JP2019104785A - Adhesive substrate, and method of producing adhesive substrate - Google Patents
Adhesive substrate, and method of producing adhesive substrate Download PDFInfo
- Publication number
- JP2019104785A JP2019104785A JP2017236434A JP2017236434A JP2019104785A JP 2019104785 A JP2019104785 A JP 2019104785A JP 2017236434 A JP2017236434 A JP 2017236434A JP 2017236434 A JP2017236434 A JP 2017236434A JP 2019104785 A JP2019104785 A JP 2019104785A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- adhesive layer
- substrate
- convex
- support base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/20—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
- C09J2301/204—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive coating being discontinuous
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/20—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
- C09J2301/206—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive layer comprising non-adhesive protrusions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Die Bonding (AREA)
- Led Device Packages (AREA)
Abstract
Description
本発明は、粘着性基材及び粘着性基材の製造方法に関する。 The present invention relates to a tacky substrate and a method of producing the tacky substrate.
近年、時計や携帯電話などの携帯機器を中心に、電子機器の小型軽量化が進んでいる。これに伴い、これら電子機器に内蔵される半導体チップに関しても小型化が一層進んでいる。 2. Description of the Related Art In recent years, the size and weight reduction of electronic devices has progressed mainly on portable devices such as watches and mobile phones. Along with this, the miniaturization of semiconductor chips incorporated in these electronic devices is further advanced.
半導体チップの電極にリード線を繋げる方法として、従来からワイヤボンディングが知られているが、ワイヤーの占めるスペースが大きいため、半導体チップの小型化には不向きである。 Conventionally, wire bonding has been known as a method of connecting a lead wire to an electrode of a semiconductor chip, but since the space occupied by the wire is large, it is not suitable for miniaturization of the semiconductor chip.
そこで、電極がある上面を反転して直接電極基板と接続するフリップチップボンディングが行われている(特許文献1,2)。この方法ではワイヤーがないぶん、小型化が可能となる。しかし従来の方法ではチップを1つ1つピックアップするので、マイクロLEDなど非常に小さなチップを大量にダイボンドする際には非常に時間がかかってしまう。 Then, flip chip bonding which inverts the upper surface with an electrode, and directly connects with an electrode substrate is performed (patent documents 1 and 2). In this method, miniaturization is possible because there is no wire. However, since the conventional method picks up the chips one by one, it takes a very long time to die-bond a large number of very small chips such as micro LEDs.
特許文献3に記載されている転写用の部材では、凹凸パターンの凸部に粘着層が平面に付着しているが、このような転写用の部材は、チップと接触させた際に、平面粘着層とチップの接している面積が大きいため、チップをピックアップして別の粘着性基板に配置する際、全てのチップがきちんと別の粘着性基板に移行することが困難であった。また、平面粘着層とチップの接している面積が大きいために、チップのピックアップ速度と別の粘着性基板へ転写する速度が異なるなど、工程が煩雑となる。 In the member for transfer described in Patent Document 3, the adhesive layer adheres to a flat surface to the convex portion of the concavo-convex pattern, but when such a member for transfer is brought into contact with the chip, the planar adhesion Due to the large contact area between the layer and the chip, it was difficult for all the chips to be properly transferred to another sticky substrate when picking up the chips and placing them on another sticky substrate. In addition, since the area in which the flat adhesive layer and the chip are in contact is large, the process is complicated because, for example, the pickup speed of the chip is different from the transfer speed to another adhesive substrate.
本発明は上記事情に鑑みなされたもので、大量の微細なチップを短時間でダイボンドすることが可能な粘着性基材及び粘着性基材の製造方法を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a pressure-sensitive adhesive substrate capable of die-bonding a large amount of fine chips in a short time and a method of producing the pressure-sensitive adhesive substrate.
上記課題を解決するために、本発明によれば、支持基材と、該支持基材に設けられた粘着層とを有する粘着性基材であって、前記支持基材は、片面又は両面に2個以上の凸部を有する凹凸パターンを有し、前記粘着層は、少なくとも、前記支持基材の前記凹凸パターンの前記凸部の上面に設けられ、前記凸部の上面の前記粘着層表面が曲面を有するものであることを特徴とする粘着性基材を提供する。 In order to solve the above problems, according to the present invention, it is an adhesive substrate having a support substrate and an adhesive layer provided on the support substrate, wherein the support substrate is formed on one side or both sides. The adhesive layer is provided on the upper surface of the convex portion of the uneven pattern of the support base, and the adhesive layer surface of the upper surface of the convex portion is at least provided. Provided is a tacky substrate characterized by having a curved surface.
本発明の粘着性基材によれば、微細なチップを大量に短時間でダイボンドすることが可能となる。 According to the adhesive base material of the present invention, it is possible to die-bond a large number of fine chips in a short time.
またこの場合、前記粘着層は、前記支持基材の前記凹凸パターンの前記凸部の上面のみに設けられたものすることが好ましい。 In this case, preferably, the adhesive layer is provided only on the upper surface of the convex portion of the uneven pattern of the support base.
また、前記粘着層は、前記支持基材の前記凹凸パターンの凹部にも設けられたものであり、かつ、前記凹凸パターンの凹部に設けられた前記粘着層の表面高さが、前記凸部の上面に設けられた前記粘着層の表面高さよりも低い位置となるように設けられたものとすることが好ましい。 Further, the adhesive layer is provided also in the concave portion of the uneven pattern of the support base, and the surface height of the adhesive layer provided in the concave portion of the uneven pattern is the same as that of the convex portion. It is preferable to be provided so that it may become a position lower than the surface height of the said adhesion layer provided in the upper surface.
本発明の粘着性基材としては、これらの具体的態様が挙げられる。このような粘着性基材であれは、微細なチップを大量に選択的にピックアップすることができ、短時間で大量のチップをダイボンドすることができる。 The adhesive substrate of the present invention includes these specific embodiments. With such a tacky substrate, a large amount of fine chips can be selectively picked up, and a large number of chips can be die-bonded in a short time.
またこの場合、前記支持基材の前記凸部の上面に設けられた前記粘着層の表面のみが、曲面を有するものとすることが好ましい。 In this case, it is preferable that only the surface of the pressure-sensitive adhesive layer provided on the upper surface of the convex portion of the support base has a curved surface.
このような粘着性基材であれば、より確実に、微細なチップを大量に選択的にピックアップでき、短時間で大量のチップをダイボンドすることができるものとなる。 With such a tacky substrate, it is possible to selectively pick up a large amount of fine chips more reliably, and to die-bond a large number of chips in a short time.
また、前記支持基材の前記凸部の上面に設けられた前記粘着層の表面高さと、前記支持基材の前記凹凸パターンの凹部の表面高さとの差が最長1μm〜100μmであることが好ましい。 Moreover, it is preferable that the difference between the surface height of the adhesive layer provided on the upper surface of the convex portion of the support base and the surface height of the concave portion of the concavo-convex pattern of the support base is at most 1 μm to 100 μm. .
また、前記支持基材の前記凸部の上面に設けられた粘着層の表面高さと、前記支持基材の前記凹部に設けられた粘着層の表面高さとの差が最長1μm〜100μmであることが好ましい。 Further, the difference between the surface height of the adhesive layer provided on the upper surface of the convex portion of the support base and the surface height of the adhesive layer provided in the recess of the support base is at most 1 μm to 100 μm. Is preferred.
このような支持基材の凸部の上面に設けられた粘着層の表面と、支持基材の凹部の表面又は凹部に設けられた粘着層の表面との距離であれば、より確実に、微細なチップを大量に選択的にピックアップでき、短時間で大量のチップをダイボンドすることができるものとなる。 If the distance between the surface of the pressure-sensitive adhesive layer provided on the upper surface of the convex portion of the support base and the surface of the pressure-sensitive adhesive layer provided on the surface of the concave portion of the support base or the concave portion It is possible to selectively pick up a large number of chips and die-bond a large number of chips in a short time.
また、前記粘着層の最大厚みが0.01μm〜100μmであることが好ましい。 Moreover, it is preferable that the maximum thickness of the said adhesion layer is 0.01 micrometer-100 micrometers.
このような最大厚み(高さ)を有する粘着層であれば、粘着性基材をチップに押し付けた際に、変形量が小さくすむために好ましい。 An adhesive layer having such a maximum thickness (height) is preferable because the amount of deformation can be reduced when the adhesive base is pressed against the chip.
また、前記支持基材の前記凹凸パターンの隣接する前記凸部の間隔が1μm〜100μmであることが好ましい。 Moreover, it is preferable that the space | interval of the said adjacent convex part of the said uneven | corrugated pattern of the said support base material is 1 micrometer-100 micrometers.
また、前記支持基材の前記凹凸パターンの前記凸部の幅が1μm〜100μmであることが好ましい。 Moreover, it is preferable that the width | variety of the said convex part of the said uneven | corrugated pattern of the said support base material is 1 micrometer-100 micrometers.
このような支持基材の隣接する凸部の間隔や凸部の幅であれば、確実に、微細なチップをピックアップすることができるために好ましい。 The distance between adjacent convex portions and the width of the convex portions of such a support base material is preferable because fine chips can be picked up reliably.
また、前記粘着層の粘着力が、JIS Z 0237:2009に準拠した、23℃、引きはがし角度180°、及び剥離速度300mm/min.の条件での剥離時の粘着力が、0.05〜50(N/25mm幅)であることが好ましい。 Further, the adhesive strength of the adhesive layer is 23 ° C., a peeling angle of 180 °, and a peeling speed of 300 mm / min., In accordance with JIS Z 0237: 2009. It is preferable that the adhesive force at the time of peeling under the conditions of is 0.05 to 50 (N / 25 mm width).
本発明における粘着層の粘着力がこの範囲であれば、マイクロチップをピックアップするのに十分な粘着性を有するために好ましい。 If the adhesive strength of the adhesive layer in the present invention is in this range, it is preferable in order to have sufficient adhesiveness to pick up the microchip.
また、前記粘着性基材が、マイクロLED転写用であることが好ましい。 Moreover, it is preferable that the said adhesive base material is for micro LED transfer.
本発明の粘着性基材は、微細なチップを大量に選択的にピックアップでき、短時間で大量のチップをダイボンドすることが可能であるため、マイクロLED転写用として有用である。 The adhesive substrate of the present invention is useful for micro LED transfer because it can selectively pick up a large amount of fine chips and can die-bond a large number of chips in a short time.
また、本発明では、前記粘着性基材の製造方法であって、静電気力でノズルから粘着剤を塗布することによって、前記支持基材の、少なくとも前記凸部の上面に、表面に曲面を有する粘着層を形成することを特徴とする粘着性基材の製造方法を提供する。 Further, in the present invention, in the method for producing an adhesive substrate, an adhesive is applied from a nozzle by electrostatic force to have a curved surface on at least the upper surface of the convex portion of the support substrate. There is provided a method of producing a pressure-sensitive adhesive substrate characterized by forming a pressure-sensitive adhesive layer.
このように静電気力で粘着剤を塗布することにより、支持基材の凸部の上面に、表面に曲面を有する粘着層が設けられた本発明の粘着性基材を短時間で製造することができる。 Thus, the adhesive substrate of the present invention in which the adhesive layer having a curved surface is provided on the surface on the upper surface of the convex portion of the support substrate is produced in a short time by applying the adhesive by electrostatic force. it can.
本発明の粘着性基材は、支持基材の表面に凹凸パターンが配列されており、少なくとも、支持基材の凹凸パターンの凸部の上面に粘着層が設けられ、この凸部の上面の粘着層表面が曲面を有するものであることにより、微細なチップを大量に選択的にピックアップでき、短時間で大量のチップをダイボンドすることができる。そのため、チップトランスファー用基材として有用である。 In the pressure-sensitive adhesive substrate of the present invention, the concavo-convex pattern is arranged on the surface of the support substrate, and at least the pressure-sensitive adhesive layer is provided on the upper surface of the convex portion of the concave-convex pattern of the support substrate Since the layer surface has a curved surface, a large amount of fine chips can be selectively picked up, and a large number of chips can be die-bonded in a short time. Therefore, it is useful as a substrate for chip transfer.
本発明者は、上記目的を達成するため鋭意検討を行った結果、支持基材と、該支持基材に設けられた粘着層とを有する粘着性基材であって、前記支持基材は、片面又は両面に2個以上の凸部を有する凹凸パターンを有し、前記粘着層は、少なくとも、前記支持基材の前記凹凸パターンの前記凸部の上面に設けられ、前記凸部の上面の前記粘着層表面が曲面を有するものである粘着性基材であれば、微細なチップを大量に選択的にピックアップすることができ、基板の回路電極にプレスすることにより、短時間で大量のチップを電気的に接続することができることを見出し、本発明を成すに至った。以下、本発明の粘着性基材、及び粘着性基材の製造方法について詳細に説明する。 The inventors of the present invention conducted intensive studies to achieve the above object, and as a result, the present invention is a tacky substrate comprising a support base and an adhesive layer provided on the support base, wherein the support base is It has a concavo-convex pattern having two or more convex parts on one side or both sides, and the adhesive layer is provided at least on the upper surface of the convex part of the concavo-convex pattern of the support base material; If it is an adhesive substrate having an adhesive layer surface having a curved surface, a large amount of fine chips can be selectively picked up, and by pressing on a circuit electrode of a substrate, a large number of chips can be obtained in a short time. It has been found that electrical connection can be made, and the present invention has been achieved. Hereinafter, the adhesive substrate of the present invention and the method for producing the adhesive substrate will be described in detail.
即ち、本発明は、支持基材と、該支持基材に設けられた粘着層とを有する粘着性基材であって、前記支持基材は、片面又は両面に2個以上の凸部を有する凹凸パターンを有し、前記粘着層は、少なくとも、前記支持基材の前記凹凸パターンの前記凸部の上面に設けられ、前記凸部の上面の前記粘着層表面が曲面を有するものであることを特徴とする粘着性基材を提供する。 That is, the present invention is an adhesive substrate having a support substrate and an adhesive layer provided on the support substrate, and the support substrate has two or more convex portions on one side or both sides. It has a concavo-convex pattern, the pressure-sensitive adhesive layer is provided at least on the upper surface of the convex portion of the concave-convex pattern of the support base, and the adhesive layer surface of the upper surface of the convex portion has a curved surface. Provided is a tacky substrate that is characterized.
このような本発明の粘着性基材の具体的態様としては、図1(A)に示されるような、片面又は両面に2個以上の凸部を有する凹凸パターンを有する支持基材1の凸部の上面1’のみに粘着層2aが設けられ、この凸部の上面1’の粘着層2aの表面が曲面を有する粘着性基材100Aが挙げられる。また、別の態様としては、図1(B)に示されるような、支持基材1の凸部の上面1’に粘着層2aが設けられ、粘着層2a以外に、支持基材1の凹凸パターンの凹部にも粘着層2bが設けられたものであり、かつ、凹凸パターンの凹部に設けられた粘着層2bの表面高さが、凸部の上面1’に設けられた粘着層2aの表面高さよりも低い位置となるように設けられた粘着性基材100Bが挙げられる。以下、本発明における支持基材、粘着層について詳述する。 As a specific embodiment of such an adhesive base material of the present invention, as shown in FIG. 1 (A), the convex of the support base 1 having a concavo-convex pattern having two or more convex parts on one side or both sides. The adhesive layer 2a is provided only on the upper surface 1 'of the part, and the adhesive substrate 100A in which the surface of the adhesive layer 2a on the upper surface 1' of the convex part has a curved surface is mentioned. Moreover, as another aspect, the adhesive layer 2a is provided on the upper surface 1 'of the convex portion of the support base 1 as shown in FIG. 1 (B), and the unevenness of the support base 1 is provided in addition to the adhesive layer 2a. The adhesive layer 2b is provided also in the concave portion of the pattern, and the surface height of the adhesive layer 2b provided in the concave portion of the concavo-convex pattern is the surface of the adhesive layer 2a provided on the upper surface 1 'of the convex portion. The adhesive base material 100B provided so that it may become a position lower than height may be mentioned. Hereinafter, the support substrate and the adhesive layer in the present invention will be described in detail.
[支持基材]
本発明に使用される支持基材1としては、片面又は両面に2個以上の凸部を有する凹凸パターン、特には、規則的な凹凸パターンを有しているものであれば、特に制限はない。このような支持基材1は、例えば、ガラス、セラミックス基板、シリコンウエハー、ガラスエポキシ積層基板、ポリイミド積層基板、紙フェノール基板、シリコーン樹脂基板、フッ素樹脂基板、ポリエステル基板などを用いて作製することができる。
[Supporting base material]
The support substrate 1 used in the present invention is not particularly limited as long as it has a concavo-convex pattern having two or more convex portions on one side or both sides, in particular, a regular concavo-convex pattern. . Such a supporting substrate 1 may be produced using, for example, glass, ceramic substrate, silicon wafer, glass epoxy laminated substrate, polyimide laminated substrate, paper phenol substrate, silicone resin substrate, fluorocarbon resin substrate, polyester substrate, etc. it can.
凹凸パターンの設け方は特に制限はないが、例えば、フォトリソグラフィーにより被加工体に直接凹凸パターンを形成したものを支持基材1とすることができる。 There is no particular limitation on the method of providing the concavo-convex pattern, but for example, the support base 1 can be formed by forming the concavo-convex pattern directly on the workpiece by photolithography.
フォトリソグラフィーにより凹凸パターンを有する支持基材1を作製する方法は、従来公知の方法に従えばよく、図2に示されるように、被加工体3にフォトレジスト4を塗布し、次いで露光、次いで現像、次いでエッチング、その後余ったレジストを洗浄することで、凹凸パターンを有する支持基材1を得ることができる。 The method for producing the supporting substrate 1 having the concavo-convex pattern by photolithography may be according to a conventionally known method, and as shown in FIG. 2, the photoresist 4 is applied to the object 3 to be processed, and then exposure and then By developing and then etching, and then cleaning the remaining resist, the support substrate 1 having a concavo-convex pattern can be obtained.
更には、このような方法で作製した凹凸パターンに型取り材料を押し当てて型取りし、その型に熱硬化性樹脂、熱可塑性樹脂などを流し込んで、凹凸パターンを有する支持基材1としても良い。 Furthermore, a molding material is pressed against the concavo-convex pattern produced by such a method, the mold is taken, and a thermosetting resin, a thermoplastic resin or the like is poured into the mold to form the support base 1 having the concavo-convex pattern. good.
また、本発明における凹凸パターンを有する支持基材1は、他の基板の上に粘着剤を塗布し、その上に配置しても良い。この場合の粘着剤は、本発明において支持基材1の凸部の上面に設ける粘着層を形成するための粘着剤と同じであっても良いし、異なっても良い。他の基板としては、上記支持基材の作製に用いられる基板と同様の基板が挙げられる。 Moreover, the support base 1 which has the uneven | corrugated pattern in this invention may apply | coat an adhesive on another board | substrate, and may arrange | position on it. The pressure-sensitive adhesive in this case may be the same as or different from the pressure-sensitive adhesive for forming the pressure-sensitive adhesive layer provided on the upper surface of the convex portion of the support base 1 in the present invention. As another board | substrate, the board | substrate similar to the board | substrate used for preparation of the said support base material is mentioned.
支持基材1の凹凸パターンの大きさ、間隔としては特に制限はなく、ピックアップしようとするチップサイズに合わせて適宜選択することができるが、微細なチップをピックアップするためには、図1に示される凸部の幅101は1μm〜100μmとすることができ、好ましくは1μm〜20μm、より好ましくは1μm〜10μmである。 The size and interval of the uneven pattern of the supporting substrate 1 are not particularly limited and may be appropriately selected according to the size of the chip to be picked up, but in order to pick up a fine chip, it is shown in FIG. The width 101 of the raised portion can be 1 μm to 100 μm, preferably 1 μm to 20 μm, and more preferably 1 μm to 10 μm.
さらに幅101に合わせて、高さ103a、103bが1μm〜100μm、好ましくは1μm〜20μm、より好ましくは1μm〜10μmであると良い。ここでいう高さ103aとは、図1(A)に示されるように、支持基材の凸部の上面に設けられた粘着層2aの表面高さと、支持基材の凹部の表面高さとの差の最長距離であり、また、高さ103bとは、図1(B)に示されるように、支持基材の凸部の上面に設けられた粘着層の表面高さと、支持基材の凹部に設けられた粘着層の表面高さとの差の最長距離である。 Furthermore, according to the width 101, the heights 103a and 103b may be 1 μm to 100 μm, preferably 1 μm to 20 μm, and more preferably 1 μm to 10 μm. The height 103a referred to here is, as shown in FIG. 1A, the surface height of the adhesive layer 2a provided on the upper surface of the convex portion of the support base and the surface height of the concave portion of the support base The maximum distance of the difference, and the height 103b, as shown in FIG. 1B, is the surface height of the adhesive layer provided on the upper surface of the convex portion of the support base and the recess of the support base Is the longest distance of the difference from the surface height of the adhesive layer provided on the
また、隣接する凸部の間隔102としては1μm〜100μm、好ましくは1μm〜50μm、より好ましくは1μm〜20μmであると良い。なお、本発明において凸部の幅、高さ、間隔とは走査型電子顕微鏡によって測定された値を指す。 In addition, the interval 102 between the adjacent convex portions is 1 μm to 100 μm, preferably 1 μm to 50 μm, and more preferably 1 μm to 20 μm. In the present invention, the width, height, and spacing of the projections refer to values measured by a scanning electron microscope.
[粘着層]
本発明の粘着性基材100A、100Bは、少なくとも、支持基材1の凹凸パターンの凸部の上面1’に粘着層2aが設けられ、この粘着層2a表面が曲面を有することを特徴とする。このような形状の粘着層2aを有する粘着性基材であれば、マイクロチップピックアップ時の押し付け圧力を分散させチップに掛かる圧力を低減することができ、また密着面積の低減により低応力で剥離することができる。そのため、微細なチップを大量に短時間でダイボンドすることが可能となる。また、本発明における粘着層は、支持基材1の凹凸パターンの凹部にも形成されていても良いが、支持基材の凸部上面の粘着層2aの表面のみが曲面を有することが好ましい。
[Adhesive layer]
The adhesive base material 100A, 100B of the present invention is characterized in that at least the adhesive layer 2a is provided on the upper surface 1 'of the convex part of the concavo-convex pattern of the support base material 1, and the surface of the adhesive layer 2a has a curved surface. . With an adhesive substrate having the adhesive layer 2a having such a shape, the pressing pressure at the time of microchip pickup can be dispersed to reduce the pressure applied to the chip, and peeling can be performed with low stress due to the reduction of the adhesion area. be able to. Therefore, a large amount of fine chips can be die-bonded in a short time. Moreover, although the adhesion layer in this invention may be formed also in the recessed part of the uneven | corrugated pattern of the support base material 1, it is preferable that only the surface of the adhesion layer 2a of the convex part upper surface of a support base material has a curved surface.
粘着層の粘着力としては特に制限はないが、180度剥離強度が0.05〜50(N/25mm幅)が好ましく、0.1〜40(N/25mm幅)がより好ましく、0.15〜30(N/25mm幅)が更に好ましい。この範囲であればマイクロチップをピックアップするのに十分な粘着性を有する。 The adhesive strength of the adhesive layer is not particularly limited, but the 180 degree peel strength is preferably 0.05 to 50 (N / 25 mm width), more preferably 0.1 to 40 (N / 25 mm width), 0.15 -30 (N / 25 mm width) is more preferable. Within this range, it has sufficient adhesiveness to pick up the microchip.
なお、本発明における粘着力とは、JIS Z 0237:2009記載の方法で測定した、温度:23℃、剥離速度:300mm/min.、引きはがし角度:180°の条件で剥離した際の剥離強度を指す。 Incidentally, the adhesive strength in the present invention means a temperature of 23 ° C., a peeling rate of 300 mm / min, which was measured by the method described in JIS Z 0237: 2009. Peeling angle: Peeling strength when peeled off under the condition of 180 °.
粘着層の最大厚さ(高さ)としては特に制限はないが、チップトランスファー用基材をチップに押し付けた際に、変形量が小さい方がよく、0.01μm〜100μm、好ましくは0.01μm〜50μm、より好ましくは0.05μm〜30μmが良い。 The maximum thickness (height) of the adhesive layer is not particularly limited, but when the chip transfer substrate is pressed against the chip, the smaller the deformation amount, the better, and 0.01 μm to 100 μm, preferably 0.01 μm. The thickness is preferably 50 μm, more preferably 0.05 μm to 30 μm.
本発明における粘着層を形成する粘着剤としては、特に制限はなく、塗布後に硬化するもの、例えばアクリル粘着剤、シリコーン粘着剤、ウレタン粘着剤、ラテックス粘着剤、エポキシ粘着剤等が挙げられる。 There is no restriction | limiting in particular as an adhesive which forms the adhesion layer in this invention, What is hardened | cured after application | coating, for example, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a latex adhesive, an epoxy adhesive etc. are mentioned.
粘着層の形成方法は特に制限はないが、支持基材の凸部の上面の粘着層表面が曲面を有するものとなる必要がある。特には、図1(A)のように、支持基材1の凸部の上面のみに表面が曲面を有する粘着層2aを形成することが好ましい。または、図1(B)のように、支持基材1の凸部の上面1’に表面が曲面を有する粘着層2aを、支持基材1の凹凸パターンの凹部にも粘着層2bを、凹凸パターンの凹部に設けられた粘着層2bの表面高さが、凸部の上面に設けられた粘着層2aの表面高さよりも低い位置となるように形成することが好ましい。 The method for forming the pressure-sensitive adhesive layer is not particularly limited, but the surface of the pressure-sensitive adhesive layer on the upper surface of the convex portion of the support substrate needs to have a curved surface. In particular, as shown in FIG. 1A, it is preferable to form the adhesive layer 2a having a curved surface only on the upper surface of the convex portion of the support base 1. Alternatively, as shown in FIG. 1B, the adhesive layer 2a whose surface has a curved surface on the upper surface 1 'of the convex portion of the support base 1, the adhesive layer 2b even in the concave portion of the concavo-convex pattern of the support base 1 It is preferable to form so that the surface height of the adhesion layer 2b provided in the recessed part of a pattern may become a position lower than the surface height of the adhesion layer 2a provided in the upper surface of a convex part.
そのため、スピンコーターや通常の加圧スプレーで接着剤を塗布するだけでは、支持基材の凸部に塗布された粘着剤が流れてしまい、凸部上面に粘着層が形成されない、または凹部の粘着層の高さと凸部の粘着層の高さが同じになってしまい、微細なフリップチップを選択的にピックアップすることができなくなってしまう。 Therefore, only by applying the adhesive with a spin coater or a normal pressure spray, the adhesive applied to the convex portion of the support substrate flows, and the adhesive layer is not formed on the upper surface of the convex portion, or the adhesion of the concave portion The height of the layer and the height of the adhesive layer of the convex portion become the same, and it becomes impossible to selectively pick up a fine flip chip.
支持基材1の凸部の上面1’のみに表面が曲面を有する粘着層2aを形成する(図1(A))、または、支持基材1の凹凸パターンの凹部にも粘着層2bが形成されており、凹凸パターンの凹部に設けられた粘着層2bの表面高さが、凸部の上面に設けられた表面が曲面を有する粘着層2aの表面高さよりも低い位置となるように形成する(図1(B))ための具体的方法としては、例えば微細なノズルを用いて凸部の上から粘着剤を塗布する、または静電塗布(エレクトロスプレー)などが挙げられる。 The adhesive layer 2a having a curved surface is formed only on the upper surface 1 'of the convex portion of the supporting base 1 (FIG. 1A), or the adhesive layer 2b is also formed on the concave portion of the concavo-convex pattern of the supporting base 1 Is formed so that the surface height of the adhesive layer 2b provided in the recess of the concavo-convex pattern is lower than the surface height of the adhesive layer 2a having a curved surface. As a specific method for (FIG. 1 (B)), for example, a pressure-sensitive adhesive is applied from above the convex portion using a fine nozzle, or electrostatic application (electrospray) or the like can be mentioned.
特に、静電塗布は、正または負に帯電した粘着剤が、静電気の引力によって基材に塗布されるため、ノズルと基材の距離が近い箇所に多く塗布され、細かく制御しなくとも短時間で、支持基材1の凸部の上面1’のみに表面が曲面を有する粘着層2aを形成するように、または、凹凸パターンの凹部に設けられた粘着層2bの表面高さが、凸部の上面に設けられた表面が曲面を有する粘着層2aの表面高さよりも低い位置となるような粘着層2a,2bを形成するように、粘着剤を塗布することが可能であるため好ましい。 In particular, in electrostatic coating, since a positively or negatively charged adhesive is applied to a substrate by the attraction of static electricity, many are applied to places where the distance between the nozzle and the substrate is close, and even if not finely controlled, in a short time So that the adhesive layer 2a having a curved surface is formed only on the upper surface 1 'of the convex portion of the support base 1, or the surface height of the adhesive layer 2b provided in the concave portion of the concavo-convex pattern is convex The adhesive is preferably applied so that the adhesive layer 2a, 2b can be formed such that the surface provided on the upper surface of the adhesive layer 2a, 2b is positioned lower than the surface height of the adhesive layer 2a having a curved surface.
ノズルの形状としては、特に制限はないが、分散液に均一に電圧を印加するために円形状が望ましい。ノズルの径としては、特に制限はなく、パターンの幅、間隔に合わせて適宜選択することができるが、例えば幅10μm、高さ10μm、間隔10μmの凸パターンに粘着層を形成するためには、5μm〜500μm、好ましくは10μm〜300μm、より好ましくは20μm〜100μmが良い。 The shape of the nozzle is not particularly limited, but a circular shape is desirable in order to apply a voltage uniformly to the dispersion. The diameter of the nozzle is not particularly limited and may be appropriately selected in accordance with the width and interval of the pattern. For example, in order to form the adhesive layer in a convex pattern having a width of 10 μm, a height of 10 μm and an interval of 10 μm, 5 μm to 500 μm, preferably 10 μm to 300 μm, more preferably 20 μm to 100 μm.
この範囲であれば、支持基材1の凸部の上面のみに表面が曲面を有する粘着層2aが形成され、または、支持基材1の凹部に設けられた粘着層2bの表面高さが、凸部の上面に設けられた表面が曲面を有する粘着層2aの表面高さよりも低い位置となるよう粘着層2a、2bが形成されるように、粘着剤を塗布することが可能である。 Within this range, the adhesive layer 2a having a curved surface is formed only on the upper surface of the convex portion of the support base 1, or the surface height of the adhesive layer 2b provided in the recess of the support base 1 is The adhesive can be applied such that the adhesive layers 2a and 2b are formed such that the surface provided on the upper surface of the convex portion is at a position lower than the surface height of the adhesive layer 2a having a curved surface.
印加する電圧は、特に制限はないが、例えば1,000V〜10,000V、好ましくは1,000V〜8,000V、より好ましくは1,000V〜5,000Vである。またノズルの先端部と支持基材との距離は例えば10μm〜3,000μm、好ましくは10μm〜2,000μmである。 The voltage to be applied is not particularly limited, and is, for example, 1,000 V to 10,000 V, preferably 1,000 V to 8,000 V, more preferably 1,000 V to 5,000 V. The distance between the tip of the nozzle and the support substrate is, for example, 10 μm to 3,000 μm, preferably 10 μm to 2,000 μm.
粘着層の硬化方法は、樹脂の種類によって異なるが、特に限定はなく、例えば熱硬化、光硬化、湿気硬化などが挙げられる。 Although the hardening method of the adhesion layer changes with kinds of resin, there is no limitation in particular, For example, thermosetting, photocuring, moisture hardening, etc. are mentioned.
本発明における粘着性基材は、微細なチップを大量に選択的にピックアップでき、短時間で大量のチップをダイボンドすることが可能であるため、マイクロLED転写用として、ボンディングヘッドに好適に利用される。 The adhesive substrate in the present invention can selectively pick up a large amount of fine chips, and can die-bond a large number of chips in a short time, so it is suitably used for a bonding head for micro LED transfer. Ru.
以下、実施例、比較例を示し、本発明をより詳細に説明するが、本発明は下記の実施例に制限されるものではない。 Hereinafter, the present invention will be described in more detail by way of examples and comparative examples, but the present invention is not limited to the following examples.
(実施例1)
酸化膜が形成されたシリコンウエハー(被加工体3)に、フォトレジスト膜4を形成し、公知のフォトリソグラフィー法を用いて凸部の幅10μm、高さ10μm、間隔10μmの凹凸パターンを形成し、凹凸パターンを有する支持基材を作製した(図2、図3)。次いで、メチルエチルケトン(MEK)を用いて、付加硬化型シリコーン粘着剤KR−3700(信越化学工業(株)社製、粘着力:8.7N/25mm)を固形分濃度1.25質量%に希釈し、前記粘着剤を静電噴霧/塗布実験機(アピックヤマダ(株)社製)を用いて前記凹凸パターンの凸部上面に塗布し、曲面を有する粘着層を凸部にのみ有する粘着性基材を製造した(図4)。
Example 1
Photoresist film 4 is formed on a silicon wafer (workpiece 3) on which an oxide film is formed, and a convex-concave pattern with a width of 10 μm, a height of 10 μm, and an interval of 10 μm is formed using a known photolithography method. The support base material which has an uneven | corrugated pattern was produced (FIG. 2, FIG. 3). Then, using methyl ethyl ketone (MEK), the addition-curable silicone adhesive KR-3700 (manufactured by Shin-Etsu Chemical Co., Ltd., adhesive strength: 8.7 N / 25 mm) is diluted to a solid content concentration of 1.25 mass%. A pressure-sensitive adhesive substrate having the pressure-sensitive adhesive layer having a curved surface only on the convex portion is applied to the upper surface of the convex portion of the concave-convex pattern using an electrostatic spray / coating experimental machine (manufactured by Apic Yamada Co., Ltd.) Manufactured (Figure 4).
(実施例2)
実施例1と同様の方法で、酸化膜が形成されたシリコンウエハー(被加工体3)に、凸部の幅5μm、高さ10μm、間隔5μmの凹凸パターンを形成し、凹凸パターンを有する支持基材を作製した(図5)。次いで、メチルエチルケトン(MEK)を用いて、付加硬化型シリコーン粘着剤X−40−3270−1(信越化学工業(株)社製、粘着力:0.15N/25mm)を固形分濃度1.25質量%に希釈し、前記粘着剤を静電噴霧/塗布実験機(アピックヤマダ(株)社製)を用いて前記凹凸パターンの凸部上面に塗布し、曲面を有する粘着層を凸部にのみ有する粘着性基材を製造した(図6)。
(Example 2)
A convex-concave pattern having a width of 5 μm, a height of 10 μm, and an interval of 5 μm is formed on a silicon wafer (processed object 3) having an oxide film formed thereon by the same method as Example 1 The material was produced (FIG. 5). Then, using methyl ethyl ketone (MEK), addition-curable silicone adhesive X-40-3270-1 (Shin-Etsu Chemical Co., Ltd. product, adhesive strength: 0.15 N / 25 mm) at a solid content concentration of 1.25 mass %, And the above-mentioned adhesive is applied on the upper surface of the convex part of the uneven pattern using an electrostatic spray / coating test machine (manufactured by Apic Yamada Co., Ltd.), and an adhesive layer having an adhesive layer having a curved surface only on the convex part Base material was produced (FIG. 6).
(実施例3)
実施例1と同様の方法で、酸化膜が形成されたシリコンウエハー(被加工体3)に、凸部の幅30μm、高さ50μm、間隔30μmの凹凸パターンを形成して型を作製した。その型に付加硬化型ジメチルシリコーン樹脂を流し込み、150℃×4時間加熱して硬化させ、剥がすことで凹凸パターンがシリコンウエハーの逆になったシリコーン樹脂型を作製した。作製した型に付加硬化型メチルフェニルシリコーン樹脂を流し込み、150℃×4時間加熱して硬化させ、剥がすことで凹凸パターンを有するシリコーン樹脂製支持基材を作製した(図7)。次いで粘着層として、メチルエチルケトン(MEK)を用いて、アクリル樹脂系粘着剤オリバインBPW6570(トーヨーケム(株)社製、粘着力:25.6N/25mm)を固形分濃度10質量%に希釈し、前記粘着剤を静電噴霧/塗布実験機(アピックヤマダ(株)社製)を用いて前記凹凸パターンの凸部上面に塗布し、曲面を有する粘着層を凸部にのみ有する粘着性基材を製造した(図8)。
(Example 3)
In the same manner as in Example 1, a mold was produced by forming a concavo-convex pattern with a width of 30 μm, a height of 50 μm, and an interval of 30 μm on a silicon wafer (processed object 3) on which an oxide film was formed. An addition-curable dimethylsilicone resin was poured into the mold, cured by heating at 150 ° C. for 4 hours, and peeled off to produce a silicone resin mold in which the concavo-convex pattern was reversed to that of the silicon wafer. An addition-curable methylphenyl silicone resin was poured into the produced mold, cured by heating at 150 ° C. for 4 hours, and peeled off, thereby producing a silicone resin supporting base having a concavo-convex pattern (FIG. 7). Then, using methyl ethyl ketone (MEK) as an adhesive layer, the acrylic resin adhesive olivine BPW 6570 (manufactured by Toyo Chem Co., Ltd., adhesive power: 25.6 N / 25 mm) is diluted to a solid content concentration of 10 mass%, Agent was applied on the upper surface of the convex portion of the uneven pattern using an electrostatic spray / coating experimental machine (manufactured by Apic Yamada Co., Ltd.) to produce a tacky substrate having an adhesive layer having a curved surface only on the convex portion ( Figure 8).
(比較例1)
実施例1と同様の方法で、酸化膜が形成されたシリコンウエハー(被加工体3)に、凸部の幅10μm、高さ10μm、間隔10μmの凹凸パターンを形成し、凹凸パターンを有する支持基材を作製した。次いで粘着層として、メチルエチルケトン(MEK)を用いて、付加硬化型シリコーン粘着剤KR−3700(信越化学工業(株)社製、粘着力:8.7N/25mm)を固形分濃度1.25質量%に希釈し、前記粘着剤をスピンコーター(株式会社アクティブ社製)を用いて前記凹凸パターンに塗布し、図9に示されるような、支持基材10の凹部にのみ粘着層20を持ち、凸部に粘着層を持たない粘着性基材を作製した。
(Comparative example 1)
A convex-concave pattern having a width of 10 μm, a height of 10 μm, and a gap of 10 μm is formed on a silicon wafer (processed object 3) having an oxide film formed thereon by the same method as Example 1 The material was made. Next, methyl ethyl ketone (MEK) is used as an adhesive layer, and an addition-curable silicone adhesive KR-3700 (Shin-Etsu Chemical Co., Ltd. product, adhesive strength: 8.7 N / 25 mm) is solid content concentration 1.25 mass% Diluted, and the adhesive is applied to the concavo-convex pattern using a spin coater (manufactured by Active Co., Ltd.), and the adhesive layer 20 is held only in the concave portion of the supporting substrate 10 as shown in FIG. The adhesive base material which does not have an adhesive layer in part was produced.
(比較例2)
凸部の幅10μm、高さ10μm、間隔10μmに変更した以外は、実施例3と同様の方法で凹凸パターンを有するシリコーン樹脂製支持基材を作製した。次いで粘着層として、メチルエチルケトン(MEK)を用いて、付加硬化型シリコーン粘着剤KR−3700(信越化学工業(株)社製、粘着力:8.7N/25mm)を固形分濃度1.25質量%に希釈し、前記粘着剤をハンドスプレーガンを用いて前記凹凸パターンに塗布し、図10に示されるような、支持基材10の凹部が粘着層20で埋まり、凹凸パターンを持たない、即ち、凸部の上面及び凹部に形成された粘着層20の表面が平坦である粘着性基材を作製した。
(Comparative example 2)
A support base made of a silicone resin having a concavo-convex pattern was produced in the same manner as in Example 3 except that the width was 10 μm, the height was 10 μm, and the interval was 10 μm. Next, methyl ethyl ketone (MEK) is used as an adhesive layer, and an addition-curable silicone adhesive KR-3700 (Shin-Etsu Chemical Co., Ltd. product, adhesive strength: 8.7 N / 25 mm) is solid content concentration 1.25 mass% And the adhesive is applied to the concavo-convex pattern using a hand spray gun, and the concave portion of the support substrate 10 is filled with the adhesive layer 20 as shown in FIG. 10 and does not have the concavo-convex pattern, that is, A tacky substrate in which the surface of the pressure-sensitive adhesive layer 20 formed on the upper surface of the convex portion and the concave portion was flat was manufactured.
(比較例3)
凸部の幅20μm、高さ50μm、間隔20μmに変更した以外は、実施例3と同様の方法で凹凸パターンを有するシリコーン樹脂製支持基材を作製した。次いで粘着層として、付加硬化型シリコーン粘着剤KR−3700(信越化学工業(株)社製、粘着力:8.7N/25mm)をスクリーン印刷し、図11に示されるような、支持基材10の凸部に矩形の粘着層20を持つ粘着性基材を作製した。
(Comparative example 3)
A support base made of a silicone resin having a concavo-convex pattern was produced in the same manner as in Example 3 except that the width of the projections was changed to 20 μm, the height 50 μm, and the interval 20 μm. Then, as an adhesive layer, an addition-curable silicone adhesive KR-3700 (manufactured by Shin-Etsu Chemical Co., Ltd., adhesive strength: 8.7 N / 25 mm) is screen-printed, and a supporting substrate 10 as shown in FIG. A pressure-sensitive adhesive substrate having a rectangular pressure-sensitive adhesive layer 20 at the convex portion of the above was prepared.
[粘着試験]
実施例1〜3、比較例1〜3で得られた粘着性基材を用いて、図12のように並べられた赤、緑、青のマイクロLEDを選択的にピックアンドプレイスで転写した。選択的に転写したものを○、転写できなかったものを×とした。結果を表1に示す。
[Adhesive test]
Using the adhesive substrates obtained in Examples 1 to 3 and Comparative Examples 1 to 3, the red, green and blue micro LEDs arranged as shown in FIG. 12 were selectively transferred by pick and place. Those that were selectively transferred were marked ○, and those that could not be transferred were marked ×. The results are shown in Table 1.
表1に示す通り、本発明の粘着性基材(実施例1〜3)を用いれば、一度に多くのマイクロLEDを選択的にピックアンドプレイスできるため、マイクロLEDの転写用として好適に用いることができる。 As shown in Table 1, when using the adhesive base material (Examples 1 to 3) of the present invention, many micro LEDs can be selectively picked and placed at one time, so that they are suitably used for micro LED transfer Can.
一方、比較例1では、実施例のように支持基材の凸部に粘着層を有していなかったため、LEDをピックアップすることができなかった。また、比較例2では、凹部と凸部の全てに粘着層を有していたため、選択的にLEDをピックアップできなかった。また、ピックアップしたLEDも転写することができなかった。比較例3では選択的にLEDをピックアップできたが、チップと粘着層の密着面積が大きいため、別の粘着性基板に転写できなかった。 On the other hand, in Comparative Example 1, since the adhesive layer was not provided on the convex portion of the supporting substrate as in the example, it was not possible to pick up the LED. Moreover, in Comparative Example 2, the adhesive layer was provided on all the concave portions and the convex portions, so that it was not possible to selectively pick up the LED. Also, the picked up LED could not be transferred. Although it was possible to selectively pick up the LED in Comparative Example 3, it could not be transferred to another adhesive substrate because the contact area between the chip and the adhesive layer was large.
なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に含有される。 The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has the substantially same constitution as the technical idea described in the claims of the present invention, and the same effects can be exhibited by any invention. Contained in the technical scope of
1、10…支持基材、 1’ …支持基材の凸部の上面、 2a、2b、20…粘着層、 3…被加工体、 4…フォトレジスト、 100A、100B…粘着性基材、 101…凸部の幅、 102…隣接する凸部の間隔、 103a、103b…高さ。
DESCRIPTION OF SYMBOLS 1, 10 ... Supporting base material, 1 '... Upper surface of convex part of supporting base, 2a, 2b, 20 ... Adhesive layer, 3 ... Workpiece, 4 ... Photoresist, 100A, 100B ... Adhesive base, 101 ... Width of convex portion, 102 ... Distance between adjacent convex portions, 103a, 103b ... height.
Claims (12)
前記支持基材は、片面又は両面に2個以上の凸部を有する凹凸パターンを有し、
前記粘着層は、少なくとも、前記支持基材の前記凹凸パターンの前記凸部の上面に設けられ、前記凸部の上面の前記粘着層表面が曲面を有するものであることを特徴とする粘着性基材。 A tacky substrate comprising a support substrate and an adhesive layer provided on the support substrate,
The support substrate has a concavo-convex pattern having two or more convex portions on one side or both sides,
The adhesive layer is provided at least on the upper surface of the convex portion of the uneven pattern of the support base, and the adhesive layer surface of the upper surface of the convex portion has a curved surface. Material.
静電気力でノズルから粘着剤を塗布することによって、前記支持基材の、少なくとも前記凸部の上面に、表面に曲面を有する粘着層を形成することを特徴とする粘着性基材の製造方法。 It is a manufacturing method of the adhesive substrate according to any one of claims 1 to 11,
A method for producing an adhesive substrate comprising: forming an adhesive layer having a curved surface on at least the upper surface of the support base by applying an adhesive from a nozzle by electrostatic force.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017236434A JP6842404B2 (en) | 2017-12-08 | 2017-12-08 | Manufacturing method of adhesive base material |
TW107136894A TWI791644B (en) | 2017-12-08 | 2018-10-19 | Adhesive substrate manufacturing method |
KR1020180142405A KR102593231B1 (en) | 2017-12-08 | 2018-11-19 | Adhesive substrate and method for producing adhesive substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017236434A JP6842404B2 (en) | 2017-12-08 | 2017-12-08 | Manufacturing method of adhesive base material |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019104785A true JP2019104785A (en) | 2019-06-27 |
JP6842404B2 JP6842404B2 (en) | 2021-03-17 |
Family
ID=67061806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017236434A Active JP6842404B2 (en) | 2017-12-08 | 2017-12-08 | Manufacturing method of adhesive base material |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6842404B2 (en) |
KR (1) | KR102593231B1 (en) |
TW (1) | TWI791644B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7429173B2 (en) | 2020-09-08 | 2024-02-07 | 信越ポリマー株式会社 | Manufacturing method of adhesive retaining jig |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111048502A (en) * | 2019-12-27 | 2020-04-21 | 上海天马微电子有限公司 | Display panel, manufacturing method thereof and display device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009054628A (en) * | 2007-08-23 | 2009-03-12 | Shin Etsu Polymer Co Ltd | Substrate holder |
JP2013206961A (en) * | 2012-03-27 | 2013-10-07 | Lintec Corp | Adhesive film |
JP2015500562A (en) * | 2011-11-18 | 2015-01-05 | ルクスビュー テクノロジー コーポレイション | Micro light emitting diode |
JP2017175087A (en) * | 2016-03-25 | 2017-09-28 | 株式会社写真化学 | Manufacturing method for electronic device using device chip and manufacturing apparatus thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5701465B2 (en) | 2012-12-21 | 2015-04-15 | 株式会社新川 | Flatness of flip chip bonder and bonding stage, and deformation correction method |
CN117198903A (en) | 2014-07-20 | 2023-12-08 | 艾克斯展示公司技术有限公司 | Apparatus and method for micro transfer printing |
JP2016001752A (en) | 2015-08-25 | 2016-01-07 | 日本航空電子工業株式会社 | Flip-chip mounting structure and flip-chip mounting method, and using method of flip-chip mounting structure |
-
2017
- 2017-12-08 JP JP2017236434A patent/JP6842404B2/en active Active
-
2018
- 2018-10-19 TW TW107136894A patent/TWI791644B/en active
- 2018-11-19 KR KR1020180142405A patent/KR102593231B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009054628A (en) * | 2007-08-23 | 2009-03-12 | Shin Etsu Polymer Co Ltd | Substrate holder |
JP2015500562A (en) * | 2011-11-18 | 2015-01-05 | ルクスビュー テクノロジー コーポレイション | Micro light emitting diode |
JP2013206961A (en) * | 2012-03-27 | 2013-10-07 | Lintec Corp | Adhesive film |
JP2017175087A (en) * | 2016-03-25 | 2017-09-28 | 株式会社写真化学 | Manufacturing method for electronic device using device chip and manufacturing apparatus thereof |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7429173B2 (en) | 2020-09-08 | 2024-02-07 | 信越ポリマー株式会社 | Manufacturing method of adhesive retaining jig |
Also Published As
Publication number | Publication date |
---|---|
TWI791644B (en) | 2023-02-11 |
KR102593231B1 (en) | 2023-10-25 |
KR20190068420A (en) | 2019-06-18 |
JP6842404B2 (en) | 2021-03-17 |
TW201925393A (en) | 2019-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6983123B2 (en) | Adhesive substrate, transfer device having adhesive substrate, and method for manufacturing the adhesive substrate | |
US7919229B2 (en) | Phosphor coating process for light emitting diode | |
JP7252032B2 (en) | Transfer substrate, mounting method using same, and method for manufacturing image display device | |
JP5036614B2 (en) | Substrate stage | |
JP2006190975A (en) | Sealant filling structure of wafer-level package, and manufacturing method thereof | |
JP2019104785A (en) | Adhesive substrate, and method of producing adhesive substrate | |
CN111276440A (en) | Micro device transfer head, manufacturing method thereof and micro device transfer method | |
JP2004142878A (en) | Peeling method of flexible film, peeling device and circuit substrate | |
CN107195658A (en) | Flexible substrate and manufacturing method thereof | |
JP2004260146A (en) | Method and device of manufacturing circuit board | |
KR101317790B1 (en) | Adhesive Chuck and Method for Manufacturing the same | |
JP2009028947A (en) | Micro contact printing plate and manufacturing process of electronic device | |
KR102190706B1 (en) | Method for transferring a plurality of micro LED chips | |
JP2008205056A (en) | Mask for arranging solder ball, and manufacturing method for the same | |
TW200908246A (en) | Adhesion structure for a package apparatus | |
JP2006237411A (en) | Semiconductor device and its manufacturing method | |
KR100914376B1 (en) | Method for manufacturing printed wiring board | |
JP7429173B2 (en) | Manufacturing method of adhesive retaining jig | |
CN219937070U (en) | LED wafer, transfer substrate and display device | |
JP2010247461A (en) | Imprinting method | |
JP5795272B2 (en) | Method for manufacturing ceramic element | |
TWI237533B (en) | Circuit board and manufacturing method thereof | |
JP2004265913A (en) | Circuit board member and method of manufacturing circuit board | |
JP4045674B2 (en) | IC chip connection method | |
JP2013182895A (en) | Member for mounting semiconductor element and semiconductor device using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20191122 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20201019 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20201117 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201225 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210202 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210219 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6842404 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |