic redistribution layers and lateral features |
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US9634642B2 (en) | 2014-05-30 | 2017-04-25 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator comprising vertically extended acoustic cavity |
US20170054430A1 (en) | 2015-08-21 | 2017-02-23 | Rf Micro Devices, Inc. | Baw resonator having multi-layer electrode and bo ring close to piezoelectric layer |
US10547283B2 (en) | 2016-03-10 | 2020-01-28 | Qorvo Us, Inc. | Bulk acoustic wave resonator with a border ring and an inner ring |
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- 2019-02-27 US US16/287,277 patent/US11095267B2/en active Active
- 2019-03-21 CN CN201910217433.5A patent/CN110324019A/zh active Pending
- 2019-03-28 JP JP2019062612A patent/JP7405513B2/ja active Active
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US20120218056A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge |
US20120218058A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Coupled resonator filter comprising a bridge and frame elements |
US20120218059A1 (en) * | 2011-02-28 | 2012-08-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Stacked bulk acoustic resonator comprising a bridge and an acoustic reflector along a perimeter of the resonator |
JP2013005446A (ja) * | 2011-06-16 | 2013-01-07 | Avago Technologies Wireless Ip (Singapore) Pte Ltd | 非圧電層を備えたバルク音響共振器 |
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US20190305755A1 (en) | 2019-10-03 |
JP7405513B2 (ja) | 2023-12-26 |
KR20190113670A (ko) | 2019-10-08 |
US11095267B2 (en) | 2021-08-17 |
CN110324019A (zh) | 2019-10-11 |
KR102658389B1 (ko) | 2024-04-16 |
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