JP2019117952A - Foreign matter removal device of body to be washed and foreign matter removal method of the same - Google Patents

Abstract

PURPOSE: To provide a foreign matter removal device of a body to be washed and a foreign matter removal method of the body to be washed which can be housed into a compact size of such an extent as to be incorporated into a conveyance system and can easily perform the washing, permitted in a washing tank in the conventional technique, in an atmosphere such as in a way in conveyance.CONSTITUTION: A foreign matter removal device includes: a washing head having a discharge hole, a suction hole and a cover; a vacuum exhaust system which sucks washing liquid by vacuum from a suction hole and discharges the washing liquid from a liquid discharge hole; and interval adjusting means which retains a distance between the washing head and a body to be washed in a constant interval. Therein, in accordance with vacuum suction of washing liquid from the suction hole by means of the vacuum exhaust system, the washing liquid discharged from the liquid discharge hole is discharged onto the body to be washed, the foreign matter on the body to be washed is washed and is sucked from the suction hole, and the body to be washed is washed locally.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an apparatus for removing foreign matter from an object to be cleaned, which cleans the foreign matter on the object to be cleaned using a cleaning liquid, and a method for removing the foreign matter.

  Heretofore, various methods for simply removing foreign matter attached to a substrate such as a semiconductor substrate, a liquid crystal substrate, a print substrate, etc. have been considered and put to practical use.

  If the substrate is placed in a cleaning tank and cleaned, most foreign substances can be removed, but the equipment becomes large, time-consuming, additional incidental processes increase, too strong and the object to be cleaned is destroyed, etc. Because it contains a lot, it is thought that we want to avoid it if possible.

  Therefore, for example, a brush is applied in the atmosphere during the transfer of the substrate. Spray a very strong gas. In order to remove the charge, ions for charge neutralization are sprayed from the ionizer. Alternatively, small foreign particles can not be removed simply by spraying, so methods such as using ultrasonic waves are taken. These are integrated and widely used in the form of being incorporated into a part of the transport system.

  However, in the above-mentioned prior art which can be used in the atmosphere, a foreign substance having a size of 1 micron or more can sufficiently transmit its mechanical action, so it has sufficient removal power, but on the order of submicron There was a problem that the foreign matter could not be removed.

  In addition, since the method for removing foreign matter is based on mechanical force, there is also a problem that foreign matter that is connected in any other way can not be removed in principle.

  In addition, atmospheric pressure plasma method has been developed as a conventional cleaning method in the atmosphere, but since it uses surface chemical reaction, it is effective only for a very thin layer of the nm order and generally causes problems as defects. There is also a problem that the removal of foreign matter in submicron (several tens of nm to several hundreds of nm order) is totally useless.

  In contrast to the conventional liquid cleaning method requiring a large cleaning tank, the present invention can be incorporated into the transport system by locally cleaning the substrate using the local immersion technique. It is intended to be stored in a compact size and to be able to be easily cleaned in the atmosphere such as during transportation, which has been conventionally performed in a cleaning tank.

Therefore, according to the present invention, in the foreign matter removing apparatus for cleaning foreign matter on the object to be cleaned with the cleaning liquid, the ejection hole for ejecting the cleaning liquid and the cleaning liquid after the cleaning liquid ejected from the ejection hole cleans the surface of the object to be cleaned The cleaning solution is vacuum suctioned from the suction hole forming the closed space by the suction hole for suction, the head having the ejection hole and the suction hole, the cleaning object and the seal portion forming the closed space, and the cleaning solution is jetted out A vacuum exhaust system jetted from a hole, and a space adjusting means for holding the distance between the cleaning head and the object to be cleaned at a constant interval, forming an ad hoc flow path with the object to be cleaned, and a suction hole by the vacuum exhaust system. In response to vacuum suction of the cleaning liquid from the nozzle, the cleaning liquid ejected from the ejection hole is ejected to the object to be cleaned, and the foreign matter on the object to be cleaned is cleaned and aspirated from the suction hole to clean the object to be cleaned. To do To have. In addition, by making good use of the surface tension, the liquid is removed to prevent the cleaning liquid residue from remaining on the object to be cleaned.

  Under the present circumstances, the foreign material in the washing | cleaning liquid attracted | sucked from the suction hole is removed, and the filter which makes the washing | cleaning liquid which removed the foreign material eject from the ejection hole is provided.

  Also, as the space adjusting means, in order to adjust the distance between the cleaning head and the object to be cleaned constant, the outer periphery of the cover constituting the cleaning head ejects gas toward the object to be cleaned and the outer periphery of the cover The distance between the part and the object to be cleaned is adjusted to be constant according to Bernoulli's principle.

  In addition, the distance between the outer peripheral portion of the cover and the body to be cleaned is kept constant, and at the same time, the jetted gas is drained to dry the cleaning liquid on the body to be cleaned.

  In addition, the object to be cleaned is moved at a constant speed as a flat plate, and the entire flat plate or a designated area is cleaned.

  In addition, as a cleaning liquid, it is made to be a liquid cleaning liquid using water, an organic solvent, and an inorganic solvent as a solvent.

  In addition, the ejection holes are provided in the central portion of the cover, and the suction holes are provided so as to surround the outside thereof. The outer wall or cover forms a closed space with the body to be cleaned, and is confined so that the cleaning solution does not leak out.

  In addition, the tip of the jet hole is made hydrophilic, and the portion between the suction hole and the outside is made water repellent.

  In addition, one or more ejection holes and one or more suction holes are provided around the ejection holes.

  In addition, a laser beam is irradiated to a portion where the cleaning solution flows from the ejection hole toward the suction hole, or ultrasonic vibration is applied to promote the cleaning action.

  Further, a gas jet port is provided at the outer peripheral portion of the cover for housing the cleaning head or at the portion connected to the cover so that the cleaning liquid on the object to be cleaned can be blown off and dried.

  Further, one or more Bernoulli chucks are provided to eject the gas from one or a plurality of nozzles toward the object to be cleaned and to hold and convey the object to be cleaned in a noncontact manner according to the Bernoulli principle.

  In addition, the cover constituting the cleaning head is hemispherical or semi-cylindrical, and the hemispherical or semi-cylindrical portion is provided with a plurality of ejection holes and one or more suction holes are provided. The plurality of ejection holes provided in the portion eject and wash the object to be cleaned from different angles.

  Using the present invention, liquid cleaning, which is the strongest cleaning method conventionally used, can be performed in the atmosphere. This makes it possible to easily remove foreign substances that were difficult to remove by the conventional dry cleaning technology. The footprint is also very small, compact in size, and can be made in the atmosphere, so it can be placed anywhere, regardless of the installation location. The manufacturing cost is also reduced. Since the amount of cleaning fluid can be reduced and fresh cleaning fluid can always be sent to the object to be cleaned, the running cost can also be reduced.

  Further, according to the present invention, since the object to be cleaned (cleaned substrate) comes out of the apparatus in a dried state, it becomes pseudo dry cleaning and there is no drop of liquid or the like. Since the surface tension is used well to drain the water, no washing residue remains. Since the cleaning solution is locally heated and used, energy saving is achieved as compared with the case where a large cleaning tank is used. Since the electrostatic charge can be prevented by using the ionizer, it is possible to prevent the foreign matter once removed from adhering again. Since the non-contact transfer method such as Bernoulli chuck method is adopted, double-sided cleaning is easy, and since the transfer device does not touch the cleaning surface, the cleaning surface can be kept clean.

  Further, according to the present invention, various cleaning liquids can be used, and various foreign substances can be removed from inorganic substances to organic substances. Since a large cleaning tank is not used, the power of the ultrasonic oscillator to be used can be reduced. Since unnecessary force is not applied to the object to be cleaned, there is an effect such that destruction of the object to be cleaned can be prevented. By instructing the cleaning position from the computer, the cleaning speed can be increased because only the necessary place can be cleaned.

  According to the present invention, in contrast to the conventional liquid cleaning method requiring a large cleaning tank, local cleaning of the object to be cleaned (substrate etc.) is performed using a local liquid immersion technique, and the inside of the transfer system It has been realized that it can be stored in a compact size that can be incorporated into the container, and that the cleaning that has conventionally been performed in the cleaning tank can be easily performed in the atmosphere, such as during transportation.

  FIG. 1 shows a block diagram of one embodiment of the present invention.

  (A) of FIG. 1 shows the side view represented typically, and (b) of FIG. 1 shows the bottom view represented typically.

  In FIG. 1, an object to be cleaned 1 is a substrate to be cleaned with a cleaning solution, for example, a substrate such as a wafer or a glass substrate, and although the surface is flat or flat, the surface is exposed and developed in the previous process It is a substrate after being formed and a minute pattern is formed, and it is a substrate on which foreign matter is present on the surface due to processing or the like and which is to be cleaned with a cleaning liquid.

  The cleaning head 2 is a head composed of a suction hole 3, a jet hole 4, a cover 5 having a sealing property, and the like, and is held by the body 1 in a non-contact state (described later) It is for cleaning the to-be-cleaned body 1 which the washing | cleaning liquid spouts from the spout hole 4 corresponding to having been vacuum-suctioned from the hole 3, and it faces and has arrange | positioned.

  The suction holes 3 are used to vacuum suction the cleaning liquid by the vacuum pump 11.

  The spouting holes 4 spout toward the to-be-cleaned body 1 disposed facing the cleaning liquid in response to vacuum suction from the suction holes 3.

  The cover 5 constitutes the cleaning head 2 and covers the suction holes 3 and the jet holes 4 and holds the distance between the cleaning head 2 and the cleaning object 1 at a constant distance in a non-contacting manner according to the Bernoulli principle. (To be described later). The cover 5 has a sealing property so that the cleaning solution can be contained in the cleaning head 2 and not splashed out.

  The support means 6 is for holding (fixing) the cleaning head 2 at a predetermined position in the air (for example, a leg).

  The transport system 7 fixes the cleaning head 2 and transports the body 1 without contact (to be described later). Conversely, the cleaning object 1 may be fixed, and the cleaning head 2 may be transported to the object 1 without contact.

  The vacuum pump 11 is an evacuation system that evacuates the suction hole 3 and is a pump that evacuates liquid (various cleaning liquids) and gas (air, etc.).

  The filter 12 is for removing foreign substances in the washing liquid evacuated by the vacuum pump 11 and recirculating the washing liquid after the foreign substance removal. This makes it possible to reuse the cleaning solution to reduce the amount of the cleaning solution to the necessary minimum.

  The pipe 13 is a pipe that connects the vacuum pump 11, the filter 12, and the like. Although not shown, various valves, flow control valves, etc. may be arranged as necessary.

  Next, the configuration of FIG. 1 and its operation will be described.

  (1) FIG. 1 shows a filter 12 for removing foreign substances contained in the cleaning liquid, a liquid ejection hole 4 for supplying the cleaning liquid having passed through the filter 12 to the surface of the object to be cleaned, a liquid ejection port for recovering the cleaning liquid The suction hole 3 provided so as to surround the peripheral portion, and the vacuum pump 11 for strongly suctioning the cleaning solution from the suction hole 3 are formed. The above components form an ad hoc flow path integrally with the cleaning object 1 . In particular, the whole of the cleaning head 2 disposed in the vicinity of the cleaning object 1 is supported in the air by a support extending from a floor or the like or an existing device. It has a means to adjust so that the space | interval of the washing | cleaning head 2 and the to-be-cleaned body 1 may become optimal (refer the adjustment means using the Bernoulli principle mentioned later).

  (2) The to-be-cleaned body 1 is disposed in the vicinity of the cleaning head 2 to form an ad-hoc flow channel, and the cleaning liquid is spouted from the spouting hole 4 by vacuum suction from the suction hole 3 by the vacuum pump 11. The cleaning liquid is applied to the surface of the body 1 to be cleaned while covering the surface of the body 1 in a film shape by the action of surface tension, and then all is recovered from the suction holes 3. In this way, it is possible to supply the liquid cleaning liquid only to the local surface of the cleaning target 1 requiring cleaning while in the air, and after cleaning, the cleaning liquid can be cleaned. It is possible not to remain in 1.

  (3) The cleaning solution is pure water used in ordinary liquid cleaning, ozone water, redox water, functional water, hydrogen peroxide water, alcohol, organic solvents such as benzene, toluene, xylene, acid, aqueous alkali solution, liquid dioxide Superfluid liquids such as carbon, or aqueous solutions in which carbon dioxide is dissolved, ammonia water in which ammonia gas is dissolved, inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, quaternary ammonium aqueous solutions such as TMAH, organic acids, or aqua regia, RCA, piranha A mixed acid such as a cleaning solution, an alkali such as hydrofluoric acid or alkali hydroxide can be used. If necessary, surfactants, chelating agents, pH adjusters, viscosity adjusters and the like can also be contained. By optimizing the viscosity or surface tension of the cleaning solution, the cleaning solution residue can be reduced to the minimum of the cleaning solution residue.

  (4) A gas may be blown into the aqueous solution (washing solution) and bubbling may be performed so as to generate micro bubbles. Microbubbles of ozone may be used to remove the organic matter on the object 1 to be cleaned. Liquid heating or cooling may be used to adjust the reaction rate to a desired rate. The liquid may be cooled to an aerosol state to be semisolid. A two-fluid jet method may be used in which water or water vapor is irradiated to the object to be cleaned at supersonic velocity.

  (5) In addition, washing can be performed by combining washing solutions. When one cleaning head 2 is used, different cleaning solutions can be used in time division. For example, the organic cleaning is performed first, and then the pure water cleaning is performed. These can be realized by preparing cleaning solutions in separate containers in advance and switching the piping (flow path) 13 not shown using a solenoid valve according to a command from a computer.

  (6) As another method, a plurality of independent cleaning heads 2 are prepared, and different cleaning solutions are supplied to each of them, and a command is given from a computer so that they are processed in that order It can be realized by For example, the first cleaning head 2 may be cleaned with an organic solvent, and thereafter another pure water cleaning may be performed with another cleaning head 2, and a method of finally drying can be realized. The multiple cleaning solutions used are collected from separate inlets so that they do not mix.

  (7) The cleaning solution may be disposable, and the filter 12 or a chemical reaction suitable for removing foreign matter dissolved in the cleaning solution or a chemical reaction, a circulation path including a physical reaction chamber may be provided to remove foreign matter or dissolved matter. It can be removed and used over and over again. Of course, it is desirable to attach a dirt sensor, a pH sensor, and a conductivity sensor to check whether the cleaning solution is in a normal state. The output value of the sensor is compared with the normal value, and if the sensor indicates an abnormal value, replace it with a new cleaning solution.

  (8) An electrolysis chamber for producing functional water or an electromagnetic wave irradiation device may be included in the flow path. A control mechanism of zeta potential can also be included. By using the present invention, it is possible to take measures necessary to prepare a surface condition suitable for the following process conventionally performed in a water tank in the atmosphere.

  (9) The surface of the cleaning head 2 forming the ad hoc flow path is a water repellent material such as Teflon (registered trademark) or the contact angle exceeds 150 degrees so that no liquid remains on the surface of the object 1 after cleaning. It is desirable to be composed of a saturated fluoroalkyl group (especially trifluoromethyl group CF3−) alkylsilyl group fluorosilyl group long chain alkyl group etc., which are such super water repellent materials. The surface may be finely processed like insect wings to have super water repellency such as Lotus effect. A porous material having nanopores called a porous metal complex may be used. The self-cleaning effect of the super water repellent material can also keep the cleaning head itself clean at all times. By making the inside of the cleaning solution spout hole 4 hydrophilic, the cleaning head can hold the cleaning solution in the cleaning head 2 even when the suction force of the vacuum pump does not work, so that the cleaning solution does not drip down when there is no object to be cleaned 2 .

  (11) A sensor for checking the presence or absence of the object to be cleaned 1 is provided, and only when the object to be cleaned 1 is used in the apparatus of FIG. In fact, the cleaning solution is guided to the cleaning object 1 by drawing a vacuum on the side of the suction hole 3 around the ejection hole 4 without applying a large pressure to the side to supply the cleaning solution. That is, vacuum suction works on the cleaning liquid only when the ad-hoc flow channel is established when the suction hole 3, the cleaning liquid spouting hole 4 and the cover 5 are spaced from the to-be-cleaned body 1. It spouts from. This automatically prevents accidental cleaning solution leakage.

  (12) The to-be-cleaned body 1 is moved by moving the to-be-cleaned body 1 sequentially (right and left or up and down movement) by the conveyance means (conveyance system 7) such as a roller in a state where the cleaning liquid is supplied to the The surface of the can be cleaned. It is desirable to use the transport system moving speed at such a speed or less that the liquid is contained in the washing head 2 due to the surface tension of the washing fluid and does not move while adhering to the body 1 (see FIG. 11 and ). Of course, the cleaning head 2 may be moved conversely.

  (13) The transport system 7 does not have to be a roller, and it is better to use a non-contact transport system having a Bernoulli effect so that dirt does not transfer from the transport system 7 to the object 1 to be cleaned. Since the cleaning head 2 operates in any direction in the space, the transport system 7 may be freely disposed not only horizontally but also obliquely or vertically. In particular, when the object to be cleaned is held vertically for cleaning, the cleaning liquid can be removed from the object to be cleaned very cleanly by surface tension.

  This will be sequentially described in detail with reference to FIG. 2 to FIG.

  FIG. 2 shows a detailed block diagram of the present invention. FIG. 2 is an enlarged view of the ad-hoc flow path formed between the cleaning head 2 and the cleaning object 1 of FIG. Since 1, 2, 3 and 4 in the figure are the same as those of the same numbers in FIG. 1, the description will be omitted.

  In FIG. 2, OUT indicates a state of vacuum suction by the vacuum pump 11.

  IN shows how the cleaning liquid is jetted toward the object to be cleaned 1 in response to vacuum suction from OUT by the vacuum pump 11.

  The state in which the inner side including the cleaning solution suction hole 3 and the cleaning solution ejection hole 4 is subjected to the hydrophilic treatment 14 is schematically shown.

  The portion surrounding the peripheral portion of the ejection hole 4 so as to prevent leakage of the cleaning liquid is made water repellant 14 in a portion that is made airtight, and the cleaning liquid suction hole 3 and the cleaning liquid ejection hole 4 are made hydrophilic.

  If it does in this way, as shown in figure, surface tension will keep a washing solution inside and can prevent it flowing out outside.

  Next, the configuration of FIG. 2 and its operation will be described.

  (1) The cleaning head 2 has two horizontal surfaces different in distance from the object 1 to be cleaned, and forms a first gap 16 and a second gap 17, respectively.

  (2) The suction liquid is jetted (supplied) to the surface of the body 1 by suction from the washing liquid suction hole 3 provided around the washing liquid injection hole 4 at the center of the washing head 2 by the vacuum pump 11. The second gap 17 in which the cleaning solution is accumulated is slightly deeper than the first gap 16 in the peripheral portion so that the cleaning solution does not splash out of the cleaning head 2, and the cleaning solution is drawn back to the center by surface tension. So that the cleaning solution does not spill out. It is even better if the inner region of the second gap 17 is hydrophilic 14. In this way, it is possible to prevent the liquid from dripping when the to-be-cleaned body 1 disappears. The distance between the object to be cleaned 1 and the surface of the cleaning head 2 is between a few microns and a few mm, and the cleaning head 2 is held non-contact by the object to be cleaned 1. The distance between the cleaning head 2 and the to-be-cleaned body 1 is automatically adjusted so as to optimize the cleaning solution circulation and the cleaning effect.

  FIG. 3 shows a detailed configuration diagram (part 2) of the present invention.

  (A) of FIG. 3 shows a side view, and (b) of FIG. 3 shows a bottom view. Since 1, 2, 3, 4, OUT and IN in FIG. 3 are the same as those in FIGS. 1 and 2 with the same numbers and symbols, the description will be omitted.

  In FIG. 3, a laser beam 18 is a laser beam irradiated to the cleaning solution.

  The piezo jet 19 is a cleaning solution injected by vacuum suction while being atomized by using a piezoelectric element (not shown).

  Next, the configuration of FIG. 3 and its operation will be described.

  (1) As shown in FIG. 3, the piezoelectric element is used to supply the cleaning liquid, and the surface of the cleaning object 1 is very fast, for example, picoliter to microliter used for the ink jet printer. The liquid can be jetted to wash the liquid, and can be evacuated and suctioned to remove the liquid washing. Similar to the printer, the amount and location of the cleaning liquid are recorded in advance on a computer, and based on the information, the piezoelectric element is driven to eject the cleaning liquid to clean only the local part and to evacuate it. By removing the solution, it is possible to perform the solution cleaning of only an arbitrary pattern. In other words, it is possible to specify the cleaning position on the object to be cleaned 1 which is not in the conventional concept of liquid cleaning, and only the very small local part is liquid-cleaned to realize the removal of the cleaning liquid by vacuum evacuation.

  (2) Therefore, if a dirty place is known in advance by an inspection device or the like, it is possible to locally wash only the place and remove the cleaning fluid by specifying the place. It becomes. As a result, the amount of cleaning solution used can be reduced, and the load for suctioning the solution in vacuum can be reduced. When it is washed in a large amount of liquid, it may be destroyed by surface tension. However, in this method, since the amount of liquid adhesion is very small, there is also an effect that destruction of the body 1 to be cleaned can be prevented. Since the cleaning liquid does not touch a place where cleaning is not necessary, it is possible to prevent the body 1 from being hurt.

  (2) Similarly, a bubble jet (registered trademark) mechanism using heat may be used as the cleaning solution ejection principle.

  (3) In order to enhance the local cleaning effect, as shown in the figure, the place where the cleaning solution contacts the object 1 is a transparent member, and only the designated part of the object 1 is irradiated with the laser beam 18 or the like. The cleaning solution may be heated to a desired temperature. Since the washing is a chemical reaction, the washing speed is approximately doubled whenever the temperature rises by 10 degrees. Light of a specific wavelength may be applied to promote the cleaning reaction. Alternatively, instead of heat, light of a wavelength that accelerates a photochemical reaction may be applied.

  FIG. 4 shows a detailed block diagram (No. 3) of the present invention.

  (A) of FIG. 4 shows a side view, and (b) of FIG. 4 shows a bottom view. Since 1, 2, 3, 4, OUT and IN in FIG. 3 are the same as those of the same numbers and symbols in FIG. 1, FIG. 2 and FIG.

  In FIG. 4, the ultrasonic transducer 20 is for applying ultrasonic vibration to the cleaning liquid jetted to the object to be cleaned 1 to enhance the cleaning power, and in the figure, the lower side and the upper side of the object to be cleaned 1 are shown. It is provided on both sides. Only the upper side or the lower side may be used.

  Next, the configuration and operation of FIG. 4 will be described.

  (1) FIG. 4 shows a configuration example of performing ultrasonic cleaning in a liquid immersion state. As ultrasonic cleaning is known for cleaning mechanical watches (movements), glasses, etc., foreign substances adhering to the object to be cleaned 1 are removed (released) in the cleaning solution by applying strong ultrasonic vibration. It is a method.

  (2) In the present invention, since the liquid (washing liquid) directly contacts the body 1 in the form of a film while in the air, the ultrasonic wave easily reaches the body 1 to be cleaned, and the cleaning is very efficient. It can be done. The frequency of the ultrasonic wave can be selected optimally depending on the cleaning purpose. For example, if oil contamination is the purpose, a frequency of several tens of kilohertz (28 KHz) where cavitation is likely to occur is selected, and if damage is a problem, cleaning is performed using a frequency of 100 KHz or higher. This frequency is suitable for cleaning a glass substrate or a silicon substrate without a pattern. In order to remove submicron foreign matter, foreign matter can be efficiently removed by using ultrasonic waves in the megasonic region of 1 MHz or more. Suitable for cleaning glass masks.

  (3) In the present invention, since the cleaning liquid is in the form of a film on the surface of the body 1 to be cleaned, the energy of the ultrasonic waves is effectively applied only to the foreign matter on the surface. Therefore, even when the object 1 to be cleaned is subjected to fine processing such as a photoresist having a high aspect ratio, the cleaning can be performed without destroying it. In particular, in the case where the cleaning liquid is locally injected to the body 1 to be cleaned, the effect is remarkable.

  (4) The frequency of the sound wave used for ultrasonic cleaning is desirably changed with the passage of time in order to prevent uneven cleaning. By changing the frequency, it is possible to move the place where the cleaning effect is the highest, and uniform cleaning can be performed. The applied power (for example, several tens of watts to several hundreds of watts) is experimentally determined and adjusted so that the best result can be obtained by the durability of the object to be cleaned 1 and the adhesion of foreign matter. Unlike ultrasonic cleaning in the conventional cleaning tank, the ultrasonic transducer 20 can be disposed directly at a position several mm near the surface of the object to be cleaned 1 to apply ultrasonic waves, so more direct ultrasonic waves can be generated. Application is possible, energy saving and improvement of cleaning power can be realized.

  FIG. 5 shows a detailed block diagram (No. 4) of the present invention.

  (A) of FIG. 5 shows a side view, (b) of FIG. 5 shows a bottom view, and (c) of FIG. 5 shows a top view (portion). Since 1, 2, 3, 4, 20, OUT, and IN in FIG. 5 are the same as those in FIGS. 1, 2, 3, and 4 with the same numbers and symbols, the description will be omitted.

  In FIG. 5, the gas jet nozzle 21 obliquely jets the gas ionized by the ionizer 212 (or the gas not ionized) to the object 1 to form an air knife as shown in FIG. (1) A mouth for spouting a gas (gas) for blowing off and drying the cleaning liquid on the upper side so that no residue remains.

  The gas source 211 is, for example, a cylinder storing a gas to be injected.

  The ionizer 212 is for ionizing the gas taken in from the gas source 211.

  Next, the configuration and operation of FIG. 5 will be described.

  (1) FIG. 5 shows a configuration example in which a gas spout 21 is provided on the periphery of the cleaning head 2 in order to dry the surface of the object to be cleaned 1 after cleaning. An appropriate pressure and flow rate or temperature is used for the gas jet 21 to completely blow off or / and dry the liquid (cleaning liquid) used in the cleaning. Thereby, the to-be-cleaned body 1 is completely dried and a washing | cleaning liquid does not remain. Hot air may be used, or in order to prevent the reattachment of foreign matter, the surface of the object 1 may be prevented from being charged by spraying ion gas generated by the ionizer 212.

  (2) The gas jet port 21 is arranged to form an air curtain around the entire apparatus so that the gas hits the boundary between the cleaning liquid and the atmosphere. The washing apparatus does not necessarily move in only one direction, and in some cases, may freely move in the left and right direction and the up and down direction. If the gas injection port 21 is disposed as in the present invention, the cleaning liquid can be reliably removed from the surface of the object 1 to be cleaned regardless of the movement to whichever. The gas used for the gas shower spouted from the gas injection port 21 may be air or dry nitrogen. In the case where the object 1 to be cleaned is altered by applying heat, an inert gas can also be used (if necessary, the gas source 211 is prepared).

  (3) A high power laser beam such as infrared rays may be applied to the surface of the to-be-cleaned body 1 after cleaning to raise the surface temperature of the to-be-cleaned body 1 to dry the cleaning solution.

  FIG. 6 shows a detailed block diagram (No. 5) of the present invention.

  (A) of FIG. 6 shows a side view, and (b) of FIG. 6 shows a bottom view. Since 1, 2, 3, 4, 21 and OUT, IN in FIG. 6 are the same as those in FIGS. 1, 2, 3, 4 and 5, the description will be omitted. FIG. 6 shows an example in which the area of the object to be cleaned 1 is large, and the cleaning heads 2 are arrayed correspondingly.

  In FIG. 6, the arraying of the cleaning head 2 shows an example in which a plurality of cleaning solution injection holes 4 are provided as shown, and the cleaning solution suction holes 3 are provided outside the cleaning solution injection holes 4 so as to surround the cleaning solution injection holes 4.

  Next, the configuration and operation of FIG. 6 will be described.

  (1) FIG. 6 shows an example of a configuration for cleaning a wide-area to-be-cleaned body 1. In order to correspond to the large area of the to-be-cleaned body 1, it is desirable to arrange the cleaning heads 2 in parallel in a staggered pattern or to form an array.

  (2) In FIG. 6, 6 shows an example in which three liquid jet holes 4 are provided in one cleaning head 2. The arraying is performed considering that the liquid injection holes 4 and the suction holes 3 are a pair. The cleaning head 2 has a mechanism in which the cleaning liquid is jetted from the cleaning liquid spouting hole 4 toward the body to be cleaned 1 by strongly sucking the liquid (cleaning liquid) from the cleaning liquid suction hole 3. In order to keep the jet output of the liquid constant regardless of the location even if the area of the cleaning object 1 to be cleaned becomes wider, the liquid injection hole 4 is better than having the liquid suction hole 3 in the entire peripheral part of the cleaning head 2 It is advantageous to set it near the In FIG. 6, the liquid suction holes 3 are provided around the respective liquid injection holes 4 so that stable large suction of the cleaning liquid can be realized.

  (3) The gas injection port 21 for drying the object 1 to be cleaned can be installed freely by setting the gap wide so that there is no pressure exchange with the cleaning liquid 1 and the air flow is directed outward. , Provided around the cleaning head 2 so as to surround the cleaning solution area. By providing the cleaning head 2 so as to go around the periphery of the cleaning head 2, when the object 1 to be cleaned moves away from the cleaning head 2, the gas is sprayed and sufficient drying is performed. There is also the effect of an air curtain, and the cleaning solution is properly separated in the gas region. If it is desired to increase the area that can be cleaned more once, this can be realized by increasing the number of pairs of liquid jet holes 4 and suction holes 3. Of course, it is sufficient to cover a large area by arranging the small cleaning heads 2 in a zigzag manner so that there is no washout in the transport direction.

  FIG. 7 shows a detailed configuration diagram (part 6) of the present invention.

  (A) of FIG. 7 shows a side view, and (b) of FIG. 7 shows a bottom view. Since 1, 2, 3, 4, 21 and OUT, IN in FIG. 7 are the same as those in FIG. 1, FIG. 2, FIG. 3, FIG. I omit it. FIG. 7 shows an example in which the object to be cleaned 1 is simultaneously subjected to liquid cleaning from both sides.

  In FIG. 7, two sets are provided on the upper and lower sides of the cleaning head 2 in FIG. 7, and the upper surface and the lower surface of the object to be cleaned 1 are simultaneously subjected to liquid cleaning.

  Next, the configuration and operation of FIG. 7 will be described.

  (1) FIG. 7 shows an example in which the to-be-cleaned body 1 is sandwiched from both upper and lower sides and simultaneously cleaned on both sides.

  (2) The object to be cleaned 1 is not only used on one side as in a normal semiconductor substrate, but is also available on both sides like a wafer for micromachining. Since some glass for liquid crystal is used on both sides, it is desirable that both sides of the substrate (to-be-cleaned body 1) can be cleaned simultaneously. In FIG. 7, the cleaning heads 2 are disposed at the top and the bottom as shown in FIG.

  (3) When the to-be-cleaned body 1 is vertically symmetrically sandwiched from both sides, the surface tension of the cleaning liquid is evenly applied to both sides of the to-be-cleaned body 1. It just comes to the center. In this case, since the transfer system (the illustrated Bernoulli transfer robot 22) floats in the air, the transfer system can move the cleaning object 1 with a very small force. It is very easy to use in the Bernoulli chuck method or the like used in the illustrated Bernoulli transport robot 22. In this way, the object to be cleaned 1 can be held and moved while being cleaned because it is not in contact with anywhere.

  (4) The same mechanism can be used to clean the side of the body 1 to be cleaned. When it is desired to simultaneously clean the side surfaces, this can be realized by simultaneously applying four sets of cleaning heads 2 from the four directions, up, down, left, and right, to the body 1 to be cleaned. When only the side surface is to be cleaned, this can be realized by providing the cleaning head 2 only on the side surface.

  FIG. 8 shows a detailed configuration diagram (part 7) of the present invention.

  (A) of FIG. 8 shows a side view, and (b) of FIG. 8 shows a bottom view. 1, 2, 3, 4 and 21 in FIG. 8 are the same as those in FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 4, FIG. Do. FIG. 8 shows a Bernoulli linear transfer robot 24 provided with a Bernoulli chuck 23 and a translational movement device such as a linear motor, on which the object to be cleaned 1 is placed.

  In FIG. 8, a Bernoulli linear transfer robot 24 is composed of a linear transfer mechanism and a Bernoulli chuck 23, and transfers the object to be cleaned 1 (transfers right or left in FIG. 8) without contact.

  As will be described later with reference to FIG. 9, the Bernoulli chuck 23 sprays a gas toward the contact object 1 and the gas injection flow of the gas at that time holds the gas injection port and the contact object 1 at a certain distance. A chuck using Bernoulli's principle (known).

  Next, the configuration and operation of FIG. 8 will be described.

  (1) In FIG. 8, a Bernoulli chuck 23 is attached to a translational movement device (known) such as a linear motor, and an object to be cleaned 1 is placed thereon. When the hand of the robot 22 shown in FIG. 7 described above is used as the transfer means, it can be easily transferred when the cleaning target 1 is small or when the transfer distance is short. However, when the to-be-cleaned body 1 becomes large, the hand of the robot 22 with a large stroke is required, and the apparatus becomes very large in order to maintain the mechanical strength of the hand. In FIG. 8, the Bernoulli chuck 23 is mounted on a transfer device such as a linear motor capable of translational movement, and the object to be cleaned 1 is placed thereon, so even in the case of the very large object to be cleaned 1, Translational transport can be easily performed while keeping the gap accurate.

  FIG. 9 shows a detailed block diagram (No. 8) of the present invention. FIG. 9 shows an example of a noncontact transfer system.

  In FIG. 9, the Bernoulli chuck 23 injects high-pressure gas, which has received the gas supply 27 from a nozzle not shown, and holds or conveys the to-be-cleaned body 1 placed in a non-contacting manner. is there.

  The switching valve 25 supplies the high pressure gas supplied from the gas supply 27 to the Bernoulli chuck 23 instructed from the computer 26.

  The computer 26 supplies the high pressure gas from the gas supply 27 in a predetermined order by controlling the switching valve 25 to ON or OFF when transporting the cleaning object 1, etc., and transfers the cleaning object 1, etc. It is

  Next, the configuration and operation of FIG. 9 will be described.

  (1) FIG. 9 shows a configuration example of a noncontact transfer system using a Bernoulli chuck. As shown, a lot of small Bernoulli chucks 23 are laid out in the same plane so that each Bernoulli chuck 23 can operate at an arbitrary timing and position. In this state, Bernoulli gas ejection is started from the nozzle in order from the direction in which the body to be cleaned 1 is being transported, and the switching valve 25 is controlled by the computer 26 so that the place where the body to be cleaned 1 passes is turned off. In this case, the Bernoulli chuck 23 is not in contact with the non-contacting position because the position at which the force of the to-be-cleaned body 1 captured by the Bernoulli effect is most strongly deviates and the to-be-cleaned body 1 moves accordingly. The object to be cleaned 1 can be transported by the

  (2) In addition, compressed air can be blown out from the porous holes to form a fluid film on the surface of the body 1 to be cleaned, and an air bearing technique or the like can be used to support and carry the flat plate in the air. It is needless to say that the gas used for these should be free of dust through HEPA or ULPA filters and the like. Also, it goes without saying that charge control is performed by an ionizer or the like so that they themselves do not cause static electricity. The former is an example of making a static fluid film, but there is also a method of dynamically making a fluid film on the surface of the body to be cleaned 1 using ultrasonic waves and transporting it. There is also a method of conveying using a swirl flow or a cyclone, which can also be used as a non-contact moving means.

  FIG. 10 shows a detailed block diagram (No. 9) of the present invention.

  (A) of FIG. 10 shows a schematic view of the chuck 23, (b) of FIG. 10 schematically shows the relationship between the wafer (cleaned body) 1 and the chuck 23, and (c) of FIG. The relationship between the pad 28 and the wafer (the body to be cleaned) 1 is shown in a schematic view.

  As shown in FIG. 10, when the Bernoulli chuck 23 described above ejects high pressure air from the nozzles of the pad 28 toward the wafer (object to be cleaned) 1 as shown in the drawing, the injection ports and the wafer (object to be cleaned) 1 The present invention is based on Bernoulli's principle, which holds the distance between the above and the like constant, and can be realized specifically by the configuration as illustrated.

  Next, in accordance with vacuum suction of the cleaning liquid from the suction hole 3 using FIGS. 11 to 14, the cleaning liquid ejected from the ejection hole 4 is jetted to the object 1 to be cleaned, and then the object to be cleaned The configuration and operation when removing (drying) the cleaning liquid on 1 will be described in detail.

  FIG. 11 is a flowchart (part 1) for explaining the operation of the present invention.

  In FIG. 11, S1 measures the height of the liquid. This measures, for example, the height of the liquid level 31 of FIG. In the example of FIG. 2, since the transport direction is from right to left, the height of the liquid level at the rear end on the left side (the cleaning head 1 on the liquid level between the cleaning head 2 and the cleaning target 1 shown) Measure the height from the left tip of the

  S2 adjusts the ejection pressure or the moving speed of the object 1 to be cleaned.

  It is determined whether S3 is within the range. If yes, exit. In the case of NO, S1 and subsequent steps are repeated.

  From the above, for example, when the to-be-cleaned body 1 of FIG. 2 is conveyed in the right direction, the height from the rear end of the cleaning head 2 to the liquid level 31 is measured (S1), and the appropriate height determined in the experiment 5 (YES in S3), the jet pressure (jet pressure of the gas jet nozzle 21 in FIG. 5) or the moving speed of the body 1 to be cleaned (moving speed of the body 1 to be cleaned in FIGS. 2 and 5) ) Is adjusted (S2). Thereby, the speed (or the pressure of the gas jet nozzle 21) for moving the body 1 to the right in FIG. 2, FIG. 5, etc. is appropriately adjusted, and the liquid level 31 by surface tension is automatically adjusted to an appropriate range. The entire cleaning fluid after cleaning is vacuum-suctioned from the suction holes 3 to prevent the cleaning fluid after cleaning from remaining on the body 1 to be cleaned, thereby preventing the occurrence of uneven drying and the like.

  FIG. 12 shows a flowchart (part 2) for explaining the operation of the present invention.

  In FIG. 12, S11 blows from a predetermined angle.

  S12 moves the blow position to blow uniformly.

  In step S13, it is determined whether blow is uniform. In the case of YES, the process proceeds to S14. In the case of NO, the process returns to S12 and is repeated.

  S14 moves a board (to-be-cleaned body 1).

  For example, as shown in (c) of FIG. 5 described above, a gas is jetted from the gas jet nozzle 21 toward the object to be cleaned 1 in an oblique direction to blow away the cleaning solution and dry it (S11). Then, the gas jet nozzle 21 is shaken to blow the object 1 uniformly, and the cleaning liquid on the object 1 is blown off and dried uniformly (S12). If blow is uniformly performed on the cleaning target 1 (YES in S13), the cleaning target (plate) is moved to the next position (S14).

  As described above, as shown in FIG. 5, after the cleaning liquid is sprayed from the cleaning head 2 to the object to be cleaned 1 for cleaning, the gas is sprayed from the gas injection port 21 and the injection position is moved and blown to blow away the cleaning liquid. At the same time, the object to be cleaned 1 can be cleanly dried leaving a residue.

  FIG. 13 shows a flowchart (part 3) for explaining the operation of the present invention.

  In FIG. 13, S21 scatters with a mop and a brush.

  S22 determines whether it has become clean. In the case of YES, the process proceeds to S23. In the case of NO, the process returns to S21 and is repeated.

  S23 moves the body to be cleaned.

  From the above, for example, when the to-be-cleaned body 1 of FIG. 1 is transported in the right direction, the remaining cleaning liquid is wiped off by a mop or brush not shown at the rear end portion after cleaning on the right side of the cleaning head 2 At the same time, it sprays a gas (not shown) and dries it while scattering, and a fine particle detection mechanism (for example, a weak laser beam is irradiated on the object to be cleaned 1 not shown) When it is determined by the mechanism that determines whether the inside is clean or not, and it is determined that the inside of the predetermined range is in the clean state, the plate (to-be-cleaned body 1) is transported to the next position. The situation in which the cleaning liquid after cleaning remains on the body to be cleaned 1 can be reduced, and the occurrence of uneven drying can be prevented.

  FIG. 14 shows a block diagram of another embodiment of the present invention. In FIG. 14, the cover 5 of the cleaning head 2 described above with reference to FIGS. 1 to 8 is hemispherical or semi-cylindrical, and a plurality of vacuum pumps 11 are used to evacuate the suction holes 3. The cleaning solution (cleaning solution or steam 8 or a mixture of both) is sprayed from different angles from the jet nozzle (spray hole) 4 to the object to be cleaned 1 to ensure that foreign substances on the surface of the object to be cleaned 1 having irregularities are An example is shown for removal. For the vapor, isopropyl alcohol or the like can be used.

FIG. 1 is a structural diagram of one embodiment of the present invention. It is a detailed block diagram of this invention. It is a detailed block diagram (the 2) to this invention. It is a detailed block diagram (the 3) to this invention. It is a detailed block diagram (the 4) to this invention. It is a detailed block diagram (the 5) to this invention. It is a detailed block diagram (the 6) to this invention. It is a detailed block diagram (the 7) to this invention. It is a detailed block diagram (the 2) to this invention. It is a detailed block diagram (the 2) to this invention. It is operation | movement explanatory flowchart (the 1) to this invention. It is operation | movement explanatory flowchart (the 2) to this invention. It is operation | movement explanatory flowchart (the 3) to this invention. It is a block diagram of another Example to this invention.

1: Washed body 2: Wash head 3: Suction hole, washing solution suction hole 4: spout hole, washing solution spout hole 5: cover 6: support means 7: transport system 11: vacuum pump 12: filter 13: piping 14: hydrophilic 15: water repellent 16: first gap 17: second gap 18: laser beam 19: piezo jet 20: ultrasonic transducer 21: gas jet nozzle 211: gas source 212: ionizer 22: Bernoulli transport robot 23: Bernoulli chuck 24: Bernoulli linear transfer robot 25: switching valve 26: computer 27: gas supply 28: pad 31: liquid level 32: cleaning liquid or vapor

Claims (14)

In a foreign matter removing apparatus for washing foreign matter on a body to be washed with a washing liquid,
A jetted hole for jetting a cleaning liquid at the time of cleaning, a suction hole formed so as to surround the jetted hole for vacuum suction of the periphery of the jetted hole, the jetted hole and the suctioned hole surrounding the jetted hole and the cleaning object A closed space consisting of a body and a cover having a narrow gap in which the cleaning solution does not leak to the outside of the closed space, or in which gas does not flow from the outside, or which reduces leakage and inflow Having a cleaning head,
A vacuum exhaust system for spouting the cleaning liquid from the spout hole into the closed space by drawing the suction liquid in the closed space from the suction hole forming the cleaning head and drawing it into a vacuum during the cleaning;
And an interval adjusting means for holding the distance between the cleaning head and the object at a constant interval,
During the cleaning, the inside of the closed space is drawn from the suction hole in a vacuum by the vacuum evacuation system and suctioned, and the cleaning liquid ejected from the ejection hole into the closed space of the negative pressure is jetted to the object to be cleaned. A foreign matter removing device for a body to be cleaned, which cleans the foreign matter on the body to be cleaned, discharges the cleaning liquid after the washing to the outside from the suction hole, and cleans the body to be cleaned.   The first gap between the suction hole and the object to be cleaned is smaller than the second gap between the ejection hole provided inside the suction hole and the wire-like member to enhance airtightness, 2. The foreign matter removing device for the object to be cleaned according to claim 1, wherein the cleaning solution is efficiently ejected from the ejection holes toward the filament.   The filter according to any one of claims 1 to 2, further comprising: a filter that removes foreign matter in the cleaning solution sucked from the suction hole and ejects the cleaning solution from which the foreign matter has been removed from the ejection hole. Foreign body removal device for cleaning body.   In order to adjust the distance between the cleaning head and the to-be-cleaned body constant as the interval adjusting means, a gas is jetted toward the to-be-cleaned body from an outer peripheral portion of a cover constituting the cleaning head 4. The foreign matter removing device for the object to be cleaned according to any one of claims 1 to 3, wherein the distance between the outer peripheral portion of the cover and the object to be cleaned is adjusted to be constant.   The object to be cleaned according to claim 4, wherein the distance between the outer peripheral portion of the cover and the object to be cleaned is kept constant and, at the same time, the cleaning liquid on the object to be cleaned is dried by the jetted gas. Foreign material removal device.   The foreign matter removing apparatus for a cleaning object according to any one of claims 1 to 5, wherein the entire cleaning object or a designated range is cleaned.   The apparatus for removing foreign matter to be cleaned according to any one of claims 1 to 6, wherein the cleaning liquid is a liquid cleaning liquid containing water, an organic solvent, and an inorganic solvent as a solvent.   The foreign matter removing device for an object to be cleaned according to any one of claims 1 to 7, wherein the ejection hole is provided in a central portion of the cover and the suction hole is provided so as to surround the outside thereof.   9. The foreign matter removing method according to any one of claims 1 to 8, wherein a tip portion of the jet hole is made hydrophilic and a portion between the suction hole and the outside is made water repellent. apparatus.   10. The foreign matter removing device for an object to be cleaned according to any one of claims 1 to 9, wherein one or more of the jet holes and one or more suction holes are provided around the jet hole.   11. The cleaning action is promoted by irradiating a laser beam or applying an ultrasonic vibration to a portion where a cleaning solution flows from the jet hole toward the suction hole, according to any one of claims 1 to 10, Foreign substance removal device for the body to be cleaned.   12. A gas jet port is provided on an outer peripheral portion of a cover for accommodating the cleaning head or a portion connected to the cover, and the cleaning liquid on the object to be cleaned is blown off and dried. The foreign substance removal apparatus of the to-be-cleaned body of description.   One or more Bernoulli chucks for spouting gas from one or more nozzles toward the body to be cleaned and holding and transporting the body to be cleaned in a non-contact manner according to the Bernoulli principle. The foreign matter removal apparatus for a body to be cleaned according to any one of claims 1 to 11. In a foreign matter removing method for washing foreign matter on a body to be washed with a washing solution,
A jetted hole for jetting a cleaning liquid at the time of cleaning, a suction hole formed so as to surround the jetted hole for vacuum suction of the periphery of the jetted hole, the jetted hole and the suctioned hole surrounding the jetted hole and the cleaning object A closed space consisting of a body and a cover having a narrow gap in which the cleaning solution does not leak to the outside of the closed space, or in which gas does not flow from the outside, or which reduces leakage and inflow Having a cleaning head,
A vacuum exhaust system for spouting the cleaning liquid from the spout hole into the closed space by drawing the suction liquid in the closed space from the suction hole forming the cleaning head and drawing it into a vacuum during the cleaning;
Space adjusting means for holding the distance between the cleaning head and the object to be cleaned at a constant interval;
During the cleaning, the inside of the closed space is drawn from the suction hole in a vacuum by the vacuum evacuation system and suctioned, and the cleaning liquid ejected from the ejection hole into the closed space of the negative pressure is jetted to the object to be cleaned. A method for removing foreign matter from a body to be cleaned comprising: cleaning foreign matter on the body to be cleaned, discharging the cleaned cleaning liquid from the suction hole to the outside, and cleaning the body to be cleaned.