JP2019089967A - Allyl group-containing carbonate resin, method for producing the same, resin varnish, and method for producing laminated plate - Google Patents
Allyl group-containing carbonate resin, method for producing the same, resin varnish, and method for producing laminated plate Download PDFInfo
- Publication number
- JP2019089967A JP2019089967A JP2017220710A JP2017220710A JP2019089967A JP 2019089967 A JP2019089967 A JP 2019089967A JP 2017220710 A JP2017220710 A JP 2017220710A JP 2017220710 A JP2017220710 A JP 2017220710A JP 2019089967 A JP2019089967 A JP 2019089967A
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- Japan
- Prior art keywords
- compound
- resin
- allyl group
- group
- carbonate resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920005989 resin Polymers 0.000 title claims abstract description 239
- 239000011347 resin Substances 0.000 title claims abstract description 239
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 title claims abstract description 126
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 title claims abstract description 90
- 239000002966 varnish Substances 0.000 title claims abstract description 87
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- -1 bisphenol compound Chemical class 0.000 claims abstract description 218
- 150000001875 compounds Chemical class 0.000 claims abstract description 66
- 239000003822 epoxy resin Substances 0.000 claims abstract description 58
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 58
- 229930185605 Bisphenol Natural products 0.000 claims abstract description 53
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims description 76
- 239000000463 material Substances 0.000 claims description 39
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 34
- 239000002904 solvent Substances 0.000 claims description 33
- 150000005690 diesters Chemical class 0.000 claims description 20
- 239000007795 chemical reaction product Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 claims description 10
- 150000004650 carbonic acid diesters Chemical class 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 34
- 239000000047 product Substances 0.000 description 50
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 23
- 239000003054 catalyst Substances 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 19
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 16
- 230000009477 glass transition Effects 0.000 description 15
- 238000005979 thermal decomposition reaction Methods 0.000 description 14
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 13
- 239000002585 base Substances 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 12
- 239000007809 chemical reaction catalyst Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 12
- 239000011572 manganese Substances 0.000 description 12
- 229920003986 novolac Polymers 0.000 description 12
- 238000005227 gel permeation chromatography Methods 0.000 description 11
- 239000007787 solid Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000010517 secondary reaction Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 125000002723 alicyclic group Chemical group 0.000 description 9
- 239000000835 fiber Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 125000001424 substituent group Chemical group 0.000 description 9
- 239000004744 fabric Substances 0.000 description 7
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 6
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 6
- 230000009257 reactivity Effects 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 5
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 5
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 description 5
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 238000006266 etherification reaction Methods 0.000 description 5
- 239000011151 fibre-reinforced plastic Substances 0.000 description 5
- 239000002648 laminated material Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005809 transesterification reaction Methods 0.000 description 5
- 238000005538 encapsulation Methods 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920003192 poly(bis maleimide) Polymers 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 3
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical group C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- OWEYKIWAZBBXJK-UHFFFAOYSA-N 1,1-Dichloro-2,2-bis(4-hydroxyphenyl)ethylene Chemical compound C1=CC(O)=CC=C1C(=C(Cl)Cl)C1=CC=C(O)C=C1 OWEYKIWAZBBXJK-UHFFFAOYSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000000306 component Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012772 electrical insulation material Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 2
- NAKOELLGRBLZOF-UHFFFAOYSA-N phenoxybenzene;pyrrole-2,5-dione Chemical compound O=C1NC(=O)C=C1.O=C1NC(=O)C=C1.C=1C=CC=CC=1OC1=CC=CC=C1 NAKOELLGRBLZOF-UHFFFAOYSA-N 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- UGJHILWNNSROJV-UHFFFAOYSA-N 1-[4-[3-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1OC1=CC=CC(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)=C1 UGJHILWNNSROJV-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- NWZKSTUZKJCCMK-UHFFFAOYSA-N 2-(2-methylimidazol-1-yl)acetonitrile Chemical compound CC1=NC=CN1CC#N NWZKSTUZKJCCMK-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- QDFXRVAOBHEBGJ-UHFFFAOYSA-N 3-(cyclononen-1-yl)-4,5,6,7,8,9-hexahydro-1h-diazonine Chemical compound C1CCCCCCC=C1C1=NNCCCCCC1 QDFXRVAOBHEBGJ-UHFFFAOYSA-N 0.000 description 1
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 1
- VXPSQDAMFATNNG-UHFFFAOYSA-N 3-[2-(2,5-dioxopyrrol-3-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C(=CC=CC=2)C=2C(NC(=O)C=2)=O)=C1 VXPSQDAMFATNNG-UHFFFAOYSA-N 0.000 description 1
- MOSSLXZUUKTULI-UHFFFAOYSA-N 3-[3-(2,5-dioxopyrrol-3-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(C=2C(NC(=O)C=2)=O)C=C1C1=CC(=O)NC1=O MOSSLXZUUKTULI-UHFFFAOYSA-N 0.000 description 1
- QCMKXHXKNIOBBC-UHFFFAOYSA-N 3-fluoroprop-1-ene Chemical compound FCC=C QCMKXHXKNIOBBC-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 description 1
- VOWWYDCFAISREI-UHFFFAOYSA-N Bisphenol AP Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=CC=C1 VOWWYDCFAISREI-UHFFFAOYSA-N 0.000 description 1
- HTVITOHKHWFJKO-UHFFFAOYSA-N Bisphenol B Chemical compound C=1C=C(O)C=CC=1C(C)(CC)C1=CC=C(O)C=C1 HTVITOHKHWFJKO-UHFFFAOYSA-N 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- YCPHNYDJZJGPRE-UHFFFAOYSA-N C(CC)N1C(=NC=C1)C.C(=C)N1C(=NC=C1)C Chemical compound C(CC)N1C(=NC=C1)C.C(=C)N1C(=NC=C1)C YCPHNYDJZJGPRE-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 235000012766 Cannabis sativa ssp. sativa var. sativa Nutrition 0.000 description 1
- 235000012765 Cannabis sativa ssp. sativa var. spontanea Nutrition 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 238000005821 Claisen rearrangement reaction Methods 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- UUQQGGWZVKUCBD-UHFFFAOYSA-N [4-(hydroxymethyl)-2-phenyl-1h-imidazol-5-yl]methanol Chemical compound N1C(CO)=C(CO)N=C1C1=CC=CC=C1 UUQQGGWZVKUCBD-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001502 aryl halides Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 150000001555 benzenes Chemical group 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 235000009120 camo Nutrition 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 235000005607 chanvre indien Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- VEIOBOXBGYWJIT-UHFFFAOYSA-N cyclohexane;methanol Chemical compound OC.OC.C1CCCCC1 VEIOBOXBGYWJIT-UHFFFAOYSA-N 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000011487 hemp Substances 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical class [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- BNHFWQQYLUPDOG-UHFFFAOYSA-N lithium;1,2,2,3-tetramethylpiperidine Chemical compound [Li].CC1CCCN(C)C1(C)C BNHFWQQYLUPDOG-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 125000005634 peroxydicarbonate group Chemical group 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- HEPBQSXQJMTVFI-UHFFFAOYSA-N zinc;butane Chemical compound [Zn+2].CCC[CH2-].CCC[CH2-] HEPBQSXQJMTVFI-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/067—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of fibres or filaments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/16—Aliphatic-aromatic or araliphatic polycarbonates
- C08G64/1691—Aliphatic-aromatic or araliphatic polycarbonates unsaturated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
- C08G64/30—General preparatory processes using carbonates
- C08G64/305—General preparatory processes using carbonates and alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/20—General preparatory processes
- C08G64/30—General preparatory processes using carbonates
- C08G64/307—General preparatory processes using carbonates and phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/10—Inorganic fibres
- B32B2262/101—Glass fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/204—Di-electric
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
- C08J2479/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2479/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Reinforced Plastic Materials (AREA)
- Polyesters Or Polycarbonates (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本発明は、アリル基含有カーボネート樹脂、その製造方法、樹脂ワニス、および積層板の製造方法に関する。 The present invention relates to an allyl group-containing carbonate resin, a method for producing the same, a resin varnish, and a method for producing a laminate.
従来、電子製品に用いられる部材、例えば絶縁性の積層板やその片面又は両面に銅箔が積層した積層板(銅張積層板)に、エポキシ樹脂が用いられている。積層板は、例えばエポキシ樹脂、硬化剤等が溶剤に溶解した樹脂ワニスをガラスクロス等の繊維質基材に含浸させ、乾燥してプリプレグとし、これを単独で又は複数枚を重ねて熱プレスすることで製造される。エポキシ樹脂の硬化剤としては、フェノールとホルムアルデヒドを用いたフェノールノボラック樹脂が広く使用されている。 BACKGROUND ART Epoxy resins are conventionally used for members used in electronic products, such as insulating laminates and laminates (copper-clad laminates) in which copper foil is laminated on one side or both sides thereof. For example, a resin varnish in which an epoxy resin, a curing agent, etc. is dissolved in a solvent is impregnated into a fibrous base material such as glass cloth and dried to form a prepreg, which is heat-pressed singly or in combination. Manufactured by As a curing agent for epoxy resin, phenol novolac resin using phenol and formaldehyde is widely used.
近年、電子製品の高性能化が図られる中、積層板を構成する樹脂にさらなる低誘電率、低誘電正接が求められている。エポキシ樹脂をフェノールノボラック樹脂で硬化させた硬化物の電気特性(低誘電率、低誘電正接)は、汎用の電子製品に要求されるレベルを満たすことはできても、高性能電子製品(スマートフォン、タブレット等)に要求されるレベルを満たすことは困難である。 In recent years, while higher performance of electronic products has been achieved, lower dielectric constants and lower dielectric loss tangents are required of resins constituting laminates. The electrical properties (low dielectric constant, low dielectric loss tangent) of the cured product of epoxy resin cured with phenol novolac resin can meet the level required for general purpose electronic products, but it is a high performance electronic product (smartphone, It is difficult to meet the level required for tablets etc.).
2官能フェニレンエーテルオリゴマーをエポキシ樹脂硬化剤として用いることが提案されている(特許文献1)。かかるエポキシ樹脂硬化剤によれば、電気特性に優れたエポキシ樹脂硬化物が得られるとされている。
しかし、特許文献1のエポキシ樹脂硬化剤を用いた硬化物の誘電正接は未だ十分に低いとはいえない。
It has been proposed to use a bifunctional phenylene ether oligomer as an epoxy resin curing agent (Patent Document 1). According to such an epoxy resin curing agent, it is said that an epoxy resin cured product having excellent electrical properties can be obtained.
However, the dielectric loss tangent of the cured product using the epoxy resin curing agent of Patent Document 1 is not yet sufficiently low.
本発明は、マレイミド硬化剤として使用でき、低誘電率、低誘電正接の硬化物が得られるアリル基含有カーボネート樹脂およびその製造方法、ならびに低誘電率、低誘電正接の硬化物が得られる樹脂ワニスおよびこれを用いた積層板の製造方法を提供することを目的とする。 The present invention is an allyl group-containing carbonate resin which can be used as a maleimide curing agent and provides a cured product having a low dielectric constant and a low dielectric loss tangent, a method for producing the same, and a resin varnish capable of obtaining a cured product having a low dielectric constant and a low dielectric loss tangent. And it aims at providing the manufacturing method of the laminated board using this.
本発明は、以下の態様を有する。
〔1〕下記式(1)で表される化合物を主成分として含むアリル基含有カーボネート樹脂。
〔2〕前記式(1)中のR1が、アリル基含有ビスフェノール化合物由来の残基またはアリル基含有ビフェノール化合物由来の残基である、〔1〕のアリル基含有カーボネート樹脂。
〔3〕前記式(1)中のR1が、下記式(r1)、下記式(r2)または下記式(r3)で表される基である、〔2〕のアリル基含有カーボネート樹脂。
〔4〕前記式(1)中のn個のR2の少なくとも一部が、脂環式ジメタノール化合物由来の残基である、〔1〕〜〔3〕のいずれかのアリル基含有カーボネート樹脂。
〔5〕炭酸ジエステルと、ビスフェノール化合物、ビフェノール化合物および脂環式ジメタノール化合物からなる群から選ばれる少なくとも1種のジオール化合物とを反応させる工程を有し、前記ジオール化合物の少なくとも一部がアリル基を含有する、アリル基含有カーボネート樹脂の製造方法。
〔6〕前記炭酸エステルと前記ジオール化合物とを反応させる工程が、
炭酸ジエステルと、脂環式ジメタノール化合物とを反応させ、または、炭酸ジエステルと、脂環式ジメタノール化合物と、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させ、一次反応生成物を得て、前記一次反応生成物と、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させる工程、または
炭酸ジエステルと、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させる工程である、〔5〕のアリル基含有カーボネート樹脂の製造方法。
〔7〕前記一次反応生成物を得る際の、前記脂環式ジメタノール化合物と前記芳香族ジオール化合物との合計量に対する前記炭酸ジエステルのモル比が、1.05〜3.00である、〔6〕のアリル基含有カーボネート樹脂の製造方法。
〔8〕前記炭酸エステルと前記ジオール化合物との反応により生成した、末端が水酸基であるアリル基含有カーボネート樹脂と、ハロゲン化アリルとを反応させ、前記水酸基をアリルエーテル化する工程をさらに有する、〔6〕または〔7〕のアリル基含有カーボネート樹脂の製造方法。
〔9〕前記〔1〕〜〔4〕のいずれかのアリル基含有カーボネート樹脂と、マレイミド基を2以上有するマレイミド化合物と、溶剤とを含む樹脂ワニス。
〔10〕前記アリル基含有カーボネート樹脂が、前記式(1)中の2個のXの少なくとも一方が水素原子である化合物を含み、
エポキシ樹脂をさらに含む〔9〕の樹脂ワニス。
〔11〕前記〔9〕または〔10〕の樹脂ワニスを繊維質基材に含浸させ、前記樹脂ワニスが含浸した繊維質基材を加熱加圧し、硬化させて積層板を得る、積層板の製造方法。
The present invention has the following aspects.
[1] An allyl group-containing carbonate resin containing a compound represented by the following formula (1) as a main component.
[2] The allyl group-containing carbonate resin of [1], wherein R 1 in the formula (1) is a residue derived from an allyl group-containing bisphenol compound or a residue derived from an allyl group-containing biphenol compound.
[3] The allyl group-containing carbonate resin of [2], wherein R 1 in the formula (1) is a group represented by the following formula (r1), the following formula (r2) or the following formula (r3).
[4] The allyl group-containing carbonate resin according to any one of [1] to [3], wherein at least a part of n R 2 in the formula (1) is a residue derived from an alicyclic dimethanol compound .
[5] A step of reacting carbonic acid diester with at least one diol compound selected from the group consisting of a bisphenol compound, a biphenol compound and an alicyclic dimethanol compound, wherein at least a part of the diol compound is an allyl group A method for producing an allyl group-containing carbonate resin, comprising
[6] The step of reacting the carbonic ester with the diol compound
A carbonic acid diester is reacted with an alicyclic dimethanol compound, or a carbonic acid diester, an alicyclic dimethanol compound, and at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound Reacting to obtain a primary reaction product, and reacting the primary reaction product with at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound, or a carbonic diester with a bisphenol compound And a process for producing the allyl group-containing carbonate resin of [5], which is a step of reacting with at least one aromatic diol compound selected from the group consisting of biphenol compounds.
[7] The molar ratio of the carbonic diester to the total amount of the alicyclic dimethanol compound and the aromatic diol compound when obtaining the primary reaction product is 1.05 to 3.00, [ 6] The manufacturing method of allyl group containing carbonate resin.
[8] The method further comprising the step of reacting the allyl group-containing carbonate resin having a hydroxyl group at a terminal with an allyl halide, which is produced by the reaction of the carbonic ester with the diol compound, and allyletherifying the hydroxyl group [ 6] Or the manufacturing method of allyl group containing carbonate resin of [7].
[9] A resin varnish comprising the allyl group-containing carbonate resin of any one of the above [1] to [4], a maleimide compound having two or more maleimide groups, and a solvent.
[10] The allyl group-containing carbonate resin contains a compound in which at least one of two X in the formula (1) is a hydrogen atom,
The resin varnish of [9] which further contains an epoxy resin.
[11] A laminate obtained by impregnating a fibrous base material with the resin varnish of the above [9] or [10] and heating and pressing the fibrous base material impregnated with the resin varnish to obtain a laminate. Method.
本発明によれば、マレイミド硬化剤として使用でき、低誘電率、低誘電正接の硬化物が得られるアリル基含有カーボネート樹脂およびその製造方法、ならびに低誘電率、低誘電正接の硬化物が得られる樹脂ワニスおよびこれを用いた積層板の製造方法を提供できる。 According to the present invention, an allyl group-containing carbonate resin which can be used as a maleimide curing agent and can obtain a cured product having a low dielectric constant and a low dielectric loss tangent, a method for producing the same, and a cured product having a low dielectric constant and a low dielectric loss tangent The resin varnish and the manufacturing method of the laminated board using the same can be provided.
≪アリル基含有カーボネート樹脂≫
本発明のアリル基含有カーボネート樹脂(以下、「本カーボネート樹脂」ともいう。)は、下記式(1)で表される化合物を主成分として含む。「主成分」とは、本カーボネート樹脂を構成する成分のうち最も含有量が多い成分を示す。
本カーボネート樹脂は、nの値が異なる複数の化合物の混合物であってよい。
本カーボネート樹脂は、式(1)で表される化合物以外の成分(例えば、後述する式(2)で表される化合物、ビスフェノール化合物、ビフェノール化合物、またはそれらのアリルエーテル化化合物等)を含んでいてもよい。これらの成分は、本カーボネート樹脂の製造に用いられた原料や、製造時に副生した副生物であってもよい。
本カーボネート樹脂中の式(1)で表される化合物の含有量は、80質量%以上が好ましく、90質量%以上がより好ましい。この含有量の上限は特に限定されず、100質量%であってよい。式(1)で表される化合物の含有量は、ゲル浸透クロマトグラフィー(GPC)により測定される。
«Allyl group-containing carbonate resin»
The allyl group-containing carbonate resin of the present invention (hereinafter, also referred to as "the present carbonate resin") contains a compound represented by the following formula (1) as a main component. The "main component" refers to the component having the largest content among the components constituting the present carbonate resin.
The carbonate resin may be a mixture of a plurality of compounds having different values of n.
The present carbonate resin contains components other than the compound represented by the formula (1) (for example, a compound represented by the formula (2) described later, a bisphenol compound, a biphenol compound, or an allyletherified compound thereof) It may be These components may be the raw materials used for the production of the present carbonate resin or by-products by-produced during the production.
80 mass% or more is preferable, and, as for content of the compound represented by Formula (1) in this carbonate resin, 90 mass% or more is more preferable. The upper limit of the content is not particularly limited, and may be 100% by mass. The content of the compound represented by formula (1) is measured by gel permeation chromatography (GPC).
nは、0〜50の整数が好ましく、0〜40の整数がより好ましく、0〜35の整数がさらに好ましい。
nの平均値は、本カーボネート樹脂の重量平均分子量(Mw)が、3000〜12000の範囲内となる値が好ましい。より好ましいMwは後述のとおりである。nの平均値が大きいほど、Mwが大きくなる傾向がある。
n is preferably an integer of 0 to 50, more preferably an integer of 0 to 40, and still more preferably an integer of 0 to 35.
The average value of n is preferably a value such that the weight average molecular weight (Mw) of the carbonate resin is in the range of 3000 to 12000. More preferable Mw is as described later. As the average value of n is larger, Mw tends to be larger.
ビスフェノール化合物は、連結基を介して結合した2個のヒドロキシフェニル基を有する化合物である。ヒドロキシフェニル基は置換基を有していてもよい。
ビスフェノール化合物由来の残基とは、ビスフェノール化合物から2個のフェノール性水酸基を除いた構造の基である。つまり、置換基を有していてもよい2個のフェニレン基が連結基を介して結合した構造の基である。
置換基としては、アリル基、アルキル基等が挙げられる。置換基の数は1つでもよく2つ以上でもよい。
ビスフェノール化合物の具体例としては、ビスフェノールA、ビスフェノールF、ビスフェノールB、ビスフェノールAP、ビスフェノールC、ビスフェノールE、ビスフェノールS、ビスフェノールZ、これらのビスフェノール化合物のヒドロキシフェニル基の少なくとも一方にアリル基が結合したアリル基含有ビスフェノール化合物等が挙げられる。
The bisphenol compound is a compound having two hydroxyphenyl groups linked via a linking group. The hydroxyphenyl group may have a substituent.
The residue derived from the bisphenol compound is a group having a structure in which two phenolic hydroxyl groups are removed from the bisphenol compound. That is, it is a group having a structure in which two phenylene groups which may have a substituent are linked via a linking group.
Examples of the substituent include an allyl group and an alkyl group. The number of substituents may be one or two or more.
Specific examples of the bisphenol compound include bisphenol A, bisphenol F, bisphenol B, bisphenol AP, bisphenol C, bisphenol C, bisphenol E, bisphenol S, bisphenol Z, and allyl having an allyl group bonded to at least one of the hydroxyphenyl groups of these bisphenol compounds. Group-containing bisphenol compounds and the like can be mentioned.
ビフェノール化合物は、直接結合した2個のヒドロキシフェニル基を有する化合物である。ヒドロキシフェニル基は置換基を有していてもよい。
ビフェノール化合物由来の残基とは、ビフェノール化合物から2個のフェノール性水酸基を除いた構造の基である。つまり、置換基を有していてもよいビフェニレン基である。
置換基としては、アリル基、ハロゲン原子、アルキル基等が挙げられる。置換基の数は1つでもよく2つ以上でもよい。
ビフェノール化合物の具体例としては、ビフェノール、ハロゲン化ビフェノール、アルキルビフェノール、これらのビフェノール化合物のヒドロキシフェニル基の少なくとも一方にアリル基が結合したアリル基含有ビフェノール化合物等が挙げられる。
A biphenol compound is a compound having two hydroxyphenyl groups directly bonded. The hydroxyphenyl group may have a substituent.
The residue derived from a biphenol compound is a group having a structure in which two phenolic hydroxyl groups are removed from a biphenol compound. That is, it is a biphenylene group which may have a substituent.
Examples of the substituent include an allyl group, a halogen atom and an alkyl group. The number of substituents may be one or two or more.
Specific examples of biphenol compounds include biphenols, halogenated biphenols, alkyl biphenols, and allyl group-containing biphenol compounds in which an allyl group is bonded to at least one of the hydroxyphenyl groups of these biphenol compounds.
脂環式ジメタノール化合物は、脂環式基と、脂環式基に結合した2つのメタノール基(−CH2OH)とを有する化合物である。
脂環式ジメタノール化合物由来の残基とは、脂環式ジメタノール化合物から2個の水酸基を除いた構造の基である。具体的には、下記式(r4)で表される基が挙げられる。
An alicyclic dimethanol compound is a compound which has an alicyclic group and two methanol groups (-CH2OH) couple | bonded with the alicyclic group.
The residue derived from the alicyclic dimethanol compound is a group having a structure in which two hydroxyl groups are removed from the alicyclic dimethanol compound. Specifically, a group represented by the following formula (r4) can be mentioned.
脂環式基は、単環構造でもよく多環構造でもよい。脂環式基は、不飽和結合を有しないことが好ましい。脂環式基の炭素数は、6〜20が好ましく、8〜15がより好ましい。脂環式基の具体例としては、シクロヘキシレン基、トリシクロデカンジイル基、ペルヒドロ−1,4;5,8−ナフチレン−2,3−ジイル基、ビシクロ [2.2.1] ヘプタン−2,3−ジイル基等が挙げられる。
脂環式基は、アリル基、アルキル基、ハロゲン原子等の置換基を有していてもよい。
脂環式ジメタノール化合物の具体例としては、シクロヘキサンジメタノール、トリシクロデカンジメタノール、トランス−2,3−ジ(ヒドロキシメチル)−ペルヒドロ−1,4;5,8−ジメタノナフタレン、トランス−2,3−ジ(ヒドロキシメチル)ビシクロ [2.2.1] ヘプタン等が挙げられる。それぞれ異性体を混合していてもよい。
The alicyclic group may have a single ring structure or a multiple ring structure. The alicyclic group preferably has no unsaturated bond. 6-20 are preferable and, as for carbon number of an alicyclic group, 8-15 are more preferable. Specific examples of the alicyclic group include cyclohexylene group, tricyclodecanediyl group, perhydro-1,4; 5,8-naphthylene-2,3-diyl group, bicyclo [2.2.1] heptane-2 And 3-diyl groups.
The alicyclic group may have a substituent such as an allyl group, an alkyl group or a halogen atom.
Specific examples of the alicyclic dimethanol compound include cyclohexane dimethanol, tricyclodecane dimethanol, trans-2,3-di (hydroxymethyl) -perhydro-1,4; 5,8-dimethanonaphthalene, trans- 2,3-di (hydroxymethyl) bicyclo [2.2.1] heptane and the like can be mentioned. Each isomer may be mixed.
式(1)中、2個のR1およびn個のR2の少なくとも一部はアリル基を含有する。つまり、2個のR1およびn個のR2の少なくとも一部は、アリル基含有ビスフェノール化合物(例えば前述のアリルビスフェノール)由来の残基、アリル基含有ビフェノール化合物(例えば前述のアリルビフェノール)由来の残基またはアリル基含有脂環式ジメタノール化合物由来の残基である。これにより、本カーボネート樹脂をマレイミド硬化剤として使用できる。
2個のR1およびn個のR2の一部は、アリル基を含有していなくてもよい。
本カーボネート樹脂中の全てのR1およびR2のうち、アリル基を含有するR1およびアリル基を含有するR2の合計の割合は、2〜80モル%が好ましく、5〜50モル%がより好ましい。
In the formula (1), at least a part of two R 1 and n R 2 contains an allyl group. That is, at least a part of two R 1 and n R 2 are derived from an allyl group-containing bisphenol compound (for example, the above-mentioned allyl bisphenol) -derived residue, an allyl group-containing biphenol compound (for example, the above-mentioned allylbiphenol) It is a residue or a residue derived from an allyl group-containing alicyclic dimethanol compound. Thereby, this carbonate resin can be used as a maleimide curing agent.
Some of two R 1 and n R 2 may not contain an allyl group.
Among all R 1 and R 2 in the present carbonate resin, the ratio of the sum of R 1 containing an allyl group and R 2 containing an allyl group is preferably 2 to 80 mol%, and 5 to 50 mol% More preferable.
式(1)中の2つのR1は同一であってもよく異なっていてもよい。
R1としては、アリル基含有ビスフェノール化合物由来の残基またはアリル基含有ビフェノール化合物由来の残基が好ましい。この場合、式(1)中のXが水素原子であるときに、OXがフェノール性水酸基となる。フェノール性水酸基は、エポキシ樹脂との反応性に優れる。また、フェノール性水酸基は、アリルエーテル化する場合の反応性(ハロゲン化アリルとの反応性)にも優れる。
アリル基含有ビスフェノール化合物由来の残基またはアリル基含有ビフェノール化合物由来の残基としては、原料が安価であり容易に入手可能な点から、下記式(r1)、下記式(r2)または下記式(r3)で表される基が好ましい。これらの基は、アリル基含有ビスフェノールA、アリル基含有ビスフェノールFまたはアリル基含有ビフェノールに由来する残基である。
Two R 1 in the formula (1) may be the same or different.
As R 1 , a residue derived from an allyl group-containing bisphenol compound or a residue derived from an allyl group-containing biphenol compound is preferable. In this case, OX is a phenolic hydroxyl group when X in the formula (1) is a hydrogen atom. The phenolic hydroxyl group is excellent in the reactivity with the epoxy resin. Moreover, phenolic hydroxyl group is excellent also in the reactivity (reactivity with allyl halide) in the case of allyl etherification.
As the residue derived from the allyl group-containing bisphenol compound or the residue derived from the allyl group-containing biphenol compound, the following formula (r1), the following formula (r2) or the following formula The group represented by r3) is preferred. These groups are residues derived from allyl group-containing bisphenol A, allyl group-containing bisphenol F or allyl group-containing biphenol.
式中、pは1または2を示し、qは0〜2の整数を示す。
pとしては1が好ましい。qとしては1が好ましい。
In formula, p shows 1 or 2 and q shows the integer of 0-2.
1 is preferable as p. 1 is preferable as q.
式(1)中のnが2以上である場合、n個のR2はそれぞれ同一であってもよく異なっていてもよい。
硬化物がより低誘電正接になる点では、式(1)中のn個のR2の少なくとも一部は、脂環式ジメタノール化合物由来の残基、すなわち式(r4)で表される基であることが好ましい。nが1である場合は、R2が脂環式ジメタノール化合物由来の残基であることが好ましく、nが2以上である場合は、n個のR2の少なくとも1個が脂環式ジメタノール化合物由来の残基であることが好ましい。
n個のR2の一部はビスフェノール化合物由来の残基またはビフェノール化合物由来の残基であってもよい。ビスフェノール化合物由来の残基またはビフェノール化合物由来の残基は、アリル基を有していても有さなくてもよい。
When n in Formula (1) is 2 or more, n R 2 s may be the same or different.
At least a part of n R 2 in the formula (1) is a residue derived from an alicyclic dimethanol compound, that is, a group represented by the formula (r 4 ) in that the cured product has a lower dielectric loss tangent. Is preferred. When n is 1, R 2 is preferably a residue derived from a cycloaliphatic dimethanol compound, and when n is 2 or more, at least one of n R 2 s is a cycloaliphatic dimethanol compound. It is preferably a residue derived from a methanol compound.
A part of n R 2 may be a residue derived from a bisphenol compound or a residue derived from a biphenol compound. The residue derived from the bisphenol compound or the residue derived from the biphenol compound may or may not have an allyl group.
本カーボネート樹脂中の全てのR2のうち、脂環式ジメタノール化合物由来の残基であるR2の割合は、20〜100モル%が好ましく、50〜90モル%がより好ましい。脂環式ジメタノール化合物由来の残基であるR2の割合が前記下限値以上であると、より低誘電正接の硬化物が得られる。 Of all the R 2 of the carbonate in the resin, the ratio of R 2 is a residue derived from a cycloaliphatic di-methanol compound is preferably 20 to 100 mol%, more preferably 50 to 90 mol%. When the ratio of R 2 which is a residue derived from an alicyclic dimethanol compound is equal to or more than the lower limit, a cured product having a lower dielectric loss tangent can be obtained.
式(1)中、2個のXはそれぞれ水素原子であってもよくアリル基であってもよい。
本カーボネート樹脂は、前記式(1)中の2個のXの少なくとも一方が水素原子である化合物を含んでもよい。この場合、本カーボネート樹脂をエポキシ樹脂硬化剤としても使用できる。
本カーボネート樹脂をエポキシ樹脂硬化剤として使用する場合、本カーボネート樹脂中の全てのXのうち、水素原子であるXの割合は、50〜100モル%が好ましく、80〜100モル%がより好ましい。水素原子であるXの割合が前記下限値以上であると、エポキシ樹脂との反応性、硬化物の耐熱性がより優れる。
In the formula (1), each of two X's may be a hydrogen atom or an allyl group.
The present carbonate resin may contain a compound in which at least one of two X's in the formula (1) is a hydrogen atom. In this case, the present carbonate resin can also be used as an epoxy resin curing agent.
When using this carbonate resin as an epoxy resin hardening | curing agent, 50-100 mol% is preferable and, as for the ratio of X which is a hydrogen atom among all X in this carbonate resin, 80-100 mol% is more preferable. The reactivity with an epoxy resin and heat resistance of hardened | cured material are more excellent in the ratio of X which is a hydrogen atom being more than the said lower limit.
本カーボネート樹脂の軟化点は、70〜130℃が好ましく、90〜120℃がより好ましい。軟化点が前記下限値以上であれば、樹脂の耐ブロッキング性がより優れる。軟化点が前記上限値以下であれば、流動性がより優れる。
軟化点は、JIS K 6910に従って測定される。
70-130 degreeC is preferable and, as for the softening point of this carbonate resin, 90-120 degreeC is more preferable. When the softening point is at least the lower limit value, the blocking resistance of the resin is more excellent. If a softening point is below the said upper limit, fluidity | liquidity is more excellent.
The softening point is measured in accordance with JIS K 6910.
本カーボネート樹脂の150℃における溶融粘度は、10P〜100Pが好ましく、30P〜80Pがより好ましい。溶融粘度が前記下限値以上であると、樹脂の耐ブロッキング性がより優れる。溶融粘度が前記上限値以下であると、流動性に優れる。
溶融粘度は、後述する実施例に記載の測定方法により測定される。
10P-100P are preferable and, as for melt viscosity at 150 degrees C of this carbonate resin, 30P-80P are more preferable. The blocking resistance of resin is more excellent in melt viscosity being more than the above-mentioned lower limit. It is excellent in fluidity | liquidity that melt viscosity is below the said upper limit.
Melt viscosity is measured by the measuring method as described in the Example mentioned later.
本カーボネート樹脂の重量平均分子量(Mw)は、3000〜12000が好ましく、5000〜10000がより好ましい。Mwが前記下限値以上であると、樹脂の耐ブロッキング性がより優れる。Mwが前記上限値以下であると、流動性がより優れる。
カーボネート樹脂のMwおよびMnは、標準物質をポリスチレンとしたゲル浸透クロマトグラフィー(GPC)により測定される値である。
3000-12000 are preferable and, as for the weight average molecular weight (Mw) of this carbonate resin, 5000-10000 are more preferable. The blocking resistance of resin is more excellent in Mw being more than the above-mentioned lower limit. Fluidity is more excellent in it being Mw below the above-mentioned upper limit.
Mw and Mn of the carbonate resin are values measured by gel permeation chromatography (GPC) using polystyrene as a standard substance.
本カーボネート樹脂のアリル基当量は、500〜3000g/eqが好ましく、800〜2000g/eqがより好ましい。アリル基当量が前記下限値以上であると、誘電特性がより優れる。アリル基当量が前記上限値以下であると、マレイミド化合物との反応性がより優れる。
本カーボネート樹脂のアリル基当量は、本カーボネート樹脂の数平均分子量(Mn)をアリル基の数で割った値である。
500-3000 g / eq is preferable and, as for the allyl group equivalent of this carbonate resin, 800-2000 g / eq is more preferable. A dielectric characteristic is more excellent in the allyl group equivalent being more than the said lower limit. The reactivity with a maleimide compound is more excellent in an allyl group equivalent being below the above-mentioned upper limit.
The allyl group equivalent of the present carbonate resin is a value obtained by dividing the number average molecular weight (Mn) of the present carbonate resin by the number of allyl groups.
<本カーボネート樹脂の製造方法>
本カーボネート樹脂は、例えば、以下の工程1を有する製造方法により製造できる。工程1の後、必要に応じて、工程2を行ってもよい。
工程1:炭酸ジエステルと、ビスフェノール化合物、ビフェノール化合物および脂環式ジメタノール化合物からなる群から選ばれる少なくとも1種のジオール化合物とを反応させる工程。
工程2:工程1で生成した、末端が水酸基であるアリル基含有カーボネート樹脂と、ハロゲン化アリルとを反応させ、前記水酸基をアリルエーテル化する工程。
<Method of producing the present carbonate resin>
The present carbonate resin can be produced, for example, by the production method having the following step 1. After step 1, step 2 may be performed as necessary.
Step 1: A step of reacting carbonic diester with at least one diol compound selected from the group consisting of a bisphenol compound, a biphenol compound and an alicyclic dimethanol compound.
Step 2: A step of reacting the allyl group-containing carbonate resin having a hydroxyl group at the terminal, which is produced in Step 1, with allyl halide to allyletherify the hydroxyl group.
(ジオール化合物)
ビスフェノール化合物、ビフェノール化合物、脂環式ジメタノール化合物はそれぞれ前記と同様である。
工程1において用いるジオール化合物の少なくとも一部はアリル基を含有する。つまり、ジオール化合物の少なくとも一部は、アリル基含有ビスフェノール化合物、アリル基含有ビフェノール化合物およびアリル基含有脂環式ジメタノール化合物からなる群から選ばれる少なくとも1種を含む。
(Diol compound)
The bisphenol compound, the biphenol compound and the alicyclic dimethanol compound are the same as described above.
At least a portion of the diol compound used in step 1 contains an allyl group. That is, at least a part of the diol compound contains at least one selected from the group consisting of an allyl group-containing bisphenol compound, an allyl group-containing biphenol compound and an allyl group-containing alicyclic dimethanol compound.
アリル基含有ビスフェノール化合物は、例えば、ビスフェノール化合物のフェノール性水酸基をアリルエーテル化した後、アリル基を転位させることにより製造できる。
アリルエーテル化は、ビスフェノール化合物とハロゲン化アリルとを反応させることにより実施できる。この反応では、ビスフェノール化合物のフェノール性水酸基(−OH)がアリルエーテル基(−O−CH2−CH=CH2)に変換される。
The allyl group-containing bisphenol compound can be produced, for example, by allyletherifying the phenolic hydroxyl group of the bisphenol compound and then rearranging the allyl group.
Allyl etherification can be carried out by reacting a bisphenol compound with an allyl halide. In this reaction, the phenolic hydroxyl group of the bisphenol compound (-OH) is converted into an allyl ether group (-O-CH 2 -CH = CH 2).
ハロゲン化アリルとしては、例えば塩化アリル、臭化アリル、フッ化アリル、ヨウ化アリル等が挙げられる。安価な点から、塩化アリルが好ましい。
ビスフェノール化合物とハロゲン化アリルとの反応(アリルエーテル化)は、触媒の存在下で行うことが好ましい。触媒としては、例えば、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物、ジアザビシクロノネン、ジアザビシクロウンデセン、トリエチルアミン等のアミン化合物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド、リチウムジイソプロピルアミド、ケイ素−塩基性アミン、リチウムテトラメチルピペリジン等が挙げられる。
Examples of the allyl halide include allyl chloride, allyl bromide, allyl fluoride, allyl iodide and the like. Allyl chloride is preferred from the viewpoint of low cost.
The reaction of the bisphenol compound with the allyl halide (allyl etherification) is preferably carried out in the presence of a catalyst. As the catalyst, for example, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide, amine compounds such as diazabicyclononene, diazabicycloundecene and triethylamine, sodium tert-butoxide, potassium tert-butoxide, lithium diisopropyl Amides, silicon-basic amines, lithium tetramethylpiperidine and the like can be mentioned.
ビスフェノール化合物とハロゲン化アリルとの反応は、溶媒の存在下で行ってもよい。溶媒としては、ビスフェノール化合物およびハロゲン化アリルを溶解可能であればよく、例えば後述する樹脂ワニスにおける溶剤が挙げられる。 The reaction of the bisphenol compound with the allyl halide may be carried out in the presence of a solvent. The solvent is only required to be capable of dissolving the bisphenol compound and the allyl halide, and examples thereof include the solvents in the resin varnish described later.
ビスフェノール化合物とハロゲン化アリルとの反応において、ビスフェノール化合物と反応させるハロゲン化アリルの量は、ビスフェノール化合物のフェノール性水酸基に対するハロゲン化アリルのモル比(ハロゲン化アリル/フェノール性水酸基)が、0.3〜2.0となる量が好ましい。ハロゲン化アリル/フェノール性水酸基のモル比は、1.0〜1.5がより好ましい。
触媒の使用量は、ハロゲン化アリルの使用モル量に対し、0.7〜1.3倍モルが好ましい。
反応温度は、例えば10〜150℃であってよい。反応時間は、例えば1〜30時間であってよい。
反応の終了後、必要に応じて、反応生成物の水洗、濃縮等の処理を行ってもよい。
In the reaction of the bisphenol compound and the allyl halide, the amount of allyl halide to be reacted with the bisphenol compound is such that the molar ratio of allyl halide to phenolic hydroxyl group of the bisphenol compound (aryl halide / phenolic hydroxyl group) is 0.3 An amount of ̃2.0 is preferred. The molar ratio of halogenated allyl / phenolic hydroxyl group is more preferably 1.0 to 1.5.
The amount of the catalyst used is preferably 0.7 to 1.3 times the molar amount of the allyl halide used.
The reaction temperature may be, for example, 10 to 150 ° C. The reaction time may be, for example, 1 to 30 hours.
After completion of the reaction, the reaction product may be subjected to treatment such as washing with water, concentration, etc., if necessary.
アリルエーテル化されたビスフェノール化合物のアリル基が転位すると、ビスフェノール化合物のヒドロキシフェニル基のベンゼン環にアリル基が結合したアリル基含有ビスフェノール化合物が生成する。
アリル基の転位反応は、例えば、アリルエーテル化されたビスフェノール化合物を加熱することにより実施できる。アリルエーテル化されたビスフェノール化合物を加熱すると、ベンゼン環に結合したアリルエーテル基(−O−CH2−CH=CH2)のアリル基がこのベンゼン環のオルソまたはパラ位に転位する、いわゆるクライゼン転位反応が生じる。加熱条件は、例えば160〜200℃で1〜24時間とすることができる。
加熱は、溶媒の存在下で行ってもよい。溶媒としては、アリルエーテル化されたビスフェノール化合物を溶解可能であればよく、例えばメタノールが挙げられる。
反応後、必要に応じて、反応生成物に対し溶媒の除去、水洗等の処理を行ってもよい。
アリル基含有ビフェノール化合物も上記と同様にして製造できる。
Rearrangement of the allyl group of the allyl etherified bisphenol compound produces an allyl group-containing bisphenol compound in which an allyl group is bonded to the benzene ring of the hydroxyphenyl group of the bisphenol compound.
The rearrangement reaction of the allyl group can be carried out, for example, by heating the allyl etherified bisphenol compound. So-called Claisen rearrangement in which the allyl group of the allyl ether group (—O—CH 2 —CH = CH 2 ) bonded to the benzene ring is rearranged to the ortho or para position of the benzene ring when the allyl etherified bisphenol compound is heated. A reaction occurs. The heating conditions can be set, for example, at 160 to 200 ° C. for 1 to 24 hours.
Heating may be performed in the presence of a solvent. The solvent is only required to be capable of dissolving the allyletherified bisphenol compound, and includes, for example, methanol.
After the reaction, if necessary, the reaction product may be subjected to treatments such as removal of the solvent and washing with water.
The allyl group-containing biphenol compound can also be produced in the same manner as described above.
(炭酸ジエステル)
炭酸ジエステルとしては、炭酸ジメチル、炭酸ジエチル等のジアルキルカーボネート(好ましくは、炭素数1〜4のアルキル基を有するもの)、炭素数1〜4のアルキレンカーボネート(例えばエチレンカーボネート)、炭酸ジフェニル等が挙げられる。これらの炭酸ジエステルはいずれか1種を単独で用いてもよく2種以上を併用してもよい。ジオール類(脂環式ジメタノール化合物、芳香族ジオール化合物)との反応性が良いこと、比較的安価で、取り扱いが容易であることから、炭酸ジフェニルが好ましい。
(Carbon diester)
Examples of carbonic diesters include dialkyl carbonates such as dimethyl carbonate and diethyl carbonate (preferably having an alkyl group having 1 to 4 carbon atoms), alkylene carbonates having 1 to 4 carbon atoms (for example, ethylene carbonate), diphenyl carbonate and the like Be One of these carbonic acid diesters may be used alone, or two or more thereof may be used in combination. Diphenyl carbonate is preferred because it has good reactivity with diols (alicyclic dimethanol compounds and aromatic diol compounds), is relatively inexpensive, and is easy to handle.
(工程1)
工程1の好ましい一態様は、炭酸ジエステルと、脂環式ジメタノール化合物と、必要に応じてビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応(一次反応)させて一次反応生成物を得て、得られた一次反応生成物と、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応(二次反応)させる工程(以下、「工程1A」ともいう。)である。
一次反応および二次反応はそれぞれエステル交換反応である。二次反応で芳香族ジオール化合物を反応させることにより、末端水酸基がフェノール性水酸基であるカーボネート樹脂が得られる。
(Step 1)
A preferred embodiment of step 1 is a reaction (first reaction) of a carbonic diester, an alicyclic dimethanol compound, and at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound as required. A step of reacting (secondarily reacting) the obtained primary reaction product with at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound to obtain a primary reaction product , “Step 1A”).
The primary and secondary reactions are each transesterification reactions. By reacting the aromatic diol compound in the secondary reaction, a carbonate resin in which the terminal hydroxyl group is a phenolic hydroxyl group is obtained.
一次反応は、例えば、炭酸ジエステルと、脂環式ジメタノール化合物と、必要に応じて芳香族ジオール化合物とを溶融混合し、触媒を添加し、所定の反応温度を所定の時間保持することにより実施できる。
炭酸ジエステル、脂環式ジメタノール化合物、芳香族ジオール化合物はそれぞれ、1種を単独で用いてもよく2種以上を併用してもよい。
The primary reaction is carried out, for example, by melt-mixing a diester of carbonic acid, an alicyclic dimethanol compound, and, if necessary, an aromatic diol compound, adding a catalyst, and maintaining a predetermined reaction temperature for a predetermined time. it can.
The carbonic diester, the alicyclic dimethanol compound and the aromatic diol compound may be used alone or in combination of two or more.
一次反応において、脂環式ジメタノール化合物と芳香族ジオール化合物との合計量(芳香族ジオール化合物を反応させない場合は脂環式ジメタノール化合物のみの量)に対する炭酸ジエステルのモル比(炭酸ジエステル/(脂環式ジメタノール化合物+芳香族ジオール化合物))は、1.05〜3.00が好ましく、1.20〜2.50がより好ましい。炭酸ジエステルの比率が低すぎると、一次反応生成物中に、脂環式ジメタノール化合物の水酸基が多く残留してしまい、二次反応の際に、末端水酸基がフェノール性水酸基ではない化合物が副生するおそれがある。炭酸ジエステルの比率が高すぎると、二次反応に使用する芳香族ジオール化合物の使用量が多くなり、脂環式ジメタノール化合物由来の構造による誘電正接の低減効果が不十分になるおそれがある。 In the primary reaction, the molar ratio of carbonic acid diester to the total amount of the alicyclic dimethanol compound and the aromatic diol compound (the amount of the alicyclic dimethanol compound alone when the aromatic diol compound is not reacted) (carbonic diester / ( 1.05 to 3.00 is preferable, and 1.20 to 2.50 is more preferable for the alicyclic dimethanol compound + aromatic diol compound). If the ratio of carbonic diester is too low, many hydroxyl groups of the alicyclic dimethanol compound remain in the primary reaction product, and in secondary reaction, a compound whose terminal hydroxyl group is not a phenolic hydroxyl group is by-produced. There is a risk of When the ratio of carbonic diester is too high, the amount of use of the aromatic diol compound used in the secondary reaction increases, and the effect of reducing the dielectric loss tangent due to the structure derived from the alicyclic dimethanol compound may be insufficient.
一次反応において、脂環式ジメタノール化合物と芳香族ジオール化合物との合計量(100モル%)のうち、脂環式ジメタノール化合物の割合は、20〜100モル%が好ましく、50〜90モル%がより好ましい。 In the primary reaction, the proportion of the alicyclic dimethanol compound is preferably 20 to 100 mol%, and 50 to 90 mol% of the total amount (100 mol%) of the alicyclic dimethanol compound and the aromatic diol compound. Is more preferred.
触媒としては、反応(エステル交換反応)が進行すれば特に制限はない。具体例としては、水酸化ナトリウム、水酸化カリウム、マグネシウム金属、アルキル亜鉛化合物(例えばジ−n−ブチル亜鉛)、水酸化リチウム、酢酸リチウム、チタンエステル(例えばテトラ−n−ブチルチタネート)、酸化亜鉛、酸化鉛、二酸化マンガン、テトラアルキルオルソチタネート、酢酸亜鉛、酸化アンチモン、酸化ゲルマニウム、種々のアルコキシド(例えばカリウム−t−ブトキシド、ナトリウムメトキシド)、アルカリ金属(例えばリチウム、ナトリウム)、アルカリ金属の水素化物(例えば水素化リチウム、水素化ナトリウム)、アルカリ金属水酸化物(例えば水酸化リチウムや水酸化ナトリウム)、金属ハロゲン化物等が挙げられる。 The catalyst is not particularly limited as long as the reaction (transesterification) proceeds. Specific examples include sodium hydroxide, potassium hydroxide, magnesium metal, alkyl zinc compounds (eg, di-n-butyl zinc), lithium hydroxide, lithium acetate, titanium esters (eg, tetra-n-butyl titanate), zinc oxide , Lead oxide, manganese dioxide, tetraalkyl orthotitanate, zinc acetate, antimony oxide, germanium oxide, various alkoxides (eg, potassium-t-butoxide, sodium methoxide), alkali metals (eg, lithium, sodium), hydrogens of alkali metals Hydrides (eg, lithium hydride, sodium hydride), alkali metal hydroxides (eg, lithium hydroxide and sodium hydroxide), metal halides and the like.
触媒の使用量は、炭酸ジエステル類に対して、1.0〜0.00001質量%が好ましく、0.1〜0.0001質量%がより好ましい。触媒の使用量がこの範囲よりも多い場合には、生成した樹脂に濁りが生ずることがあり、この範囲内よりも少ない場合には、重合速度が遅くなり、高重合度の樹脂が得られないことがある。 The amount of the catalyst used is preferably 1.0 to 0.00001% by mass, and more preferably 0.1 to 0.0001% by mass, with respect to the diester carbonate. If the amount of the catalyst used is larger than this range, turbidity may occur in the formed resin, and if smaller than this range, the polymerization rate becomes slow and a resin having a high degree of polymerization can not be obtained. Sometimes.
一次反応の反応温度は、130〜250℃が好ましく、150〜200℃がより好ましい。反応温度があまりに低いと反応が進まず、あまりに高いと反応をコントロールすることが難しくなり、樹脂が安定的に得ることが出来ないおそれがある。反応時間は、例えば0.5〜10時間であってよい。
一次反応は、常圧下で行ってもよく、減圧下で行ってもよい。
一次反応は、反応(エステル交換反応)で副生するアルコール類やフェノール類を減圧下で除去しながら行ってもよい。
130-250 degreeC is preferable and, as for the reaction temperature of primary reaction, 150-200 degreeC is more preferable. If the reaction temperature is too low, the reaction does not proceed, and if it is too high, it may be difficult to control the reaction, and the resin may not be stably obtained. The reaction time may be, for example, 0.5 to 10 hours.
The primary reaction may be carried out under normal pressure or under reduced pressure.
The primary reaction may be performed while removing alcohols and phenols by-produced in the reaction (transesterification) under reduced pressure.
二次反応は、例えば、一次反応で生成した一次反応生成物に芳香族ジオール化合物を添加し、所定の反応温度を所定の時間保持することにより実施できる。
二次反応で用いる芳香族ジオール化合物は、一次反応で用いた芳香族ジオール化合物と同じであってもよく異なっていてもよい。芳香族ジオール化合物は、1種を単独で用いてもよく2種以上を併用してもよい。
二次反応において反応させる芳香族ジオール化合物の量は、一次反応で用いた炭酸ジエステル(100モル%)に対し、5〜80モル%が好ましく、15〜60モル%がより好ましい。
The secondary reaction can be carried out, for example, by adding an aromatic diol compound to the primary reaction product generated in the primary reaction, and maintaining a predetermined reaction temperature for a predetermined time.
The aromatic diol compound used in the secondary reaction may be the same as or different from the aromatic diol compound used in the primary reaction. The aromatic diol compounds may be used alone or in combination of two or more.
The amount of the aromatic diol compound to be reacted in the second reaction is preferably 5 to 80 mol%, more preferably 15 to 60 mol%, with respect to the carbonic diester (100 mol%) used in the first reaction.
二次反応の反応温度は、130〜250℃が好ましく、170〜230℃がより好ましい。反応温度があまりに低いと反応が進まず、あまりに高いと反応をコントロールすることが難しくなり、樹脂が安定的に得ることが出来ないおそれがある。反応時間は、例えば0.5〜10時間であってよい。
二次反応は、反応(エステル交換反応)で副生するアルコール類やフェノール類を減圧下で除去しながら行うことが好ましい。
二次反応における減圧度は、反応で副生するアルコール類やフェノール類を減圧下で除去できれば特に制限はない。例えば、80〜5mmHgであってよく、20〜5mmHgであってよい。
二次反応の終了後、必要に応じて、反応生成物の水洗、濃縮等の処理を行ってもよい。
130-250 degreeC is preferable and, as for the reaction temperature of secondary reaction, 170-230 degreeC is more preferable. If the reaction temperature is too low, the reaction does not proceed, and if it is too high, it may be difficult to control the reaction, and the resin may not be stably obtained. The reaction time may be, for example, 0.5 to 10 hours.
The secondary reaction is preferably performed while removing alcohols and phenols by-produced in the reaction (transesterification) under reduced pressure.
The degree of reduced pressure in the secondary reaction is not particularly limited as long as alcohols and phenols by-produced in the reaction can be removed under reduced pressure. For example, it may be 80-5 mmHg and may be 20-5 mmHg.
After completion of the secondary reaction, the reaction product may be subjected to treatment such as washing with water, concentration, etc., if necessary.
工程1の他の好ましい一態様は、炭酸ジエステルと、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させる工程(以下、「工程1B」ともいう。)である。この反応はエステル交換反応である。 Another preferable embodiment of step 1 is a step of reacting carbonic diester with at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound (hereinafter, also referred to as "step 1B"). is there. This reaction is a transesterification reaction.
芳香族ジオール化合物に対する炭酸ジエステルのモル比(炭酸ジエステル/芳香族ジオール化合物)は、0.40〜0.99が好ましく、0.50〜0.95がより好ましい。
炭酸ジエステルと芳香族ジオール化合物との反応は、触媒の存在下で行うことが好ましい。触媒としては、前記と同様のものが挙げられる。触媒の使用量の好ましい範囲も前記と同様である。
0.40-0.99 are preferable, and, as for the molar ratio (carbonic diester / aromatic diol compound) of carbonic diester with respect to aromatic diol compound, 0.50-0.95 are more preferable.
The reaction of the carbonic diester with the aromatic diol compound is preferably carried out in the presence of a catalyst. As the catalyst, the same as those described above can be mentioned. The preferred range of the amount of catalyst used is the same as above.
炭酸ジエステルと芳香族ジオール化合物との反応は、例えば、炭酸ジエステルと、芳香族ジオール化合物とを溶融混合し、触媒を添加し、所定の反応温度を所定の時間保持することにより実施できる。
反応温度は、130〜250℃が好ましく、170〜230℃がより好ましい。反応温度があまりに低いと反応が進まず、あまりに高いと反応をコントロールすることが難しくなり、樹脂が安定的に得ることが出来ないおそれがある。反応時間は、例えば0.5〜10時間であってよい。
反応は、副生するアルコール類やフェノール類を減圧下で除去しながら行うことが好ましい。反応開始時においては常圧下で反応を行い、一定時間経過後に減圧してもよい。
反応における減圧度は、反応で副生するアルコール類やフェノール類を減圧下で除去できれば特に制限はない。例えば、80〜5mmHgであってよく、20〜5mmHgであってよい。
反応の終了後、必要に応じて、反応生成物の水洗、濃縮等の処理を行ってもよい。
The reaction between the carbonic diester and the aromatic diol compound can be carried out, for example, by melt-mixing the carbonic diester and the aromatic diol compound, adding a catalyst, and maintaining a predetermined reaction temperature for a predetermined time.
130-250 degreeC is preferable and, as for reaction temperature, 170-230 degreeC is more preferable. If the reaction temperature is too low, the reaction does not proceed, and if it is too high, it may be difficult to control the reaction, and the resin may not be stably obtained. The reaction time may be, for example, 0.5 to 10 hours.
The reaction is preferably carried out while removing by-produced alcohols and phenols under reduced pressure. At the start of the reaction, the reaction may be carried out under normal pressure, and the pressure may be reduced after a predetermined time has elapsed.
The degree of reduced pressure in the reaction is not particularly limited as long as alcohols and phenols by-produced in the reaction can be removed under reduced pressure. For example, it may be 80-5 mmHg and may be 20-5 mmHg.
After completion of the reaction, the reaction product may be subjected to treatment such as washing with water, concentration, etc., if necessary.
工程1では、末端が水酸基であるアリル基含有カーボネート樹脂が得られる。このアリル基含有カーボネート樹脂は、前記式(1)中のXが水素原子である化合物、すなわち下記式(2)で表される化合物を主成分として含む。 In step 1, an allyl group-containing carbonate resin in which the terminal is a hydroxyl group is obtained. The allyl group-containing carbonate resin contains, as a main component, a compound in which X in the formula (1) is a hydrogen atom, that is, a compound represented by the following formula (2).
工程1が工程1Aである場合、式(2)中のR1がアリル基含有ビスフェノール化合物由来の残基またはアリル基含有ビフェノール化合物由来の残基であり、R2の少なくとも一部が脂環式ジメタノール化合物由来の残基である化合物を主成分として含むアリル基含有カーボネート樹脂が得られる。
工程1が工程1Bである場合、式(2)中のR1およびR2がそれぞれアリル基含有ビスフェノール化合物由来の残基またはアリル基含有ビフェノール化合物由来の残基である化合物を主成分として含むアリル基含有カーボネート樹脂が得られる。
これらのアリル基含有カーボネート樹脂を併用してもよい。
硬化物がより低誘電正接になる点では、工程1Aで得られたアリル基含有カーボネート樹脂を含むことが好ましい。
When step 1 is step 1A, R 1 in the formula (2) is a residue derived from an allyl group-containing bisphenol compound or a residue derived from an allyl group-containing biphenol compound, and at least a part of R 2 is alicyclic An allyl group-containing carbonate resin containing as a main component a compound which is a residue derived from a dimethanol compound is obtained.
When step 1 is step 1B, an allyl containing, as a main component, a compound in which R 1 and R 2 in the formula (2) are each a residue derived from an allyl group-containing bisphenol compound or a residue derived from an allyl group-containing biphenol compound A group-containing carbonate resin is obtained.
These allyl group-containing carbonate resins may be used in combination.
It is preferable to include the allyl group-containing carbonate resin obtained in step 1A in that the cured product has a lower dielectric loss tangent.
(工程2)
工程2では、工程1で生成した、末端が水酸基であるアリル基含有カーボネート樹脂と、ハロゲン化アリルとを反応させる。これにより、末端の水酸基(−OH)がアリルエーテル基(−O−CH2−CH=CH2)に変換され、前記式(1)中のXがアリル基である化合物を主成分として含むアリル基含有カーボネート樹脂が得られる。
ハロゲン化アリルとしては、前記と同様のものが挙げられる。
アリルエーテル化は、前記と同様にして実施できる。
(Step 2)
In step 2, the allyl group-containing carbonate resin produced in step 1 and having a hydroxyl group at the end is reacted with allyl halide. Allyl containing Thereby, terminal hydroxyl group (-OH) is converted into an allyl ether group (-O-CH 2 -CH = CH 2), the formula (1) compounds wherein X is an allyl group in a main component A group-containing carbonate resin is obtained.
Examples of the allyl halide include the same as described above.
The allylic etherification can be carried out as described above.
末端が水酸基であるアリル基含有カーボネート樹脂とハロゲン化アリルとの反応において、アリル基含有カーボネート樹脂と反応させるハロゲン化アリルの量は、アリル基含有カーボネート樹脂末端の水酸基に対するハロゲン化アリルのモル比(ハロゲン化アリル/フェノール性水酸基)が、0.3〜2.0となる量が好ましい。ハロゲン化アリル/フェノール性水酸基のモル比は、1.0〜1.5がより好ましい。 The amount of allyl halide to be reacted with the allyl group-containing carbonate resin in the reaction of the allyl group-containing carbonate resin whose end is a hydroxyl group with the allyl halide is the molar ratio of allyl halide to hydroxyl group of the allyl group-containing carbonate resin The amount of the halogenated allyl / phenolic hydroxyl group) is preferably 0.3 to 2.0. The molar ratio of halogenated allyl / phenolic hydroxyl group is more preferably 1.0 to 1.5.
本カーボネート樹脂は、アリル基を有するため、マレイミド化合物を硬化させるための硬化剤(マレイミド硬化剤)として用いることができる。マレイミド化合物の硬化は、加熱により行うことができる。
また、本カーボネート樹脂を用いてマレイミド化合物を硬化させた硬化物は、マレイミド化合物を用いているために、高ガラス転移温度、高熱分解温度、低熱線膨張率を示す。また、本カーボネート樹脂を用いているために、マレイミド化合物をアリルフェノール樹脂で硬化させた硬化物や、エポキシ樹脂をフェノールノボラック樹脂で硬化させた硬化物に比べて、低誘電率、低誘電正接である。
Since this carbonate resin has an allyl group, it can be used as a curing agent (maleimide curing agent) for curing a maleimide compound. Curing of the maleimide compound can be carried out by heating.
Moreover, since the hardened | cured material which hardened the maleimide compound using this carbonate resin is using a maleimide compound, it shows high glass transition temperature, high thermal decomposition temperature, and a low thermal expansion coefficient. In addition, since this carbonate resin is used, it has a lower dielectric constant and a lower dielectric loss tangent than a cured product obtained by curing a maleimide compound with an allylphenol resin or a cured product obtained by curing an epoxy resin with a phenol novolac resin. is there.
本カーボネート樹脂を用いてマレイミド化合物を硬化させる際には、以下の(1)〜(3)の反応が生じて硬化していると考えられる。
(1)マレイミド基とアリル基との反応。
(2)マレイミド基同士の反応。
(3)アリル基同士の反応。
When hardening a maleimide compound using this carbonate resin, it is thought that reaction of the following (1)-(3) arises and it hardens | cures.
(1) Reaction of maleimide group with allyl group.
(2) Reaction between maleimide groups.
(3) Reaction between allyl groups.
本カーボネート樹脂が水酸基を有する場合(Xが水素原子である場合)、本カーボネート樹脂は、エポキシ樹脂を硬化させるための硬化剤(エポキシ樹脂硬化剤)として用いることができる。エポキシ樹脂の硬化は、加熱により行うことができる。
本カーボネート樹脂を用いてエポキシ樹脂を硬化させる際には、前述の(3)の反応および以下の(4)〜(5)の反応が生じて硬化していると考えられる。
(4)エポキシ基と水酸基との反応。
(5)エポキシ基同士の反応。
When the carbonate resin has a hydroxyl group (when X is a hydrogen atom), the carbonate resin can be used as a curing agent (epoxy resin curing agent) for curing the epoxy resin. Curing of the epoxy resin can be carried out by heating.
When the epoxy resin is cured using the present carbonate resin, it is considered that the reaction of (3) described above and the reactions of (4) to (5) below occur to cure.
(4) Reaction of epoxy group and hydroxyl group.
(5) Reaction between epoxy groups.
さらに、本カーボネート樹脂は、一般的にマレイミド化合物やエポキシ樹脂を溶解させるために用いられているような溶剤に対する溶解性に優れる。したがって、本カーボネート樹脂およびマレイミド化合物、ならびに必要に応じてエポキシ樹脂が共に溶剤に溶解した樹脂ワニスを得ることができる。
前記の溶剤としては、メチルエチルケトンのような極性のあるものが一般的である。
Furthermore, this carbonate resin is excellent in the solubility with respect to the solvent generally used in order to dissolve a maleimide compound and an epoxy resin. Therefore, it is possible to obtain a resin varnish in which both the present carbonate resin and maleimide compound and, if necessary, epoxy resin are dissolved in a solvent.
As the above-mentioned solvent, solvents having polarity such as methyl ethyl ketone are generally used.
なお、本カーボネート樹脂は、マレイミド化合物やエポキシ樹脂と組み合わせなくても、前記(3)の反応により、単独で硬化させることができる。しかし、マレイミド化合物やエポキシ樹脂と組み合わせることで、単独で硬化させる場合に比べて、硬化温度を低くすることができ、ガラス転移温度等の熱的特性を高めることができる。そのため、マレイミド化合物やエポキシ樹脂と組み合わせて硬化反応に供することが好適である。 In addition, even if this carbonate resin is not combined with a maleimide compound or an epoxy resin, it can be independently cured by reaction of said (3). However, by combining with a maleimide compound or an epoxy resin, the curing temperature can be lowered and the thermal characteristics such as the glass transition temperature can be enhanced as compared with the case of curing alone. Therefore, it is preferable to use in combination with a maleimide compound or an epoxy resin for a curing reaction.
本カーボネート樹脂の用途としては、特に制限はない。例えば公知の熱硬化性成形材料の用途と同様であってよく、例えば封止材料、フィルム材料、積層材料等が挙げられる。より具体的な用途の例としては、半導体封止材料、電子部品の封止用樹脂材料、電気絶縁材料、銅張り積層板用樹脂材料、ビルドアップ積層板材料、レジスト材料、液晶のカラーフィルター用樹脂材料、塗料、各種コーティング剤、接着剤、繊維強化プラスチック(FRP)材料等が挙げられる。 There is no restriction | limiting in particular as a use of this carbonate resin. For example, it may be the same as the application of a known thermosetting molding material, and examples thereof include a sealing material, a film material, a laminated material and the like. Examples of more specific applications include semiconductor encapsulation materials, resin materials for encapsulation of electronic components, electrical insulation materials, resin materials for copper-clad laminates, build-up laminate materials, resist materials, for liquid crystal color filters Resin materials, paints, various coating agents, adhesives, fiber reinforced plastic (FRP) materials, etc. may be mentioned.
≪樹脂ワニス≫
本発明の樹脂ワニス(以下、「本樹脂ワニス」ともいう。)は、本カーボネート樹脂と、マレイミド基を2以上有するマレイミド化合物と、溶剤とを含む。
本カーボネート樹脂は、マレイミド硬化剤として機能する。「マレイミド硬化剤」とは、前記マレイミド化合物を硬化させるための硬化剤を意味する。
本樹脂ワニスにおいては、本カーボネート樹脂のアリル基の一部と、マレイミド化合物のマレイミド基の一部とが反応した状態になっていてもよい。
«Resin varnish»
The resin varnish of the present invention (hereinafter, also referred to as "the present resin varnish") contains the present carbonate resin, a maleimide compound having two or more maleimide groups, and a solvent.
The carbonate resin functions as a maleimide curing agent. The "maleimide curing agent" means a curing agent for curing the maleimide compound.
In the resin varnish, a part of the allyl group of the carbonate resin and a part of the maleimide group of the maleimide compound may be in a reacted state.
本カーボネート樹脂が、前記式(1)中の2個のXの少なくとも一方が水素原子である化合物を含む場合、つまり本カーボネート樹脂が水酸基を含む場合、本カーボネート樹脂はエポキシ樹脂硬化剤としても機能する。「エポキシ樹脂硬化剤」とは、エポキシ樹脂を硬化させるための硬化剤を意味する。
したがって、本樹脂ワニスの好ましい一態様は、本カーボネート樹脂と、マレイミド基を2以上有するマレイミド化合物と、エポキシ樹脂と、溶剤とを含み、本カーボネート樹脂が、前記式(1)中の2個のXの少なくとも一方が水素原子である化合物を含む樹脂ワニスである。本態様の樹脂ワニスは、エポキシ樹脂を含まない場合に比べて、誘電特性がより優れる。
When the present carbonate resin contains a compound in which at least one of two X in the formula (1) is a hydrogen atom, that is, when the present carbonate resin contains a hydroxyl group, the present carbonate resin also functions as an epoxy resin curing agent Do. "Epoxy resin curing agent" means a curing agent for curing an epoxy resin.
Therefore, a preferred embodiment of the present resin varnish comprises the present carbonate resin, a maleimide compound having two or more maleimide groups, an epoxy resin, and a solvent, and the present carbonate resin comprises two in the formula (1). It is a resin varnish containing a compound in which at least one of X is a hydrogen atom. The resin varnish of this aspect is more excellent in dielectric properties as compared to the case where it does not contain an epoxy resin.
本樹脂ワニスは、硬化反応触媒をさらに含むことができる。
本樹脂ワニスは、本カーボネート樹脂、マレイミド化合物、溶剤、エポキシ樹脂および硬化反応触媒以外の他の成分をさらに含むことができる。
The resin varnish can further include a curing reaction catalyst.
The resin varnish can further contain other components other than the present carbonate resin, maleimide compound, solvent, epoxy resin and curing reaction catalyst.
<マレイミド化合物>
マレイミド化合物としては、マレイミド基を2以上有する化合物であれば特に限定されず、例えばビスマレイミド化合物、ポリフェニルメタンマレイミド等が挙げられる。
ビスマレイミド化合物としては、例えば4,4’−ジフェニルメタンビスマレイミド(例えば大和化成工業株式会社品のBMI−1100)、アルキルビスマレイミド、ジフェニルメタンビスマレイミド、フェニレンビスマレイミド、ビスフェノールAジフェニルエーテルビスマレイミド(例えば大和化成工業株式会社品のBMI−4000)、3,3’−ジメチル−5,5’−ジエチル−4,4’−ジフェニルメタンビスマレイミド(例えば大和化成工業株式会社品のBMI−5100)、4−メチル−1,3−フェニレンビスマレイミド、1,6’−ビスマレイミド−(2,2,4−トリメチル)ヘキサン、4,4’−ジフェニルエーテルビスマレイミド、4,4’−ジフェニルスルフォンビスマレイミド、1,3−ビス(3−マレイミドフェノキシ)ベンゼン、1,3−ビス(4−マレイミドフェノキシ)ベンゼン等が挙げられる。
ポリフェニルメタンマレイミドは、マレイミド基が置換した3以上のベンゼン環がメチレン基を介して結合した重合体であり、例えば大和化成工業株式会社品のBMI−2300が挙げられる。
これらのマレイミド化合物は1種単独で用いても2種以上を組合わせて用いてもよい。
<Maleimide compound>
The maleimide compound is not particularly limited as long as it is a compound having two or more maleimide groups, and examples thereof include a bismaleimide compound and polyphenylmethane maleimide.
Examples of the bismaleimide compound include 4,4'-diphenylmethane bismaleimide (for example, BMI-1100 manufactured by Daiwa Kasei Kogyo Co., Ltd.), alkyl bismaleimide, diphenylmethane bismaleimide, phenylene bismaleimide, bisphenol A diphenylether bismaleimide (for example, Daiwa Kasei Corp. BMI-4000), manufactured by Kogyo Co., Ltd., 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide (eg, BMI-5100 manufactured by Daiwa Kasei Kogyo Co., Ltd.), 4-methyl- 1,3-phenylenebismaleimide, 1,6'-bismaleimide- (2,2,4-trimethyl) hexane, 4,4'-diphenyletherbismaleimide, 4,4'-diphenylsulfone bismaleimide, 1,3- Bis (3-maleimidophenoki And c) benzene, 1,3-bis (4-maleimidophenoxy) benzene and the like.
Polyphenylmethane maleimide is a polymer in which three or more benzene rings substituted with a maleimide group are bonded via a methylene group, and examples thereof include BMI-2300 manufactured by Daiwa Kasei Kogyo Co., Ltd.
These maleimide compounds may be used alone or in combination of two or more.
本樹脂ワニス中のマレイミド化合物の含有量は、本カーボネート樹脂の100質量部に対し、10〜300質量部が好ましく、15〜200質量部がより好ましく、20〜150質量部がさらに好ましい。マレイミド化合物の含有量が前記範囲の下限値以上であれば、本樹脂ワニスのゲル化温度を低く、例えば200℃以下にすることができる。マレイミド化合物の含有量が前記範囲の下限値以上であれば、本樹脂ワニスの硬化物が、より高ガラス転移温度、高熱分解温度、低線膨張係数、低誘電率、低誘電正接を示すものとなる。 10-300 mass parts is preferable with respect to 100 mass parts of this carbonate resin, as for content of the maleimide compound in this resin varnish, 15-200 mass parts is more preferable, and 20-150 mass parts is more preferable. If the content of the maleimide compound is at least the lower limit value of the above range, the gelling temperature of the resin varnish can be lowered, for example, to 200 ° C. or less. If the content of the maleimide compound is at least the lower limit of the above range, the cured product of the resin varnish exhibits a higher glass transition temperature, a higher thermal decomposition temperature, a lower linear expansion coefficient, a lower dielectric constant, and a lower dielectric loss tangent. Become.
<溶剤>
溶剤としては、本樹脂ワニスに含まれる成分(本カーボネート樹脂、マレイミド化合物、必要に応じて硬化反応触媒等)を溶解するものであれば特に制限はない。
溶剤として典型的には、極性溶剤が用いられる。極性溶剤としては、例えばアセトン、メチルエチルケトン、メチルイソブチルケトン、ジエチルケトン、メチルプロピルケトン、メチルアミルケトン、イソホロン、ジイソブチルケトン、ジアセトンアルコール、シクロヘキサノン等のケトン系溶剤、N,N−ジメチルホルムアミド、N−メチル−2−ピロリドン、メタノール、エタノール、ブタノール、酢酸エチル、酢酸ブチル、メチルセロソルブ、エチルジグリコールアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、テトラヒドロフラン等が挙げられる。これらの溶剤はいずれか1種を単独で用いてもよく2種以上を組合わせて用いてもよい。前記の中でも、ケトン系溶剤が好ましく、メチルエチルケトンが特に好ましい。
<Solvent>
The solvent is not particularly limited as long as it dissolves the components (the present carbonate resin, maleimide compound, curing reaction catalyst, etc., if necessary) contained in the present resin varnish.
As a solvent, a polar solvent is typically used. Examples of polar solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diethyl ketone, methyl propyl ketone, methyl amyl ketone, isophorone, diisobutyl ketone, ketone solvents such as diacetone alcohol and cyclohexanone, N, N-dimethylformamide, N- Examples include methyl-2-pyrrolidone, methanol, ethanol, butanol, ethyl acetate, butyl acetate, methyl cellosolve, ethyl diglycol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, tetrahydrofuran and the like. One of these solvents may be used alone, or two or more thereof may be used in combination. Among the above, ketone solvents are preferable, and methyl ethyl ketone is particularly preferable.
本樹脂ワニス中の溶剤の含有量は本樹脂ワニスの固形分濃度に応じて適宜設定される。
本樹脂ワニスの固形分濃度は、用途によっても異なるが、20〜80質量%が好ましく、50〜70質量%がより好ましい。
本樹脂ワニスの固形分濃度は、本樹脂ワニスの全質量に対する、本樹脂ワニスから溶剤を除いた質量の割合である。
The content of the solvent in the present resin varnish is appropriately set according to the solid content concentration of the present resin varnish.
Although solid content concentration of this resin varnish changes also with uses, 20-80 mass% is preferable, and 50-70 mass% is more preferable.
The solid content concentration of the present resin varnish is the ratio of the mass of the present resin varnish excluding the solvent to the total mass of the present resin varnish.
<エポキシ樹脂>
エポキシ樹脂としては、特に限定されず、公知のエポキシ樹脂であってよく、例えばフェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビフェノール型エポキシ樹脂、ナフタレン型エポキシ樹脂、アントラセン型エポキシ樹脂、ナフトール型エポキシ樹脂、キシリレン型エポキシ樹脂、ビフェニル型エポキシ樹脂、トリフェニルメタン型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、スチルベン型エポキシ樹脂、硫黄原子含有エポキシ樹脂、リン原子含有エポキシ樹脂等が挙げられる。これらのエポキシ樹脂はいずれか1種を単独で用いてもよく2種以上を組合わせて用いてもよい。
<Epoxy resin>
The epoxy resin is not particularly limited and may be a known epoxy resin, such as phenol novolac epoxy resin, ortho cresol novolac epoxy resin, bisphenol A epoxy resin, bisphenol F epoxy resin, biphenol epoxy resin, Naphthalene type epoxy resin, anthracene type epoxy resin, naphthol type epoxy resin, xylylene type epoxy resin, biphenyl type epoxy resin, triphenylmethane type epoxy resin, dicyclopentadiene type epoxy resin, stilbene type epoxy resin, sulfur atom containing epoxy resin, A phosphorus atom containing epoxy resin etc. are mentioned. One of these epoxy resins may be used alone, or two or more of these epoxy resins may be used in combination.
<硬化反応触媒>
硬化反応触媒(硬化促進剤)としては、アリル基とマレイミド基との反応を促進する作用を有する触媒(以下、「触媒(1)」ともいう。)を含むことが好ましい。触媒(1)としては、例えば、イミダゾール化合物、有機過酸化物等が挙げられる。イミダゾール化合物としては、2−エチル−4−メチルイミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2,4−ジメチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、1−ビニル−2−メチルイミダゾール、1−プロピル−2−メチルイミダゾール、2−イソプロピルイミダゾール、1−シアノメチル−2−メチルイミダゾール、1−シアノエチル−2−エチル−4−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−フェニルイミダゾール等が挙げられる。有機過酸化物としては、ケトンパーオキサイド、パーオキシケタール、ハイドロパーオキサイド、ジアルキルパーオキサイド、ジアシルパーオキサイド、パーオキシジカーボネート、パーオキシエステル等が挙げられる。ジアルキルパーオキサイドにおいて、アルキル基は、フェニル基等で置換されていてもよい。このようなジアルキルパーオキサイドとしては、例えばジクミルパーオキサイドが挙げられる。
<Curing reaction catalyst>
As the curing reaction catalyst (curing accelerator), it is preferable to include a catalyst (hereinafter, also referred to as “catalyst (1)”) having an action of promoting the reaction between an allyl group and a maleimide group. Examples of the catalyst (1) include imidazole compounds and organic peroxides. Examples of imidazole compounds include 2-ethyl-4-methylimidazole, 2-methylimidazole, 2-ethylimidazole, 2,4-dimethylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2- Phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 1-vinyl-2-methylimidazole 1-propyl-2-methylimidazole, 2-isopropylimidazole, 1-cyanomethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1- Anoechiru 2-phenyl imidazole, and the like. Examples of organic peroxides include ketone peroxides, peroxy ketals, hydroperoxides, dialkyl peroxides, diacyl peroxides, peroxy dicarbonates, and peroxy esters. In the dialkyl peroxide, the alkyl group may be substituted by a phenyl group or the like. Examples of such dialkyl peroxides include dicumyl peroxide.
本カーボネート樹脂が水酸基を有し、本樹脂ワニスがエポキシ樹脂を含む場合、硬化反応触媒として、水酸基とエポキシ基との反応を促進する作用を有する触媒(以下、「触媒(2)」ともいう。)を含んでいてもよい。触媒(2)としては、例えば、リン系化合物、第3級アミン、イミダゾール化合物、有機酸金属塩、ルイス酸、アミン錯塩等が挙げられる。リン系化合物としては、トリフェニルホスフィン、トリス−2,6−ジメトキシフェニルホスフィン、トリ−p−トリルホスフィン、亜リン酸トリフェニル等が挙げられる。第3級アミンとしては、2−ジメチルアミノメチルフェノール、ベンジルジメチルアミン、α−メチルベンジルジメチルアミン、1,8−ジアザビシクロ[5.4.0]ウンデセン−7等が挙げられる。イミダゾール化合物としては、前記と同様のものが挙げられる。 When the present carbonate resin has a hydroxyl group and the present resin varnish contains an epoxy resin, it is also referred to as a catalyst having a function of promoting the reaction between the hydroxyl group and the epoxy group as a curing reaction catalyst (hereinafter referred to as "catalyst (2)"). ) May be included. Examples of the catalyst (2) include phosphorus compounds, tertiary amines, imidazole compounds, organic acid metal salts, Lewis acids, amine complex salts and the like. Examples of phosphorus compounds include triphenylphosphine, tris-2, 6-dimethoxyphenyl phosphine, tri-p-tolyl phosphine, triphenyl phosphite and the like. Examples of tertiary amines include 2-dimethylaminomethylphenol, benzyldimethylamine, α-methylbenzyldimethylamine, and 1,8-diazabicyclo [5.4.0] undecene-7. As an imidazole compound, the thing similar to the above is mentioned.
これらの硬化反応触媒はいずれか1種を単独で用いてもよく2種以上を組合わせて用いてもよい。
本樹脂ワニス中の触媒(1)の含有量は、マレイミド化合物に対し、0.1〜5.0質量%が好ましい。
本樹脂ワニス中の触媒(2)の含有量は、エポキシ樹脂に対し、0.1〜5.0質量%が好ましい。
本樹脂ワニス中の触媒(1)および触媒(2)の合計の含有量は、マレイミド化合物およびエポキシ樹脂の合計量に対し、0.1〜5.0質量%が好ましい。
One of these curing reaction catalysts may be used alone, or two or more thereof may be used in combination.
The content of the catalyst (1) in the present resin varnish is preferably 0.1 to 5.0% by mass with respect to the maleimide compound.
The content of the catalyst (2) in the present resin varnish is preferably 0.1 to 5.0% by mass with respect to the epoxy resin.
The total content of the catalyst (1) and the catalyst (2) in the resin varnish is preferably 0.1 to 5.0% by mass with respect to the total amount of the maleimide compound and the epoxy resin.
<他の成分>
他の成分としては、例えば、無機フィラー(例えばカーボンブラック、ガラスクロス、シリカ等)、ワックス、難燃剤、カップリング剤等、本カーボネート樹脂以外の硬化剤(以下、他の硬化剤ともいう。)、充填材(フィラー)、離型剤、表面処理剤、着色剤、可撓性付与剤等が挙げられる。他の硬化剤としては、マレイミド硬化剤、エポキシ樹脂硬化剤等が挙げられ、それぞれ従来公知のものを用いることができる。例えばマレイミド硬化剤としては、アリルノボラック型フェノール樹脂等のノボラック型樹脂等が挙げられる。
本樹脂ワニス中の他の硬化剤の含有量は、本発明の効果の点では、本樹脂ワニスの固形分(100質量%)に対し、10質量%以下が好ましく、0質量%が特に好ましい。
本樹脂ワニスの固形分は、本樹脂ワニスから溶剤を除いた部分である。
<Other ingredients>
As other components, for example, inorganic fillers (for example, carbon black, glass cloth, silica, etc.), waxes, flame retardants, coupling agents, etc., curing agents other than the present carbonate resin (hereinafter, also referred to as other curing agents). And fillers, mold release agents, surface treatment agents, colorants, flexibility imparting agents and the like. Examples of other curing agents include maleimide curing agents, epoxy resin curing agents and the like, and conventionally known ones can be used. For example, as the maleimide curing agent, novolac resins such as allyl novolac phenol resins and the like can be mentioned.
From the viewpoint of the effect of the present invention, the content of the other curing agent in the present resin varnish is preferably 10% by mass or less, and particularly preferably 0% by mass, with respect to the solid content (100% by mass) of the present resin varnish.
The solid content of the present resin varnish is a portion obtained by removing the solvent from the present resin varnish.
充填材(フィラー)としては、カーボンブラック、結晶性シリカ粉、溶融性シリカ粉、石英ガラス粉、タルク、ケイ酸カルシウム粉、ケイ酸ジルコニウム粉、アルミナ粉、炭酸カルシウム粉等が挙げられ、結晶性シリカ粉、溶融性シリカ粉が好ましい。
離型剤としては、例えばカルナバワックス等の各種ワックス類等が挙げられる。
表面処理剤としては、公知のシランカップリング剤等が挙げられる。
着色剤としては、カーボンブラック等が挙げられる。
可撓性付与剤としては、シリコーン樹脂、ブタジエン−アクリロニトリルゴム等が挙げられる。
Examples of fillers include carbon black, crystalline silica powder, fusible silica powder, quartz glass powder, talc, calcium silicate powder, zirconium silicate powder, alumina powder, calcium carbonate powder, etc. Silica powder and fusible silica powder are preferred.
As a mold release agent, various waxes, such as carnauba wax, etc. are mentioned, for example.
As a surface treating agent, a well-known silane coupling agent etc. are mentioned.
As a coloring agent, carbon black etc. are mentioned.
As the flexibility imparting agent, silicone resin, butadiene-acrylonitrile rubber and the like can be mentioned.
<樹脂ワニスの製造方法>
本樹脂ワニスは、例えば、本カーボネート樹脂とマレイミド化合物と溶剤とを混合することにより製造できる。本カーボネート樹脂とマレイミド化合物と溶剤とを混合する際に、または混合した後、必要に応じて、エポキシ樹脂や硬化反応触媒、他の成分をさらに混合してもよい。
本カーボネート樹脂は、上述の製造方法により製造できる。マレイミド化合物やエポキシ樹脂、硬化反応触媒、他の成分はそれぞれ市販品を用いることができる。各成分の混合は、常法により行うことができる。
<Method of producing resin varnish>
The present resin varnish can be produced, for example, by mixing the present carbonate resin, a maleimide compound and a solvent. When or after mixing the present carbonate resin, maleimide compound and solvent, if necessary, an epoxy resin, a curing reaction catalyst, and other components may be further mixed.
This carbonate resin can be manufactured by the above-mentioned manufacturing method. A maleimide compound, an epoxy resin, a curing reaction catalyst, and another component can use a commercial item, respectively. Mixing of each component can be performed by a conventional method.
本カーボネート樹脂とマレイミド化合物と溶剤との混合の後、本カーボネート樹脂とマレイミド化合物とを前反応させてもよい。前記の混合によって得られたワニス状態の混合物について前反応を行うことで、結晶性が高いマレイミド化合物が樹脂ワニスから析出するのを抑制することができる。
前反応を行う際の反応温度は50〜150℃が好ましく、70〜130℃がより好ましく、80〜120℃がさらに好ましい。反応温度があまりに低いと反応は進まず、あまりに高すぎると反応をコントロールすることが難しくなり、目的の本樹脂ワニスを安定的に得ることが難しくなる。
After mixing the present carbonate resin, the maleimide compound and the solvent, the present carbonate resin and the maleimide compound may be prereacted. By pre-reacting the mixture in the varnish state obtained by the above mixing, it is possible to suppress the precipitation of the maleimide compound having high crystallinity from the resin varnish.
50-150 degreeC is preferable, as for the reaction temperature at the time of pre-reacting, 70-130 degreeC is more preferable, and 80-120 degreeC is further more preferable. If the reaction temperature is too low, the reaction does not proceed, and if it is too high, it becomes difficult to control the reaction and it becomes difficult to stably obtain the desired present resin varnish.
本樹脂ワニスは、本カーボネート樹脂とマレイミド化合物とを含むため、加熱することによって硬化させ、硬化物とすることができる。
本樹脂ワニスを硬化させる際の加熱温度(硬化温度)は60〜250℃が好ましい。
硬化操作の一例としては、前記の好適な温度で30秒間以上1時間以下の前硬化を行い、溶剤を除去し、その後さらに、前記の好適な温度で1〜20時間の後硬化を行う方法が挙げられる。
Since the present resin varnish contains the present carbonate resin and the maleimide compound, it can be cured by heating to form a cured product.
As for the heating temperature (hardening temperature) at the time of hardening this resin varnish, 60-250 degreeC is preferable.
As an example of the curing operation, there is a method of performing pre-curing for 30 seconds to 1 hour at the above-mentioned suitable temperature, removing the solvent, and then performing post-curing for 1 to 20 hours at the above-mentioned suitable temperature. It can be mentioned.
本樹脂ワニスにあっては、マレイミド化合物を用いているために、本樹脂ワニスの硬化物が高ガラス転移温度、高熱分解温度、低熱線膨張率を示す。また、この硬化物は、マレイミド化合物の硬化剤として本カーボネート樹脂を用いているため、マレイミド化合物をアリルフェノール樹脂で硬化させた硬化物や、エポキシ樹脂をフェノールノボラック樹脂で硬化させた硬化物に比べて、低誘電率、低誘電正接である。 In the present resin varnish, since the maleimide compound is used, the cured product of the present resin varnish exhibits a high glass transition temperature, a high thermal decomposition temperature, and a low thermal expansion coefficient. Moreover, since this hardened | cured material is using this carbonate resin as a hardening | curing agent of a maleimide compound, compared with the hardened | cured material which hardened the maleimide compound by allylphenol resin and the hardened | cured material which hardened epoxy resin by phenol novolak resin. Low dielectric constant and low dielectric loss tangent.
本樹脂ワニスの用途としては、特に制限はない。例えば公知の熱硬化性成形材料の用途と同様であってよく、例えば封止材料、フィルム材料、積層材料等が挙げられる。より具体的な用途の例としては、半導体封止材料、電子部品の封止用樹脂材料、電気絶縁材料、銅張り積層板用樹脂材料、ビルドアップ積層板材料、レジスト材料、液晶のカラーフィルター用樹脂材料、塗料、各種コーティング剤、接着剤、繊維強化プラスチック(FRP)材料等が挙げられる。
本樹脂ワニスの硬化物は、低誘電率、低誘電正接であり、絶縁性に優れる。また、この硬化物は、高ガラス転移温度、高熱分解温度、低熱膨張率あり、耐熱性にも優れる。そのため、本樹脂ワニスは、電子部品に用いられる積層板の製造用の材料として有用である。
There is no restriction | limiting in particular as a use of this resin varnish. For example, it may be the same as the application of a known thermosetting molding material, and examples thereof include a sealing material, a film material, a laminated material and the like. Examples of more specific applications include semiconductor encapsulation materials, resin materials for encapsulation of electronic components, electrical insulation materials, resin materials for copper-clad laminates, build-up laminate materials, resist materials, for liquid crystal color filters Resin materials, paints, various coating agents, adhesives, fiber reinforced plastic (FRP) materials, etc. may be mentioned.
The cured product of the resin varnish has a low dielectric constant and a low dielectric loss tangent, and is excellent in insulation. In addition, this cured product has a high glass transition temperature, a high thermal decomposition temperature, a low thermal expansion coefficient, and is also excellent in heat resistance. Therefore, this resin varnish is useful as a material for manufacture of the laminated board used for an electronic component.
本樹脂ワニスの硬化物の比誘電率は、3.50以下が好ましい。
本樹脂ワニスの硬化物の誘電正接は、0.008以下が好ましい。
本樹脂ワニスの硬化物のガラス転移温度は、150℃以上が好ましい。
本樹脂ワニスの硬化物の5%熱分解温度は、300℃以上が好ましい。
本樹脂ワニスの硬化物の常温線膨張係数は、100ppm以下が好ましい。
比誘電率、誘電正接、ガラス転移温度、5%熱分解温度、常温線膨張係数はそれぞれ、後述する実施例に記載の方法により測定される。
The relative dielectric constant of the cured product of the resin varnish is preferably 3.50 or less.
The dielectric loss tangent of the cured product of the resin varnish is preferably 0.008 or less.
As for the glass transition temperature of the hardened | cured material of this resin varnish, 150 degreeC or more is preferable.
The 5% thermal decomposition temperature of the cured product of the resin varnish is preferably 300 ° C. or higher.
The normal temperature linear expansion coefficient of the cured product of the resin varnish is preferably 100 ppm or less.
The relative dielectric constant, the dielectric loss tangent, the glass transition temperature, the 5% thermal decomposition temperature, and the room-temperature linear expansion coefficient are each measured by the method described in the examples described later.
≪積層板の製造方法≫
本発明の積層板の製造方法では、本樹脂ワニスを繊維質基材に含浸させ、本樹脂ワニスが含浸した繊維質基材を加熱加圧し、硬化させて積層板を得る。
«Method of manufacturing laminates»
In the method for producing a laminate of the present invention, the present resin varnish is impregnated into a fibrous base material, the fibrous base material impregnated with the present resin varnish is heated and pressed, and cured to obtain a laminated board.
本発明の積層板の製造方法により製造される積層板は、繊維質基材と本樹脂ワニスの硬化物とを含む繊維強化樹脂層を備える。前記積層板が備える繊維強化樹脂層の数は1層でもよく2層以上でもよい。
前記積層板は、前記繊維強化樹脂層以外の他の層をさらに備えてもよい。他の層としては、例えば銅箔等の金属箔層が挙げられる。
The laminated board manufactured by the manufacturing method of the laminated board of this invention is equipped with the fiber reinforced resin layer containing a fibrous base material and the hardened | cured material of this resin varnish. The number of fiber reinforced resin layers included in the laminate may be one or two or more.
The laminate may further include another layer other than the fiber reinforced resin layer. As another layer, metal foil layers, such as copper foil, are mentioned, for example.
繊維質基材としては、例えばガラス繊維、炭素繊維、セラミック繊維、ステンレス繊維等の無機繊維;綿、麻、紙等の天然繊維;ポリエステル樹脂、ポリアミド樹脂等の合成有機繊維;等が挙げられる。これらはいずれか1種を単独で用いてもよく2種以上を組合わせて用いてもよい。
繊維質基材の形状は特に限定されず、例えば短繊維、ヤーン、マット、シート等が挙げられる。
Examples of the fibrous base material include inorganic fibers such as glass fibers, carbon fibers, ceramic fibers and stainless steel fibers; natural fibers such as cotton, hemp and paper; and synthetic organic fibers such as polyester resin and polyamide resin. One of these may be used alone, or two or more of these may be used in combination.
The shape of the fibrous base material is not particularly limited, and examples thereof include staple fibers, yarns, mats, sheets and the like.
本発明の積層板の製造方法の一実施形態として、本樹脂ワニスを繊維質基材に含浸させ、乾燥(溶剤を除去)してプリプレグを得て、必要に応じて前記プリプレグを複数枚積層し、必要に応じて前記プリプレグまたはその積層物の片面又は両面にさらに金属箔を積層し、加熱加圧して硬化させる方法が挙げられる。 As one embodiment of the method for producing a laminate of the present invention, the present resin varnish is impregnated into a fibrous base material, dried (solvent is removed) to obtain a prepreg, and a plurality of the prepregs are laminated as required. If necessary, a metal foil may be further laminated on one side or both sides of the above prepreg or a laminate thereof, and a method of heating and pressing may be used.
繊維質基材に含浸させる本樹脂ワニスの量としては、特に限定されない。例えば、本樹脂ワニスの固形分量が、繊維質基材(100質量%)に対して30〜50質量%程度とされる。
本樹脂ワニスが含浸した繊維質基材を加熱加圧する際の加熱温度は、前述の硬化温度が好ましい。加圧条件としては、2〜20kN/m2が好ましい。
It does not specifically limit as a quantity of this resin varnish with which a fibrous base material is impregnated. For example, the solid content of the present resin varnish is about 30 to 50% by mass with respect to the fibrous base material (100% by mass).
The heating temperature when heating and pressing the fibrous base material impregnated with the resin varnish is preferably the above-mentioned curing temperature. As pressurization conditions, 2-20 kN / m < 2 > is preferable.
本発明の積層板の製造方法により得られる積層板は、繊維質基材と本樹脂ワニスの硬化物とを含む繊維強化樹脂層を備えており、この繊維強化樹脂層は、前記硬化物が低誘電率、低誘電正接であることから、絶縁性に優れる。また、繊維強化樹脂層は、前記硬化物が高ガラス転移温度、高熱分解温度、低熱膨張率であることから、耐熱性にも優れる。 The laminate obtained by the method for producing a laminate of the present invention comprises a fiber-reinforced resin layer containing a fibrous base material and a cured product of the present resin varnish, and the fiber-reinforced resin layer is low in the cured product. Since the dielectric constant and the low dielectric loss tangent are excellent in insulation. Further, the fiber reinforced resin layer is excellent in heat resistance because the cured product has a high glass transition temperature, a high thermal decomposition temperature, and a low thermal expansion coefficient.
以下に、本発明を実施例によってさらに詳しく説明するが、本発明は実施例に限定されるものではない。
以下の各例において「%」は、特に限定のない場合は「質量%」を示す。
以下の各例で用いた測定方法を以下に示す。
Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to the examples.
In each of the following examples, "%" indicates "% by mass" unless otherwise specified.
The measuring method used in each of the following examples is shown below.
[樹脂の重量平均分子量(Mw)、数平均分子量(Mn)、分散度(Mw/Mn)]
下記のGPC装置及びカラムを使用し、標準物質をポリスチレンとして重量平均分子量(Mw)および数平均分子量(Mn)を測定し、分散度(Mw/Mn)を求めた。
GPC装置:東ソー社製のHLC8120GPC。
カラム:東ソー社製のTSKgel(登録商標) G3000H+G2000H+G2000H。
[Weight average molecular weight of resin (Mw), number average molecular weight (Mn), dispersion degree (Mw / Mn)]
The weight average molecular weight (Mw) and the number average molecular weight (Mn) were measured using polystyrene as the standard substance using the following GPC apparatus and column, and the degree of dispersion (Mw / Mn) was determined.
GPC apparatus: HLC 8120 GPC manufactured by Tosoh Corporation.
Column: TSKgel (registered trademark) G3000H + G2000H + G2000H manufactured by Tosoh Corporation.
[樹脂の軟化点]
JIS K 6910に従って軟化点(℃)を測定した。
[Softening point of resin]
The softening point (° C.) was measured according to JIS K 6910.
[樹脂の溶融粘度]
150℃に設定した溶融粘度計(ブルックフィールド社製CAP2000 VISCOMETER)により、150℃における溶融粘度(P)を測定した。
[Melt viscosity of resin]
The melt viscosity (P) at 150 ° C. was measured by a melt viscometer set at 150 ° C. (CAP2000 VISCOMETER manufactured by Brookfield).
[ガラス転移温度]
得られた成形物を幅10.0mm×長さ5.5mm×厚さ1.5mmの大きさに加工し、測定試料とした。この測定試料について、粘弾性測定装置(日立ハイテクサイエンス社製DMA7100)を用い、2℃/分の昇温速度で30℃〜400℃の範囲でtanδを測定し、ガラス転移温度(℃)を求めた。
[Glass-transition temperature]
The obtained molded product was processed into a size of width 10.0 mm × length 5.5 mm × thickness 1.5 mm as a measurement sample. About this measurement sample, tan δ is measured in the range of 30 ° C. to 400 ° C. at a temperature rising rate of 2 ° C./min using a viscoelasticity measuring apparatus (DMA7100 manufactured by Hitachi High-Tech Science Co., Ltd.) to determine the glass transition temperature (° C.) The
[5%熱分解温度]
得られた成形物を微粉砕し、測定試料とした。この測定試料について、示差熱熱重量同時測定装置(セイコーインスツルメンツ社製TG/DTA6300)により、エアー雰囲気下で10℃/分の昇温速度で30〜800℃の範囲で熱重量減量を測定し、5%熱分解温度(℃)を求めた。
[5% thermal decomposition temperature]
The obtained molded product was pulverized and used as a measurement sample. For this measurement sample, the thermal weight loss is measured in the range of 30 to 800 ° C. at a heating rate of 10 ° C./min in an air atmosphere using a differential thermal thermal gravimetric simultaneous measurement device (TG / DTA 6300 manufactured by Seiko Instruments Inc.), The 5% thermal decomposition temperature (° C.) was determined.
[常温線膨張係数]
得られた成形物を幅5.0mm×長さ5.0mm×厚さ1.5mmの大きさに加工し、測定試料とした。この測定試料について、熱機械分析装置(日立ハイテクサイエンス社製TMA7100)を用いて2℃/分の昇温速度で30℃〜400℃の範囲で硬化物の熱膨張を測定し、常温線膨張係数(ppm)を求めた。常温線膨張係数は、30℃での線膨張係数を示す。
[Room temperature linear expansion coefficient]
The obtained molded product was processed into a size of width 5.0 mm × length 5.0 mm × thickness 1.5 mm as a measurement sample. For this measurement sample, the thermal expansion of the cured product is measured in the range of 30 ° C. to 400 ° C. at a temperature rise rate of 2 ° C./min using a thermomechanical analyzer (TMA 7100 manufactured by Hitachi High-Tech Science Co., Ltd.) (Ppm) was determined. The normal temperature linear expansion coefficient indicates a linear expansion coefficient at 30 ° C.
[比誘電率、誘電正接]
得られた成形物を幅50.0mm×長さ50.0mm×厚さ1.5mmの大きさに加工し、測定試料とした。この測定試料について、空洞共振摂動法により周波数1GHzにおける比誘電率(εr)および誘電正接(tanδ)を求めた。
[Permittivity, dielectric loss tangent]
The obtained molded product was processed into a size of width 50.0 mm × length 50.0 mm × thickness 1.5 mm as a measurement sample. The dielectric constant (ε r ) and the dielectric loss tangent (tan δ) at a frequency of 1 GHz were determined for this measurement sample by the cavity resonance perturbation method.
<合成例1:ジアリルビスフェノールFの合成>
温度計、攪拌機、冷却管を備えた内容量3Lの反応容器に、ビスフェノールF(群栄化学製BPF−SG)1000.0g、メタノール800.0gを仕込み、発熱に注意しながら水酸化ナトリウム480gを分割添加した。次いで、塩化アリル995.0gを35℃以下で発熱に注意しながら2時間かけて滴下し、同温度で2時間反応させた後、65℃まで昇温し、5時間反応させて、ビスフェノールFのアリルエーテル化を行った。次いで、得られた反応液から減圧下でメタノールを除去した後、多量の塩を水洗で除去した。水洗後の反応液を、窒素雰囲気下で190℃まで昇温し、5時間反応させることでアリル基を転移させ、目的とするジアリルビスフェノールFを得た。得られたジアリルビスフェノールFは常温で液体であり、25℃での粘度はE型粘度計で0.8Pa・sであった。
Synthesis Example 1: Synthesis of diallyl bisphenol F
In a 3-liter reaction vessel equipped with a thermometer, a stirrer, and a cooling tube, 1000.0 g of bisphenol F (BPF-SG manufactured by Gun-ei Chemical Co., Ltd.) and 800.0 g of methanol are charged, and 480 g of sodium hydroxide while paying attention to heat generation Separately added. Then, 995.0 g of allyl chloride is added dropwise over 2 hours while paying attention to heat generation at 35 ° C. or lower, reacted at the same temperature for 2 hours, heated to 65 ° C., reacted for 5 hours, Allyl etherification was performed. Next, after removing methanol from the obtained reaction solution under reduced pressure, a large amount of salt was removed by water washing. The reaction solution after washing with water was heated up to 190 ° C. under a nitrogen atmosphere, and reacted for 5 hours to transfer an allyl group to obtain the desired diallyl bisphenol F. The obtained diallyl bisphenol F was liquid at normal temperature, and the viscosity at 25 ° C. was 0.8 Pa · s by an E-type viscometer.
<合成例2:ジアリルビスフェノールAの合成>
合成例1において、ビスフェノールFの1000.0gに代えてビスフェノールAの1140.0gを用い、メタノール量を912.0gに変更したこと以外は合成例1と同様の操作を行ってジアリルビスフェノールAを得た。得られたジアリルビスフェノールAは常温で液体であり、25℃での粘度はE型粘度計で21.2Pa・sであった。
Synthesis Example 2 Synthesis of Diallyl Bisphenol A
In Synthetic Example 1, diallyl bisphenol A is obtained in the same manner as in Synthetic Example 1 except that 1140.0 g of bisphenol A is used instead of 1000.0 g of bisphenol F and the amount of methanol is changed to 912.0 g. The The obtained diallyl bisphenol A was liquid at normal temperature, and the viscosity at 25 ° C. was 21.2 Pa · s with an E-type viscometer.
<合成例3:炭酸ジフェニル、トリシクロデカンジメタノール、ジアリルビスフェノールFを使用したカーボネート樹脂の合成>
温度計、攪拌機、冷却管を備えた内容量1Lの反応容器に炭酸ジフェニル214.2g(1.00モル)、トリシクロデカンジメタノール98.1g(0.50モル)を仕込み、100℃で溶融混合した。その後、48%KOH水溶液0.02gを添加し、発熱に注意しながら180℃まで昇温し1時間常圧下で反応させた。次いで、130℃まで冷却し、合成例1で得たジアリルビスフェノールFの183.0g(0.61モル)を添加し、180℃まで昇温し1時間常圧下で反応させた。その後、系内を180℃で維持しながら10mmHgまでゆっくり減圧した。次いで、減圧下のまま220℃まで昇温し2時間減圧下で反応させた。その後、反応生成物を水洗、濃縮し、アリル基含有カーボネート樹脂を得た。この樹脂の軟化点は93.5℃、150℃における溶融粘度は45.6Pであった。ゲル浸透クロマトグラフ分析(以下、GPCと略記することもある。)によるMwは9153、Mnは3139、Mw/Mnは2.916、式(1)で表される化合物の含有量は97.2%であった。
Synthesis Example 3: Synthesis of carbonate resin using diphenyl carbonate, tricyclodecanedimethanol, diallyl bisphenol F
214.2 g (1.00 mol) of diphenyl carbonate and 98.1 g (0.50 mol) of tricyclodecanedimethanol are charged into a 1 L reaction vessel equipped with a thermometer, a stirrer, and a cooling pipe, and melted at 100 ° C. Mixed. Thereafter, 0.02 g of a 48% aqueous solution of KOH was added, and the temperature was raised to 180 ° C., taking care of heat generation, and the reaction was conducted under normal pressure for 1 hour. Then, the reaction solution was cooled to 130 ° C., 183.0 g (0.61 mol) of diallyl bisphenol F obtained in Synthesis Example 1 was added, the temperature was raised to 180 ° C., and reaction was conducted under normal pressure for 1 hour. Thereafter, the pressure was slowly reduced to 10 mmHg while maintaining the system at 180 ° C. Then, the temperature was raised to 220 ° C. while under reduced pressure, and reaction was performed under reduced pressure for 2 hours. Thereafter, the reaction product was washed with water and concentrated to obtain an allyl group-containing carbonate resin. The softening point of this resin was 93.5 ° C. and the melt viscosity at 150 ° C. was 45.6 P. The Mw is 9153, the Mn is 3139, the Mw / Mn is 2.916, and the content of the compound represented by the formula (1) is 97.2 according to gel permeation chromatography analysis (hereinafter sometimes abbreviated as GPC). %Met.
<合成例4:炭酸ジフェニル、トリシクロデカンジメタノール、ジアリルビスフェノールFを使用したカーボネート樹脂の合成>
合成例3において、トリシクロデカンジメタノールの98.1gを157.0g(0.80モル)に変更し、ジアリルビスフェノールFの183.0gを93.0g(0.31モル)に変更したこと以外は合成例3と同様の操作を行い、アリル基含有カーボネート樹脂を得た。この樹脂の軟化点は98.4℃、150℃における溶融粘度は69.6Pであった。GPCによるMwは6774、Mnは2506、Mw/Mnは2.703、式(1)で表される化合物の含有量は97.3%であった。
Synthesis Example 4: Synthesis of carbonate resin using diphenyl carbonate, tricyclodecanedimethanol, diallyl bisphenol F
In Synthesis Example 3 except that 98.1 g of tricyclodecanedimethanol was changed to 157.0 g (0.80 mol) and 183.0 g of diallyl bisphenol F was changed to 93.0 g (0.31 mol) Carried out the same operation as in Synthesis Example 3 to obtain an allyl group-containing carbonate resin. The softening point of this resin was 98.4 ° C. and the melt viscosity at 150 ° C. was 69.6 P. The Mw by GPC was 6774, the Mn was 2506, the Mw / Mn was 2.703, and the content of the compound represented by the formula (1) was 97.3%.
<合成例5:炭酸ジフェニル、トリシクロデカンジメタノール、ジアリルビスフェノールAを使用したカーボネート樹脂の合成>
合成例3において、ジアリルビスフェノールFの183.0gを、合成例2で得たジアリルビスフェノールAの208.6g(0.61モル)に変更したこと以外は合成例3と同様の操作を行い、アリル基含有カーボネート樹脂を得た。この樹脂の軟化点は108.4℃、200℃における溶融粘度は26.1Pであった。GPCによるMwは9711、Mnは3309、Mw/Mnは2.935、式(1)で表される化合物の含有量は96.5%であった。
Synthesis Example 5 Synthesis of Carbonate Resin Using Diphenyl Carbonate, Tricyclodecane Dimethanol, and Diallyl Bisphenol A>
The same procedure as in Synthesis Example 3 is performed except that 183.0 g of diallyl bisphenol F is changed to 208.6 g (0.61 mol) of diallyl bisphenol A obtained in Synthesis Example 2 in Synthesis Example 3. A group-containing carbonate resin was obtained. The softening point of this resin was 108.4 ° C. and the melt viscosity at 200 ° C. was 26.1 P. The Mw by GPC was 9711, the Mn was 3309, the Mw / Mn was 2.935, and the content of the compound represented by the formula (1) was 96.5%.
<実施例1>
合成例3で合成したアリル基含有カーボネート樹脂の100gと、マレイミド化合物として大和化成工業社製のBMI−2300(ポリフェニルメタンマレイミド、マレイミド当量:186.0g/eq)の23.7gと、硬化反応触媒としてジクミルパーオキサイドの1.2g(全樹脂量に対して1%)とを、メチルエチルケトンに固形分60%になるように溶解し樹脂ワニスを得た。
得られた樹脂ワニスをガラスクロス(Eガラス)に、樹脂分40%になるように含浸し、100℃で10分間乾燥させ、溶剤を除去してプリプレグを得た。このプリプレグを6枚重ね、180℃でプレス成形し、その後、230℃で5時間アフターベークを行い、厚さ1.5mmの成形物(積層板)を得た。樹脂分とは、成形物の総質量に対する樹脂(硬化物)の割合を示す。
Example 1
100 g of the allyl group-containing carbonate resin synthesized in Synthesis Example 3 and 23.7 g of BMI-2300 (polyphenylmethane maleimide, maleimide equivalent: 186.0 g / eq) manufactured by Daiwa Chemical Industries, Ltd. as a maleimide compound, and a curing reaction As a catalyst, 1.2 g of dicumyl peroxide (1% relative to the total resin amount) was dissolved in methyl ethyl ketone so as to have a solid content of 60% to obtain a resin varnish.
The obtained resin varnish was impregnated into a glass cloth (E glass) to a resin content of 40%, dried at 100 ° C. for 10 minutes, and the solvent was removed to obtain a prepreg. Six pieces of this prepreg were stacked, press-molded at 180 ° C., and then after-baked at 230 ° C. for 5 hours to obtain a molded product (laminated plate) having a thickness of 1.5 mm. The resin content indicates the ratio of the resin (cured product) to the total mass of the molded product.
<実施例2>
実施例1においてBMI−2300の23.7gを47.4gに代えたこと以外は実施例1と同様の方法で樹脂ワニスを調製し、成形物を得た。
Example 2
A resin varnish was prepared in the same manner as in Example 1 except that 23.7 g of BMI-2300 in Example 1 was replaced by 47.4 g, to obtain a molded product.
<実施例3>
実施例1においてのBMI−2300の23.7gを大和化成工業社製のBMI−4000(ビスフェノールAジフェニルエーテルビスマレイミド、マレイミド当量:285.1g/eq)の72.7gに代えたこと以外は実施例1と同様の方法で樹脂ワニスを調製し、成形物を得た。
Example 3
Example except replacing 23.7 g of BMI-2300 in Example 1 with 72.7 g of BMI-4000 (bisphenol A diphenyl ether bismaleimide, maleimide equivalent: 285.1 g / eq) manufactured by Daiwa Kasei Kogyo Co., Ltd. A resin varnish was prepared in the same manner as 1 to obtain a molded product.
<実施例4>
合成例4で合成したアリル基含有カーボネート樹脂の100gと、マレイミド化合物として大和化成工業社製のBMI−4000の91.0gと、硬化反応触媒としてジクミルパーオキサイドの1.9g(全樹脂量に対して1%)とを、メチルエチルケトンに固形分60%になるように溶解し樹脂ワニスを得た。
得られた樹脂ワニスをガラスクロス(Eガラス)に、樹脂分40%になるように含浸し、100℃で10分間乾燥させ、溶剤を除去してプリプレグを得た。このプリプレグを6枚重ね、180℃でプレス成形し、その後、230℃で5時間アフターベークを行い、厚さ1.5mmの成形物(積層板)を得た。
Example 4
100 g of the allyl group-containing carbonate resin synthesized in Synthesis Example 4, 91.0 g of BMI-4000 manufactured by Daiwa Kasei Kogyo Co., Ltd. as a maleimide compound, and 1.9 g of dicumyl peroxide as a curing reaction catalyst (total resin amount Then, 1% of the solution was dissolved in methyl ethyl ketone so as to have a solid content of 60% to obtain a resin varnish.
The obtained resin varnish was impregnated into a glass cloth (E glass) to a resin content of 40%, dried at 100 ° C. for 10 minutes, and the solvent was removed to obtain a prepreg. Six pieces of this prepreg were stacked, press-molded at 180 ° C., and then after-baked at 230 ° C. for 5 hours to obtain a molded product (laminated plate) having a thickness of 1.5 mm.
<実施例5>
実施例4においてBMI−4000の91.0gを136.3gに代えたこと以外は実施例4と同様の方法で樹脂ワニスを調製し、成形物を得た。
Example 5
A resin varnish was prepared in the same manner as in Example 4 except that 91.0 g of BMI-4000 was changed to 136.3 g in Example 4, to obtain a molded product.
<実施例6>
合成例5で合成したアリル基含有カーボネート樹脂の100gと、マレイミド化合物として大和化成工業社製のBMI−2300の22.5gと、硬化反応触媒としてジクミルパーオキサイドの1.2g(全樹脂量に対して1%)とを、メチルエチルケトンに固形分60%になるように溶解し樹脂ワニスを得た。
得られた樹脂ワニスをガラスクロス(Eガラス)に、樹脂分40%になるように含浸し、100℃で10分間乾燥させ、溶剤を除去してプリプレグを得た。このプリプレグを6枚重ね、180℃でプレス成形し、その後、230℃で5時間アフターベークを行い、厚さ1.5mmの成形物(積層板)を得た。
Example 6
100 g of the allyl group-containing carbonate resin synthesized in Synthesis Example 5, 22.5 g of BMI-2300 manufactured by Daiwa Kasei Kogyo Co., Ltd. as a maleimide compound, and 1.2 g of dicumyl peroxide as a curing reaction catalyst (total resin amount Then, 1% of the solution was dissolved in methyl ethyl ketone so as to have a solid content of 60% to obtain a resin varnish.
The obtained resin varnish was impregnated into a glass cloth (E glass) to a resin content of 40%, dried at 100 ° C. for 10 minutes, and the solvent was removed to obtain a prepreg. Six pieces of this prepreg were stacked, press-molded at 180 ° C., and then after-baked at 230 ° C. for 5 hours to obtain a molded product (laminated plate) having a thickness of 1.5 mm.
<実施例7>
実施例6においてBMI−2300の22.5gを45.0gに代えたこと以外は実施例1と同様の方法で樹脂ワニスを調製し、成形物を得た。
Example 7
A resin varnish was prepared in the same manner as in Example 1 except that 22.5 g of BMI-2300 in Example 6 was changed to 45.0 g, to obtain a molded product.
<比較例1>
フェノールノボラック樹脂(群栄化学工業社製PSM−4261、軟化点:80℃、水酸基当量:106g/eq)の50.0gと、エポキシ樹脂としてオルソクレゾールノボラック型エポキシ樹脂(日本化薬製:EOCN1020、エポキシ当量:199g/eq)の93.9gと、触媒としてトリフェニルホスフィンの1.9g(エポキシ樹脂に対して2%)とを、メチルエチルケトンに固形分60%になるように溶解し樹脂ワニスを得た。
得られた樹脂ワニスをガラスクロス(Eガラス)に、樹脂分40%になるように含浸し、100℃10分乾燥させ、溶剤を除去してプリプレグを得た。このプリプレグを6枚重ね、180℃でプレス成形し、その後、180℃で5時間アフターベークを行い、厚さ1.5mmの成形物(積層板)を得た。
Comparative Example 1
50.0 g of phenol novolac resin (PSM-4261 manufactured by Gunei Chemical Industry Co., Ltd., softening point: 80 ° C., hydroxyl group equivalent: 106 g / eq) and ortho cresol novolac epoxy resin (Nippon Kayaku Co., Ltd .: EOCN 1020, as epoxy resin) A resin varnish is obtained by dissolving 93.9 g of epoxy equivalent: 199 g / eq) and 1.9 g (2% with respect to epoxy resin) of triphenylphosphine as a catalyst in methyl ethyl ketone so as to have a solid content of 60%. The
The obtained resin varnish was impregnated into a glass cloth (E glass) to a resin content of 40%, dried at 100 ° C. for 10 minutes, and the solvent was removed to obtain a prepreg. Six pieces of this prepreg were stacked, press-molded at 180 ° C., and after-baked at 180 ° C. for 5 hours to obtain a molded product (laminated plate) having a thickness of 1.5 mm.
<比較例2>
アリルフェノールノボラック樹脂(群栄化学工業社製XPL−4437E、アリル基当量:145g/eq、常温で液状、E型粘度計で測定した25℃での粘度:31Pa・s)の100gと、マレイミド化合物として大和化成工業社製のBMI−4000の196.6gと、硬化反応触媒としてジクミルパーオキサイドの3.0g(全樹脂量に対して1%)とを、メチルエチルケトンに固形分60%になるように溶解し樹脂ワニスを得た。
得られた樹脂ワニスをガラスクロス(Eガラス)に、樹脂分40%になるように含浸し、100℃10分乾燥させ、溶剤を除去してプリプレグを得た。このプリプレグを6枚重ね、180℃でプレス成形し、その後、230℃で5時間アフターベークを行い、厚さ1.5mmの成形物(積層板)を得た。
Comparative Example 2
100 g of allylphenol novolac resin (XPL-4437E manufactured by Gunei Chemical Industry, allyl equivalent: 145 g / eq, liquid at normal temperature, viscosity at 25 ° C. measured with an E-type viscometer: 31 Pa · s), maleimide compound As 196.6 g of BMI-4000 manufactured by Daiwa Kasei Kogyo Co., Ltd. and 3.0 g of dicumyl peroxide as a curing reaction catalyst (1% relative to the total amount of resin) to give a solid content of 60% in methyl ethyl ketone The resin varnish was obtained by
The obtained resin varnish was impregnated into a glass cloth (E glass) to a resin content of 40%, dried at 100 ° C. for 10 minutes, and the solvent was removed to obtain a prepreg. Six pieces of this prepreg were stacked, press-molded at 180 ° C., and then after-baked at 230 ° C. for 5 hours to obtain a molded product (laminated plate) having a thickness of 1.5 mm.
実施例1〜7、比較例1〜2で得た成形物について、ガラス転移温度、5%熱分解温度、常温線膨張係数、比誘電率、誘電正接を測定した。結果を表1〜2に示した。なお、測定されたガラス転移温度、5%熱分解温度、常温線膨張係数、比誘電率、誘電正接はそれぞれ、成形物に用いた樹脂ワニスの硬化物のガラス転移温度、5%熱分解温度、常温線膨張係数、比誘電率、誘電正接とみなすことができる。
各例で用いた硬化剤(アリル基含有カーボネート樹脂、フェノールノボラック樹脂またはアリルフェノールノボラック樹脂)、マレイミド化合物、エポキシ樹脂それぞれの種類を表1〜2に併記した。
The glass transition temperature, the 5% thermal decomposition temperature, the room temperature linear expansion coefficient, the relative dielectric constant, and the dielectric loss tangent were measured for the molded products obtained in Examples 1 to 7 and Comparative Examples 1 and 2. The results are shown in Tables 1-2. The measured glass transition temperature, 5% thermal decomposition temperature, room temperature linear expansion coefficient, relative dielectric constant, and dielectric loss tangent are respectively the glass transition temperature of the cured product of the resin varnish used for the molded product, 5% thermal decomposition temperature, It can be regarded as a normal temperature linear expansion coefficient, a relative dielectric constant, and a dielectric loss tangent.
The types of the curing agent (allyl group-containing carbonate resin, phenol novolac resin or allyl phenol novolac resin), maleimide compound and epoxy resin used in each example are shown in Tables 1 and 2.
実施例1〜7の成形物は、低誘電率、低誘電正接であり、電気特性に優れていた。また、ガラス転移温度、5%熱分解温度、常温線膨張係数等の熱的特性も充分に優れていた。
エポキシ樹脂をフェノールノボラック樹脂で硬化させた比較例1の成形物は、実施例1〜7に比べて誘電率および誘電正接が高かった。また、常温線膨張係数が大きかった。
硬化剤としてアリルフェノールノボラック樹脂を用いた比較例2の成形物は、比較例1よりもさらに誘電率および誘電正接が高かった。
The moldings of Examples 1 to 7 had low dielectric constants, low dielectric loss tangents, and excellent electrical characteristics. In addition, thermal characteristics such as glass transition temperature, 5% thermal decomposition temperature and normal temperature linear expansion coefficient were also sufficiently excellent.
The molded product of Comparative Example 1 in which the epoxy resin was cured with a phenol novolac resin had higher dielectric constant and dielectric loss tangent as compared with Examples 1 to 7. In addition, the room temperature linear expansion coefficient was large.
The molded product of Comparative Example 2 using allylphenol novolac resin as a curing agent had a dielectric constant and a dielectric loss tangent higher than those of Comparative Example 1.
本樹脂ワニスによれば、低誘電率、低誘電正接である、電気特性に優れた硬化物が得られる。また、本樹脂ワニスによれば、高ガラス転移温度、高熱分解温度、低熱膨張率である、熱的特性にも優れた硬化物が得られる。
したがって、本樹脂ワニスおよびこれを用いた積層板は、高機能性高分子材料として極めて有用であり、電気的、熱的に優れた材料として、半導体封止材、電気絶縁材料、銅張り積層板用樹脂、レジスト、電子部品の封止用樹脂、液晶のカラーフィルター用樹脂、塗料、各種コーティング剤、接着剤、ビルドアップ積層板材料、FRP等の幅広い用途に使用できる。
According to the resin varnish, a cured product having excellent electrical characteristics, which has a low dielectric constant and a low dielectric loss tangent, can be obtained. Moreover, according to this resin varnish, the hardened | cured material excellent also in the thermal characteristic which is a high glass transition temperature, a high thermal decomposition temperature, and a low thermal expansion coefficient is obtained.
Therefore, the present resin varnish and a laminate using the same are extremely useful as a high functional polymer material, and as an electrically and thermally excellent material, a semiconductor sealing material, an electric insulating material, a copper-clad laminate It can be used in a wide range of applications such as resins for resins, resists, resins for sealing electronic parts, resins for color filters for liquid crystals, paints, various coating agents, adhesives, build-up laminate materials, FRP and the like.
Claims (11)
炭酸ジエステルと、脂環式ジメタノール化合物とを反応させ、または、炭酸ジエステルと、脂環式ジメタノール化合物と、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させ、一次反応生成物を得て、前記一次反応生成物と、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させる工程、または
炭酸ジエステルと、ビスフェノール化合物およびビフェノール化合物からなる群から選ばれる少なくとも1種の芳香族ジオール化合物とを反応させる工程である、請求項5に記載のアリル基含有カーボネート樹脂の製造方法。 Reacting the carbonic ester with the diol compound;
A carbonic acid diester is reacted with an alicyclic dimethanol compound, or a carbonic acid diester, an alicyclic dimethanol compound, and at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound Reacting to obtain a primary reaction product, and reacting the primary reaction product with at least one aromatic diol compound selected from the group consisting of a bisphenol compound and a biphenol compound, or a carbonic diester with a bisphenol compound The process for producing an allyl group-containing carbonate resin according to claim 5, which is a step of reacting with at least one aromatic diol compound selected from the group consisting of and biphenol compounds.
エポキシ樹脂をさらに含む、請求項9に記載の樹脂ワニス。 The allyl group-containing carbonate resin includes a compound in which at least one of two X in the formula (1) is a hydrogen atom,
The resin varnish according to claim 9, further comprising an epoxy resin.
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WO2021106848A1 (en) * | 2019-11-29 | 2021-06-03 | 東洋紡株式会社 | Adhesive composition, adhesive sheet, laminate, and printed wiring board |
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JP2022077847A (en) * | 2020-11-12 | 2022-05-24 | 信越化学工業株式会社 | Thermosetting maleimide resin composition, and uncured resin film and cured resin film comprising the resin composition |
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