JP2019078300A - Support device - Google Patents

Abstract

To provide a support device which can absorb vibration in a horizontal direction and a vertical direction.SOLUTION: A support device 1 includes: a device placement part 10 on which a processing device is placed; and a movable frame part 20 which rotatably supports the device placement part 10; multiple movable parts 30, each of which includes a first pedestal 31, a second pedestal 32 which is provided opposite to the first pedestal 31, and a ball 33 provided between the first pedestal 31 and the second pedestal 32 and is disposed obliquely relative to a side surface of the movable frame part 20; and multiple support parts 40, each of which is connected to the movable part 30 and supports the movable part 30 in a manner that the movable part 30 can move in a horizontal direction while biasing the movable part 30 so that the device placement part 10 moves the upper side in a vertical direction.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a support device that absorbs horizontal and vertical vibrations.

  Conventionally, a spherical body is provided between a dish-shaped upper member concaved toward the lower surface side and a dish-shaped lower member concaved toward the upper surface, and rolling of the spherical body lowers the upper member There is known a seismic isolation table which is moved relative to a member (see, for example, Patent Document 1).

Japanese Patent Application Publication No. 2001-200890

  Although the above-described seismic isolation table (support device) can absorb horizontal vibration, it has been difficult to absorb vertical (vertical) vibration.

  An object of the present invention is to provide a supporting device capable of absorbing horizontal and vertical vibrations.

The present invention solves the problem by the following solutions.
The present invention is opposed to a device mounting portion on which a processing device is mounted, a moving frame portion rotatably supporting the device mounting portion, a first pedestal having a concave curved surface, and the first pedestal. And a second pedestal having a concave curved surface, and a plurality of movable members disposed obliquely with respect to the side surface of the movable frame portion, and a sphere provided between the first pedestal and the second pedestal. And a plurality of the plurality of movable parts respectively connected to the plurality of movable parts, the plurality of movable parts being horizontally movably supported while the movable part is urged so that the device mounting part moves upward in the vertical direction And a support unit.

  According to the present invention, it is possible to provide a supporting device capable of absorbing horizontal and vertical vibrations.

It is a perspective view which shows the whole structure of the support apparatus 1 in 1st Embodiment. It is sectional drawing of the support apparatus 1 in 1st Embodiment. FIG. 6 is a perspective view showing a configuration of a movable pedestal 41 and a linear guide 42 in the support portion 40. It is a schematic diagram which shows the relationship between the height of the upper base 10, and the expansion | extension state of the 1st spring 43 and the 2nd spring 44. As shown in FIG. It is sectional drawing which shows operation | movement of the support apparatus 1 when the upper pedestal 10 moves to the minimum height position. It is sectional drawing which shows operation | movement of the support apparatus 1 when the upper pedestal 10 moves to the maximum height position. It is sectional drawing which shows operation | movement of the support apparatus 1 when the upper base 10 moves to a horizontal direction. It is sectional drawing of 1 A of support apparatuses in 2nd Embodiment. It is sectional drawing which shows operation | movement of 1 A of support apparatuses when the upper base 110 moves to minimum height position. It is sectional drawing which shows operation | movement of 1 A of support apparatuses when the upper base 110 moves to a maximum height position. It is sectional drawing which shows operation | movement of 1 A of support apparatuses when the upper base 110 moves to a horizontal direction. It is a perspective view which shows the whole structure of the support apparatus 1B in a modification.

Hereinafter, embodiments of the present invention will be described. The drawings attached to the present specification are all schematic views, and in consideration of ease of understanding and the like, shapes, scales, dimensional ratios of longitudinal and lateral dimensions, and the like of the respective parts are changed or exaggerated from the real thing. Further, in the drawings, hatching indicating a cross section of a member is appropriately omitted.
In the present specification and the like, terms that specify shape, geometric condition, and their degree, for example, terms such as “parallel” and “direction” can be regarded as substantially parallel in addition to the exact meaning of the terms. The range of the degree, including the range that can be regarded as the direction in general.

  Further, in the drawings shown in the embodiments, an XYZ orthogonal coordinate system is described. This coordinate system is based on the state of the supporting device 1 shown in FIG. 1, in which two directions orthogonal to each other in the horizontal direction are the X (X1-X2) direction and the Y (Y1-Y2) direction. The orthogonal direction is taken as the Z direction. In the X (X1-X2) direction, the X1 direction is the left side in the figure, and the X2 direction is the right side in the figure. In the Y (Y1-Y2) direction, the Y1 direction is the near side in the figure, and the Y2 direction is the far side in the figure. In the Z (Z1-Z2) direction, the Z1 side is the lower side or the lower side in the figure, and the Z2 side is the upper side or the upper side in the figure.

  Further, in the present embodiment, when the support device 1 is viewed from the vertical direction Z, the center of the upper pedestal 10 and the center of the lower pedestal 20 coincide with each other, and the sphere 33 of the movable portion 30 is the first pedestal 31 and the first pedestal 31. The state of being located at the center of the two pedestals 32 is also referred to as "home position". In the home position, the center of the support device 1 coincides with the center of the upper pedestal 10 and the center of the lower pedestal 20. In the home position, the center of the upper pedestal 10 coincides with the center of the lower pedestal 20 in a state where the processing device 90 is placed on the support device 1 and the support device 1 is not disturbed. This means that the spheres 33 of the portion 30 are located at the centers of the first pedestal 31 and the second pedestal 32.

First Embodiment
FIG. 1 is a perspective view showing an entire configuration of a support device 1 in the first embodiment.
FIG. 2 is a cross-sectional view of the support device 1 in the first embodiment. FIG. 2 is a cross-sectional view of the XZ plane at the center position (home position) of the support device 1, and a part of the configuration is omitted.
FIGS. 3A and 3B are perspective views showing the configuration of the movable pedestal 41 and the linear guide 42 in the support portion 40. FIG. FIG. 3A shows a state in which the ball is accommodated in the movable pedestal 41. FIG. FIG. 3B shows a state in which a fall prevention cover is provided on the outside of the movable pedestal 41. In FIG. 3, the upper pedestal 10, the lower pedestal 20, the movable portion 30 (described later), and the like are omitted in order to make the shapes and arrangements of the movable pedestal 41 and the linear guide 42 easy to understand.

  The support device 1 is a device that suppresses transmission of disturbance (such as earthquakes, vibrations of other processing devices, etc.) generated on the installation surface G described later to the processing device 90. That is, the support device 1 is used as a seismic isolation table of the processing device 90. The type of the processing apparatus 90 is not limited, but is, for example, an NC machine tool used for machining, a chip mounter (surface mounter), an automatic insertion machine, or the like. In the following description, the disturbance generated on the installation surface G is referred to as the disturbance generated on the support device 1.

  The support apparatus 1 is arrange | positioned between the lower surface (or the base part for installation, etc.) of the processing apparatus 90, and the installation surface G, as shown in FIG. That is, the support device 1 is provided on the installation surface G. The processing device 90 is provided on the support device 1. The supporting devices 1 are disposed, for example, at the four corners of the lower surface of the processing device 90 respectively, and support the processing device 90 at the disposed position. FIG. 1 shows the support device 1 disposed at one corner of the lower surface of the processing device 90 as a perspective view.

(Configuration of support device 1)
As shown in FIG. 1, the support device 1 includes an upper pedestal (device mounting portion) 10, a lower pedestal (moving frame portion) 20, a movable portion 30, a support portion 40, and a base portion 50.
The upper pedestal 10 is a portion on which the processing device 90 is mounted. As shown in FIG. 2, the upper pedestal 10 includes a pedestal portion 11, a mounting portion 12, and a shaft portion 13.

The pedestal portion 11 is a member having a substantially concave vertical cross section and formed in a substantially conical shape as a whole. The placement unit 12 is a portion in direct contact with the processing device 90, and is formed in an annular shape. The placement unit 12 is provided on the upper side (Z2 side) of the pedestal unit 11. The shaft portion 13 is a portion rotatably engaged with the lower pedestal 20 (described later). The shaft 13 is provided at the lower end (Z1 side) of the pedestal 11. A spherical convex portion 13 a is formed on the shaft portion 13. The protrusion 13 a rotatably engages with a recess 20 a (described later) of the lower pedestal 20.
As shown in FIG. 2, assuming that the height position of the upper pedestal 10 at the home position is L0 (hereinafter, also referred to as “home position L0”), the highest position on the upper side (Z2 side) in the vertical direction is The maximum height position L1 is obtained, and the position lowered most to the lower side (Z1 side) in the vertical direction is the minimum height position L2.

  The lower pedestal 20 is a member that rotatably supports the upper pedestal 10. The lower pedestal 20 is provided below the upper pedestal 10 (Z1 side). The lower pedestal 20 is substantially concave in vertical cross section, and formed in a substantially conical shape as a whole. The lower pedestal 20 is formed with a hemispherical recess 20 a at its central portion. The length of the radius of the inner circumferential circle of the recess 20a is substantially the same as the length of the radius of the outer circumferential circle of the convex portion 13a (shaft portion 13) described above. Therefore, when the convex portion 13a of the shaft portion 13 is engaged with the concave portion 20a of the lower pedestal 20, the concave portion 20a and the convex portion 13a are in a state where their spherical surfaces are in close contact with each other. Thus, the upper pedestal 10 is rotatably supported by the lower pedestal 20 about the shaft portion 13. In addition, a first pedestal 31 (described later) of the movable portion 30 is attached to the outer peripheral surface 21 a of the outer peripheral frame 21 of the lower pedestal 20.

  The movable portion 30 is a structure that moves the upper pedestal 10 relative to the lower pedestal 20. The movable part 30 is arrange | positioned at four places of the outer peripheral side of the lower base 20, as shown in FIG. 1 (in FIG. 1, three places except Y2 side are shown in figure). Each movable part 30 is arrange | positioned at equal intervals (90 degrees) with respect to the center of the support apparatus 1, when the support apparatus 1 is seen from Z2 side of the perpendicular direction to Z1 side. Since the configuration of each movable portion 30 is the same, one of the movable portions 30 arranged at four locations will be described.

The movable part 30 is provided with the 1st base 31, the 2nd base 32, and the spherical body 33, as shown in FIG.
The first pedestal 31 is a plate-like member, and has a first pedestal curved surface 31 a that is concave toward the lower surface side (Z1 side). The first pedestal 31 is attached to the outer circumferential surface 21 a of the lower pedestal 20. The first pedestal 31 is mounted on the outer circumferential surface 21 a of the lower pedestal 20 at an angle of 45 ° upward with respect to a perpendicular P parallel to the vertical direction (Z direction). In FIG. 2, the perpendicular P is drawn as a line passing through the center of the support device 1.

  The second pedestal 32 is a dish-like member, and has a second pedestal curved surface 32 a that is concave toward the upper surface side (Z 2 side). In the present embodiment, the radius of curvature of the first pedestal curved surface 31 a and the radius of curvature of the second pedestal curved surface 32 a are configured to be equal. The second pedestal 32 is provided below the first pedestal 31 (Z1 side). The second pedestal 32 is attached to a slope 41 a (described later) of the support portion 40. The second pedestal 32 is attached on the slope 41 a of the support portion 40 at an angle of 45 ° upward with respect to a perpendicular P parallel to the vertical direction (Z direction).

  The second pedestal 32 is provided with a stopper portion 32 b at the outer peripheral edge of the second pedestal curved surface 32 a. The stopper portion 32 b is a portion that suppresses separation of the first pedestal 31 and the second pedestal 32 when a large disturbance acts on the support device 1. The stopper portion 32 b is convex from the outer peripheral edge of the second pedestal 32 toward the upper surface side (Z2 side). The stopper portion 32 b is annularly formed along the outer peripheral edge of the second pedestal 32. The action of the stopper portion 32b will be described later.

  The spherical body 33 is a spherical member provided between the first pedestal 31 and the second pedestal 32. The diameter of the sphere 33 is larger than the sum of the maximum depth of the first pedestal curved surface 31 a of the first pedestal 31 and the maximum depth of the second pedestal curved surface 32 a of the second pedestal 32. Therefore, when the ball 33 is inserted between the first pedestal 31 and the second pedestal 32, a gap is formed between the first pedestal 31 and the second pedestal 32. That is, by inserting the spherical body 33 between the first pedestal 31 and the second pedestal 32, the first pedestal 31 and the second pedestal 32 do not contact each other.

  The support portion 40 urges the movable portion 30 in the horizontal direction (X-Y direction) while biasing the movable portion 30 in the center direction of the support device 1 so that the upper pedestal 10 moves upward (Z2 side) in the vertical direction. Movably supporting part. The support part 40 is provided in four places so that each movable part 30 may be supported, as shown in FIG. The respective support portions 40 are arranged at equal intervals (90 °) with respect to the center of the support device 1 when the support device 1 is viewed from the Z2 side in the vertical direction from the Z2 side in the same manner as the movable portion 30 . Since the configurations of the respective support portions 40 are the same, the configuration will be described by citing one of the support portions 40 arranged at four places.

The support part 40 is provided with the movement base 41, the linear guide (rail part) 42, the 1st spring 43, and the 2nd spring 44, as shown in FIG.
The movable pedestal 41 is a member that urges the lower pedestal 20 toward the center of the support device 1 by the first spring 43 and the second spring 44 (described later), and in the magnitude and direction of the force applied to the movable portion 30. In response, it moves on the linear guide 42 in the X direction (or Y direction). As shown in FIG. 2, the movable pedestal 41 is formed such that the cross section of the XZ plane is substantially trapezoidal. A second pedestal 32 (movable portion 30) is attached to a slope 41a formed on the side of the movable pedestal 41 facing the lower pedestal 20. In the present embodiment, each of the first spring 43, the second spring 44, and each spring described later is a compression spring.

  As shown in FIG. 1, the movable pedestal 41 is provided with a first movable holding plate 411 on one side surface in the thickness direction, and a second movable holding plate 412 on the other side surface. The first movable pressing plate 411 is a member engaged with one end of the first spring 43. The second movable pressing plate 412 is a member engaged with one end of the second spring 44.

  As shown in FIG. 3A, the movable pedestal 41 is provided with grooves 413 on both side surfaces in contact with the linear guide 42. The groove portion 413 is a return-like groove that is concave toward the upper side (Z2 side). In the groove portion 413, a plurality of balls 414 are annularly accommodated. The ball 414 is a component for reducing the friction between the linear guide 42 and the movable pedestal 41 so that the movable pedestal 41 can smoothly move in a state of being engaged with the linear guide 42. The groove portion 413 and the ball 414 function as a friction reduction mechanism in the present embodiment. In addition, when the movable pedestal 41 moves, the plurality of balls 414 accommodated in the groove portion 413 move in the lateral direction orthogonal to the extending direction (moving direction) of the linear guide 42. It has a suppressing function.

  As described later, the movable pedestal 41 moves along the extending direction of the linear guide 42 when the upper pedestal 10 moves up and down and to the left and right or tilts due to a large disturbance acting on the support device 1. . At this time, since the plurality of balls 414 accommodated in the groove portion 413 move in the groove portion 413 while rotating, the friction between the linear guide 42 and the movable pedestal 41 can be reduced. As shown in FIG. 3A, among the plurality of balls 414 contained in the groove 413 of the movable pedestal 41, those in contact with the linear guide 42 are arranged in the lower row of the groove 413. It is a ball 414.

  As shown in FIG. 3B, a cover 415 for fall prevention is attached to the outside of the groove 413. The fall prevention cover 415 is a member that covers the balls 414 which are disposed in the groove 413 and not in contact with the linear guide 42. When the fall prevention cover 415 is attached to the movable base 41, only the balls 414 arranged in the lower row of the groove portions 413 are exposed and can be in contact with the linear guide 42. By attaching the dropout preventing cover 415 to the outside of the groove portion 413, it is possible to prevent the ball 414 contained in the groove portion 413 from falling to the outside when the movable pedestal 41 moves on the linear guide 42.

  The linear guide 42 is a member that supports the movable pedestal 41 so as to be linearly movable, and is provided on the upper surface side (Z2 side) of the base portion 50. As shown in FIG. 3A, a pair of linear guides 42 is provided for one movable pedestal 41. The pair of linear guides 42 are arranged in parallel. The balls 414 arranged in the lower row of the groove portion 413 of the plurality of balls 414 accommodated in the groove portion 413 of the movable pedestal 41 are in contact with the side surface 42 a of the linear guide 42.

  Further, although not shown, in the lower side (Z1 side) of the groove portion 413 in the movable pedestal 41, an annular groove portion having a concave shape is formed downward, and a plurality of balls are formed in the groove portion. It is housed in a ring. A cover for preventing falling off is also attached to the lower groove. The balls disposed in the lower row not covered by the drop-off prevention cover are in contact with the slide grooves 51 (described later). The balls arranged in the lower row have a function of suppressing movement of the movable pedestal 41 in the vertical direction when the movable pedestal 41 moves.

As described above, in the movable pedestal 41, the ball 414 provided on the upper side (Z2 side) contacts the side surface 42a of the linear guide 42, and the ball (not shown) provided on the lower side (Z1 side) It is configured to be in contact with the slide groove 51 provided in the
In addition, the friction reduction mechanism mentioned above may be further provided with two or more. Also, the friction reduction mechanism may be omitted, for example, when the support device 1 is small. Furthermore, the friction reduction mechanism is not limited to the above configuration, and various forms can be applied.

The base portion 50 is a member on which the upper pedestal 10, the lower pedestal 20, the movable portion 30, the support portion 40, and the like described above are placed. The base part 50 is provided in the upper surface side (Z2 side) of the installation surface G, as shown in FIG. As shown in FIG. 1, a slide groove 51 is provided on the upper surface side (Z 2 side) of the base portion 50. The slide groove 51 is a portion in contact with a ball (not shown) provided on the lower side (Z1 side) of the movable pedestal 41.
A home position plate 417 is provided on the upper surface side (Z2 side) of the base unit 50. By appropriately adjusting the position of the home position plate 417 (the position from the center of the support device 1), the home position of the upper pedestal 10 can be determined. Further, on the side surface of each side of the base portion 50, a first pressing plate 416 and a second pressing plate 418 are provided.

Next, the first spring 43 (first biasing member) and the second spring 44 (second biasing member) in the support portion 40 will be described.
The first spring 43 and the second spring 44 are members for biasing the movable pedestal 41 in the central direction of the support device 1 so that the upper pedestal 10 moves to the upper side (Z2 side) in the vertical direction.

  The first spring 43 is a member that generates a main biasing force to the movable pedestal 41. As shown in FIG. 1, the first spring 43 is mounted between the first movable pressing plate 411 and the first pressing plate 416. The first pressing plate 416 is a member that engages with the other end of the first spring 43, and is attached to the side surface of the base 50.

  The second spring 44 is a member that generates a biasing force on the movable pedestal 41 in conjunction with the first spring 43 from a position where the first spring 43 biases the movable pedestal 41 by a predetermined amount. The second spring 44 is mounted between the second movable pressing plate 412 and the second pressing plate 418. The second pressing plate 418 is a member engaged with the other end of the second spring 44 in the home position, and is attached to the side surface of the base portion 50.

  Further, one end of the second spring 44 is engaged with the home position plate 417 at the home position. As shown in FIG. 1, the home position plate 417 is formed with a recess 417 a that opens in the lateral direction. One end (outer periphery) of the second spring 44 is accommodated in the inner periphery of the recess 417a at the home position (and the maximum height position).

  As described later, when the support device 1 moves to the upper side (Z2 side) in the vertical direction to the maximum height position L1, the movable pedestal 41 moves in the center direction of the support device 1. Therefore, the second movable pressing plate 412 attached to the movable pedestal 41 is separated from one end of the second spring 44. As a result, one end of the second spring 44 does not engage with the second movable pressing plate 412. However, in this state, since one end of the second spring 44 is accommodated in the recess 417 a of the home position plate 417, it does not come off the home position plate 417. In addition, when the support device 1 moves vertically downward (Z1 side) to the minimum height position L2, the movable pedestal 41 moves outward from the center of the support device 1. Therefore, while the second movable pressing plate 412 is engaged with one end of the second spring 44, the second movable pressing plate 412 moves in the direction opposite to the biasing direction of the second spring 44.

Next, the operation of the first spring 43 and the second spring 44 when the upper pedestal 10 of the support device 1 moves in the vertical direction will be described.
FIGS. 4A to 4C are schematic views showing the relationship between the height of the upper pedestal 10 and the extension state of the first spring 43 and the second spring 44. FIG. FIG. 4A is a schematic view showing an extended state of the first spring 43 and the second spring 44 when the upper pedestal 10 is moved to the upper side (Z2 side) in the vertical direction to the maximum height position L1. FIG. 4B is a schematic view showing an extended state of the first spring 43 and the second spring 44 when the upper pedestal 10 is at the home position L0. FIG. 4C is a schematic view showing an extended state of the first spring 43 and the second spring 44 when the upper pedestal 10 is moved to the lower side (Z1 side) in the vertical direction to the minimum height position L2.

  4A to 4C show the first spring 43 and the second spring of the support portion 40 provided on the Y1 side of FIG. 1 among the support portions 40 arranged at four places of the support device 1. 44 will be described as an example. The action of the first spring 43 and the second spring 44 is the same in the other support portions 40 as well.

(Maximum height position)
When a large disturbance acts on the support device 1 and the upper pedestal 10 moves upward (Z2 side) in the vertical direction to the maximum height position L1 (see FIG. 2), as shown in FIG. Moves in the center direction (Y2 direction) of the support device 1. At this time, the first spring 43 is in an extended state as the movable pedestal 41 moves. The first spring 43 exerts an urging force on the moving base 41 also while the moving base 41 moves. The first spring 43 is engaged with the convex portion 411 a of the first movable pressing plate 411 and the convex portion 416 a of the first pressing plate 416 in this state. Therefore, the first spring 43 does not come off between the first movable pressing plate 411 and the first pressing plate 416 in the most extended state.

  When the upper pedestal 10 moves to the upper side (Z2 side) in the vertical direction to the maximum height position L1, the second spring 44 is in the most extended state. Therefore, in the second spring 44, a biasing force for moving the movable pedestal 41 in the Y2 direction does not occur. The difference from the first spring 43 is that one end of the second spring 44 is separated from the second movable pressing plate 412 of the movable base 41. The second spring 44 is engaged with the recess 417a (see FIG. 1) of the home position plate 417 and the projection 418a of the second pressing plate 418 in this state. Therefore, the second spring 44 does not come off between the home position plate 417 and the second pressing plate 418 in a state of being separated from the second movable pressing plate 412.

(Home position)
When the support device 1 is at the home position L0 (see FIG. 2), the upper pedestal 10 is moved from the maximum height position L1 to the lower side (Z1 side). At the home position L0, the total biasing force of each spring in the support device 1 provided on the lower surface of the processing device 90 and the load of the processing device 90 are balanced. At this time, as shown in FIG. 4 (B), the movable pedestal 41 moves to the outside (Y1 side) of the support device 1 by a predetermined amount. In this state, the first spring 43 has a biasing force for moving the movable pedestal 41 in the Y2 direction.

  In addition, when the movable pedestal 41 is moved to the outside (Y1 side) of the support device 1 by a predetermined amount, one end of the second spring 44 is, as shown in FIG. It will be in the state engaged with convex part 412a. As described above, at the home position, the first spring 43 generates a biasing force that moves the movable pedestal 41 in the Y2 direction. The second spring 44 biases the movable pedestal 41 in the center direction in conjunction with the first spring 43 from a home position where the first spring 43 biases the movable pedestal 41 by a predetermined amount.

  That is, the second spring 44 does not generate a biasing force for moving the movable pedestal 41 in the Y2 direction when the upper pedestal 10 is from the maximum height position L1 to the home position L0. During this time, only the biasing force of the first spring 43 acts on the movable pedestal 41. The second spring 44 generates a biasing force for moving the movable pedestal 41 in the Y2 direction between the home position L0 and the minimum height position L2. Therefore, during this period, the biasing force of the first spring 43 and the biasing force of the second spring 44 act on the moving pedestal 41.

  Thus, when the movable pedestal 41 moves from the home position to the outside of the support device 1, the second spring 44 generates a biasing force that moves the movable pedestal 41 in the Y2 direction. By making the elastic force of the second spring 44 larger than the amount of variation in weight of the processing device 90, the variation in weight of the processing device 90 can be corrected. For example, when the variation amount of the weight of the processing apparatus 90 is 10 kg, it may be set to apply an elastic force (pretension) of about 20 kg, for example, in anticipation of a safety margin.

(Minimum height position)
A large disturbance acts on the supporting device 1, and the upper pedestal 10 resists the biasing force of the first spring 43 and the second spring 44, and the lower side (Z1 side) in the vertical direction to the minimum height position L2 (see FIG. 2) 4C, the movable pedestal 41 moves outward (in the Y1 direction) from the center of the support device 1. As shown in FIG. At this time, the first spring 43 and the second spring 44 are in the most contracted state. After that, when the disturbance that moves the support device 1 downward in the vertical direction is settled, the upper pedestal 10 is the upper side (Z2 side) that becomes the home position side by the biasing force of the first spring 43 and the second spring 44. Move to

(Operation of support device 1)
Next, in the support device 1 of the first embodiment, an operation when a disturbance occurs will be described.
The support device 1 maintains the state of the home position shown in FIG. 2 in a state in which almost no disturbance occurs. On the other hand, when a disturbance occurs, the support device 1 operates as shown in FIGS. 5 to 7 described later according to the direction and magnitude of the disturbance. The disturbance described below is the largest pitch and roll that can be absorbed by the support device 1.

  FIG. 5 is a cross-sectional view showing the operation of the support device 1 when the upper pedestal 10 is moved to the minimum height position. FIG. 6 is a cross-sectional view showing the operation of the support device 1 when the upper pedestal 10 is moved to the maximum height position. FIG. 7 is a cross-sectional view showing the operation of the support device 1 when the upper pedestal 10 moves in the horizontal direction.

(Disturbance to minimum height position)
As a disturbance to the supporting device 1, for example, when a push-up (stress in the Z2 direction) of the installation surface G due to an earthquake occurs, as shown in FIG. 5, the first pedestal 31 connected to the lower pedestal 20 is a second pedestal Move to the lower side (Z1 side) in the vertical direction with respect to 32. Further, the ball 33 moves between the first pedestal 31 and the second pedestal 32 while rolling in a diagonal direction toward the lower side (Z1 side) and the center side (X1 side) of the support device 1. Therefore, the upper pedestal 10 can move to the lower side (Z1 side) in the vertical direction following the push-up of the installation surface G.

  Then, when the upper pedestal 10 moves to the minimum height position, the ball 33 abuts on the stopper portion 32 b provided on the outer peripheral edge of the second pedestal 32. According to this, between the first pedestal 31 and the second pedestal 32, movement of the sphere 33 to the lower side and to the center side of the support device 1 further than the position shown in FIG. 5 is restricted. Therefore, when the upper pedestal 10 moves to the minimum height position, separation of the first pedestal 31 and the second pedestal 32 due to the drop of the ball 33 can be suppressed. In addition, after convergence of the disturbance, the upper pedestal 10 returns to the home position by the biasing force applied to each of the movable pedestals 41.

(Disturbance to maximum height position)
As shown in FIG. 6, when the installation surface G is pushed up as described above as a disturbance to the supporting device 1 and if the installation surface G sinks (stress in the Z1 direction) due to reaction thereof, as shown in FIG. The first pedestal 31 coupled to 20 moves to the upper side (Z 2 side) in the vertical direction with respect to the second pedestal 32. In addition, the ball 33 moves between the first pedestal 31 and the second pedestal 32 while rolling in an oblique direction from the center of the support device 1 to the outside (X2 side) from the upper side (Z2 side). Therefore, the upper pedestal 10 can move to the upper side (Z2 side) in the vertical direction following the sinking of the installation surface G.

  Then, when the upper pedestal 10 moves to the maximum height position, the ball 33 abuts on the stopper portion 32 b provided on the outer peripheral edge of the second pedestal 32. According to this, between the first pedestal 31 and the second pedestal 32, movement of the sphere 33 above the position shown in FIG. 5 and above the center of the support device 1 is restricted. Therefore, when the upper pedestal 10 is moved to the maximum height position, separation of the first pedestal 31 and the second pedestal 32 due to dropping of the ball 33 can be suppressed. In addition, after convergence of the disturbance, the upper pedestal 10 returns to the home position by the biasing force applied to each of the movable pedestals 41.

(Horizontal disturbance)
As a disturbance to the supporting device 1, for example, a case where a rolling of the installation surface G due to an earthquake occurs will be described. Here, as shown in FIG. 7, an example in which the upper pedestal 10 is relatively moved from the center (vertical line P) of the support device 1 in the X2 direction by L3 due to the occurrence of lateral swing in the X1 direction on the installation surface G Will be explained.

  As shown in FIG. 7, when the upper pedestal 10 moves in the X2 direction from the home position, the first pedestal 31 on the X2 side connected to the lower pedestal 20 is also perpendicular to the second pedestal 32 on the X2 side. Move to the upper side (Z2 side) of In addition, the ball 33 can move while rolling in an oblique direction between the first pedestal 31 and the second pedestal 32 toward the upper side (Z2 side) and the outer side (X2 side) from the center of the support device 1.

  On the other hand, the first pedestal 31 on the X1 side connected to the lower pedestal 20 moves to the lower side (Z1 side) in the vertical direction with respect to the second pedestal 32 on the X1 side as well. Further, the ball 33 moves between the first pedestal 31 and the second pedestal 32 while rolling in a diagonal direction toward the lower side (Z1 side) and the center side (X1 side) of the support device 1.

  Thus, when the upper pedestal 10 moves in the X2 direction from the home position, the first pedestal 31 of the movable portion 30 disposed on the X2 side is on the upper side (Z2 side) in the vertical direction with respect to the second pedestal 32 Moving. In addition, the ball 33 abuts on a stopper portion 32 b provided on the outer peripheral edge of the second pedestal 32. According to this, between the first pedestal 31 and the second pedestal 32, movement of the sphere 33 above the position shown in FIG. 7 and above the center of the support device 1 is restricted. Therefore, when the upper pedestal 10 is largely inclined, separation of the first pedestal 31 and the second pedestal 32 due to the dropping of the ball 33 can be suppressed.

  On the other hand, the first pedestal 31 of the movable portion 30 disposed on the X1 side moves to the lower side (Z1 side) in the vertical direction with respect to the second pedestal 32. Therefore, as shown in FIG. 7, the lower pedestal 20 is inclined such that the X2 side is the upper side (Z2 side) in the vertical direction and the X1 side is the lower side (Z1 side) in the vertical direction. The upper pedestal 10 is rotatably engaged with the recess 20 a of the lower pedestal 20 at the convex portion 13 a (shaft portion 13). Therefore, even when the lower pedestal 20 is inclined, the upper pedestal 10 can maintain the horizontal state by relatively rotating the convex portion 13a in the concave portion 20a. In addition, after convergence of the disturbance, the upper pedestal 10 returns to the home position by the biasing force applied to each of the movable pedestals 41.

  As described above, according to the support device 1 of the first embodiment, the upper pedestal 10, the lower pedestal 20, the movable portion 30, and the support are supported even when horizontal and vertical vibrations occur in the installation surface G due to disturbance. Since the light can be absorbed by the operation of the unit 40, direct transmission of the disturbance to the processing device 90 can be suppressed.

The supporting device 1 according to the first embodiment includes the stoppers 32b on the outer peripheral edge of the second pedestal curved surface 32a (the second pedestal 32). Therefore, even when large vibration occurs in the installation surface G due to disturbance, the supporting device 1 The separation of the first pedestal 31 and the second pedestal 32 can be suppressed.
The supporting device 1 according to the first embodiment includes a second spring 44 that generates a biasing force with respect to the movable pedestal 41 in conjunction with the first spring 43. Therefore, it is possible to cope with a large disturbance to the support device 1 without increasing the size of the first spring 43.

Second Embodiment
Next, a second embodiment of the support device according to the present invention will be described.
The supporting device 1A of the second embodiment differs from the first embodiment in the configuration of the upper pedestal 110 and the lower pedestal 120, the arrangement of the movable portion 130 and the supporting portion 140, the operation direction, and the like. The other configurations of the supporting device 1A of the second embodiment are the same as those of the first embodiment. In the description of the second embodiment, the entire support device 1A is not shown. Further, in the description and drawings of the second embodiment, the same reference numerals or the same reference numerals at the end (last two digits) are attached to the members, portions, etc., which perform the same functions as the first embodiment. The explanation is omitted appropriately.

FIG. 8 is a cross-sectional view of the support device 1A in the second embodiment. FIG. 8 is a cross-sectional view of the XZ plane at the center position of the support device 1A. In addition, in FIGS. 8-11, a one part structure is abbreviate | omitted similarly to 1st Embodiment.
The supporting device 1A of the second embodiment differs from the first embodiment in the shapes of the upper pedestal 110 and the lower pedestal 120. Moreover, 1 A of support apparatuses of 2nd Embodiment differ in arrangement | positioning of the movable part 130 and the support part 140, an operation direction, etc. from 1st Embodiment.

  As shown in FIG. 8, in the upper pedestal 110 (support device 1A) of the second embodiment, the pedestal section 111 has a reverse cross section in the vertical cross section, and is formed in a substantially disk shape as a whole. The placement unit 112 is provided on the outer peripheral edge of the pedestal 111. The shaft portion 113 is provided at the lower end (Z1 side) end of the pedestal portion 111 as in the first embodiment. The protrusion 113 a of the shaft 113 engages with a recess 120 a (described later) of the lower pedestal 120.

  The lower pedestal 120 has a reverse cross section in the vertical cross section, and is generally formed in a substantially conical shape opposite to the lower pedestal 120 of the first embodiment. The recess 120 a of the lower pedestal 120 has a shape that can be engaged with the protrusion 113 a of the shaft 113. When the recess 120 a of the lower pedestal 120 and the convex portion 113 a of the upper pedestal 110 are engaged, the upper pedestal 110 is rotatably supported by the lower pedestal 120 about the shaft portion 113. In addition, the first pedestal 131 of the movable portion 130 is attached to the inner circumferential surface 121 a of the outer circumferential frame 121 of the lower pedestal 120.

  The movable portion 130 includes a first pedestal 131, a second pedestal 132, and a sphere 133. In the second embodiment, the configurations of the first pedestal 131, the second pedestal 132, and the sphere 133 of the movable portion 130 are the same as the first pedestal 31, the second pedestal 32, and the sphere 33 of the movable portion 30 in the first embodiment. Description is omitted because there is.

  In the movable portion 130 according to the second embodiment, the first pedestal 131 has an angle of 45 ° downward with respect to a perpendicular P parallel to the vertical direction (Z direction) on the inner circumferential surface 121a of the lower pedestal 120. It is attached. The second pedestal 132 is attached on the inclined surface 141a of the movable pedestal 141 (support portion 140) so as to form a downward angle of 45 ° with respect to a perpendicular P parallel to the vertical direction (Z direction). Further, the second pedestal 132 is provided with a stopper portion 132b on the outer peripheral edge of the second pedestal curved surface 132a. A sphere 133 is provided between the first pedestal 131 and the second pedestal 132.

The support portion 140 includes, in addition to the movable pedestal 141, a linear guide (not shown), a first spring, and a second spring.
The movable pedestal 141 of the second embodiment biases the lower pedestal 120 outward from the center of the support device 1 by the first spring and the second spring. That is, the first and second springs of the second embodiment are different from the first embodiment in that the movable pedestal 141 is biased outward from the center of the support device 1. In addition, the configuration of the linear guide or the like in the support portion 140 is the same as that of the first embodiment (see FIG. 3 etc.).

Next, in support device 1A of a 2nd embodiment, operation when a disturbance occurs is explained.
The support device 1A maintains the state of the home position shown in FIG. 8 in a state in which almost no disturbance occurs. On the other hand, when a disturbance occurs, the support device 1A operates as shown in FIGS. 9 to 11 described later according to the direction and the magnitude. The disturbance described below is the largest pitch and roll that can be absorbed by the support device 1A.

  FIG. 9 is a cross-sectional view showing the operation of the support device 1A when the upper pedestal 110 is moved to the minimum height position. FIG. 10 is a cross-sectional view showing the operation of the support device 1A when the upper pedestal 110 is moved to the maximum height position. FIG. 11 is a cross-sectional view showing the operation of the support device 1A when the upper pedestal 110 moves in the horizontal direction.

(Disturbance to minimum height position)
As a disturbance to the supporting device 1A, for example, when a push-up (stress in the Z2 direction) of the installation surface G due to an earthquake occurs, the first pedestal 131 connected to the lower pedestal 120 is a second pedestal as shown in FIG. With respect to 132, move to the lower side (Z1 side) in the vertical direction. In addition, the ball 133 moves between the first pedestal 131 and the second pedestal 132 while rolling in an oblique direction from the center of the support device 1A on the lower side (Z1 side) and outward. Therefore, the upper pedestal 110 can move to the lower side (Z1 side) in the vertical direction following the push-up of the installation surface G.

  Then, when the upper pedestal 110 moves to the minimum height position, the spherical body 133 abuts on the stopper portion 132 b provided on the outer peripheral edge of the second pedestal 132. According to this, between the first pedestal 131 and the second pedestal 132, movement of the sphere 133 lower than the position shown in FIG. 8 and outward from the center of the support device 1A is restricted. Therefore, when the upper pedestal 110 moves to the minimum height position, separation of the first pedestal 131 and the second pedestal 132 due to dropping of the sphere 133 can be suppressed. In addition, after convergence of the disturbance, the upper pedestal 110 returns to the home position by the biasing force applied to each of the movable pedestals 141.

(Disturbance to maximum height position)
As shown in FIG. 10, when the installation surface G is pushed up as described above as a disturbance to the support device 1A, and if the installation surface G sinks (stress in the Z1 direction) due to reaction thereof, as shown in FIG. The first pedestal 131 coupled to 120 moves to the upper side (Z2 side) in the vertical direction with respect to the second pedestal 132. In addition, the ball 133 moves between the first pedestal 131 and the second pedestal 132 while rolling in an oblique direction toward the upper side (Z2 side) and the center side (X1 side) of the support device 1. Therefore, the upper pedestal 110 can move to the upper side (Z2 side) in the vertical direction following the sinking of the installation surface G.

  Then, when the upper pedestal 110 moves to the maximum height position, the spherical body 133 abuts on the stopper portion 132 b provided on the outer peripheral edge of the second pedestal 132. According to this, between the first pedestal 131 and the second pedestal 132, movement of the sphere 133 further to the upper side of the position shown in FIG. 10 and toward the center of the support device 1 is restricted. Therefore, when the upper pedestal 110 moves to the maximum height position, separation of the first pedestal 131 and the second pedestal 132 due to dropping of the sphere 133 can be suppressed. In addition, after convergence of the disturbance, the upper pedestal 110 returns to the home position by the biasing force applied to each of the movable pedestals 141.

(Horizontal disturbance)
As a disturbance to the supporting device 1A, for example, a case where a rolling of the installation surface G due to an earthquake occurs will be described. Here, as shown in FIG. 11, an example will be described in which the upper pedestal 110 is relatively moved from the center (vertical line P) in the X1 direction by L4 due to the occurrence of lateral swing in the X2 direction on the installation surface G.

  As shown in FIG. 11, when the upper pedestal 110 moves in the X1 direction, the first pedestal 131 on the X2 side connected to the lower pedestal 120 is vertically upward (with respect to the second pedestal 132 on the X2 side) Move to Z2 side). In addition, the ball 133 moves between the first pedestal 131 and the second pedestal 132 while rolling in an oblique direction toward the upper side (Z2 side) and the center side (X1 side) of the support device 1.

  On the other hand, the first pedestal 131 on the X1 side connected to the lower pedestal 120 moves to the lower side (Z1 side) in the vertical direction with respect to the second pedestal 132 on the X1 side as well. In addition, the ball 133 moves between the first pedestal 131 and the second pedestal 132 while rolling in an oblique direction from the center of the support device 1 to the outer side (X1 side) from the lower side (Z1 side).

  Thus, when the upper pedestal 110 moves in the X1 direction from the home position, the first pedestal 131 of the movable portion 130 disposed on the X2 side is on the upper side (Z2 side) in the vertical direction with respect to the second pedestal 132 Moving. Further, the first pedestal 131 of the movable portion 130 disposed on the X1 side moves to the lower side (Z1 side) in the vertical direction with respect to the second pedestal 132. Accordingly, as shown in FIG. 11, the lower pedestal 120 is inclined such that the X2 side is the upper side (Z2 side) in the vertical direction and the X1 side is the lower side (Z1 side) in the vertical direction. The upper pedestal 110 is rotatably engaged with the recess 120 a of the lower pedestal 120 at the convex portion 113 a (supporting portion). Therefore, even when the lower pedestal 120 is inclined, the upper pedestal 110 can maintain the horizontal state by relatively rotating the convex portion 113a in the concave portion 120a. In addition, after convergence of the disturbance, the upper pedestal 110 returns to the home position by the biasing force applied to each of the movable pedestals 141.

  As described above, in the supporting device 1A of the second embodiment, the upper pedestal 110, the lower pedestal 120, the movable portion 130, and the supporting portion 140 even when horizontal and vertical vibrations occur in the installation surface G due to disturbance. Since it can be absorbed by the operation of, it is possible to suppress that the disturbance is directly transmitted to the processing device 90.

  Since the lower pedestal 120 of the second embodiment is formed in a substantially conical shape in the opposite direction, the height in the vertical direction (Z direction) can be made lower than that of the support device 1 of the first embodiment. Further, in the support device 1A of the second embodiment, the movable portion 130 is provided on the inner peripheral side of the lower pedestal 120, so that it is possible to suppress the entry of foreign matter and the like from the outside. In addition, support device 1A of a 2nd embodiment produces the same effect as support device 1 of a 1st embodiment.

  As mentioned above, although embodiment of this invention was described, this invention is not limited to embodiment mentioned above, For example, various deformation | transformation and changes are possible like the modification mentioned later, These are also this Within the technical scope of the invention. Further, the effects described in the embodiment only list the most preferable effects arising from the present invention, and the effects according to the present invention are not limited to those described in the embodiment. In addition, although embodiment mentioned above and the deformation | transformation form mentioned later can also be combined and used suitably, detailed description is abbreviate | omitted. In addition, since the modified embodiment has a configuration common to the first embodiment and the second embodiment, in the following description, the reference numerals of members and the like are omitted.

(Modified form)
Although the embodiment describes the example in which the height (the thickness in the vertical direction) of the upper pedestal is fixed, the present invention is not limited to this. For example, a screw mechanism may be provided between the upper pedestal and the lower pedestal, and the height of the upper pedestal relative to the lower pedestal may be adjusted by operating the screw mechanism.

  In the embodiment, an example in which the first pedestal and the second pedestal have substantially the same shape has been described, but is not limited thereto. The first pedestal and the second pedestal may have different shapes. For example, the radius of curvature of the two base curved surfaces may be different. Moreover, although embodiment demonstrated the example which made both the pedestal curved surfaces the same curvature radius in a 1st pedestal and a 2nd pedestal, it is not limited to this. At least one of the first pedestal and the second pedestal may have a shape combining spherical surfaces of a plurality of curvature radii. For example, in the case where two spherical surfaces are combined, the curvature of the central surface may be smaller than the curvature of the outer surface. In that case, the radius of the central surface may be larger than the radius of the outer surface. This makes it possible to reduce the rolling resistance when the ball starts to roll, so that the ball can smoothly roll even when a small disturbance is applied.

  Although an embodiment explained an example which arranged a movable part and a supporter in four places by the side of the perimeter of a lower pedestal, it is not limited to this. The movable portion and the support portion may be disposed at three locations on the outer periphery side of the lower pedestal, or may be disposed at five or more locations.

  For example, when the movable portion is disposed at three locations on the outer periphery side of the lower pedestal, the first and second springs can be made longer if the size of the base portion is the same, so the movement range in the vertical direction (Z direction) Can be made bigger. In addition, when the movable portion is disposed at three locations on the outer periphery side of the lower pedestal, the degree of freedom of the position at which the first and second springs are disposed can be further enhanced. Furthermore, if the springs have the same stroke, a smaller diameter can be used, which allows the support device to be miniaturized.

  Although the embodiment has described the example in which the first spring and the second spring are provided as the biasing member, the present invention is not limited to this. As the biasing member, only the first spring may be provided. Further, at least one of the first spring and the second spring may be provided with an adjustment mechanism of elastic force. For example, the elastic force of the second spring can be adjusted by making the second pressing plate engaged with the other end of the second spring movable in the expansion and contraction direction of the spring. By providing such a configuration, the home position of the upper pedestal can be adjusted more easily.

  In addition, a third spring may be provided between the first spring and the second spring. FIG. 12 is a perspective view showing an entire configuration of a supporting device 1B in a modified embodiment. In the description of the modified embodiment and the drawings, members, portions and the like that perform the same functions as in the first embodiment are denoted by the same reference numerals, and overlapping descriptions will be appropriately omitted.

  As shown in FIG. 12, in the supporting device 1 </ b> B of the modified embodiment, a third pressing plate 419 is provided between the first pressing plate 416 and the second pressing plate 418 in the base unit 50. Moreover, in the supporting device 1B of the modified embodiment, the movable pedestal 41 is provided with a recess 41b on the surface facing outward. A third spring 45 is mounted between the recess 41 b of the movable pedestal 41 and the third pressing plate 419. The third spring 45 is a member that generates a biasing force on the movable pedestal 41 together with the first spring 43. The third spring 45 is provided at the center of the moving direction of the moving pedestal 41, so when each moving pedestal 41 moves along the linear guide 42 (see FIG. 1), the third spring 45 is inclined with respect to the moving direction. It is possible to suppress the occurrence. Therefore, according to the support device 1B of the configuration of this modification, the movable pedestal 41 can be moved more smoothly.

  Although an embodiment explained an example using a spring as an energizing member, it is not limited to this. The biasing member may be a spring, or may be a piston mechanism or the like in which air, gas or the like is enclosed. Note that the biasing member may be rubber or the like if the deterioration of the elastic force due to aging is not taken into consideration.

  In the embodiment, an example in which the angle of the first pedestal and the second pedestal in the movable portion is 45 ° upward or downward with respect to the perpendicular P parallel to the vertical direction (Z direction) has been described, but the present invention is not limited thereto. The angle of the first pedestal and the second pedestal in the movable portion is preferably 45 °, but can be appropriately selected, for example, in the range of about 45 ° to -10 to + 10 °.

  In the embodiment, in the supporting device, the configuration provided with the base portion has been described, but is not limited thereto. The mounting surface of the support device may be used as a base.

  Although the embodiment shows an example in which the support device is used as a seismic isolation table of the processing device, the present invention is not limited to this. The supporting device may be used, for example, as an insulator that blocks the transmission of vibration or the like generated during normal operation of the processing device to the installation surface.

1, 1A support device 10, 110 upper pedestal 20, 120 lower pedestal 30, 130 movable portion 31, 131 first pedestal 32, 132 second pedestal 33, 133 sphere 40, 140 support portion 41, 141 movable pedestal 42 rail portion 43 1st spring 44 2nd spring 50 base part

Claims (5)

A device placement unit on which the processing device is placed;
A moving frame portion rotatably supporting the device mounting portion;
A first pedestal having a concave curved surface, a second pedestal provided to face the first pedestal and having a concave curved surface, and a sphere provided between the first pedestal and the second pedestal, A plurality of movable parts disposed obliquely to the side surface of the moving frame;
A plurality of support portions which are respectively connected to a plurality of the movable portions and bias the movable portion so that the device mounting portion moves upward in the vertical direction, and horizontally movably support the movable portion And
Support device. In the support device according to claim 1,
The moving frame has a substantially concave vertical cross section,
The movable portion is coupled to an outer peripheral side of the moving frame portion.
Support device. In the support device according to claim 1,
The moving frame has a substantially inverted concave vertical cross section,
The movable portion is coupled to an inner circumferential side of the moving frame portion.
Support device. The supporting device according to any one of claims 1 to 3,
The support portion is
A movable pedestal coupled to the movable portion;
A rail portion which supports the movable pedestal so as to move linearly;
And a first biasing member coupled to the movable base and biasing the movable portion such that the moving frame moves upward in the vertical direction.
Support device. In the supporting device according to claim 4,
The support portion is
From the position where the first biasing member biases the moving frame by a predetermined amount, the movable unit is moved such that the device mounting portion moves upward in the vertical direction in conjunction with the first biasing member. Further comprising a second biasing member for biasing the portion;
Support device.

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