JP2018156364A - Data storage medium and its manufacturing method, medium for storing data, data reading device and data reading method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a data storage medium and its manufacturing method, a medium for storing data, a data reading device and a data reading method having durability against change of storage environment and capable of easily manufacturing a duplication even after recording and storing information.SOLUTION: A data storage medium comprises: a base material made of quartz having a first surface and a second surface facing the first surface; a first data pattern formed in a first square storage region defined on the first surface of the base material to express a content of the data by an irregular structure; and a second data pattern formed in a second square storage region defined on the second surface to express a content of the data by the irregular structure.SELECTED DRAWING: Figure 2

Description

  The present disclosure relates to a data storage medium and a manufacturing method thereof, a data storage medium, a data reading device, and a data reading method.

  Paper as a medium for recording various information has been used for a long time, and even now, a lot of information is recorded on paper. On the other hand, with the development of industry, film (microfilm, etc.) for recording image information such as moving images and still images, and a record board for recording sound information have been used. In recent years, magnetic media have been used as media for recording digital data. Recording media, optical recording media, semiconductor recording media, and the like are used.

  Some of the information recorded on the medium as described above is required to be stored for an extremely long time exceeding 100 years. Each of the above media has a durability that does not hinder use depending on the application. For example, media such as paper, film, and record board are sufficiently durable on a time scale of several years. It can be said that it is a medium having a property. However, on time scales exceeding 100 years, aging degradation cannot be avoided, stored information may be lost, and water or heat may cause damage. For example, if microfilm is made of cellulose acetate as a raw material, it will decompose due to the temperature and humidity of the storage environment, and acetic acid will be generated on the surface, causing a vinegar syndrome that makes it impossible to read data. Is said to be less than 30 years. Although it is said that the lifespan of polyester is about 500 years, it cannot be achieved unless it is stored in an environment defined by standards such as ISO and JIS, and the storage environment is a risk of information loss. It will remain one of the factors.

  In addition, although magnetic recording media, optical recording media, semiconductor recording media, etc. have durability that does not hinder the use of general electronic equipment, they are considered to be durable on a time scale such as several decades. Since it has not been designed, it is not suitable for storing information permanently or semi-permanently. For example, in an EEPROM typified by a flash memory as a semiconductor recording medium, data is recorded and stored by holding charges in the floating gate, but the holding time of the charges in the floating gate depends on the storage environment. In addition, the repeated writing of data may damage the insulating layer and prevent the charge from being retained. A ROM is known as a long-lived semiconductor recording medium. However, it is very expensive to produce a ROM (replica) as a backup from a ROM in which information is recorded and stored.

  Further, the above medium has a problem that it lacks fire resistance and heat resistance. For example, if a fire occurs at the storage location of the above-mentioned medium where information is recorded and stored, the data will be lost due to the heat, so it is practical to store information permanently or semi-permanently on existing media. Is impossible.

  On the other hand, as a method capable of permanently and semipermanently storing information, a method of recording and storing information on a durable medium such as quartz glass has been proposed (see Patent Documents 1 and 2). Specifically, a method of recording data three-dimensionally as a difference in light transmittance in a minute cell in a cylindrical medium, and reading out information using computer tomography technology while rotating the medium (Refer to Patent Document 1), a method of measuring the difference in transmittance by irradiating electromagnetic waves to a cylindrical medium while changing the irradiation angle, and reading out information using a computer tomography technique (Patent Document) 2) has been proposed.

Japanese Patent No. 4991487 Japanese Patent No. 5286246

  As disclosed in the above Patent Documents 1 and 2, if a method of recording and storing information three-dimensionally in a cylindrical quartz glass is used as a medium, information can be stored permanently or semi-permanently. Can be recorded and saved. When reading information recorded and stored in this way, it is necessary to extract information from cells that are three-dimensionally distributed in the medium, so it is necessary to use computer tomography technology to perform Fourier transform processing, etc. There is. However, after a very long time scale of several hundred years, the recorded and stored information cannot be read if the same computer tomography technology as that used when recording and storing the information does not exist. There is.

  In addition, in order to reduce the risk that information will be lost due to damage to the medium on which the information is recorded / stored, the information is recorded / stored when making a copy as a backup of the medium. It is necessary to prepare a separate quartz glass, and to record and store information newly. However, if there is no information to be recorded / stored, such as digital information, a copy cannot be made, and a copy is made even if there is information to be recorded / stored. There is a problem that the work is complicated and a large cost is required.

  In view of such problems, the present invention is a data storage medium that is durable against changes in storage environment and can easily produce a copy as a backup even after information is recorded and stored. Another object is to provide a manufacturing method, a data storage medium, a data reading device, and a data reading method.

  In order to solve the above-described problem, as an embodiment of the present invention, a data storage medium in which data is stored, the first surface and a second surface opposite to the first surface, made of quartz. A material, a first data pattern formed in a first storage area having a rectangular shape defined on the first surface of the substrate, and expressing the content of the data by a concavo-convex structure; and A data storage medium is provided, which is formed in a second storage area having a rectangular shape defined on the second surface, and includes a second data pattern that expresses the content of the data by a concavo-convex structure.

  The concavo-convex structure of each of the first data pattern and the second data pattern includes a concave portion and a convex portion corresponding to each bit of the data bit string of the data, and on the first surface of the base material, A first arrangement direction index indicating information related to the arrangement direction of the data bit string expressed by the uneven structure of the first data pattern formed in the first storage area so as to correspond to the first storage area A concavo-convex structure of the second data pattern formed in the second storage area so as to correspond to the second storage area on the second surface of the base material, wherein a pattern is formed A second arrangement direction indicator pattern indicating information relating to the arrangement direction of the data bit string represented by the first arrangement direction indicator pattern and the second arrangement direction index pattern is formed. Column index pattern, respectively, may be formed on the identifiable position arrangement direction of the data bit sequence is expressed by the uneven structure of the first data pattern and the second data pattern.

  The first array direction indicator pattern and the second array direction indicator pattern may both have an asymmetric shape, and the first array direction indicator pattern and the second array direction indicator pattern are both uneven. It can be constituted by a structure.

  The concavo-convex structure constituting the first data pattern and the concavo-convex structure constituting the first array direction indicator pattern have substantially the same dimensions as each other, and the concavo-convex structure constituting the second data pattern And the concavo-convex structure constituting the second arrangement direction indicator pattern may have substantially the same dimensions.

  A first data non-storage area outside the first storage area is defined on the first surface of the base material, and a second data outside the second storage area is defined on the second surface of the base material. A data non-storage area is defined, and each of the first array direction index pattern and the second array direction index pattern is formed in each of the first data non-storage area and the second data non-storage area. Good.

  A plurality of first unit storage areas arranged in a matrix are provided in the first storage area, and a plurality of second unit storage areas arranged in a matrix are provided in the second storage area. In each of the plurality of first unit storage areas and the second unit storage area, each data bit string of the plurality of unit data obtained by dividing the data into a plurality of bits corresponds to each bit of the data bit string. A unit data pattern expressed by a unit concavo-convex structure is formed, and the first array direction indicator pattern and the second array direction indicator pattern are provided in each of the plurality of first unit storage regions and second unit storage regions. Correspondingly, it is expressed by the unit concavo-convex structure of the unit data pattern formed in each of the plurality of first unit storage regions and the second unit storage region. The arrangement direction of the data bit string of the unit data may be provided to the identifiable positions.

  On the first surface of the base material, corresponding to each of the plurality of first unit storage areas, a first address pattern indicating position information of each first unit storage area is formed, and A second address pattern indicating position information of each of the second unit storage areas may be formed on the second surface of the base material corresponding to each of the plurality of second unit storage areas.

  The plurality of first unit storage areas and the plurality of second unit storage areas are respectively M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more) .)), The first address pattern and the second address pattern are respectively in the p-th row, which is the parallel position of each of the first unit storage areas and each of the second unit storage areas. p is an integer of 1 or more and M or less) and q-th column (q is an integer of 1 or more and N or less).

  The concavo-convex structure constituting the first data pattern and the concavo-convex structure constituting the first address pattern have substantially the same dimensions, and the concavo-convex structure constituting the second data pattern; The concavo-convex structure constituting the second address pattern may have substantially the same dimensions as each other.

  The first array direction indicator pattern has a function of indicating a boundary between the adjacent first unit storage regions, and the second array direction indicator pattern has a function of indicating a boundary between the adjacent second unit storage regions. You may do it.

  The first data pattern and the second data pattern are positioned so as to overlap each intersection of the virtual grids when virtual grids are set in the first storage area and the second storage area, respectively. Also good.

  The base material has a thickness of the concavo-convex structure of the second data pattern in the second storage region so as to face a concave portion of the concavo-convex structure of the first data pattern formed in the first storage region. In the case where the concave portion is formed, the distance in the thickness direction of the base material between the bottom surfaces of the concave portions can read the first data pattern from the first surface side of the base material. The thickness may be such that the two data patterns cannot be read.

  Between the concave bottom surface of the concave / convex structure of the first data pattern formed in the first storage region and the concave bottom surface of the concave / convex structure of the second data pattern formed in the second storage region. The distance in the thickness direction of the substrate can be 350 μm or more.

  As one embodiment of the present invention, there is provided a data storage medium for storing data, a base material made of quartz having a first surface and a second surface facing the first surface, and the base material A first data pattern that is defined on the first surface of the first data pattern can be formed to express the data content by a concavo-convex structure including a concave portion and a convex portion corresponding to each bit of the data bit string of the data. A second data pattern that expresses the content of the data defined by the region and the second surface of the base material by a concavo-convex structure including a concave portion and a convex portion corresponding to each bit of the data bit string of the data; A second storage area that can be formed, and on the first surface of the substrate, the first data pattern of the first data pattern that can be formed in the first storage area so as to correspond to the first storage area Expressed by uneven structure A first array direction indicator pattern indicating information related to an array direction of the data bit string is formed on the second surface of the base material so as to correspond to the second storage region. There is provided a data storage medium on which a second arrangement direction indicator pattern indicating information on the arrangement direction of the data bit string represented by the uneven structure of the second data pattern that can be formed is formed.

  The first array direction indicator pattern and the second array direction indicator pattern may both have an asymmetric shape, and the first array direction indicator pattern and the second array direction indicator pattern are both uneven. You may be comprised by the structure.

  The first array direction indicator pattern is formed in a first data non-storage area outside the first storage area on the first surface of the base material, and the second array direction indicator pattern is the base material of the base material. A second data non-storage area outside the second storage area on the second surface may be formed.

  Each of the plurality of first storage regions and the plurality of second storage regions arranged in a matrix is defined on each of the first surface and the second surface of the base material, and the base material A first address pattern indicating position information of each of the first storage areas is formed on the first surface of the base material, corresponding to each of the plurality of first storage areas. On the second surface, a second address pattern indicating position information of each second storage area may be formed corresponding to each of the plurality of second storage areas.

  Each of the plurality of first storage areas and the plurality of second storage areas has M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more). The first address pattern and the second address pattern are in the p-th row (p is 1 or more), which is the parallel position of the first storage area and the second storage area, respectively. M may be an integer of M or less) and a q-th column (q is an integer of 1 to N).

  The first array direction indicator pattern has a function of indicating a boundary between the adjacent first storage regions, and the second array direction indicator pattern has a function of indicating a boundary between the adjacent second storage regions. May be.

  As one embodiment of the present invention, a method for manufacturing the data storage medium, the method comprising setting a first virtual grid in the first storage area defined on the first surface of the data storage medium The first resist pattern corresponding to the first data pattern indicating the contents of the data is positioned on the intersection of the first virtual grid in the first storage area, and the concave and convex portions of the first resist pattern are positioned. Forming a second virtual grid in the second storage area defined on the second surface, and a second data pattern corresponding to the second data pattern indicating the content of the data. Forming two resist patterns so that the concave and convex portions of the second resist pattern are positioned on the intersections of the second virtual grids in the second storage region; Data including a step of etching the first surface of the data storage medium using the first resist pattern as a mask and a step of etching the second surface of the data storage medium using the second resist pattern as a mask. A method for manufacturing a storage medium is provided.

  The first surface and the second surface of the data storage medium may be etched simultaneously, or the data storage may be performed after the first surface of the data storage medium is etched using the first resist pattern as a mask. The second resist pattern may be formed on the second surface of the storage medium, and the second surface of the data storage medium may be etched using the second resist pattern as a mask.

  A first hard mask layer and a second hard mask layer are respectively formed on the first surface and the second surface of the data storage medium, and the first hard mask layer is used as a mask. Etching a mask layer to form a first hard mask pattern; and etching the second hard mask layer using the second resist pattern as a mask to form a second hard mask pattern, In the step of etching the first surface of the data storage medium, the second hard disk pattern is used as a mask instead of the first resist pattern or together with the first resist pattern. In the step of etching the surface, the second resist pattern may be used instead of the second resist pattern. It may be used the second hard mask pattern as a mask with a pattern.

  As one embodiment of the present invention, a base material made of quartz having a first surface and a second surface facing the first surface, and a rectangular first defined on the first surface of the base material Formed in a storage area, and formed in a first data pattern that expresses the content of the data by a concavo-convex structure, and a second storage area of a square shape defined on the second surface of the substrate. A device for reading out the data from a data storage medium in which the data is stored, the second data pattern expressing the content of the data with a concavo-convex structure, the medium holding capable of holding the data storage medium And an image data acquisition unit for acquiring first image data of an area including the first storage area and second image data of an area including the second storage area of the data storage medium held in the medium holding unit And the image There is provided a data reading device including a data reading unit that extracts the concavo-convex structure from each of the first image data and the second image data acquired by the data acquisition unit and reads the data from the concavo-convex structure. .

  On each of the first surface and the second surface of the base material, a first array direction indicator pattern indicating information on an array direction of the data bit string represented by the uneven structure of the first data pattern And a second array direction indicator pattern indicating information on the array direction of the data bit string represented by the concave-convex structure of the second data pattern is formed, and the data reading device includes the first storage area. And an extraction direction determining unit that determines a direction in which the uneven structure of each of the first data pattern and the second data pattern formed in each of the second storage regions is extracted. Is obtained from each of the first image data and the second image data acquired by the image data acquisition unit. Recognizing each of the column direction index pattern and the second array direction index pattern, and for each of the first storage area and the second storage area of each of the first array direction index pattern and the second array direction index pattern Based on the positional relationship, the extraction direction of the concavo-convex structure is determined, and the data reading unit determines whether the first image data and the second image data are in accordance with the extraction direction of the concavo-convex structure determined by the extraction direction determination unit. The uneven structure may be extracted from each, and the data may be read from the uneven structure.

  The image data acquisition unit may acquire one of the first image data and the second image data, and then acquire the other. The image data acquisition unit may include the first image data and the second image data. You may acquire 2nd image data simultaneously.

  The image data acquisition unit includes a first image data acquisition unit that acquires the first image data, and a second image data acquisition unit that acquires the second image data, and the first image data acquisition unit and the Each of the second image data acquisition units may acquire the first image data and the second image data from the first surface side of the data storage medium.

  The image data acquisition unit includes a first image data acquisition unit that acquires the first image data, and a second image data acquisition unit that acquires the second image data. The first image data acquisition unit includes: The first image data is acquired from the first surface side of the data storage medium, and the second image data acquisition unit acquires the second image data from the second surface side of the data storage medium. Also good.

  A plurality of first unit storage areas arranged in a matrix are provided in the first storage area, and a plurality of second unit storage areas arranged in a matrix are provided in the second storage area. In each of the plurality of first unit storage areas and the second unit storage area, each data bit string of the plurality of unit data obtained by dividing the data into a plurality of bits corresponds to each bit of the data bit string. A unit data pattern expressed by a unit concavo-convex structure is formed, the first image data includes first unit image data of each first unit storage area, and the second image data includes Second unit image data of each second unit storage area is included, and the data reading unit extracts each first unit storage area and each second unit from the first unit image data and the second unit image data. Storage It reads each of the unit data based on the unit data pattern that is formed on, may read the data on the basis of the each unit data.

  The image data acquisition unit includes a first image data acquisition unit that acquires the first unit image data, and a second image data acquisition unit that acquires the second unit image data, and the first image data The acquisition unit and the second image data acquisition unit may acquire the first unit image data and the second unit image data from the first surface side of the data storage medium.

  The image data acquisition unit includes a first image data acquisition unit that acquires the first unit image data, and a second image data acquisition unit that acquires the second unit image data, and the first image data The acquisition unit acquires the first unit image data from the first surface side of the data storage medium, and the second image data acquisition unit acquires the second unit image data from the second surface side of the data storage medium. Unit image data may be acquired.

  The data reading device further includes an image data acquisition order determination unit that determines an acquisition order of the first unit image data and the second unit image data, and the image data acquisition unit determines the image data acquisition order determination. The first unit image data and the second unit image data may be acquired based on the acquisition order determined by the unit.

  The image data acquisition order determination unit is configured to acquire the first unit image data at the same time that the first image data acquisition unit acquires the first unit image data, and to face the first unit storage area included in the first unit image data. The acquisition order may be determined so that the second image data acquisition unit acquires the second unit image data including a two-unit storage area.

  As one embodiment of the present invention, a base material made of quartz having a first surface and a second surface facing the first surface, and a rectangular first defined on the first surface of the base material Formed in a storage area, and formed in a first data pattern that expresses the content of the data by a concavo-convex structure, and a second storage area of a square shape defined on the second surface of the substrate. And a method of reading the data from a data storage medium in which the data is stored, the second storage pattern including the second data pattern expressing the content of the data by a concavo-convex structure, the first storage area of the data storage medium An image data acquisition step of acquiring first image data of a region including the second image data of a region including the second storage region, the first image data acquired in the image data acquisition step, and the second Of image data Since Re respectively, it extracts the unevenness structure, data reading method and a data reading step of reading the data from the relief structure is provided.

  On each of the first surface and the second surface of the base material, a first array direction indicator pattern indicating information on an array direction of the data bit string represented by the uneven structure of the first data pattern Each of the second array direction indicator patterns indicating information on the array direction of the data bit string represented by the uneven structure of the second data pattern is formed, and the data reading method includes: And an extraction direction determining step for determining a direction for extracting the concavo-convex structure of each of the first data pattern and the second data pattern formed in each of the second storage regions, and the extraction direction determining step The first array direction index pattern and the first image data and the second image data, respectively. Recognizing each of the second array direction indicator patterns, and based on the positional relationship of the first array direction indicator pattern and the second array direction indicator pattern with respect to the first storage region and the second storage region, respectively. Determining the extraction direction of the concavo-convex structure, and in the data reading step, the concavo-convex structure from each of the first image data and the second image data according to the extraction direction of the concavo-convex structure determined in the extraction direction determination step. May be extracted, and the data may be read from the uneven structure.

  In the image data acquisition step, after acquiring either the first image data or the second image data, the other may be acquired. In the image data acquisition step, the first image data and the second image data may be acquired. You may acquire 2nd image data simultaneously.

  The image data acquisition step includes a first image data acquisition step of acquiring the first image data and a second image data acquisition step of acquiring the second image data, and the first image data acquisition step and the In the second image data acquisition step, the first image data and the second image data may be acquired from the first surface side of the data storage medium, respectively.

  The image data acquisition step includes a first image data acquisition step of acquiring the first image data, and a second image data acquisition step of acquiring the second image data. In the first image data acquisition step, The first image data may be acquired from the first surface side of the data storage medium, and the second image data may be acquired from the second surface side of the data storage medium in the second image data acquisition step. .

  A plurality of first unit storage areas arranged in a matrix are provided in the first storage area, and a plurality of second unit storage areas arranged in a matrix are provided in the second storage area. In each of the plurality of first unit storage areas and the second unit storage area, each data bit string of the plurality of unit data obtained by dividing the data into a plurality of bits corresponds to each bit of the data bit string. A unit data pattern expressed by a unit concavo-convex structure is formed, the first image data includes first unit image data of each first unit storage area, and the second image data includes Second unit image data of each second unit storage area is included, and in the data reading step, from each of the first unit image data and the second unit image data, each first unit storage area and each second unit image data are stored. Wherein based on the unit data pattern that is formed in the storage area reads each unit data, it may read the data on the basis of the each unit data.

  The image data acquisition step includes a first image data acquisition step of acquiring the first unit image data and a second image data acquisition step of acquiring the second unit image data, and the first image data In each of the acquisition step and the second image data acquisition step, the first unit image data and the second unit image data may be acquired from the first surface side of the data storage medium.

  The image data acquisition step includes a first image data acquisition step of acquiring the first unit image data and a second image data acquisition step of acquiring the second unit image data, and the first image data In the obtaining step, each first unit image data may be obtained from the first surface side of the data storage medium, and each second unit image data may be obtained in the second image data obtaining step.

  An image data acquisition order determination step for determining an acquisition order of each of the first unit image data and each of the second unit image data, wherein in the image data acquisition step, the acquisition determined by the image data acquisition order determination step The first unit image data and the second unit image data may be acquired based on the order.

  In the image data acquisition order determination step, the second unit including the second unit storage region facing the first unit storage region included in the first unit image data acquired by the first image data acquisition step The acquisition order may be determined so that image data is acquired by the second image data acquisition unit.

  ADVANTAGE OF THE INVENTION According to this invention, it is durable with respect to the change of a storage environment, and even after information is recorded and preserve | saved, the data storage medium which can produce the replica as a backup easily, its manufacturing method, data A storage medium, a data reading device, and a data reading method can be provided.

FIG. 1 is a perspective view showing a schematic configuration of a data storage medium according to an embodiment of the present invention. FIG. 2 is a plan view showing a schematic configuration of the first unit storage area according to the embodiment of the present invention. FIG. 3 is a plan view showing a schematic configuration of the second unit storage area according to the embodiment of the present invention. FIG. 4 is a plan view showing a first storage area in one embodiment of the present invention. FIG. 5 is a plan view showing a second storage area in one embodiment of the present invention. FIG. 6 is a partially enlarged cut end view of the data storage medium according to the embodiment of the present invention, and is a cut end view taken along the line II in FIG. 2 and FIG. 3. FIG. 7A is a plan view showing another aspect of the first storage area and the second storage area in one embodiment of the present invention, and FIG. 7B shows the first arrangement direction in the other aspect. It is an enlarged plan view showing a schematic configuration of an index pattern and a second arrangement direction index pattern. FIG. 8 is a plan view showing the arrangement direction of unit data patterns according to an embodiment of the present invention. FIG. 9 is a plan view schematically showing another aspect of the first unit storage area and the second unit storage area in one embodiment of the present invention. FIG. 10 is a plan view showing a pattern representing numbers of row numbers and column numbers of an address pattern in one embodiment of the present invention. FIG. 11 is a partial plan view showing an arrangement example of unit data patterns, arrangement direction indicator patterns, and address patterns in an embodiment of the present invention. FIG. 12 is a schematic diagram illustrating a process of generating drawing data according to an embodiment of the present invention. FIGS. 13A to 13F are process flow diagrams showing a method for manufacturing a data storage medium according to an embodiment of the present invention on a cut end surface. 14A to 14C are process flow diagrams showing a method for producing a replica of a data storage medium according to an embodiment of the present invention on a cut end surface. FIGS. 15A to 15C are process flow diagrams subsequent to FIG. 14 and showing a method for producing a replica of a data storage medium according to an embodiment of the present invention at a cut end surface. FIGS. 16A to 16H are process flow diagrams subsequent to FIG. 15 showing a method for producing a replica of a data storage medium according to an embodiment of the present invention at a cut end surface. FIG. 17 is a block diagram showing a schematic configuration of a data reading device according to an embodiment of the present invention. FIG. 18 is a schematic diagram showing a configuration of a data reading device according to an embodiment of the present invention. FIG. 19 is a flowchart showing each step of the data reading method according to the embodiment of the present invention. 20A to 20B are plan views showing other modes of the first boundary pattern and the second boundary pattern in one embodiment of the present invention. FIGS. 21A to 21D are plan views showing other aspects of the first array direction indicator pattern, the second array direction indicator pattern, the first boundary pattern, and the second boundary pattern in one embodiment of the present invention. is there. FIG. 22 is a process flow diagram showing a part of processes of another aspect of the method for producing a duplicate according to an embodiment of the present invention at a cut end surface.

Embodiments of the present invention will be described with reference to the drawings.
In the drawings attached to this specification, in order to facilitate understanding, the shape, scale, vertical / horizontal dimensional ratio, etc. of each part may be changed from the actual one or may be exaggerated. In the present specification and the like, a numerical range expressed using “to” means a range including each of the numerical values described before and after “to” as a lower limit value and an upper limit value. In this specification and the like, terms such as “film”, “sheet”, and “plate” are not distinguished from each other on the basis of the difference in names. For example, the “plate” is a concept including members that can be generally called “sheet” and “film”.

[Data storage medium]
FIG. 1 is a perspective view showing a schematic configuration of a data storage medium according to the present embodiment, FIG. 2 is a plan view showing a schematic configuration of a first unit storage area in the present embodiment, and FIG. FIG. 4 is a plan view showing a schematic configuration of a second unit storage area in the embodiment, FIG. 4 is a plan view showing a first storage area in the embodiment, and FIG. 5 shows a second storage area in the embodiment. FIG. 6 is a partially enlarged cut end view of the data storage medium according to the present embodiment, and is a cut end view taken along the line II in FIG. 2 and FIG. 3.

  The data storage medium 1 according to the present embodiment has a first surface 21 and a second surface 22 opposite to the first surface 21, and includes a base material 2 made of substantially rectangular quartz glass. In the substantially square-shaped first storage area SA1 defined on the first surface 21 of the base material 2, the content of the data (by the concavo-convex structure corresponding to each bit of the content of the stored data (bit string) ( A first data pattern expressing a bit sequence is formed. In the second storage area SA2 having a substantially rectangular shape defined on the second surface 22 of the substrate 2, the content of the data (by the concavo-convex structure corresponding to each bit of the content of the stored data (bit string) ( A second data pattern expressing a bit sequence is formed.

  In the first storage area SA1 and the second storage area SA2, a plurality of first unit storage areas UA1 and second unit storage areas UA2 are M rows × N columns (one of M and N is an integer of 2 or more). And the other is an integer greater than or equal to 1). As shown in FIGS. 4 and 5, in the present embodiment, the 24 first unit storage areas UA1 and the second unit storage areas UA2 are 4 rows (M = 4) × 6 columns (N = 6) matrix. An example of parallel arrangement will be described, but the present invention is not limited to this mode. In the example shown in FIGS. 4 and 5, the first unit storage area UA1 and the second unit storage area UA2 are rectangular. However, the present invention is not limited to such a mode. Also good.

  The first storage area SA1 includes a plurality of first unit storage areas UA1 and a saddle-shaped data non-storage area NA located between the adjacent first unit storage areas UA1. Each first unit storage area UA1 is an area where the unit data pattern 30 is formed, and the data non-storage area NA is formed by the first address pattern 40A, the first array direction indicator pattern 51, and the first boundary pattern BP1. It is an area that has been. Similarly, the second storage area SA2 includes a plurality of second unit storage areas UA2 and a saddle-shaped data non-storage area NA located between the adjacent second unit storage areas UA2. Each second unit storage area UA2 is an area where the unit data pattern 30 is formed, and the data non-storage area NA is formed by the second address pattern 40B, the second array direction indicator pattern 52, and the second boundary pattern BP2. It is an area that has been.

The sizes of the first unit storage area UA1 and the second unit storage area UA2 in the first storage area SA1 and the second storage area SA2 are the sizes of the imageable areas in the imaging units 111A and 111B (see FIGS. 17 and 18) described later. Size (size of an area that can be photographed at a magnification capable of recognizing the uneven structure (concave part 31 and convex part 32) of the unit data pattern 30 formed in the first unit storage area UA1 and the second unit storage area UA2) Can be appropriately set according to the above. The size of the data non-storage area NA is not particularly limited, and may be a size capable of forming the first array direction indicator pattern 51 and the second array direction indicator pattern 52. By reducing the size of the storage area NA as much as possible, the proportion of the unit storage area UA in the first storage area SA1 and the second storage area SA2 can be increased, and the data recording capacity can be increased. Can do. At this time, the width W _NA of the data non-storage area NA is set to an integral multiple of the interval between the concavo-convex structures (concave part 31 and convex part 32) of the unit data pattern 30 in the first unit storage area UA1 and the second unit storage area UA2. You may set so that it may be inconsistent. As a result, the data non-storage area NA can be easily grasped.

  The unit data pattern 30 formed in each of the first unit storage area UA1 and the second unit storage area UA2 is the content of unit data (unit bit string) obtained by dividing the data recorded and stored in the data storage medium 1 into a plurality of units. ) Representing a concave portion (hole) 31 and a convex portion (portion where no hole is formed) 32. In the present embodiment, the bit “1” in the unit bit string of the unit data is defined as the concave portion 31, and the bit “0” is defined as the convex portion 32. For example, in FIG. 2, unit data expressed by a unit bit string (unit bit matrix) “1010011101...” From the upper left to the right is recorded and stored in the first unit storage area UA1 of the data storage medium 1. ing. In FIG. 3, unit data expressed by a unit bit string (unit bit matrix) “1111101011...” From the upper left to the right is recorded and stored in the second unit storage area UA2 of the data storage medium 1. . The bit “1” in the unit bit string may be defined as the convex portion 32, and “0” may be defined as the concave portion 31.

  The concave portion 31 and the convex portion 32 as the unit data pattern 30 are formed in the first unit storage area UA1 and the second unit storage area UA2 so as to be arranged in a matrix, and the concave portion 31 and the convex portion 32 are formed. The matrix arrangement is an arrangement corresponding to a unit bit matrix obtained by converting a unit bit string of unit data into a matrix arrangement.

  The type of data recorded / stored in the data storage medium 1 is not particularly limited, and examples thereof include text data, image data such as moving images and still images, audio data, and the like.

  The first array direction indicator pattern 51 and the second array direction indicator pattern 52 are formed by unit data patterns 30 (concave portion 31 and convex portion 32) formed in each first unit storage area UA1 and each second unit storage area UA2. It is a pattern which shows the information regarding the arrangement direction of the unit bit string (unit bit matrix) expressed. In the present embodiment, the first array direction indicator pattern 51 and the second array direction indicator pattern 52 are provided corresponding to each first unit storage area UA1 and each second unit storage area UA2. Without being limited thereto, one first arrangement direction indicator pattern 51 may be provided in the first storage area SA1, and one second arrangement direction indicator pattern 52 may be provided in the second storage area SA2. 7 (A)). In this case, the first arrangement direction indicator pattern 51 and the second arrangement direction indicator pattern 52 may be configured as a plurality of concave portions arranged in parallel (see FIG. 7B).

  The first array direction indicator pattern 51 and the second array direction indicator pattern 52 relate to a matrix arrangement of unit data patterns 30 (unit bit strings of unit data) formed in the first unit storage area UA1 and the second unit storage area UA2. Information is shown. In the example shown in FIG. 8, the first array direction indicator pattern 51 (second array direction indicator pattern 52) is formed near the upper left corner of the rectangular first unit storage area UA1 (second unit storage area UA2). A mode in which the first array direction indicator pattern 51 (second array direction indicator pattern 52) is formed at this position is the normal position of the data storage medium 1. In the first unit storage area UA1 (second unit storage area UA2) located at the lower right of the first array direction indicator pattern 51 (second array direction indicator pattern 52) when viewed in the normal position state, the unit The data pattern 30 (concave portion 31 and convex portion 32) has a matrix arrangement corresponding to a unit bit string (unit bit matrix) (a matrix arrangement from the upper left to the lower right of the first unit storage area UA1 (second unit storage area UA2)). It can be understood that it is formed by. In FIG. 8, the unit data pattern 30 (concave part 31 and convex part 32) corresponding to each bit of the unit bit string of the unit data is arranged in a portion indicated by a solid line of the arrow along the arrow direction, and is indicated by a broken line. It is shown that it is not arranged in the represented part.

  The first array direction index pattern 51 and the second array direction index pattern 52 are unit bit strings (units) expressed by the unit data pattern 30 formed in each first unit storage area UA1 and each second unit storage area UA2. As long as it is formed at a position where the arrangement direction of the (bit matrix) can be specified, the present invention is not limited to the above embodiment.

  In the present embodiment, each of the first array direction indicator pattern 51 and the second array direction indicator pattern 52 has a shape (asymmetric shape) having no symmetry such as point symmetry, line symmetry, and rotational symmetry. In the illustrated example, a plurality of recesses are arranged in parallel to form an “F” shape as a whole (see FIGS. 2 and 3). Since the first array direction indicator pattern 51 and the second array direction indicator pattern 52 have such an asymmetric shape, the data storage medium 1 of the data reading device 100 (see FIGS. 17 and 18) will be described later. The positional relationship between the first storage area SA1 or the second storage area SA2 (first unit storage area UA1, second unit storage area UA2) with the imaging units 111A and 111B of the data reading device 100 when held in the holding unit It is possible to easily recognize whether or not it is a normal position.

  The overall size of the first array direction indicator pattern 51 and the second array direction indicator pattern 52 in the present embodiment is not particularly limited, but may be a size that can be visually recognized by the naked eye as a whole. Good. In addition, the shape and size of the concave portions constituting the first arrangement direction indicator pattern 51 and the second arrangement direction indicator pattern 52 are substantially the same as the shape and size of the concave-convex structure (concave portion 31) constituting the unit data pattern 30. It may be different or different. When the shape and size of the concavo-convex structure constituting the unit data pattern 30, the first array direction indicator pattern 51, and the second array direction indicator pattern 52 are substantially the same, the data storage medium 1 according to the present embodiment is replicated. When manufacturing an object (backup), pattern defects and the like are less likely to occur.

  As shown in FIG. 9, the first array direction indicator pattern 51 and the second array direction indicator pattern 52 may be formed in the first unit storage area UA1 and the second unit storage area UA2. When the first array direction index pattern 51 and the second array direction index pattern 52 having a size that can be visually recognized by the naked eye are formed in the data non-storage area NA, the data non-storage area NA also increases accordingly. Although the first address pattern 40A and the second address pattern 40B are also formed in the data non-storage area NA, when the first array direction index pattern 51 and the second array direction index pattern 52 are formed in the data non-storage area NA, In the data non-storage area NA, an area where a concavo-convex structure is not formed (an area that becomes a margin) tends to be large. In this case, if the first array direction indicator pattern 51 and the second array direction indicator pattern 52 are formed in the first unit storage area UA1 and the second unit storage area UA2, each first unit storage area UA1 and each second unit is stored. Although the recording capacity in the storage area UA2 is reduced, the size of the data non-storage area NA can be reduced, and as a result, the recording capacity in the data storage medium 1 can be increased.

  The first array direction index pattern 51 and the second array direction index pattern 52 indicate information related to the array direction of the unit data patterns 30 formed in each first unit storage area UA1 and each second unit storage area UA2. And the first unit storage area UA1 and the second unit storage area UA2 that are adjacent to each other via the data non-storage area NA in the row direction and the column direction. It may indicate a boundary with the storage area UA2, and can also be used as the first boundary pattern BP1 and the second boundary pattern BP2.

  In the present embodiment, the first address pattern 40A and the second address pattern 40B representing the position information of each first unit storage area UA1 and each second unit storage area UA2 in the first storage area SA1 and the second storage area SA2 are: The row number and the column number of the p-th row (p is an integer from 1 to M) and the q-th column (q is an integer from 1 to N) representing the parallel position of each unit storage area UA. A pattern imitating Braille representing the numbers (p, q) (see FIG. 10) is expressed by an uneven structure (concave portion 41 and convex portion 42). In FIG. 2 and FIG. 3, the first unit storage area UA1 and the second unit storage area UA2 are areas located at the 03th row and the 02nd column, and the first unit storage area UA1 and the second unit storage area UA2 below the first unit storage area UA1. Is an area located at the 04th row and the 02nd column, is expressed by the first address pattern 40A and the second address pattern 40B.

  Note that the first address pattern 40A and the second address pattern 40B in the present embodiment, like the unit data pattern 30, have a concavo-convex structure (a concave portion 41 and a convex portion 42) representing a bit string obtained by binarizing row number and column number. ).

  The first boundary pattern BP1 (second boundary pattern BP2) is adjacent to one first unit storage area UA1 (second unit storage area UA2) via the data non-storage area NA in the row direction and the column direction. Of the first unit storage area UA1 (second unit storage area UA2) and the two corners of each of the substantially square first unit storage areas UA1 (each second unit storage area UA2) ( In the example shown in FIGS. 2 and 3, the first unit storage area UA <b> 1 (the second unit storage area UA <b> 2) is formed outside the upper right corner and the lower right corner. Since the first boundary pattern BP1 (second boundary pattern BP2) is formed, the first unit storage area UA1 (each second unit) from the acquired image data in the imaging units 111A and 111B as described later. The storage area UA2) can be easily recognized, and the data recorded and stored as the plurality of unit data patterns 30 can be read accurately.

  In the present embodiment, the concave portions 31 constituting the unit data pattern 30 have a hole shape that is substantially rectangular in plan view. The dimension of the recess 31 may be a dimension that allows the recess 31 to be optically recognized by a general imaging device. However, in order to increase the data capacity that can be recorded and stored in the data storage medium 1, a unit data pattern The size of the 30 recesses 31 can be set to, for example, 400 nm or less, preferably about 100 to 250 nm.

In the present embodiment, the thickness T ₂ of the base material 2 is not particularly limited as long as the data storage medium 1 is hard to be damaged. In the present embodiment, the recess 31 formed in the first unit storage area UA1 of the first storage area SA1 and the recess 31 formed in the second unit storage area UA of the second storage area SA face each other. In this case, the distance T _31-31 (the distance in the thickness direction of the base material 2) between the bottom surfaces of the opposing recesses 31 exceeds the depth of focus in the imaging units 111A and 111B (see FIGS. 17 and 18) described later. It is preferable that the distance is. As will be described later, when data is read from the data storage medium 1 according to the present embodiment, the uneven structure (unit data pattern 30) formed in the first storage area SA1 and the second storage area SA2 are formed. The concavo-convex structure (unit data pattern 30) may be imaged simultaneously. In this case, when the distance T _31-31 between the bottom surfaces of the opposing recesses 31 is equal to or less than the depth of focus in the imaging units 111A and 111B, image data obtained by imaging the concavo-convex structure (unit data pattern 30) of the first storage area SA1. Therefore, the uneven structure (unit data pattern 30) of the second storage area SA2 is recognized, or the reverse phenomenon (from the image data obtained by imaging the uneven structure (unit data pattern 30) of the second storage area SA2) There is a possibility that the uneven structure (unit data pattern 30) of the one storage area SA1 may be recognized and erroneous data may be read out. However, since the distance T _31-31 between the bottom surfaces of the opposing concave portions 31 is a distance that exceeds the depth of focus in the imaging units 111A and 111B, the above-described erroneous recognition can be made difficult to occur, and the data It can be read accurately.

  As shown in FIG. 11, in the first storage area SA1, the unit data pattern 30, the first array direction indicator pattern 51, and the first address pattern 40A are all virtual grids set in the first storage area SA1. It is formed so as to overlap the intersection point PI of Gr. More specifically, the unit data pattern 30 so that the reference points Cp of the unit data pattern 30 (concave portion 31), the first array direction indicator pattern 51, and the first address pattern 40A overlap the intersection PI of the virtual grid Gr. The first array direction indicator pattern 51 and the first address pattern 40A are formed. Here, the reference point Cp of the unit data pattern 30, the first array direction indicator pattern 51, and the first address pattern 40A is a concavo-convex structure constituting the unit data pattern 30, the first array direction indicator pattern 51, and the first address pattern 40A. Is the center point in plan view. Note that it is sufficient that at least the reference point Cp of the unit data pattern 30 overlaps the intersection point PI of the virtual grid Gr, and the reference points Cp of the first array direction indicator pattern 51 and the first address pattern 40A are virtual. It may overlap with the intersection point PI of the grid Gr, may overlap the grid line of the virtual grid Gr, but may not overlap the intersection point PI, and does not overlap either the intersection point PI or the grid line of the virtual grid Gr May be.

  Similarly, in the second storage area SA2, the unit data pattern 30, the second array direction indicator pattern 52, and the second address pattern 40B are all of the virtual grid Gr set in the second storage area SA2. It is formed so as to overlap the intersection point PI. More specifically, the unit data pattern 30 so that the reference points Cp of the unit data pattern 30 (concave portion 31), the second array direction indicator pattern 52, and the second address pattern 40B overlap the intersection PI of the virtual grid Gr. The second array direction indicator pattern 52 and the second address pattern 40B are formed. Here, the reference point Cp of the unit data pattern 30, the second array direction indicator pattern 52, and the second address pattern 40B is an uneven structure that forms the unit data pattern 30, the second array direction indicator pattern 52, and the second address pattern 40B. Is the center point in plan view. It is sufficient that at least the reference point Cp of the unit data pattern 30 overlaps the intersection point PI of the virtual grid Gr, and the reference points Cp of the second array direction indicator pattern 52 and the second address pattern 40B are virtual. It may overlap with the intersection point PI of the grid Gr, may overlap the grid line of the virtual grid Gr, but may not overlap the intersection point PI, and does not overlap either the intersection point PI or the grid line of the virtual grid Gr May be.

  In the data storage medium 1 according to the present embodiment having the above-described configuration, the content (bit string) of data recorded / stored is the first unit storage area UA1 of the first storage area SA1 and the second storage area SA2. And the unit data pattern 30 (recessed portion 31 and raised portion 32 as a concavo-convex structure arranged in a matrix) formed in each second unit storage area UA2. Then, the first array direction index pattern 51 and the second array direction index pattern 52 which are indexes of the arrangement order of the concavo-convex structure (the concave portion 31 and the convex portion 32) in the unit data pattern 30 include the first unit storage area UA1 and each It is formed corresponding to the second unit storage area UA2. Further, both the first arrangement direction indicator pattern 51 and the second arrangement direction indicator pattern 52 have an asymmetric shape. Therefore, by recognizing the first array direction indicator pattern 51 and the second array direction indicator pattern 52, the order in which the data is read can be accurately recognized, and the data can be accurately restored.

  The data storage medium 1 according to the present embodiment can be produced by processing a base material made of quartz, and has extremely excellent heat resistance and water resistance. Therefore, even if the storage environment changes, the recorded / stored data (unit data pattern 30), the first array direction index pattern 51, and the second array direction index pattern 52 are not lost, and the data is stored for a very long time. Data storage medium by recognizing the first array direction index pattern 51 and the second array direction index pattern 52 even after an extremely long span. It is possible to accurately recognize the order in which data stored in 1 is read and to restore the data accurately.

  Furthermore, the data storage medium 1 according to the present embodiment records and stores data by the data pattern (the concave portion 31 and the convex portion 32 as the concave-convex structure) formed on the first surface 21 and the second surface 22 of the substrate 2. Therefore, as will be described later, by performing imprint lithography using the data storage medium 1, a copy (backup) of the data storage medium 1 on which the data is recorded / stored is transferred to the data ( For example, it can be easily created even if digital data or the like does not exist.

  Furthermore, since the data recorded / stored in the data storage medium 1 according to the present embodiment is expressed by a concavo-convex structure that can be optically recognized using a general imaging device, the future is very long-term. However, data can be easily restored simply by imaging the concavo-convex structure (the concave portion 31 and the convex portion 32) using the imaging element existing at that time and converting it into a bit string.

  Note that, in the data storage medium 1 according to the present embodiment, a part of the concavo-convex structure (concave portion 31) formed in the first unit storage area UA1 and the second unit storage area UA2 is damaged. Since the first unit storage area UA1 and the second unit storage area UA2 in which a part of the concavo-convex structure is damaged can be specified by the first address pattern 40A and the second address pattern 40B, the data storage medium 1 If a duplicate (backup) of the file is created in advance, the data recorded and saved in the first unit storage area UA1 and the second unit storage area UA2 can be easily read from the duplicate, and the data is saved. By combining with the data read from the other first unit storage area UA1 and second unit storage area UA2 of the medium 1, recording / storage in the data storage medium 1 is performed. It is possible to restore data being.

[Method of manufacturing data storage medium]
The data storage medium 1 having the above-described configuration can be manufactured as follows. FIG. 12 is a flowchart schematically showing a process of designing drawing data as a pre-stage for producing the data storage medium 1 according to the present embodiment. FIG. 13 shows the production of the data storage medium 1 according to the present embodiment. It is a flowchart which shows the process to perform with a cutting | disconnection end elevation.

[Drawing data design process]
First, based on the data D recorded / stored in the data storage medium 1, the first storage area SA1 and the second storage area SA2 of the data storage medium 1 have unit data patterns 30, first address patterns 40A, and The drawing data for forming the 2-address pattern 40B is designed.

Specifically, first, all the bit strings of the data D are divided into X unit bit strings (X is an integer of 2 or more) from the head in a predetermined bit length unit, and unit data including the unit bit string is included. UD _{1 to} UD _X are generated. The bit length of the unit bit string of each unit data UD can be set to be the same as the bit length that can be recorded and stored in the first unit storage area UA1 and the second unit storage area UA2. When data can be stored in each of the first unit storage area UA1 and the second unit storage area UA2 in the present embodiment in a bit matrix of 8 rows × 16 columns, all bit strings of data D to be recorded / stored are recorded from the head. The data is divided into unit data UD of 128-bit unit bit string.

Next, the unit bit string of each unit data UD is converted into a unit bit matrix UM of 8 rows × 16 columns, and unit pattern data D ₃₀ is generated based on the unit bit matrix UM. In this embodiment, at this time, the unit bit matrix is defined so that the virtual grid Gr is defined in the area corresponding to the first unit storage area UA1 and the second unit storage area UA2 and overlaps the intersection point PI of the virtual grid Gr. A bit figure (square figure) corresponding to the recess 31 is arranged only at a position corresponding to the bit “1” in the UM, and a bit figure is not arranged at a position corresponding to the bit “0” (see FIG. 8). ). The unit pattern data D _30, depending on the presence or absence of a bit graphic at each position constituting a matrix of 8 rows × 16 columns, expresses the 128-bit information constituting the unit bit matrix UM. The unit pattern data D ₃₀ is used as the drawing data for forming the unit data pattern 30 (the recess 31 and the protrusion 32) in a first unit storage region UA1 and the second unit storage region UA2.

Subsequently, the unit pattern data D _30, adds the address pattern data D ₄₀ to the data non-conserved region NA. The address pattern data D ₄₀ is added along the arrangement order of the unit data UD in the data D recorded and stored in the data storage medium 1. The address pattern data D ₄₀ is used as the drawing data for forming the first address pattern 40A and the second address pattern 40B (recess 41 and the protrusion 42) in the data non-conserved region NA.

In this way, the unit pattern data D ₃₀ which is the drawing data of the unit data pattern 30 formed in each first unit storage area UA1 and each second unit storage area UA2 and the first pattern formed in the data non-storage area NA. after generating the address pattern data D ₄₀ is a drawing data of the address pattern 40A and the second address pattern 40B, by arranging them in a matrix, it is possible to generate the drawing data.

[Data storage medium production process]
Subsequently, the first surface 11 and the second surface 12 opposite to the first surface 11, and the data storage made of quartz in which the first hard mask layer HM1 made of chromium oxide or the like is formed on the first surface 11. A medium base material 10 is prepared, and a unit data pattern 30 and a first address pattern are formed in areas corresponding to the first unit storage area UA1 and the data non-storage area NA on the first surface 11 of the base material 10, respectively. Resist patterns R ₃₀ and R ₄₀ corresponding to 40A are formed (see FIG. 13A). In the present embodiment, the data storage medium substrate 10 in which the first array direction indicator pattern 51 and the second array direction indicator pattern 52 are formed on the first surface 11 and the second surface 12, respectively. The method for producing the data storage medium 1 will be described as an example, but the present invention is not limited to this mode. For example, even if the data storage medium 1 is manufactured by forming the first array direction index pattern 51 and the second array direction index pattern 52 together with the unit data pattern 30, the first address pattern 40A, and the second address pattern 40B. Alternatively, the data storage medium 1 may be formed using a data storage medium substrate on which the first address pattern 40A and the second address pattern 40B, and the first array direction indicator pattern 51 and the second array direction indicator pattern 52 are formed in advance. May be produced.

The resist patterns R ₃₀ and R ₄₀ can be formed using a conventionally known exposure apparatus (electron beam drawing apparatus, laser drawing apparatus, etc.) used in a semiconductor manufacturing process or the like. Using this exposure apparatus, based on the drawing data generated as described above, a pattern latent image is formed on the resist layer formed on the first surface 11 side of the substrate 10 for data storage medium, and developed. By performing the treatment, resist patterns R ₃₀ and R ₄₀ can be formed.

The material constituting the resist layer is not particularly limited, and a conventionally known energy beam sensitive resist material (for example, electron beam sensitive resist material) can be used. In the example shown in FIG. 13A, since a positive type energy ray-sensitive resist material is used, the resist layer R having a pattern latent image is subjected to development processing, whereby a concave resist pattern R is formed. ₃₀ and R ₄₀ are formed.

After the resist patterns R ₃₀ and R ₄₀ are formed in this way, the first hard mask layer HM1 is etched by a dry etching method or the like using the resist patterns R ₃₀ and R ₄₀ as a mask, and the remaining resist pattern R ₃₀ , R ₄₀ are removed (see FIG. 13B). In this way, the first hard mask pattern HP1 is formed on the first surface 11 of the data storage medium substrate 10. If it is difficult to affect the etching of the first surface 11 of the data storage medium substrate 10 in the subsequent process, the remaining resist patterns R ₃₀ and R ₄₀ are removed after etching the first hard mask layer HM1. You don't have to.

  Subsequently, using the first hard mask pattern HP1 as a mask, the first surface 11 of the data storage medium substrate 10 is etched by a dry etching method to remove the remaining first hard mask pattern HP1 (FIG. 13C )reference). Accordingly, the unit data pattern 30 and the first address pattern 40A can be formed on the first surface 11 of the data storage medium substrate 10.

Next, the second hard mask layer HM2 is formed on the second surface 12 of the substrate 10, and regions corresponding to the second unit storage area UA2 and the data non-storage area NA on the second hard mask layer HM2. Then, resist patterns R ₃₀ and R ₄₀ corresponding to the unit data pattern 30 and the second address pattern 40B are formed (see FIG. 13D). The method of forming a resist pattern R _30, R ₄₀ is the same as the method of forming a resist pattern R _30, R ₄₀ on the first surface 11. Then, using the resist patterns R ₃₀ and R ₄₀ as a mask, the second hard mask layer HM2 is etched by a dry etching method or the like, and the remaining resist patterns R ₃₀ and R ₄₀ are removed (see FIG. 13E). . In this way, the second hard mask pattern HP2 is formed on the second surface 12 of the data storage medium substrate 10. If it is difficult to affect the etching of the second surface 12 of the data storage medium substrate 10 in the subsequent process, the remaining resist patterns R ₃₀ and R ₄₀ are removed after etching the second hard mask layer HM2. You don't have to.

Subsequently, using the second hard mask pattern HP2 as a mask, the second surface 12 of the data storage medium substrate 10 is etched by a dry etching method to remove the remaining second hard mask pattern HP2 (FIG. 13F). )reference). As a result, the unit data pattern 30 and the second address pattern 40B can be formed on the second surface 12 of the data storage medium substrate 10. In this way, the data storage medium 1 according to this embodiment can be manufactured. Note that the first hard mask layer HM1 and the second hard mask layer HM2 do not have to be formed on the first surface 11 side surface and the second surface 12 side surface of the data storage medium substrate 10. In this case, data storage is performed by etching the first surface 11 and the second surface 12 of the data storage medium substrate 10 using the resist patterns R ₃₀ and R ₄₀ as masks, and removing the resist patterns R ₃₀ and R _40. The medium 1 can be produced.

In the data storage medium 1, the resist patterns R ₃₀ and R ₄₀ (see FIG. 13A) are formed on the first surface 11 of the data storage medium substrate 10, and then the first surface 11 is not etched. Resist patterns R ₃₀ and R ₄₀ (see FIG. 13C) are also formed on the second surface 12, and then the data storage medium substrate 10 is subjected to an etching process to form the first surface 11 and the second surface. It may be produced by etching 12 at the same time. As the etching process for the data storage medium substrate 10, for example, a wet etching process or the like can be employed.

  A method for producing a copy of the data storage medium 1 thus produced will be described. 14 to 16 are process flow diagrams showing a process of producing a replica of the data storage medium 1 according to the present embodiment on a cut end face.

  First, the unit data pattern 30, the first array direction indicator pattern 51, the second array direction indicator pattern 52, the first address pattern 40A, and the second address pattern are respectively formed on the first surface 21 and the second surface 22 of the substrate 2. A data storage medium 1 formed with 40B and a substrate 5 having a first surface 5a and a second surface 5b opposite to the first surface 5a and having a resin layer 61 provided on the first surface 5a are prepared (FIG. 14 (A)).

  The material constituting the substrate 5 is not particularly limited, and examples thereof include a quartz glass substrate, a soda glass substrate, a fluorite substrate, a calcium fluoride substrate, a magnesium fluoride substrate, an acrylic glass substrate, and a borosilicate glass substrate. A glass substrate; a single-layer substrate composed of a polycarbonate substrate, a polypropylene substrate, a polyethylene substrate, other resin substrates such as a polyolefin substrate, or a laminated substrate obtained by laminating two or more arbitrarily selected from the above substrates. It is done.

  The resin layer 61 is formed by the unit data pattern 30, the first array direction indicator pattern 51, and the first address formed in the first storage area SA of the data storage medium 1 in a process described later (see FIG. 14B). This is a layer in which an inverted pattern of the pattern 40A is formed. As the resin material constituting the resin layer 61, a resin material such as a thermoplastic resin, a thermosetting resin, or an ultraviolet curable resin can be used, and more specifically, an acrylic resin, a styrene resin, an olefin resin, or the like. Resins, polycarbonate resins, polyester resins, epoxy resins, silicone resins, and the like can be used.

  Next, the first surface 21 of the data storage medium 1 is pressed against the resin layer 61 on the first surface 5a of the substrate 5, and the resin layer 61 is formed in the first storage area SA1 of the data storage medium 1. The unit data pattern 30, the first array direction indicator pattern 51, and the first address pattern 40A are transferred to form an inverted pattern thereof (see FIG. 14B). After the resin layer 61 is cured, the first resin mold 71 is manufactured by peeling the data storage medium 1 and the substrate 5 from the resin layer 61 (see FIG. 14C).

  Similarly, on the resin layer 61 ′ on the first surface 5a of the substrate 5, the unit data pattern 30, the second array direction indicator pattern 52, and the second array data formed in the second storage area SA2 of the data storage medium 1 are formed. The address pattern 40B is transferred to form an inverted pattern thereof. After the resin layer 61 ′ is cured, the second resin mold 72 is manufactured by peeling the data storage medium 1 and the substrate 5 from the resin layer 61 ′ (see FIGS. 15A to 15C). . The substrate 5 used for producing the second resin mold 72 may be the same substrate as the substrate 5 used for producing the first resin mold 72 or may be a separate substrate. May be.

  Subsequently, for a replica made of quartz, which has a first surface 11 ′ and a second surface 12 ′ opposite thereto, and a first hard mask layer HM1 ′ made of chromium oxide or the like is formed on the first surface 11 ′. A base material 10 ′ is prepared, a resist layer 81 is formed on the first hard mask layer HM 1 ′ on the first surface 11 ′ of the replica base material 10 ′, and a first resin mold 71 is formed on the resist layer 81. The surface on which the reverse pattern is formed is pressed and the resist layer 81 is cured in that state (see FIG. 16A).

  After the resist layer 81 is cured, the first resin mold 71 is peeled from the resist layer 81 to form a resist pattern 91 to which the reverse pattern of the first resin mold 71 is transferred (FIG. 16B). reference). Using the resist pattern 91 as a mask, the first hard mask layer HM1 'on the first surface 11' of the replica base material 10 'is etched. Thereby, the first hard mask pattern HP1 'can be formed on the first surface 11' of the replica substrate 10 '(see FIG. 16C).

  Then, the first surface 11 ′ of the duplicate base material 10 ′ is etched using the first hard mask pattern HP <b> 1 ′ as a mask. Thereby, a duplicate pattern of the unit data pattern 30, the first arrangement direction indicator pattern 51, and the first address pattern 40A formed on the first surface 21 of the data storage medium 1 can be formed (FIG. 16D). reference).

  Next, a second hard mask layer HM2 ′ made of chromium oxide or the like is formed on the second surface 12 ′ of the replica base material 10 ′, and a resist layer 82 is formed on the second hard mask layer HM2 ′. . Then, the surface of the second resin mold 72 on which the reverse pattern is formed is pressed against the resist layer 82, and the resist layer 82 is cured in that state (see FIG. 16E).

  After the resist layer 82 is cured, the second resin mold 72 is peeled from the resist layer 82 to form a resist pattern 92 to which the reverse pattern of the second resin mold 72 is transferred (FIG. 16E). reference). Using the resist pattern 92 as a mask, the second hard mask layer HM2 'on the second surface 12' of the replica base material 10 'is etched. Accordingly, the second hard mask pattern HP2 'can be formed on the second surface 12' of the replica base material 10 '(see FIG. 16F).

  Then, the second surface 12 'of the replica base material 10' is etched using the second hard mask pattern HP2 'as a mask. As a result, the unit data pattern 30, the second arrangement direction indicator pattern 52, and the second address pattern 40B formed on the second surface 22 of the data storage medium 1 are formed on the second surface 12 ′ of the duplicate substrate 10 ′. Can be formed (see FIG. 16G). In this way, a replica 1 ′ of the data storage medium 1 can be produced (see FIG. 16H). In addition, if it is hard to produce a problem in terms of etching selectivity with respect to the replica base material 10 ′, the first surface 11 ′ side surface and the second surface 12 ′ side surface of the replica base material 10 ′ The first hard mask layer HM1 ′ and the second hard mask layer HM2 ′ may not be formed. In this case, resist patterns 91 and 92 are formed on the first surface 11 ′ and the second surface 12 ′ of the replica substrate 10 ′, and the replica substrate 10 ′ is formed using the resist patterns 91 and 92 as a mask. After the first surface 11 ′ and the second surface 11 ′ are etched, the resist patterns 91 and 92 are removed, whereby a replica 1 ′ of the data storage medium 1 can be produced.

  As described above, according to the present embodiment, the data storage medium 1 can be easily manufactured by using a conventionally known lithography technique used in a semiconductor manufacturing process or the like. In addition, a copy as a backup of data recorded / stored in the case where the data storage medium 1 is damaged can be easily made by using a conventionally known imprint technique.

[Data reading device / data reading method]
A data reading apparatus for reading data recorded and stored in the data storage medium 1 having the above-described configuration and a data reading method using the data reading apparatus will be described. FIG. 17 is a block diagram illustrating a schematic configuration of the data reading device according to the present embodiment. FIG. 18 is a schematic diagram illustrating a configuration of the data reading device according to the present embodiment.

  The data reading apparatus 100 according to the present embodiment includes a holding unit (not shown) that holds the data storage medium 1, and image data (first image data) of the first storage area SA1 and the second storage area SA2 of the data storage medium 1. And the second image data), the image data acquisition unit 110 that performs data processing based on the image data, the operation control of the image data acquisition unit 110, and the image data acquisition unit 110. And a control device 120 having a storage unit 122 for storing data, various data generated by the control unit 121, various programs, and the like. The holding unit can hold the data storage medium 1 at a normal position with respect to the image data acquisition unit 110, but is rotated 90 ° to the left and rotated 90 ° to the right with respect to the image data acquisition unit 110. The data storage medium 1 can also be held in the rotated state and rotated by 180 °.

  The image data acquisition unit 110 includes a first image data acquisition unit 110A that acquires first image data including each first unit image data of each first unit storage area UA1 of the first storage area SA1 of the data storage medium 1. A second image data acquisition unit 110B that acquires second image data including each second unit image data of each second unit storage area UA2 of the second storage area SA2 of the data storage medium 1;

  The first image data acquisition unit 110A and the second image data acquisition unit 110B respectively include imaging units 111A and 111B that can capture an image in a predetermined shooting target area such as a CCD camera as image data, and a shooting target area. Is configured to sequentially move the first unit storage area UA1 and the second unit storage area UA2 of the first storage area SA and the second storage area SA of the data storage medium 1 relative to the imaging units 111A and 111B. It includes scanning units 112A and 112B that perform scanning processing. As the image data acquisition unit 110 (first image data acquisition unit 110A, second image data acquisition unit 110B), a general-purpose optical microscope or the like can be used. In the present embodiment, the first image data acquisition unit 110A (the imaging unit 111A and the scanning unit 112A) and the second image data acquisition unit 110B (the imaging unit 111B and the scanning unit 112B) are configured by separate devices, respectively. It is not limited to this aspect. For example, the first image data acquisition unit 110A and the second image data acquisition unit 110B physically have two functions (each first unit storage area UA1 of each first storage area SA1 in one device). There are two functions: a function for acquiring first image data including one unit image data, and a function for acquiring second image data including each second unit image data in each second unit storage area UA2 in the second storage area SA2. The function may be conceptualized.

In the present embodiment, the first image data acquisition unit 110A (particularly the imaging unit 111A) and the second image data acquisition unit 110B (particularly the imaging unit 111B) face each other with the data storage medium 1 held in the holding unit interposed therebetween. (See FIG. 18). However, the data reading device 100 is not limited to such a mode. For example, the first image data acquisition unit 110A and the second image data acquisition unit 110B are both located on one side of the data storage medium 1 held in the holding unit (for example, above the data storage medium 1). Also good. The focal depths of the imaging units 111 </ _b> A and 111 </ _{b> B are} less than the distance T _31-31 between the opposing concave portions 31 of the data storage medium 1. Accordingly, the uneven structure formed in the second storage area SA2 cannot be recognized from the first image data (first unit image data) acquired by the imaging unit 111A, and is acquired by the imaging unit 111B. Therefore, the uneven structure formed in the first storage area SA1 cannot be recognized from the second image data (second unit image data), and the data can be accurately restored.

  In addition, the data reading apparatus 100 includes one image data acquisition unit 110. The image data acquisition unit 110 acquires image data on one side (for example, the first side 21) of the data storage medium 1, and then The data storage medium 1 may be turned over and held by the holding unit, and image data on the other side (for example, the second side 22) may be acquired.

  The control unit 121 performs arithmetic processing according to instructions of various programs. Specifically, the control unit 121 acquires the first unit image data in each first unit storage area UA1 and the second unit image data in each second unit storage area UA2 by the imaging units 111A and 111B ( Acquisition order), processing for reading unit data (unit bit string) based on image data of unit data pattern 30 formed in each first unit storage area UA1 and each second unit storage area UA2, Unit data (unit) corresponding to the unit data pattern 30 based on the processing for generating the data (join order data) relating to the join order of the unit data (unit bit string), the first array direction indicator pattern 51 and the second array direction indicator pattern 52 Processing for determining the extraction direction of the bit sequence), the image data acquisition unit 110 (the first image data acquisition unit 110A and the second image data acquisition unit). Processing for storing the image data (first image data and second image data) acquired by the unit 110B) and various generated data in the storage unit 122, and combining the read unit data (unit bit string) Then, processing for restoring data recorded and stored in the data storage medium 1 is performed.

  The control unit 121 performs arithmetic processing according to instructions of various programs. Specifically, the control unit 121 performs processing for causing the scanning units 112A and 112B to scan the imaging units 111A and 111B based on the determined acquisition order, and the unit data pattern 30 formed in each unit storage area UA. Processing for reading out unit data (unit bit string) from image data, processing for generating data (combination order data) relating to the combination order of the unit data (unit bit string), first array direction indicator pattern 51 and second array direction indicator pattern 52, the process of determining the extraction direction of the unit data (unit bit string) corresponding to the unit data pattern 30, acquired by the image data acquisition unit 110 (the first image data acquisition unit 110A and the second image data acquisition unit 110B). Image data (first image data and second image data), various generated data, etc. Process of storing the 憶部 122 combines the unit data read out (unit bit string), performs processing for restoring data that has been recorded and stored in the data storage medium 1.

  The storage unit 122 stores the first image data (each first unit image data) and the second storage area SA2 (each first unit image data) of the first storage area SA1 (each first unit storage area UA1) acquired by the image data acquisition unit 110. 2 unit storage area UA2) second image data (each second unit is image data), image data based on unit data pattern 30 formed in first unit storage area UA1 and second unit storage area UA2 (each The unit order data (unit bit string) read out from the first unit image data and each second unit image data) is stored. The storage unit 122 also stores unit data (unit bit string) and a first address pattern read based on the image data of the unit data pattern 30 formed in the first unit storage area UA1 and the second unit storage area UA2. The positional information of the first unit storage area UA1 and the second unit storage area UA2 read based on the image data of 40A and the second address pattern 40B is stored in association with each other. A general-purpose computer or the like can be used as the control device 120 including the control unit 121 and the storage unit 122.

  A method of reading data recorded / stored in the data storage medium 1 using the data reading device 100 having such a configuration will be described. FIG. 19 is a flowchart showing each step of the data reading method in this embodiment.

  First, when the data storage medium 1 is stored in the storage unit in the image data acquisition unit 110, the control unit 121 causes the first unit image data and the second storage region in each first unit storage area UA1 in the first storage area SA1. The order (acquisition order) for acquiring the second unit image data of each second unit storage area UA2 of SA2 is determined (S1).

  The method for determining the acquisition order is not particularly limited. For example, the image data of the first surface 21 and / or the second surface 22 of the data storage medium 1 is acquired by the imaging units 111A and 111B. It may be determined based on the first array direction indicator pattern 51 and / or the second array direction indicator pattern 52 recognized from the image data.

  More specifically, since the first array direction indicator pattern 51 and the second array direction indicator pattern 52 have asymmetric shapes, the first array is obtained before acquisition of image data (first image data and second image data). The controller 121 recognizes the shape of the direction indicator pattern 51 and / or the second array direction indicator pattern 52, and the control unit 121 performs data based on the shape of the first array direction indicator pattern 51 and / or the second array direction indicator pattern 52. It is determined whether the storage medium 1 is held at the normal position, is held 90 ° rotated right or left from the normal position, or is held 180 ° rotated.

  If it is determined that the position is held at the normal position or 180 degrees rotated from the normal position, it corresponds to the first unit storage area UA1 and the second unit storage area UA2 arranged in M rows × N columns. Then, the image capturing units 111A and 111B may be scanned in the row direction to acquire M × N image data. On the other hand, when it is determined that the image is held 90 ° rotated from the normal position to the right or left, the imaging units 111A and 111B are scanned in the row direction corresponding to N rows × M columns, and M × N image data may be acquired.

  The overall shape of the first unit storage area UA1 and the second unit storage area UA2 is square, and the first storage area SA1 and the second storage area SA2 have a matrix arrangement of M rows × N columns (M = N). In the case where the first unit storage area UA1 and the second unit storage area UA2 are arranged, the data storage medium 1 is held in the normal position or in a state rotated by 180 °, or is moved 90 ° to the right or left from the normal position. ° There is no need to determine if the product is held rotated. In this case, the acquisition order may not be determined based on the direction in which the data storage medium 1 is held.

  Further, in the data reading device 100 having the configuration shown in FIG. 18, the imaging unit 111A of the first image data acquisition unit 110 and the imaging unit 111B of the second image data acquisition unit 110 sandwich the data storage medium 1. The acquisition order may be determined so as to always move facing each other. Since the imaging units 111A and 111B are opposed to each other, the first image data (first unit image data) and the second image data (first unit image data) acquired by the first image data acquisition unit 110A and the second image data acquisition unit 110B. The contrast of (2 unit image data) can be improved.

  The scanning units 112A and 112B of the image data acquisition unit 110 (the first image data acquisition unit 110A and the second image data acquisition unit 110B) transfer the data storage medium 1 to the imaging units 111A and 111B based on the acquisition order. The first storage area SA1 and the second storage area SA2 of the first storage area SA1 and the second storage area SA2 of the data storage medium 1 are imaged by the imaging units 111A and 111B. First unit image data including one unit storage area UA1, first array direction indicator pattern 51, and first address pattern 40A, and second unit storage area UA2, second array direction indicator pattern 52, and second address pattern 40B The second unit image data including is acquired (S2).

  Next, the control unit 121 determines whether the data storage medium 1 is held at the normal position, is held 90 ° rotated right or left from the normal position, or is held 180 ° rotated. Based on the determination, the direction (extraction direction) in which the concave portions 31 and the convex portions 32 of the unit data pattern 30 formed in the first unit storage area UA1 and the second unit storage area UA2 are extracted is determined, and each image data is used. Join order data indicating the join order of unit data (unit bit string) that can be read is generated (S3).

  Subsequently, the control unit 121 extracts the concave portion 31 and the convex portion 32 of the unit data pattern 30 from each image data stored in the storage unit 122 according to the extraction direction determined as described above, and the concave portion Unit data (unit bit string) is read based on 31 and the convex part 32, and the unit data (unit bit string) is stored in the storage unit 122 (S4).

  When the concave portion 31 and the convex portion 32 of the unit data pattern 30 are extracted and the unit data (unit bit string) is read based on the concave portion 31 and the convex portion 32, the control unit 121 includes the first unit storage area UA1 and the first array. The first unit image data including the direction indicator pattern 51 and the first address pattern 40A, and the virtual grid on the second unit image data including the second unit storage area UA2, the second array direction indicator pattern 52, and the second address pattern 40B. Define Gr. The virtual grid Gr is defined so as to pass through the reference point Cp of the first arrangement direction indicator pattern 51 or the second arrangement direction indicator pattern 52 located at the upper left. And the control part 121 determines whether the recessed part 31 exists on each intersection PI of the virtual grid Gr in each 1st unit storage area UA1 and 2nd unit storage area UA2. The determination of whether or not the recess 31 is present can be made based on, for example, the light / dark distribution in the image data.

  The control unit 121 associates the bit “1” with the intersection point PI determined to have the recess 31, and associates the bit “0” with the intersection point PI determined to have no recess 31, thereby generating unit data (unit bit string). Is read out.

  The control unit 121 stores the unit data (unit bit string) for all the first unit image data and the second unit image data in the storage unit 122 (S4), and then combines the unit data (unit bit string) according to the combination order data. Then, data (bit string) is generated (S5). In this way, data stored in the data storage medium 1 can be restored.

  As described above, according to the data reading apparatus and the data reading method using the same in the present embodiment, the first array direction indicator pattern 51 and the second array direction indicator pattern 52 are provided on the data storage medium 1. Thus, the data stored in the data storage medium 1 can be accurately restored regardless of the direction in which the data storage medium 1 is held in the holding unit of the data reading device.

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the above embodiment, the data storage medium 1 includes a plurality of first unit storage areas in the first storage area SA1 and the second storage area SA2 defined on the first surface 21 and the second surface 22 of the base material 2, respectively. Although the UA1 and the second unit storage area UA2 are arranged in a matrix, the present invention is not limited to such a mode. For example, the first unit storage area UA1 and the second unit storage area UA2 are not provided, and a data pattern representing a bit string of data is formed in the first storage area SA1 and the second storage area SA2. May be.

  In the above embodiment, the number of the first unit storage areas UA1 in which the unit data patterns 30 (recesses 31 and protrusions 32) in the first storage area SA1 of the data storage medium 1 are formed, and the second storage area SA2 The number of second unit storage areas UA2 in which unit data patterns 30 (concave portions 31 and convex portions 32) are formed may be different. For example, in the first storage area SA1, unit data patterns 30 are formed in all the first unit storage areas UA1, but in the second storage area SA2, unit data is stored in some second unit storage areas UA2. A pattern 30 may be formed. In both the first storage area SA1 and the second storage area SA2, unit data patterns 30 are formed in some of the first unit storage areas UA1 and second unit storage areas UA2, and the unit data pattern 30 is formed. The number of the first unit storage areas UA1 and the number of the second unit storage areas UA2 may be different.

  In the above-described embodiment, the first address pattern 40A and the second address pattern 40B each have a concavo-convex structure (concave portion 41 and convex portion 42) having a pattern (see FIG. 10) simulating braille representing numbers of row numbers and column numbers. However, the present invention is not limited to this embodiment. The first address pattern 40A and the second address pattern 40B are, for example, the coordinates (X, Y) and serial numbers of the first unit storage area UA1 and the second unit storage area UA2 in the first storage area SA1 and the second storage area SA2. (For example, a pattern imitating Braille representing those numbers).

  In the above embodiment, the first boundary pattern BP1 and the second boundary pattern BP2 have a plurality of concave portions arranged in parallel and have a substantially L shape as a whole (see FIGS. 2 and 3), but are limited to such an aspect. It is not a thing. For example, a shape in which a plurality of concave portions are arranged in a substantially cross shape may be used, or a shape in which a plurality of concave portions are arranged in a substantially T shape may be used (see FIGS. 20A and 20B).

  In the above embodiment, the first array direction indicator pattern 51, the second array direction indicator pattern 52, the first boundary pattern BP1, and the second boundary pattern BP2 are formed by arranging a plurality of recesses in parallel. It is not limited. For example, as shown in FIGS. 21A to 21D, the first array direction indicator pattern 51, the second array direction indicator pattern 52, the first boundary pattern BP1, and the second boundary pattern BP2 are substantially F-shaped, You may be comprised by one recessed part of substantially L shape, a substantially cross shape, and a substantially T shape. In this case, the width of the concave portion in the short direction may be substantially the same as the size of the concave portion 31 constituting the unit data pattern 30.

  In the above embodiment, the unit data pattern 30, the first array direction indicator pattern 51, the second array direction indicator pattern 52, the first address pattern 40A, and the second address pattern are included in the first storage area SA1 and the second storage area SA2. A dummy pattern unrelated to 40B may be formed. This dummy pattern is formed so that the pattern density of the first surface 21 and the second surface 22 is uniform in the data non-storage area NA and blank areas in the first unit storage area UA1 and the second unit storage area UA2. It only has to be formed. By forming such a dummy pattern, it is possible to make it difficult to cause a pattern defect in an imprint process when a replica of the data storage medium 1 is produced.

  In the above embodiment, a pattern capable of recognizing the first surface 21 and the second surface 22 of the data storage medium 1 may be formed. This pattern may be formed on either the first surface 21 or the second surface 22, and a pattern capable of recognizing the first surface 21 is formed on the first surface 21. A pattern capable of recognizing the second surface 22 may be formed on the surface 22.

In the above embodiment, the resist patterns R ₃₀ and R ₄₀ having openings at portions corresponding to the unit data pattern 30, the first address pattern 40A, and the second address pattern 40B using a positive energy beam sensitive resist material. The data storage medium 1 having the unit data pattern 30, the first address pattern 40A, and the second address pattern 40B as a portion having no recess and no recess has been described as an example. However, the present invention is not limited to such an embodiment. For example, using a positive or negative energy beam sensitive resist material, a resist pattern is formed by leaving the resist in portions corresponding to the unit data pattern 30, the first address pattern 40A, and the second address pattern 40B. May be. As a result, the data storage medium 1 having the unit data pattern 30, the first address pattern 40A, and the second address pattern 40B as protrusions (pillars) and portions having no protrusions can be manufactured.

  In the above embodiment, the first resin mold 71 and the second resin mold 72 used for producing the replica 1 ′ of the data storage medium 1 are produced in separate steps. It is not limited to. For example, as shown in FIG. 22, a substrate 5 having a resin layer 61 formed on the first surface 5a and a substrate 5 'having a resin layer 61' formed on the first surface 5a 'are prepared, and a data storage medium is prepared. The resin layer 61 of the substrate 5 is pressed against the first surface 21 of the first base material 2, and simultaneously, the resin layer 61 ′ of the substrate 5 ′ is pressed against the second surface 22 to simultaneously cure the resin layers 61, 61 ′. You may do it. Thereby, the 1st resin mold 71 and the 2nd resin mold 72 can be produced in the same process.

  In the above embodiment, the first surface 21 and the second surface 22 of the base material 2 of the data storage medium 1 are pressed against the resin layers 61 and 61 ′ formed on the first surface 5 a of the substrate 5, respectively. Although the resin mold 71 and the second resin mold 72 are produced (see FIGS. 14 and 15), the present invention is not limited to this mode. For example, resin layers 61 and 61 ′ are formed on a film base material or a flexible glass substrate placed on the first surface 5a of the substrate 5, and the data storage medium 1 is formed on the resin layers 61 and 61 ′. By pressing each of the first surface 21 and the second surface 22 of the base material 2, the resin layers 61 and 61 ′ to which the concavo-convex structure of the data storage medium 1 is transferred, a film base material, a flexible glass substrate, A first resin mold 71 and a second resin mold 72 may be manufactured. Further, the substrate is formed on the resin layers 61 and 61 ′ interposed between the film base material or the flexible glass substrate and the data storage medium 1 (the first surface 21 or the second surface 22) by a so-called roll imprint process. The first resin mold 71 and the second resin mold 72 may be manufactured by transferring the concavo-convex structure of the data storage medium 1 without using 5. Further, the flexible glass substrate is etched using the resin layers 61 and 61 ′ to which the concave / convex structure of the data storage medium 1 is transferred as a mask, and the concave / convex structure of the data storage medium 1 is transferred to the flexible glass substrate. May be used in place of the first resin mold 71 and the second resin mold 72 to produce a replica 1 ′ of the data storage medium 1.

  In the above embodiment, the first resin mold 71 and the second resin mold 72 and the resist patterns 91 and 92 formed in the manufacturing process of the replica 1 ′ of the data storage medium 1 are, for example, the substrate 5 and the replica. A resin material (resist material) is applied onto the base material 10 ′ for ink jet by an inkjet method, and the first surface 21 or the second surface 22 of the base material 2 of the data storage medium 1 is brought into contact with the resin material (resist material). It may be produced by developing a resin material (resist material) between the substrate 5 or the replica base material 10 'and the data storage medium 1.

  In the above embodiment, from the image data (first image data and second image data) acquired by the image data acquisition unit 110 (first image data acquisition unit 110A and second image data acquisition unit 110B) of the data reading device 100. The extraction direction of the concavo-convex structure of the unit data pattern 30 is determined, and the concavo-convex structure is extracted in accordance with the extraction direction to read unit data (unit bit string). However, the present invention is not limited to such a mode. For example, from the image data (first image data and second image data) acquired by the image data acquisition unit 110 (first image data acquisition unit 110A and second image data acquisition unit 110B), image data (first image data) And the second unit storage area UA2 are determined relative to the primary position of the first unit storage area UA1 and the second unit storage area UA2, and the first unit storage area UA1 and the second unit storage area UA2 are image data (first image). If the original position of the data and the second image data does not match, the image data (first image data and second image data) is rotated back to the normal position, and the matrix arrangement is from the upper left to the lower right. Unit data (unit bit string) may be read by extracting the concavo-convex structure.

  In the data reading device 100 according to the above embodiment, when the imaging units 111A and 111B capture an image, one first unit image data or second unit including one first unit storage area UA1 or second unit storage area UA2. Whether image data is acquired and the data storage medium 1 is held in the correct position based on the first array direction index pattern 51 or the second array direction index pattern 52 from the first unit image data or the second unit image data If it is determined whether or not it is held at the normal position, it may have an alert function that informs the operator that it is held at the normal position.

  In the data reading device 100 according to the above embodiment, the image data of each of the first storage area SA1 and the second storage area SA2 or each of the first storage area SA1 and the second storage area SA2 is obtained by the imaging units 111A and 111B. You may acquire each image data of the area | region divided | segmented into 2 or more, without considering the arrangement | sequence etc. of 1 unit storage area UA1 and 2nd unit storage area UA2. In this case, when the image data (each image data of an area obtained by dividing the first storage area SA1 and the second storage area SA2 into two or more is acquired, the image data or the image data is synthesized. , The image data including each of the first storage area SA1 and the second storage area SA2), and the concave portion 31 and the convex portion of the unit data pattern 30 formed in the first unit storage area UA1 and the second unit storage area UA2. The direction in which the unit 32 is extracted may be determined, and combining order data indicating the combining order of unit data that can be read from the image data may be generated. Then, the concave portion 31 and the convex portion 32 of the unit data pattern 30 are extracted according to the extraction direction, the unit data is read, and the unit data is combined according to the combination order data to generate data.

DESCRIPTION OF SYMBOLS 1 ... Data storage medium 2 ... Base material 21 ... 1st surface 22 ... 2nd surface 30 ... Unit data pattern 31 ... Concave part 32 ... Convex part 40A ... 1st address pattern 40B ... 2nd address pattern 51 ... 1st arrangement direction parameter | index Pattern 52 ... second array direction index pattern SA1 ... first storage area SA2 ... second storage area UA1 ... first unit storage area UA2 ... second unit storage area NA ... data non-storage area Gr ... virtual grid PI ... intersection

Claims (47)

A data storage medium in which data is stored,
A base material made of quartz, having a first surface and a second surface facing the first surface;
A first data pattern formed in a first storage area having a rectangular shape defined on the first surface of the substrate, and expressing the content of the data by a concavo-convex structure;
A data storage medium comprising: a second data pattern formed in a rectangular second storage region defined on the second surface of the base material and expressing the data content by a concavo-convex structure. The uneven structure of each of the first data pattern and the second data pattern includes a concave portion and a convex portion corresponding to each bit of the data bit string of the data,
On the first surface of the base material, the data represented by the uneven structure of the first data pattern formed in the first storage area so as to correspond to the first storage area A first arrangement direction indicator pattern indicating information on the arrangement direction of the bit string is formed,
The data represented by the concavo-convex structure of the second data pattern formed in the second storage area so as to correspond to the second storage area on the second surface of the base material A second arrangement direction indicator pattern indicating information on the arrangement direction of the bit string is formed;
The first array direction indicator pattern and the second array direction indicator pattern are positions that can specify the array direction of the data bit string expressed by the concave-convex structure of the first data pattern and the second data pattern, respectively. The data storage medium according to claim 1, wherein the data storage medium is formed.   The data storage medium according to claim 2, wherein each of the first array direction indicator pattern and the second array direction indicator pattern has an asymmetric shape.   4. The data storage medium according to claim 2, wherein each of the first array direction indicator pattern and the second array direction indicator pattern is configured by a concavo-convex structure. The concavo-convex structure constituting the first data pattern and the concavo-convex structure constituting the first arrangement direction indicator pattern have substantially the same dimensions.
The data storage medium according to claim 4, wherein the concavo-convex structure constituting the second data pattern and the concavo-convex structure constituting the second arrangement direction indicator pattern have substantially the same dimensions. A first data non-storage area outside the first storage area is defined on the first surface of the base material, and a second data outside the second storage area is defined on the second surface of the base material. Data non-storage area is defined,
Each of the first array direction indicator pattern and the second array direction indicator pattern is formed in each of the first data non-storage region and the second data non-storage region. The data storage medium described. A plurality of first unit storage areas arranged in a matrix are provided in the first storage area,
A plurality of second unit storage areas arranged in a matrix are provided in the second storage area,
In each of the plurality of first unit storage areas and the second unit storage area, a data bit string of a plurality of unit data obtained by dividing the data into a plurality of units is a unit corresponding to each bit of the data bit string. The unit data pattern expressed by the concavo-convex structure is formed,
The first array direction indicator pattern and the second array direction indicator pattern correspond to each of the plurality of first unit storage regions and second unit storage regions, and the plurality of first unit storage regions and the second unit storage regions and the second unit storage regions. 7. The device according to claim 2, wherein the unit data pattern is provided at a position where the arrangement direction of the data bit string of the unit data represented by the unit concavo-convex structure of the unit data pattern formed in each of the two unit storage areas can be specified. A data storage medium according to any one of the above.   On the first surface of the base material, corresponding to each of the plurality of first unit storage areas, a first address pattern indicating position information of each first unit storage area is formed, and The second address pattern indicating the position information of each of the second unit storage areas is formed on the second surface of the base material corresponding to each of the plurality of second unit storage areas. The data storage medium described in 1. The plurality of first unit storage areas and the plurality of second unit storage areas are respectively M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more) )) In a matrix arrangement,
Each of the first address pattern and the second address pattern is a p-th row (p is an integer from 1 to M), which is a parallel position of each of the first unit storage areas and each of the second unit storage areas. ) And the q-th column (q is an integer of 1 or more and N or less), and the data storage medium according to claim 8. The concavo-convex structure constituting the first data pattern and the concavo-convex structure constituting the first address pattern have substantially the same dimensions.
The data storage medium according to claim 9, wherein the concavo-convex structure constituting the second data pattern and the concavo-convex structure constituting the second address pattern have substantially the same dimensions. The first arrangement direction indicator pattern has a function of indicating a boundary between the adjacent first unit storage areas,
The data storage medium according to claim 7, wherein the second arrangement direction index pattern has a function of indicating a boundary between the adjacent second unit storage areas.   The first data pattern and the second data pattern are positioned so as to overlap with an intersection of the virtual grids when virtual grids are set in the first storage area and the second storage area, respectively. The data storage medium according to any one of claims 1 to 11.   The base material has a thickness of the concavo-convex structure of the second data pattern in the second storage region so as to face a concave portion of the concavo-convex structure of the first data pattern formed in the first storage region. In the case where the concave portion is formed, the distance in the thickness direction of the base material between the bottom surfaces of the concave portions can read the first data pattern from the first surface side of the base material. The data storage medium according to any one of claims 1 to 12, wherein the thickness is such that the two data patterns cannot be read.   Between the concave bottom surface of the concave / convex structure of the first data pattern formed in the first storage region and the concave bottom surface of the concave / convex structure of the second data pattern formed in the second storage region. The data storage medium according to claim 13, wherein a distance in the thickness direction of the base material is 350 μm or more. A data storage medium for data storage,
A base material made of quartz, having a first surface and a second surface facing the first surface;
A first data pattern that is defined on the first surface of the substrate and that expresses the content of the data by a concavo-convex structure including a concave portion and a convex portion corresponding to each bit of the data bit string of the data may be formed. A first storage area;
A second data pattern that is defined on the second surface of the substrate and that expresses the content of the data by a concavo-convex structure including a concave portion and a convex portion corresponding to each bit of the data bit string of the data may be formed. A second storage area,
An array of the data bit strings represented by the concavo-convex structure of the first data pattern that can be formed in the first storage area on the first surface of the base material so as to correspond to the first storage area A first array direction indicator pattern indicating information about the direction is formed,
Arrangement of the data bit string represented by the concavo-convex structure of the second data pattern that can be formed in the second storage area on the second surface of the base material so as to correspond to the second storage area A data storage medium on which a second array direction indicator pattern indicating information on a direction is formed.   16. The data storage medium according to claim 15, wherein each of the first arrangement direction indicator pattern and the second arrangement direction indicator pattern has an asymmetric shape.   17. The data storage medium according to claim 15, wherein each of the first arrangement direction indicator pattern and the second arrangement direction indicator pattern is configured by a concavo-convex structure. The first arrangement direction indicator pattern is formed in a first data non-storage area outside the first storage area on the first surface of the base material,
The data storage according to any one of claims 15 to 17, wherein the second array direction index pattern is formed with a second data non-storage area outside the second storage area on the second surface of the base material. Media. Each of the plurality of first storage regions and the plurality of second storage regions arranged in a matrix is defined on each of the first surface and the second surface of the base material,
On the first surface of the base material, a first address pattern indicating position information of each first storage region is formed corresponding to each of the plurality of first storage regions, and the base material The second address pattern indicating position information of each of the second storage areas is formed on the second surface of each of the second storage areas in correspondence with each of the plurality of second storage areas. A data storage medium according to any one of the above. Each of the plurality of first storage areas and the plurality of second storage areas has M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more). In parallel with the matrix arrangement of
The first address pattern and the second address pattern are respectively the p-th row (p is an integer of 1 or more and M or less) that is a parallel position of each of the first storage regions and each of the second storage regions. The data storage medium according to claim 19, comprising a concavo-convex structure representing a q-th column (q is an integer of 1 to N). The first arrangement direction indicator pattern has a function of indicating a boundary between the adjacent first storage regions,
21. The data storage medium according to claim 19, wherein the second arrangement direction indicator pattern has a function of indicating a boundary between the adjacent second storage areas. A method for producing the data storage medium according to claim 1,
A step of setting a first virtual grid in the first storage area defined on the first surface of the data storage medium according to any one of claims 15 to 21;
The first resist pattern corresponding to the first data pattern indicating the content of the data is positioned at the intersection of the first virtual grid in the first storage area with the concave and convex portions of the first resist pattern. And forming the process,
Setting a second virtual grid in the second storage area defined on the second surface;
A second resist pattern corresponding to the second data pattern indicating the content of the data is arranged such that a concave portion and a convex portion of the second resist pattern are positioned on the intersection of the second virtual grid in the second storage region. And forming the process,
Etching the first surface of the data storage medium using the first resist pattern as a mask;
And a step of etching the second surface of the data storage medium using the second resist pattern as a mask.   23. The method of manufacturing a data storage medium according to claim 22, wherein the first surface and the second surface of the data storage medium are etched simultaneously.   Etching the first surface of the data storage medium using the first resist pattern as a mask, forming the second resist pattern on the second surface of the data storage medium, and masking the second resist pattern 23. The method of manufacturing a data storage medium according to claim 22, wherein the second surface of the data storage medium is etched. Each of the first hard mask layer and the second hard mask layer is formed on each of the first surface and the second surface of the data storage medium,
Etching the first hard mask layer using the first resist pattern as a mask to form a first hard mask pattern; and etching the second hard mask layer using the second resist pattern as a mask to form a second hard mask. Further forming a mask pattern,
In the step of etching the first surface of the data storage medium, using the first hard mask pattern as a mask instead of the first resist pattern or together with the first resist pattern,
The step of etching the second surface of the data storage medium uses the second hard mask pattern as a mask instead of the second resist pattern or together with the second resist pattern. A manufacturing method of the data storage medium described. A base material made of quartz having a first surface and a second surface facing the first surface, and a first storage region having a rectangular shape defined on the first surface of the base material. The first data pattern that expresses the content of the data by a concavo-convex structure and the second storage area of the rectangular shape defined on the second surface of the base material, An apparatus for reading out the data from a data storage medium in which the data is stored, the second data pattern expressed by a structure;
A medium holding unit capable of holding the data storage medium;
An image data acquisition unit for acquiring first image data of a region including the first storage region and second image data of a region including the second storage region of the data storage medium held in the medium holding unit;
A data reading apparatus comprising: a data reading unit that extracts the concavo-convex structure from each of the first image data and the second image data acquired by the image data acquisition unit and reads the data from the concavo-convex structure. On each of the first surface and the second surface of the base material, a first array direction indicator pattern indicating information on an array direction of the data bit string represented by the uneven structure of the first data pattern Each of the second arrangement direction indicator patterns indicating information on the arrangement direction of the data bit string represented by the concavo-convex structure of the second data pattern is formed,
The data reading device determines an extraction direction for extracting the concavo-convex structure of each of the first data pattern and the second data pattern formed in each of the first storage region and the second storage region. A decision unit;
The extraction direction determination unit recognizes each of the first arrangement direction indicator pattern and the second arrangement direction indicator pattern from each of the first image data and the second image data acquired by the image data acquisition unit. Determining the extraction direction of the concavo-convex structure based on the positional relationship of the first array direction indicator pattern and the second array direction indicator pattern with respect to each of the first storage region and the second storage region,
The data reading unit extracts the concavo-convex structure from each of the first image data and the second image data according to the extraction direction of the concavo-convex structure determined by the extraction direction determination unit, and extracts the data from the concavo-convex structure. 27. A data reading device according to claim 26 for reading.   28. The data reading device according to claim 26, wherein the image data acquisition unit acquires one of the first image data and the second image data, and then acquires the other.   28. The data reading device according to claim 26, wherein the image data acquisition unit acquires the first image data and the second image data simultaneously. The image data acquisition unit includes a first image data acquisition unit that acquires the first image data, and a second image data acquisition unit that acquires the second image data,
The first image data acquisition unit and the second image data acquisition unit respectively acquire the first image data and the second image data from the first surface side of the data storage medium. The data reading device according to any one of the above. The image data acquisition unit includes a first image data acquisition unit that acquires the first image data, and a second image data acquisition unit that acquires the second image data,
The first image data acquisition unit acquires the first image data from the first surface side of the data storage medium,
30. The data reading device according to claim 26, wherein the second image data acquisition unit acquires the second image data from the second surface side of the data storage medium. A plurality of first unit storage areas arranged in a matrix are provided in the first storage area, and a plurality of second unit storage areas arranged in a matrix are provided in the second storage area. In each of the plurality of first unit storage areas and the second unit storage area, each data bit string of the plurality of unit data obtained by dividing the data into a plurality of bits corresponds to each bit of the data bit string. A unit data pattern expressed by the unit concavo-convex structure is formed,
The first image data includes first unit image data of each first unit storage area,
The second image data includes second unit image data of each second unit storage area,
The data reading unit is configured to determine the first unit image data and the second unit image data based on the unit data patterns formed in the first unit storage areas and the second unit storage areas. 30. The data reading device according to claim 26, wherein unit data is read and the data is read based on each unit data. The image data acquisition unit includes a first image data acquisition unit that acquires the first unit image data, and a second image data acquisition unit that acquires the second unit image data.
The first image data acquisition unit and the second image data acquisition unit acquire the first unit image data and the second unit image data from the first surface side of the data storage medium. The data reading device described. The image data acquisition unit includes a first image data acquisition unit that acquires the first unit image data, and a second image data acquisition unit that acquires the second unit image data.
The first image data acquisition unit acquires the first unit image data from the first surface side of the data storage medium,
The data reading device according to claim 32, wherein the second image data acquisition unit acquires the second unit image data from the second surface side of the data storage medium. The data reading device further includes an image data acquisition order determination unit that determines an acquisition order of the first unit image data and the second unit image data.
The said image data acquisition part acquires each said 1st unit image data and each said 2nd unit image data based on the acquisition order determined by the said image data acquisition order determination part. The data reading device described in 1.   The image data acquisition order determination unit is configured to acquire the first unit image data at the same time that the first image data acquisition unit acquires the first unit image data, and to face the first unit storage area included in the first unit image data. 36. The data reading apparatus according to claim 35, wherein the acquisition order is determined so that the second image data acquisition unit acquires the second unit image data including a two-unit storage area. A base material made of quartz having a first surface and a second surface facing the first surface, and a first storage region having a rectangular shape defined on the first surface of the base material. The first data pattern that expresses the content of the data by a concavo-convex structure and the second storage area of the rectangular shape defined on the second surface of the base material, A method of reading the data from a data storage medium in which the data is stored, comprising a second data pattern expressed by a structure,
An image data acquisition step of acquiring first image data of an area including the first storage area of the data storage medium and second image data of an area including the second storage area;
A data reading method comprising: a data reading step of extracting the concavo-convex structure from each of the first image data and the second image data acquired in the image data acquisition step and reading the data from the concavo-convex structure. On each of the first surface and the second surface of the base material, a first array direction indicator pattern indicating information on an array direction of the data bit string represented by the uneven structure of the first data pattern Each of the second arrangement direction indicator patterns indicating information on the arrangement direction of the data bit string represented by the concavo-convex structure of the second data pattern is formed,
In the data reading method, an extraction direction for determining a direction in which the concavo-convex structure of each of the first data pattern and the second data pattern formed in each of the first storage area and the second storage area is extracted. Further comprising a decision step,
In the extraction direction determining step, the first arrangement direction indicator pattern is recognized from the first image data and the second image data, respectively, and the first arrangement direction indicator pattern is recognized. And determining the extraction direction of the concavo-convex structure based on the positional relationship with respect to each of the first storage area and the second storage area of each of the second array direction index pattern,
In the data reading step, the concavo-convex structure is extracted from each of the first image data and the second image data according to the extraction direction of the concavo-convex structure determined in the extraction direction determination step, and the data is extracted from the concavo-convex structure. The data reading method according to claim 37, wherein the data is read.   The data reading method according to claim 37 or 38, wherein, in the image data acquisition step, after acquiring one of the first image data and the second image data, the other is acquired.   40. The data reading method according to claim 37, wherein in the image data acquisition step, the first image data and the second image data are acquired simultaneously. The image data acquisition step includes a first image data acquisition step of acquiring the first image data, and a second image data acquisition step of acquiring the second image data,
41. The first image data and the second image data are acquired from the first surface side of the data storage medium in the first image data acquisition step and the second image data acquisition step, respectively. The data reading method according to any one of the above. The image data acquisition step includes a first image data acquisition step of acquiring the first image data, and a second image data acquisition step of acquiring the second image data,
In the first image data acquisition step, the first image data is acquired from the first surface side of the data storage medium,
41. The data reading method according to claim 38, wherein the second image data is acquired from the second surface side of the data storage medium in the second image data acquisition step. A plurality of first unit storage areas arranged in a matrix are provided in the first storage area, and a plurality of second unit storage areas arranged in a matrix are provided in the second storage area. In each of the plurality of first unit storage areas and the second unit storage area, each data bit string of the plurality of unit data obtained by dividing the data into a plurality of bits corresponds to each bit of the data bit string. A unit data pattern expressed by the unit concavo-convex structure is formed,
The first image data includes first unit image data of each first unit storage area,
The second image data includes second unit image data of each second unit storage area,
In the data reading step, each of the first unit image data and the second unit image data is determined based on the unit data pattern formed in each of the first unit storage areas and each of the second unit storage areas. 41. The data reading method according to claim 38, wherein unit data is read and the data is read based on each unit data. The image data acquisition step includes a first image data acquisition step for acquiring each first unit image data, and a second image data acquisition step for acquiring each second unit image data,
In each of the first image data acquisition step and the second image data acquisition step, the first unit image data and the second unit image data are acquired from the first surface side of the data storage medium. 45. A data reading method according to claim 43. The image data acquisition step includes a first image data acquisition step for acquiring each first unit image data, and a second image data acquisition step for acquiring each second unit image data,
In the first image data acquisition step, the first unit image data is acquired from the first surface side of the data storage medium,
44. The data reading method according to claim 43, wherein each of the second unit image data is acquired in the second image data acquisition step. An image data acquisition order determination step for determining an acquisition order of the first unit image data and the second unit image data;
The said image data acquisition process WHEREIN: Based on the acquisition order determined by the said image data acquisition order determination process, each said 1st unit image data and each said 2nd unit image data are acquired. The data reading method described in 1.   In the image data acquisition order determination step, the second unit including the second unit storage region facing the first unit storage region included in the first unit image data acquired by the first image data acquisition step 47. The data reading method according to claim 46, wherein the acquisition order is determined so that image data is acquired by the second image data acquisition unit.

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