JP2018199857A5 - - Google Patents
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- JP2018199857A5 JP2018199857A5 JP2017105796A JP2017105796A JP2018199857A5 JP 2018199857 A5 JP2018199857 A5 JP 2018199857A5 JP 2017105796 A JP2017105796 A JP 2017105796A JP 2017105796 A JP2017105796 A JP 2017105796A JP 2018199857 A5 JP2018199857 A5 JP 2018199857A5
- Authority
- JP
- Japan
- Prior art keywords
- metal
- cathode plate
- plate
- metal electrodeposition
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 claims 10
- 239000002184 metal Substances 0.000 claims 10
- 238000004070 electrodeposition Methods 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 229910001200 Ferrotitanium Inorganic materials 0.000 claims 1
- 238000003801 milling Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 230000002093 peripheral Effects 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
- 238000001039 wet etching Methods 0.000 claims 1
Claims (5)
前記金属板の突起部以外の表面に形成される非導電膜と、を有し、
前記突起部は、その側面が、略垂直部と傾斜部とからなる形状であり、
前記突起部の高さＬ１は、５０μｍ以上５００μｍ以下であり、
前記突起部の外周縁から外側に２０μｍ離れた位置Ｘから垂直に下ろした垂線と前記側面との交点をＹとするとき、ＸからＹまでの長さＬ２は４０μｍ以上、０．８×Ｌ１μｍ以下である、金属電着用陰極板。 A metal plate having a thickness of 3 mm or more and 10 mm or less, and a plurality of disc-shaped protrusions arranged on at least one surface;
A non-conductive film formed on the surface other than the protrusions of the metal plate,
The projecting portion has a side surface formed of a substantially vertical portion and an inclined portion,
The height L1 of the protrusion is 50 μm or more and 500 μm or less,
The length L2 from X to Y is 40 μm or more and 0.8 × L1 μm or less, where Y is the intersection of the perpendicular line drawn from a position X 20 μm away from the outer peripheral edge of the projection and perpendicular to the side surface. A cathode plate for metal electrodeposition.
請求項１に記載の金属電着用陰極板。 The metal plate is made of titanium or stainless steel.
The cathode plate for metal electrodeposition according to claim 1.
請求項１又は２に記載の金属電着用陰極板。 Used in the production of electro nickel for plating,
The cathode plate for metal electrodeposition according to claim 1 or 2.
金属板の少なくとも一方の表面に、ウェットエッチング加工又はエンドミル加工によって、円盤状の前記突起部を複数形成する、金属電着用陰極板の製造方法。 It is a manufacturing method of the metal electrodeposition cathode plate in any one of Claims 1 thru | or 3, Comprising:
A method for producing a metal electrodeposition cathode plate, wherein a plurality of disk-shaped protrusions are formed on at least one surface of a metal plate by wet etching or end milling.
請求項４に記載の金属電着用陰極板の製造方法。 In the above end mill processing, a radius end mill is used.
The manufacturing method of the metal electrodeposition cathode plate of Claim 4.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017105796A JP6500937B2 (en) | 2017-05-29 | 2017-05-29 | Negative electrode plate for metal electrodeposition and method of manufacturing the same |
| CA3064525A CA3064525C (en) | 2017-05-29 | 2018-03-29 | Cathode plate for metal electrodeposition and manufacturing method for same |
| PCT/JP2018/013187 WO2018220979A1 (en) | 2017-05-29 | 2018-03-29 | Cathode plate for metal electrodeposition and manufacturing method for same |
| EP18809926.1A EP3633074B1 (en) | 2017-05-29 | 2018-03-29 | Cathode plate for metal electrodeposition and manufacturing method for same |
| CN201880026566.8A CN110546310B (en) | 2017-05-29 | 2018-03-29 | Cathode plate for metal electrodeposition and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017105796A JP6500937B2 (en) | 2017-05-29 | 2017-05-29 | Negative electrode plate for metal electrodeposition and method of manufacturing the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018199857A JP2018199857A (en) | 2018-12-20 |
| JP2018199857A5 true JP2018199857A5 (en) | 2019-02-07 |
| JP6500937B2 JP6500937B2 (en) | 2019-04-17 |
Family
ID=64454726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017105796A Active JP6500937B2 (en) | 2017-05-29 | 2017-05-29 | Negative electrode plate for metal electrodeposition and method of manufacturing the same |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP3633074B1 (en) |
| JP (1) | JP6500937B2 (en) |
| CN (1) | CN110546310B (en) |
| CA (1) | CA3064525C (en) |
| WO (1) | WO2018220979A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7188219B2 (en) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | Cathode plate for metal electrodeposition |
| JP7188217B2 (en) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | Manufacturing method of cathode plate for metal electrodeposition |
| JP7188216B2 (en) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | Manufacturing method of cathode plate for metal electrodeposition |
| JP7238524B2 (en) * | 2019-03-25 | 2023-03-14 | 住友金属鉱山株式会社 | Cathode plate for metal electrodeposition |
| JP7188218B2 (en) * | 2019-03-25 | 2022-12-13 | 住友金属鉱山株式会社 | Cathode plate for metal electrodeposition |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3668081A (en) * | 1971-03-17 | 1972-06-06 | Int Nickel Co | Production of electrolytic metal |
| GB1573449A (en) * | 1976-04-01 | 1980-08-20 | Falconbridge Nickel Mines Ltd | Reusable electrolysis cathode |
| US4040915A (en) * | 1976-06-15 | 1977-08-09 | The International Nickel Company, Inc. | Method for producing regular electronickel or S nickel rounds from electroplating baths giving highly stressed deposits |
| JPS6038678Y2 (en) * | 1981-05-15 | 1985-11-19 | 住友金属鉱山株式会社 | Mother plate for metal electrodeposition |
| JPH10317197A (en) * | 1997-05-14 | 1998-12-02 | Sumitomo Metal Mining Co Ltd | Electric nickel for plating, cathode plate for for its production and production |
| KR20030023640A (en) * | 2000-06-30 | 2003-03-19 | 허니웰 인터내셔널 인코포레이티드 | Method and apparatus for processing metals, and the metals so produced |
| CN102149854A (en) * | 2008-09-09 | 2011-08-10 | 斯提奥摩有限公司 | A cathode and a method of forming a cathode |
| KR101664540B1 (en) * | 2014-04-02 | 2016-10-25 | 오씨아이 주식회사 | Electrolytic plating electrode and plating apparatus comprising thereof |
| JP6374966B2 (en) * | 2014-07-15 | 2018-08-15 | デノラ・ペルメレック株式会社 | Electrolysis cathode and method for producing electrolysis cathode |
-
2017
- 2017-05-29 JP JP2017105796A patent/JP6500937B2/en active Active
-
2018
- 2018-03-29 CA CA3064525A patent/CA3064525C/en active Active
- 2018-03-29 WO PCT/JP2018/013187 patent/WO2018220979A1/en unknown
- 2018-03-29 EP EP18809926.1A patent/EP3633074B1/en active Active
- 2018-03-29 CN CN201880026566.8A patent/CN110546310B/en active Active
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