JP2019047035A5 - - Google Patents

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Publication number
JP2019047035A5
JP2019047035A5 JP2017170422A JP2017170422A JP2019047035A5 JP 2019047035 A5 JP2019047035 A5 JP 2019047035A5 JP 2017170422 A JP2017170422 A JP 2017170422A JP 2017170422 A JP2017170422 A JP 2017170422A JP 2019047035 A5 JP2019047035 A5 JP 2019047035A5
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JP
Japan
Prior art keywords
gas
processing apparatus
plasma processing
pipe
length
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JP2017170422A
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English (en)
Japanese (ja)
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JP2019047035A (ja
JP6759167B2 (ja
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Priority to JP2017170422A priority Critical patent/JP6759167B2/ja
Priority claimed from JP2017170422A external-priority patent/JP6759167B2/ja
Publication of JP2019047035A publication Critical patent/JP2019047035A/ja
Publication of JP2019047035A5 publication Critical patent/JP2019047035A5/ja
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Publication of JP6759167B2 publication Critical patent/JP6759167B2/ja
Expired - Fee Related legal-status Critical Current
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JP2017170422A 2017-09-05 2017-09-05 プラズマ処理装置 Expired - Fee Related JP6759167B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2017170422A JP6759167B2 (ja) 2017-09-05 2017-09-05 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017170422A JP6759167B2 (ja) 2017-09-05 2017-09-05 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2019047035A JP2019047035A (ja) 2019-03-22
JP2019047035A5 true JP2019047035A5 (enExample) 2019-11-07
JP6759167B2 JP6759167B2 (ja) 2020-09-23

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ID=65814680

Family Applications (1)

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JP2017170422A Expired - Fee Related JP6759167B2 (ja) 2017-09-05 2017-09-05 プラズマ処理装置

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JP (1) JP6759167B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119907956A (zh) * 2022-09-16 2025-04-29 桑名金属工业株式会社 质量流量控制器

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1119494A (ja) * 1997-07-01 1999-01-26 Nippon Sanso Kk ガス混合装置
JP5037510B2 (ja) * 2006-08-23 2012-09-26 株式会社堀場エステック 集積型ガスパネル装置
JP4928893B2 (ja) * 2006-10-03 2012-05-09 株式会社日立ハイテクノロジーズ プラズマエッチング方法。
JP6034655B2 (ja) * 2012-10-25 2016-11-30 東京エレクトロン株式会社 プラズマ処理装置
TWI693638B (zh) * 2014-04-07 2020-05-11 美商蘭姆研究公司 獨立於配置的氣體輸送系統
US10557197B2 (en) * 2014-10-17 2020-02-11 Lam Research Corporation Monolithic gas distribution manifold and various construction techniques and use cases therefor
JP6438751B2 (ja) * 2014-12-01 2018-12-19 株式会社日立ハイテクノロジーズ プラズマ処理装置およびプラズマ処理方法
US10215317B2 (en) * 2016-01-15 2019-02-26 Lam Research Corporation Additively manufactured gas distribution manifold

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