JP2019107613A - Light irradiation device - Google Patents

Abstract

To provide a light irradiation device which can remove electric charges from a processed body even if the processed body is electrified.SOLUTION: A light irradiation device for irradiating an ultraviolet ray to one face of a band-shaped processed body which is transported along a transport path comprises: a lamp house having an opening along a passage plane of the one-face side of the processed body in the transport path; an ultraviolet ray lamp arranged in the lamp house, and extending to a width direction of the processed body; gas supply means for supplying a processing-space gas containing an inactive gas in the lamp house; and a charge removal mechanism arranged in the vicinity of at least either of a carry-in port being the inside of the lamp house, or the outside of the lamp house into which the processed body in the lamp house is carried in, and a carry-out port from which the processed body is carried out, and removing electric charges from the processed body.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a light irradiation apparatus which irradiates ultraviolet light to one surface of a strip-like object to be processed which is conveyed along a conveyance path and performs light cleaning.

  Photoashing of the resist in the manufacturing process of semiconductors, liquid crystals, etc., removal of the resist attached to the pattern surface of the template in the nanoimprint apparatus, or dry cleaning of a glass substrate for liquid crystal, silicon wafer, etc. A light cleaning (dry cleaning) method of irradiating ultraviolet light is known as a cleaning process of a laminated surface of a film.

As a light irradiation device for performing such light cleaning, for example, in Patent Document 1, a glass substrate is irradiated with vacuum ultraviolet light, and the glass substrate is cleaned by the vacuum ultraviolet light and the cleaning action of active oxygen generated by the vacuum ultraviolet light. It is disclosed to remove contaminants on the surface of a substrate.
FIG. 7 is a cross-sectional view in the transport direction of the object to be processed, schematically showing an example of a conventional light irradiation apparatus.
In the light irradiation apparatus, the object to be processed W is carried by the conveyance roller 54 from the carry-in port 58 on the upstream side (right side in FIG. 7) along the conveyance path, and the treatment region from the discharge lamp 51 is irradiated with ultraviolet light. After the ultraviolet rays are irradiated to one surface (upper surface in FIG. 7) of the object to be treated W, the ultraviolet rays are carried out from the outlet 59.
Since vacuum ultraviolet rays have the property of being absorbed by oxygen in the atmosphere and greatly attenuating, conventionally, in such a light irradiation device, nitrogen gas or the like is contained in the lamp house 52 in which the discharge lamp 51 is disposed. An inert gas is supplied from the outside to remove excess oxygen beyond the amount necessary for cleaning in the ultraviolet radiation space between the discharge lamp 51 and the object to be processed to suppress the attenuation of vacuum ultraviolet radiation. ing. The inert gas is, for example, a gas supply pipe provided on the back side (upper surface side in FIG. 7) of the discharge lamp 51 in the lamp house 52 provided on one surface side (upper surface side in FIG. 7) of the object W to be processed. An exhaust space provided mainly on the other surface side (the lower surface side in FIG. 7) of the object to be treated W after being discharged from the gas supply port 56 and replacing particularly the ultraviolet radiation space in the lamp house 52 with an inert gas atmosphere. The gas is discharged from the gas discharge port 57 of the forming member 53.
In FIG. 7, reference numeral 55 denotes a sub-chamber having an exhaust part 55A.

As described above, in the ultraviolet radiation space between the discharge lamp 51 and the object W, an inert gas is externally supplied to remove excess oxygen more than the amount required for cleaning in the ultraviolet radiation space. It has been done. On the other hand, when vacuum ultraviolet rays are irradiated in an atmosphere with an extremely low oxygen concentration, the amount of ozone generation is extremely small, so the activation of the surface of the object to be treated by ozone does not work and the light cleaning effect is reduced. It is known.
In addition, even when the ultraviolet radiation space is excessively replaced by the dried inert gas and vacuum ultraviolet rays are irradiated in an extremely low humidity atmosphere, the generation amount of active species such as hydroxyl radical is extremely small. The cleaning effect on the surface of the treatment body is reduced.

Unexamined-Japanese-Patent No. 2010-75888

In the light irradiation apparatus, the object to be treated is basically in the form of a band, and more specifically, those of various shapes and materials such as plate-like and sheet-like films are subjected to light washing.
The sheet-like film before being subjected to the light cleaning treatment may be, for example, in a form (roll body) taken up in a roll shape, and the film portion carried into the light irradiation device for performing the light cleaning treatment Is separated from the roll body and fed out sequentially. However, when peeled from the roll body, the peeled film portion has the surface of the film portion and the portion in contact with the surface of the film portion before peeling (the back surface of the film constituting the roll body) Between the positive charge and the negative charge. When the object to be treated before being subjected to the light cleaning treatment is of a form in which the surface is covered with a protective sheet, when the protective sheet is peeled off from the object to be treated and carried into the light irradiation device The positive charge and the negative charge are divided and distributed between the surface of the object to be treated and the portion of the protective sheet in contact with the surface of the object to be treated before peeling. Then, when the object to be treated is an insulator, the generated charge remains on the surface of the object to be treated, whereby the object to be treated is charged.
In addition, the interior of the lamp house into which the object to be processed is carried in is filled with the processing space gas containing components such as CDA (Clean Dry Air) and nitrogen gas, whereby the humidity is kept extremely low. . For this reason, in the lamp house, the surface of the object to be treated is easily charged.
When the surface of the object to be treated is charged, dust and dirt easily adhere to the surface of the object to be treated. Then, the dust and dirt adhering to the surface of the object to be treated are decomposed by the irradiation of ultraviolet rays in the light cleaning treatment, which causes a problem that the atmosphere in the lamp house is contaminated more than necessary.
Further, if the object to be treated is carried out from the lamp house while being charged, dust and dirt adhere to the surface of the object to be treated outside the lamp house, and the object to be treated is cleaned in the light cleaning process. There is also a problem that the surface of the metal is recontaminated.

  The present invention has been made based on the above circumstances, and an object thereof is to provide a light irradiation device capable of removing the charge of the object even when the object is charged. It is to do.

The light irradiation apparatus according to the present invention is a light irradiation apparatus that irradiates ultraviolet light to one surface of a strip-like object to be processed which is transported along a transport path,
A lamp house having an opening along a passage plane on one side of the object in the transfer path;
An ultraviolet lamp provided in the lamp house and extending in the width direction of the object;
A gas supply means for supplying a processing space gas containing an inert gas in the lamp house;
It is provided in the inside of the lamp house, or in the vicinity of at least one of an inlet for carrying the object in the lamp house and an outlet for carrying the object out of the lamp house. And a charge removing mechanism for removing the charge of the object to be treated.

  In the light irradiation apparatus of the present invention, the charge removal mechanism may have a charge removal member made of a conductor, and the charge removal member may be disposed in a state of being in proximity to or in contact with the object to be treated.

  In the light irradiation apparatus of the present invention, the charge removal member may be configured to protrude in a state closer to the object than the ultraviolet lamp.

In the light irradiation apparatus of the present invention, the charge removing member is provided adjacent to the ultraviolet lamp inside the lamp house,
The charge removal member has a gas sampling function by having a gas suction hole opened toward the processing area to be irradiated with the ultraviolet light from the ultraviolet lamp in the passage plane on one side of the object to be processed. it can.

  In the light irradiation apparatus according to the present invention, the charge removing member is positioned in a direction away from the gas suction hole in a direction approaching the processing area on the surface facing the processing area to which the ultraviolet light from the ultraviolet lamp is irradiated. It is preferable to have the gas suction hole blockade prevention part which protrudes.

  The light irradiation apparatus of the present invention is provided with a charge removing mechanism for discharging the object to be treated, inside the lamp house or outside the lamp house and in the vicinity of the inlet and / or outlet. Therefore, even when the object to be treated is charged, the object to be treated can be neutralized. As a result, the atmosphere in the lamp house may be contaminated more than necessary due to the decomposition of the dust and the dust adhering to the surface of the object to be treated due to the irradiation of ultraviolet rays, and the object to be treated carried out of the lamp house It is possible to prevent recontamination that dust and dirt adhere to the surface of

It is sectional drawing of the conveyance direction of a to-be-processed object which shows typically an example of the light irradiation apparatus of the 1st Embodiment of this invention. It is sectional drawing of the width direction of a to-be-processed object of the light irradiation apparatus of FIG. It is a perspective view which shows the static elimination member concerning this invention typically. It is a figure which shows typically the static elimination member which has a gas sampling function which concerns on this invention, Comprising: (a) is a side view of the width direction of to-be-processed object, (b) is a side view of the conveyance direction of to-be-processed object. c) is a perspective view. It is a perspective view which shows typically another example of the static elimination member which has a gas sampling function which concerns on this invention. In the light irradiation apparatus of FIG. 1, it is sectional drawing of the conveyance direction of a to-be-processed object which shows the case where a static elimination member moves to the direction which adjoins to-be-processed object. It is sectional drawing of the conveyance direction of a to-be-processed object which shows typically an example of the conventional light irradiation apparatus.

  Hereinafter, embodiments of the present invention will be described.

First Embodiment
FIG. 1 is a cross-sectional view schematically showing an example of a light irradiation apparatus according to a first embodiment of the present invention in the transport direction of an object to be treated. FIG. 2 is a drawing of the light irradiation apparatus of FIG. It is sectional drawing of the width direction of a process body.
The light irradiation apparatus according to the present invention emits ultraviolet light to one surface (upper surface in FIG. 1) of the strip-like object W transported along the transport path from the inlet 18 on the upstream side (right side in FIG. 1) of the processing chamber 10. In the processing area to which the ultraviolet light from the lamp 11 is irradiated, the ultraviolet light is irradiated for light cleaning.

Examples of the strip-like object (work) W to be light-cleaned in the light irradiation device include plate-like bodies such as a glass substrate and a print substrate, and a continuous sheet-like film.
The to-be-processed object W is a thing of about 100-2000 mm in width, for example.

  The processing chamber 10 has a rod-shaped lamp house 12 having an opening 12H along a passage plane on one surface side (upper surface side in FIG. 1) of the processing object in the processing region of the transport path, and the processing object W in the processing region It is formed by the housing-like exhaust space formation member 13 which has the opening 13H along the passage plane of the other surface side (lower surface side in FIG. 1). As a result, the inside of the processing chamber 10 is divided into a cleaning processing space consisting of the lamp house 12 and an exhaust space consisting of the exhaust space forming member 13 via the processing region of the transfer path. A slit-like inlet 18 and outlet 19 are formed by the lamp house 12 and the exhaust space forming member 13 at both ends of the transfer path in the processing chamber 10, respectively.

In this light irradiation device, it is preferable that the opening 12H of the lamp house 12 be provided with a shield that forms a bottleneck G for gas flow resistance between the side edges of the object W in the width direction. Specifically, the shield has a plate shape having an opening 15H having a width allowing passage of the object W, which extends along the conveyance plane of the object W continuously along the periphery of the opening 12H of the lamp house 12 Frame portion 12A. As a result, a gas flow resistance blocking passage G is formed between the side edge of the opening 15H of the frame 12A extending in parallel to the transport direction of the object W and the side edge of the object W in the width direction. Ru. The frame 12A of the lamp house 12 is provided at the same level position as the processing area related to the object W to be processed.
The distance (gap) of the flow passage for gas flow resistance G is such that the pressure in the exhaust space forming member 13 is lower than the pressure in the lamp house 12, and the pressure state of both spaces is maintained. Preferably, specifically, the differential pressure between the pressure in the lamp house 12 and the pressure in the exhaust space forming member 13 is preferably maintained at, for example, 1 Pa or more. This differential pressure becomes larger as the distance between the gas flow passage resistance passage G becomes smaller.

  By providing a shield for forming a bottleneck G for gas flow resistance between the opening 12 H of the lamp house 12 of the light irradiation device and both side edges of the object W in the width direction, the inside of the lamp house 12 is provided. Since the free flow of gas between the space of and the space in the exhaust space forming member 13 is inhibited to increase the flow resistance of the gas, the hermeticity in the lamp house 12 is enhanced. Therefore, the atmosphere in the ultraviolet radiation space can be replaced with the processing space gas by a smaller amount of processing space gas than before, regardless of the transfer speed determined based on the type and shape of the object W to be processed. .

  In the lamp house 12, a plurality of ultraviolet lamps 11 extending in the width direction of the object W are provided on the same plane while being separated from each other in the transport direction of the object W, and inactive in the lamp house 12 A gas supply means for supplying a processing space gas containing gas is provided on the back side (upper side in FIG. 1) of the ultraviolet lamp 11.

  As the ultraviolet lamp 11, for example, a xenon excimer lamp having a flat shape whose cross section extends in the transport direction of the object W, which emits vacuum ultraviolet light having a center wavelength of about 172 to 380 nm, is used.

Specifically, the gas supply means comprises a gas supply pipe 16 in which a number of gas supply ports consisting of holes or slits are opened, and at least one gas supply pipe 16 is an inlet 18 in the lamp house 12. Are placed in the vicinity of
In the light irradiation apparatus of FIG. 1, the gas supply means has a plurality of gas supply pipes 16, and each of the gas supply pipes 16 extends in parallel with the direction in which the ultraviolet lamps 11 extend, and adjacent ultraviolet lamps 11. Are arranged on the back side of the ultraviolet lamp 11 in an equidistant manner.

  The processing space gas may, for example, be one in which oxygen gas is mixed in an inert gas which is a main component, or a humidified inert gas in which water is mixed in the inert gas.

  As the inert gas, for example, nitrogen gas, argon gas, xenon gas or the like can be used.

  The oxygen gas is preferably mixed with the inert gas in the form of a gas containing a controlled concentration of oxygen gas, specifically, CDA (Clean Dry Air).

The processing space gas is supplied by a gas mixture supply mechanism (not shown). Specifically, when the processing space gas is one in which oxygen gas is mixed with an inert gas, the gas mixture supply mechanism includes, for example, an inert gas supply source comprising an inert gas cylinder for supplying an inert gas; Processing by mixing an oxygen-containing gas supply source comprising an oxygen-containing gas cylinder supplying an oxygen-containing gas, and an inert gas and an oxygen-containing gas supplied from the inert gas supply source and the oxygen-containing gas supply source A gas mixer for adjusting the space gas is provided, and the processing space gas is supplied to the gas supply pipe 16 from the gas mixer.
When the processing space gas is a humidified inert gas, the gas mixture supply mechanism includes an inert gas supply source comprising an inert gas cylinder for supplying the inert gas, and a humidifier for humidifying the introduced gas. A gas mixer for mixing the dry inert gas supplied from the inert gas supply source and the humidified inert gas supplied from the humidifier to adjust the processing space gas; The processing space gas is supplied to the gas supply pipe 16 from the The humidifier comprises a humidification tank storing pure water and a heater for heating the humidification tank, and the inert gas supplied from the inert gas supply source from the inlet of the humidification tank is contained in the humidification tank. Water is introduced into pure water or into water vapor obtained by heating pure water by a heater, whereby water is mixed in the inert gas. The inert gas mixed with water is derived from the outlet provided at the top of the humidification tank and supplied to the gas mixer.

The oxygen concentration in the processing space gas in which oxygen gas is mixed with the inert gas is adjusted by the gas adjustment mechanism described later, and is preferably 0.5 to 8% by volume, particularly preferably 2.5% by volume. Preferably.
If the concentration of oxygen in the processing space gas is excessive, the attenuation of the ultraviolet light in the ultraviolet light emitting space may be so great that the light cleaning may be hindered. On the other hand, when the concentration of oxygen in the processing space gas is too low, the amount of ozone generated is extremely small, so that the effect of activating the surface of the object to be treated by ozone does not work, and a sufficient light cleaning effect is obtained. May not be

In addition, the humidified inert gas is adjusted in the mixing amount of water by the gas adjustment mechanism described later, and is assumed to be mixed with water having a relative humidity in the lamp house 12 to be, for example, 15 to 30% RH. Is preferred.
When the mixing amount of water in the processing space gas is excessive, the absorption of the ultraviolet light into the water molecules is increased, and there may be a problem that the ultraviolet light does not reach the object to be treated. On the other hand, when the mixing amount of water in the processing space gas is too small, the generation amount of active species such as oxygen radical and hydroxyl radical becomes extremely small, so the activation action of the surface of the object to be treated by the active species There is a possibility that a sufficient light cleaning effect can not be obtained without working.

  And in the light irradiation apparatus of this example, the discharge mechanism which discharges the to-be-processed object W in the inside of the lamp house 12 is provided.

For example, as shown in FIG. 3, the charge removal mechanism extends from the ceiling plate 12B of the lamp house 12 toward the processing region from the rectangular plate-shaped charge removal portion electrode plate 45 extending in the width direction of the object W to be treated. And an electrode plate support member 46 for supporting the partial electrode plate 45. The static elimination part electrode plate 45 and the electrode plate support member 46 are both made of a conductor, and they are electrically connected by welding. In the static elimination member 40, the electrode plate support member 46 is welded to the ceiling plate 12B of the lamp house 12 and electrically connected, and the static elimination part electrode plate 45 is disposed in a state of coming close to or in contact with the object W to be processed. Be done.
Specifically, the static elimination member 40 is in a state in which the static elimination part electrode plate 45 extends along the extension direction (left and right direction in FIG. 2) of the ultraviolet lamps 11 and is equidistant from the adjacent ultraviolet lamps 11. It is arranged and supported by a plurality of (three in FIG. 2) plate support members 46 which are equally spaced in the direction in which the ultraviolet lamp 11 extends. The charge removal portion electrode plate 45 is disposed so as to protrude to a level position on the processing region side of the ultraviolet lamp 11 so as to reliably discharge the object W, that is, to protrude in a state approaching the object W Preferably.
In the light irradiation apparatus of this example, the charge removal member 40 is a UV lamp 11 on the most upstream side between adjacent UV lamps 11 on the downstream side of the UV lamp 11 disposed on the most upstream side in the transport direction of the object W to be treated. And the inlet 18 and at least one of the most downstream ultraviolet lamp 11 and the outlet 19.

  The material of the static elimination part electrode plate 45 and the electrode plate support member 46 may be a conductor, and may be, for example, stainless steel (SUS).

  It is preferable that the distance of the static elimination part electrode plate 45 of the static elimination member 40 and a process area | region is 0-5 mm. If the distance between the static elimination part electrode plate 45 and the processing region is excessive, the static elimination of the object to be treated W may not be sufficiently performed.

  It is preferable that the static elimination member 40 in the light irradiation apparatus of this example has a gas sampling function to extract the atmosphere gas of the ultraviolet radiation space.

  In the example of this figure, the charge removal member 40 is between the adjacent ultraviolet lamps 11, between the most upstream ultraviolet lamp 11 and the inlet 18, and between the most downstream ultraviolet lamp 11 and the outlet 19. The charge removing member 40 having a gas sampling function is provided between adjacent ultraviolet lamps 11 downstream of the ultraviolet lamps 11 disposed most upstream in the transport direction of the object W. It only needs to be arranged one.

  In the static elimination member 40 having a gas sampling function, as shown in FIG. 4, it extends in a direction (vertical direction in FIGS. 1 to 4) perpendicular to the passage plane of the object W to be treated. At least one gas suction hole 31 is formed in the passing plane on the one surface side of the object to be processed W, which opens toward the processing region to which the ultraviolet light from the ultraviolet light lamp 11 is irradiated.

Further, in the charge removal portion electrode plate 45, a gas suction hole projecting in a direction approaching the processing region at a position separated from the gas suction hole 31 on the surface facing the processing region to which the ultraviolet light from the ultraviolet lamp 11 is irradiated. It is preferable that the blocking prevention part is formed.
Specifically, the gas suction hole blockage prevention portion includes two bank members 37 extending along the transport direction of the object W to be treated. That is, the gas suction hole 31 is opened in the concave groove 38 which is sandwiched between the two bank members 37 and extends in the transport direction of the object W to be treated.
The distance between the gas suction hole 31 and the bank member 37 may be, for example, 1 to 3 mm as long as the gas suction hole 31 is not blocked even when the workpiece W undulates and contacts the static elimination member 40. When the distance between the gas suction hole 31 and the bank member 37 is excessive, there may be a problem that the atmosphere gas near the surface of the object to be treated W can not be properly collected. On the other hand, when the distance between the gas suction hole 31 and the bank member 37 is too small, there is a possibility that the gas suction hole 31 may be blocked when the object W to be processed is in contact with the static elimination member 40.

The gas suction hole 31 is connected to a gas adjustment mechanism (not shown) via a gas sampling pipe 32.
The collection of the atmosphere gas of the ultraviolet radiation space from the gas suction holes 31 in the static elimination member 40 is performed by suction with a suction pump (not shown).

The gas suction hole 31 is preferably formed at the center in the width direction of the object W to be processed.
For example, like the static elimination part electrode plate 45A shown by FIG. 5, you may form in the center of the width direction of the to-be-processed object W, and three places of the both ends. Specifically, the object to be treated is provided with a gas suction hole blocking preventing portion consisting of four bank members 37A extending in parallel along the transport direction of the object W to be treated, which is sandwiched between two adjacent bank members 37A. The gas suction holes 31A are opened in the concave grooves 38A extending in the transport direction of W, respectively. According to the light irradiation apparatus provided with the charge removal member having such a plurality of gas suction holes 31A, the oxygen concentration and the humidity in the atmosphere gas of the ultraviolet radiation space can be measured with high accuracy, and as a result, higher stability Light cleaning can be performed.

  The distance between the gas suction holes 31 and the processing area is preferably 2 to 7 mm. If the distance between the gas suction hole 31 and the processing area is excessive, the oxygen concentration of the collected atmosphere gas deviates from the actual oxygen concentration near the surface of the object W transported to the processing area. There is a fear. On the other hand, if the distance between the gas suction hole 31 and the processing region is too small, the frequency of the object W being in contact with the static elimination member 40 is high due to the waviness of the object W being transported, and a series of ultraviolet rays There is a risk of blocking the flow of irradiation treatment.

The gas adjustment mechanism is based on the measuring means for measuring the oxygen concentration and humidity in the atmosphere gas of the ultraviolet radiation space collected from the gas suction hole 31 of the static elimination member 40, and the oxygen concentration and humidity obtained by the measuring means. The adjustment unit performs feedback control of the concentration of oxygen and the amount of water mixed in the processing space gas supplied from the gas supply pipe 16 so that the oxygen concentration and relative humidity in the lamp house 12 become a predetermined constant value.
It is preferable that the measurement of the oxygen concentration and humidity via the static elimination member 40 be performed constantly and intermittently, specifically, in a short span of 1 to 5 seconds.

The transport speed of the object W to the processing area, for example, the speed of flowing a sheet-like film is determined depending on the shape, the material, the surface condition, etc. of the object W, and therefore differs for each object W.
Then, the amount of air drawn into the periphery (ultraviolet radiation space) of the processing region as the object W is transported depends on the transport speed of the object W, so that the ultraviolet light is applied to each object W Although the oxygen concentration and the humidity in the radiation space vary, as a result, there is a problem that the desired light cleaning effect can not be stably obtained, but the light irradiation provided with the charge removal member 40 having the gas sampling function According to the device, the above problems can be solved.
That is, the atmosphere gas in the ultraviolet radiation space is sampled in real time by the static elimination member 40, and the amount of treatment space gas or gas for treatment space supplied into the lamp house 12 based on the oxygen concentration and humidity of the sampled atmosphere gas. Adjusting the oxygen concentration and humidity in the ultraviolet radiation space stably regardless of the transport speed determined based on the type and shape of the object W by adjusting the type of gas contained in the be able to. As a result, it is possible to suppress the occurrence of variations in the oxygen concentration and humidity in the ultraviolet radiation space while stably suppressing the attenuation of the ultraviolet radiation in the ultraviolet radiation space, and as a result, light cleaning is performed with high stability. be able to.

The static elimination member 40 according to the present invention also functions as a contact prevention member that prevents the contact between the object to be treated W and the ultraviolet lamp 11. Specifically, the charge removing member 40 is provided at a position projecting to the processing region side of the level position of the light irradiation surface (the lower surface in FIG. 1) of the ultraviolet lamp 11, whereby the above function is exhibited.
When the object to be treated W is, for example, in the form of a film, the object to be treated W may be deformed by the ultraviolet rays emitted from the ultraviolet ray lamp 11 or the radiant heat from the ultraviolet ray lamp 11 to cause waviness or deflection. . When the object to be treated W undulates and contacts the ultraviolet ray lamp 11 which becomes high temperature during lighting, the object to be treated W may melt and adhere to the ultraviolet ray lamp 11 in some cases. In the case where an abnormality occurs in the ultraviolet irradiation process or other processes, the conveyance means may be urgently stopped. At this time, the conveyance roller on the discharge port 18 side is stopped first, and the conveyance port 19 side Even when the transport roller continues to move, the object W to be treated is subjected to waviness or deflection, and the object W to be treated which is in contact with the ultraviolet lamp 11 comes into contact.

As shown in FIG. 6, a direction perpendicular to the processing area (see FIG. 6), so that the charge removing member 40 can move the object W away from the ultraviolet lamp 11 when the conveyance means is urgently stopped or the like. 6) may be provided so as to be movable in the vertical direction). By having such a configuration, the object to be processed W can be reliably separated from the ultraviolet lamp 11 when the conveyance means is urgently stopped.
In the case where a plurality of charge removal members 40 are provided in the light irradiation device, at least one of the charge removal members 40 may be provided so as to be movable.

  Particularly when the static elimination member 40 functions as a contact prevention member, it is preferable that the portion of the static elimination portion electrode plate 45 facing the object to be processed W be formed of a curved surface. With such a configuration, it is possible to suppress the occurrence of damage such as damage to the object to be processed W even when the static elimination part electrode plate 45 and the object to be processed W come into contact with each other with a strong force.

A gas exhaust port 17 for forcibly exhausting the gas in the exhaust space forming member 13 to the outside is provided at the bottom (the lower portion in FIG. 1) of the exhaust space forming member 13.
In this light irradiation apparatus, it is preferable that the displacement of the exhaust space forming member 13 through the gas outlet 17 be larger than the amount of gas supplied from the gas supply pipe 16 of the gas supply means.

On the upstream side of the processing chamber 10 in the transfer path, a sub chamber 21 is provided in the vicinity of the loading port 18. In addition, it is preferable that the subchamber 22 be provided in the vicinity of the outlet 19 also on the downstream side of the processing chamber 10 in the transport path.
The sub-chambers 21 and 22 are respectively provided with the exhaust parts 21A, 21B, 22A and 22B opposite to each other through the transport path, and the inlet 18 and outlet from the inside of the exhaust space forming member 13 and the lamp house 12 The gas which leaks through 19 is forcedly exhausted to the outside.
It is preferable that the exhaust amount from the subchambers 21 and 22 is larger than the gas supply amount of the processing space gas from the gas supply pipe 16 of the gas supply means.

  As the conveyance means for conveying the object W along the conveyance path, in the case where the object W is a plate-like body, for example, a plurality of conveyance rollers are provided and conveyed on the conveyance roller In the case where the object W to be treated is a continuous sheet-like film, for example, a sheet-like film is stretched between the unwinding roll and the winding roll, for unwinding. You may use the thing of the structure wound up to a roll for rolls from a roll.

When one example of the dimensions and the like of the light irradiation device of the present invention is shown, and the width of the object to be treated W is, for example, 500 mm, the length in the transport direction of the object to be treated W in the processing chamber 10 is 445 mm, the object to be treated The length in the width direction of the body W is 1090 mm.
The distance (gap) of the gas flow resistance tunnel G is 10 mm, the distance between the processing area where the object W is to be disposed and the ceiling surface (upper surface in FIG. 1) of the lamp house 12 is 72 mm, the object W is disposed. The distance between the processing area to be processed and the bottom surface (the lower surface in FIG. 1) of the exhaust space forming member 13 is 150 mm.
The length t1 in the transport direction of the static elimination member 40 is 20 mm, the length t2 in the vertical direction is 5 mm, and the length t3 in the longitudinal direction may be about +10 mm width of the object W, for example 510 mm.
The depth t4 of the recessed groove 38 of the static elimination member 40 is 2 mm, and the length t5 is 10 mm.
The internal diameter of the gas suction hole 31 of the static elimination member 40 is 3 mm, and the length is 3 mm.
The flow rate of the suction pump for suctioning the atmosphere gas from the gas suction hole 31 is 200 mL / min.
The pressure in the lamp house 12 is positive pressure 2 Pa higher than the external atmosphere (atmospheric pressure), the pressure in the exhaust space forming member 13 negative pressure 2 Pa lower than the external atmosphere (atmospheric pressure), and the differential pressure is 4 Pa .
The length of the ultraviolet lamp 11 in the longitudinal direction (lateral direction in FIG. 2) is 640 mm, the length in the lateral direction of the ultraviolet lamp 11 (lateral direction in FIG. 1) is 70 mm, and the effective irradiation width of the ultraviolet lamp 11 is 510 mm. . The distance between the adjacent ultraviolet lamps 11 is 70 mm, and the distance between the surface (the lower surface in FIG. 1) of the ultraviolet lamps 11 and the processing region where the object W is to be disposed is 3 to 5 mm, for example 4 mm.
The total transfer direction length of the processing chamber 10 and the subchambers 21 and 22 is 600 to 700 mm.
The amount of processing space gas supplied from the gas supply port is 100 L / min, the amount of gas exhausted from the gas exhaust port 17 of the exhaust space forming member 13 is 200 L / min, and the exhaust portions 21A and 21B of the subchambers 21 and 22 , 22A and 22B are each set to 200 L / min.

In the above-mentioned light irradiation apparatus, ultraviolet irradiation processing (light washing processing) is performed as follows. That is, the object W is carried into the processing region along the transport path from the loading port 18 of the processing chamber 10 by the transport means, and a small amount of external atmosphere (atmosphere) adheres to the surface of the object W accordingly. And brought around the processing area. In the lamp house 12, the gas for the processing space having the adjusted oxygen concentration or humidity is supplied from the gas supply port of the gas supply pipe 16 by the gas mixture supply mechanism. The supplied processing space gas fills the lamp house 12 to cool the ultraviolet lamp 11 and replace the air in the ultraviolet radiation space between the ultraviolet lamp 11 and the object W with the processing space gas. Do. The processing space gas filled in the lamp house 12 is discharged from the gas flow resistance bottleneck G between the shield (frame 12A) provided in the opening 12H and the both side edges in the width direction of the object W to be treated. The gas slightly flows out into the exhaust space in the forming member 13 and is forcibly exhausted from the gas discharge port 17 of the exhaust space forming member 13 together with ozone generated in the lamp house 12 and the exhaust space. Further, the processing space gas supplied into the lamp house 12 and the ozone generated in the lamp house 12 and the exhaust space are directed to the sub-chambers 21 and 22 through the inlet 18 and outlet 19 of the processing chamber 10. The gas is forced to be exhausted from the exhaust parts 21A, 21B, 22A, 22B of the sub-chambers 21 and 22, respectively.
Then, when ultraviolet light is emitted from the ultraviolet lamp 11 toward the one surface of the object W transported to the processing area, the ultraviolet light and oxygen gas contained in the processing space gas and the processing object are processed. Contaminants such as organic substances present on one side of the object W are decomposed and removed (cleaned) by active species such as ozone generated by irradiation of ultraviolet rays to air slightly brought in with the transport of the body W As a result, surface wettability is modified. Thereafter, the object W irradiated with the ultraviolet light is unloaded from the outlet 19 along the transport path.
Then, the object to be processed W carried into the lamp house 12 from the carry-in opening 18 of the processing chamber 10 by the conveying means is neutralized by the static elimination member 40. Specifically, the inside of the lamp house 12 is charged by being peeled off from the roller body and then fed into the lamp house 12, or after being carried into the lamp house 12, the inside of the lamp house 12 is dried. The charge removal member 40 is in contact with or extremely close to the object to be treated W in a state of being charged by the charge generated as a result. Since the charge removing member 40 is electrically connected to the lamp house 12 and the lamp house 12 is grounded, the charge accumulated on the surface of the object to be treated W is the charge removing member 40 and the charge removing member 40. It is grounded via the lamp house 12, whereby the object to be treated W is neutralized.

  Further, during the ultraviolet irradiation process, in the static elimination member 40, the atmosphere gas in the ultraviolet radiation space is always collected through the gas suction holes 31 and the gas sampling pipe 32 by the gas suction pump. The atmosphere gas of the collected ultraviolet radiation space contains an external atmosphere brought into the periphery of the processing region as the object W is transported. The atmosphere gas thus collected is measured by the measuring means of the adjusting mechanism so that its oxygen concentration and humidity are measured, and based on the measured oxygen concentration and humidity, the adjusting means makes the oxygen concentration and relative humidity in the lamp house 12 predetermined. The concentration of oxygen and the amount of water mixed in the processing space gas supplied from the gas supply pipe 16 are feedback controlled so as to become values.

  The transport speed of the object W is, for example, 0.5 to 40 m / min when the object W is a sheet-like film, and 0.5 to 9 m / min when it is a plate-like glass substrate. It is assumed to be min.

  The light irradiation apparatus according to the first embodiment as described above is provided with a discharging mechanism for discharging the object W inside the lamp house 12. Therefore, even when the object to be treated W is charged, the object to be treated W can be discharged. As a result, the atmosphere in the lamp house 12 may be polluted more than necessary due to the decomposition of the dust or the dust attached to the surface of the object W due to the irradiation of ultraviolet rays, and it is carried out of the lamp house 12 It is possible to suppress recontamination that dust and dirt adhere to the surface of the object to be treated W.

As mentioned above, although embodiment which concerns on the 1st Embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.
For example, in the light irradiation apparatus of the present invention, it is not essential that a shield is provided to form a gas flow resistance bottleneck between the side edges in the width direction of the object to be treated.

  Further, for example, the light irradiation device of the present invention is not limited to the configuration in which the ultraviolet light is irradiated by the ultraviolet lamp 11 from the upper side of the object to be processed, and has a structure in which the ultraviolet light is irradiated from below the object to be processed It is also good.

  Also, for example, in the static elimination member 40, the electrode plate support member 46 may be made of an insulator, in which case the static elimination part electrode plate 45 and the lamp house 12 are electrically connected by another ground wire. Thus, the static elimination part electrode plate 45 may be in a grounded state.

Second Embodiment
In the light irradiation apparatus according to the second embodiment of the present invention, the charge removal mechanism for discharging the object W to be processed is outside the lamp house 12 and at the loading port 18 to which the object W in the lamp house 12 is loaded. The structure is the same as that of the light irradiation apparatus of the first embodiment except that it is provided in the vicinity, specifically, between the loading port 18 of the processing chamber 10 and the sub-chamber 21.

  In the charge removal mechanism in the light irradiation apparatus according to the second embodiment, for example, a rectangular parallelepiped charge removal portion electrode plate extending in the width direction of the object W is moved from the side wall of the lamp house 12 in the transport direction of the object W Discharger supported by an electrode plate supporting member in which a rod-like short bar extending and a rod-like long bar extending from the tip of the short bar toward the transport path of the object to be treated W are welded in an L shape. It consists of a member. In the static elimination member, the proximal end of the short bar portion of the electrode plate support member is welded to the side wall of the lamp house 12 and electrically connected, and the static elimination part electrode plate approaches or contacts the object W Be placed.

  It is preferable that the distance of the static elimination part electrode plate of a static elimination member and the conveyance path which the to-be-processed object W is conveyed is 0-5 mm. If the distance between the charge removal portion electrode plate and the transport path through which the object to be processed W is transported is too large, there is a possibility that the charge to be processed W may not be sufficiently eliminated.

  According to the light irradiation apparatus according to the second embodiment as described above, the charge removal mechanism for removing charge of the object W is provided on the upstream side of the inlet 18 of the processing chamber 10 in the transfer path of the object W ing. Therefore, even when the charged object to be treated W is transported, the object to be treated W can be carried into the lamp house 12 in a state of charge removal. As a result, it is possible to prevent the atmosphere in the lamp house 12 from being contaminated more than necessary due to the decomposition of the dust or the dust attached to the surface of the object to be processed W due to the irradiation of the ultraviolet light.

  As mentioned above, although embodiment which concerns on the 2nd Embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.

Third Embodiment
In the light irradiation apparatus according to the third embodiment of the present invention, the discharge mechanism for discharging the object W is outside the lamp house 12 and at the outlet 19 from which the object W in the lamp house 12 is unloaded. The structure is the same as that of the light irradiation apparatus of the second embodiment except that it is provided in the vicinity, specifically, between the discharge port 19 of the processing chamber 10 and the subchamber 22.

  According to the light irradiation apparatus according to the third embodiment as described above, the charge removal mechanism for removing charge of the object W is provided on the downstream side of the outlet 19 of the processing chamber 10 in the transfer path of the object W ing. Therefore, even when the object to be treated W carried out of the lamp house 12 is charged, the object to be treated W can be discharged, and accordingly, the object to be treated W carried out of the lamp house 12 It is possible to prevent recontamination that dust and dirt adhere to the surface of

  As mentioned above, although embodiment which concerns on the 3rd Embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.

DESCRIPTION OF SYMBOLS 10 processing chamber 11 ultraviolet lamp 12 lamp house 12A frame part 12B ceiling plate 12H opening 13 exhaust space formation member 13H opening 15H opening 16 gas supply pipe 17 gas outlet 18 inlet 18 outlet 19 and outlets 21 and 22 sub chambers 21A, 21B, 22A , 22B exhaust part 31, 31A gas suction hole 32 gas sampling pipe 37, 37A bank member 38, 38A recessed groove 40 charge removing member 45, 45A charge removing portion electrode plate 46 electrode plate support member 51 discharge lamp 52 lamp house 53 exhaust space forming member 55 Sub-chamber 54 Conveying roller 55A Exhausting part 56 Gas supply pipe 57 Gas outlet 58 Loading port 59 Outlet G G

Claims (5)

A light irradiator which irradiates ultraviolet light to one surface of a strip-like object to be processed which is transported along a transport path, which comprises:
A lamp house having an opening along a passage plane on one side of the object in the transfer path;
An ultraviolet lamp provided in the lamp house and extending in the width direction of the object;
A gas supply means for supplying a processing space gas containing an inert gas in the lamp house;
It is provided in the inside of the lamp house, or in the vicinity of at least one of an inlet for carrying the object in the lamp house and an outlet for carrying the object out of the lamp house. A light irradiation apparatus comprising: a charge removing mechanism for removing the charge of the object to be treated.   The light irradiation apparatus according to claim 1, wherein the charge removal mechanism includes a charge removal member made of a conductor, and the charge removal member is disposed in a state of being in proximity to or in contact with the object to be treated.   The light irradiation apparatus according to claim 2, wherein the static elimination member projects in a state closer to the object than the ultraviolet lamp. The charge removing member is provided adjacent to the ultraviolet lamp inside the lamp house,
The charge removal member is characterized in that it has a gas sampling function by having a gas suction hole opened toward the processing region to be irradiated with the ultraviolet light from the ultraviolet lamp in the passage plane on the one surface side of the object to be processed. The light irradiation apparatus of Claim 2 or Claim 3. The charge removal member is a gas suction hole blockage prevention portion projecting in a direction approaching the processing region at a position separated from the gas suction hole on the surface facing the processing region to which the ultraviolet light from the ultraviolet lamp is irradiated. The light irradiation device according to claim 4, characterized in that

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