JP2018503983A - 放射変換要素を有するオプトエレクトロニクス装置および放射変換要素の製造方法 - Google Patents
放射変換要素を有するオプトエレクトロニクス装置および放射変換要素の製造方法 Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/13362—Illuminating devices providing polarized light, e.g. by converting a polarisation component into another one
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H01L33/50—Wavelength conversion elements
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- H01L33/502—Wavelength conversion materials
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- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
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- H—ELECTRICITY
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H10K59/8793—Arrangements for polarized light emission
Abstract
Description
Claims (16)
- 放射を発生させるために設けられた活性領域を備える半導体チップ(2)を有するオプトエレクトロニクス装置(1)であって、
− 放射変換要素(3)が出射方向(21)において前記半導体チップの下流側に配置されており;
− 前記放射変換要素は、対称軸(40)をそれぞれが有する複数の変換体(4)を含み;
− 前記対称軸の空間的配向が好ましい方向(45)を含み;
− 前記変換体によって出射された放射が好ましい偏光(48)を含み;
− 前記オプトエレクトロニクス装置は、反射性偏光要素(5)を備え、前記反射性偏光要素(5)は、前記出射方向において前記放射変換要素の下流側に配置されており、前記反射性偏光要素は、前記好ましい偏光を有する放射を大部分通過させ、かつ前記好ましい偏光に直交して偏光された放射を大部分反射する、
オプトエレクトロニクス装置(1)。 - 前記変換体の前記好ましい方向と、前記好ましい偏光とは、前記出射方向に直交する平面において互いに直交している、
請求項1に記載のオプトエレクトロニクス装置。 - 前記変換体は、量子ロッドを含み、長手伸長軸に直交する横断方向の最大の大きさ(42)を有し、前記長手伸長軸に沿った長手方向の大きさ(41)の、前記横断方向の最大の大きさに対する比が1.5:1以上であり、かつ、40:1以下である、
請求項1または2に記載のオプトエレクトロニクス装置。 - 前記半導体チップは、拡散反射性反射体(7)によって少なくとも所々で取り囲まれている、
請求項1〜3のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記放射変換要素は、前記変換体が埋め込まれたマトリックス材料(35)を備える、
請求項1〜4のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記放射変換要素は、少なくとも所々で前記半導体チップに直接的に隣接している、
請求項5に記載のオプトエレクトロニクス装置。 - 拡散体(75)は、前記マトリックス材料に埋め込まれている、
請求項5または6に記載のオプトエレクトロニクス装置。 - 前記反射性偏光要素は、異方性屈折率を有する複数の層(51)を有する、
請求項1〜7のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記反射性偏光要素の、前記半導体チップによって出射された一次放射の反射率は、前記放射変換要素によって出射された二次放射の反射率より高い、
請求項1〜8のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記反射性偏光要素は、前記放射変換要素に隣接している、または、前記放射変換要素から200μm以下離間している、
請求項1〜9のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記反射性偏光要素が伸長する主平面と、前記活性領域が伸長する主平面とは、互いに平行である、
請求項1〜10のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記オプトエレクトロニクス装置は、表面実装型半導体デバイスである、
請求項1〜11のいずれか一項に記載のオプトエレクトロニクス装置。 - 前記オプトエレクトロニクス装置は、液晶ディスプレイ(92)の背面照明のために設けられている、
請求項1〜12のいずれか一項に記載のオプトエレクトロニクス装置。 - a) 対称軸(40)をそれぞれが有する変換体(4)を備える液状の基材(30)を設けるステップと;
b) 前記基材を型に充填するステップと;
c) 前記変換体の前記対称軸を好ましい方向に少なくともある程度配向するステップと;
d) 前記基材を硬化するステップと、を含む、
放射変換要素の製造方法。 - 前記変換体は、電界によって配向される、
請求項14に記載の放射変換要素の製造方法。 - 前記型は、少なくとも1つの半導体チップ(2)が配置されるキャビティ(250)である、
請求項14または15に記載の放射変換要素の製造方法。
Applications Claiming Priority (3)
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DE102015101216.2A DE102015101216A1 (de) | 2015-01-28 | 2015-01-28 | Optoelektronische Anordnung mit Strahlungskonversionselement und Verfahren zur Herstellung eines Strahlungskonversionselements |
DE102015101216.2 | 2015-01-28 | ||
PCT/EP2016/051553 WO2016120262A1 (de) | 2015-01-28 | 2016-01-26 | Optoelektronische anordnung mit strahlungskonversionselement und verfahren zum herstellen eines strahlungskonversionselements |
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DE102014117312A1 (de) | 2014-08-28 | 2016-03-03 | Osram Opto Semiconductors Gmbh | Optoelektronische Anordnung und Beleuchtungsvorrichtung |
KR20200088960A (ko) * | 2019-01-15 | 2020-07-24 | 삼성디스플레이 주식회사 | 발광 장치, 이를 포함하는 표시 장치 및 표시 장치의 제조 방법 |
US20230155085A1 (en) * | 2020-04-08 | 2023-05-18 | Ams-Osram International Gmbh | Optoelectronic component and illumination device |
FR3109453A1 (fr) * | 2020-04-17 | 2021-10-22 | Aledia | Dispositif optoélectronique comportant un polariseur et au moins un émetteur de rayonnement |
DE102021113095A1 (de) * | 2021-05-20 | 2022-11-24 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines optoelektronisches Bauelements und optoelektronisches Bauelement |
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- 2016-01-26 CN CN201680007846.5A patent/CN107209413B/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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CN107209413B (zh) | 2021-09-10 |
JP6506847B2 (ja) | 2019-04-24 |
WO2016120262A1 (de) | 2016-08-04 |
DE102015101216A1 (de) | 2016-07-28 |
CN107209413A (zh) | 2017-09-26 |
US20170365749A1 (en) | 2017-12-21 |
TWI594466B (zh) | 2017-08-01 |
TW201633570A (zh) | 2016-09-16 |
US10573790B2 (en) | 2020-02-25 |
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