JP2019161024A - Bonding material, bonding structure, forming method, and manufacturing method - Google Patents

Bonding material, bonding structure, forming method, and manufacturing method Download PDF

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JP2019161024A
JP2019161024A JP2018046135A JP2018046135A JP2019161024A JP 2019161024 A JP2019161024 A JP 2019161024A JP 2018046135 A JP2018046135 A JP 2018046135A JP 2018046135 A JP2018046135 A JP 2018046135A JP 2019161024 A JP2019161024 A JP 2019161024A
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resin
bonding material
bonding
curved surface
base material
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恭子 大塚
Kyoko Otsuka
恭子 大塚
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NEC Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

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  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

To provide a bonding material that can suppress breakage and improve yield when bonding two electrodes.SOLUTION: The bonding material includes a plurality of conductive wires and a resin. Each of the conductive wires is accommodated in a predetermined closed curved surface. A first end of the conductive wire is exposed from a first region of the closed curved surface and a second end of the conductive wire is exposed from a second region of the closed curved surface. A length of the conductive wire is longer than a distance between the first region and the second region. The resin is accommodated in the closed curved surface and is a solid or close to a solid.SELECTED DRAWING: Figure 6

Description

本発明は、電子部品を回路基板に接合する構造に関する。   The present invention relates to a structure for joining an electronic component to a circuit board.

半導体部品の外部電極の一形態であるBGAは、半導体部品下面の回路基板の電極位置にはんだボールをエリアアレイ状に配置し、はんだボールをリフロー工程によって溶融させることにより、回路基板と接合し、電気的導通をとる。ここで、BGAは、Ball Grid Arrayの略である。回路基板と部品の接続がDIPやQFPのように、外部電極がリードを用いて部品の外形より外側に配置される形状に比べ、BGAは同じピン数でも部品実装面積を縮小できるという利点があるため、採用が拡大している。ここで、DIPは、Dual Inline Packageの略である。また、QFPは、Quad Flat Package の略である。   BGA which is one form of the external electrode of the semiconductor component is arranged in an area array of solder balls at the electrode position of the circuit board on the lower surface of the semiconductor component, and the solder balls are melted by a reflow process to be joined to the circuit board. Take electrical continuity. Here, BGA is an abbreviation for Ball Grid Array. Compared to the shape in which the external electrodes are arranged outside the external shape of the component using leads, such as DIP and QFP, the connection between the circuit board and the component has the advantage that the component mounting area can be reduced even with the same number of pins. Therefore, the adoption is expanding. Here, DIP is an abbreviation for Dual Inline Package. QFP is an abbreviation for Quad Flat Package.

ところが、一般的なBGA接合は、半導体部品等の動作時に発生する熱により、パッケージと回路基板の熱膨張差によって発生する歪が繰り返しBGA接合部に生じ、BGA接合部にクラックが発生し、金属疲労破壊を生ずる場合がある。   However, in general BGA bonding, distortion generated due to the difference in thermal expansion between the package and the circuit board is repeatedly generated in the BGA bonding portion due to heat generated during the operation of the semiconductor component, etc., and cracks are generated in the BGA bonding portion. May cause fatigue failure.

この問題を解決するため、特許文献1は、はんだバンプの代わりに、ばね状に加工された導電性のカラムを圧縮させ介装する方法を開示する。また、特許文献2及び3は、複数の線材からなる撚り線や編み線を用いた接合材を開示する。   In order to solve this problem, Patent Document 1 discloses a method of compressing and interposing a conductive column processed into a spring shape instead of a solder bump. Patent Documents 2 and 3 disclose bonding materials using stranded wires and knitted wires made of a plurality of wires.

特開平08−139226号公報Japanese Patent Laid-Open No. 08-139226 特開2009−224682号公報JP 2009-224682 A 特開平09−307053号公報JP 09-307053 A

特許文献1が開示する方法では、BGAのはんだボールの代わりに用いるバネ状の部材が、単一部材で構成されるため、長期間の繰り返しの歪によりクラックが発生し、破断する危険性がある。   In the method disclosed in Patent Document 1, the spring-like member used in place of the BGA solder ball is composed of a single member, so that there is a risk of cracks occurring due to repeated strain over a long period of time and breaking. .

一方、特許文献2及び3が開示する方法は、接合材により二つの電極を接合する過程において接合材が備える複数の線材が互いにほどけてしまう確率が高い。そのために、同方法は、当該接合に係る歩留りが悪い。   On the other hand, in the methods disclosed in Patent Documents 2 and 3, there is a high probability that a plurality of wire rods included in the bonding material are unwound from each other in the process of bonding two electrodes with the bonding material. Therefore, this method has a poor yield related to the bonding.

本発明は、破断を抑えることができ、二つの電極を接合する際の歩留りを向上し得る接合材等の提供を目的とする。   An object of this invention is to provide the joining material etc. which can suppress a fracture | rupture and can improve the yield at the time of joining two electrodes.

本発明の接合材は、複数の導線と樹脂とを備え、前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い。   The bonding material of the present invention includes a plurality of conducting wires and a resin, each of the conducting wires is accommodated in a predetermined closed curved surface, and a first end portion of the conducting wire is exposed from a first region of the closed curved surface, The second end of the conducting wire is exposed from the second region of the closed surface, the length of the conducting wire is longer than the distance between the first region and the second region, the resin is accommodated in the closed surface, Solid or near solid.

本発明の接合材等は、破断を抑えることができ、二つの電極を接合する際の歩留りを向上し得る。   The bonding material of the present invention can suppress breakage, and can improve the yield when bonding two electrodes.

本実施形態の接合材の例(その1)を表すイメージ図である。It is an image figure showing the example (the 1) of the joining material of this embodiment. 本実施形態の接合材の例(その2)を表すイメージ図である。It is an image figure showing the example (the 2) of the joining material of this embodiment. 本実施形態の接合材の例(その3)を表すイメージ図である。It is an image figure showing the example (the 3) of the joining material of this embodiment. 本実施形態の接合材の例(その4)を表すイメージ図である。It is an image figure showing the example (the 4) of the joining material of this embodiment. 接合材を用いて電子部品を回路基板に接合する様子を表す図である。It is a figure showing a mode that an electronic component is joined to a circuit board using a joining material. 本実施形態の接合体の例を表す図である。It is a figure showing the example of the conjugate | zygote of this embodiment. 回路基板が熱膨張した接合体を表すイメージ図である。It is an image figure showing the joined body which the circuit board thermally expanded. 接合材の製造方法の例を表すイメージ図(その1)である。It is an image figure showing the example of the manufacturing method of a joining material (the 1). 接合材の製造方法の例を表すイメージ図(その2)である。It is an image figure showing the example of the manufacturing method of a joining material (the 2). 実施形態の接合材の最小限の構成を表すブロック図である。It is a block diagram showing the minimum composition of the joining material of an embodiment.

[構成と動作]
図1は、本実施形態の接合材の例である接合材101を表すイメージ図である。なお、図1に表す接合材101は単なるイメージ図であり、接合材101の構成を正しく表すものではない。以下、「イメージ図」は上記のような図をいうこととする。
[Configuration and operation]
FIG. 1 is an image diagram showing a bonding material 101 which is an example of the bonding material of the present embodiment. Note that the bonding material 101 illustrated in FIG. 1 is merely an image, and does not correctly represent the configuration of the bonding material 101. Hereinafter, the “image diagram” refers to the above diagram.

図1(a)は、接合材101の側面のイメージ図である。また、図1(b)は接合材101の断面のイメージ図である。図1(a)と図1(b)とは、互いに対応したものではない。   FIG. 1A is an image view of a side surface of the bonding material 101. FIG. 1B is an image view of a cross section of the bonding material 101. FIG. 1A and FIG. 1B do not correspond to each other.

接合材101は、導線群106と樹脂111とを備える。   The bonding material 101 includes a conductive wire group 106 and a resin 111.

各々の導線群106は、複数の、断面が略円状の導線116が互いに編みこまれたものである。すなわち、導線群106は、複数の前記導線が編目状に交叉するように形成された編組の束線である。導線116の材料は、導電性を有するものであれば任意であり、例えば、銅である。なお、導線の本数は任意であり、図1に表す本数で無くても構わない。   Each conducting wire group 106 is formed by braiding a plurality of conducting wires 116 having a substantially circular cross section. That is, the conducting wire group 106 is a braided bundle formed so that a plurality of conducting wires cross like a stitch. The material of the conducting wire 116 is arbitrary as long as it has conductivity, and is, for example, copper. In addition, the number of conducting wires is arbitrary and may not be the number shown in FIG.

導線116の各々の上端部は、樹脂111の、図1(a)に表す見方による上部領域から露出している。また、導線116の各々の下端部は、樹脂111の、図1(a)に表す見方による下部領域から露出している。   The upper end portion of each of the conductive wires 116 is exposed from the upper region of the resin 111 according to the view shown in FIG. Moreover, the lower end part of each conducting wire 116 is exposed from the lower region of the resin 111 according to the view shown in FIG.

樹脂111は、導線群106の周囲や、導線群106の内部における導線116の各々の間に入り込んで、形成されている。導線116の各々は、樹脂111によりある程度固められ、ほどけにくくなっている。樹脂111は、固体又はある程度の粘度を有する、固体に近い流動体である。   The resin 111 is formed so as to enter between the conductors 116 around the conductor group 106 and inside the conductor group 106. Each of the conductive wires 116 is hardened to some extent by the resin 111 and is difficult to unwind. The resin 111 is a solid or a fluid close to a solid having a certain degree of viscosity.

樹脂111は、導電性の樹脂であっても構わない。樹脂111が導電性樹脂である場合には、図1(a)に表す上下の両端部間の電気抵抗を低下させ得る。   The resin 111 may be a conductive resin. When the resin 111 is a conductive resin, the electrical resistance between the upper and lower ends shown in FIG.

図2は、本実施形態の接合材の第二の例である接合材101を表すイメージ図である。図2に表す接合材101の説明は、導線に太さの異なる3種類のものが存在する点を除いて、図1に表す接合材101の説明と同じである。ただし、上記説明と図1の説明とが矛盾する場合は、上記説明を優先する。   FIG. 2 is an image diagram showing a bonding material 101 which is a second example of the bonding material of the present embodiment. The description of the bonding material 101 illustrated in FIG. 2 is the same as the description of the bonding material 101 illustrated in FIG. 1 except that there are three types of conductors having different thicknesses. However, when the above description and the description of FIG.

図3は、本実施形態の第三の例である接合材101を表すイメージ図である。   FIG. 3 is an image diagram showing a bonding material 101 which is a third example of the present embodiment.

図3に表す複数の導線116は、図1に表す導線116のように互いに交差することなく、例えば、特許文献3に記載されたリードピンのように、撚り合わされている。図3に表す接合材101の説明は、上記を除いて、図1に表す接合材101の説明と同じである。ただし、上記説明と図1の説明とが矛盾する場合は、上記説明を優先する。   The plurality of conducting wires 116 shown in FIG. 3 are twisted together like a lead pin described in Patent Document 3, for example, without crossing each other like the conducting wires 116 shown in FIG. Except for the above, the description of the bonding material 101 illustrated in FIG. 3 is the same as the description of the bonding material 101 illustrated in FIG. 1. However, when the above description and the description of FIG.

図4は、本実施形態の第四の例である接合材101を表すイメージ図である。   FIG. 4 is an image diagram showing a bonding material 101 which is a fourth example of the present embodiment.

図4に表す複数の導線116は、互いに交差はしているが、その交差の仕方に規則性が無い。図3に表す接合材101の説明は、上記を除いて、図1に表す接合材101の説明と同じである。ただし、上記説明と図1の説明とが矛盾する場合は、上記説明を優先する。   The plurality of conductors 116 shown in FIG. 4 intersect each other, but there is no regularity in the manner of intersection. Except for the above, the description of the bonding material 101 illustrated in FIG. 3 is the same as the description of the bonding material 101 illustrated in FIG. 1. However, when the above description and the description of FIG.

なお、接合材101の備える導線116の各々の形状は図1乃至図4に表す形状に類似していなくても構わない。導線116からなる導線群に含まれる複数の導線116の各々の長さが、接合材101の高さより長ければよい。   Note that the shape of each of the conductive wires 116 included in the bonding material 101 may not be similar to the shape illustrated in FIGS. 1 to 4. The length of each of the plurality of conducting wires 116 included in the conducting wire group including the conducting wires 116 only needs to be longer than the height of the bonding material 101.

なお、図1乃至図4に表す樹脂111は、必ずしも、導線群の周囲及び導線116の各々の間のすべてに形成されている必要はない。   Note that the resin 111 shown in FIGS. 1 to 4 is not necessarily formed around the conductor group and between the conductors 116.

樹脂111は、例えば、導線群の周囲に形成されていなくても構わない。ただし、樹脂111が前記周囲にも形成されている方が、導線116の各々は一層ほどけにくくなる。   For example, the resin 111 may not be formed around the conductor group. However, when the resin 111 is also formed on the periphery, each of the conductive wires 116 is more difficult to be removed.

樹脂111は、また、例えば、導線群の中心部付近に形成されていなくても構わない。ただし、樹脂111が当該中心部付近まで形成されている場合の方が、各銅線をほどけにくくする効果はより大きい。   The resin 111 may not be formed near the center of the conductor group, for example. However, the effect of making each copper wire difficult to unwind is greater when the resin 111 is formed to the vicinity of the central portion.

さらに、樹脂111は、例えば、導線群の周囲の一部と導線116の各々の間の一部に形成されていても良い。   Furthermore, the resin 111 may be formed in, for example, a part of the periphery of the conductor group and a part between each of the conductors 116.

図5は、図1乃至図4に表す接合材101を用いて電子部品を回路基板に接合する様子を表す図である。   FIG. 5 is a diagram illustrating a state in which an electronic component is bonded to a circuit board using the bonding material 101 illustrated in FIGS. 1 to 4.

電子部品201の備える部品電極206の各々に予めはんだ211を付着させておく。   Solder 211 is attached in advance to each of the component electrodes 206 included in the electronic component 201.

また、回路基板301の備える基板電極306の各々に予めはんだ311を付着させておく。   Also, solder 311 is attached in advance to each of the substrate electrodes 306 included in the circuit board 301.

また、接合材101の各々の上端にはんだ151を、下端にはんだ156を予め付着させておく。   Further, the solder 151 is attached to the upper end of each of the bonding materials 101 and the solder 156 is attached to the lower end in advance.

そして、はんだ311の各々の上に、接合材101の各々を載せる。   Then, each of the bonding materials 101 is placed on each of the solders 311.

そして、接合材101の各々の上に、はんだ211の各々が載るように、電子部品201を載せる。   Then, the electronic component 201 is placed on each of the bonding materials 101 so that each of the solders 211 is placed thereon.

その後、上記により重ね合わせた構造体全体を、はんだ211、151、156及び311の各々が溶融する温度で加熱する。   Thereafter, the entire structure superposed as described above is heated at a temperature at which each of the solders 211, 151, 156 and 311 is melted.

これにより、はんだ211とはんだ151との組合せの各々、及び、はんだ156とはんだ311との組合せの各々が一体化する。   Thereby, each combination of the solder 211 and the solder 151 and each combination of the solder 156 and the solder 311 are integrated.

上記により、電子部品201の部品電極206の各々は、接合材101の各々を介して、対応する基板電極306の各々に接合される。   As described above, each of the component electrodes 206 of the electronic component 201 is bonded to each of the corresponding substrate electrodes 306 via each of the bonding materials 101.

図6は、上記説明により接合された電子部品201と回路基板301との組合せである接合体501を表す図である。   FIG. 6 is a diagram illustrating a bonded body 501 that is a combination of the electronic component 201 and the circuit board 301 bonded according to the above description.

なお、図1に表す樹脂111の一部又は全部は、図6に表す接合体501から除去されても構わない。その理由は、樹脂111は、接合材101の導線群106が部品電極206及び基板電極306にはんだにより接続された後は、必ずしも必要ないからである。その理由は、樹脂111は、接合材101を用いての接合体501の製造を容易にするためのものであり、さらに、後述のように、接合材101の製造を容易にするためのものであるためである。   Note that part or all of the resin 111 illustrated in FIG. 1 may be removed from the bonded body 501 illustrated in FIG. 6. The reason is that the resin 111 is not necessarily required after the conductive wire group 106 of the bonding material 101 is connected to the component electrode 206 and the substrate electrode 306 by solder. The reason for this is that the resin 111 is for facilitating the production of the joined body 501 using the joining material 101, and further for facilitating the production of the joining material 101 as will be described later. Because there is.

前記除去は、例えば、接合体501を、樹脂111を溶解する溶液に浸すことにより行われる。   The removal is performed, for example, by immersing the bonded body 501 in a solution in which the resin 111 is dissolved.

図7は、回路基板301が熱膨張した場合における、図6に表す接合体501を表すイメージ図である。なお、図7に表す接合材1011乃至1015は、図6に表す接合材101である。   FIG. 7 is an image diagram showing the bonded body 501 shown in FIG. 6 when the circuit board 301 is thermally expanded. Note that the bonding materials 1011 to 1015 illustrated in FIG. 7 are the bonding materials 101 illustrated in FIG. 6.

図7に表す回路基板301は電子部品との熱膨張差により反っている。その際に、電子部品201の端部近傍の部品電極206に接合された接合材1011及び1015は、上下方向に伸びている。   The circuit board 301 shown in FIG. 7 is warped due to a difference in thermal expansion from the electronic component. At that time, the bonding materials 1011 and 1015 bonded to the component electrode 206 in the vicinity of the end of the electronic component 201 extend in the vertical direction.

接合材1011及び1015における部品電極206と基板電極306とを電気的に接続する主要部は、図1乃至図4に表す導線116である。そして、導線116は、前述のように、編目状に交叉するように形成されているか、撚り合わされているかである。従い、導線116からなる導線群は、接合材が伸び縮みしたとしてもすぐには断線するものではない(特許文献3参照)。そのため、図7に表す接合材1011及び1015のようにある程度伸びた状態においても、それらは、部品電極206と基板電極306とを電気的に接続し得る。   A main part that electrically connects the component electrode 206 and the substrate electrode 306 in the bonding materials 1011 and 1015 is a conducting wire 116 shown in FIGS. Then, as described above, the conductive wire 116 is formed so as to cross the stitch shape or is twisted together. Therefore, even if the joining material expands and contracts, the conducting wire group including the conducting wires 116 does not break immediately (see Patent Document 3). Therefore, even when the bonding materials 1011 and 1015 shown in FIG. 7 are extended to some extent, they can electrically connect the component electrode 206 and the substrate electrode 306.

なお、接合材に含まれる導体群が伸縮に耐えうる程度は、導体群を構成する導体の本数、各導体の太さ、各導体の太さの種類(図2参照)及び各導線の絡ませ方や撚り方により選択し得る。   The degree to which the conductor group included in the bonding material can withstand expansion and contraction is the number of conductors constituting the conductor group, the thickness of each conductor, the type of thickness of each conductor (see FIG. 2), and how to entangle each conductor. It can be selected depending on the twisting method.

ここで、接合材1011及び1015のように接合材が伸びた状態において図1乃至図4に表す樹脂111に亀裂が入るか否かは、部品電極206と基板電極306との電気的接続には影響が少ない。その理由は、上述のように、接合材1011及び1015における部品電極206と基板電極306とを電気的に接続する主要部は、導線116であり樹脂111ではないからである。   Here, whether or not the resin 111 shown in FIGS. 1 to 4 is cracked in a state where the bonding material is extended like the bonding materials 1011 and 1015 depends on the electrical connection between the component electrode 206 and the substrate electrode 306. There is little influence. This is because, as described above, the main part that electrically connects the component electrode 206 and the substrate electrode 306 in the bonding materials 1011 and 1015 is the conductive wire 116 and not the resin 111.

また、樹脂111が、加熱や経時変化により変質するか否かは、部品電極206と基板電極306との電気的接続には影響が少ない。その理由は、上述のように、接合材1011及び1015における部品電極206と基板電極306とを電気的に接続する主要部は、導線116であり樹脂111ではないからである。ただし、前記変質の際に、導線116を劣化させないことが前提である。   Whether or not the resin 111 is altered by heating or change with time has little influence on the electrical connection between the component electrode 206 and the substrate electrode 306. This is because, as described above, the main part that electrically connects the component electrode 206 and the substrate electrode 306 in the bonding materials 1011 and 1015 is the conductive wire 116 and not the resin 111. However, it is a premise that the conducting wire 116 is not deteriorated during the alteration.

図8及び図9は、図1に表す接合材101の製造方法の例を表すイメージ図である。   8 and 9 are image diagrams showing an example of a manufacturing method of the bonding material 101 shown in FIG.

まず、周知の方法により導線の各々は編み上げられ、図8(a)に表す導線群母材107が作成される。   First, each of the conducting wires is knitted by a known method, and the conducting wire group base material 107 shown in FIG.

次に、導線群母材107は、図8(b)に表す容器706に入れられた溶液701に浸される。溶液701は、図1乃至図4に表す樹脂111を溶媒に溶かしたものである。   Next, the lead wire group base material 107 is immersed in a solution 701 placed in a container 706 shown in FIG. The solution 701 is obtained by dissolving the resin 111 shown in FIGS. 1 to 4 in a solvent.

この状態において溶液701は加圧されても構わない。溶液701が加圧される場合は、溶液701は、導線群母材107における各導線の隙間に入り込む程度が向上する。   In this state, the solution 701 may be pressurized. When the solution 701 is pressurized, the degree to which the solution 701 enters the gaps between the conductors in the conductor group base material 107 is improved.

次に、導線群母材107は、溶液701から出される。このとき、導線群母材107の周囲や隙間には樹脂が存在する。この状態で、溶液701に含まれる溶媒を蒸発させると、導線群母材107と樹脂111とからなる図8(c)に表す接合母材102が形成される。   Next, the conductive wire group base material 107 is taken out of the solution 701. At this time, resin is present around and around the conductor group base material 107. When the solvent contained in the solution 701 is evaporated in this state, the joining base material 102 shown in FIG. 8C composed of the conductive wire group base material 107 and the resin 111 is formed.

次に、接合母材102を、例えば、ダイヤモンドカッター等で所定の長さに切断すると、図9に表すように、接合材101と端材191とが作成される。端材191は廃棄されても構わない。   Next, when the joining base material 102 is cut into a predetermined length with, for example, a diamond cutter, the joining material 101 and the end material 191 are created as shown in FIG. The end material 191 may be discarded.

導線群母材107は、前記切断の段階では樹脂111により固められている。そのため、前記切断の際に導線群母材107に含まれる各導線はほどけにくい。   The conducting wire group base material 107 is hardened by the resin 111 at the cutting stage. Therefore, each conducting wire included in the conducting wire group base material 107 is difficult to unwind during the cutting.

そのため、図8及び図9に表す製造方法は、導線群母材107が樹脂111により固められていない場合と比較して、切断が容易である。従い、上記製造方法は、接合材の製造時の歩留りを向上させ得る。
[効果]
本実施形態の接合材においては、導線群が、樹脂により固められている。そのため、前記接合材は、樹脂で固められていない場合と比較して、各銅線がほどけにくく、取扱いが容易である。従い、前記接合材は、電子部品等を基板等に接合する際の歩留りを向上させ得る。
Therefore, the manufacturing method shown in FIGS. 8 and 9 is easier to cut compared to the case where the conductor group base material 107 is not hardened by the resin 111. Accordingly, the above manufacturing method can improve the yield at the time of manufacturing the bonding material.
[effect]
In the bonding material of this embodiment, the conducting wire group is hardened with resin. Therefore, compared with the case where the said joining material is not hardened with resin, each copper wire is hard to unwind and handling is easy. Accordingly, the bonding material can improve the yield when bonding electronic components or the like to a substrate or the like.

また、本実施形態の接合材の製造方法は、所定の長さの導線群を、前記樹脂を溶かした溶液等に浸した後に樹脂を形成させ、接合母材を形成させる。そして、その接合母材を、所定の長さに切断して、前記接合体を形成する。接合母材は、前記導線群を前記樹脂により固めたものである。そのため、前記接合母材においては、前記樹脂がない導体群と比較して、前記切断の際に各導線がほどける確率が低い。そのため、前記製造方法は、接合体の製造時の歩留りを向上させ得る。   Moreover, the manufacturing method of the bonding | jointing material of this embodiment forms resin after forming the conductor group of predetermined length in the solution etc. which melt | dissolved the said resin, and forms a joining base material. Then, the joined base material is cut into a predetermined length to form the joined body. The joining base material is obtained by solidifying the conductor group with the resin. Therefore, in the said joining base material, compared with the conductor group without the said resin, the probability that each conducting wire will be unwound in the case of the said cutting | disconnection is low. Therefore, the said manufacturing method can improve the yield at the time of manufacture of a conjugate | zygote.

図10は、実施形態の接合材の最小限の構成である接合材101xの構成を表すブロック図である。   FIG. 10 is a block diagram illustrating a configuration of a bonding material 101x which is the minimum configuration of the bonding material according to the embodiment.

接合材101xは、図示しない、複数の導線と樹脂とを備える。   The bonding material 101x includes a plurality of conductive wires and a resin (not shown).

前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長い。   Each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and the second end of the conducting wire is exposed from the second region of the closed curved surface. And the length of the said conducting wire is longer than the distance of said 1st area | region and said 2nd area | region.

前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い。   The resin is contained in the closed curved surface and is solid or close to solid.

前記導線の各々は、前記第一領域と前記第二領域との間でたわんでいるため、伸縮に対する許容度が大きい。すなわち、接合材101xは、破断を抑えられる構造のものである。   Since each of the conducting wires bends between the first region and the second region, the tolerance for expansion and contraction is large. That is, the bonding material 101x has a structure that can suppress breakage.

また、接合材101xにおいて、前記導線群は前記兵曲面の内部において前記樹脂により固められている。そのため、接合材101xは、前記接合を行う際に、前記導線がほどける確率が少ない。そのため、接合材101xは、二つの電極を接合する際の歩留まりを向上し得る。   Further, in the bonding material 101x, the conductor group is hardened by the resin inside the military curved surface. Therefore, the bonding material 101x has a low probability of unwinding the conducting wire when performing the bonding. Therefore, the bonding material 101x can improve the yield when bonding the two electrodes.

すなわち、接合材101xは、接合部の破断を抑えることができ、接合の際の歩留りを向上し得る。   That is, the bonding material 101x can suppress breakage of the bonded portion, and can improve the yield during bonding.

そのため、接合材101xは、前記構成により、[発明の効果]の項に記載した効果を奏する。   Therefore, the bonding material 101x has the effects described in the section [Effects of the Invention] due to the above configuration.

なお、接合材101xは、例えば、図1乃至図5及び図9に表す接合材101の各々や、図7に表す接合材1011乃至1015の各々である。また、前記導線は、例えば、図1乃至図4に表す導線116である。また、前記樹脂は、例えば、図1乃至図4及び図8に表す樹脂111である。また、前記閉曲面は、例えば、図1乃至図4に表す導線116を収容する図示しない閉曲面である。   Note that the bonding material 101x is, for example, each of the bonding materials 101 illustrated in FIGS. 1 to 5 and 9 and each of the bonding materials 1011 to 1015 illustrated in FIG. Moreover, the said conducting wire is the conducting wire 116 represented, for example in FIG. 1 thru | or FIG. The resin is, for example, the resin 111 shown in FIGS. 1 to 4 and 8. The closed curved surface is, for example, a closed curved surface (not shown) that accommodates the conducting wire 116 shown in FIGS. 1 to 4.

以上、本発明の各実施形態を説明したが、本発明は、前記した実施形態に限定されるものではなく、本発明の基本的技術的思想を逸脱しない範囲で更なる変形、置換、調整を加えることができる。例えば、各図面に示した要素の構成は、本発明の理解を助けるための一例であり、これらの図面に示した構成に限定されるものではない。   Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and further modifications, substitutions, and adjustments may be made without departing from the basic technical idea of the present invention. Can be added. For example, the configuration of the elements shown in each drawing is an example for helping understanding of the present invention, and is not limited to the configuration shown in these drawings.

また、前記の実施形態の一部又は全部は、以下の付記のようにも記述され得るが、以下には限られない。
(付記1)
複数の導線と樹脂とを備え、
前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、
前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い、
接合材。
(付記2)
前記樹脂が、前記閉曲面の周囲にも形成されている、付記1に記載された接合材。
(付記3)
前記複数の前記導線が編目状に交叉するように形成された編組の束線、及び、前記複数の前記導線を撚り合わせた撚線、のうちの少なくともいずれかである、付記1又は付記2に記載された接合材。
(付記4)
前記樹脂が導電性樹脂である、付記1乃至付記3のうちのいずれか一に記載された接合材。
(付記5)
電子部品の電極である部品電極と前記電子部品を設置するための回路基板の電極である基板電極とを接合するためのものである、付記1乃至付記4のうちのいずれか一に記載された接合材。
(付記6)
付記5に記載された接合材と、
前記接合材の第一端部と接合された前記部品電極と、
前記接合材の第二端部と接合された前記基板電極と、
を備える接合構造。
(付記7)
複数の導線と樹脂とを備え、前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、
前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い、接合材と、
前記接合材の第一端部と第一接合された電子部品の部品電極と、
前記接合材の第二端部と第二接合された、前記電子部品を設置するための回路基板の電極と、
を備え、
前記閉曲面に、前記第一接合及び前記第二接合の際に、前記収容が行われている、接合構造。
(付記8)
前記樹脂の少なくとも一部は、前記第一接合及び前記第二接合の後に除去される、付記7に記載された接合構造。
(付記9)
複数の導線母材が編目状に交叉するように形成された編組の束線、及び、前記導線母材を撚り合わせた撚線、のうちの少なくともいずれかを備える導線群母材を形成し、
前記導線群母材における前記導線母材の間に樹脂を形成した接合母材を形成し、
前記接合母材を所定の長さに切断する、
接合材形成方法。
(付記10)
導線群母材の長さより長い複数の導線母材を備える前記導線群母材を形成し、
前記導線群母材における前記導線母材の間に樹脂を形成した接合母材を形成し、
前記接合母材を所定の長さに切断し、
導線群の長さより長い複数の導線を備える前記導線群を備える接合材を形成する
接合材形成方法。
(付記11)
前記樹脂を、前記導線群の周囲にも形成する、付記10に記載された接合材形成方法。
(付記12)
前記接合母材を、前記導線群母材を形成し、前記樹脂を形成するための液に前記導線群母材を浸し、前記導線群母材を前記液から取り出し、前記樹脂を固化することにより作成する、付記10又は付記11に記載された接合材形成方法。
(付記13)
前記液は、前記樹脂を、前記樹脂を溶解する溶媒に溶かしたものであり、前記固化を、前記溶媒を蒸発させることにより行う、付記12に記載された接合材形成方法。
(付記14)
電子部品の電極である部品電極と前記電子部品を設置するための回路基板の電極とを接合するための接合体に係る、付記10乃至付記13のうちのいずれか一に記載された接合材形成方法。
(付記15)
複数の導線と樹脂とを備え、前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、
前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い、接合材、の前記第一端部を、電子部品の電極である部品電極に第一接合し、
前記接合材の前記第二端部を、前記電子部品を設置するための回路基板の電極である基板電極に第二接合する、
製造方法。
(付記16)
前記第一接合が、前記第一端部に付けられた第一はんだと、前記部品電極に付けられた第二はんだとの第一溶着により行われ、前記第二接合が、前記第二端部に付けられた第三はんだと前記基板電極に付けられた第四はんだと、の第二溶着とにより行われる、付記15に記載された製造方法。
(付記17)
前記第一溶着と前記第二溶着とが同時に行われる、付記16に記載された製造方法。
(付記18)
前記第一溶着と前記第二溶着とが、前記第一はんだ、前記第二はんだ、前記第三はんだ及び前記第四はんだを同時に加熱することにより行われる、付記16又は付記17に記載された製造方法。
(付記19)
前記第一接合及び前記第二接合の後に、前記樹脂の少なくとも一部を除去する、付記15乃至付記18のうちのいずれか一に記載された製造方法。
Further, a part or all of the above-described embodiment can be described as in the following supplementary notes, but is not limited thereto.
(Appendix 1)
It has a plurality of conductors and resin,
Each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and the second end of the conducting wire is exposed from the second region of the closed curved surface. And the length of the conducting wire is longer than the distance between the first region and the second region,
The resin is contained in the closed curved surface and is solid or close to solid,
Bonding material.
(Appendix 2)
The bonding material according to attachment 1, wherein the resin is also formed around the closed curved surface.
(Appendix 3)
Appendix 1 or Appendix 2, which is at least one of a bundle of braids formed so that the plurality of conductors cross like a stitch, and a twisted wire obtained by twisting the plurality of conductors The described bonding material.
(Appendix 4)
The bonding material according to any one of supplementary notes 1 to 3, wherein the resin is a conductive resin.
(Appendix 5)
It is for joining a component electrode which is an electrode of an electronic component and a substrate electrode which is an electrode of a circuit board for installing the electronic component. Bonding material.
(Appendix 6)
The bonding material described in Appendix 5,
The component electrode joined to the first end of the joining material;
The substrate electrode bonded to the second end of the bonding material;
A junction structure comprising:
(Appendix 7)
A plurality of conducting wires and a resin, each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and from the second region of the closed curved surface The second end of the conducting wire is exposed, and the length of the conducting wire is longer than the distance between the first region and the second region,
The resin is contained in the closed curved surface, and is a solid or near solid, a bonding material,
A component electrode of the electronic component first bonded to the first end of the bonding material;
An electrode of a circuit board for installing the electronic component, second bonded to the second end of the bonding material;
With
A joining structure in which the housing is performed on the closed curved surface during the first joining and the second joining.
(Appendix 8)
The joining structure according to appendix 7, wherein at least a part of the resin is removed after the first joining and the second joining.
(Appendix 9)
Forming a conductor group base material comprising at least one of a bundle of braids formed so that a plurality of conductor base materials cross in a knitted pattern, and a twisted wire obtained by twisting the conductor base materials;
Forming a joining base material in which a resin is formed between the conducting wire base materials in the conducting wire group base material;
Cutting the joining base material to a predetermined length;
Bonding material forming method.
(Appendix 10)
Forming the conductor group base material comprising a plurality of conductor base materials longer than the length of the conductor group base material;
Forming a joining base material in which a resin is formed between the conducting wire base materials in the conducting wire group base material;
Cutting the joining base material to a predetermined length;
A bonding material forming method, comprising: forming a bonding material including the conductive wire group including a plurality of conductive wires longer than the length of the conductive wire group.
(Appendix 11)
The bonding material forming method according to appendix 10, wherein the resin is also formed around the conductor group.
(Appendix 12)
By forming the wire group base material, immersing the wire group base material in a liquid for forming the resin, taking out the wire group base material from the liquid, and solidifying the resin The bonding material forming method described in Appendix 10 or Appendix 11.
(Appendix 13)
The bonding material forming method according to appendix 12, wherein the liquid is obtained by dissolving the resin in a solvent that dissolves the resin, and the solidification is performed by evaporating the solvent.
(Appendix 14)
The bonding material formation according to any one of appendix 10 to appendix 13, relating to a joined body for joining a component electrode which is an electrode of an electronic component and an electrode of a circuit board for installing the electronic component Method.
(Appendix 15)
A plurality of conducting wires and a resin, each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and from the second region of the closed curved surface The second end of the conducting wire is exposed, and the length of the conducting wire is longer than the distance between the first region and the second region,
The resin is accommodated in the closed curved surface, and the first end of a bonding material that is solid or close to solid is first bonded to a component electrode that is an electrode of an electronic component,
The second end of the bonding material is second bonded to a substrate electrode that is an electrode of a circuit board for installing the electronic component,
Production method.
(Appendix 16)
The first joining is performed by first welding of a first solder attached to the first end and a second solder attached to the component electrode, and the second joining is performed to the second end. The manufacturing method according to appendix 15, which is performed by second welding of the third solder attached to the substrate and the fourth solder attached to the substrate electrode.
(Appendix 17)
The manufacturing method according to appendix 16, wherein the first welding and the second welding are performed simultaneously.
(Appendix 18)
The manufacturing according to appendix 16 or appendix 17, wherein the first welding and the second welding are performed by simultaneously heating the first solder, the second solder, the third solder, and the fourth solder. Method.
(Appendix 19)
The manufacturing method according to any one of Appendix 15 to Appendix 18, wherein at least a part of the resin is removed after the first bonding and the second bonding.

101、1011、1012、1013、1014、1015、101x 接合材
102 接合母材
106 導線群
107 導線群母材
111 樹脂
116 導線
151、156、211、311 はんだ
191 端材
201 電子部品
206 部品電極
301 回路基板
306 基板電極
701 溶液
706 容器
101, 1011, 1012, 1013, 1014, 1015, 101x Bonding material 102 Bonding base material 106 Conductive wire group 107 Conductive wire group base material 111 Resin 116 Lead wire 151, 156, 211, 311 Solder 191 End material 201 Electronic component 206 Component electrode 301 Circuit Substrate 306 Substrate electrode 701 Solution 706 Container

Claims (10)

複数の導線と樹脂とを備え、
前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、
前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い、
接合材。
It has a plurality of conductors and resin,
Each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and the second end of the conducting wire is exposed from the second region of the closed curved surface. And the length of the conducting wire is longer than the distance between the first region and the second region,
The resin is contained in the closed curved surface and is solid or close to solid,
Bonding material.
前記樹脂が、前記閉曲面の周囲にも形成されている、請求項1に記載された接合材。   The bonding material according to claim 1, wherein the resin is also formed around the closed curved surface. 前記複数の前記導線が編目状に交叉するように形成された編組の束線、及び、前記複数の前記導線を撚り合わせた撚線、のうちの少なくともいずれかである、請求項1又は請求項2に記載された接合材。   The braided bundle wire formed so that the plurality of the conducting wires intersect in a stitch shape and at least one of the twisted wires obtained by twisting the plurality of the conducting wires together. 2. The bonding material described in 2. 電子部品の電極である部品電極と前記電子部品を設置するための回路基板の電極である基板電極とを接合するためのものである、請求項1乃至請求項3のうちのいずれか一に記載された接合材。   4. The device according to claim 1, which is for joining a component electrode that is an electrode of an electronic component and a substrate electrode that is an electrode of a circuit board for installing the electronic component. 5. Bonded material. 請求項4に記載された接合材と、
前記接合材の第一端部と接合された前記部品電極と、
前記接合材の第二端部と接合された前記基板電極と、
を備える接合構造。
A bonding material according to claim 4;
The component electrode joined to the first end of the joining material;
The substrate electrode bonded to the second end of the bonding material;
A junction structure comprising:
複数の導線母材が編目状に交叉するように形成された編組の束線、及び、前記導線母材を撚り合わせた撚線、のうちの少なくともいずれかを備える導線群母材を形成し、
前記導線群母材における前記導線母材の間に樹脂を形成した接合母材を形成し、
前記接合母材を所定の長さに切断する、
接合材形成方法。
Forming a conductor group base material comprising at least one of a bundle of braids formed so that a plurality of conductor base materials cross in a knitted pattern, and a twisted wire obtained by twisting the conductor base materials;
Forming a joining base material in which a resin is formed between the conducting wire base materials in the conducting wire group base material;
Cutting the joining base material to a predetermined length;
Bonding material forming method.
導線群母材の長さより長い複数の導線母材を備える前記導線群母材を形成し、
前記導線群母材における前記導線母材の間に樹脂を形成した接合母材を形成し、
前記接合母材を所定の長さに切断し、
導線群の長さより長い複数の導線を備える前記導線群を備える接合材を形成する
接合材形成方法。
Forming the conductor group base material comprising a plurality of conductor base materials longer than the length of the conductor group base material;
Forming a joining base material in which a resin is formed between the conducting wire base materials in the conducting wire group base material;
Cutting the joining base material to a predetermined length;
A bonding material forming method, comprising: forming a bonding material including the conductive wire group including a plurality of conductive wires longer than the length of the conductive wire group.
前記接合母材を、前記導線群母材を形成し、前記樹脂を形成するための液に前記導線群母材を浸し、前記導線群母材を前記液から取り出し、前記樹脂を固化することにより作成する、請求項6又は請求項7に記載された接合材形成方法。   By forming the wire group base material, immersing the wire group base material in a liquid for forming the resin, taking out the wire group base material from the liquid, and solidifying the resin The bonding material forming method according to claim 6, wherein the bonding material is formed. 複数の導線と樹脂とを備え、前記導線の各々は、所定の閉曲面に収容され、前記閉曲面の第一領域から前記導線の第一端部が露出し、前記閉曲面の第二領域から前記導線の第二端部が露出し、前記導線の長さが前記第一領域と前記第二領域との距離より長く、
前記樹脂は、前記閉曲面に収容され、固体若しくは固体に近い、接合材、の前記第一端部を、電子部品の電極である部品電極に第一接合し、
前記接合材の前記第二端部を、前記電子部品を設置するための回路基板の電極である基板電極に第二接合する、
製造方法。
A plurality of conducting wires and a resin, each of the conducting wires is accommodated in a predetermined closed curved surface, the first end of the conducting wire is exposed from the first region of the closed curved surface, and from the second region of the closed curved surface The second end of the conducting wire is exposed, and the length of the conducting wire is longer than the distance between the first region and the second region,
The resin is accommodated in the closed curved surface, and the first end of a bonding material, which is solid or close to solid, is first bonded to a component electrode which is an electrode of an electronic component,
The second end of the bonding material is second bonded to a substrate electrode that is an electrode of a circuit board for installing the electronic component,
Production method.
前記第一接合及び前記第二接合の後に、前記樹脂の少なくとも一部を除去する、請求項9に記載された製造方法。   The manufacturing method according to claim 9, wherein at least a part of the resin is removed after the first bonding and the second bonding.
JP2018046135A 2018-03-14 2018-03-14 Bonding material, bonding structure, forming method, and manufacturing method Pending JP2019161024A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02241045A (en) * 1989-03-15 1990-09-25 Matsushita Electric Works Ltd Semiconductor device and manufacture thereof
JPH0883662A (en) * 1994-01-13 1996-03-26 Furukawa Electric Co Ltd:The Manufacture of super-micro connector
JPH09307053A (en) * 1996-05-15 1997-11-28 Furukawa Electric Co Ltd:The Lead pin for semiconductor components and method of manufacturing it
JP2007227263A (en) * 2006-02-24 2007-09-06 Mitsubishi Cable Ind Ltd Assembled conductor and manufacturing method thereof
JP2009224682A (en) * 2008-03-18 2009-10-01 Fujitsu Ltd Semiconductor device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02241045A (en) * 1989-03-15 1990-09-25 Matsushita Electric Works Ltd Semiconductor device and manufacture thereof
JPH0883662A (en) * 1994-01-13 1996-03-26 Furukawa Electric Co Ltd:The Manufacture of super-micro connector
JPH09307053A (en) * 1996-05-15 1997-11-28 Furukawa Electric Co Ltd:The Lead pin for semiconductor components and method of manufacturing it
JP2007227263A (en) * 2006-02-24 2007-09-06 Mitsubishi Cable Ind Ltd Assembled conductor and manufacturing method thereof
JP2009224682A (en) * 2008-03-18 2009-10-01 Fujitsu Ltd Semiconductor device

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