JP2019167618A5 - - Google Patents
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- JP2019167618A5 JP2019167618A5 JP2018128553A JP2018128553A JP2019167618A5 JP 2019167618 A5 JP2019167618 A5 JP 2019167618A5 JP 2018128553 A JP2018128553 A JP 2018128553A JP 2018128553 A JP2018128553 A JP 2018128553A JP 2019167618 A5 JP2019167618 A5 JP 2019167618A5
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- 210000002381 Plasma Anatomy 0.000 claims description 6
- 239000012495 reaction gas Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 230000001105 regulatory Effects 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 230000002093 peripheral Effects 0.000 description 4
- 230000000386 athletic Effects 0.000 description 1
Description
上記の目的を達成するために、本発明の真空処理装置は、
内部を真空とすることが可能なチャンバと、
前記チャンバ内に設けられた回転テーブルであって、当該回転テーブルの回転軸心を中心とする円周の軌跡でワークを循環搬送する回転テーブルと、
前記回転テーブルに搭載され、前記ワークを載置する複数のトレイと、
前記回転テーブルにより搬送される前記ワークに対して、導入された反応ガスをプラズマ化して所定の処理を行う処理部と、
を有し、
前記処理部は、前記トレイの前記処理部に対向する面との間に、前記トレイに載置された前記ワークが通過可能な間隔を空けて、前記回転テーブルの径方向に沿って配置されたシールド部材を有し、
複数の前記トレイの前記処理部に対向する面は、前記円周の前記軌跡に沿って連続して面一となる部分を有する。
In order to achieve the above object, the vacuum processing apparatus of the present invention
A chamber that can be evacuated inside,
A rotary table provided in the chamber, the rotary table that circulates and conveys the work along a circular locus centered on the rotation axis of the rotary table.
A plurality of trays mounted on the rotary table and on which the workpiece is placed, and
A processing unit that turns the introduced reaction gas into plasma and performs a predetermined process on the work conveyed by the rotary table.
Have,
The processing unit was arranged along the radial direction of the rotary table with a space between the tray and the surface of the tray facing the processing unit so that the work placed on the tray could pass through. Has a shield member
Surface facing the processing unit of the plurality of the trays, having a portion to be flush continuously along the trajectory of the circumference.
前記ワークは、前記処理部に対向する面に凸部を有し、前記シールド部材は、前記ワークの前記凸部に沿う凹部を有していてもよい。前記トレイは、前記処理部に対向する面に、前記シールド部材の前記凹部に沿う凸部を有していてもよい。前記シールド部材には、成膜される膜の膜厚分布を調整する調整部が設けられていてもよい。前記回転テーブルは、前記トレイの位置を規制する規制部を有していてもよい。前記トレイは、前記ワークが嵌め込まれる嵌込部を有していてもよい。
The workpiece has a convex portion on a surface opposed to the processing unit, the shield member may have a recess along the convex portion of the workpiece. The tray, on the surface facing the processing unit may have a protrusion along the concave portion of the shield member. The shield member may be provided with an adjusting portion for adjusting the film thickness distribution of the film to be formed. The turntable may have a regulating section that regulates the position of the tray. The tray may have a fitting portion into which the work is fitted.
他の態様の真空処理装置は、内部を真空とすることが可能なチャンバと、前記チャンバ内に設けられ、円周の軌跡でワークを循環搬送する回転テーブルと、前記回転テーブルにより搬送される前記ワークに対して、導入された反応ガスをプラズマ化して所定の処理を行う処理部と、を有し、前記ワークは、前記処理部に対向する面に凸部を有し、前記処理部は、前記回転テーブルにより搬送される前記ワークに間隔を空けて対向し、前記ワークの凸部に沿う凹部を有するシールド部材を有し、前記回転テーブルの表面に、前記シールド部材の前記凹部に沿う凸部が設けられ、前記回転テーブルの前記凸部の表面が、前記円周の前記軌跡に沿って連続して面一となる部分を有する。
The vacuum processing apparatus of another aspect includes a chamber capable of evacuating the inside, a rotary table provided in the chamber and circulating and transporting the work in a circumferential locus, and the rotary table. The work has a processing unit that evacuates the introduced reaction gas into plasma to perform a predetermined process, the work has a convex portion on a surface facing the processing unit, and the processing unit has a convex portion. the conveyed by the rotary table and spaced and opposed to said workpiece has a shield member having a recess along the convex portion of the workpiece, said the surface of the rotating table, the convex along the concave portion of the shield member is provided, the surface of the convex portion of the rotary table has the trajectory segment to be to flush continuously along the circumference.
前記回転テーブルは、前記ワークが載置されるトレイが搭載されることにより、前記回転テーブルの表面と前記トレイの表面とが、前記円周の前記軌跡に沿って連続して面一となる部分が生じる搭載部を有していてもよい。
The rotary table, by the tray where the workpiece is placed is mounted, the portion where the surface of the rotary table and said tray surface, flush with continuously along the trajectory of the circumferential May have a mounting portion where
他の態様のトレイは、内部を真空とすることが可能なチャンバと、前記チャンバ内に設けられた回転テーブルであって、当該回転テーブルの回転軸心を中心とする円周の軌跡でワークを循環搬送する回転テーブルと、前記回転テーブルにより搬送される前記ワークに対して、導入された反応ガスをプラズマ化して所定の処理を行う処理部と、を有する真空処理装置に使用される前記ワークが載置されるトレイであって、
前記処理部は、前記トレイの前記処理部に対向する面との間に、前記トレイに載置された前記ワークが通過可能な間隔を空けて、前記回転テーブルの径方向に沿って配置されたシールド部材を有し、
前記回転テーブルに複数搭載されることにより、前記処理部に対向する面が、前記円周の前記軌跡に沿って連続して面一となる部分を有する。
The tray of another aspect is a chamber in which the inside can be evacuated and a rotary table provided in the chamber, and the work is formed on a circumferential locus centered on the rotation axis of the rotary table. a rotary table for circulating conveying the workpiece relative to the workpiece to be conveyed by the rotary table, is used in plasma the introduced reactive gas into the vacuum processing apparatus which have a, a processing unit for performing predetermined processing Is a tray on which
Wherein the processing unit is provided between the surface facing the processing unit of the tray, the workpiece placed on the tray at a passable space, located along a radial direction of the turntable Has a shield member
Wherein by being more mounted on the rotary table, a surface facing the processing unit has a said portion to be flush continuously along the trajectory of the circumference.
筒状体５１は、水平断面が角丸長方形状の筒である。ここでいう角丸長方形状とは、陸上競技におけるトラック形状である。トラック形状とは、一対の部分円を凸側を相反する方向として離隔して対向させ、それぞれの両端を互いに並行な直線で結んだ形状である。筒状体５１は、回転テーブル３１と同様の材質とする。筒状体５１は、開口Ｈｏが回転テーブル３１側に離隔して向かうように、チャンバ２０の天井２０ａに設けられた開口２１ａに挿入されている。これにより、筒状体５１の側壁の大半は、真空室２１内に収容されている。筒状体５１は、その長径方向が回転テーブル３１の半径方向と平行となるように配置されている。なお、厳密な平行である必要はなく、多少の傾きがあってもよい。
The tubular body 51 is a rectangular cylinder having a rounded horizontal cross section. The rounded rectangular shape referred to here is a track shape in athletics. The track shape is a shape in which a pair of partial circles are separated from each other with their convex sides facing each other in opposite directions, and both ends are connected by straight lines parallel to each other. The tubular body 51 is made of the same material as the rotary table 31. The tubular body 51 is inserted into the opening 21a provided in the ceiling 20a of the chamber 20 so that the opening Ho is separated from the rotary table 31 side. As a result, most of the side walls of the tubular body 51 are housed in the vacuum chamber 21. The tubular body 51 is arranged so that its major axis direction is parallel to the radial direction of the rotary table 31. It should be noted that it does not have to be exactly parallel, and there may be some inclination.
ここで、回転テーブル３１の外周側と内周側とを比べると、一定距離を通過する速度に差が生じる。つまり、本実施形態の筒状体５１のように、長径方向が回転テーブル３１の半径方向と平行となるように配置されている場合、筒状体５１の下部を回転テーブル３１が通過する時間は、内周側よりも外周側が短い。
Here, when the outer peripheral side and the inner peripheral side of the rotary table 31 are compared, there is a difference in the speed of passing a certain distance. That is, when the tubular body 51 of the present embodiment is arranged so that the major axis direction is parallel to the radial direction of the rotary table 31, the time required for the rotary table 31 to pass through the lower part of the tubular body 51 is , The outer peripheral side is shorter than the inner peripheral side.
Claims (11)
前記チャンバ内に設けられた回転テーブルであって、当該回転テーブルの回転軸心を中心とする円周の軌跡でワークを循環搬送する回転テーブルと、
前記回転テーブルに搭載され、前記ワークを載置する複数のトレイと、
前記回転テーブルにより搬送される前記ワークに対して、導入された反応ガスをプラズマ化して所定の処理を行う処理部と、
を有し、
前記処理部は、前記トレイの前記処理部に対向する面との間に、前記トレイに載置された前記ワークが通過可能な間隔を空けて、前記回転テーブルの径方向に沿って配置されたシールド部材を有し、
複数の前記トレイの前記処理部に対向する面は、前記円周の前記軌跡に沿って連続して面一となる部分を有することを特徴とする真空処理装置。 A chamber that can be evacuated inside,
A rotary table provided in the chamber, the rotary table that circulates and conveys the work along a circular locus centered on the rotation axis of the rotary table.
A plurality of trays mounted on the rotary table and on which the workpiece is placed, and
A processing unit that turns the introduced reaction gas into plasma and performs a predetermined process on the work conveyed by the rotary table.
Have,
The processing unit was arranged along the radial direction of the rotary table with a space between the tray and the surface of the tray facing the processing unit so that the work placed on the tray could pass through. Has a shield member
The surface facing the said processing unit of the plurality of the tray, a vacuum processing apparatus characterized by having a portion to be flush continuously along the trajectory of the circumference.
前記シールド部材は、前記ワークの前記凸部に沿う凹部を有することを特徴とする請求項１記載の真空処理装置。 The work has a convex portion on a surface facing the processing portion, and has a convex portion.
It said shield member is a vacuum processing apparatus according to claim 1, characterized in that it has a recess along the convex portion of the workpiece.
前記チャンバ内に設けられ、円周の軌跡でワークを循環搬送する回転テーブルと、
前記回転テーブルにより搬送される前記ワークに対して、導入された反応ガスをプラズマ化して所定の処理を行う処理部と、
を有し、
前記ワークは、前記処理部に対向する面に凸部を有し、
前記処理部は、前記回転テーブルにより搬送される前記ワークに間隔を空けて対向し、
前記ワークの前記凸部に沿う凹部を有するシールド部材を有し、
前記回転テーブルの表面に、前記シールド部材の前記凹部に沿う凸部が設けられ、
前記回転テーブルの前記凸部の表面が、前記円周の前記軌跡に沿って連続して面一となる部分を有することを特徴とする真空処理装置。 A chamber that can be evacuated inside,
A rotary table provided in the chamber and circulating and transporting the work in a circumferential locus,
A processing unit that turns the introduced reaction gas into plasma and performs a predetermined process on the work conveyed by the rotary table.
Have,
The work has a convex portion on a surface facing the processing portion, and has a convex portion.
The processing unit faces the work conveyed by the rotary table at intervals.
A shield member having a recess along the convex portion of the workpiece,
On the surface of the rotary table, the convex portion is provided along the concave portion of the shield member,
Vacuum processing apparatus in which the surface of the convex portion of the rotary table, and having the trajectory segment to be to flush continuously along the circumference.
前記処理部は、前記トレイの前記処理部に対向する面との間に、前記トレイに載置された前記ワークが通過可能な間隔を空けて、前記回転テーブルの径方向に沿って配置されたシールド部材を有し、
前記回転テーブルに複数搭載されることにより、前記処理部に対向する面が、前記円周の前記軌跡に沿って連続して面一となる部分を有することを特徴とするトレイ。 A chamber in which the inside can be evacuated, a rotary table provided in the chamber, and a rotary table that circulates and conveys a work along a circular trajectory centered on the rotation axis of the rotary table. to the workpiece to be conveyed by said rotary table, in the tray where the workpiece is placed, which by plasma the introduced reactive gas is used in a vacuum processing apparatus which have a, a processing unit for performing predetermined processing There,
Wherein the processing unit is provided between the surface facing the processing unit of the tray, the workpiece placed on the tray at a passable space, located along a radial direction of the turntable Has a shield member
Tray wherein by being more mounted on the rotary table, a surface facing the processing unit is characterized by having a track portion to be to flush continuously along the circumference.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020190022402A KR102194574B1 (en) | 2018-03-22 | 2019-02-26 | Vacuum processing apparatus and tray |
| CN201910213184.2A CN110295350B (en) | 2018-03-22 | 2019-03-20 | Vacuum processing apparatus |
| TW108109663A TWI688032B (en) | 2018-03-22 | 2019-03-21 | Vacuum processing device and tray |
| KR1020200120476A KR102412766B1 (en) | 2018-03-22 | 2020-09-18 | Vacuum processing apparatus and tray |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018055265 | 2018-03-22 | ||
| JP2018055265 | 2018-03-22 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019167618A JP2019167618A (en) | 2019-10-03 |
| JP2019167618A5 true JP2019167618A5 (en) | 2021-07-29 |
| JP7144219B2 JP7144219B2 (en) | 2022-09-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018128553A Active JP7144219B2 (en) | 2018-03-22 | 2018-07-05 | Vacuum processor and tray |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7144219B2 (en) |
| KR (2) | KR102194574B1 (en) |
| CN (1) | CN110295350B (en) |
| TW (1) | TWI688032B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113265626B (en) * | 2020-02-14 | 2023-06-16 | 芝浦机械电子装置株式会社 | Film forming apparatus and method for removing moisture in film forming apparatus |
| JP7451436B2 (en) | 2020-02-14 | 2024-03-18 | 芝浦メカトロニクス株式会社 | Film deposition equipment and method for removing moisture from film deposition equipment |
| JP7390997B2 (en) * | 2020-09-15 | 2023-12-04 | 芝浦メカトロニクス株式会社 | Film forming equipment |
| JP2022155711A (en) * | 2021-03-31 | 2022-10-14 | 芝浦メカトロニクス株式会社 | Film deposition apparatus |
| CN113690172B (en) * | 2021-06-30 | 2023-10-13 | 华灿光电（浙江）有限公司 | Graphite substrate for improving wavelength uniformity of epitaxial wafer |
| CN114572530B (en) * | 2022-03-18 | 2023-05-23 | 南京信息工程大学 | Express delivery box and unmanned aerial vehicle carrying device thereof |
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| JPS56112469A (en) * | 1980-02-06 | 1981-09-04 | Toshiba Corp | Sputtering device |
| JP4428873B2 (en) | 2001-02-28 | 2010-03-10 | 芝浦メカトロニクス株式会社 | Sputtering equipment |
| US7744730B2 (en) * | 2005-04-14 | 2010-06-29 | Tango Systems, Inc. | Rotating pallet in sputtering system |
| US8808456B2 (en) | 2008-08-29 | 2014-08-19 | Tokyo Electron Limited | Film deposition apparatus and substrate process apparatus |
| JP5857896B2 (en) | 2012-07-06 | 2016-02-10 | 東京エレクトロン株式会社 | Method of operating film forming apparatus and film forming apparatus |
| JP6040609B2 (en) * | 2012-07-20 | 2016-12-07 | 東京エレクトロン株式会社 | Film forming apparatus and film forming method |
| JP2014110378A (en) | 2012-12-04 | 2014-06-12 | Tokyo Electron Ltd | Film formation device |
| JP5800952B1 (en) | 2014-04-24 | 2015-10-28 | 株式会社日立国際電気 | Substrate processing apparatus, semiconductor device manufacturing method, program, and recording medium |
| JP6329110B2 (en) * | 2014-09-30 | 2018-05-23 | 芝浦メカトロニクス株式会社 | Plasma processing equipment |
| JP6411975B2 (en) * | 2014-09-30 | 2018-10-24 | 芝浦メカトロニクス株式会社 | Film forming apparatus and film forming substrate manufacturing method |
| CN105463385B (en) * | 2014-09-30 | 2018-08-14 | 芝浦机械电子装置株式会社 | Plasma processing apparatus |
| CN107533161B (en) * | 2015-11-20 | 2020-08-04 | Ａｇｃ株式会社 | Curved substrate with film, method for manufacturing same, and image display device |
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-
2018
- 2018-07-05 JP JP2018128553A patent/JP7144219B2/en active Active
-
2019
- 2019-02-26 KR KR1020190022402A patent/KR102194574B1/en active IP Right Grant
- 2019-03-20 CN CN201910213184.2A patent/CN110295350B/en active Active
- 2019-03-21 TW TW108109663A patent/TWI688032B/en active
-
2020
- 2020-09-18 KR KR1020200120476A patent/KR102412766B1/en active IP Right Grant
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