JP2019057385A - Ion source support base - Google Patents

Abstract

To enable an ion source 101 mounted on an ion source support base X to assume a lain posture in a stable condition.SOLUTION: There is provided an ion source support base X on which an ion source 101 comprising a long-shaped plasma generation container 10 and a pair of rollers 31 provided in side walls 11b of the plasma generation container 10 are mounted, the side walls 11b being opposite to a direction orthogonal to a longitudinal direction in the long-shaped plasma generation container 10. The ion source support base X comprises: a pair of rails 5 on which the pair of rollers 31 is mounted rollably while the ion source 101 is suspended; and a dragging mechanism 6 that drags the ion source 101 from one end side A of a rail 5 to the other end side B while the pair of rollers 31 is mounted on the pair of rails 5.SELECTED DRAWING: Figure 3

Description

  The present invention relates to an ion source support base that supports an ion source.

  As a conventional ion source support base, as shown in Patent Document 1, there is one for placing and transporting an ion source removed from an apparatus main body such as an ion beam irradiation apparatus. This Patent Document 1 describes that an ion source in a standing posture is fallen down and supported in a lying posture with a reduced height size in order to transport an ion source having a large height in a stable state. Yes.

Specifically, the ion source is provided with a pair of rollers provided so as to sandwich the ion extraction port, and the ion source support base is provided with a pair of rails on which the pair of rollers are rotatably mounted. It is.
Then, when removing the ion source from the apparatus main body, the ion source is placed in a forward leaning posture by attaching and suspending a wire behind the center of gravity of the ion source, and the roller is placed on the rail in the forward leaning posture. . Thus, after the roller is placed on the rail, the ion source is gradually lowered, so that the ion source falls forward by its own weight and assumes a lying posture.

  However, if the roller is to be placed on the rail while the ion source is suspended as described above, for example, the ion source may be shaken and become unstable, and the roller and the rail may be misaligned. If the roller is placed on the rail while the position is shifted, the roller will come off the rail and the ion source will fall from the ion source support, causing damage to the ion source or ion source support, There is a risk of man-made disasters around the source support stand.

JP 2016-110828 A

  Therefore, the present invention has been made to solve the above-described problems, and its main problem is to enable the ion source placed on the ion source support base to be in a stable posture. is there.

That is, the ion source support base according to the present invention is mounted with an ion source including an elongated plasma generation container and a pair of rollers provided on a side wall facing the direction perpendicular to the longitudinal direction of the plasma generation container. In a state where the ion source is suspended, a pair of rails on which the pair of rollers are rotatably mounted, and a state in which the pair of rollers are mounted on the pair of rails, And a pulling mechanism for pulling the ion source from one end side to the other end side of the rail.
Here, “pulling in from one end side toward the other end side” means that the pulling direction is from the one end side of the rail toward the other end side. There is no need to place the ion source or pull the ion source until it reaches the other end of the rail.

  In the case of the ion source support base configured as described above, the pulling mechanism pulls the ion source from one end side to the other end side of the rail while the pair of rollers are mounted on the pair of rails. Even if the lowered ion source is in an unstable state, the ion source can be brought into a stable state when the ion source is drawn. As a result, the ion source can be placed in a stable posture in a stable state, and the ion source can be transported in a stable posture.

The pulling mechanism is provided outside the pair of rails, and has a moving body that can move from one end side to the other end side of the rail, and the moving body is integrated with the plasma generation container. It is preferable to move while contacting the provided contacted member.
With such a configuration, since the moving body is located outside the pair of rails, the operator can check the work situation such as whether the moving body is in contact with the contacted member from the outside of the rails. It is possible to work safely without entering the inside of the rail.

If the pulling mechanism is configured to pull the ion source with a constant pulling force, if the ion source is pulled out of balance by the pulling mechanism, the roller may bite the rail. If the ion source is pulled in with a constant pulling force, the roller may come off and the ion source may fall over.
Therefore, it is preferable that the pulling mechanism is configured so that the force for pulling the ion source can be manually adjusted.
With such a configuration, it is possible to stop drawing the ion source at the operator's judgment when danger is likely to occur, and to prevent an accident.

  As a specific embodiment, the pull-in mechanism further includes a pair of conveyance belts provided along the rails outside the pair of rails, and the moving body is attached to each of the pair of conveyance belts. The structure currently described is mentioned.

The movable body has an accommodating recess that opens upward, and the contacted member is accommodated in the accommodating recess through the opening by the pair of rollers being placed on the pair of rails. It is preferred that
If it is such a structure, a to-be-contacted member and a moving body can be made to contact only by mounting a pair of roller on a pair of rail.

  According to the present invention configured as described above, the ion source removed from the apparatus main body can be placed on the ion source support base and can be in a stable posture in a stable state.

The figure which shows typically the whole structure of the ion irradiation apparatus of this embodiment. The figure which shows the ion source of the embodiment typically. The figure which shows typically the ion source support stand of the embodiment. The figure explaining operation | movement of the ion source conveyance system of the embodiment.

  An embodiment of an ion source support base according to the present invention will be described.

  The ion source support base X of this embodiment supports the ion source 101 which comprises the ion irradiation apparatus 100, and is used in order to convey the ion source 101 to a predetermined position.

First, the ion irradiation apparatus 100 will be described with reference to FIG.
The ion irradiation apparatus 100 is used, for example, in semiconductor manufacturing, and includes an apparatus main body 102 including a mass separator 103 and a separation slit 104, and an ion source 101 that can be attached to and detached from the apparatus main body 102. The ion beam extracted from the source 101 is irradiated onto the wafer W held by the holder 105.

  The ion source 101 generates an ion beam containing predetermined ions such as phosphorus, arsenic, boron, etc., and emits it to the apparatus main body 102. Specifically, as shown in FIG. 2, plasma is generated inside. The plasma generation vessel 10 is connected to the plasma generation vessel 10 and an extraction electrode system (not shown) composed of a plurality of electrodes for extracting an ion beam from an extraction port O formed in the plasma generation vessel 10. And an electrode holding member 20 that holds the extraction electrode system.

The plasma generation vessel 10 has a filament (not shown) that emits thermoelectrons inserted therein, and the ion source gas introduced into the plasma generation vessel 10 is ionized by the electrons emitted from the filament to generate plasma. It is comprised so that.
As shown in FIG. 2, the plasma generation container 10 of the present embodiment has a rectangular parallelepiped shape, for example, and has a vertically long shape when the ion source 101 is attached to the apparatus main body 102.
On one side surface 11a (hereinafter referred to as the front surface 11a) of the plasma generation container 10, the above-described drawer port O is formed in a long shape, and the front surface 11a has a flange portion 12 having a plurality of bolt holes 13. Is provided.

  The extraction electrode system (not shown) is for accelerating and extracting an ion beam from the plasma generated in the plasma generation container 10 by the action of an electric field, and includes, for example, an acceleration electrode, an extraction electrode, a suppression electrode, and a ground electrode. Has been. The extraction electrode system here is arranged in the vicinity of the above-described extraction port O, and a ribbon-like ion beam is extracted from the extraction port O.

  The electrode holding member 20 is a cylindrical body in which the plurality of electrodes described above are provided. One end surface 21a is attached to the front surface 11a of the plasma generation vessel 10 described above, and the other end surface 21b is attached to the apparatus main body 102. Attached to a surface (not shown). The mounting surface of the apparatus main body 102 is a surface on the mass separator 103 side, and is, for example, an end surface of a vacuum vessel (not shown) that constitutes the ion beam transport path. Moreover, the electrode holding member 20 is not limited to a cylindrical shape, and the shape thereof may be variously changed.

More specifically, a flange portion 22 having a plurality of bolt holes 23 is provided on one end surface 21 a and the other end surface 21 b of the electrode holding member 20, and the bolt holes 13 on the front surface 11 a of the plasma generation vessel 10 are provided. The plasma generation container 10 and the electrode holding member 20 are connected by passing a bolt through the bolt hole 23 of the one end surface 21 a of the electrode holding member 20. Further, the device main body 102 and the electrode holding member 20 are connected by passing a bolt through a bolt hole (not shown) on the mounting surface of the device main body 102 and a bolt hole 23 on the other end surface 21 b of the electrode holding member 20.
Thereby, the ion source 101 is attached to the apparatus main body 102 with a predetermined attachment posture.

  1 and 2, the mounting posture of the present embodiment is a posture in which the ion source 101 stands up along the vertical direction. In other words, the posture in which the longitudinal direction and the vertical direction of the plasma generation vessel 10 are parallel to each other. It is.

  The ion source 101 according to the present embodiment includes a lower roller 31 provided on the lower side of the plasma generation container 10 and an upper roller 32 provided on the upper side of the plasma generation container 10 when attached to the apparatus main body 102. Is further provided.

  Here, the pair of lower rollers 31 are disposed so as to sandwich the drawer port O from the direction orthogonal to the longitudinal direction, and the pair of upper rollers 32 sandwich the drawer port O from the direction orthogonal to the longitudinal direction. Is arranged. That is, the lower roller 31 is provided on each opposing side surface 11b orthogonal to the front surface 11a and extending in the longitudinal direction, and the upper roller 32 is also provided on each opposing side surface 11b.

  Each of the pair of lower rollers 31 is arranged to have the same height from the bottom surface 11c of the plasma generation vessel 10 and the same distance from the front surface 11a.

  Each of the pair of upper rollers 32 is spaced apart from the lower roller 31 by an equal distance in the longitudinal direction, and the distance between the pair of upper rollers 32 is equal to the distance between the pair of lower rollers 31. Is arranged.

  In the present embodiment, as shown in FIG. 1, the center G of the lower roller 31, the upper roller 32, and the ion source 101 is linear along the vertical direction when the ion source 101 is attached to the apparatus main body 102. Is arranged.

  Each lower roller 31 and each upper roller 32 are supported by a roller support member H so as to be able to roll, and are attached to the opposite side surface 11 b of the plasma generation container 10 via the roller support member H.

  Next, the ion source support base X of the present embodiment will be described with reference to FIG.

  The ion source support base X is mounted with an ion source 101 in a posture (hereinafter referred to as a standing posture) that is detached from the apparatus main body 102 and suspended, and the ion source 101 in a lying posture with a lower center of gravity G than the standing posture. Is to support.

  Specifically, as shown in FIG. 3, the ion source support base X includes a carriage 4 and a pair of rails 5 provided on the carriage 4.

  The carriage 4 includes a frame body 41 and a plurality of wheels 42 attached to the frame body 41. Each wheel 42 is attached to the lower surface of the frame 41 and rolls on a floor surface on which the apparatus main body 102 is arranged or a dedicated floor surface for transporting the ion source 101, for example.

The pair of rails 5 are horizontal rails provided on the upper surface of the frame body 41 and extending parallel to each other along the horizontal direction.
More specifically, the separation distance between the rails 5 is equal to the separation distance between the pair of lower rollers 31 and the separation distance between the pair of upper rollers 32, and the length of each rail 5 is equal to the lower roller 31 and the upper roller. It is longer than the distance from 32.
Further, stoppers 51 that prevent the lower roller 31 and the upper roller 32 from falling from the rail 5 are provided at both ends of the rails 5.

  However, as shown in FIGS. 3 and 4, the ion source support base X of the present embodiment is configured such that the ion source 101 is placed on one end side of the rail while the pair of lower rollers 31 are placed on the pair of rails 5. A pull-in mechanism 6 for pulling from A toward the other end B is further provided.

  The pulling mechanism 6 causes the ion source 101 to pull in a force below the center of gravity G of the ion source 101, and causes the pair of lower rollers 31 to move from one end A to the other end B on the rail 5. And the function of causing the ion source 101 to fall from the standing posture to the lying posture.

  Specifically, the retracting mechanism 6 includes a moving body 61 that can move from one end side A to the other end side B of the rail 5 and a drive unit 62 that moves the moving body 61. The ion source 101 is pulled in by moving from one end side A of the rail 5 toward the other end side B while contacting a contacted member Z provided integrally with the generation container 10.

The contacted member Z is a part of the ion source 101 or a member attached to the ion source 101. In the present embodiment, as shown in FIG. 2, a pair of contacted members Z are externally attached to the ion source 101. Yes.
Specifically, the contacted member Z extends outward from the pair of lower rollers 31. Here, the contacted member Z is attached to a roller support member H that rotatably supports the lower roller 31. It has a cylindrical shape extending along the axial direction.

As shown in FIG. 3, the moving body 61 has, for example, a resin block shape in which an accommodation recess 61 </ b> S opened upward is formed, and the contacted member Z described above is accommodated in the accommodation recess 61 </ b> S. .
The depth dimension of the accommodation recess 61S is set to be at least larger than the diameter of the contacted member Z, whereby the contacted member Z is accommodated in the accommodation recess 61S without protruding upward from the opening 61O.

  The pull-in mechanism 6 of the present embodiment is configured so that the ion source 101 can be pulled in manually, and here, the pull-in force described above is configured to be manually adjustable. The adjustment of the pulling force here includes not only adjusting the magnitude of the pulling force but also adjusting the direction of the pulling force (that is, whether to pull in or push in).

  Specifically, the retracting mechanism 6 is configured such that the moving body 61 can be manually moved by the driving unit 62. If it demonstrates in detail, the drive part 62 of this embodiment is provided with the conveyance belt 621 to which the mobile body 61 is attached, and the handle 622 for moving the conveyance belt 621 manually.

Here, a pair of conveyor belts 621 are provided outside the rails 5, and these conveyor belts 621 are configured such that both are interlocked by a link mechanism 63 including a plurality of gears, link members, and the like.
Specifically, the conveyor belt 621 is an endless belt-like timing belt provided along each rail 5, and the length along the rail 5 is substantially equal to or slightly longer than the length of the rail 5. is there.

The handle 622 is connected to one of the conveyor belts 621 via a gear or the like (not shown). Here, in view of operability and safety, the handle 622 is connected to the ion source 101 on the upper surface of the frame body 41, that is, a rail. 5 is provided on the other end side B.
For example, by rotating the handle 622 in the forward direction (for example, clockwise), the moving body 61 is transported from the one end A to the other end B of the rail 5 by the transport belt 621, and the handle 622 is moved in the reverse direction (for example, counterclockwise). By rotating in the clockwise direction, the moving body 61 is conveyed from the other end side B of the rail 5 to the one end side A by the conveying belt 621.

  In this embodiment, the handle 622 is rotated in the positive direction, and the movable body 61 is conveyed from one end A to the other end B of the rail 5, so that a positive pulling force acts on the ion source 101, and the force is Increasing the rotational speed of the handle 622 increases the speed, and decreasing the rotational speed decreases the speed. On the other hand, by rotating the handle 622 in the opposite direction and transporting the moving body 61 from the other end side B of the rail 5 to the one end side A, a negative pulling force (that is, a pushing force) acts on the ion source 101, The force increases as the rotational speed increases, and decreases as the rotational speed decreases.

  The pulling mechanism 6 is configured to be manually switchable between a pulling state in which a pulling force acts on the ion source 101 and a stopped state in which no pulling force acts on the ion source 101. Specifically, a pulling force acts on the ion source 101 by rotating the handle 622, and no pulling force acts on the ion source 101 unless the handle 622 is operated.

As shown in FIG. 4, the ion source support base X configured as described above constructs a transport system 200 that transports the ion source 101 together with a suspension mechanism Y that suspends the ion source 101 removed from the apparatus main body 102. ing.
The suspension mechanism Y suspends the ion source 101 so as to be movable in the vertical direction and the horizontal direction, and here uses a chain block movable in the horizontal direction. As the suspension mechanism Y, an electric crane may be used.

  Next, the operation of the above-described transport system 200 will be described with reference to FIG.

  First, a case where the ion source 101 attached to the apparatus main body 102 is removed and transported to a desired location will be described.

  First, in a state where the ion source 101 is attached to the apparatus main body 102, the ion source support base X is moved to the vicinity of the ion source 101.

Next, in a state where the chain of the chain block is hung on the ion source 101, for example, a user pulls out a bolt connecting the apparatus main body 102 and the electrode holding member 20, and removes the ion source 101 from the apparatus main body 102. As a result, the plasma generation container 10 and the electrode holding member 20 are integrally removed from the apparatus main body 102, and the ion source 101 is suspended by the suspension mechanism Y to be in an upright posture (FIG. 4a).
In this embodiment, in order to suspend the ion source 101 while maintaining the mounting posture, that is, to make the mounting posture and the standing posture the same, the chain is hung on each roller support member H that supports the upper roller 32, for example. The ion source 101 is suspended from directly above the center of gravity G. The chain may be attached to the plasma generation container 10.

  Subsequently, the suspended ion source 101 is swung or horizontally moved as necessary, and the ion source 101 is moved above the ion source support base X. More specifically, the ion source 101 is moved so that each of the pair of lower rollers 31 is positioned above one end side A of the pair of rails 5.

  Then, the ion source 101 is gradually lowered to place the pair of lower rollers 31 on one end side A of the pair of rails 5 (FIG. 4b). At this time, the lower roller 31 is placed on the rail 5, so that the contacted member Z extending outward from the lower roller 31 is accommodated in the accommodating recess 61 </ b> S of the movable body 61 in advance. It is arranged on one end side A of the rail 5.

  After placing the pair of lower rollers 31 on one end side A of the pair of rails 5, it is confirmed that the contacted member Z is accommodated in the accommodating recess 61 </ b> S of the moving body 61, and the ion source is operated by the drawing mechanism 6. 101 is pulled from one end A of the rail 5 to the other end B. In the present embodiment, the operator rotates the handle 622 in the forward direction, for example, to move the moving body 61 from one end side A to the other end side B of the rail 5 (FIG. 4 c).

  Thus, the moving body 61 moves from one end A to the other end B of the rail 5 while contacting the contacted member Z, so that the lower roller 31 moves from the one end A to the other end B on the rail 5. The ion source 101 gradually tilts from the standing posture while rolling upward and the upper roller 32 approaches the rail 5.

  Then, when the pair of upper rollers 32 are placed on the rail 5, both the lower roller 31 and the upper roller 32 are placed on the rail 5, and the ion source 101 is in a lying posture. In the present embodiment, the drawer port O faces downward in the lying posture.

  By removing the hook of the crane in this lying down posture and, for example, the operator moving the carriage 4, the ion source 101 can be transported to a desired position in a stable state.

  Next, a case where the ion source 101 is attached to the apparatus main body 102 will be described.

  First, the ion source 101 placed on the ion source support base X is moved to the vicinity of the apparatus main body 102. At this time, the ion source 101 is in a lying posture.

Next, a chain of chains is hung on the ion source 101 and the ion source 101 is lifted. As a result, the upper roller 32 is separated from the rail 5, and the lower roller 31 rolls on the rail 5 from the other end B toward the one end A. Then, the lower roller 31 is separated from the rail 5, and the ion source 101 is suspended to be in a standing posture.
At this time, in order to make the standing posture and the mounting posture the same posture, that is, to stand the ion source 101 along the vertical direction, for example, the chain is hung on each roller support member H that supports the upper roller 32, etc. The ion source 101 is suspended from directly above the center of gravity G. The chain may be attached to the plasma generation container 10.

  Subsequently, the suspended ion source 101 is swung, horizontally moved, or moved up and down as necessary to bring it close to the apparatus main body 102, and the apparatus main body 102 and the electrode holding member 20 are connected by a bolt. As a result, the ion source 101 is attached to the apparatus main body 102 while maintaining the standing posture.

In the case of the ion source support base X according to the present embodiment configured as described above, the pull-in mechanism 6 moves the ion source 101 to the rail 5 while the pair of lower rollers 31 are placed on the pair of rails 5.
Therefore, even if the suspended ion source 101 is in an unstable state, when the ion source 101 is pulled in, the ion source 101 is brought into a stable state. can do. As a result, the ion source 101 can be placed in a stable posture in a stable state, and the ion source 101 can be transported in a stable posture.

By the way, when the ion source 101 removed from the apparatus main body 102 is suspended so as to have a forward tilted posture, for example, the ion source 101 is inclined when the ion source 101 is detached, and the ion source 101 and the apparatus main body 102 are rubbed. The apparatus main body 102 is damaged. Further, when the ion source 101 is removed from the apparatus main body 102, a load is applied to a bolt or the like that fastens the ion source 101 and the apparatus main body 102, and the bolt or the like may be damaged.
On the other hand, when the ion source 101 suspended in the forward tilted posture is attached to the apparatus main body 102, the ion source 101 is fastened with a bolt or the like while being pressed against the apparatus main body 102. However, there is a risk of damage due to the load on the bolts.

  In order to avoid such a problem, when removing the ion source 101 from the apparatus main body 102, it is preferable to remove the ion source 101 while keeping the mounting posture without tilting the ion source 101 as much as possible. When placed on the support base X, it is dangerous because the ion source 101 does not know which side falls on one side A or the other side B of the rail 5.

On the other hand, in the ion source support base X of the present embodiment, the pull-in mechanism 6 moves the ion source 101 to one end side of the rail 5 with the pair of lower rollers 31 placed on the pair of rails 5. Since the ion source 101 is pulled from A toward the other end B, even if the ion source 101 removed from the apparatus main body 102 is mounted on the ion source support base X without being inclined, the ion source 101 is securely attached to the rail. Can be laid down on one side.
Thereby, it is not necessary to tilt the ion source 101 when removing the ion source 101 from the apparatus main body 102, so that the ion source 101 and the apparatus main body 102 are prevented from rubbing at the time of removal and a load is applied to a bolt or the like. be able to.
Further, when the ion source 101 is attached to the apparatus main body 102, it is not necessary to force the ion source 101 against the apparatus main body 102, so that it is possible to prevent a large amount of work or a load from being applied to a bolt or the like.

  In addition, since the moving body 61 is located outside the pair of rails 5, the operator can confirm from the outside of the rail 5 the work situation such as whether the moving body 61 is in contact with the contacted member Z, for example. The work can be safely proceeded without entering the inside of the rail 5.

  In addition, since the pull-in mechanism 6 is configured to be able to adjust the force with which the ion source 101 is manually pulled, for example, when the danger is likely to occur, such as when the ion source 101 is out of balance, the operator's judgment It is possible to stop pulling in the ion source 101, or to reversely rotate the handle to push the ion source back. Thereby, it is possible to prevent an accident in which the lower roller 31 is removed from the rail 5 or the ion source 101 falls.

  The present invention is not limited to the above embodiment.

  For example, the retracting mechanism of the above embodiment is configured to transport the moving body by the transport belt using the timing belt, but moves the moving body from one end side of the rail to the other end side. Any structure can be used as appropriate, and specific examples include a structure using a spring balancer, a winch, or the like as the pull-in mechanism.

More specifically, a spring balancer or winch includes a hook (attachment portion) provided at the tip of a wire and a main body portion that pulls the hook. The hook is a moving body, and the main body portion is a drive portion. is there.
More specifically, when the hook is hooked on, for example, a plasma generation container, the hooked portion becomes the contacted member. Thereby, a hook functions as a moving body which moves from the one end side of a rail to the other end side, contacting a to-be-contacted part.
For example, the main body is fixed to the other end of the carriage, and the lower roller is placed on one end of the rail. Can be pulled to the side. The main body portion does not necessarily have to be fixed to the carriage, and may be fixed to a member or a floor surface located on the other end side of the rail.

  Further, in the above-described embodiment, the retracting mechanism is configured so that the moving body can be moved manually. However, the retracting mechanism may be configured so that the moving body can be automatically moved using a motor or the like. Regardless, you may provide the transmission which switches the gear ratio of the moving speed of a moving body.

  Furthermore, the drawing mechanism may push the ion source from one end side of the rail to the other end side.

In the above embodiment, the lower roller, the upper roller, and the center of gravity of the ion source are arranged along the vertical direction in a state where the ion source is attached to the apparatus main body. For example, the lower roller and the upper roller may be displaced from the center of gravity along the vertical direction.
Even with such an ion source, if the chain is attached directly above the center of gravity of the ion source, the ion source can be removed from the apparatus main body while maintaining the mounting posture, and thereafter, the same operation as in the above embodiment is performed. The ion source can be in a lying posture.

  In the above embodiment, the case where the standing posture and the mounting posture are the same is described. However, for example, the ion source removed from the apparatus main body may be suspended in a posture inclined forward from the mounting posture. The ion source suspended in the forward tilt posture may be erected along the vertical direction and then placed on the ion source support.

In the embodiment, the ion source is drawn from one end side of the rail toward the other end side with the lower roller placed on one end side of the rail. For example, it is sufficiently longer than the longitudinal direction of the ion source 101. A rail may be prepared, and the ion source may be drawn from one end side of the rail toward the other end side with the lower roller placed on the center portion or the other end side of the rail.
Furthermore, when a long rail is used, two or more ion sources may be mounted on one ion source support base.

  Although the contacted member of the embodiment extends outward from the lower roller, it may extend outward from the opposite side surface of the plasma generation container, or may extend outward from the side surface of the electrode holding member. It may be a thing.

  In the above embodiment, the lower roller and the upper roller are provided on the opposite side surface, but may be provided on the front surface and the back surface opposite to the front surface, or may be provided on the electrode holding member. . Further, the number of rollers is not limited to the above embodiment, and a pair of intermediate rollers may be provided between the upper roller and the lower roller, for example.

  In the above embodiment, the ion source support was described as supporting the ion source including the plasma generation container, the extraction electrode system, and the electrode holding member. However, the ion source support is not the extraction electrode system. Or an ion source that does not include an electrode holding member, that is, a plasma generation container may be supported.

  In addition, it goes without saying that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention.

X ... Ion source support 100 ... Ion irradiation device 101 ... Ion source 102 ... Device main body 10 ... Plasma generation vessel 31 ... Lower roller 32 ... Upper roller 6 ... · Retraction mechanism 61 ··· Moving body 62 ··· Conveyor belt Z · · · Contacted member

Claims (5)

An ion source support base on which an ion source including a long plasma generation container and a pair of rollers provided on a side wall facing the direction perpendicular to the longitudinal direction of the plasma generation container is placed,
In a state where the ion source is suspended, a pair of rails on which the pair of rollers are movably mounted; and
An ion source support stage comprising: a pulling mechanism for pulling the ion source from one end side to the other end side of the rail in a state where the pair of rollers are placed on the pair of rails. The pull-in mechanism is provided on the outside of the pair of rails, and has a movable body that is movable from one end side to the other end side of the rails;
The ion source support base according to claim 1, wherein the moving body moves while contacting a contacted member provided integrally with the plasma generation container.   The ion source support base according to claim 1, wherein the pulling mechanism is configured so that a force for pulling the ion source can be manually adjusted. The retraction mechanism is
A pair of conveyor belts provided along the rails on the outside of the pair of rails;
The ion source support base according to claim 2 or 3, wherein the movable body is attached to each of the pair of transport belts. The moving body has an accommodating recess that opens upward;
5. The ion according to claim 2, wherein the contacted member is accommodated in the accommodating recess through the opening by placing the pair of rollers on the pair of rails. Source support stand.