JP3204041U - Support device - Google Patents

Abstract

Provided is a support device in which an upper pedestal and a lower pedestal are not completely separated even when a large disturbance occurs. An upper pedestal 10 having a concave curved surface 11 on a lower surface, a lower pedestal 20 having a concave curved surface 21 on an upper surface, and a lower pedestal 20 on which a processing device 90 is mounted. The supporting device 1 includes a spherical body 30 disposed between the curved surface and the curved surface of the lower pedestal, and a stopper 40. The stopper 40 is provided with an outward projecting portion 41b provided on the upper pedestal and an opening provided on the lower pedestal. And an inward protruding portion 42b through which the outward protruding portion 41b is inserted, and the upper pedestal moves in the horizontal direction with respect to the lower pedestal, whereby the outward protruding portion enters the lower side of the inward protruding portion. [Selection] Figure 1

Description

  The present invention relates to a support device including a sphere.

Conventionally, there has been a base isolation table provided with a sphere between the upper member and the lower member.
However, in the conventional base isolation table, when a large shaking occurs, there is a possibility that the upper member and the lower member are completely separated.

JP 2001-200890 A

  An object of the present invention is to provide a support device in which an upper pedestal and a lower pedestal are not completely separated even when a large disturbance occurs.

  The present invention solves the problems by the following means. In addition, in order to make an understanding easy, although it attaches | subjects and demonstrates the code | symbol corresponding to embodiment of this invention, it is not limited to this. In addition, the configuration described with reference numerals may be improved as appropriate, or at least a part thereof may be replaced with another configuration.

The first device is an upper pedestal (10, 301, 401) on which a processing device is mounted and having an upper pedestal curved surface (11) which is a concave curved surface on the lower surface, and a lower side in the vertical direction than the upper pedestal A lower pedestal (20, 320, 420) having a lower pedestal curved surface (21) which is a concave curved surface on the upper surface, and a sphere (30) disposed between the upper pedestal curved surface and the lower pedestal curved surface , Stoppers (40, 340, 440), and the stoppers are outwardly projecting portions (41b, 341b, 441b) projecting outward in the horizontal direction in a flange shape from the cylindrical surface provided on the upper base, and the lower A flange that protrudes inward in the horizontal direction from a hole that is provided on the upper side of the pedestal and accommodates the outward projecting portion, and has an inner diameter portion that is larger than an outer diameter portion of the outward projecting portion, Inward direction with outward protrusion inserted A projecting portion (42b, 342b, 442b), and the outwardly projecting portion enters the lower side of the inwardly projecting portion by moving the upper base horizontally with respect to the lower base. It is a support device.
The second device is the support device of the first device, wherein the upper base (10, 301, 401) moves in the horizontal direction with respect to the lower base (20, 320, 420), thereby The cylindrical surface (41a, 341a) of the pedestal is in contact with the inner diameter portion of the inward protruding portion (42b, 342b, 442b), or the outer diameter portion of the outward protruding portion (41b, 341b, 441b) and the lower side In the state where the inner surface of the hole (42a, 342a, 442a) of the pedestal is in contact, and the contact is made, the outward protrusion and the inward protrusion have a gap in the vertical direction. It is a support device.
-The third device, the processing device is placed, the upper base (210) having an upper base curved surface (11) that is a concave curved surface on the lower surface, and arranged below the upper base in the vertical direction, A lower pedestal (220) having a lower pedestal curved surface (21) that is a concave curved surface on the upper surface, a sphere (30) disposed between the upper pedestal curved surface and the lower pedestal curved surface, and a stopper (240). The stopper is provided on the lower pedestal, and an inwardly projecting portion (242b) in which an inner diameter portion of the collar forms an opening from a hole provided on the lower side of the upper pedestal, and which has an inner diameter portion forming an opening. An outward projecting portion (241b) that protrudes outward from the cylindrical surface in a flange shape, has an outer diameter portion of the flange that is smaller than an opening formed by the inward projecting portion, and is accommodated in the hole, Upper pedestal horizontally with respect to the lower pedestal By moving, the inward protrusion, from entering the bottom of the outward protrusion is a support device according to claim.
The fourth device is a support device according to the third device, wherein the upper base (210) moves in a horizontal direction with respect to the lower base (220), whereby an inner diameter portion of the inward projecting portion (242b). And the cylindrical surface (241a) of the lower pedestal abut or the inner side surface of the hole (242a) of the upper pedestal abuts the outer diameter portion of the outward projecting portion (241b), In the contacted state, the outwardly projecting portion and the inwardly projecting portion have a gap in the vertical direction.
The fifth device is the supporting device according to any one of the first to fourth devices, wherein at least one of the upper pedestal curved surface (11) and the lower pedestal curved surface (21) is a cross section viewed from the horizontal direction. The support device is characterized in that the curvature on the center side is smaller than the curvature on the outside.

  According to the present invention, it is possible to provide a support device in which the upper pedestal and the lower pedestal are not completely separated even when a large disturbance occurs.

It is a figure explaining support device 1 of a standard state of a 1st embodiment. It is sectional drawing explaining the aspect from which the upper base 10 of 1st Embodiment moves with respect to the lower base 20. FIG. It is sectional drawing explaining the support apparatus 201 of 2nd Embodiment. It is sectional drawing explaining the support apparatus 301 of 3rd Embodiment. It is sectional drawing explaining the support apparatus 401 of 4th Embodiment.

(Embodiment)
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(First embodiment)
FIG. 1 is a diagram illustrating a support device 1 in a reference state according to the first embodiment.
FIG. 1A is a diagram showing the arrangement of each part in a state where the support device 1 is viewed from the upper side Z2. FIG. 1A illustrates the outer shape of the processing apparatus 90 superimposed on the AA cross-sectional view of FIG.
FIG. 1B is a cross-sectional view of the support device 1 (a view corresponding to the cross-sectional view taken along the line BB in FIG. 1A).
FIG. 2 is a cross-sectional view illustrating a manner in which the upper base 10 of the first embodiment moves relative to the lower base 20.
FIG. 2A shows a case where the movement amount is small.
FIG. 2B is a diagram illustrating a mode in which the stopper 40 functions in the horizontal direction.
FIG. 2C is a diagram illustrating a mode in which the stopper 40 functions in the vertical direction Z.

In the embodiment and the drawings, an XYZ orthogonal coordinate system is provided for ease of explanation and understanding. This coordinate system is based on the state shown in FIG. 1A. The horizontal direction X (left side X1, right side X2), vertical direction Y (lower side Y1, upper side Y2), vertical direction Z (lower side Z1, upper side Z2). Represents. The axial direction of the left-right direction X and the vertical direction Y is a horizontal direction.
In the embodiment, when the support device 1 is viewed from the vertical direction Z (that is, in the arrangement in the horizontal plane), the center of the upper pedestal curved surface 11 and the center of the lower pedestal curved surface 21 coincide with each other. The state that is not moved with respect to the lower pedestal 20 is appropriately referred to as a reference state.

The support device 1 is a device that reduces the influence of disturbance (such as earthquakes and vibrations of other processing devices) on the processing device 90. That is, the support device 1 can be used as a seismic isolation device for the processing device 90. Although the kind of processing apparatus 90 is not limited, For example, they are NC machine tool used for machining, a chip mounter (surface mounter), a self-inserting machine, etc.
The support device 1 is disposed between the lower surface of the processing device 90 or an installation foot (hereinafter, simply referred to as “the lower surface of the processing device 90” or the like) and the installation surface G of the processing device 90. That is, the support device 1 is installed on the installation surface G, and the processing device 90 is installed on the support device 1. For example, the support device 1 is disposed at each of the four corners of the lower surface of the processing device 90, for a total of four. FIG. 1 is installed in the lower left corner part of the lower surface of the processing apparatus 90 among them.

(Configuration of support device 1)
The configuration of the support device 1 will be described. The description of the configuration will mainly describe the form of the reference state.
As shown in FIG. 1, the support device 1 includes an upper pedestal 10, a lower pedestal 20, a sphere 30, a stopper 40, a tilt adjustment unit 50, and a rubber plate 55.
The upper base 10 is a disk-shaped member.
The upper pedestal 10 includes six upper pedestal curved surfaces 11.
The upper pedestal curved surface 11 is a concave spherical surface provided by recessing the lower surface of the upper pedestal 10.

The lower pedestal 20 is a disk-shaped member having substantially the same outer shape as the upper pedestal 10. The lower pedestal 20 is disposed on the lower side Z <b> 1 than the upper pedestal 10.
The lower pedestal 20 has six lower pedestal curved surfaces 21.
The lower pedestal curved surface 21 is a concave spherical surface provided by recessing the upper surface of the lower pedestal 20. The length of the radius of the lower pedestal curved surface 21 is equal to the length of the radius of the lower pedestal curved surface 21.

The spherical body 30 is disposed between the upper pedestal curved surface 11 and the lower pedestal curved surface 21. Six spheres 30 are provided corresponding to these.
The length of the diameter of the sphere 30 is sufficiently smaller than the length of the diameter of the upper pedestal curved surface 11 and the diameter of the lower pedestal curved surface 21. Moreover, the length of the diameter of the spherical body 30 is larger than the sum of the depth of the upper pedestal curved surface 11 and the depth of the lower pedestal curved surface 21. For this reason, the lower surface of the upper pedestal 10 and the upper surface of the lower pedestal 20 are separated by this large amount.

In addition, the shape (length of a diameter, etc.) of the upper pedestal curved surface 11, the lower pedestal curved surface 21, and the sphere 30 can be appropriately set according to the weight of the processing device 90 or the like.
Further, the combination of the upper pedestal curved surface 11, the lower pedestal curved surface 21, and the sphere 30 is not limited to six sets, and may be, for example, three or more sets.

The shape of the upper pedestal curved surface 11, the lower pedestal curved surface 21, and the sphere 30 as viewed from the upper side Z2 will be described.
As shown in FIG. 1A, the centers of the six lower pedestal curved surfaces 21 are arranged at equiangular intervals (that is, 90 ° intervals) at the center of the support device 1 and are arranged on the same circumference 15. . Although not shown, similarly, the centers of the six upper pedestal curved surfaces 11 are arranged at equal angular intervals on the center of the support device 1 and are arranged on the same circumference 15.
These two circumferences 15 coincide. For this reason, the center of the upper pedestal curved surface 11 and the center of the lower pedestal curved surface 21 coincide, and the outer shape of the upper pedestal curved surface 11 and the outer shape of the lower pedestal curved surface 21 coincide. The center of the upper pedestal curved surface 11, the center of the lower pedestal curved surface 21, and the center of the sphere coincide.
In the embodiment, the center of the upper pedestal curved surface 11, the center of the lower pedestal curved surface 21, and the center of the sphere refer to the center when viewed from the upper side Z <b> 2. The following description is also the same.

The stopper 40 is a part for preventing the upper pedestal 10 and the lower pedestal 20 from being completely separated when a large disturbance is applied to the support device 1 (see FIG. 2C).
The stopper 40 includes a shaft 41 a and an outward projecting portion 41 b provided on the upper base 10, and a hole 42 a and an inward projecting portion 42 b provided on the lower base 20.

The shaft 41a has a columnar shape having a cylindrical surface. The shaft 41a is provided on the lower surface of the upper base 10 so as to protrude to the lower side Z1.
The outward projecting portion 41b is formed so as to project in a flange shape outward from the tip of the shaft 41a in the horizontal direction.
The hole 42 a is provided by denting the upper surface of the lower pedestal 20.
The inward projecting portion 42b is formed so as to project in a brim shape from the opening edge of the hole 42a toward the inner side in the horizontal direction of the hole 42a.
The shape of the outward projecting portion 41b and the inward projecting portion 42b viewed from the upper side Z2 is a concentric circle.

The inclination adjusting unit 50 is a part that adjusts the inclination in the vertical plane between the processing device 90 and the support device 1.
The inclination adjusting unit 50 includes a concave spherical surface 51 and a support shaft 52.
The concave spherical surface 51 is a concave spherical surface provided on the upper surface of the lower pedestal 20.
The support shaft 52 is disposed between the upper base 10 and the processing device 90 in a state where the axial direction is parallel to the vertical direction Z.
The upper end portion of the support shaft 52 is a portion where the processing apparatus 90 is actually placed. The upper end of the support shaft 52 and the lower surface of the processing apparatus 90 are fixed by screws or the like. The lower end portion of the support shaft 52 is provided with a convex convex spherical surface 52 a having the same radius as the concave spherical surface 51. The convex spherical surface 52 a is inserted into the concave spherical surface 51.

  The rubber plate 55 is disposed on the lower surface of the lower pedestal 20. The lower surface of the rubber plate 55 is actually grounded to the installation surface G. That is, the rubber plate 55 is disposed between the lower pedestal 20 and the installation surface G. The rubber plate 55 reduces the influence of disturbance on the processing device 90 in the vertical direction Z.

[Dimension setting for stopper 40, etc.]
(Dimension setting when viewed from the upper side Z2)
The length D42b of the inner diameter of the inward protrusion 42b is larger than the length D41b of the outer diameter of the outward protrusion 41b. For this reason, when assembling the support device 1, the outward projecting portion 41 b can be inserted through the opening formed by the inward projecting portion 42 b, and thus can be accommodated in the hole 42 a.

  The length L41b from which the outward projecting portion 41b projects from the shaft 41a is smaller than the length L42b from which the inward projecting portion 42b projects from the inner diameter portion of the hole 42a. For this reason, when the upper pedestal 10 moves in the horizontal direction with respect to the lower pedestal 20, the outer periphery of the shaft 41 a and the inward protruding portion are brought into contact with the tip of the outward protruding portion 41 b and the inner diameter portion of the hole 42 a. The tip of 42b abuts (see FIG. 2B). In this case, the moving length by which the upper pedestal 10 moves with respect to the lower pedestal 20 is a length LX1 from the outer periphery of the shaft 41a to the tip of the inward protruding portion 42b.

Further, half the arc length L21 of the cross section of the lower pedestal curved surface 21 (the length of the arc indicated by the thick line portion in FIG. 1B) is equal to or longer than the length of rolling of the sphere 30 when the upper pedestal 10 has the length LX1. Is set to
For this reason, the sphere 30 does not ride on the upper surface of the lower pedestal curved surface 21. The same applies to the upper pedestal curved surface 11.

(Dimension setting in the vertical direction Z)
In response to the movement of the upper pedestal 10 in the horizontal direction with respect to the lower pedestal 20, the sphere 30 moves while rolling on the upper pedestal curved surface 11 and the lower pedestal curved surface 21. For this reason, the sphere 30 also moves from the reference state to the upper side Z2. Thereby, the upper pedestal 10 moves to the upper side Z <b> 2 with respect to the lower pedestal 20.
As shown in FIG. 2B, the outward protrusion 41 b and the inward protrusion 42 b have a gap LZ <b> 2 in the vertical direction Z when the shaft 41 a is in contact with the tip of the inward protrusion 42 b. That is, in the reference state, the length LZ3 of the upper surface of the outward projecting portion 41b and the lower surface of the inward projecting portion 42b in the vertical direction Z is larger than the moving length LZ1 of the upper base 10 and the lower base 20 in the vertical direction Z. Thus, the inward protruding portion 42b is arranged at a position where the movement range of the outward protruding portion 41b has escaped.

[Operation of Support Device 1]
The support device 1 operates as follows according to the magnitude of the disturbance.
The support device 1 maintains the state of the reference state of FIG. 1 in a normal state where there is almost no disturbance.
Then, the operation is performed as shown in FIGS. 2A, 2B, and 2C according to the magnitude (small, medium, and large) of the disturbance.
The magnitude of the disturbance is small, for example, such that the installation surface G is shaken by vibrations generated by other processing devices or earthquakes having a seismic intensity of about 4.
The medium disturbance is, for example, such a magnitude that the installation surface G is shaken by an earthquake having a seismic intensity of about 5 or 6.
The magnitude of the disturbance is large, for example, such that the installation surface G is shaken by an earthquake having a seismic intensity of about 7, and in some cases, the processing device 90 is collapsed.

Hereinafter, although the form which the upper base 10 moves to the right side X2 among water directions with respect to the lower base 20 is demonstrated, it is the same also in the form which moves to any direction of a horizontal direction.
(1) Reference state: FIG.
The upper base 10 is supported by the lower base 20 via six spheres 30. For this reason, the upper base 10 does not tilt with respect to the lower base 20.
The load of the processing device 90 is received by the installation surface G through the support shaft 52, the upper base 10, the sphere 30, the lower base 20, and the rubber plate 55 in this order.
The load of the processing device 90 is received by the sphere 30 via the upper pedestal curved surface 11. For this reason, the upper pedestal curved surface 11 and the sphere 30 are the center of the upper pedestal curved surface 11 and the highest position of the upper pedestal curved surface 11 (a position where the tangential direction becomes the horizontal direction) is in contact with the highest position of the sphere 30. Try to maintain state.
Further, the load on the processing device 90 is received by the lower pedestal curved surface 21 via the sphere 30. Therefore, the sphere 30 and the upper pedestal curved surface 11 have the lowest position of the sphere 30 and the lowest position of the arc of the lower pedestal curved surface 21 that is the center of the lower pedestal curved surface 21 (position where the tangential direction becomes the horizontal direction). Try to stay in contact.
Thereby, between the upper base 10 and the lower base 20 can maintain the state which does not move to a horizontal direction, ie, can maintain a reference | standard state stably.

Although illustration is omitted, when the installation surface G has an inclination with respect to the horizontal plane, the inclination adjusting unit 50 can absorb this inclination.
That is, in this case, since the entire support device 1 is installed in an inclined state with respect to the horizontal plane, the upper base 10 is also inclined with respect to the installation surface G. In this case, the convex spherical surface 52 a and the concave spherical surface 51 of the inclination adjusting unit 50 slide. For this reason, the support shaft 52 can support the processing apparatus 90 in a state of being arranged in parallel to the vertical direction Z. In addition, since the inclination of the installation surface G is usually very small, the seismic isolation function of the processing device 90 is not hindered.
Even when the lower surface of the processing apparatus 90 is distorted or inclined, the inclination adjusting unit 50 can absorb these inclinations and the like.

(2) State where disturbance is small: FIG. 2 (A)
When the disturbance of the installation surface G is transmitted to the support device 1, the upper base 10 moves in the horizontal direction with respect to the lower base 20.
Thereby, the support device 1 can suppress the disturbance from the installation surface G from being directly transmitted to the processing device 90.
The sphere 30 moves while rolling on the upper pedestal curved surface 11 and the lower pedestal curved surface 21. For this reason, the upper pedestal curved surface 11 slightly moves in the vertical direction Z with respect to the lower pedestal curved surface 21.

Here, the height of the lower pedestal curved surface 21 is lowest at the center where the tangential direction is the horizontal direction. For this reason, the sphere 30 tends to return to the center by gravity.
The height of the upper pedestal curved surface 11 is highest at the center where the tangential direction is the horizontal direction. For this reason, the upper base curved surface 11 tries to return to the center by gravity. That is, the upper pedestal curved surface 11 tends to descend until the center of the upper pedestal curved surface 11 is in contact with the highest position of the sphere 30.
Thereby, even if the upper pedestal 10 moves relative to the lower pedestal 20 due to a disturbance, the upper pedestal 10 can return to the reference state after the disturbance has converged. In addition, although illustration is abbreviate | omitted, the upper base 10 may return to a reference | standard state, repeating the movement to an opposite direction.

In addition, the inclination of the lower pedestal curved surface 21 with respect to the horizontal plane (that is, the angle formed by the tangent line of the arc of the lower pedestal curved surface 21 and the horizontal plane in the cross-sectional view) gradually increases as the distance from the center of the lower pedestal curved surface 21 increases. The same applies to the upper pedestal curved surface 11.
For this reason, the force that the sphere 30 tries to return to the center of the lower pedestal curved surface 21 gradually increases as the amount of movement from the reference state increases. The same applies to the force with which the sphere 30 tries to return to the center of the upper pedestal curved surface 11.
For this reason, the upper pedestal 10 is easy to move with respect to the lower pedestal 20 in the reference state, and gradually becomes difficult to move as the sphere 30 moves away from the center of the lower pedestal curved surface 21 (and the center of the upper pedestal curved surface 11). .
Thereby, after the disturbance acts on the processing apparatus 90, the force that the upper base 10 tries to return to the reference state gradually increases. For this reason, when a disturbance works, the machining device 90 does not suddenly receive a large impact.

(3) State in which the disturbance is medium: FIG. 2 (B)
In a state where the disturbance is medium, the force acting on the support device 1 by the disturbance is larger than that in the state (2).
For this reason, the upper pedestal 10 moves in the horizontal direction with respect to the lower pedestal 20 until the inner periphery of the shaft 41a and the tip of the inward projecting portion 42b come into contact with each other. As described above in the dimension setting, in this case, the outward protrusion 41b and the inward protrusion 42b have a gap in the vertical direction Z.
For this reason, the upper surface of the outward protrusion 41b does not contact the lower surface of the inward protrusion 42b in a state where the inward protrusion 42b enters the lower side Z1 of the outward protrusion 41b. Therefore, the inward protruding portion 42b can directly stop the movement in the horizontal direction with respect to the lower base 20 of the upper base 10.

  As described above, since the stopper 40 operates, the machining apparatus 90 is subjected to a large acceleration, and thus an impact is applied. However, the state in which the disturbance is medium is not a state that occurs during normal operation of the processing apparatus 90. In addition, the force acting on the processing apparatus 90 can be reduced by the action (2) until the shaft 41a and the tip of the inward projecting portion 42b come into contact with each other. For this reason, the support device 1 has a sufficient seismic isolation effect.

  In the embodiment, when the space between the upper pedestal 10 and the lower pedestal 20 moves, the distal end (outer diameter portion) of the outward projecting portion 41b is brought into contact with the inner periphery of the shaft 41a and the distal end of the inward projecting portion 42b. And the inner diameter portion of the hole 42a can be deformed. That is, the protrusion length L41b of the outward protrusion 41b may be larger than the protrusion length L42b of the inward protrusion 42b. However, in this modified embodiment, a force acts on the tip of the shaft 41a (that is, the outward projecting portion 41b), so that the moment generated at the base of the shaft 41a is larger than that in the embodiment. For this reason, in this modified form, the burden concerning the axis | shaft 41a becomes large.

(4) Large disturbance: Fig. 2 (C)
In a state where the disturbance is large, the force acting on the support device 1 by the disturbance is larger than that in the state (3).
Due to such a large disturbance, the four support devices 1 that are grounded to the lower surface of the processing device 90 are initially in the state shown in FIG. When the support device 1 tries to move to the right side X2, the support device 1 (not shown) arranged on the right side X2 serves as a fulcrum, and the processing device 90 rotates to the right side X2.
As shown in FIG. 2C, in this case, the upper base 10 of the support device 1 arranged on the left side X1 rotates to the right side X2 with respect to the lower base 20 from the state of FIG. In this case, the upper base 10 rotates until the upper surface of the outward projecting portion 41b contacts the lower surface of the inward projecting portion 42b, but does not rotate further. For this reason, the upper base 10 is not completely separated from the lower base 20.
Thereby, the stopper 40 can suppress the falling of the processing apparatus 90.

  Thus, when the stopper 40 operates, the machining device 90 receives a larger impact than in the case (3). However, a state where the disturbance is large is an emergency such as a large-scale earthquake. Even in such a case, the support device 1 can suppress the tilting of the processing device 90, and according to the above (2) or the like until the inner periphery of the shaft 41a and the tip of the inward protruding portion 42b come into contact with each other. Has seismic isolation effect. For this reason, after the disturbance converges, it can be expected that the processing apparatus 90 can be promptly restored to the operating state.

  In this case, the support shaft 52 of the inclination adjusting unit 50 can maintain a state parallel to the vertical direction Z by rotating with respect to the upper base 10 (see arrow θ50 shown in FIG. 2C). For this reason, the lower surface of the processing apparatus 90 can maintain a state parallel to the horizontal plane.

  As described above, the stopper 40 of the support device 1 of the present embodiment can function in the horizontal direction and the vertical direction Z depending on the magnitude of the disturbance, and even when the disturbance is large, the upper pedestal 10 and the lower pedestal. 20 does not completely separate. Further, when the support device 1 is assembled, the outward projecting portion 41b and the inward projecting portion 42b do not interfere with each other.

(Second Embodiment)
Next, a second embodiment to which the present invention is applied will be described.
In the following description and drawings, parts having the same functions as those of the first embodiment described above are given the same reference numerals or the same reference numerals at the end (the last two digits), and overlapping explanations are appropriately given. Omitted.
FIG. 3 is a cross-sectional view illustrating a support device 201 according to the second embodiment.
FIG. 3A is a diagram of the reference state.
FIG. 3B is a diagram for explaining a mode in which the stopper 240 functions in the horizontal direction (a diagram corresponding to FIG. 2B).

As shown in FIG. 3A, in the support device 201 of this embodiment, the configuration of the stopper 240 is turned upside down from that of the first embodiment.
That is, the stopper 240 includes a hole 242a and an inward projecting portion 242b provided in the upper base 210, and a shaft 241a and an outward projecting portion 241b provided in the lower base 220.

The hole 242a is provided by recessing the lower surface of the upper base 210.
The inward projecting portion 242b is formed so as to project in a brim shape from the opening edge of the hole 242a toward the inside in the water direction.
The shaft 241a is provided on the upper surface of the lower pedestal 220 so as to protrude to the upper side Z2.
The outward protrusion 241b is formed so as to protrude in a flange shape radially outward from the tip of the shaft 241a.

As shown in FIG. 3B, when the disturbance on the installation surface G is transmitted to the support device 201, the upper base 210 moves in the horizontal direction with respect to the lower base 220. Then, the upper pedestal 210 moves in the horizontal direction with respect to the lower pedestal 220 until the tip of the inward projecting portion 242b contacts the inner periphery of the shaft 241a.
In a state where the inward projecting portion 242b enters the lower side Z1 of the outward projecting portion 241b, there is a gap between the lower surface of the outward projecting portion 241b and the upper surface of the inward projecting portion 242b, as in the first embodiment. For this reason, the stopper 240 can directly stop the movement in the horizontal direction with respect to the lower base 220 of the upper base 210.

  As in the first embodiment, the stopper 240 is configured such that the tip of the outward projection 241b contacts the inner surface of the hole 242a before the tip of the inward projection 242b contacts the inner periphery of the shaft 241a. It may be deformed.

  Although detailed description is omitted, when the disturbance is large, the lower surface of the outward projecting portion 241b comes into contact with the upper surface of the inward projecting portion 242b by tilting the upper base 210. Thereby, the upper base 210 and the lower base 220 are not completely separated.

  As described above, the support device 201 of this embodiment has the same effects as those of the first embodiment even if the stopper 240 is configured upside down from that of the first embodiment.

(Third embodiment)
FIG. 4 is a cross-sectional view illustrating a support device 301 according to the third embodiment.
FIG. 4A is a diagram of the reference state.
FIG. 4B is a diagram (a diagram corresponding to FIG. 2B) illustrating a mode in which the stopper 340 functions in the horizontal direction.
As shown in FIG. 4A, the support device 301 is different from the first embodiment in the configuration of a stopper 340 and an inclination adjusting unit 350.

The upper surface of the outward projecting portion 341b of the stopper 340 is an inclined surface. Similarly, the lower surface of the inward projecting portion 342b is an inclined surface.
In the state viewed from the upper side Z2, the hole 342a of the lower pedestal 320 and the lower pedestal curved surface 21 overlap (see the overlapping range LX3 shown in FIG. 4A).
For this reason, the lower pedestal curved surface 21 can be disposed closer to the center of the lower pedestal 320 than in the first embodiment.
The upper pedestal curved surface 11 is arranged on the center side of the upper pedestal 310 in accordance with the arrangement of the lower pedestal curved surface 21.
Thereby, the upper pedestal 310 and the lower pedestal 320 can be reduced in size, and the entire support device 301 can also be reduced in size.

As shown in FIG. 4B, when the upper pedestal 310 moves in the horizontal direction relative to the lower pedestal 320, the manner in which the tip of the inward projecting portion 342b abuts on the shaft 341a is the same as in the first embodiment. (See FIG. 2B).
Although detailed description is omitted, when the disturbance is large, the upper pedestal 310 is inclined, and the inclined surface of the outward projecting portion 341b comes into contact with the inclined surface of the inward projecting portion 342b. Thereby, the upper base 310 and the lower base 320 are not completely separated.

In the inclination adjusting unit 350, the diameter of the support shaft 352 is made larger than that of the first embodiment, and the radii of the concave spherical surface 351 and the convex spherical surface 352a are made larger than those of the first embodiment.
For this reason, the strength of the support shaft 352 is improved as compared with the first embodiment. Further, the adhesion area between the concave spherical surface 351 and the convex spherical surface 352a is larger than that in the first embodiment. Thereby, the inclination adjustment part 350 can support the processing apparatus 90 stably, and can improve a load resistance.

  As described above, the support device 301 of the present embodiment can be downsized.

(Fourth embodiment)
FIG. 5 is a cross-sectional view illustrating a support device 401 according to the fourth embodiment.
FIG. 5A is a diagram of the reference state.
FIG. 5B is a diagram (a diagram corresponding to FIG. 2B) illustrating a mode in which the stopper 440 functions in the horizontal direction.
As shown in FIG. 5A, the support device 401 is different from the first embodiment in the arrangement of the upper pedestal curved surface 11, the lower pedestal curved surface 21, the stopper 440, and the like. 460 was provided.

As shown in FIG. 5A, the support device 401 includes a set of upper pedestal curved surface 11, lower pedestal curved surface 21, and sphere 30. That is, the first embodiment includes a plurality of these combinations, whereas the support device 401 includes only one set.
When viewed from the upper side Z2, the center of the upper pedestal curved surface 11, the center of the lower pedestal curved surface 21, and the center of the sphere 30 are coincident.

  The outward projecting portion 441b of the stopper 440 is provided so as to project outward in the horizontal direction from the outer peripheral surface 441a of the casing of the upper base 410. That is, in the first embodiment, the outward projecting portion 441b is provided on the cylindrical surface of the shaft, whereas in the present embodiment, the outward projecting portion 441b is a cylinder that is the outer peripheral surface 441a of the disc-shaped upper base 410. Provided on the surface.

The hole 442a of the lower pedestal 420 is large enough to accommodate the outward projecting portion 441b. The central axis of the hole 442a passes through the centers of the upper pedestal curved surface 11 and the upper pedestal curved surface 12. Therefore, the shape of the lower pedestal 420 is a shape like a container that opens to the upper side Z2.
The upper surface of the outward projecting portion 441b and the lower surface of the inward projecting portion 442b are inclined surfaces similar to the third embodiment.

As shown in FIG. 5B, when the disturbance of the installation surface G is transmitted to the support device 401, the tip of the inward projecting portion 442b abuts on the shaft 441a as in the third embodiment (see FIG. 4B). ).
Even when the disturbance on the installation surface G is large, the upper base 410 and the lower base 420 are not completely separated as in the third embodiment.

  Note that the support device 401 does not include the tilt adjustment unit as in the above-described embodiment. However, the upper pedestal 410 can rotate with the contact point between the upper pedestal curved surface 11 and the sphere 30 as a fulcrum. For this reason, the upper base 410 can be rotated so as to follow the inclination of the processing apparatus 90.

  As described above, the support device 401 only needs to include a pair of the upper pedestal curved surface 11, the lower pedestal curved surface 21, and the sphere 30, and the upper surface of the outward projecting portion 441b and the lower surface of the inward projecting portion 442b are inclined surfaces. Therefore, it can be further advanced and downsized.

As shown in FIG. 5A, the vibration damping unit 460 includes an outer cylinder part 461, a rod 462, an inner cylinder part 463, and a spring 464.
The outer cylinder portion 461 and the rod 462 are integrated, and can move in the vertical direction Z as a unit.
The rod 462 is provided inside the outer cylinder portion 461. The processing device 90 is actually placed on the upper portion of the outer cylinder portion 461 and the rod 462.
The inner cylinder portion 463 and the upper pedestal 410 have an integral configuration. The inner cylinder portion 463 is provided on the upper surface of the upper pedestal 410 so as to protrude to the upper side Z2. The length of the outer diameter of the inner cylinder part 463 is the same as the length of the inner diameter of the outer cylinder part 461. The inner cylinder part 463 is inserted through the outer cylinder part 461. Thereby, the inner cylinder part 463 supports the outer cylinder part 461 so as to be movable in the vertical direction Z.
The spring 464 is a compression coil spring. The spring 464 is accommodated in the inner cylinder portion 463. The spring 464 supports the rod 462 at the upper end.

As described above, the outer cylindrical portion 461 and the rod 462 are supported by the upper base 410 via the spring 464.
When a disturbance having a vertical component occurs on the installation surface G, the disturbance is transmitted to the machining apparatus 90 via the spring 464. Thereby, the vibration control part 460 can buffer the vibration transmitted to the processing apparatus 90.

  As described above, the support device 401 according to the present embodiment can be further reduced in size and can buffer disturbance in the vertical direction Z.

  As mentioned above, although embodiment of this invention was described, this invention is not limited to embodiment mentioned above, For example, various deformation | transformation and a change are possible like the deformation | transformation form mentioned later, These are also It is within the technical scope of the present invention. In addition, the effects described in the embodiments are merely a list of the most preferable effects resulting from the present invention, and the effects of the present invention are not limited to those described in the embodiments. It should be noted that the above-described embodiment and modifications described later can be used in appropriate combination, but detailed description thereof is omitted.

(Deformation)
(1) In the embodiment, the upper pedestal curved surface and the lower pedestal curved surface have the same shape, but the present invention is not limited to this. The upper pedestal curved surface and the lower pedestal curved surface may have different shapes. For example, both radii may be different.

(2) In the embodiment, an example in which the support device is used as a seismic isolation device has been described, but the embodiment is not limited thereto. The support device may be used, for example, as an insulator that blocks transmission so that vibration generated by the processing device is not transmitted to the installation surface.

(3) In the embodiment, an example in which the upper pedestal curved surface and the lower pedestal curved surface are spherical surfaces having a constant radius is shown, but the present invention is not limited to this. At least one of the upper pedestal curved surface and the lower pedestal curved surface may be, for example, a combination of a plurality of spherical surfaces.
When combining two spherical surfaces, the curvature of the center side surface may be smaller than the curvature of the outer surface. For example, the radius of the central surface may be larger than the radius of the outer surface.
As a result, the rolling resistance when the sphere begins to roll can be reduced, so that the sphere rolls smoothly even when a small disturbance is applied.

1, 201, 301, 401 ... Supporting device 10, 210, 310, 410 ... Upper base 11 ... Upper base curved surface 20, 220, 320, 420 ... Lower base 21 ... Lower base curved surface 30 ... Sphere 40, 240, 340, 440 ... Stopper 41a, 241a, 341a ... Shaft 41b, 241b, 341b, 441b ... Outward projecting part 42a, 242a, 342a, 442a ... Hole 42b, 242b, 342b, 442b ... Inward projecting part 90 ... Processing device 441a ... Outer peripheral surface

Claims (5)

An upper pedestal on which a processing apparatus is placed and has an upper pedestal curved surface that is a concave curved surface on the lower surface;
A lower pedestal disposed on the lower side in the vertical direction than the upper pedestal and having a lower pedestal curved surface which is a concave curved surface on the upper surface;
A sphere disposed between the upper pedestal curved surface and the lower pedestal curved surface;
With a stopper,
The stopper is
An outward projecting portion projecting outward in the horizontal direction in a flange shape from the cylindrical surface provided on the upper pedestal;
An opening provided on the upper side of the lower pedestal that protrudes in the shape of a collar inward in the horizontal direction from a hole in which the outward projecting portion is accommodated, forming an opening in which the inner diameter portion of the collar is larger than the outer diameter portion of the outward projecting portion, And an inward protruding portion through which the outward protruding portion is inserted,
When the upper pedestal moves in a horizontal direction with respect to the lower pedestal, the outward protrusion enters the lower side of the inward protrusion,
A support device characterized by the above. The support device according to claim 1,
When the upper pedestal moves in the horizontal direction with respect to the lower pedestal, the cylindrical surface of the upper pedestal comes into contact with the inner diameter portion of the inward protruding portion, or the outer diameter portion of the outward protruding portion and the The inner surface of the hole of the lower pedestal makes contact,
In the state of contact, the outward projection and the inward projection have a gap in the vertical direction;
A support device characterized by the above. An upper pedestal on which a processing apparatus is placed and has an upper pedestal curved surface that is a concave curved surface on the lower surface;
A lower pedestal disposed on the lower side in the vertical direction than the upper pedestal and having a lower pedestal curved surface which is a concave curved surface on the upper surface;
A sphere disposed between the upper pedestal curved surface and the lower pedestal curved surface;
With a stopper,
The stopper is
An inward protruding portion that protrudes in a flange shape from the hole provided on the lower side of the upper pedestal inward in the horizontal direction, and an inner diameter portion of the flange forms an opening;
An outward projecting portion that protrudes outward in a flange shape from a cylindrical surface provided on the lower pedestal, and has an outer diameter smaller than an opening formed by the inward projecting portion, and is accommodated in the hole. With
The inward projecting portion enters the lower side of the outward projecting portion by moving the upper base horizontally with respect to the lower base;
A support device characterized by the above. The support device according to claim 3, wherein
When the upper pedestal moves in the horizontal direction with respect to the lower pedestal, the inner diameter portion of the inward projecting portion and the cylindrical surface of the lower pedestal come into contact with each other, or the inner side surface of the hole of the upper pedestal The outer diameter portion of the outward projecting portion abuts,
In the state of contact, the outward projection and the inward projection have a gap in the vertical direction;
A support device characterized by the above. The support device according to any one of claims 1 to 4,
In a cross section viewed from the horizontal direction, at least one of the upper pedestal curved surface and the lower pedestal curved surface has a center side curvature smaller than an outer curvature,
A support device characterized by the above.

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