JP2019165199A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019165199A5 JP2019165199A5 JP2019001526A JP2019001526A JP2019165199A5 JP 2019165199 A5 JP2019165199 A5 JP 2019165199A5 JP 2019001526 A JP2019001526 A JP 2019001526A JP 2019001526 A JP2019001526 A JP 2019001526A JP 2019165199 A5 JP2019165199 A5 JP 2019165199A5
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- value
- pixels
- exposure
- pixel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 27
- 239000002245 particle Substances 0.000 claims description 5
- 238000004364 calculation method Methods 0.000 description 15
- 238000012886 linear function Methods 0.000 description 5
- 238000005094 computer simulation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18150797 | 2018-01-09 | ||
| EP18150797.1 | 2018-01-09 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019165199A JP2019165199A (ja) | 2019-09-26 |
| JP2019165199A5 true JP2019165199A5 (https=) | 2022-01-11 |
| JP7299705B2 JP7299705B2 (ja) | 2023-06-28 |
Family
ID=60953712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019001526A Active JP7299705B2 (ja) | 2018-01-09 | 2019-01-09 | 非線形的線量およびブラー（ボケ）に依存するエッジ配置の補正 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3518272B1 (https=) |
| JP (1) | JP7299705B2 (https=) |
| KR (1) | KR102652218B1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112172155A (zh) * | 2020-08-04 | 2021-01-05 | 深圳市创必得科技有限公司 | 3d打印的边缘柔化方法、装置、存储介质及3d打印机 |
| CN113529533A (zh) * | 2021-07-12 | 2021-10-22 | 江苏三叶人造草坪有限公司 | 一种自带缓冲垫的免填充草坪 |
| CN115729048B (zh) * | 2021-08-31 | 2026-03-06 | 上海微电子装备（集团）股份有限公司 | 边缘放置误差的检测方法 |
| CN114093956A (zh) * | 2021-11-03 | 2022-02-25 | 通威太阳能（合肥）有限公司 | 一种网格栅线胶水印刷质量检测方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6269472B1 (en) * | 1996-02-27 | 2001-07-31 | Lsi Logic Corporation | Optical proximity correction method and apparatus |
| US6665856B1 (en) * | 2000-12-01 | 2003-12-16 | Numerical Technologies, Inc. | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| US7302111B2 (en) | 2001-09-12 | 2007-11-27 | Micronic Laser Systems A.B. | Graphics engine for high precision lithography |
| GB2399676B (en) | 2003-03-21 | 2006-02-22 | Ims Ionen Mikrofab Syst | Apparatus for enhancing the lifetime of stencil masks |
| GB2414111B (en) | 2004-04-30 | 2010-01-27 | Ims Nanofabrication Gmbh | Advanced pattern definition for particle-beam processing |
| KR101350980B1 (ko) * | 2007-12-31 | 2014-01-15 | 삼성전자주식회사 | Ｃｄ 선형성을 보정할 수 있는 가변 성형 빔을 이용한 노광방법 및 이를 이용한 패턴 형성 방법 |
| US20130070222A1 (en) * | 2011-09-19 | 2013-03-21 | D2S, Inc. | Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography |
| JP5495540B2 (ja) * | 2008-09-18 | 2014-05-21 | 株式会社ニューフレアテクノロジー | 描画方法及び描画装置 |
| EP2187427B1 (en) | 2008-11-17 | 2011-10-05 | IMS Nanofabrication AG | Method for maskless particle-beam exposure |
| EP2190003B1 (en) * | 2008-11-20 | 2014-10-01 | IMS Nanofabrication AG | Constant current multi-beam patterning |
| US8198601B2 (en) | 2009-01-28 | 2012-06-12 | Ims Nanofabrication Ag | Method for producing a multi-beam deflector array device having electrodes |
| JP2010250286A (ja) * | 2009-03-23 | 2010-11-04 | Toshiba Corp | フォトマスク、半導体装置、荷電ビーム描画装置 |
| US8703389B2 (en) | 2011-06-25 | 2014-04-22 | D2S, Inc. | Method and system for forming patterns with charged particle beam lithography |
| JP5743955B2 (ja) * | 2012-05-28 | 2015-07-01 | 株式会社日立ハイテクノロジーズ | パターン検査装置およびパターン検査方法 |
| EP2830083B1 (en) | 2013-07-25 | 2016-05-04 | IMS Nanofabrication AG | Method for charged-particle multi-beam exposure |
| EP2913838B1 (en) | 2014-02-28 | 2018-09-19 | IMS Nanofabrication GmbH | Compensation of defective beamlets in a charged-particle multi-beam exposure tool |
| EP2950325B1 (en) | 2014-05-30 | 2018-11-28 | IMS Nanofabrication GmbH | Compensation of dose inhomogeneity using overlapping exposure spots |
| KR102302015B1 (ko) | 2015-03-17 | 2021-09-15 | 아이엠에스 나노패브릭케이션 게엠베하 | 완화된 임계 치수의 패턴 에어리어의 멀티빔 기록 |
| US9653263B2 (en) * | 2015-03-17 | 2017-05-16 | Ims Nanofabrication Ag | Multi-beam writing of pattern areas of relaxed critical dimension |
| US10381196B2 (en) * | 2015-03-23 | 2019-08-13 | Nuflare Technology, Inc. | Charged particle beam writing apparatus and method for calculating irradiation coefficient |
| JP2016225357A (ja) * | 2015-05-27 | 2016-12-28 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 |
| EP3258479B1 (en) | 2016-06-13 | 2019-05-15 | IMS Nanofabrication GmbH | Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer |
-
2019
- 2019-01-08 EP EP19150665.8A patent/EP3518272B1/en active Active
- 2019-01-09 JP JP2019001526A patent/JP7299705B2/ja active Active
- 2019-01-09 KR KR1020190002719A patent/KR102652218B1/ko active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019165199A5 (https=) | ||
| JP2016029715A5 (https=) | ||
| JP2016018995A5 (https=) | ||
| US8457411B2 (en) | Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure | |
| JP7117914B2 (ja) | 画像処理装置、画像処理方法、及びプログラム | |
| DE112016004540T5 (de) | Kamerakalibrierung unter Verwendung von synthetischen Bildern | |
| JP7392805B2 (ja) | 描画データ生成プログラム、マルチ荷電粒子ビーム描画プログラム及びコンピュータ読み取り可能な記録媒体 | |
| JP6756320B2 (ja) | 描画データ生成方法、プログラム、マルチ荷電粒子ビーム描画装置、及びパターン検査装置 | |
| JP5576332B2 (ja) | 電子ビーム露光装置及び電子ビーム露光方法 | |
| JP2018520411A (ja) | 車両周辺部のバーチャル画像を作成するための方法 | |
| US20100237469A1 (en) | Photomask, semiconductor device, and charged beam writing apparatus | |
| CN110737178A (zh) | 描绘数据生成方法、计算机可读记录介质及多带电粒子束描绘装置 | |
| JP6881168B2 (ja) | マルチビーム電子線描画装置における露光強度分布を求める方法および装置 | |
| JP6342304B2 (ja) | データ補正装置、描画装置、検査装置、データ補正方法、描画方法、検査方法およびプログラム | |
| JP5864424B2 (ja) | 描画用電子ビームの最適照射量を求めるための方法及び描画装置 | |
| TWI900677B (zh) | 用於對複數個像素設定各自相對雷射強度的裝置及方法、電腦可讀媒體、電腦程式及遮罩書寫器系統 | |
| JP3555484B2 (ja) | 電子線描画装置、および描画方法 | |
| WO2018061960A1 (ja) | マルチビーム電子線描画装置における露光強度分布を求める方法および装置 | |
| WO2012049901A1 (ja) | 描画方法及び描画装置 | |
| JP2018077767A (ja) | 投影システム及び造形装置 | |
| JP6651776B2 (ja) | 画像処理装置、画像処理方法、及び、プログラム | |
| CN113409222B (zh) | 图像处理方法、打印方法、打印相关装置及可读存储介质 | |
| JP2010199837A (ja) | 濃度調整処理方法、それを実行させるためのプログラム及び濃度調整処理装置 | |
| CN120339088A (zh) | 一种图像匀光方法、装置、设备及介质 | |
| KR20250110147A (ko) | 묘화 데이터 생성 방법, 묘화 데이터 생성 장치, 하전 입자 빔 묘화 방법, 하전 입자 빔 묘화 장치 및 컴퓨터 판독 가능한 기록 매체 |