JP2019093369A - Placing device - Google Patents

Placing device Download PDF

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JP2019093369A
JP2019093369A JP2017227379A JP2017227379A JP2019093369A JP 2019093369 A JP2019093369 A JP 2019093369A JP 2017227379 A JP2017227379 A JP 2017227379A JP 2017227379 A JP2017227379 A JP 2017227379A JP 2019093369 A JP2019093369 A JP 2019093369A
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substrate
mounting
mounting surface
solution material
shoulder drop
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清人 山本
Kiyoto Yamamoto
清人 山本
元井 昌司
Masashi Motoi
昌司 元井
健太郎 三原
Kentaro Mihara
健太郎 三原
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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Abstract

To provide a placing device which reduces the intrusion and deposition of a solution material on a back surface of a substrate, when the solution material is applied to the substrate placed on the placing device.SOLUTION: In a placing device 10 placing a substrate 2 applied with a liquid, a placing surface 12 on which the substrate 2 is placed is a surface with a size that can be stored in an inner range than an outer periphery of a placed surface, has a blow-out portion which blows out a gas toward a non-contacting area 6 that is a part projected out from the placing surface 12 when the substrate 2 is placed on the placing surface 12, and has a counterbored portion that has lower surface height then the placing surface 12.SELECTED DRAWING: Figure 7

Description

この発明は、溶液材料を基板に塗布する塗布装置に関する。   The present invention relates to a coating apparatus for applying a solution material to a substrate.

従来、電圧印加された溶液材料をノズルから噴霧し、吸着ステージに把持された基板に薄膜として堆積するエレクトロスプレー装置が知られている。(たとえば、特許文献1参照)。このようなエレクトロスプレー装置は、金属製ノズルに高電圧を印加することで、ノズル開口先端部において、溶液材料表面に凝集した同一電荷同士のクーロン反発力によりテーラーコーンを形成し、当該クーロン反発力が、溶液材料の表面張力を上回ると液滴がスプレー状に拡がり、エレクトロスプレーが発生する現象を利用して、電気的に接地された吸着ステージに基板を固定し、溶液材料を供給された金属製ノズルに高電圧を印加することでノズルと吸着ステージとの間の電位差を設け、溶液材料を基板に向けて噴霧させ薄膜として堆積させている。   2. Description of the Related Art Conventionally, an electrospray apparatus has been known which sprays a voltage-applied solution material from a nozzle and deposits it as a thin film on a substrate held by an adsorption stage. (For example, refer to Patent Document 1). In such an electrospray apparatus, by applying a high voltage to a metal nozzle, a Taylor cone is formed by the Coulomb repulsion between identical charges aggregated on the surface of the solution material at the tip of the nozzle opening, and the Coulomb repulsion However, when the surface tension of the solution material exceeds the surface tension of the droplets, the droplets spread in the form of a spray, and the substrate is fixed to the electrically grounded adsorption stage using the phenomenon that electrospray occurs to supply the solution material. By applying a high voltage to the nozzle, a potential difference between the nozzle and the adsorption stage is provided, and the solution material is sprayed onto the substrate and deposited as a thin film.

特開2014−180590号公報JP, 2014-180590, A

ここで、特許文献1で開示されているようなエレクトロスプレー装置に用いられる吸着ステージは、基板を載置する面に多数の孔が設けられており、この孔に連通する真空装置により基板を吸着する。しかしながら、このような吸着ステージでは、たとえば、吸着ステージの基板を載置する面のごくわずかな凹凸や基板のそり等により、吸着ステージと基板との間にごくずかな隙間が存在している。   Here, the suction stage used in the electrospray apparatus as disclosed in Patent Document 1 has a large number of holes in the surface on which the substrate is to be mounted, and the vacuum device communicating with the holes sucks the substrate Do. However, in such a suction stage, a scrap gap is present between the suction stage and the substrate due to, for example, very slight unevenness on the surface of the suction stage on which the substrate is mounted, a warp of the substrate, or the like.

基板に溶液材料をスプレー塗布する際に、基板に堆積せずに基板側面近傍を通過する噴霧された溶液材料は、基板に堆積せずに基板近傍の吸着ステージ上に堆積する。また、基板上に堆積したのち基板側面を伝う溶液材料も基板近傍の吸着ステージ上に堆積する。これらの基板近傍の吸着ステージ上に堆積する溶液材料が、基板と吸着ステージとの間のごくわずかな隙間入口に溜まっていく。その結果、毛細管現象が働き、溶液材料がこの隙間に更に入り込み、基板の裏面に溶液材料が付着する可能性があった。   When the solution material is spray applied to the substrate, the sprayed solution material passing near the side of the substrate without being deposited on the substrate is deposited on the adsorption stage near the substrate without depositing on the substrate. In addition, a solution material which is deposited on the substrate and then transmitted along the side of the substrate is also deposited on the adsorption stage in the vicinity of the substrate. The solution material deposited on the adsorption stage in the vicinity of these substrates accumulates at a very small gap inlet between the substrate and the adsorption stage. As a result, capillary action is exerted, and the solution material may further enter the gap, and the solution material may adhere to the back surface of the substrate.

上記課題を解決するために、本発明の載置装置は、液体が塗布される基板が載置される載置装置において、前記基板が載置される載置面は、前記基板の被載置面の外周より内側の範囲に収まる大きさの面であることを特徴とする。   In order to solve the above-mentioned subject, the mounting device of the present invention is a mounting device on which a substrate to which a liquid is applied is mounted, wherein the mounting surface on which the substrate is mounted is a mounting surface of the substrate It is characterized in that it is a surface of a size that falls within the range inside the outer periphery of the surface.

載置面を基板の被載置面である基板の裏面より小さくすることにより、基板の外周とは接触せずに内側のみを載置できる。載置面に液体(溶液材料)が直接堆積しないので、載置面と基板との隙間に溶液材料が載置面を伝い毛細管現象により入り込むことを防ぐことができる。また、基板に塗布された後、基板側面を伝ってくる溶液材料は、基板の裏面で重力の影響を受けるため、載置面と基板との隙間まで伝うことを低減できる。こうすることで、溶液材料が載置面と基板との隙間に毛細管現象により入り込み、基板の裏面へ溶液材料が回り込みことを低減できる。   By making the mounting surface smaller than the back surface of the substrate which is the mounting surface of the substrate, only the inside can be mounted without being in contact with the outer periphery of the substrate. Since the liquid (solution material) is not deposited directly on the mounting surface, it is possible to prevent the solution material from flowing along the mounting surface and entering the gap between the mounting surface and the substrate by capillary action. In addition, since the solution material transmitted to the side surface of the substrate after being applied to the substrate is affected by the gravity on the back surface of the substrate, the propagation to the gap between the mounting surface and the substrate can be reduced. In this way, the solution material can be introduced into the gap between the mounting surface and the substrate by capillary action, and the solution material can be reduced to the back surface of the substrate.

また、前記基板の被載置面において、前記基板が前記載置面に載置された際に前記載置面からはみ出る部分である非接触領域に向けて、気体を吹き出す吹き出し部を有することを特徴としてもよい。   In addition, in the mounting surface of the substrate, the substrate has a blowout portion for blowing out gas toward a non-contact area which is a portion protruding from the mounting surface when the substrate is mounted on the mounting surface. It may be a feature.

こうすることで、非接触領域に向けて吹き出し部から吹き出された気流が、基板に塗布された後、基板表面を伝ってくる溶液材料にあたることで、その溶液材料がそれ以上基板の裏面側に回り込むことを低減できる。   In this way, the air stream blown out from the blowout portion toward the non-contact area is applied to the substrate and then hits the solution material transmitted through the substrate surface, so that the solution material is more on the back side of the substrate It is possible to reduce wraparound.

また、前記載置面を囲い、前記載置面より表面高さが低い肩落とし部を有することを特徴としてもよい。   In addition, it may be characterized in that the mounting surface is enclosed and the shoulder drop portion whose surface height is lower than the mounting surface is included.

肩落とし部を設けることで、肩落とし部側から吹き出された気流が、非接触領域にあたった後、基板の外側に流れやすくなる。このため、基板側面を伝い基板の裏面に回り込んだ溶液材料が、基板の外側に流れる気流にあたり、それより内側に溶液材料が回り込むことを、肩落とし部を設けない場合よりも低減できる。こうすることで、溶液材料の基板の裏面への回り込みを低減できる。   By providing the shoulder-dropping portion, the air flow blown out from the shoulder-dropping portion side can easily flow to the outside of the substrate after hitting the non-contact area. Therefore, the solution material extending along the side surface of the substrate and flowing around the back surface of the substrate can be an air flow flowing to the outside of the substrate, and the solution material can be reduced inside from that as compared to the case without the shoulder drop. This can reduce the wraparound of the solution material to the back surface of the substrate.

また、前記肩落とし部は、前記基板の被載置面の外周に近い側の表面の高さが、それ以外の表面の高さより高いことを特徴としてもよい。   The shoulder dropper may be characterized in that the height of the surface close to the outer periphery of the mounting surface of the substrate is higher than the height of the other surfaces.

こうすることで、非接触領域から基板の外側へ流れる吹き出し部からの気流の速度を、肩落とし部と非接触領域との間の空間を基板の外側に向けて絞った形状とすることで、肩落とし部と非接触領域との間の空間を基板の外側へ向けて絞らない形状の場合よりも速くできる。こうすることで、基板表面を伝う基板に塗布された溶液材料の基板の裏面側への回り込みを肩落とし部と非接触領域との間の空間を基板の外側へ向けて絞らない形状とした場合よりも低減できる。   By doing this, the velocity of the air flow from the blowout portion flowing from the noncontact region to the outside of the substrate is made to be a shape in which the space between the shoulder drop portion and the noncontact region is narrowed toward the outside of the substrate. The space between the shoulder drop and the non-contact area can be made faster towards the outside of the substrate than in the non-squeezed configuration. By doing this, the case where the solution material applied to the substrate that travels over the surface of the substrate does not squeeze the space between the shoulder drop portion and the non-contact region toward the outside of the substrate. It can be reduced more than that.

また、前記肩落とし部は、前記基板の被載置面に対して垂直な方向から前記基板の被載置面に向けて投影した前記肩落とし部の範囲が、前記基板の被載置面の外周より内側にあることを特徴としてもよい。   Further, in the shoulder drop portion, the area of the shoulder drop portion projected toward the mounting surface of the substrate from the direction perpendicular to the mounting surface of the substrate is the surface of the mounting surface of the substrate. It may be characterized in that it is inside the outer periphery.

肩落とし部を基板の範囲より内側に引き込んだ形状とすることにより、非接触領域において、吹き出し部からの気流の向きが、非接触領域にあたった後、肩落とし部がない方向、すなわち、載置装置の側面に沿って基板のある方向と反対方向に向くことにより、基板の表面側への気流の吹込みを防ぐことができる。こうすることで吹き出し部からの気流が基板の表面側に吹込み、基板へ向けて噴霧された溶液材料に干渉し基板表面上への塗布状態に影響を与えることを低減できる。   By forming the shoulder drop portion inward from the range of the substrate, the direction of the air flow from the blowout portion in the non-contact area is the direction in which there is no shoulder drop portion after hitting the non-contact area, that is, By facing the side of the placement apparatus opposite to the direction in which the substrate is present, it is possible to prevent the blowing of air flow to the front side of the substrate. By doing this, it is possible to reduce that the air flow from the blowout part blows to the surface side of the substrate and interferes with the solution material sprayed toward the substrate to affect the application state on the substrate surface.

また、前記載置装置は、前記載置面に開口する吸着部と、前記吸着部に連通する負圧付加機構と、を有することを特徴としてもよい。   Further, the placement device may be characterized by including an adsorption portion opened to the placement surface and a negative pressure application mechanism communicating with the adsorption portion.

載置面上で吸着把持をする場合だと、載置面周辺に負圧が生じるが、本発明では、載置面の外周と基板の外周との間に距離があるため、この負圧によって基板外周部近傍の溶液材料が基板と載置面との間の隙間に引き込まれることを低減することができる。   In the case of suction holding on the mounting surface, a negative pressure is generated around the mounting surface, but in the present invention, since there is a distance between the outer periphery of the mounting surface and the outer periphery of the substrate, this negative pressure It can be reduced that the solution material in the vicinity of the outer peripheral portion of the substrate is drawn into the gap between the substrate and the mounting surface.

本発明によれば、上記のように、載置装置に載置された基板に溶液材料を塗布する際に、溶液材料が基板の裏面に回り込み付着することを低減できる。   According to the present invention, as described above, when the solution material is applied to the substrate placed on the placement apparatus, the solution material can be reduced from coming around and adhering to the back surface of the substrate.

一般的なエレクトロスプレー装置の一例を示した概略図である。It is the schematic which showed an example of the common electrospray apparatus. 図1のa矢視の一般的な載置装置の概略平面図である。It is a schematic plan view of the general mounting apparatus of arrow a of FIG. 図2のb矢視の側面図である。It is a side view of b arrow of FIG. 図3のc矢視の本発明の載置装置を用いないで塗布した場合の基板の裏面の状態を示した図である。It is the figure which showed the state of the back surface of the board | substrate at the time of apply | coating without using the mounting apparatus of this invention of c arrow of FIG. 本発明の載置装置を有するエレクトロスプレー装置の一例を示した概略図である。It is the schematic which showed an example of the electrospray apparatus which has a mounting apparatus of this invention. 実施例1の載置装置の一例を示した概略平面図である。FIG. 5 is a schematic plan view showing an example of the mounting device of the first embodiment. 図6のe矢視の側面図である。It is a side view of e in FIG. 実施例2の載置装置の一例を示した概略側面図である。FIG. 8 is a schematic side view showing an example of the mounting device of the second embodiment. 実施例3の載置装置の一例を示した概略平面図である。FIG. 16 is a schematic plan view showing an example of the mounting device of the third embodiment. 図9のf矢視の側面図である。It is a side view of f arrow of FIG. 実施例4の載置装置の一例を示した概略側面図である。FIG. 18 is a schematic side view showing an example of the mounting device of the fourth embodiment. 実施例5の載置装置の一例を示した概略側面図である。FIG. 21 is a schematic side view showing an example of the mounting device of the fifth embodiment.

本発明の実施例について、図面を参照しながら説明する。最初に、載置装置を有する一般的なエレクトロスプレー装置の一例の概略図を図1に示す。エレクトロスプレー装置1は、電圧印加された溶液材料を噴霧するノズル3と、ノズル3から噴霧される溶液材料に電圧を印加する電圧制御部4と、ノズル3の噴霧側に位置し、基板2を載置する載置装置10’とを有する。   Embodiments of the present invention will be described with reference to the drawings. First, a schematic diagram of an example of a typical electrospray device having a mounting device is shown in FIG. The electrospray device 1 is positioned on the spray side of the nozzle 3 for spraying the solution material to which voltage is applied, the voltage control unit 4 for applying a voltage to the solution material sprayed from the nozzle 3, and the substrate 2. And a mounting device 10 'to be mounted.

ノズル3は、たとえば金属製の円筒状の細管であり、開口の一方の端は図示しない溶液材料供給部と連通し、開口の他方は、載置装置10’と対向するよう配置されている。電圧制御部4により制御された電圧を直接ノズル3に印加することにより、図示しない溶液材料供給部からノズル3の内部に供給される溶液材料に電圧が印加され、載置装置10’と対向する側のノズル先端に電圧印加された溶液材料によるテーラーコーンを形成した後、テーラーコーン先端から溶液材料が噴霧されるよう構成されている。   The nozzle 3 is a cylindrical thin tube made of metal, for example, and one end of the opening is in communication with a solution material supply unit (not shown), and the other end of the opening is disposed to face the mounting device 10 ′. By applying a voltage controlled by the voltage control unit 4 directly to the nozzle 3, a voltage is applied to the solution material supplied from the solution material supply unit (not shown) to the inside of the nozzle 3 to face the placement device 10 ' After forming the tailor cone by the voltage applied solution material at the side nozzle tip, the solution material is sprayed from the tailor cone tip.

載置装置10’は、たとえば金属製等の導電性物質からなり電気的に接地されている。電圧制御部4により、ノズル3と載置装置10’との間に電位差を持たせることで、ノズル3から噴霧された溶液材料は載置装置10’に向かって飛行する。これにより載置装置10’に載置された基板2への溶液材料の塗布がされる。   The placement device 10 'is made of, for example, a conductive material such as metal, and is electrically grounded. By providing a potential difference between the nozzle 3 and the mounting device 10 ′ by the voltage control unit 4, the solution material sprayed from the nozzle 3 flies toward the mounting device 10 ′. Thus, the solution material is applied to the substrate 2 placed on the placement device 10 '.

ここで、載置装置10’に載置される基板2と載置装置10’には、基板2のそりや吸着載置装置10’の基板2が載置される面の平面度や面粗度等により、載置装置10’と基板2との間に、ごくわずかな隙間が存在している。   Here, in the substrate 2 placed on the placement device 10 ′ and the placement device 10 ′, the flatness or surface roughness of the surface on which the substrate 2 of the substrate 2 is warped or the suction placement device 10 ′ is placed. There is a very slight gap between the mounting device 10 'and the substrate 2 depending on the degree or the like.

最初に、一般的な載置装置10’について、図2および図3を用いて説明する。図2は、図1のa矢視の載置装置10’の概略平面図であり、図3は、図2のb矢視図である。載置装置10’は、基板2を載置する載置面12と、載置面12上で基板2が載置される領域である載置領域13の内部に設けられ基板2の塗布側の面(表面)と反対側の面である裏面を吸着し基板2を把持する吸着部11と、吸着部11に連通する図示しない負圧付加機構とを有している。ここで、基板2の裏面の大きさより載置面12の大きさの方が大きく、基板2全体が載置面12に載置される。すなわち、載置領域13の範囲は基板2の裏面の範囲に等しい。   First, a general placement device 10 'will be described using FIGS. 2 and 3. FIG. FIG. 2 is a schematic plan view of the mounting apparatus 10 'in the direction of arrow a in FIG. 1, and FIG. 3 is a view in the direction of arrow b in FIG. The mounting apparatus 10 ′ is provided on the mounting surface 12 on which the substrate 2 is to be mounted, and in the mounting area 13 which is a region on the mounting surface 12 on which the substrate 2 is to be mounted. The suction unit 11 holds the back surface which is the surface opposite to the surface (surface) and holds the substrate 2, and a negative pressure application mechanism (not shown) communicating with the suction unit 11. Here, the size of the mounting surface 12 is larger than the size of the back surface of the substrate 2, and the entire substrate 2 is mounted on the mounting surface 12. That is, the range of the mounting area 13 is equal to the range of the back surface of the substrate 2.

吸着部11は、載置面12に開口し図示しない負圧付加機構に連通する複数の貫通孔15を有している。図示しない負圧付加機構から供給される負圧により、吸着部11の貫通孔15が載置面12上の載置領域13に載置された基板2の裏面を吸着し、基板2を吸着部11が把持する。   The adsorbing portion 11 has a plurality of through holes 15 which are opened to the mounting surface 12 and communicate with a negative pressure applying mechanism (not shown). By the negative pressure supplied from a negative pressure application mechanism (not shown), the through hole 15 of the suction unit 11 sucks the back surface of the substrate 2 mounted on the mounting area 13 on the mounting surface 12 and suctions the substrate 2 11 grips.

ここで、上述したように載置装置10’と基板2の間にはごくわずかな隙間が存在いているため、図示しない負圧付加機構による負圧がこの隙間にも存在する。   Here, as described above, since a very small gap exists between the mounting device 10 ′ and the substrate 2, a negative pressure by a negative pressure application mechanism (not shown) also exists in this gap.

基板2への溶液材料の塗布が進んでいくと、基板2上に堆積せずにこの基板側面7近傍の載置面12上に堆積した溶液材料と、基板2上に堆積したのち基板2の側面である基板側面7を伝って基板側面7近傍の載置面12上に堆積した溶液材料とが、基板2と載置面12との間の隙間入口に溜まっていく。その結果、毛細管現象が働き、溶液材料がこの隙間に入り込み、基板2の裏面に溶液材料が付着する可能性がある。また、吸着部11からの負圧はこの隙間にも働き、基板側面7近傍の溶液材料がこの負圧によって基板2と載置面12との間の隙間に引き込まれ、基板2の裏面に溶液材料が付着する可能性がある。この状態を図4に示す。図4は図3のc矢視図であり、ハッチング部は溶液材料が付着した部分を表示している。   As the application of the solution material to the substrate 2 proceeds, the solution material deposited on the mounting surface 12 near the substrate side surface 7 without depositing on the substrate 2, and after depositing on the substrate 2, the substrate 2 The solution material deposited on the mounting surface 12 in the vicinity of the substrate side surface 7 along the substrate side surface 7 which is the side surface is accumulated in the gap inlet between the substrate 2 and the mounting surface 12. As a result, capillary action may occur, and the solution material may enter this gap and adhere to the back surface of the substrate 2. Further, the negative pressure from the adsorption portion 11 also acts on this gap, and the solution material in the vicinity of the substrate side surface 7 is drawn into the gap between the substrate 2 and the mounting surface 12 by this negative pressure. Material may stick. This state is shown in FIG. FIG. 4 is a view taken in the direction of the arrow c in FIG. 3, and the hatched portion indicates a portion to which the solution material is attached.

本発明の実施例1の載置装置の一例について、図5、図6および図7を用いて説明する。図5は、本発明の載置装置を有するエレクトロスプレー装置の一例を示した概略図である。図6は、図5のd矢視図の実施例1の載置装置10の概略平面図であり、図7は、図6のe矢視図である。
実施例1の載置装置10は、図2、図3で説明した一般的な載置装置10’と比較して、載置面12の範囲が基板2の被載置面である基板2の裏面の範囲より小さく、載置領域13の範囲が基板2の裏面の範囲の内側にあり、載置面12の範囲と等しくなっている。基板2が載置面12上に載置されたときに基板2の内側に載置面12があるために、基板2の裏面において、基板2の外周と載置領域13との間に載置面12が接触しない領域である非接触領域6が存在している。
An example of the mounting apparatus of Example 1 of this invention is demonstrated using FIG.5, FIG.6 and FIG. FIG. 5 is a schematic view showing an example of an electrospray apparatus having the mounting device of the present invention. 6 is a schematic plan view of the mounting apparatus 10 according to the first embodiment as viewed in the direction of the arrow d in FIG. 5, and FIG. 7 is a view as viewed in the direction of the arrow e in FIG.
The mounting apparatus 10 according to the first embodiment is, compared to the general mounting apparatus 10 ′ described with reference to FIGS. 2 and 3, in the substrate 2 in which the range of the mounting surface 12 is the mounting surface of the substrate 2. It is smaller than the range of the back surface, and the range of the mounting area 13 is inside the range of the back surface of the substrate 2 and is equal to the range of the mounting surface 12. Because the mounting surface 12 is inside the substrate 2 when the substrate 2 is mounted on the mounting surface 12, the substrate 2 is mounted between the outer periphery of the substrate 2 and the mounting area 13 on the back surface of the substrate 2. There is a non-contact area 6 which is an area where the surface 12 does not contact.

載置面12を基板2の被載置面である基板2の裏面より小さくすることにより、基板2の裏面に非接触領域6を設けることができ、基板2の外周とは接触せずに内側のみを載置できる。載置面12に溶液材料が直接堆積しないので、載置面12と基板2との隙間に溶液材料が載置面12を伝い毛細管現象により入り込むことを防ぐことができる。また、基板2に塗布された後、基板側面7を伝ってくる溶液材料は、基板2の裏面で重力の影響を受けるため、載置面12と基板2との隙間まで伝うことを低減できる。こうすることで、溶液材料が載置面12と基板2との隙間に毛細管現象により入り込み、基板2の裏面へ溶液材料が回り込むことを低減できる。また、吸着部11からの負圧が、基板2と載置面12との間の隙間にも働くことより、載置面12周辺に負圧が生じるが、載置面12の外周と基板2の外周との間に距離があるため、この負圧によって基板2外周部近傍の溶液材料が基板2と載置面12との間の隙間に引き込まれることを低減することができる。   By making the mounting surface 12 smaller than the back surface of the substrate 2 which is the mounting surface of the substrate 2, the non-contact region 6 can be provided on the back surface of the substrate 2 and the inner side without contacting the outer periphery of the substrate 2. Can only be placed. Since the solution material is not deposited directly on the mounting surface 12, it is possible to prevent the solution material from flowing along the mounting surface 12 and entering the gap between the mounting surface 12 and the substrate 2 by capillary action. In addition, since the solution material transmitted to the substrate side surface 7 after being applied to the substrate 2 is affected by the gravity on the back surface of the substrate 2, the propagation to the gap between the mounting surface 12 and the substrate 2 can be reduced. By doing this, it is possible to reduce that the solution material gets into the gap between the mounting surface 12 and the substrate 2 by capillary action and the solution material gets around to the back surface of the substrate 2. In addition, although negative pressure from the suction unit 11 also acts on the gap between the substrate 2 and the mounting surface 12, negative pressure is generated around the mounting surface 12, but the outer periphery of the mounting surface 12 and the substrate 2 Since the distance between the substrate 2 and the outer periphery of the substrate 2 is reduced, the negative pressure can reduce the attraction of the solution material in the vicinity of the outer periphery of the substrate 2 into the gap between the substrate 2 and the mounting surface 12.

本発明の実施例2の載置装置20は、実施例1の載置装置10に対して、基板2が載置面12に載置された時に基板2の載置面12からはみ出た基板2の裏面の部分である非接触領域6に気体を吹き付ける吹き出し部26を更に有している。   The mounting apparatus 20 according to the second embodiment of the present invention is a substrate 2 protruding from the mounting surface 12 of the substrate 2 when the substrate 2 is mounted on the mounting surface 12 with respect to the mounting apparatus 10 according to the first embodiment. It further has the blowing part 26 which blows gas on the non-contact area | region 6 which is a part of back surface of.

本発明の実施例2の載置装置の一例について、図8を用いて説明する。図8は、実施例1で説明した図6におけるe矢視図と同じ方向から見た概略立面図である。以下、実施例1と同じ構造のものについては、実施例1と同じ符号を用いている。実施例2の載置装置20の吹き出し部26は、載置装置20の側面に開口する吹き出し口27と、吹き出し口27に連通する複数の貫通孔28と、複数の貫通孔28に連通する図示しない圧空供給装置を有している。   An example of the mounting apparatus of Example 2 of this invention is demonstrated using FIG. FIG. 8 is a schematic elevation view seen from the same direction as the e arrow view in FIG. 6 described in the first embodiment. Hereinafter, the same reference numerals as those of the first embodiment are used for the same structures as the first embodiment. The blowout portion 26 of the mounting apparatus 20 according to the second embodiment includes a blowout port 27 opened on the side surface of the mounting apparatus 20, a plurality of through holes 28 communicating with the blowout port 27, and a plurality of through holes 28 Not have a pressurized air supply device.

吹き出し口27は、吹き出し口27から吹き出した気体が非接触領域6にあたるように載置装置20の側面から鉛直方向に対して、たとえば15°程度の所定の角度をつけて設けられた載置装置20の側面に開口する連続した溝である。その溝の断面形状は溝の全周に亘って均一であり、溝の側面が先述の鉛直方向からの所定の角度に平行で、溝の底面が先述の鉛直方向からの所定の角度に対して直交する、溝の底面と側面との間の角度が直角な台形をしている。ここで、溝断面の寸法は、たとえば、溝の側面間、すなわち、溝の幅方向の寸法が数mmから10mm程度であり、溝の深さの寸法が、溝の底の浅い方、すなわち、載置装置20の側面と吹き出し口27との下側の交点から溝の底までの間の寸法が数mmから10mm程度である。   The outlet 27 is provided at a predetermined angle of, for example, about 15 ° with respect to the vertical direction from the side surface of the mounting device 20 so that the gas blown out from the outlet 27 hits the non-contact area 6 It is a continuous groove opening on the side of 20. The cross-sectional shape of the groove is uniform over the entire circumference of the groove, the side surface of the groove is parallel to the predetermined angle from the vertical direction described above, and the bottom of the groove is relative to the predetermined angle from the vertical direction described above The angle between the bottom and the side of the groove perpendicular to each other is trapezoidal. Here, the dimension of the groove cross section is, for example, between the side surfaces of the groove, that is, the dimension in the width direction of the groove is about several mm to 10 mm, and the dimension of the depth of the groove is the shallower of the bottom of the groove, ie, The dimension from the lower intersection point of the side surface of the mounting device 20 and the outlet 27 to the bottom of the groove is about several mm to 10 mm.

貫通孔28は、吹き出し口27から吹き出される気体の流量分布または速度分布が略均一になるように、吹き出し口27の溝底に複数配置されている。また、吹き出し口27の溝の断面方向の貫通孔28の角度は、吹き出し口27から吹き出される気体が非接触領域6にまっすぐに当たるように、吹き出し口27の溝の側面に平行である。   A plurality of through holes 28 are disposed at the bottom of the groove of the outlet 27 so that the flow rate distribution or velocity distribution of the gas blown out from the outlet 27 is substantially uniform. Further, the angle of the through hole 28 in the cross-sectional direction of the groove of the outlet 27 is parallel to the side surface of the groove of the outlet 27 so that the gas blown out from the outlet 27 strikes the non-contact area 6 straight.

図示しない圧空供給装置にて複数の貫通孔28を経由して吹き出し口27に圧空を供給することで、非接触領域6に向けて気体を吹き付ける。こうすることで、非接触領域6に向けて吹き出し部26から吹き出された気流が、基板2に塗布された後、基板側面7を伝ってくる溶液材料にあたることで、その溶液材料がそれ以上基板2の裏面側に回り込むことを低減できる。   By supplying compressed air to the outlet 27 via the plurality of through holes 28 by a compressed air supply device (not shown), the gas is blown toward the non-contact area 6. In this way, the air flow blown out from the blowout part 26 toward the non-contact area 6 is applied to the substrate 2 and then hits the solution material transmitted through the substrate side surface 7 so that the solution material becomes more substrate It is possible to reduce the wrap around 2 back side.

本発明の実施例3の載置装置の一例について、図9および図10を用いて説明する。図9は、実施例3の載置装置30の概略平面図であり、図10は、図9のf矢視図である。実施例3の載置装置30は、実施例2で説明した載置装置20と比較して、載置面12の周囲に、表面高さが載置面12の表面高さより低い肩落とし部34を更に有している。本実施例では、吹き出し部36は肩落とし部34に設けられている。   An example of the mounting apparatus of Example 3 of this invention is demonstrated using FIG. 9 and FIG. FIG. 9 is a schematic plan view of the mounting device 30 of the third embodiment, and FIG. 10 is a view on arrow f in FIG. The mounting apparatus 30 of the third embodiment has a shoulder drop portion 34 whose surface height is lower than the surface height of the mounting surface 12 around the mounting surface 12 as compared with the mounting apparatus 20 described in the second embodiment. Furthermore, it has. In the present embodiment, the blowout portion 36 is provided in the shoulder removing portion 34.

ここで、肩落とし部34は、載置面12より、たとえば10mm程度低い載置面12と平行な面であり、その面の範囲は基板2の非接触領域6の範囲より広く、載置面12に垂直な方向からみて基板2より外側に肩落とし部34がでている。   Here, the shoulder drop portion 34 is a surface parallel to the mounting surface 12 lower than the mounting surface 12 by, for example, about 10 mm, and the range of the surface is wider than the range of the non-contact area 6 of the substrate 2 A shoulder drop 34 appears outside the substrate 2 as viewed in the direction perpendicular to the arrow 12.

吹き出し部36は、肩落とし部34の表面に開口する吹き出し口37と、吹き出し口37に連通する複数の貫通孔38と、複数の貫通孔38に連通する図示しない圧空供給装置とを有している。吹き出し口37は、吹き出し部36から吹き出した気体が非接触領域6にあたるように、載置面12の外周から、例えば数mm程度の一定の距離を離して、非接触領域6と対向するように肩落とし部34の表面上に非接触領域6に対して垂直な方向に開口する連続した溝である。溝の断面形状は、溝の全周に渡って均一であり、たとえば、幅数mmから10mm程度、深さ数mmから10mm程度の図9に示すような矩形の形状である。貫通孔38は、吹き出し口37から吹き出される気体の流量分布または速度分布が略均一になるように、吹き出し口37の溝底に複数配置されている。図示しない圧空供給装置にて複数の貫通孔38を経由して吹き出し口37に圧空を供給することで、非接触領域6に向けて肩落とし部34側から気体を吹き付ける。   The blowout section 36 has a blowout port 37 opened on the surface of the shoulder drop section 34, a plurality of through holes 38 communicating with the blowout port 37, and a not-shown pressurized air supply device communicating with the plurality of through holes 38. There is. The blowout port 37 faces the noncontact area 6 at a constant distance of, for example, several mm away from the outer periphery of the mounting surface 12 so that the gas blown out from the blowout portion 36 hits the noncontact area 6. It is a continuous groove opened in the direction perpendicular to the non-contact area 6 on the surface of the shoulder drop portion 34. The cross-sectional shape of the groove is uniform over the entire circumference of the groove, and is, for example, a rectangular shape as shown in FIG. 9 having a width of several mm to about 10 mm and a depth of several mm to about 10 mm. A plurality of through holes 38 are arranged at the bottom of the groove of the outlet 37 so that the flow rate distribution or velocity distribution of the gas blown out from the outlet 37 is substantially uniform. By supplying compressed air to the blow-out port 37 via the plurality of through holes 38 by a compressed air supply device (not shown), gas is sprayed from the shoulder drop portion 34 toward the non-contact area 6.

肩落とし部34を設けることで、肩落とし部34側から吹き出された気流が、非接触領域6にあたった後、基板2の外側に流れやすくなる。このため、基板側面7を伝い基板2の裏面に回り込んだ溶液材料が、基板2の外側に流れる気流にあたり、それより内側に溶液材料が回り込むことを肩落とし部34を設けない場合よりも低減できる。こうすることで、溶液材料の基板2の裏面への回り込みを低減できる。   By providing the shoulder drop portion 34, the air flow blown out from the shoulder drop portion 34 can easily flow to the outside of the substrate 2 after hitting the non-contact area 6. For this reason, the solution material which has traveled to the back surface of the substrate 2 along the substrate side surface 7 receives the air flow flowing to the outside of the substrate 2 and the solution material does not flow around inside than it is reduced compared to the case where the shoulder drop portion 34 is not provided. it can. By doing this, the wraparound of the solution material to the back surface of the substrate 2 can be reduced.

ここで、肩落とし部34を設けることにより、基板2に堆積せずに基板2の外側を通過した溶液材料の一部が肩落とし部34に堆積するが、肩落とし部34の表面高さは載置装置30の載置面12の表面高さより低いため、載置面12と基板2との隙間まで肩落とし部34上に堆積するその溶液材料が届かない。このため、毛細管現象により載置面12と基板2との隙間に溶液材料が入り込むことを防ぐことができる。   Here, by providing the shoulder drop portion 34, a portion of the solution material that has passed through the outside of the substrate 2 without being deposited on the substrate 2 is deposited on the shoulder drop portion 34, but the surface height of the shoulder drop portion 34 is Since the height is lower than the surface height of the mounting surface 12 of the mounting device 30, the solution material deposited on the shoulder removal portion 34 does not reach the gap between the mounting surface 12 and the substrate 2. Therefore, the solution material can be prevented from entering the gap between the mounting surface 12 and the substrate 2 due to the capillary phenomenon.

本発明の実施例4の載置装置40は、実施例3の載置装置30と比べて、肩落とし部34の形状が異なる。本発明の実施例4の載置装置の一例について、図11を用いて説明する。図11は、実施例1で説明した図6におけるe矢視図と同じ方向から見た概略立面図である。以下、実施例1と同じ構造のものについては、実施例1と同じ符号を用いている。   The placement device 40 of the fourth embodiment of the present invention differs from the placement device 30 of the third embodiment in the shape of the shoulder drop portion 34. An example of the mounting apparatus of Example 4 of this invention is demonstrated using FIG. FIG. 11 is a schematic elevation view seen from the same direction as the e arrow view in FIG. 6 described in the first embodiment. Hereinafter, the same reference numerals as those of the first embodiment are used for the same structures as the first embodiment.

実施例4の肩落とし部44は、基板2の被載置面である基板2の裏面の外周に近い側の表面である第1面41の高さが、それ以外の表面である第2面42の高さより高い、第1面41が第2面42よりも基板2の裏面に近づいた形状を有している。ここで、吹き出し部46の吹き出し口47は、第2面42に開口している。   The shoulder drop portion 44 of the fourth embodiment has a second surface which is a surface other than the first surface 41 which is the surface on the side close to the outer periphery of the back surface of the substrate 2 which is the mounting surface of the substrate 2. The first surface 41, which is higher than the height 42, has a shape closer to the back surface of the substrate 2 than the second surface 42. Here, the blowout port 47 of the blowout portion 46 is open to the second surface 42.

ここで、第2面42は、載置面12の周囲を取り囲む載置面12と平行な面であり、その範囲は非接触領域6の範囲の内側である。   Here, the second surface 42 is a surface parallel to the mounting surface 12 surrounding the periphery of the mounting surface 12, and the range thereof is inside the range of the non-contact region 6.

また、第1面41は、載置面12の周囲を取り囲む第2面42の周囲を更に取り囲む面であり、また、載置面12より、たとえば5mm程度低い載置面12と平行な面である。非接触領域6において第1面41と対向する範囲は、基板側面7から、たとえば10mm程度の一定の距離の範囲である。   Further, the first surface 41 is a surface further surrounding the periphery of the second surface 42 surrounding the periphery of the mounting surface 12, and is a surface parallel to the mounting surface 12 lower than the mounting surface 12 by, for example, about 5 mm. is there. The range facing the first surface 41 in the non-contact area 6 is a range of a fixed distance of, for example, about 10 mm from the substrate side surface 7.

第2面42の表面高さは、第1面41の表面高さより、たとえば10mm程度低い。これにより、非接触領域6と肩落とし部44との間の空間は、基板2の外側に向けて絞られた形状を有している。   The surface height of the second surface 42 is, for example, about 10 mm lower than the surface height of the first surface 41. Thereby, the space between the non-contact area 6 and the shoulder drop portion 44 has a shape narrowed toward the outside of the substrate 2.

非接触領域6から基板2の外側へ流れる吹き出し部46からの気流の速度を、肩落とし部44と非接触領域6との間の空間を基板2の外側に向けて絞った形状とすることで、肩落とし部44と非接触領域6との間の空間を基板2の外側へ向けて絞らない形状の場合よりも速くできる。こうすることで、基板2に堆積せずに基板2の外側を通過する噴霧された溶液材料や基板2の表面を伝う基板2に塗布された溶液材料の基板2の裏面側への回り込みを肩落とし部44と非接触領域6との間の空間を基板2の外側へ向けて絞らない形状とした場合よりも低減できる。   By setting the velocity of the air flow from the blowout portion 46 flowing from the noncontact region 6 to the outside of the substrate 2 in such a shape that the space between the shoulder drop 44 and the noncontact region 6 is narrowed toward the outside of the substrate 2 The space between the shoulder drop 44 and the non-contact area 6 can be made faster than in the case of the non-squeezed shape toward the outside of the substrate 2. By doing this, the rolled solution material that passes through the outside of the substrate 2 without being deposited on the substrate 2 or the solution material applied to the substrate 2 that travels on the surface of the substrate 2 The space between the drop portion 44 and the non-contact area 6 can be reduced more than in the case where the shape is not narrowed toward the outside of the substrate 2.

本発明の実施例5の載置装置50は、実施例3の載置装置30と比べて、肩落とし部34の形状が異なる。本発明の実施例5の載置装置の一例について、図12を用いて説明する。図12は、実施例1で説明した図6におけるe矢視図の概略立面図である。以下、実施例1と同じ構造のものについては、実施例1と同じ符号を用いている。   The placement device 50 according to the fifth embodiment of the present invention differs from the placement device 30 according to the third embodiment in the shape of the shoulder drop portion 34. An example of the mounting apparatus of Example 5 of this invention is demonstrated using FIG. FIG. 12 is a schematic elevation view of a view taken in the direction of an arrow e in FIG. 6 described in the first embodiment. Hereinafter, the same reference numerals as those of the first embodiment are used for the same structures as the first embodiment.

実施例5の肩落とし部54は、基板2の被載置面である基板2の裏面に対して垂直な方向から基板2の裏面に向けて投影した肩落とし部54の範囲が、基板2の裏面の外周すなわち基板側面7より、たとえば10mm程度の所定の距離を離した内側の範囲にある。   In the shoulder drop portion 54 of the fifth embodiment, the range of the shoulder drop portion 54 projected toward the back surface of the substrate 2 from the direction perpendicular to the back surface of the substrate 2 which is the mounting surface of the substrate 2 is the same as that of the substrate 2. The outer periphery of the back surface, that is, the inner side separated by a predetermined distance of about 10 mm, for example, from the substrate side surface 7.

ここで、肩落とし部54の外周は、載置装置50の外周に等しい。すなわち、非接触領域6側から載置装置50側を見て、基板側面7から所定の距離の範囲の非接触領域6の下側には、載置装置50は存在していない。   Here, the outer periphery of the shoulder drop portion 54 is equal to the outer periphery of the mounting device 50. That is, the placement device 50 does not exist below the non-contact region 6 in a range of a predetermined distance from the substrate side surface 7 when the placement device 50 side is viewed from the non-contact region 6 side.

肩落とし部54を基板2の範囲より内側に引き込んだ形状とすることにより、非接触領域6において、吹き出し部56からの気流の向きが、非接触領域6にあたった後、肩落とし部54がない方向、すなわち、載置装置50の側面に沿って基板2のある方向と反対方向に向くことにより、基板2の表面側への気流の吹込みを防ぐことができる。こうすることで吹き出し部56からの気流が基板2の表面側に吹込み、基板2へ向けて噴霧された溶液材料に干渉し基板2の表面上への塗布状態に影響を与えることを低減できる。   By forming the shoulder drop portion 54 inward from the range of the substrate 2, in the non-contact region 6, after the direction of the air flow from the blowout portion 56 hits the non-contact region 6, the shoulder drop portion 54 By facing in the opposite direction, that is, in the direction opposite to the direction in which the substrate 2 is present along the side surface of the mounting device 50, it is possible to prevent the blowing of the air flow to the surface side of the substrate 2. By doing this, it is possible to reduce that the air flow from the blowout part 56 blows to the surface side of the substrate 2 and interferes with the solution material sprayed toward the substrate 2 to affect the application state on the surface of the substrate 2 .

以上、本発明の実施例について説明したが、本発明はこれらに限定されるものではない。たとえば、吸着部は貫通孔の集合に限らず、たとえば載置面12に環状や格子状等に開口する溝であってもかまわない。また多孔質状であってもかまわない。また、負圧付加機構で吸着する代わりに静電吸着してよい。また、吸着部を有していなくてもよい。   As mentioned above, although the Example of this invention was described, this invention is not limited to these. For example, the suction portion is not limited to the set of through holes, and may be, for example, a groove opened in a ring shape or a lattice shape on the mounting surface 12. It may be porous. In addition, instead of adsorption by a negative pressure application mechanism, electrostatic adsorption may be performed. Moreover, it is not necessary to have an adsorption part.

たとえば、実施例2から5において、吹き出し部の吹き出し口は連続した溝でなくてもよい。また、溝の断面形状は溝の全周に渡って均一でなくてもよい。また、吹き出し口の溝の幅は数mmより小さくてもよいし、10mmより大きくてもよい。また、吹き出し部の溝の深さは数mmより小さくてもよいし、10mmより大きくてもよい。また、溝の断面形状は、たとえば、半円のように矩形でなくてもよい。また、吹き出し口は溝でなく、たとえば、複数の貫通孔を一列に並べらたようなものでもよい。   For example, in the second to fifth embodiments, the outlet of the outlet may not be a continuous groove. Also, the cross-sectional shape of the groove may not be uniform over the entire circumference of the groove. In addition, the width of the groove of the outlet may be smaller than several mm, or may be larger than 10 mm. Moreover, the depth of the groove of the blowout part may be smaller than several mm, and may be larger than 10 mm. Also, the cross-sectional shape of the groove may not be rectangular, for example, semi-circular. Also, the outlet may not be a groove, and may be, for example, a plurality of through holes arranged in a line.

また、吹き出し口に連通する貫通孔は、複数でなくてもよい。たとえば、吹き出し口の溝の各辺に一つづつの貫通孔を設けてもよいし、溝全体で1つの貫通孔でもよい。また吹き出し口に連通する貫通孔は吹き出し口の溝の底ではなく、側面等に開口していてもよい。貫通孔の代わりに、たとえば、吹き出し口の溝の内部に開口する溝や多孔質状の内壁を有する溝でもよい。   Further, the number of through holes communicating with the blowout port may not be plural. For example, one through hole may be provided on each side of the groove of the outlet, or one through hole may be provided for the entire groove. Further, the through hole communicating with the blowout port may be opened not to the bottom of the groove of the blowout port but to a side surface or the like. Instead of the through hole, for example, a groove having a groove opened inside the groove of the outlet or a groove having a porous inner wall may be used.

また、載置装置の側面や肩落とし部の表面に吹き出し口を設けずに、たとえば、載置装置の側面から離れた位置や、肩落とし部と非接触領域との間の空間に位置し、非接触領域に向けて気体を吹き出すノズルを設ける等、非接触領域に向けて気体を吹き出すものであればよい。   Also, without providing a blowout port on the side surface of the mounting device or on the surface of the shoulder removal portion, for example, it is located at a position away from the side surface of the mounting device or in the space between the shoulder removal portion and the non-contact area What is necessary is just to blow out a gas toward a non-contact area | region, such as providing the nozzle which blows off a gas towards a non-contact area | region.

また、実施例3から5において、肩落とし部は載置面と平行な面でなくてもよい。   Further, in the third to fifth embodiments, the shoulder drop portion may not be a plane parallel to the mounting surface.

また、実施例4において、第1面41および第2面42は、載置面12と平行な面でなくてもよく、たとえば、基板側面7に向けて次第に近づくような連続した斜面でもよい。また、非接触領域6と第1面41との間の距離は、5mmに限らず、また、基板2の外周に沿った方向の範囲でその距離が変わってもよい。また、第1面41の非接触領域と対向する範囲は、基板側面7から10mm程度でなくてもよく、たとえば、数mm以下でもよく、また、基板側面7から載置装置40側に基板側面7から離れた位置で対向していてもよい。   In the fourth embodiment, the first surface 41 and the second surface 42 may not be parallel to the mounting surface 12, and may be, for example, a continuous slope which gradually approaches the substrate side surface 7. Further, the distance between the non-contact area 6 and the first surface 41 is not limited to 5 mm, and the distance may change in the range along the outer periphery of the substrate 2. Further, the range facing the non-contact area of the first surface 41 may not be about 10 mm from the substrate side surface 7, for example, may be several mm or less, and the substrate side surface from the substrate side surface 7 to the mounting device 40 side It may be opposed at a position away from 7.

また、実施例5の肩落とし部54の外周と基板側面7との間の距離は10mmでなくてもよい。また、実施例4と同じように、非接触領域6と肩落とし部54との間の空間を、基板2の外側に向けて絞られたような形状としてもよい。   Further, the distance between the outer periphery of the shoulder portion 54 of the fifth embodiment and the substrate side surface 7 may not be 10 mm. Further, as in the fourth embodiment, the space between the non-contact area 6 and the shoulder drop portion 54 may be shaped so as to be narrowed toward the outside of the substrate 2.

1 エレクトロスプレー装置
2 基板
3 ノズル
4 電圧制御部
6 非接触領域
7 基板側面
10、20、30、40、50 載置装置
11 吸着部
12 載置面
13 載置領域
15 貫通孔
26、36、46、56 吹き出し部
27、37、47、57 吹き出し口
28、38、47、57 貫通孔
34、44、54 肩落とし部
41 第1面
42 第2面
DESCRIPTION OF SYMBOLS 1 electrospray apparatus 2 board | substrate 3 nozzle 4 voltage control part 6 non-contact area | region 7 board | substrate side 10, 20, 30, 40, 50 mounting apparatus 11 adsorption | suction part 12 mounting surface 13 mounting area 15 through hole 26, 36, 46 , 56 blowout portion 27, 37, 47, 57 blowout port 28, 38, 47, 57 through hole 34, 44, 54 shoulder removing portion 41 first surface 42 second surface

Claims (6)

液体が塗布される基板が載置される載置装置において、
前記基板が載置される載置面は、前記基板の被載置面の外周より内側の範囲に収まる大きさの面であることを特徴とする、載置装置。
In the mounting apparatus on which the substrate to which the liquid is applied is mounted,
The mounting apparatus according to claim 1, wherein the mounting surface on which the substrate is mounted is a surface having a size that falls within a range inside the outer periphery of the mounting surface of the substrate.
前記基板の被載置面において、前記基板が前記載置面に載置された際に前記載置面からはみ出る部分である非接触領域に向けて、気体を吹き出す吹き出し部を有することを特徴とする、請求項1に記載の載置装置。   The substrate mounting surface has a blowout portion for blowing out gas toward a non-contact area which is a portion protruding from the mounting surface when the substrate is mounted on the mounting surface. The mounting apparatus according to claim 1. 前記載置面を囲い、前記載置面より表面高さが低い肩落とし部を有することを特徴とする、請求項2に記載の載置装置。   The mounting apparatus according to claim 2, characterized in that the mounting surface is enclosed and a shoulder drop portion having a surface height lower than the mounting surface is provided. 前記肩落とし部は、前記基板の被載置面の外周に近い側の表面の高さが、それ以外の表面の高さより高いことを特徴とする、請求項3に記載の載置装置。   The mounting apparatus according to claim 3, wherein a height of a surface close to an outer periphery of the mounting surface of the substrate is higher than a height of the other surfaces of the shoulder drop portion. 前記肩落とし部は、前記基板の被載置面に対して垂直な方向から前記基板の被載置面に向けて投影した前記肩落とし部の範囲が、前記基板の被載置面の外周より内側にあることを特徴とする、請求項3または4に記載の載置装置。   In the shoulder drop portion, the range of the shoulder drop portion projected toward the mounting surface of the substrate from the direction perpendicular to the mounting surface of the substrate is from the outer periphery of the mounting surface of the substrate The mounting device according to claim 3 or 4, characterized in that it is inside. 前記載置装置は、前記載置面に開口する吸着部と、
前記吸着部に連通する負圧付加機構と、を有することを特徴とする、請求項1から5に記載の載置装置。
The placement device includes a suction unit that opens to the placement surface.
The mounting apparatus according to any one of claims 1 to 5, further comprising: a negative pressure applying mechanism in communication with the suction unit.
JP2017227379A 2017-11-28 2017-11-28 Placing device Pending JP2019093369A (en)

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