JP2018174011A - Data storage medium and manufacturing method thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a data storage medium and a manufacturing method thereof capable of having durability against changes in a storage environment, making it hard to break, and producing a copy as a backup even after information is recorded and stored.SOLUTION: A data storage medium in which data is stored includes: a base material having a three-dimensional shape including a curved surface at least in a part thereof; and a data pattern, which is formed in a storage area defined at least on the curved surface and expresses contents of data by an uneven structure, in which the uneven structure of the data pattern includes a concave portion and a convex portion corresponding to each bit of the data bit sequence of the data.SELECTED DRAWING: Figure 1

Description

  The present disclosure relates to a data storage medium and a manufacturing method thereof.

  Paper as a medium for recording various information has been used for a long time, and even now, a lot of information is recorded on paper. On the other hand, with the development of industry, film (microfilm, etc.) for recording image information such as moving images and still images, and a record board for recording sound information have been used. In recent years, magnetic media have been used as media for recording digital data. Recording media, optical recording media, semiconductor recording media, and the like are used.

  Some of the information recorded on the medium as described above is required to be stored for an extremely long time exceeding 100 years. Each of the above media has a durability that does not hinder use depending on the application. For example, media such as paper, film, and record board are sufficiently durable on a time scale of several years. It can be said that it is a medium having a property. However, on time scales exceeding 100 years, aging degradation cannot be avoided, stored information may be lost, and water or heat may cause damage. For example, if microfilm is made from cellulose acetate, the degradation will occur due to the temperature and humidity of the storage environment, and acetic acid is generated on the surface, causing vinegar syndrome that makes it impossible to read data. Is said to be less than 30 years. Although it is said that the lifespan of polyester is about 500 years, it cannot be achieved unless it is stored in an environment defined by standards such as ISO and JIS, and the storage environment is a risk of information loss. It will remain one of the factors.

  In addition, although magnetic recording media, optical recording media, semiconductor recording media, etc. have durability that does not hinder the use of general electronic equipment, they are considered to be durable on a time scale such as several decades. Since it has not been designed, it is not suitable for storing information permanently or semi-permanently. For example, in an EEPROM typified by a flash memory as a semiconductor recording medium, data is recorded and stored by holding charges in the floating gate, but the holding time of the charges in the floating gate depends on the storage environment. In addition, the repeated writing of data may damage the insulating layer and prevent the charge from being retained. A ROM is known as a long-lived semiconductor recording medium. However, it is very expensive to produce a ROM (replica) as a backup from a ROM in which information is recorded and stored.

  Further, the above medium has a problem that it lacks fire resistance and heat resistance. For example, if a fire occurs at the storage location of the above-mentioned medium where information is recorded and stored, the data will be lost due to the heat, so storing information permanently or semi-permanently on existing media, Practically impossible.

  On the other hand, as a method capable of permanently and semi-permanently storing information, a method of recording and storing information on a durable medium such as quartz glass has been proposed (see Patent Documents 1 and 2). Specifically, a method of recording data three-dimensionally as a difference in light transmittance in a minute cell in a cylindrical medium, and reading out information using computer tomography technology while rotating the medium (Refer to Patent Document 1), a method of measuring the difference in transmittance by irradiating electromagnetic waves to a cylindrical medium while changing the irradiation angle, and reading out information using a computer tomography technique (Patent Document) 2) has been proposed.

Japanese Patent No. 4991487 Japanese Patent No. 5286246

  As disclosed in the above Patent Documents 1 and 2, if a method of recording and storing information three-dimensionally in a cylindrical quartz glass is used as a medium, information can be stored permanently or semi-permanently. Can be recorded and saved. When information recorded and stored in this way is read out, it is necessary to extract information from cells that are three-dimensionally distributed in the medium. Therefore, Fourier transform processing is performed using computer tomography technology. There is a need. However, after a very long time scale of several hundred years, if the same computer tomography technology as when recording and storing the information does not exist, the recorded and stored information cannot be read out. There's a problem.

  In addition, if the medium on which information is recorded and stored is damaged, the information is lost. Therefore, it is required that the medium itself is not easily damaged. Furthermore, in order to reduce the risk of information being lost due to damage to the medium, it may be possible to make a replica as a backup of the medium. It is necessary to prepare a glass and adopt a new method for recording and storing information. However, if there is no information to be recorded and stored (for example, digital information), it is not possible to make a copy, and even if there is information to be recorded and stored, a copy is made. There is a problem that the work to be performed is complicated and a great deal of cost is required.

  In view of such problems, the present invention is durable against changes in storage environment, is not easily damaged, and easily makes a copy as a backup even after information is recorded and stored. An object is to provide a possible data storage medium and a manufacturing method thereof.

  In order to solve the above-described problem, as an embodiment of the present invention, a data storage medium in which data is stored, a base material configured by a three-dimensional shape including at least a curved surface, and at least the curve Formed in a storage area defined on the surface, and the data pattern expressing the content of the data by a concavo-convex structure, the concavo-convex structure of the data pattern corresponds to each bit of the data bit string of the data A data storage medium including a concave portion and a convex portion is provided.

  On the curved surface, a reading direction index indicating information related to the reading direction of the data bit string expressed by the concavo-convex structure of the data pattern formed in the storage area so as to correspond to the storage area A pattern is formed, and the reading direction indicator pattern can be formed at a position where the reading direction of the data bit string expressed by the concave-convex structure of the data pattern can be specified.

  The base material has a substantially cylindrical shape having the curved surface as a side surface, and the reading direction indicator pattern may have a shape indicating one direction along a circumferential direction of the curved surface, and has a concavo-convex structure. It may be configured. The concavo-convex structure constituting the data pattern and the concavo-convex structure constituting the reading direction indicator pattern may have substantially the same dimensions. A data non-storage area located outside the storage area is defined on the curved surface, and the reading direction indicator pattern may be formed in the data non-storage area.

  The storage area includes a plurality of unit storage areas, and the data pattern includes a unit concavo-convex corresponding to each bit of a plurality of unit data obtained by dividing the data into a plurality of unit data. A plurality of unit data patterns expressed by a structure are included, and each unit data pattern may be formed in each unit storage area.

  The curved surface may have a radius of curvature that allows at least one unit storage region to be imaged, and the radius of curvature may be about 12.5 mm or more.

  On the curved surface, an address pattern indicating position information of each unit storage area may be formed corresponding to each of the plurality of unit storage areas, and the plurality of unit storage areas may have M rows. × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more) are arranged in parallel, and the address pattern is parallel to the unit storage areas. It may be constituted by a concavo-convex structure representing a p-th row (p is an integer of 1 or more and M or less) and a q-th column (q is an integer of 1 or more and N or less).

  The concavo-convex structure constituting the data pattern and the concavo-convex structure constituting the address pattern may have substantially the same dimensions, and the adjacent unit storage area is formed on the curved surface. A boundary pattern indicating the boundary may be formed.

  As one embodiment of the present invention, it is a data storage medium in which data is stored, and is formed in a storage area defined on each surface of a base material constituted by a polyhedron, A data pattern that expresses the content of the data by a concavo-convex structure, and in the polyhedron, an angle located inside the polyhedron formed by two adjacent surfaces sharing one side is 90 ° or more. A data storage medium is provided in which at least one of the angles is greater than 90 °.

  The angle that is greater than 90 ° may be greater than 90 ° and less than or equal to 270 °, and each surface constituting the polyhedron can be continuous so that it can be drawn with a single stroke in a developed view of the polyhedron, The polyhedron may be a regular dodecahedron or a regular icosahedron, an anti-regular polyhedron, a convex polyhedron or a concave polyhedron.

  On each surface constituting the polyhedron, a reading order index pattern indicating information on the reading order of each surface may be formed, and the reading order index pattern may be configured by a concavo-convex structure, The concavo-convex structure constituting the data pattern and the concavo-convex structure constituting the reading order index pattern may have substantially the same dimensions, and each surface constituting the polyhedron has An address pattern indicating position information of the storage area defined on each surface may be formed.

  As one embodiment of the present invention, a method for manufacturing a data storage medium, the step of preparing a data storage medium having a base material configured by a three-dimensional shape including at least a curved surface, and the data storage Defining a storage area on the curved surface of the storage medium, setting a virtual grid in the storage area, and registering a resist pattern corresponding to the data pattern indicating the content of the data in the virtual area in the storage area A data storage medium comprising: a step of forming a concave portion and a convex portion of the resist pattern on an intersection of a grid; and a step of etching the curved surface of the data storage medium using the resist pattern as a mask. A manufacturing method is provided.

  The resist pattern may be formed by an imprint process using a flexible resin mold having a concavo-convex pattern corresponding to the resist pattern, or having a concavo-convex pattern corresponding to the resist pattern, and having rigidity The resist pattern may be formed on the curved surface by rolling the base material on the mold.

  A hard mask layer is formed on the curved surface of the data storage medium, and further includes a step of forming the hard mask pattern by etching the hard mask layer using the resist pattern as a mask, the data storage medium In the step of etching the curved surface, the hard mask pattern may be used as a mask instead of the resist pattern or together with the resist pattern.

  As one embodiment of the present invention, a method for manufacturing a data storage medium in which data is stored, which is formed by a polyhedron and formed by two adjacent surfaces sharing one side of the polyhedron. A step of preparing a data storage medium having a base material in which all of the angles located inside the polyhedron are 90 ° or more and at least one of the angles is greater than 90 °; and each surface of the data storage medium Defining a storage area on the storage area and setting a virtual grid in the storage area; and a resist pattern corresponding to a data pattern indicating the content of the data on the intersection of the virtual grid in the storage area. Forming the concave and convex portions of the pattern so as to be positioned, and each of the data storage media using the resist pattern as a mask A method of manufacturing a data storage medium is provided that includes etching a surface to form the data pattern that expresses the content of the data in a concavo-convex structure on each surface.

  Each surface constituting the polyhedron is continuous so that it can be drawn with a single stroke in a development view in which the polyhedron is developed, and the resist pattern is formed in the development drawing-like region where each of the surfaces is continuously drawn with a single stroke. A template in which a corresponding concavo-convex pattern is formed is prepared, and the resist pattern is formed on each surface of the polyhedron while rolling the polyhedron over the concavo-convex pattern in the development pattern region of the template. Good.

  A hard mask layer is formed on each surface of the data storage medium, and the method further comprises the step of etching the hard mask layer using the resist pattern as a mask to form a hard mask pattern, the data storage medium In the step of etching the surfaces, the hard mask pattern may be used as a mask instead of the resist pattern or together with the resist pattern.

  According to the present invention, a data storage medium that is durable against changes in storage environment, is not easily damaged, and can easily produce a copy as a backup even after information is recorded and stored, and A manufacturing method thereof can be provided.

FIG. 1 is a perspective view showing a schematic configuration of a data storage medium according to the first embodiment of the present invention. FIG. 2 is a perspective view showing a schematic configuration of another aspect of the data storage medium according to the first embodiment of the present invention. 3A to 3C are perspective views showing a schematic configuration of another aspect of the data storage medium according to the first embodiment of the present invention. 4A to 4B are perspective views showing a schematic configuration of another aspect of the data storage medium according to the first embodiment of the present invention. FIG. 5 is a plan view showing a schematic configuration of a unit storage area according to the first embodiment of the present invention. FIG. 6 is a perspective view showing a schematic configuration of a storage area and a unit storage area in the data storage medium according to the first embodiment of the present invention. FIG. 7 is a development view showing a curved surface in the first embodiment of the present invention. 8A and 8B are partial enlarged plan views showing an A portion and a B portion in FIG. FIG. 9 is a plan view showing a pattern representing numbers of row numbers and column numbers of the address pattern in the first embodiment of the present invention. FIG. 10 is a partial plan view showing an arrangement example of unit data patterns, arrangement direction indicator patterns, address patterns, and boundary patterns in the first embodiment of the present invention. FIG. 11 is a schematic diagram illustrating a process of generating drawing data according to the first embodiment of the present invention. FIGS. 12A to 12C are process flow diagrams showing the method for manufacturing the data storage medium according to the first embodiment of the present invention at the cut end face. FIG. 13 is a cut end view showing a step of manufacturing the structure shown in FIG. 12A among the steps of manufacturing the data storage medium according to the first embodiment of the present invention. FIGS. 14A to 14C are process flow diagrams showing a method for producing a replica of a data storage medium according to the first embodiment of the present invention on a cut end surface. FIGS. 15A to 15D are process flow diagrams subsequent to FIG. 14 showing a method for producing a replica of the data storage medium according to the first embodiment of the present invention at a cut end surface. FIG. 16 is a block diagram showing a schematic configuration of the data reading device according to the first embodiment of the present invention. FIG. 17 is a schematic diagram showing the configuration of the data reading device according to the first embodiment of the present invention. FIG. 18 is a flowchart showing each step of the data reading method according to the first embodiment of the present invention. FIG. 19 is a perspective view showing a schematic configuration of a data storage medium according to the second embodiment of the present invention. FIG. 20 is a partially enlarged cut end view showing a schematic configuration of the data storage medium according to the second embodiment of the present invention. FIG. 21 is a developed view in which the base material of the data storage medium according to the second embodiment of the present invention is developed. FIG. 22 is a developed view in which the base material of another aspect of the data storage medium according to the second embodiment of the present invention is developed. FIG. 23 is a plan view showing a schematic configuration of a storage area and a unit storage area in the second embodiment of the present invention. FIG. 24 is a partially enlarged plan view showing a schematic configuration of a reading direction index pattern in the second embodiment of the present invention. FIG. 25 is a partially enlarged plan view showing a schematic configuration of a unit storage area in the second embodiment of the present invention. FIG. 26 is a perspective view showing a process of manufacturing a data storage medium according to the second embodiment of the present invention.

Embodiments of the present invention will be described with reference to the drawings.
In the drawings attached to this specification, in order to facilitate understanding, the shape, scale, vertical / horizontal dimensional ratio, etc. of each part may be changed from the actual one or may be exaggerated. In the present specification and the like, a numerical range expressed using “to” means a range including each of the numerical values described before and after “to” as a lower limit value and an upper limit value. In this specification and the like, terms such as “film”, “sheet”, and “plate” are not distinguished from each other on the basis of the difference in names. For example, the “plate” is a concept including members that can be generally called “sheet” and “film”.

[First Embodiment]
[Data storage medium]
FIG. 1 is a perspective view showing a schematic configuration of a data storage medium according to the first embodiment. FIGS. 2, 3A to 3C, and 4A to 4B are first views. FIG. 5 is a perspective view showing a schematic configuration of another aspect of the data storage medium according to the embodiment, FIG. 5 is a plan view showing a schematic configuration of a unit storage area in the first embodiment, and FIG. FIG. 7 is a perspective view illustrating a schematic configuration of a storage area and a unit storage area in the data storage medium according to the first embodiment, and FIG. 7 is a development view illustrating a curved surface according to the first embodiment; FIG. And (B) are partial enlarged plan views showing an A portion and a B portion in FIG. 7.

  As shown in FIG. 1, the data storage medium 1 according to the first embodiment has a three-dimensional shape (pillar) having a first surface 21 and a second surface 22 facing each other, and a side wall composed of a curved surface 23. And a base material 2 made of quartz glass. The base 2 of the data storage medium 1 shown in FIG. 1 has a substantially cylindrical shape in which the first surface 21 and the second surface 22 are substantially circular. Since the base material 2 has a substantially cylindrical shape, even if an impact is applied to the base material 2 from the outside, it is difficult to be damaged.

  In addition, as shown in FIG. 2, the base material 2 in 1st Embodiment has the 1st surface 21 and the 2nd surface 22 as a substantially polygon (The polygon more than the pentagon whose interior angle of all the angles is more than 90 degrees) In the example shown in FIG. 2, it may have a substantially polygonal column shape, and as shown in FIGS. 3A to 3C, each of the first surface 21 and the second surface 22. You may have the shape where the continuous part with the curved surface 23 or the side surface 24, or the continuous part of adjacent side surfaces 24 was chamfered.

  When the 1st surface 21 and the 2nd surface 22 are substantially polygonal, and it is the shape by which the continuous part with each side surface 24 was chamfered, the 1st surface 21 and the 2nd surface 22 are substantially polygons more than a triangle. It may be configured (see FIG. 3C). Since the base material 2 has these structures, even if an impact is applied to the base material 2 from the outside, it is difficult to be damaged.

  Moreover, when the base material 2 has the side wall comprised by the curved surface 23, as shown to FIG. 4 (A), a part of side wall may be comprised by the flat surface, and FIG. As shown, the first surface 21 and the second surface 22 may have a substantially oval shape. Since the base material 2 has these shapes (see FIGS. 4A and 4B), the data storage medium 1 becomes difficult to roll and can be prevented from being damaged due to falling.

Hereinafter, the data storage medium 1 having the mode shown in FIG. 1 will be described as an example.
On the curved surface 23 of the substrate 2, a storage area SA is defined as an area for storing data, and the storage area SA corresponds to each bit of the content of the stored data (bit string). A data pattern expressing the content (bit string) of the data is formed by the uneven structure.

  As shown in FIG. 5, in the storage area SA, a plurality of unit storage areas UA are M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more). .)) Are arranged in parallel. As shown in FIGS. 6 and 7, in the first embodiment, 70 unit storage areas UA are arranged in a matrix arrangement of 14 rows (M = 14) × 5 columns (N = 5) along the circumferential direction. Although an example in which parallel processing is performed will be described, the present invention is not limited to this mode. In the examples shown in FIGS. 5 to 7, the unit storage area UA has a square shape. However, the unit storage area UA is not limited to such a mode, and may have a rectangular shape, for example.

  The storage area SA includes a plurality of unit storage areas UA and a saddle-shaped data non-storage area NA located between adjacent unit storage areas UA. Each unit storage area UA is an area where the unit data pattern 30 is formed, and the data non-storage area NA is an area where the address pattern 40, the reading direction indicator pattern 50, and the boundary pattern BP are formed.

The size of the unit storage area UA in the storage area SA is the size of the shootable area in the imaging unit 111 (see FIGS. 16 and 17) described later (the uneven structure of the unit data pattern 30 formed in the unit storage area UA). The size can be appropriately set according to (the size of an area that can be photographed at a magnification capable of recognizing the concave portion 31 and the convex portion 32). Further, the size of the data non-storage area NA is not particularly limited, but the proportion of the unit storage area UA in the storage area SA by reducing the size of the data non-storage area NA as much as possible. Can be increased, and the data recording capacity can be increased. At this time, even if the width W _NA of the data non-storage area NA is set so as to be inconsistent with an integral multiple of the interval of the concavo-convex structure (concave part 31 and convex part 32) of the unit data pattern 30 in the unit storage area UA. Good. As a result, the data non-storage area NA can be easily grasped.

  The unit data pattern 30 formed in each unit storage area UA is a recess (hole) 31 that represents the content (unit bit string) of the unit data obtained by dividing the data recorded and stored in the data storage medium 1 into a plurality of units. And convex portions (portions where no holes are formed) 32. In the first embodiment, the bit “1” in the unit bit string of the unit data is defined as the concave portion 31, and the bit “0” is defined as the convex portion 32.

  For example, in the unit storage area UA shown on the left side of FIG. 5, unit data expressed by a unit bit string (unit bit matrix) “10100111...” From the upper left to the right is recorded and stored. In the unit storage area UA shown on the right side of FIG. 5, unit data expressed by a unit bit string (unit bit matrix) “01100011...” From the upper left to the right is recorded and stored. The bit “1” in the unit bit string may be defined as the convex portion 32, and “0” may be defined as the concave portion 31.

  The concave portions 31 and the convex portions 32 as the unit data pattern 30 are formed in the unit storage area UA so as to be arranged in a matrix, and the matrix arrangement of the concave portions 31 and the convex portions 32 is a unit of unit data. This is an arrangement corresponding to a unit bit matrix obtained by converting a bit string into a matrix arrangement.

  The type of data recorded and stored in the data storage medium 1 is not particularly limited, and examples thereof include text data, image data such as moving images and still images, audio data, and the like.

  The reading direction index pattern 50 is a pattern indicating information regarding the direction in which the plurality of unit storage areas UA included in the storage area SA are read. As will be described later, when the data storage medium 1 according to the first embodiment reads data recorded / stored in the storage area SA, the axis of the base material 2 is oriented in a substantially horizontal direction or a substantially vertical direction. The imaging unit 111 is relatively rotated about the axis. In the data storage medium 1 according to the first embodiment, when the axis of the base material 2 is set in the horizontal direction, it is viewed from the first surface 21 side from the place where the reading direction index pattern 50 is formed. A data pattern is formed in the storage area SA so that it is sometimes read counterclockwise. Therefore, in the first embodiment, the reading direction indicator pattern 50 is formed in the storage area SA, so that the direction in which the imaging unit 111 is relatively rotated can be determined. In the first embodiment, an example in which each of the two reading direction index patterns 50 is provided on each of the first surface 21 side and the second surface 22 side in the storage area SA is taken as an example. However, it is not limited to this mode (see FIGS. 8A and 8B), and any one reading direction index pattern 50 may be provided in the storage area SA.

  The reading direction index pattern 50 may indicate information related to the matrix arrangement of the plurality of unit storage areas UA formed in the storage area SA, and unit data formed in each unit storage area UA. Information on the matrix arrangement of the pattern 30 (unit bit string of unit data) may be included. In the example shown in FIGS. 8A and 8B, the two reading direction index patterns 50 are formed in arrow shapes bent near the upper right corner and the upper left corner of the square unit storage area UA, respectively. Thus, the mode in which the arrow of the reading direction indicator pattern 50 is directed downward is the normal position of the data storage medium 1. When viewed in the normal position, in each unit storage area UA located in the direction of the arrow from the position of the reading direction index pattern 50, the unit data pattern 30 (concave part 31 and convex part 32) is a unit bit string ( It can be understood that it is formed in a matrix arrangement (matrix arrangement from the upper left to the lower right of the unit storage area UA) corresponding to (unit bit matrix). Further, the unit storage area UA located at the lower right of the reading direction indicator pattern 50 (see FIG. 8B) located on the second surface 22 side constitutes data recorded and saved in the data storage medium 1. This is an area for storing the top part of all bit strings. Therefore, by capturing each unit storage area UA in the direction of the arrow with the reading direction index pattern 50 as a reference, the image capturing unit 111 can restore data while sequentially capturing each unit storage area UA. It is also possible to improve the data reading speed.

  In the first embodiment, the reading direction index pattern 50 has an arrow shape (see FIGS. 8A and 8B). By relatively rotating the imaging unit 111 along the direction of the arrow, the unit data patterns 30 formed in the plurality of unit storage areas UA can be sequentially read. The reading direction index pattern 50 may be configured by a single recess (see FIG. 8), or may be configured to have a predetermined shape (for example, an arrow shape) as a whole by arranging a plurality of recesses in parallel. Also good. Note that the reading direction index pattern 50 according to the first embodiment may have a shape other than the arrow shape as long as it indicates the direction in which the imaging unit 111 is relatively rotated.

  In addition, although the whole magnitude | size of the reading direction parameter | index pattern 50 in 1st Embodiment is not specifically limited, The magnitude | size which can be visually recognized with the naked eye as a whole may be sufficient. Further, it is preferable that the shape and size of the concave portion constituting the reading direction index pattern 50 are substantially the same as the shape and size of the concavo-convex structure (concave portion 31) constituting the unit data pattern 30, but they may be different. Good. In the reading direction indicator pattern 50 constituted by one concave portion as shown in FIG. 8, the width in the short direction of the concave portion constituting the reading direction indicator pattern 50 and the concavo-convex structure (concave portion constituting the unit data pattern 30). It is only necessary that the dimension of 31) is substantially the same. When the shape and dimensions of the concavo-convex structure constituting the unit data pattern 30 and the reading direction indicator pattern 50 are substantially the same, a replica (backup) of the data storage medium 1 according to the first embodiment is produced. In addition, pattern defects are less likely to occur.

  The reading direction index pattern 50 may be formed in the unit storage area UA. When the reading direction index pattern 50 having a size that can be visually recognized by the naked eye is formed in the data non-storage area NA, the data non-storage area NA also increases accordingly. Although the address pattern 40 and the boundary pattern BP are also formed in the data non-storage area NA, when the reading direction index pattern 50 is formed in the data non-storage area NA, an area in which the uneven structure is not formed in the data non-storage area NA ( The margin area may be large. In this case, if the reading direction index pattern 50 is formed in the unit storage area UA, the recording capacity in the unit storage area UA is reduced, but the size of the data non-storage area NA can be reduced. As a result, the recording capacity of the data storage medium 1 can be increased.

  In the first embodiment, the address pattern 40 indicating the position information of each unit storage area UA in the storage area SA is the p-th line (p is an integer between 1 and M) indicating the parallel position of each unit storage area UA. And a pattern (see FIG. 9) simulating braille representing numbers of row numbers and column numbers (p, q) in the q-th column (q is an integer of 1 to N). 41 and convex part 42). In FIG. 5, the unit storage area UA located at the 03th row 02th column and the 03th row 03rd column, and the unit storage area UA located at the lower row 04th row 02th column and the 04th row 03th column are addressed. This is expressed by the pattern 40.

  Note that the address pattern 40 in the first embodiment is configured by a concavo-convex structure (concave portion 41 and convex portion 42) representing a bit string obtained by binarizing the numbers of the row number and the column number, like the unit data pattern 30. Also good. It is preferable that the shape and dimensions of the concave portions constituting the address pattern 40 are substantially the same as the shape and dimensions of the concave-convex structure (concave portion 31) constituting the unit data pattern 30, but they may be different.

  The boundary pattern BP is a pattern indicating a boundary between one unit storage area UA and another unit storage area UA that is adjacent in the row direction and the column direction via the data non-storage area NA. Each unit storage area UA is formed so as to be located outside the four corners. By forming the boundary pattern BP, as will be described later, each unit storage area UA can be easily recognized from the image data acquired by the imaging unit 111, and recorded as a plurality of unit data patterns 30. Accurate reading of stored data becomes possible. It is preferable that the shape and size of the recesses constituting the boundary pattern BP are substantially the same as the shape and size of the concavo-convex structure (recess 31) constituting the unit data pattern 30, but they may be different.

  In the first embodiment, the recess 31 constituting the unit data pattern 30 has a substantially square hole shape in plan view. The dimension of the recess 31 may be a dimension that allows the recess 31 to be optically recognized by a general imaging device. However, in order to increase the data capacity that can be recorded and stored in the data storage medium 1, a unit data pattern The size of the 30 recesses 31 can be set to, for example, 400 nm or less, preferably about 100 to 250 nm.

  In the first embodiment, the first surface 21 and the second surface 22 of the base material 2 have such a size that the data storage medium 1 is not easily damaged, and the imaging unit 111 (see FIGS. 16 and 17). It is sufficient that the curved surface 23 included in the size of the imaging target region has a radius of curvature that can be recognized by the imaging unit 111 as being substantially flat. For example, the 1st surface 21 and the 2nd surface 22 of the base material 2 should just have a diameter of about 25 mm-300 mm, and the curvature radius of the curved surface 23 should just be about 12.5 mm or more, for example. . The length between the first surface 22 and the second surface 22 of the substrate 2 (the length along the axial direction of the substrate 2) increases the recording capacity of the data storage medium 1 as the length increases. However, if the length is too long, the data storage medium 1 (base material 2) may be easily broken or heavy, and handling such as transportation and storage may be difficult. Therefore, the length in the axial direction of the base material 2 may be appropriately set in consideration of the ease of handling methods such as the storage method and transport method of the data storage medium 1. For example, in the case of the data storage medium 1 in which the diameters of the first surface 21 and the second surface 22 of the base material 2 are about 50 mm and are carried by a person without using a tool, The length of the material 2 in the axial direction is preferably set to about 200 mm or less.

  As shown in FIG. 10, in the storage area SA, at least the unit data pattern 30 and the address pattern 40 are formed so as to overlap the intersection PI of the virtual grid Gr set in the storage area SA. . More specifically, the unit data pattern 30 and the address pattern 40 are formed so that the respective reference points Cp of the unit data pattern 30 (concave portion 31) and the address pattern 40 overlap the intersection PI of the virtual grid Gr. Note that the reading direction index pattern 50 and the boundary pattern BP may also be formed so as to overlap the intersection Pi of the virtual grid Gr. Here, the reference point Cp of the unit data pattern 30, the reading direction indicator pattern 50, and the address pattern 40 is a plan view of the concavo-convex structure constituting the unit data pattern 30, the reading direction indicator pattern 50, the address pattern 40, and the boundary pattern BP. The center point. Note that it is sufficient that at least the reference point Cp of the unit data pattern 30 overlaps the intersection point PI of the virtual grid Gr. Even if the reference point Cp of the address pattern 40 overlaps the intersection point PI of the virtual grid Gr. Alternatively, it overlaps with the grid line of the virtual grid Gr but does not have to overlap with the intersection point PI, or does not have to overlap with either the intersection point PI or the grid line of the virtual grid Gr.

  In the data storage medium 1 according to the first embodiment having the above-described configuration, the base material 2 is configured with a predetermined three-dimensional shape (columnar shape), so that it is difficult to be damaged even if an impact is applied from the outside. An effect is produced.

  In the data storage medium 1 according to the first embodiment, the contents (bit string) of recorded / stored data are unit data patterns 30 (in a matrix) formed in each unit storage area UA of the storage area SA. It is expressed by the concave portion 31 and the convex portion 32) as the concave-convex structure arranged. Then, by forming the reading direction indicator pattern 50 that can also serve as an indicator of the arrangement order of the concavo-convex structure (the concave portion 31 and the convex portion 32) in the unit data pattern 30, by recognizing the reading direction indicator pattern 50, The order in which the data is read can be accurately recognized, and the data can be accurately restored.

  The data storage medium 1 according to the first embodiment can be produced by processing a base material made of quartz, and has extremely excellent heat resistance and water resistance. Therefore, even if the storage environment changes, the recorded / stored data (unit data pattern 30) and the reading direction index pattern 50 are not lost, and the data is stored in units of hundreds of years or longer. ) It can be stored, and by recognizing the reading direction index pattern 50 even after a very long span, the order in which the data stored in the data storage medium 1 is read out can be accurately recognized, and the data can be accurately Can be restored.

  Furthermore, the data storage medium 1 according to the first embodiment can record and store data by the data pattern (the concave portion 31 and the convex portion 32 as the concave-convex structure) formed on the curved surface 23 of the substrate 2. Therefore, as will be described later, by performing imprint lithography processing using the data storage medium 1, a copy (backup) of the data storage medium 1 on which the data is recorded and stored is transferred to the data (digital data or the like). It can be easily produced even if no exists.

  Furthermore, since the data recorded and stored in the data storage medium 1 according to the first embodiment is expressed by a concavo-convex structure that can be optically recognized using a general imaging device, it is extremely long-term. Even in the future, the data can be easily restored simply by imaging the concavo-convex structure (the concave portion 31 and the convex portion 32) using the imaging element existing at that time and converting it into a bit string.

  In the data storage medium 1 according to the first embodiment, even if a part of the concavo-convex structure (concave part 31) formed in the unit storage area UA is damaged, a part of the concavo-convex structure Since the unit storage area UA that has been damaged can be specified by the address pattern 40, if a copy (backup) of the data storage medium 1 is prepared in advance, the copy can be transferred to the unit storage area UA. Data recorded / stored in the data storage medium 1 can be read out easily and combined with data read from the other unit storage area UA of the data storage medium 1. Can be restored.

[Method of manufacturing data storage medium]
The data storage medium 1 having the above-described configuration can be manufactured as follows. FIG. 11 is a flowchart schematically showing a process of designing drawing data as a pre-stage for producing the data storage medium 1 according to the first embodiment, and FIG. 12 is a data storage according to the first embodiment. It is a flowchart which shows the process of producing the medium 1 with a cut end view.

[Drawing data design process]
First, drawing data for forming the unit data pattern 30 and the address pattern 40 as the concavo-convex structure in the storage area SA of the data storage medium 1 is designed based on the data D recorded and stored in the data storage medium 1.

Specifically, first, all the bit strings of the data D are divided into X unit bit strings (X is an integer of 2 or more) from the head in a predetermined bit length unit, and unit data including the unit bit string is included. UD _{1 to} UD _X are generated. The bit length of the unit bit string of each unit data UD can be set to be the same as the bit length that can be recorded and stored in the unit storage area UA. When data can be stored in a bit matrix of 8 rows × 8 columns in each unit storage area UA in the first embodiment, all the bit strings of data D to be recorded / stored are unit bit strings having a length of 64 bits from the head. Divide into unit data UD.

Next, the unit bit string of each unit data UD is converted into a unit bit matrix UM of 8 rows × 8 columns, and unit pattern data D ₃₀ is generated based on the unit bit matrix UM. In the first embodiment, at this time, a virtual grid Gr is defined in an area corresponding to the unit storage area UA, and the bit “1” of the unit bit matrix UM is overlapped with the intersection point PI of the virtual grid Gr. The bit figure (square figure) corresponding to the recess 31 is arranged only at the position corresponding to “”, and the bit figure is not arranged at the position corresponding to bit “0” (see FIG. 11). The unit pattern data D _30, depending on the presence or absence of a bit graphic at each position constituting a matrix of 8 rows × 8 columns, expresses the 64-bit information constituting the unit bit matrix UM. The unit pattern data D ₃₀ is used as the drawing data for forming the unit data pattern 30 (the recess 31 and the protrusion 32) in a unit storage area UA.

Subsequently, the unit pattern data D _30, adds the address pattern data D ₄₀ to the data non-conserved region NA. The address pattern data D ₄₀ is added along the arrangement order of the unit data UD in the data D recorded and stored in the data storage medium 1. The address pattern data D ₄₀ is used in the data non-conserved regions NA as the drawing data for forming the address pattern 40 (the recess 41 and the protrusion 42).

In this way, unit pattern data D ₃₀ which is the drawing data of the unit data pattern 30 formed in each unit storage area UA, and address pattern data D which is the drawing data of the address pattern 40 formed in the data non-storage area NA. After generating ₄₀ , these can be arranged in a matrix to generate drawing data.

[Data storage medium production process]
Then, it is comprised by the substantially cylindrical shape which has the 1st surface 11 and the 2nd surface 12 which mutually oppose, and the side wall comprised by the curved surface 13, and on the 1st surface 11, the 2nd surface 12, and the curved surface 13 A data storage medium substrate 10 made of quartz, on which a hard mask layer HM made of chromium oxide or the like is formed, is prepared, and a unit storage area UA and a data non-storage area NA on the curved surface 13 of the substrate 10 are prepared. The resist patterns R ₃₀ and R ₄₀ corresponding to the unit data pattern 30 and the address pattern ₄₀ are formed in the areas corresponding to the above (see FIG. 12A). In the first embodiment, a method for producing the data storage medium 1 using the data storage medium substrate 10 in which the reading direction index pattern 50 is formed on the curved surface 13 will be described as an example. It is not limited to this aspect. For example, the data storage medium 1 may be manufactured by forming the reading direction index pattern 50 together with the unit data pattern 30 and the address pattern 40, or the address pattern 40 and the reading direction index pattern 50 are formed in advance. Alternatively, the data storage medium 1 may be produced using the data storage medium substrate.

The resist patterns R ₃₀ and R ₄₀ can be formed as follows. For example, a mold M having rigidity formed by forming a concave / convex pattern P corresponding to the unit data pattern 30 and the address pattern 40 is prepared, and the curved surface 13 (resist layer R) of the substrate 10 is formed on the concave / convex pattern P of the mold M. ) May be rolled while being pressed (see FIG. 13), or a flexible mold M formed with a concavo-convex pattern P is prepared, and the curved surface 13 ( The mold M may be wound around the resist layer R), or a flexible mold M is placed on a rigid base material, and the base material 10 is curved on the concave-convex pattern P of the mold M. The substrate 10 may be rolled while pressing the surface 13 (resist layer R). Further, the resist patterns R ₃₀ and R ₄₀ may be formed using a conventionally known exposure apparatus (electron beam drawing apparatus, laser drawing apparatus, etc.) used in a semiconductor manufacturing process or the like. Using this exposure apparatus, based on the drawing data generated as described above, a pattern latent image is formed on the resist layer formed on the curved surface 13 of the substrate 10 for data storage medium, and development processing is performed. The resist patterns R ₃₀ and R ₄₀ can be formed.

The resist material constituting the resist patterns R ₃₀ and R ₄₀ is not particularly limited, and a conventionally known energy beam sensitive resist material (for example, electron beam sensitive resist material) can be used. . In the example shown in FIG. 12A, since a positive energy beam sensitive resist material is used, the resist layer R on which the pattern latent image is formed is subjected to a development process, whereby a concave resist pattern R is formed. ₃₀ and R ₄₀ are formed.

After the resist patterns R ₃₀ and R ₄₀ are formed in this way, the hard mask layer HM is etched by a dry etching method or the like using the resist patterns R ₃₀ and R ₄₀ as a mask, and the remaining resist patterns R ₃₀ and R _{30 40} is removed (see FIG. 12B). In this way, the hard mask pattern HP is formed on the curved surface 13 of the data storage medium substrate 10. If it is difficult to affect the etching of the curved surface 13 of the data storage medium substrate 10 in the subsequent process, the resist patterns R ₃₀ and R ₄₀ remaining after the hard mask layer HM on the curved surface 13 is etched. Need not be removed.

  Subsequently, using the hard mask pattern HP as a mask, the curved surface 13 of the data storage medium substrate 10 is etched by a dry etching method to remove the remaining hard mask pattern HP and the hard mask layer HM (FIG. 12C )reference). Accordingly, the unit data pattern 30 and the address pattern 40 can be formed on the curved surface 13 of the data storage medium substrate 10. In this way, the data storage medium 1 according to the first embodiment can be manufactured.

  A method for producing a copy of the data storage medium 1 thus produced will be described. FIG. 14 and FIG. 15 are process flow diagrams showing a process of producing a duplicate of the data storage medium 1 according to the first embodiment on a cut end face.

  First, the data storage medium 1 in which the unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary pattern BP are formed on the curved surface 23 of the substrate 2, the first surface 5a, and the second surface opposite thereto. And a substrate 5 having a resin layer 61 provided on the first surface 5a (see FIG. 14A).

  The material constituting the substrate 5 is not particularly limited, and examples thereof include a quartz glass substrate, a soda glass substrate, a fluorite substrate, a calcium fluoride substrate, a magnesium fluoride substrate, an acrylic glass substrate, and a borosilicate glass substrate. A glass substrate; a single-layer substrate composed of a polycarbonate substrate, a polypropylene substrate, a polyethylene substrate, other resin substrates such as a polyolefin substrate, or a laminated substrate obtained by laminating two or more arbitrarily selected from the above substrates. It is done.

  The resin layer 61 is formed of the unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary formed in the first storage area SA of the data storage medium 1 in a process described later (see FIG. 14B). This is a layer in which an inverted pattern of the pattern BP is formed. As the resin material constituting the resin layer 61, a resin material such as a thermoplastic resin, a thermosetting resin, or an ultraviolet curable resin can be used, and more specifically, an acrylic resin, a styrene resin, an olefin resin, or the like. Resins, polycarbonate resins, polyester resins, epoxy resins, silicone resins, and the like can be used.

  Next, the resin layer 61 on the first surface 5 a of the substrate 5 is rolled while pressing the curved surface 23 of the data storage medium 1, so that the resin layer 61 is formed in the storage area SA of the data storage medium 1. The unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary pattern BP are transferred to form an inverted pattern thereof (see FIG. 14B). The resin mold 71 is manufactured by peeling the substrate 5 from the resin layer 61 on which the reverse pattern is formed (see FIG. 14C). In addition, you may produce the mold which has rigidity by etching the 1st surface 5a of the base material 5 using the resin layer 61 in which the reverse pattern was formed as a mask. In this case, a hard mask layer may be formed on the first surface 5a of the substrate 5, and the hard mask layer is etched using the resin layer 61 as a mask to form a hard mask pattern. By etching the first surface 5a of the substrate 5 using the pattern as a mask, a rigid mold can be produced.

  Subsequently, a hard mask having a first surface and a second surface facing each other and a side wall constituted by the curved surface 13 ', and the first surface, the second surface and the curved surface 13' are made of chromium oxide or the like. A substantially cylindrical replica base material 10 ′ made of quartz in which the layer HM ′ is formed is prepared, and a resin mold 71 is placed on the base material 6 having rigidity. Then, a resist layer 81 is formed on the hard mask layer HM ′ of the curved surface 13 ′ of the replica base material 10 ′, and the resist layer 81 is pushed onto the surface on which the reverse pattern in the resin mold 71 is formed. The replica substrate 10 'is rolled while being applied to transfer the reverse pattern, and a resist pattern 91 to which the reverse pattern of the resin mold 71 is transferred is formed (FIGS. 15A and 15B). reference). Using the resist pattern 91 as a mask, the hard mask layer HM ′ on the curved surface 13 ′ of the replica base material 10 ′ is etched. Thereby, the hard mask pattern HP ′ can be formed on the curved surface 13 ′ of the replica base material 10 ′ (see FIG. 15C). The resist pattern 91 may be formed by winding the resin mold 71 around the replica base material 10 ′ having the resist layer 81, or a rigid mold may be used instead of the resin mold 71. The resist pattern 91 may be formed by rolling the replica substrate 10 ′ while pressing the resist layer 81 against the surface of the mold having the rigidity on which the reverse pattern is formed.

  Then, using the hard mask pattern HP ′ as a mask, the curved surface 13 ′ of the replica base material 10 ′ is etched. Thereby, a duplicate pattern of the unit data pattern 30, the reading direction index pattern 50, and the address pattern 40 formed on the curved surface 23 of the data storage medium 1 can be formed (see FIG. 15D). In this way, a replica 1 ′ of the data storage medium 1 can be produced (see FIG. 15D). In addition, if it is hard to produce a problem in terms of the etching selectivity with respect to the replica substrate 10 ′, the hard mask layer HM ′ is not formed on the curved surface 13 ′ of the replica substrate 10 ′. May be. In this case, a resist pattern 91 is formed on the curved surface 13 ′ of the replica substrate 10 ′, and the resist pattern 91 is used as a mask to etch the curved surface 13 ′ of the replica substrate 10 ′. By removing 91, a replica 1 ′ of the data storage medium 1 can be produced.

  As described above, according to the first embodiment, the data storage medium 1 can be easily manufactured by using a conventionally known lithography technique or roller imprint technique used in a semiconductor manufacturing process or the like. it can. In addition, a copy as a backup of data recorded / stored in the case where the data storage medium 1 is damaged can be easily made by using a conventionally known roller imprint technique.

[Data reading device / data reading method]
A data reading apparatus for reading data recorded and stored in the data storage medium 1 having the above-described configuration and a data reading method using the data reading apparatus will be described. FIG. 16 is a block diagram illustrating a schematic configuration of the data reading device according to the first embodiment, and FIG. 17 is a schematic diagram illustrating a configuration of the data reading device according to the first embodiment.

  The data reading device 100 according to the first embodiment includes a holding unit (not shown) that holds the data storage medium 1 and image data (first image data and second image data) of the storage area SA of the data storage medium 1. The image data acquisition unit 110 that acquires the image data, the control unit 121 that performs data processing based on the image data, the operation control of the image data acquisition unit 110, and the image data acquired by the image data acquisition unit 110 and the control unit 121 And a control device 120 having a storage unit 122 for storing various generated data, various programs, and the like. Note that the holding unit can hold the axis C of the data storage medium 1 in the horizontal direction and can rotate the data storage medium 1 around the axis C.

  The image data acquisition unit 110 acquires image data including each unit image data of each unit storage area UA of the storage area SA of the data storage medium 1. The image data acquisition unit 110 captures images along the axial direction of the data storage medium 1 held in the holding unit and an imaging unit 111 that can capture an image in a predetermined shooting target area such as a CCD camera as image data. And a scanning unit 112 that performs a scanning process so as to move the unit 111. As the image data acquisition unit 110, a general-purpose optical microscope or the like can be used.

  In the first embodiment, the image data acquisition unit 110 (particularly the imaging unit 111) is provided to face the curved surface 23 of the data storage medium 1 held in the holding unit, and the data storage medium held in the holding unit. As 1 rotates around the axis C, the imaging unit 111 sequentially captures images of the unit storage areas UA in the storage area SA of the data storage medium 1 (see FIG. 17). However, the data reading device 100 is not limited to such an aspect, and for example, the imaging unit 111 may rotate around the data storage medium 1 held in the holding unit.

  The control unit 121 performs arithmetic processing according to instructions of various programs. Specifically, the control unit 121 determines the order (acquisition order) in which the unit image data of each unit storage area UA is acquired by the imaging unit 111, and the unit data pattern formed in each unit storage area UA. A process of reading unit data (unit bit string) based on 30 image data, a process of generating data (combination order data) related to the combination order of the unit data (unit bit string), and a holding unit based on the reading direction indicator pattern 50 Processing for determining the direction in which the data storage medium 1 held in the disk is rotated, processing for determining the extraction direction of the unit data (unit bit string) corresponding to the unit data pattern 30 based on the reading direction index pattern 50, and an image data acquisition unit 110, processing for storing image data acquired by 110, various generated data, and the like in the storage unit 122, and reading By combining the unit data (unit bit string), it performs processing for restoring data that has been recorded and stored in the data storage medium 1.

  The control unit 121 performs arithmetic processing according to instructions of various programs. Specifically, the control unit 121 performs processing for causing the scanning unit 112 to scan the imaging unit 111 based on the determined acquisition order, and from the image data based on the unit data pattern 30 formed in each unit storage area UA. A process of reading unit data (unit bit string), a process of generating data (combination order data) related to the combination order of the unit data (unit bit string), and unit data corresponding to the unit data pattern 30 based on the reading direction index pattern 50 ( Processing for determining the extraction direction of the unit bit sequence), processing for storing the image data acquired by the image data acquisition unit 110, various generated data, and the like in the storage unit 122, read unit data (unit bit sequence) Are combined to restore the data recorded and stored in the data storage medium 1.

  The storage unit 122 is based on the image data (unit image data) of the storage area SA (each unit storage area UA) acquired by the image data acquisition unit 110 and the unit data pattern 30 formed in the unit storage area UA. The combination order data of the unit data (unit bit string) read from the image data (each unit image data) is stored. In addition, the storage unit 122 is read based on the unit data (unit bit string) read based on the image data of the unit data pattern 30 formed in the unit storage area UA and the image data of the address pattern 40. The unit storage area UA is stored in association with the position information. A general-purpose computer or the like can be used as the control device 120 including the control unit 121 and the storage unit 122.

  A method of reading data recorded / stored in the data storage medium 1 using the data reading device 100 having such a configuration will be described. FIG. 18 is a flowchart showing each step of the data reading method according to the first embodiment.

  First, when the data storage medium 1 is held in the holding unit, the control unit 121 causes the image data acquisition unit 110 to acquire image data including the reading direction index pattern 50, and based on the reading direction index pattern 50, the data The rotation direction of the storage medium 1 and the order (acquisition order) for acquiring the unit image data of each unit storage area UA of the storage area SA are determined (S1).

  A method for determining the rotation direction and the acquisition order is not particularly limited. For example, the entire circumferential direction of the curved surface 23 of the data storage medium 1 on the first surface 21 side and the second surface 22 side by the imaging unit 111 is not limited. The reading direction index pattern 50 is recognized from the image data and determined based on the reading direction index pattern 50.

  Then, after recognizing the arrow direction of the reading direction index pattern 50, the rotation direction is determined so that the unit storage area UA is relatively scanned in the direction opposite to the arrow with respect to the imaging unit 111, and one reading is performed. The imaging unit 111 is caused to scan from the direction index pattern 50 (for example, the reading direction index pattern 50 on the second surface 22 side) toward the other reading direction index pattern 50 (for example, the reading direction index pattern 50 on the first surface 21 side). What is necessary is just to acquire the image data of each unit storage area UA in a proper order.

  The scanning unit 112 of the image data acquisition unit 110 moves the imaging unit 111 with respect to the data storage medium 1 based on the acquisition order, and the control unit 121 rotates the data storage medium 1 based on the rotation direction. Then, the image capturing unit 111 causes each unit storage area UA of the storage area SA of the data storage medium 1 to be imaged, and acquires unit image data including the unit storage area UA and the address pattern 40 (S2).

  Next, the control unit 121 determines a direction (extraction direction) in which the concave portion 31 and the convex portion 32 of the unit data pattern 30 formed in the unit storage area UA are extracted based on the acquisition order, and each image data The combination order data indicating the combination order of the unit data (unit bit string) that can be read out is generated (S3).

  Subsequently, the control unit 121 extracts the concave portion 31 and the convex portion 32 of the unit data pattern 30 from each image data stored in the storage unit 122 according to the extraction direction determined as described above, and the concave portion Unit data (unit bit string) is read based on 31 and the convex part 32, and the unit data (unit bit string) is stored in the storage unit 122 (S4).

  When the concave portion 31 and the convex portion 32 of the unit data pattern 30 are extracted and the unit data (unit bit string) is read based on the concave portion 31 and the convex portion 32, the control unit 121 includes the unit storage area UA and the address pattern 40. A virtual grid Gr is defined on the unit image data. This virtual grid Gr can be defined so as to pass through the reference point Cp of an arbitrary recess 41 of the address pattern 40, for example. And the control part 121 determines whether the recessed part 31 exists on each intersection PI of the virtual grid Gr in each unit preservation | save area | region UA. The determination of whether or not the recess 31 is present can be made based on, for example, the light / dark distribution in the image data.

  The control unit 121 associates the bit “1” with the intersection point PI determined to have the recess 31, and associates the bit “0” with the intersection point PI determined to have no recess 31, thereby generating unit data (unit bit string). Is read out.

  The control unit 121 stores unit data (unit bit string) for all unit image data in the storage unit 122 (S4), and then combines the unit data (unit bit string) according to the combination order data to generate data (bit string). (S5). In this way, data stored in the data storage medium 1 can be restored.

  As described above, according to the data reading device and the data reading method using the data reading device according to the first embodiment, the data storage medium 1 is provided with the reading direction indicator pattern 50, so that the data storage medium 1 has data. Regardless of the direction in which the data is held in the holding unit of the reading device, the data stored in the data storage medium 1 can be accurately restored.

[Second Embodiment]
[Data storage medium]
FIG. 19 is a perspective view showing a schematic configuration of a data storage medium according to the second embodiment, and FIG. 20 is a partially enlarged cut end view showing a schematic configuration of the data storage medium according to the second embodiment. FIG. 21 is an expanded view of the base material of the data storage medium according to the second embodiment, and FIG. 22 is an expanded base material of another aspect of the data storage medium according to the second embodiment. FIG. 23 is a plan view showing a schematic configuration of a storage area and a unit storage area in the second embodiment, and FIG. 24 shows a schematic configuration of a reading direction index pattern in the second embodiment. FIG. 25 is a partially enlarged plan view, and FIG. 25 is a partially enlarged plan view showing a schematic configuration of a unit storage area in the second embodiment. Note that in the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  The data storage medium 1 according to the second embodiment includes a base material 2 ′ configured by a polyhedron having a plurality of surfaces 2 </ b> A. Of the plurality of surfaces 2A constituting the substrate 2 ′, the angle θ (an angle located inside the polyhedron) formed by the adjacent surfaces 2A and 2A sharing one side is 90 ° or more. , At least one of the angles θ is greater than 90 °. The angle θ exceeding 90 ° is preferably more than 90 ° and not more than 270 °, more preferably more than 90 ° to 160 °, and particularly preferably 108 ° to 140 °. The angle θ formed by the adjacent surfaces 2A, 2A sharing one side in the substrate 2 ′ composed of a polyhedron is 90 ° or more, and at least one of the angles θ is more than 90 °. The data storage medium 1 is not easily damaged. In the second embodiment, description will be given by taking as an example a base material 2 ′ constituted by an icosahedron shown in FIG. 19, but in the polyhedron constituting base material 2 ′, each face 2A is constituted by a regular pentagon. Or an anti-regular polyhedron (for example, a thirty dodecahedron, each surface 2A having a regular pentagon and a regular hexagon shown in FIG. 22). Alternatively, it may have an outer shape (for example, a step shape, a cross shape, etc.) in which a plurality of cubes or rectangular parallelepipeds are arbitrarily stacked. In addition, the polyhedrons constituting the base material 2 ′ are all dodecahedrons, regular icosahedrons, etc., and all angles θ formed by the adjacent surfaces 2 A and 2 A sharing one side are less than 180 °. It may be a convex polyhedron, or a concave polyhedron with a part of the angle θ exceeding 180 °. Note that, for example, the substantially polygonal column-shaped base material 2 shown in FIG. 2 described in the first embodiment can also be included in the concept of the base material 2 ′ configured by the polyhedron in the second embodiment.

  As shown in FIG. 21, it is preferable that each surface 2A of the polyhedron constituting the base material 2 'is continuous so that one stroke can be written in the developed view of the developed polyhedron. Since each surface 2A is continuous in this manner, the data storage medium 1 according to the second embodiment can be easily imprinted while rolling the data storage medium 10 ′ as will be described later. Can be manufactured. Further, even when the replica 1 ′ of the data storage medium 1 is manufactured, it can be easily manufactured by performing the imprint process while rolling the data storage medium 1.

  In the second embodiment, a storage area SA as an area for storing data is defined on each surface 2A of the substrate 2 ′, and the contents of the stored data are stored in the storage area SA. A data pattern expressing the content (bit string) of the data is formed by the uneven structure corresponding to each bit of (bit string).

  As shown in FIG. 23, a plurality of unit storage areas UA are arranged in parallel in the storage area SA. In the second embodiment, particularly in the example shown in FIG. 23, each surface 2A of the substrate 2 'formed of an icosahedron is an equilateral triangle, and therefore the storage area SA is also defined as an equilateral triangle area. Therefore, the plurality of unit storage areas UA (square unit storage areas UA) arranged in parallel in the storage area SA are arranged in a pyramid shape according to the shape of the storage area SA. Note that the shape of the storage area SA may be set as appropriate according to the shape of each surface 2A of the base material 2 ′ constituted by a polyhedron, for example, each of the base materials 2 ′ constituted by a regular dodecahedron. Since the surface 2A is a regular pentagon, the storage area SA may be defined as a regular pentagonal area.

  One reading direction index pattern 50 is provided in the storage area SA of each surface 2A of the substrate 2 '. In the second embodiment, as shown in FIG. 24, a numerical reading direction indicator pattern 50 composed of concave portions is provided. By providing the numerical reading direction index pattern 50 on each surface 2A, the unit data pattern 30 formed in each unit storage area UA in the storage area SA of each surface 2A is read in this numerical order. Data can be accurately restored.

  In the data storage medium 1 according to the second embodiment, when each surface 2A of the polyhedron constituting the substrate 2 ′ is continuous so that it can be written with one stroke (see FIGS. 21 and 22), a reading direction index The pattern 50 may have a shape such as an arrow indicating the order of one stroke.

  As shown in FIG. 25, the storage area SA includes a plurality of unit storage areas UA and a saddle-shaped data non-storage area NA located between adjacent unit storage areas UA. Each unit storage area UA is an area where the unit data pattern 30 is formed, and the data non-storage area NA is an area where the address pattern 40, the reading direction indicator pattern 50, and the boundary pattern BP are formed.

  In the second embodiment, the address pattern 40 representing the position information of each unit storage area UA in the storage area SA is a number (surface number) p representing the reading direction index pattern 50 on the surface 2A where the storage area SA exists. And the pattern (refer FIG. 10) which imitated the braille showing the order q of the unit storage area UA in the said storage area SA is expressed by the uneven structure (the recessed part 41 and the convex part 42). In FIG. 25, the unit storage area UA located on the left side is the area located at the eighth position of the surface number 1, and the unit storage area UA located on the right side is the area located at the ninth position of the surface number 1. This is expressed by an address pattern 40. Note that the address pattern 40 may be configured by a concavo-convex structure (concave portion 41 and convex portion 42) representing a bit string obtained by binarizing the numbers of the surface number p and the order q.

  In the example shown in FIG. 25, the boundary pattern BP (see FIG. 25) is a pattern that indicates a boundary between unit storage areas UA that are adjacent in the horizontal direction. It is formed so as to be located outside the corner. Since the boundary pattern BP is formed, each unit storage area UA can be easily recognized from the image data acquired by the imaging unit 111 and recorded as a plurality of unit data patterns 30 as described later. The stored data can be read accurately.

  The data storage medium 1 according to the second embodiment having the above-described configuration is configured by a polyhedron, and the angle θ formed by the adjacent surfaces 2A and 2A sharing one side is 90 ° or more, When at least one of the angles θ is greater than 90 °, there is an effect that even if an impact is applied from the outside, it is difficult to break.

[Method of manufacturing data storage medium]
The data storage medium 1 according to the second embodiment can be manufactured as follows. FIG. 26 is a perspective view showing a process of manufacturing the data storage medium 1 according to the second embodiment.

First, drawing data for forming the unit data pattern 30 and the address pattern 40 as the concavo-convex structure in the storage area SA of the data storage medium 1 is designed based on the data D recorded and stored in the data storage medium 1. In the design of this drawing data, generates drawing data D ₄₀ of the address pattern 40 formed in the drawing data D ₃₀ and the data non-conserved regions NA unit data pattern 30 formed in each unit storage area UA is first It can be performed in the same manner as the embodiment (see FIG. 12). The appropriate place these drawing data D _30, D _40, in the storage area SA with corresponding shape to the polyhedron of each surface 2A constituting the data storage medium 1 of the substrate 2 'according to the second embodiment In addition, drawing data can be generated by arranging the storage areas SA in parallel in the form of development of the polyhedron (see FIGS. 21 and 22).

  Then, glass substrates such as quartz glass substrate, soda glass substrate, fluorite substrate, calcium fluoride substrate, magnesium fluoride substrate, acrylic glass substrate, borosilicate glass substrate; polycarbonate substrate, polypropylene substrate, polyethylene substrate, other polyolefin substrate The drawing data (development of polyhedron) is applied to a resin layer formed on a substrate such as a single layer substrate made of a resin substrate, etc., or a laminated substrate formed by laminating two or more arbitrarily selected from the above substrates. A resist pattern is formed by performing an exposure process and a development process in accordance with drawing data in which each storage area SA is arranged in the form of a figure, and a mold M having rigidity is obtained through an etching process of the substrate using the resist pattern as a mask. Is made. In such a mold M, regions corresponding to the respective surfaces 2A (regions including the unit data pattern 30 that can be formed in the storage region SA of each surface 2A and the concavo-convex pattern P corresponding to the address pattern 40) are continuously written with a single stroke. ing. A hard mask layer is interposed between the substrate and the resin layer, the hard mask layer is etched using the resist pattern as a mask to form a hard mask pattern, and the hard mask pattern is used as a mask of the substrate. You may produce the mold M through an etching process. Further, the resin layer formed on the substrate may be subjected to exposure processing and development processing in accordance with the drawing data to produce a resin mold.

Next, a data storage medium substrate 10 made of quartz, which is formed of a polyhedron and has a hard mask layer formed on each surface, is prepared. Then, a resist layer is formed in an area located at one end of a continuous area in the mold M that can be drawn with one stroke, and an arbitrary surface of the data storage medium substrate 10 is aligned with the area where the resist layer is formed. And press it. In this state, the resist layer is cured, and then a resist layer is formed in the next area of the mold M, and the data storage medium substrate 10 is rolled toward the area. In this way, the data storage medium substrate 10 is rolled to a region located at the other end of the continuous region in the mold M that can be drawn with one stroke, and a resist pattern R _{30 is formed on} each surface of the data storage medium substrate 10. , R ₄₀ . Note that a resin mold may be used in place of the rigid mold M. In this case, the resin mold is placed on a rigid substrate, and one end of a continuous region in the resin mold that can be drawn with a single stroke. The resist patterns R ₃₀ and R ₄₀ may be formed on the respective surfaces of the data storage medium substrate 10 by sequentially bringing the respective surfaces of the data storage medium substrate 10 into contact with the resist layers in the respective regions from the first to the other end. Good.

After forming a resist pattern R _30, R ₄₀ In this manner, the resist pattern R _30, with R ₄₀ as a mask, the resist pattern R _30, R ₄₀ to the hard mask layer is etched by dry etching or the like, the remaining Remove. Thereby, a hard mask pattern can be formed on each surface of the data storage medium substrate 10. Then, using the hard mask pattern as a mask, each surface of the data storage medium substrate 10 is etched by a dry etching method to remove the remaining hard mask pattern. Thereby, the unit data pattern 30 and the address pattern 40 can be formed on each surface of the base material 10 for the data storage medium. In this way, the data storage medium 1 according to the second embodiment can be manufactured.

  In addition, when each surface 2A of the polyhedron constituting the base material 2 ′ of the data storage medium 1 according to the second embodiment is continuous so that it cannot be drawn with a single stroke in the developed view of the polyhedron, A mold M or a resin mold having a concavo-convex pattern corresponding to the unit data pattern 30 and the address pattern 40 that can be formed on 2A is prepared corresponding to each surface 2A, and through each imprint process using each mold M, each surface The unit data pattern 30 and the address pattern 40 may be formed in 2A.

  A duplicate of the data storage medium 1 can be produced in the same manner as the method for producing the data storage medium 1. Specifically, the data storage medium 1, the substrate 5 having the first surface 5a and the second surface 5b opposite to the first surface 5a and having the resin layer 61 provided on the first surface 5a (FIG. 14A). Prepare). Next, each surface 2 </ b> A of the data storage medium 1 is rolled on the resin layer 61 on the first surface 5 a of the substrate 5, so that each storage area SA of the data storage medium 1 is moved to the resin layer 61. The unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary pattern BP that are formed in the above are transferred to form an inverted pattern thereof. By etching the first surface 5a of the substrate 5 using the resin layer 61 on which the reverse pattern is formed in this manner as a mask, a rigid mold is manufactured. In such a mold, the area corresponding to each surface 2A of the data storage medium 1 (corresponding to the unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary pattern 50 formed in the storage area SA of each surface 2A). The region including the concavo-convex pattern is continuous so that one stroke can be written.

  Then, a replica base material 10 ′ made of quartz, which is made of the same polyhedron as the base material 2 ′ of the data storage medium 1 and has a hard mask layer HM ′ formed on each surface, is prepared. And the resist layer 81 was formed in the area | region located in the end of the area | region which can be drawn with a single stroke in the mold which has rigidity, and the said resist layer 81 was formed in arbitrary one surfaces of the said base material 10 'for replicas Align and press against the area. In this state, the resist layer 81 is cured, and then the resist layer 81 is formed in the next region of the mold, and the replica substrate 10 'is rolled toward the region. In this way, the replica base material 10 ′ is rolled to a region located at the other end of the continuous region in the mold that can be drawn with one stroke, and a resist pattern 91 is formed on each surface of the replica base material 10 ′. To do. A resin mold may be used in place of the rigid mold. In this case, the resin mold is placed on a rigid substrate, and from one end to the other end of a continuous region in the resin mold that can be drawn with one stroke. The resist pattern 91 may be formed on each surface of the replica substrate 10 ′ by sequentially contacting each surface of the replica substrate 10 ′ with the resist layer 81 in each region.

  After forming the resist pattern 91 in this manner, the hard mask layer is etched by a dry etching method or the like using the resist pattern 91 as a mask, and the remaining resist pattern 91 is removed. Thereby, the hard mask pattern HP 'can be formed on each surface of the duplicate substrate 10'. Then, using the hard mask pattern HP ′ as a mask, each surface of the replica substrate 10 ′ is etched by a dry etching method to remove the remaining hard mask pattern. Thereby, the replica 1 'of the data storage medium 1 can be produced.

  In order to restore data from the data storage medium 1 having the above-described configuration, the data reading device 100 having the same configuration as that of the first embodiment can be used. In the second embodiment, the scanning unit 112 may scan the imaging unit 111 so as to capture each surface 2A of the base material 2 'of the data storage medium 1.

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the first embodiment, the data storage medium 1 is formed by arranging a plurality of unit storage areas UA in a matrix in the storage area SA defined on the curved surface 23 of the substrate 2. However, the present invention is not limited to such an embodiment. For example, the unit storage area UA may not be provided, and a data pattern representing a bit string of data may be formed in the storage area SA. The storage area SA may also be defined on the first surface 21 and the second surface 22.

  In the first embodiment, the unit data pattern 30 may be formed in all the unit storage areas UA in the storage area SA defined in the curved surface 23 of the base material 2 of the data storage medium 1 or a part thereof. The unit data pattern 30 may not be formed in the unit storage area UA. In the second embodiment, the unit storage area UA in which the unit data pattern 30 (concave part 31 and convex part 32) in the storage area SA in each surface 2A of the base 2 'of the data storage medium 1 is formed. The number and arrangement may be different. For example, in the storage area SA of one surface 2A, the unit data pattern 30 is formed in all the unit storage areas UA1, but in the storage area SA of the other surface 2A, some unit storage areas UA are included. A unit data pattern 30 may be formed.

  In the first embodiment, the address pattern 40 is an example in which a pattern imitating Braille representing numbers of row numbers and column numbers (see FIG. 9) is expressed by an uneven structure (concave portion 41 and convex portion 42). However, the present invention is not limited to this embodiment. The address pattern 40 may be, for example, a pattern indicating the coordinates (X, Y) or serial number of the unit storage area UA in the storage area SA (for example, a pattern imitating Braille representing those numbers).

  In the second embodiment, the boundary pattern BP has a substantially T-shape (see FIG. 25) as a whole in which a plurality of concave portions are arranged in parallel, but is not limited to such a mode. For example, a shape in which a plurality of concave portions are arranged in a substantially cross shape may be used, or a shape in which a plurality of concave portions are arranged in a substantially L shape may be used.

  In the first and second embodiments, the boundary pattern BP is formed by arranging a plurality of concave portions in parallel, but is not limited to this mode. For example, the boundary pattern BP may be configured by one concave portion having a substantially L shape, a substantially cross shape, or a substantially T shape. In this case, the width of the concave portion in the short direction may be substantially the same as the size of the concave portion 31 constituting the unit data pattern 30.

  In the first and second embodiments, dummy patterns that are not related to the unit data pattern 30, the reading direction index pattern 50, the address pattern 40, and the boundary pattern BP may be formed in the storage area SA. The dummy pattern may be formed so that the pattern density of the curved surface 23, the side surface 24, or each surface 2A is uniform in the data non-storage area NA and the blank area in the unit storage area UA. By forming such a dummy pattern, it is possible to make it difficult to cause a pattern defect in an imprint process when a replica of the data storage medium 1 is produced.

In the first and second embodiments, resist patterns R ₃₀ and R ₄₀ having openings at portions corresponding to the unit data pattern 30 and the address pattern ₄₀ are formed by using a positive energy beam sensitive resist material. The embodiment of producing the data storage medium 1 in which the unit data pattern 30 and the address pattern 40 are formed with the concave portion (hole) and the portion having no concave portion has been described as an example. However, the present invention is not limited to such a mode. . For example, a resist pattern in which a resist is left in portions corresponding to the unit data pattern 30 and the address pattern 40 may be formed using a positive type or negative type energy ray sensitive resist material. Thereby, the data storage medium 1 having the unit data pattern 30 and the address pattern 40 as convex portions (pillars) and portions having no convex portions can be manufactured.

  In the first and second embodiments, the extraction direction of the concavo-convex structure of the unit data pattern 30 is determined from the image data acquired by the image data acquisition unit 110 of the data reading device 100, and the concavo-convex structure is extracted according to the extraction direction. The unit data (unit bit string) is read out, but it is not limited to such a mode. For example, the positional relationship of the unit storage area UA with respect to the normal position of the image data is determined from the image data acquired by the image data acquisition unit 110, and when the unit storage area UA does not match the normal position of the image data. The image data may be rotated to return to the normal position, and the concave / convex structure may be extracted in a matrix arrangement from the upper left to the lower right to read out the unit data (unit bit string).

  In the data reading apparatus 100 according to the first embodiment, when the image capturing unit 111 captures an image, one unit image data including the reading direction index pattern 50 is acquired, and the data storage medium 1 is located at the normal position from the unit image data. It is possible to have an alert function for notifying the operator that the position is held in the normal position when it is determined whether the position is held in the normal position.

  In the data reading apparatus 100 according to the first and second embodiments, each of the image data in the storage area SA or each of the storage areas SA by the imaging unit 111 is converted into two or more without considering the arrangement of the unit storage areas UA. Each image data of the divided area may be acquired. In this case, the image data (when each image data of an area obtained by dividing the storage area SA into two or more is acquired, the respective image data or their image data is synthesized to each of the entire storage areas SA. The direction in which the concave portion 31 and the convex portion 32 of the unit data pattern 30 formed in the unit storage area UA are extracted is determined from the image data including the unit data, and the unit data combination order that can be read from the image data is indicated. What is necessary is just to produce | generate joining order data. Then, the concave portion 31 and the convex portion 32 of the unit data pattern 30 are extracted according to the extraction direction, the unit data is read, and the unit data is combined according to the combination order data to generate data.

  The data reading apparatus 100 according to the first embodiment may include a plurality of imaging units 111. For example, four imaging units 111 are arranged at 90 ° intervals along the circumferential direction of the curved surface 23 of the data storage medium 1, and each image pickup is performed while the data storage medium 1 is rotated 90 ° about the axis C. The unit 111 may image the unit storage area UA included in an area of ¼ (90 ° along the circumferential direction) of the curved surface 23. Thereby, the imaging time of each unit storage area UA in the storage area SA of the data storage medium 1 can be shortened.

  In the first and second embodiments, when data stored / recorded in the data storage medium 1 is read, all unit data patterns 30 and the like formed in the storage area SA of the data storage medium 1 are rigid. The image data may be acquired by transferring to a resin layer formed on the substrate having the image, and capturing an inverted pattern of the unit data pattern 30 formed on the resin layer by the imaging unit 111, or masking the resin layer Alternatively, the substrate having rigidity may be etched, and the uneven pattern formed on the substrate may be imaged by the imaging unit 111 to obtain image data. Thereby, the storage area SA defined in the curved surface 23 or the side surface 24 of the base material 2 and each surface 2A of the base material 2 ′ formed of a polyhedron can be converted into two dimensions. Therefore, it is only necessary to scan the imaging unit 111 on a two-dimensional plane, and data can be read out by a simple method. For example, in the data storage medium 1 according to the first embodiment, the same as the resin mold 71 (see FIG. 14B) used when producing the replica 1 ′ (see FIG. 15D). A device having a configuration or the like can be used as a medium for reading data. Further, in the data storage medium 1 according to the second embodiment, the area corresponding to the storage area SA of each surface 2A used when manufacturing the data storage medium 1 is a polyhedron constituting the base material 2 ′. Mold M (see FIG. 26) arranged in parallel in a developed pattern (see FIG. 21 and FIG. 22). A medium having a similar configuration can be used as a medium for reading data.

DESCRIPTION OF SYMBOLS 1 ... Data storage medium 2 ... Base material 21 ... 1st surface 22 ... 2nd surface 23 ... Curved surface 24 ... Side surface 2A ... Surface 30 ... Unit data pattern 31 ... Concave part 32 ... Convex part 40 ... Address pattern 50 ... Reading direction parameter | index Pattern SA ... Storage area UA ... Unit storage area NA ... Data non-storage area Gr ... Virtual grid PI ... Intersection

Claims (30)

A data storage medium in which data is stored,
A substrate composed of a three-dimensional shape including at least a curved surface;
A data pattern that is formed in at least a storage area defined on the curved surface, and that expresses the content of the data by an uneven structure;
The concavo-convex structure of the data pattern includes a concave portion and a convex portion corresponding to each bit of the data bit string of the data. On the curved surface, a reading direction index indicating information related to the reading direction of the data bit string expressed by the concavo-convex structure of the data pattern formed in the storage area so as to correspond to the storage area A pattern is formed,
The data storage medium according to claim 1, wherein the reading direction indicator pattern is formed at a position where the reading direction of the data bit string expressed by the uneven structure of the data pattern can be specified. The base material has a substantially cylindrical shape having the curved surface as a side surface;
The data storage medium according to claim 2, wherein the reading direction index pattern has a shape indicating one direction along a circumferential direction of the curved surface.   The data storage medium according to claim 2, wherein the reading direction index pattern is configured by an uneven structure.   The data storage medium according to claim 4, wherein the concavo-convex structure constituting the data pattern and the concavo-convex structure constituting the reading direction indicator pattern have substantially the same dimensions. A data non-storage area located outside the storage area is defined on the curved surface,
The data storage medium according to claim 1, wherein the reading direction index pattern is formed in the data non-storage area. The storage area includes a plurality of unit storage areas,
The data pattern includes a plurality of unit data patterns each representing a data bit string of a plurality of unit data obtained by dividing the data into a plurality of unit data structures corresponding to each bit of the data bit string,
The data storage medium according to claim 1, wherein each unit data pattern is formed in each unit storage area.   The data storage medium according to claim 7, wherein the curved surface has a radius of curvature that allows at least one of the unit storage areas to be imaged.   The data storage medium according to claim 8, wherein the radius of curvature is 12.5 mm or more.   10. The data storage according to claim 7, wherein an address pattern indicating position information of each unit storage area is formed on the curved surface in correspondence with each of the plurality of unit storage areas. Medium. The plurality of unit storage areas are arranged in parallel in a matrix arrangement of M rows × N columns (one of M and N is an integer of 2 or more and the other is an integer of 1 or more),
The address pattern represents a p-th row (p is an integer from 1 to M) and a q-th column (q is an integer from 1 to N) that are parallel positions of the unit storage areas. The data storage medium according to claim 10, wherein the data storage medium is configured by an uneven structure.   The data storage medium according to claim 10 or 11, wherein the concavo-convex structure forming the data pattern and the concavo-convex structure forming the address pattern have substantially the same dimensions.   The data storage medium according to claim 7, wherein a boundary pattern indicating a boundary between the adjacent unit storage areas is formed on the curved surface. A data storage medium in which data is stored,
A substrate composed of a polyhedron,
It is formed in a storage area defined on each surface of the base material, and comprises a data pattern that expresses the content of the data by a concavo-convex structure,
In the polyhedron, a data storage medium in which an angle located inside the polyhedron formed by two adjacent surfaces sharing one side is 90 ° or more, and at least one of the angles is greater than 90 °. .   The data storage medium according to claim 14, wherein the angle that is greater than 90 ° is greater than 90 ° and equal to or less than 270 °.   The data storage medium according to claim 14 or 15, wherein each surface constituting the polyhedron is continuous so that one stroke can be written in a development view in which the polyhedron is developed.   The data storage medium according to claim 14 or 15, wherein the polyhedron is a regular dodecahedron or a regular icosahedron.   The data storage medium according to claim 14 or 15, wherein the polyhedron is an antipolyhedron.   The data storage medium according to claim 14, wherein the polyhedron is a convex polyhedron or a concave polyhedron.   The data storage medium according to any one of claims 14 to 19, wherein a reading order index pattern indicating information relating to a reading order of each surface is formed on each surface constituting the polyhedron.   The data storage medium according to claim 20, wherein the reading order index pattern is configured by an uneven structure.   The data storage medium according to claim 20 or 21, wherein the concavo-convex structure constituting the data pattern and the concavo-convex structure constituting the reading order index pattern have substantially the same dimensions.   23. The data storage medium according to claim 14, wherein an address pattern indicating position information of the storage area defined on each surface is formed on each surface constituting the polyhedron. A method for manufacturing the data storage medium according to claim 1,
Preparing a data storage medium having a substrate composed of a three-dimensional shape including at least a curved surface;
Defining a storage area on the curved surface of the data storage medium, and setting a virtual grid in the storage area;
Forming a resist pattern corresponding to the data pattern indicating the content of the data so that the concave and convex portions of the resist pattern are positioned on the intersection of the virtual grid in the storage area;
Etching the curved surface of the data storage medium using the resist pattern as a mask.   25. The method for manufacturing a data storage medium according to claim 24, wherein the resist pattern is formed by an imprint process using a flexible resin mold having a concavo-convex pattern corresponding to the resist pattern.   The data according to claim 24, wherein a mold having a concavo-convex pattern corresponding to the resist pattern and having rigidity is prepared, and the resist pattern is formed on the curved surface by rolling the base material on the mold. A method for producing a storage medium. A hard mask layer is formed on the curved surface of the data storage medium;
Etching the hard mask layer using the resist pattern as a mask to further form a hard mask pattern;
27. The method of manufacturing a data storage medium according to claim 24, wherein, in the step of etching the curved surface of the data storage medium, the hard mask pattern is used as a mask instead of the resist pattern or together with the resist pattern. Method. A method of manufacturing a data storage medium in which data is stored,
Each of the angles formed inside the polyhedron formed by a polyhedron and formed by two adjacent surfaces sharing one side of the polyhedron is 90 ° or more, and at least one of the angles is 90 °. Preparing a data storage medium having a substrate that is super;
Defining a storage area on each side of the data storage medium, and setting a virtual grid in the storage area;
Forming a resist pattern corresponding to a data pattern indicating the content of the data so that the concave and convex portions of the resist pattern are positioned on the intersection of the virtual grid in the storage area;
Manufacturing the data storage medium including the step of etching the surfaces of the data storage medium using the resist pattern as a mask to form the data pattern expressing the data contents in a concavo-convex structure on the surfaces. Method. Each surface constituting the polyhedron is continuous so that it can be drawn with a single stroke in the developed view of the polyhedron,
A template is prepared in which a concavo-convex pattern corresponding to the resist pattern is formed in the development drawing region where each surface is continuous so that one stroke can be written, and the template is formed on the concavo-convex pattern in the development drawing region in the template. 29. The method of manufacturing a data storage medium according to claim 28, wherein the resist pattern is formed on each surface of the polyhedron while rolling the polyhedron. A hard mask layer is formed on each surface of the data storage medium,
Etching the hard mask layer using the resist pattern as a mask to further form a hard mask pattern;
30. The method of manufacturing a data storage medium according to claim 28, wherein, in the step of etching each surface of the data storage medium, the hard mask pattern is used as a mask instead of the resist pattern or together with the resist pattern.

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