JP6384570B2 - Information storage device and information reading device - Google Patents

Description

  The present invention relates to a technique for writing and storing information on a durable information recording medium and reading information from the written information recording medium.

  Paper has long been used as a medium for recording various information, and even today, a lot of information is recorded on paper. On the other hand, with the development of industry, films for recording image information and record boards for recording sound information have come to be used. In recent years, with the spread of computers, a medium for recording digital data As a result, magnetic recording media, optical recording media, semiconductor recording media, and the like have been used.

  The above-described information recording medium has durability to the extent that it does not hinder use depending on the application. For example, an information recording medium such as a printed matter of paper, a film, or a record board can be said to have sufficient durability on a time scale of several years. However, when viewed on a time scale such as several decades, deterioration due to aging is unavoidable, and the recorded information may be lost. Moreover, it may be damaged not only by aging but also by the action of water and heat.

  Also, magnetic recording media for computers, optical recording media, semiconductor recording media, etc. have durability that does not hinder the use of general electronic equipment, but in the first place it is a time scale of several decades. Since it is not designed in consideration of durability, it is not suitable for permanent information storage.

  On the other hand, in Patent Document 1 below, as a method of recording information on a durable medium such as quartz glass while increasing the recording capacity, a three-dimensional difference in light transmittance is measured on a minute cell in a cylindrical medium. In particular, a method is disclosed in which data is recorded and information is read using a computer tomography technique while rotating the medium. Further, in Patent Document 2, in order to achieve the same object, the difference in transmittance is measured by irradiating electromagnetic waves while changing the irradiation angle to a cylindrical recording medium, and the computer tomography technique is also used. A method of reading information using it is disclosed.

Japanese Patent No. 4991487 Japanese Patent No. 5286246

  As described above, information recording media that are generally used at present are designed in consideration of durability of several years to several tens of years, and therefore have a long time scale of hundreds to thousands of years. It is inappropriate to leave information for future generations. For example, a physically or chemically weak information recording medium such as paper, film, or record board cannot be expected to have durability for a long period of several hundred years to thousands of years. Of course, computer information recording media such as magnetic recording media, optical recording media, and semiconductor recording media are also unsuitable for such applications.

  In human history, stone monuments exist as information recording media that have passed time scales of hundreds to thousands of years. However, it is very difficult to record information on a stone board with a high degree of integration. A stone board is not suitable as a medium for recording large amounts of information such as digital data.

  On the other hand, if a method of recording information three-dimensionally using quartz glass on a cylinder as a medium as in the techniques disclosed in the above-mentioned Patent Documents 1 and 2, the durability is considerably long-term. Thus, an information recording method capable of achieving high integration while maintaining the performance can be realized. However, at the time of reading, it is necessary to extract information from cells that are three-dimensionally distributed in the medium. Therefore, it is necessary to perform a Fourier transform process using a computer tomography technique. In other words, even after a long time scale of hundreds to thousands of years, information cannot be read out unless the same computer tomography technology as that used for recording is inherited.

  Accordingly, the present invention provides an information storage method and apparatus capable of recording information with a high degree of integration while maintaining long-term durability, and capable of reading information by a universal method. Furthermore, it aims at providing the method and apparatus for reading the original information from the medium by which the information was preserve | saved by such a method.

(1) According to a first aspect of the present invention, there is provided an information storage device for writing and storing digital data in an information recording medium.
A data input unit for inputting digital data to be stored;
A unit data generation unit that generates a plurality of unit data by dividing digital data by a predetermined bit length unit;
A unit bit matrix generation unit that generates a unit bit matrix by arranging data bits constituting individual unit data in a two-dimensional matrix;
A unit bit graphic pattern generation unit that generates a unit bit graphic pattern by converting a unit bit matrix into a geometric pattern arranged in a predetermined bit recording area;
A unit recording graphic pattern generation unit for generating a unit recording graphic pattern by adding an alignment mark to the unit bit graphic pattern;
A drawing data generation unit for generating drawing data for drawing a unit recording graphic pattern;
A beam exposure apparatus that performs beam exposure using an electron beam or laser light on a substrate serving as an information recording medium based on drawing data;
A patterning apparatus that generates an information recording medium on which a physical structure pattern corresponding to drawing data is formed by performing a patterning process on the exposed substrate;
Is provided.

(2) According to a second aspect of the present invention, in the information storage device according to the first aspect described above,
The beam exposure apparatus has a function of performing beam exposure on the surface of the resist layer for a substrate having a layer to be molded and a resist layer covering the layer to be molded,
A patterning device includes a development processing unit for performing processing in which a substrate is impregnated with a developer having a property of dissolving an exposed portion or a non-exposed portion of the resist layer, and a part thereof is a remaining portion, and a remaining portion of the resist layer. And an etching processing unit that performs etching on the layer to be molded as a mask.

(3) According to a third aspect of the present invention, in the information storage device according to the second aspect described above,
The unit bit figure pattern generation unit converts any one of individual bits “1” and individual bits “0” constituting the unit bit matrix into individual bit figures consisting of closed regions,
The drawing data generation unit generates drawing data indicating the outline of each bit figure,
The beam exposure apparatus performs beam exposure on the inner part of the contour line of each bit figure.

(4) According to a fourth aspect of the present invention, in the information storage device according to the first to third aspects described above,
The patterning apparatus forms a physical structure pattern having a concavo-convex structure including a concave portion indicating one of the bit “1” and the bit “0” and a convex portion indicating the other.

(5) According to a fifth aspect of the present invention, in the information storage device according to the fourth aspect described above,
The patterning apparatus forms a physical structure pattern having an additional layer made of a light-reflective or light-absorbing material on the surface of one or both of the concave portion and the convex portion.

(6) According to a sixth aspect of the present invention, in the information storage device according to the first to third aspects described above,
The patterning apparatus forms a physical structure pattern having a network structure composed of through-holes indicating one of the bits “1” and “0” and a non-hole portion indicating the other.

(7) According to a seventh aspect of the present invention, in the information storage device according to the first to sixth aspects described above,
The unit data generation unit divides the digital data into unit data composed of (m × n) bits,
The unit bit matrix generation unit generates a unit bit matrix consisting of m rows and n columns,
The unit bit figure pattern generation unit associates individual bits constituting the unit bit matrix with lattice points arranged in a matrix of m rows and n columns, and on the lattice point corresponding to the bit “1” or the bit “0”. A unit bit graphic pattern is generated by arranging a bit graphic of a predetermined shape on the screen.

(8) According to an eighth aspect of the present invention, in the information storage device according to the seventh aspect described above,
The unit bit graphic pattern generation unit generates a unit bit graphic pattern arranged in a rectangular bit recording area,
The unit recording graphic pattern generation unit adds an alignment mark outside the rectangular bit recording area, so that the unit recording arranged in the rectangular unit recording area including the bit recording area and the alignment mark Generate graphic patterns,
A drawing data generator generates a drawing pattern including a plurality of unit recording graphic patterns by arranging rectangular unit recording areas in a two-dimensional matrix, and drawing for drawing the drawing pattern The data is generated.

(9) According to a ninth aspect of the present invention, in the information storage device according to the eighth aspect described above,
The unit recording graphic pattern generation unit adds a total of two sets of alignment marks arranged near the outside of the two diagonal corners of the four corners of the rectangular bit recording area. A graphic pattern is generated.

(10) According to a tenth aspect of the present invention, in the information storage device according to the eighth aspect described above,
The unit recording graphic pattern generation unit generates a unit recording graphic pattern by adding a total of three sets of alignment marks arranged near the outside of the four corners of the rectangular bit recording area. In addition, the unit recording graphic patterns adjacent to each other are arranged in different manners in the arrangement of the three sets of alignment marks.

(11) An eleventh aspect of the present invention is the information storage device according to the ninth or tenth aspect described above,
The unit recording graphic pattern generation unit sets a specific unit recording area as a reference unit recording area, and for the reference unit recording area, a unit recording graphic using a reference alignment mark different from other unit recording areas A pattern is generated.

(12) In a twelfth aspect of the present invention, in the information storage device according to the first to eleventh aspects described above,
A data input unit, unit data generation unit, unit bit matrix generation unit, unit bit graphic pattern generation unit, unit recording graphic pattern generation unit, and drawing data generation unit are configured by incorporating a program into a computer. It is a thing.

  (13) A thirteenth aspect of the present invention is a data input unit, unit data generation unit, unit bit matrix generation unit, unit bit figure pattern generation unit, unit in the information storage device according to the first to eleventh aspects described above. A program for causing a computer to function as a recording graphic pattern generation unit and a drawing data generation unit is prepared.

(14) According to a fourteenth aspect of the present invention, there is provided an information reading device for reading digital data stored in an information recording medium using the information storage device according to the first aspect described above.
An image capturing device that captures an image of an image capturing area that forms a part of the recording surface of the information recording medium and captures the obtained captured image as image data;
A captured image storage unit for storing captured images;
A bit recording area recognition unit for recognizing individual bit recording areas by detecting an alignment mark from the captured image stored in the captured image storage unit;
A unit bit matrix recognition unit for recognizing a unit bit matrix based on a pattern in the bit recording area;
A scanning control unit that performs control to change the shooting target area by the image shooting device so that shot images of all the bit recording areas to be read are obtained;
A data restoration unit that generates unit data from each unit bit matrix recognized by the unit bit matrix recognition unit and combines the individual unit data to restore the digital data to be stored;
Is provided.

(15) According to a fifteenth aspect of the present invention, there is provided an information reading device for reading digital data stored in an information recording medium using the information storage device according to the eleventh aspect.
An image capturing device that captures an image of an image capturing area that forms a part of the recording surface of the information recording medium and captures the obtained captured image as image data;
A captured image storage unit for storing captured images;
A bit recording area recognition unit for recognizing individual bit recording areas by detecting an alignment mark from the captured image stored in the captured image storage unit;
A unit bit matrix recognition unit for recognizing a unit bit matrix based on a pattern in the bit recording area;
A scanning control unit that performs control to change the shooting target area by the image shooting device so that shot images of all the bit recording areas to be read are obtained;
A data restoration unit that generates unit data from each unit bit matrix recognized by the unit bit matrix recognition unit and combines the individual unit data to restore the digital data to be stored;
Provided,
The image photographing apparatus has a function of photographing a photographing target area having a size that can include at least one unit recording area,
The scanning control unit controls the image photographing apparatus to adjust the photographing target region so that a photographed image of the region including the reference unit recording region is obtained based on the reference alignment mark, and then the unit recording region In accordance with the arrangement pitch, control for sequentially moving the imaging target area is performed.

(16) According to a sixteenth aspect of the present invention, in the information reading device according to the fourteenth or fifteenth aspect described above,
A captured image storage unit, a bit recording area recognition unit, a unit bit matrix recognition unit, a scanning control unit, and a data restoration unit are configured by incorporating a program into a computer.

  (17) According to a seventeenth aspect of the present invention, there is provided a captured image storage unit, a bit recording area recognition unit, a unit bit matrix recognition unit, a scanning control unit, and a data restoration in the information reading apparatus according to the fourteenth or fifteenth aspect described above. A program for causing a computer to function as a part is prepared.

(18) An eighteenth aspect of the present invention is an information storage method for writing and storing digital data in an information recording medium,
A data input stage in which a computer inputs digital data to be stored;
A unit data generation stage in which the computer generates a plurality of unit data by dividing the digital data by a predetermined bit length unit;
A unit bit matrix generation stage in which a computer generates a unit bit matrix by arranging data bits constituting individual unit data in a two-dimensional matrix; and
A unit bit graphic pattern generation stage in which a computer generates a unit bit graphic pattern by converting a unit bit matrix into a geometric pattern arranged in a predetermined bit recording area;
A unit recording graphic pattern generation stage in which a computer generates a unit recording graphic pattern by adding an alignment mark to the unit bit graphic pattern;
A drawing data generation stage in which a computer generates drawing data for drawing a unit recording graphic pattern;
A beam exposure step of performing beam exposure using an electron beam or laser light on a substrate serving as an information recording medium based on the drawing data;
A patterning step for generating an information recording medium on which a physical structure pattern corresponding to drawing data is formed by performing a patterning process on the exposed substrate;
Is to do.

(19) According to a nineteenth aspect of the present invention, there is provided an information reading method for reading digital data stored in an information recording medium using the information storing method according to the eighteenth aspect described above.
Using an image capturing device, an image capturing stage that captures an image of an image capturing area that forms part of the recording surface of the information recording medium and captures the captured image as image data;
A captured image storage stage in which a computer stores captured images;
A bit recording area recognition stage for recognizing individual bit recording areas by detecting an alignment mark from the captured image stored in the captured image storage stage;
A unit bit matrix recognition stage in which a computer recognizes a unit bit matrix based on a pattern in a bit recording area;
A data restoration stage in which the computer generates unit data from the individual unit bit matrix recognized in the unit bit matrix recognition stage, and synthesizes the individual unit data to restore the digital data to be stored;
And
In the image shooting stage, the computer performs control to change the shooting target area by the image shooting apparatus so that shot images of all the bit recording areas to be read are obtained.

  According to the present invention, digital data to be stored is divided into a plurality of unit data, converted into a unit bit matrix, and then converted into a geometric figure pattern. This graphic pattern is transferred onto the substrate by beam exposure using an electron beam or laser light, and is recorded as a fine physical structure pattern by performing a patterning process. Therefore, information can be recorded with a high degree of integration while maintaining long-term durability. Moreover, since the graphic pattern itself transferred onto the substrate is a two-dimensional pattern, information can be read out by a universal method.

It is a block diagram which shows the structure of basic embodiment of the information storage apparatus which concerns on this invention. It is a schematic diagram which shows an example of the specific information storage process by the information storage apparatus shown in FIG. FIG. 3 is an enlarged view of a unit recording graphic pattern R (U1) shown in FIG. 2. It is a sectional side view which shows the specific example of the exposure process by the beam exposure apparatus 200 shown in FIG. 1, and the patterning process by the patterning apparatus 300 (only a cut surface is shown and illustration of a back structure is abbreviate | omitted). It is a sectional side view which shows the variation of the information recording medium with which information was written by this invention (only a cut surface is shown and illustration of a back structure is abbreviate | omitted). It is a block diagram which shows the structure of basic embodiment of the information reading device which concerns on this invention. It is a top view which shows the variation of the alignment mark used for this invention. It is a top view which shows the variation of the arrangement | positioning form of the alignment mark in this invention. It is a top view which shows another variation of the alignment mark used for this invention. It is a top view which shows another variation of the arrangement | positioning form of the alignment mark in this invention. It is a flowchart which shows the basic process sequence of the information storage method which concerns on this invention. It is a flowchart which shows the basic process sequence of the information reading method which concerns on this invention.

  Hereinafter, the present invention will be described based on the illustrated embodiments.

<<< §1. Basic embodiment of information storage apparatus according to the present invention >>
FIG. 1 is a block diagram showing a configuration of a basic embodiment of an information storage device according to the present invention. The information storage device according to this embodiment is a device that performs the function of writing and storing digital data on an information recording medium, and includes a storage processing computer 100, a beam exposure device 200, and a patterning device 300, as shown. .

  Here, the storage processing computer 100 executes a process of creating the drawing data E based on the digital data D to be stored. The beam exposure apparatus 200 is an apparatus that performs beam exposure using an electron beam or laser light on a substrate S serving as an information recording medium based on the drawing data E. A drawing pattern is formed. The patterning apparatus 300 forms a physical structure pattern according to the drawing data E by performing a patterning process on the exposed substrate S, and creates an information recording medium M. Eventually, information corresponding to the digital data D is recorded on the information recording medium M as a physical structure pattern.

  As shown in the figure, the storage processing computer 100 includes a data input unit 110, a unit data generation unit 120, a unit bit matrix generation unit 130, a unit bit graphic pattern generation unit 140, a unit recording graphic pattern generation unit 150, and a drawing data generation unit. 160. Hereinafter, functions of these units will be described in order. However, each of these units is actually a component realized by incorporating a dedicated program into the computer, and the storage processing computer 100 can be configured by installing a dedicated program on a general-purpose computer. it can.

  First, the data input unit 110 is a component having a function of inputting digital data D to be stored, and also has a function of temporarily storing the input digital data D. The digital data D to be stored may be in any form such as document data, image data, and audio data.

  The unit data generation unit 120 is a component that generates a plurality of unit data by dividing the digital data D input by the data input unit 110 into predetermined bit length units. Here, for convenience of explanation, as shown in the upper part of FIG. 2, the following explanation will be given with an example in which four sets of unit data are generated by dividing the digital data D in units of the bit length u. And the i-th unit data is indicated by a symbol Ui (i = 1 to 4 in this example). Hereinafter, the terms having the phrase “unit” used in the present application are all created for “one unit data”.

  The bit lengths of the individual unit data Ui are not necessarily equal, and a plurality of unit data having different bit lengths may be generated. However, for practical use, it is preferable that a bit recording area Ab described later is an area having the same shape and the same area. For this purpose, a common bit length u is determined in advance, and all unit data Ui have the same bit length u. It is preferable that the data has

  The common bit length u can be set to an arbitrary value. However, in practice, u = m × n is set so that a unit bit matrix of m rows and n columns can be formed. The generation unit 120 may divide the digital data into unit data composed of (m × n) bits. Here, for convenience of explanation, an example in which u = 25 bits is set so that a unit bit matrix of 5 rows and 5 columns can be configured by setting m = n = 5 (practically, u The value is preferably set to a larger value). The first unit data U1 shown in FIG. 2 is unit data generated based on such settings, and is composed of 25-bit data.

  For example, the unit data generation unit 120 may divide the input digital data D by dividing it into u bits from the beginning, and set them as unit data U1, U2, U3,. In this case, if the entire length of the digital data D is not an integral multiple of the bit length u, the length of the last unit data does not reach the bit length u. Therefore, when it is desired to align the lengths of all unit data to the common bit length u, a dummy bit is added to the end of the digital data D so that the overall length is an integral multiple of the bit length u. Adjust it.

  Note that the method of dividing the digital data D is not necessarily limited to a method of dividing the digital data D by a predetermined bit length u from the beginning. For example, when dividing into four, the first, fifth, ninth,. Are extracted as the first unit data U1, the extracted second, sixth, tenth,... Bits as the second unit data U2, and the third, seventh,. A division method such that the third unit data U3 is obtained by extracting the th bit, and the fourth unit data U4 is obtained by extracting the fourth, eighth, twelfth,... Bits. It is also possible to take.

  The individual unit data Ui generated by the unit data generation unit 120 is given to the unit bit matrix generation unit 130. The unit bit matrix generation unit 130 performs a process of generating a unit bit matrix B (Ui) by arranging data bits constituting each unit data Ui in a two-dimensional matrix of m rows and n columns.

  In FIG. 2, the 25-bit data constituting the first unit data U1 is divided into 5 bits from the beginning, and “11101”, “10110”, “010001”, “11001”, “10110” 5 An example is shown in which a unit bit matrix B (U1) consisting of a matrix of 5 rows and 5 columns in which groups are formed and individual groups are arranged in one row is shown. Of course, the unit bit matrices B (U2), B (U3), and B (U4) are generated for the unit data U2, U3, and U4 by the same method.

  The individual unit bit matrix B (Ui) generated by the unit bit matrix generation unit 130 in this way is given to the unit bit figure pattern generation unit 140. The unit bit figure pattern generation unit 140 converts each unit bit matrix B (Ui) into a geometric pattern arranged in a predetermined bit recording area on a two-dimensional plane, thereby generating a unit bit figure pattern. A process of generating P (Ui) is performed.

  The middle part of FIG. 2 shows an example of a unit bit figure pattern P (U1) created based on a unit bit matrix B (U1) consisting of a 5 × 5 matrix. In this example, a square bit recording area Ab (area shown by a broken line in the figure) is defined on a two-dimensional plane, and a small square dot (hereinafter referred to as a bit figure) painted black is placed therein. As a result, the unit bit figure pattern P (U1) is formed.

  Here, each bit figure corresponds to the bit “1” constituting the unit bit matrix B (U1). In other words, a 5 × 5 matrix is defined in the bit recording area Ab corresponding to the unit bit matrix B (U1), and corresponds to the bit “1” in the unit bit matrix B (U1). A bit figure is arranged only at the position, and nothing is arranged at the position corresponding to the bit “0”. Therefore, this unit bit figure pattern P (U1) expresses 25-bit information constituting the unit bit matrix B (U1) by the presence or absence of the bit figure at each position constituting the 5 × 5 matrix. It will be.

  Of course, each bit figure may be arranged in correspondence with the bit “0” constituting the unit bit matrix B (U1). In this case, the bit figure is arranged only at the position corresponding to the bit “0” in the unit bit matrix B (U1), and nothing is arranged at the position corresponding to the bit “1”. In short, the unit bit figure pattern generation unit 140 converts any one of the individual bits “1” and individual bits “0” constituting the unit bit matrix B (U1) into individual bit figures formed of a closed region. The process of converting to Note that the format of data indicating individual bit figures may be any format. For example, if one bit figure is composed of rectangles, the coordinate values of the four vertices of each bit figure (or the coordinate values of two diagonal vertices) may be used as data indicating the unit bit figure pattern P (U1). Can be used, or data indicating the coordinate value of the center point (or lower left corner point, etc.) of each bit graphic and data indicating the length of the horizontal and vertical sides of the bit graphic having a common rectangular shape Can also be used. Alternatively, if a circular bit graphic is employed, data indicating the coordinate value of the center point of each bit graphic and data indicating a common radius value can be used.

  Of course, the unit bit matrices B (U2), B (U3), and B (U4) generated for the unit data U2, U3, and U4 are also converted into a geometric pattern by the same method, and the unit bit figure pattern P (U2), P (U3), and P (U4) are generated. If the unit bit figure patterns P (U1) to P (U4) generated in this way are formed on the medium by some method, the information of the digital data D can be recorded on the medium. However, in the present invention, an alignment mark is added to each of the unit bit figure patterns P (U1) to P (U4) in consideration of the convenience of the reading process performed later.

  The unit recording graphic pattern generation unit 150 is a component that adds the alignment mark. In the present application, the unit bit graphic pattern P (Ui) with the alignment mark added is used as the unit recording graphic. This is called pattern R (Ui). Eventually, the unit recording graphic pattern generation unit 150 adds an alignment mark to the unit bit graphic pattern P (Ui) generated by the unit bit graphic pattern generation unit 140 to generate a unit recording graphic pattern R (Ui). Processing will be performed.

  The middle part of FIG. 2 shows an example in which a unit recording graphic pattern R (U1) is generated by adding cross-shaped alignment marks Q to the outer four corners of the unit bit graphic pattern P (U1). Here, an area including the bit recording area Ab (dashed square) in which the unit bit figure pattern P (U1) is formed and the alignment marks Q arranged at the four outer corners is defined as a unit recording area Au ( It will be called a one-dot chain line square). The unit recording graphic pattern R (U1) is a graphic pattern formed in the unit recording area Au.

  The alignment mark Q is used for recognizing individual bit recording areas Ab in the reading process described in §3. Therefore, the alignment mark Q is arranged at a specific position with respect to the bit recording area Ab (in the illustrated example, positions at the four outer corners of the bit recording area Ab). In the example shown in the figure, an example using a cross-shaped alignment mark Q is shown, but a figure that can be distinguished from a bit figure representing each bit (in the example shown, a small black square). Any shape can be used as long as it is.

  In the illustrated example, the alignment mark Q is arranged outside the bit recording area Ab. However, the alignment mark Q can be arranged inside the bit recording area Ab. However, in the case of being arranged inside the bit recording area Ab, there is a possibility of interference with bit figures representing individual bits. Therefore, in practice, an alignment mark is placed outside the bit recording area Ab as shown in the example in the figure. Q is preferably arranged. Variations in the shape and arrangement of the alignment mark Q will be described again in §4.

  Thus, when the unit recording graphic pattern generation unit 150 generates four sets of unit recording graphic patterns R (U1) to R (U4), the drawing data generation unit 160 generates drawing data E for drawing them. Generate the process. Specifically, as shown in the lower part of FIG. 2, the drawing data generation unit 160 arranges four sets of unit recording areas R (U1) to R (U4) in a two-dimensional matrix ( In the case of this example, a drawing pattern P (E) including all four sets of unit recording graphic patterns R (U1) to R (U4) is generated, and the drawing pattern P (E ) To generate drawing data E for drawing.

  The processing functions of the individual components of the storage processing computer 100 shown in FIG. 1 have been described above. The drawing data E generated in this way is given to the beam exposure apparatus 200. The beam exposure apparatus 200 is an apparatus that performs beam exposure on the exposure target substrate S based on the drawing data E. The beam exposure apparatus 200 is an electron beam drawing apparatus or laser drawing for semiconductor photolithography that is used in various electronic device manufacturing processes. It can be configured using an apparatus. When an electron beam drawing apparatus is used as the beam exposure apparatus 200, a drawing pattern P (E) is drawn on the surface of the exposure target substrate S by an electron beam, and when a laser drawing apparatus is used as the beam exposure apparatus 200, A drawing pattern P (E) is drawn on the surface of the exposure target substrate S by a laser beam.

  In FIG. 2, for convenience of description, the outline of the bit recording area Ab is indicated by a broken line, and the outline of the unit recording area Au is indicated by a one-dot chain line. ) Is not a component. The graphic pattern actually drawn on the exposure target substrate S is a bit graphic representing each bit (in the example shown, a small black square) and a cross-shaped alignment mark Q.

  Thus, since the drawing data E is data used to give the drawing pattern P (E) on the exposure target substrate S by giving it to the beam exposure apparatus 200, the data format is the beam exposure to be used. It is necessary to make it dependent on the device 200. Currently, when an arbitrary graphic pattern is drawn using an electron beam drawing apparatus or a laser drawing apparatus used in general LSI design, vector-type drawing data indicating the contour line of the graphic pattern is used. . Therefore, in practice, the drawing data generation unit 160 may generate the drawing data E indicating the contour lines of individual bit figures and alignment marks.

  FIG. 3 is an enlarged view of the unit recording graphic pattern R (U1) shown in FIG. In FIG. 2, an example of a small square filled with black is shown as a bit figure indicating the bit “1”. However, in the example shown in FIG. 3, each bit figure F is expressed as vector data indicating a square outline. Is done. Similarly, the alignment marks Q1 to Q4 arranged at the four corners are expressed as vector data indicating a cross-shaped outline. The beam exposure apparatus 200 performs a process of performing beam exposure on the inner portion of the contour line based on the drawing data E indicating the contour lines of the individual bit figures F and the alignment marks Q1 to Q4. Therefore, as shown in FIG. 2, a square or cross-shaped graphic pattern painted black is formed on the exposure target substrate S.

  In FIG. 3, horizontal grid lines X1 to X7 arranged at equal intervals and vertical grid lines Y1 to Y7 arranged at equal intervals are drawn. Each of these grid lines plays a role of determining the arrangement positions of the individual bit figures F and the alignment marks Q1 to Q4. That is, if each intersection of the horizontal grid lines X1 to X7 and the vertical grid lines Y1 to Y7 is referred to as a grid point L, each bit figure F and the alignment marks Q1 to Q4 have any center. It arrange | positions so that it may come to the position of the lattice point L of.

  For example, the alignment mark Q1 is disposed on the lattice point where the lattice lines X1 and Y1 intersect, the alignment mark Q2 is disposed on the lattice point where the lattice lines X1 and Y7 intersect, and the alignment mark Q3 is disposed on the lattice line. The alignment mark Q4 is disposed on the lattice point where the lattice lines X7 and Y7 intersect, and the alignment mark Q4 is disposed on the lattice point where X7 and Y1 intersect.

  25 lattice points at which the five horizontal lattice lines X2 to X6 and the five vertical lattice lines Y2 to Y6 intersect each other are the unit bit matrix B (5 × 5) shown in the middle of FIG. U1), the bit figure F is arranged at the grid point position corresponding to the bit “1” in the unit bit matrix B (U1) (as described above, the grid point position corresponding to the bit “0”). In addition, the bit figure F may be arranged).

  Explaining in general terms, the unit bit figure pattern generation unit 140 is a grid point in which individual bits constituting a unit bit matrix B (Ui) having m rows and n columns are arranged in a matrix of m rows and n columns. The unit bit figure pattern P (Ui) may be generated by arranging the bit figure F having a predetermined shape on the lattice point L corresponding to the bit “1” or the bit “0” in association with L.

  Of course, the figure included in the actual drawing data E, that is, the figure included in the drawing pattern P (E) is only the individual bit figure F and the individual alignment marks Q1 to Q4. The lattice lines X1 to X7, Y1 to Y7, the contour line (broken line) of the bit recording area Ab, and the contour line (one-dot chain line) of the unit recording area Au are not actually drawn.

  The drawing data E includes information indicating the actual size of the drawing pattern P (E) to be drawn on the exposure target substrate S. This actual size indicates the drawing accuracy of the beam exposure apparatus 200 to be used. This should be set in consideration.

  Currently, a pattern having a size of about 40 nm can be stably formed on the substrate S by patterning using a high-precision electron beam drawing apparatus used in general LSI design. Therefore, when such an electron beam drawing apparatus is used as the beam exposure apparatus 200, the lattice line interval (pitch of the lattice point L) shown in the figure can be set to about 100 nm, and a bit figure F having a side of about 50 nm. Is sufficiently possible to form. When drawing such a fine graphic pattern, the bit graphic F actually does not become an accurate square, and the alignment marks Q1 to Q4 do not become an accurate cross, but there is no practical problem. .

  In the first place, the bit figure F only needs to play the role of determining the binary state of whether or not a figure is present at the position of the lattice point L, so the shape may be a rectangle, a circle, or an arbitrary shape. Further, since the alignment marks Q1 to Q4 need only serve to indicate the position of the bit recording area Ab, the shape may be any shape as long as it can be distinguished from the bit graphic F. Therefore, if an electron beam drawing apparatus having a performance capable of stably forming a figure having a size of about 40 nm is used, the bit figure F can be arranged at a pitch of about 100 nm vertically and horizontally as described above. Thus, information recording with a high degree of integration becomes possible.

  On the other hand, when a laser drawing apparatus is used as the beam exposure apparatus 200, the spot diameter of the laser beam depends on the wavelength of the laser beam to be used, and its minimum value is about the same as the wavelength. For example, when an ArF excimer laser is used, since the spot diameter is about 200 nm, the degree of integration of information recording is slightly reduced as compared with the case where an electron beam drawing apparatus is used. Information recording with the same degree of integration as the medium is possible.

  In the case of the example shown in FIG. 3, the unit bit figure pattern P (U1) is a pattern arranged in a rectangular (square) bit recording area Ab, and alignment marks Q1 to Q4 are added thereto. The unit recording figure pattern R (U1) formed by doing so is also a pattern arranged in a rectangular (square) unit recording area Au. In carrying out the present invention, the bit recording area Ab and the unit recording area Au do not necessarily have to be rectangular areas. However, as shown in the lower part of FIG. 2, a plurality of unit recording graphic patterns R (U1) Considering that the drawing pattern P (E) is generated by arranging ~ R (U4), it is efficient to set both the bit recording area Ab and the unit recording area Au to rectangular areas.

  Therefore, practically, the unit bit graphic pattern generation unit 140 generates a unit bit graphic pattern P (Ui) arranged in the rectangular bit recording area Ab, and the unit recording graphic pattern generation unit 150 By adding alignment marks Q1 to Q4 outside the rectangular bit recording area Ab, unit recording arranged in the rectangular unit recording area Au including the bit recording area Ab and the alignment marks Q1 to Q4 It is preferable to generate the figure pattern R (Ui) for use. Then, the drawing data generation unit 160 arranges these rectangular unit recording areas Au in a two-dimensional matrix, thereby drawing including a plurality of unit recording graphic patterns R (U1) to R (U4). The pattern P (E) can be generated, and the drawing data E for drawing the drawing pattern P (E) can be generated.

  The size of the unit recording area Au may be set arbitrarily. For example, in the example shown in FIG. 3, if a unit recording area Au consisting of a square with a side of 50 μm is defined and bit figures F are arranged at a pitch of about 100 nm in length and width, one unit recording area Au is included. About 30 KB of information can be recorded. Therefore, for example, if a square substrate having a side of about 150 mm is used as an information recording medium, and unit recording areas Au each consisting of a square having a side of 50 μm are arranged on the two-dimensional matrix, the information recording medium Data of as much as 270 GB can be recorded on one sheet.

<<< §2. Formation of physical structure pattern on medium >>
Here, the exposure process by the beam exposure apparatus 200 shown in FIG. 1 and the patterning process by the patterning apparatus 300 will be described in more detail. As described in §1, the beam exposure apparatus 200 is an apparatus that performs beam exposure using an electron beam or a laser beam on the substrate S serving as an information recording medium based on the drawing data E. The patterning apparatus 300 The apparatus generates an information recording medium on which a physical structure pattern (drawing pattern P (E)) corresponding to the drawing data E is formed by performing a patterning process on the exposed substrate S.

  In practice, these apparatuses can be used as they are for semiconductor lithography used in the LSI manufacturing process. In other words, the beam exposure process by the beam exposure apparatus 200 and the patterning process by the patterning apparatus 300 can be performed by using a conventional general LSI manufacturing process as it is. However, the drawing data used when manufacturing an LSI is data indicating a graphic pattern for constituting each region of a semiconductor element such as a channel region, a gate region, a source region, a drain region, and a wiring region. On the other hand, the drawing data E used in the present invention is data indicating a bit figure F indicating the data bit “1” or “0” and a figure pattern for constituting the alignment mark Q used at the time of reading. .

  FIG. 4 is a side sectional view showing a specific example of the exposure process by the beam exposure apparatus 200 and the patterning process by the patterning apparatus 300 shown in FIG. 1 (only the cut surface is shown, and the back structure is not shown). First, an exposure target substrate S as shown in FIG. In the case of this example, the exposure target substrate S is composed of the molding layer 10 and the resist layer 20. Although an example using a single-layer resist layer 20 is shown here, a resist layer composed of two or more layers may be used when necessary in a patterning step described later. In addition to an organic film such as a resist, an inorganic film such as a metal film (a so-called hard mask that functions as an etching stopper) may be used together.

  Here, the layer to be molded 10 is a layer to be molded in the patterning step, and is finally a portion that becomes an information recording medium M on which digital data is recorded. As described above, the object of the present invention is to enable information recording to maintain long-term durability. Therefore, a substrate made of a material suitable for achieving such an object is formed on the molding layer 10. Use it. Specifically, as the transparent material, it is optimal to use a glass substrate, particularly a quartz glass substrate, as the molding layer 10. Of course, an opaque material such as a silicon substrate can be used as the molding layer 10. An inorganic material such as a quartz glass substrate or a silicon substrate is a material that is not easily damaged by physical damage and is not easily subjected to chemical contamination, and is an optimal material for use in the information recording medium of the present invention.

  On the other hand, as the resist layer 20, a material suitable for patterning the layer to be molded 10 may be used. That is, a material whose composition changes by exposure to an electron beam or a laser beam and that functions as a protective film in the etching process for the layer to be molded 10 may be used. Of course, a positive resist having the property of dissolving the exposed portion during development may be used, or a negative resist having a property of dissolving the non-exposed portion during development may be used.

  The shape and size of the exposure target substrate S may be arbitrary. At present, a quartz glass substrate that is generally used as a photomask is often a standard rectangular substrate of 152 × 152 × 6.35 mm. Further, as the silicon substrate, a disk-shaped wafer having a thickness of about 1 mm in accordance with a standard such as a diameter of 6 inches, 8 inches, or 12 inches is often used. As the exposure target substrate S, a substrate in which these standard substrates are formed layers 10 and a resist layer 20 is formed on the upper surface thereof may be used.

  Hereinafter, for convenience of explanation, an example in which a quartz glass substrate is used as the molding layer 10 and a positive resist is used as the resist layer 20 will be described. Therefore, the exposure target substrate S shown in FIG. 4A is a substrate in which the positive resist layer 20 is formed on the quartz glass substrate 10. Of course, the present invention is not limited to such examples.

  After all, the beam exposure apparatus 200 shown in FIG. 1 performs beam exposure on the surface of the resist layer 20 on the exposure target substrate S having the layer to be molded 10 and the resist layer 20 covering the layer to be molded 10. FIG. 4B shows an exposure process by the beam exposure apparatus 200. As described in §1, the exposure by the beam exposure apparatus 200 is performed only on the inside of the bit figure F and the inside of the alignment mark Q. Therefore, the resist layer 20 is divided into an exposed portion 21 and a non-exposed portion 22 through an exposure process. Here, the chemical composition of the non-exposed portion 22 remains the same, but the chemical composition of the exposed portion 21 changes.

  The patterning device 300 is a device that performs patterning on the substrate S after such an exposure process is completed, and includes a development processing unit 310 and an etching processing unit 320 as shown in FIG.

  The development processing unit 310 is a substrate after exposure in a developer having a property of dissolving the exposed portion 21 (when using a positive resist) or the non-exposed portion 22 (when using a negative resist) of the resist layer. A development process is performed in which S is impregnated and a part of the S is impregnated. FIG. 4 (c) shows a state in which such development processing is performed on the substrate S shown in FIG. 4 (b). In the embodiment shown here, since a positive resist is used, the exposed portion 21 is dissolved in the developer by the developing process, and the non-exposed portion 22 remains as the remaining portion 23.

  On the other hand, the etching processing unit 320 performs an etching process on the substrate S after development. In the case of the embodiment shown in FIG. 4C, the etching process is performed on the layer to be molded 10 using the remaining portion 23 as a mask. Specifically, the substrate S shown in FIG. 4 (c) may be impregnated with an etchant whose corrosiveness to the molding layer 10 is stronger than the corrosiveness to the remaining portion 23 of the resist layer (of course, dry etching). For example, a method that does not impregnate the etching solution may be used).

  FIG. 4D shows a state where the etching processing by the etching processing unit 320 has been performed. Of the upper surface of the layer 10 to be molded, the portion covered with the remaining portion 23 serving as a mask is not corroded, but the exposed portion is corroded to form a recess. Thus, the molding layer 10 is processed into the molding layer 11 having an uneven structure on the upper surface. Thereafter, the etching processing unit 320 has a processing function of peeling and removing the remaining portion 23 of the resist layer and cleaning and drying the layer 11 to be molded.

  Through such a process, the processed layer 11 after processing as shown in FIG. 4 (e) is finally obtained. The molded layer 11 thus obtained is nothing but the information recording medium M in which digital data is written by the information storage device according to the present invention. As shown in the figure, a physical concavo-convex structure is formed on the upper surface of the information recording medium M, and the bit “1” and the bit “0” are expressed by the concave portion C and the convex portion V. Therefore, by detecting whether the medium surface constitutes a concave portion C or a convex portion V at a position indicated by a thick dashed line in the figure (a position corresponding to the lattice point L shown in FIG. 3), Bit “1” and bit “0” can be read.

  Of course, contrary to the illustrated example, it is also possible to adopt a recording method in which the concave portion C is set to the bit “0” and the convex portion V is set to the bit “1”. Which is set to bit “0” and which is set to bit “1” is a matter determined according to the processes described so far. For example, in the case of the example described in §1, the unit bit graphic pattern generation unit 140 arranges the bit graphic F at the position of the grid point L corresponding to the bit “1” of the unit bit matrix. If the bit figure F is arranged at the position of the lattice point L corresponding to the bit “0”, the bit information of the concave portion and the convex portion is reversed. Further, when a negative resist is used as the resist layer 20 instead of a positive resist, the relationship between the concave portion and the convex portion is reversed.

  The information recording medium M created in this manner has long-term durability, information recording is performed with a high degree of integration, and information can be read out by a universal method.

  That is, when a material such as a quartz glass substrate or a silicon substrate is used as the layer to be molded 10, deterioration due to secular change and the action of water and heat, compared to conventional information recording media such as paper, film, and record board, etc. It is less likely to be damaged by, and can be durable on a semi-permanent time scale of hundreds of years, just like ancient stones. Needless to say, the durability can be obtained over a much longer period of time as compared with a magnetic recording medium, an optical recording medium, a semiconductor recording medium or the like generally used as a data recording medium for computers. Therefore, the present invention is most suitable for use in storing information such as an official document in which it is desirable to record information semipermanently.

  Further, as described in Section 1, the beam exposure apparatus 200 can perform fine exposure with an electron beam or a laser beam, so that information recording can be performed with a very high degree of integration. For example, if a high-definition electron beam drawing apparatus is used, the bit figure F can be written at a pitch of about 100 nm, and a capacity of about 100 GB to 1 TB can be added to the above-described standard size photomask or silicon substrate. It becomes possible to save the information.

  Furthermore, the information recording medium according to the present invention is characterized in that the binary information of the bits is directly recorded as a physical structure such as unevenness, so that the information can be read out by a universal method. That is, the above-mentioned Patent Documents 1 and 2 disclose a technique for recording information three-dimensionally using quartz glass on a cylinder as a medium, but recorded three-dimensionally in the medium. In order to read out information, a dedicated reading device using computer tomography or the like is required, and special arithmetic processing such as Fourier transform processing is required. Therefore, for example, even if a cylindrical recording medium remains intact after several hundred years, information cannot be read out unless the technique of a dedicated reading device is inherited.

  On the other hand, since the binary information of bits is directly recorded as a physical structure on the information recording medium created by the information storage device according to the present invention, the recording surface is enlarged by some method as an image. If it can be recognized, at least the bit information itself can be read. In other words, the information recording medium according to the present invention itself is a three-dimensional structure, but since bit information is recorded two-dimensionally, the information recording medium according to the present invention is temporarily Even when excavated after hundreds of years or thousands of years, bit information can be read out by a universal method.

  As described above, the information storage device according to the present invention has a concavo-convex structure on the surface of a quartz glass substrate or silicon substrate, which includes a concave portion indicating one of the bits “1” and “0” and a convex portion indicating the other. An example of forming a physical structure pattern has been described. However, in carrying out the present invention, the physical structure indicating the bit information is not necessarily limited to the uneven structure. Therefore, several variations of the method of forming a physical structure on the medium will be described with reference to the side cross-sectional view of FIG. 5 (only the cut surface is shown, and the illustration of the back structure is omitted).

  FIG. 5A shows a physical structure pattern having a network structure composed of a through hole H indicating one of the bits “1” and a bit “0” and a non-hole portion N indicating the other by the patterning device 300. It is a sectional side view which shows the example formed. In the network structure 12 shown in the figure, a position indicated by a thick one-dot chain line is a position corresponding to the lattice point L shown in FIG. 3, and the position is a through hole H or a non-hole portion N (a through hole is formed). The bit “1” and the bit “0” are represented as shown in FIG.

  Thus, in the case of the information recording medium shown in FIG. 5 (a), since the bits are expressed not by the concavo-convex structure but by the presence or absence of the through holes, the medium itself constitutes a network structure. The basic principle of recording bit information at the position of the point L is exactly the same as the basic embodiment shown in FIG. Of course, the bit “0” may be expressed by the through hole H, and the bit “1” may be expressed by the non-hole portion N. When the network structure 12 shown in FIG. 5A is used as the information recording medium M, the etching process is continued until the bottom surface of the layer to be molded 10 is reached in the etching process (FIG. 4D) by the etching processing unit 320. The through hole H may be formed.

  On the other hand, FIGS. 5B to 5D are side cross-sectional views showing modifications in which additional layers are formed on the surface of the concave portion C or the convex portion V of the information recording medium M shown in FIG. is there. In the case of the modification shown in FIG. 5 (b), the additional layer 31 is formed on the surfaces of both the recess C and the protrusion V. In the case of the modification shown in FIG. Only the additional layer 32 is formed. In the modification shown in FIG. 5D, the additional layer 33 is formed only on the surface of the recess C.

  As the additional layers 31, 32, 33, light reflecting materials (for example, metals such as aluminum, nickel, titanium, silver, chromium, silicon, molybdenum, platinum, alloys of these metals, oxides, nitrides, etc.) Alternatively, a light-absorbing material (for example, a material made of a compound such as a metal oxide or nitride, or chromium oxide, chromium nitride, etc., for example, chromium) can be used. If an additional layer made of a light-reflective material is formed, the concave portion C and the convex portion V can be distinguished based on the difference in behavior of reflected light during reading, and the additional layer made of a light-absorbing material. , The concave portion C and the convex portion V can be distinguished from each other based on the difference in the light absorption mode at the time of reading. Therefore, if such an additional layer is formed, an effect of facilitating reading of information can be obtained.

Further, instead of forming another layer having a clear boundary surface as in the additional layer, the concave portion C and the convex portion V are formed.
A similar effect can be obtained by doping impurities on the surface of the substrate. For example, when an information recording medium having a concavo-convex structure is made of quartz, and the surface is doped with boron, phosphorus, rubidium, selenium, copper, etc., and the impurity concentration of the surface portion is varied, an additional layer is provided. Similarly, the surface portion can have light reflectivity or light absorbability, and an effect of facilitating reading of information can be obtained. Specifically, in the case of the impurity in the above example, when the concentration is about 100 ppm or more, an ultraviolet absorption effect is obtained, and when the concentration is about 1000 ppm or more, an effect of increasing the reflectance is obtained.

  In particular, as in the example shown in FIG. 5C, if the additional layer 32 made of a light-reflective or light-absorbing material is formed only on the convex portion V, the reflection obtained from the concave portion C at the time of reading. Since the difference between the light or scattered light and the reflected light or scattered light obtained from the convex portion V becomes significant, the bit “1” and the bit “0” can be easily identified. Similarly, even when the additional layer 33 made of a light-reflective or light-absorbing material is formed only in the concave portion C as in the example shown in FIG. 5D, the reflection obtained from the concave portion C at the time of reading. Since the difference between the light or scattered light and the reflected light or scattered light obtained from the convex portion V becomes significant, bit identification is facilitated.

  As in the example shown in FIG. 5B, in order to form the additional layer 31 on the surface of both the concave portion C and the convex portion V, after obtaining the information recording medium M shown in FIG. Further, a process for depositing the additional layer 31 on the entire upper surface of the recording medium may be performed. Further, as in the example shown in FIG. 5C, in order to obtain a structure in which the additional layer 32 is formed only on the surface of the convex portion V, instead of the exposure target substrate S shown in FIG. A substrate having a structure in which an additional layer is sandwiched between the molding layer 10 and the resist layer 20 may be used. Then, as in the example shown in FIG. 5 (d), in order to obtain a structure in which the additional layer 33 is formed only on the surface of the recess C, the resist layer is formed when the etching process shown in FIG. 4 (d) is completed. The remaining portion 23 is left as it is, and an additional layer is deposited on the entire upper surface, and then the remaining portion 23 is peeled off.

  On the other hand, in the modification shown in FIG. 5 (e), the layer 51 itself formed on the upper surface of the support layer 40 is made of a light-reflective or light-absorbing material. For example, if the support layer 40 is made of a quartz glass substrate, an additional layer made of aluminum is formed on the upper surface thereof, and a resist layer is further formed on the upper surface thereof, and a process according to the process illustrated in FIG. A structure as shown in FIG. 5 (e) can be obtained. In this case, the etching process may use a corrosive liquid that is corrosive to aluminum. In this structure, the surface of the concave portion C is made of quartz glass, and the surface of the convex portion V is made of aluminum, so that an effect of facilitating bit identification at the time of reading can be obtained.

  In practice, when the modification shown in FIG. 5 (a) is adopted, it is preferable that the network structure 12 is made of an opaque material. By doing so, the portion of the through-hole H becomes a portion that transmits light, and the portion of the non-hole portion N becomes a portion that does not transmit light. Becomes easier.

  On the other hand, when the modification shown in FIGS. 5C to 5E is employed, the molding layer 11 or the support layer 40 is made of a transparent material, and the additional layers 32, 33, 51 are made of an opaque material. It is preferable to do this. Then, the portion where the additional layer is not formed becomes a portion that transmits light, and the portion where the additional layer is formed becomes a portion that does not transmit light. The difference can be recognized and the bit can be easily identified.

<<< §3. Basic embodiment of information reading apparatus according to the present invention >>
In §1 and §2, the configuration and operation of the information storage device for storing information in the information recording medium has been described. Here, the configuration and operation of the information reading apparatus used for reading the information thus recorded will be described.

  FIG. 6 is a block diagram showing a configuration of a basic embodiment of the information reading apparatus according to the present invention. The information reading device according to this embodiment is a device that performs the function of reading digital data stored in the information recording medium M using the information storage device shown in FIG. 1, and as shown in FIG. The computer 500 is configured.

  Here, the image capturing apparatus 400 is a component that captures an image of an image capturing area that forms part of the recording surface of the information recording medium M and captures the obtained captured image as image data. An image sensor 410, an enlargement optical system 420, and a scanning mechanism 430 are included.

  The image sensor 410 can be constituted by a CCD camera, for example, and has a function of capturing an image in a predetermined photographing target area as digital image data. The magnifying optical system 420 is composed of an optical element such as a lens. The magnifying optical system 420 enlarges a predetermined imaging target area that constitutes a part of the recording surface of the information recording medium M and forms the enlarged image on the imaging surface of the imaging element 410 Fulfill. The scanning mechanism 430 performs a scanning process (change of position and angle) on the image sensor 410 and the magnifying optical system 420 so that the imaging target area sequentially moves on the recording surface of the information recording medium M. Fulfill.

  FIG. 5 shows a variation of the information recording medium M. However, the information recording medium M including the network structure 12 shown in FIG. The information can also be read out for both, and the upper and lower surfaces constitute the recording surface. On the other hand, as shown in FIGS. 4E and 5B to 5E, in the case of the information recording medium M having the concavo-convex structure formed on the upper surface, the upper surface is the recording surface. Therefore, when the molding layer 11 or the support layer 40 is made of a transparent material, information can be read out from any of the upper and lower sides, but these are made of an opaque material. If it is, it is necessary to shoot from above.

  The read processing computer 500 includes a captured image storage unit 510, a bit recording area recognition unit 520, a unit bit matrix recognition unit 530, a scanning control unit 540, and a data restoration unit 550, as illustrated. Hereinafter, functions of these units will be described in order. However, each of these units is actually a component realized by incorporating a dedicated program into the computer, and the read processing computer 500 can be configured by installing a dedicated program on a general-purpose computer. it can.

  First, the captured image storage unit 510 is a component that stores a captured image captured by the image capturing apparatus 400. That is, it has a function of storing an image in a predetermined shooting target area shot by the imaging element 410 as digital image data. As described above, the image capturing apparatus 400 is provided with the scanning mechanism 430, and the image capturing target area sequentially moves on the recording surface of the information recording medium M. A captured image is acquired. The captured image storage unit 510 functions to store the image data sequentially given from the image sensor 410 in this way.

  On the other hand, the bit recording area recognition unit 520 performs processing for recognizing individual bit recording areas Ab from the captured image stored in the captured image storage unit 510. In the present invention, as described with reference to FIG. 2, the digital data D to be stored is divided into a plurality of unit data U1, U2, U3,..., And unit bit graphic patterns P (U1), P (U2), P (U3),... Are recorded in the individual bit recording areas Ab. Therefore, at the time of read processing, first, each bit recording area Ab is recognized, and then each bit constituting the unit data Ui is based on the individual unit bit figure pattern P (Ui) recorded therein. Will be read out.

  As described in §2, an alignment mark Q and a bit figure F are recorded on the recording surface of the information recording medium M as a physical structure pattern such as a concavo-convex structure or the presence or absence of a through hole. For this reason, the alignment mark Q, the bit figure F, or the outline thereof is expressed as a light and dark distribution on the photographed image, and the position on the photographed image can be obtained by using the existing pattern recognition technology. It is possible to recognize the alignment mark Q and the bit figure F.

  First, each bit recording area Ab is recognized by detecting the alignment mark Q. Since a graphic different from the bit graphic F is used for the alignment mark Q, the bit recording area recognition unit 520 searches the captured image stored in the captured image storage unit 510 to perform alignment. The mark Q can be detected. For example, in the example shown in the lower part of FIG. 2, the bit figure F is a square, whereas the alignment mark Q is a cross shape. It is possible to recognize the alignment mark Q and determine its position.

  Since the alignment mark Q is arranged at a specific position with respect to the bit recording area Ab, if the alignment mark Q can be recognized on the captured image, the position of the bit recording area Ab can be specified. . For example, if a unit recording graphic pattern R (U1) as shown in FIG. 3 is included in the photographed image, if four sets of alignment marks Q1 to Q4 can be recognized, these four sets of positions will be recognized. A square-shaped bit recording area Ab having alignment marks Q1 to Q4 in the vicinity of the four corners can be recognized.

  If the image photographing device 400 has a function of photographing a photographing target area having a size that can include at least one unit recording area Au, four sets as shown in FIG. The alignment marks Q1 to Q4 can be recognized, and the bit recording area Ab can be recognized.

  Of course, if the shooting target area is set at a position that is crotch to the unit recording area Au adjacent to each other, the four sets of alignment marks Q1 to Q4 indicating the position of the same bit recording area Ab cannot be recognized correctly. . In this case, the bit recording area recognizing unit 520 can grasp the positional deviation of the imaging target area based on the reciprocal relationship of the recognized alignment marks, and therefore reports the positional deviation to the scanning control unit 540. Perform the process.

  When the scanning control unit 540 receives such a positional deviation report, the scanning control unit 540 controls the image capturing apparatus 400 to adjust the positional deviation. Specifically, the scanning mechanism 430 is instructed to move the imaging target area in a predetermined correction direction by a predetermined correction amount. By performing such adjustment, as shown in FIG. 3, it is possible to obtain a correct captured image in which the alignment marks Q1 to Q4 are arranged at appropriate positions at the four corners, which is correct with respect to the bit recording area Ab. Reading processing can be performed. As described above, the first role of the scanning control unit 540 is an adjustment process for correcting the positional deviation when the photographing target area has a positional deviation with respect to the unit recording area Au.

  The second role of the scanning control unit 540 is scanning processing for setting the next unit recording area Au as a new imaging target area after the imaging with one unit recording area Au as the imaging target area is completed. For example, in the case of the example shown in the lower part of FIG. 2, when photographing of the unit recording area Au (U1) in which the unit recording graphic pattern R (U1) is recorded is completed, the unit recording graphic pattern R ( The unit recording area Au (U2) in which U2) is recorded needs to be photographed, and then the unit recording area Au (U3) in which the unit recording graphic pattern R (U3) is recorded, and the unit It is necessary to move the photographing target area sequentially with the unit recording area Au (U4) where the recording graphic pattern R (U4) is recorded.

  After all, the scanning control unit 540 can be said to be a component that performs control for changing the shooting target area by the image shooting apparatus 400 so that shot images for all the bit recording areas to be read are obtained. This control can be performed by feedback control based on the detection result of the alignment mark Q by the bit recording area recognition unit 520, and fine adjustment as described above is possible even when a positional deviation occurs.

  When the bit recording area recognition unit 520 recognizes the i-th bit recording area Ab (i) from the photographed image, the information of the i-th bit recording area Ab (i) is sent to the unit bit matrix recognition unit 530. Given. The unit bit matrix recognition unit 530 performs processing for recognizing the unit bit matrix based on the pattern in the bit recording area Ab (i). For example, in the case of the example shown in FIG. 3, based on the unit bit figure pattern P (U1) recorded in the bit recording area Ab, a unit bit matrix B having 5 rows and 5 columns as shown in the middle of FIG. (U1) can be recognized.

  In the case of the example shown in FIG. 3, as described in §1, horizontal grid lines X1 to X7 arranged at equal intervals and vertical grid lines Y1 to Y7 arranged at equal intervals are defined. A grid point L is defined as each intersection, and the individual bit figures F and the alignment marks Q1 to Q4 are arranged so that the centers thereof are located at any of the grid points L. Therefore, the recognition process of the unit bit matrix B (U1) by the unit bit matrix recognition unit 530 can be performed by the following procedure.

  First, the horizontal grid lines X1 and X7 and the vertical grid lines Y1 and Y7 are recognized based on the center point positions of the four sets of alignment marks Q1 to Q4 recognized by the bit recording area recognition unit 520. Subsequently, the horizontal grid lines X2 to X6 are defined so as to equally divide the horizontal grid lines X1 and X7, and the vertical grid lines are equally divided between the vertical grid lines Y1 and Y7. Y2 to Y6 are defined. Then, 25 grid point positions where the horizontal grid lines X2 to X6 and the vertical grid lines Y2 to Y6 cross each other are determined, and it is determined whether or not the bit figure F exists at each grid point position. What is necessary is just to process. As described above, since the bit figure F can be recognized based on the light / dark distribution on the photographed image, the bit “1” is associated with the grid point position where the bit figure F exists, and the non-existing grid point position. Is associated with bit “0”, a 5 × 5 unit bit matrix B (U1) shown in the middle of FIG. 2 can be obtained.

  The unit bit matrix recognition unit 530 thus performs the i-th unit bit matrix B based on the i-th unit bit figure pattern P (Ui) recorded in the i-th bit recording area Ab (i). Processing for recognizing (Ui) is performed, and the result is given to the data restoration unit 550. The unit bit matrix recognizing unit 530 repeatedly executes the unit bit matrix recognizing process for all the bit recording areas recognized by the bit recording area recognizing unit 520 in the same manner.

  The data restoration unit 550 generates the unit data Ui from the individual unit bit matrix B (Ui) recognized by the unit bit matrix recognition unit 530 in this way, and synthesizes the individual unit data Ui to thereby store the digital data to be stored. A process for restoring the data D is executed. For example, in the case of the example shown in FIG. 2, four sets of unit data U1 to U4 are generated from four sets of unit bit matrices B (U1) to B (U4), and these are concatenated to generate the original digital data D Will be restored.

  As described above, the basic embodiment of the information reading apparatus according to the present invention has been described with reference to the block diagram of FIG. 6, but reading of information from the information recording medium M created by the information storage apparatus according to the present invention is performed. However, it is not always necessary to use such an information reading device. For example, information can be read out using an optical measuring instrument, a scanning electron microscope, an atomic force microscope, or the like.

  Since the information recording medium M created by the information storage device according to the present invention has the universality that the binary information of bits is directly recorded as a physical structure as described above, the recording surface is not If the image showing the presence or absence of the bit figure F can be obtained by enlarging by the method, the bit information can be read out. Therefore, even when the information recording medium M is excavated after several hundreds of years or thousands of years, it is possible to read bit information if there is any physical structure recognition means in that era. Of course, if it is stored buried in the ground, there is a possibility that foreign matter adheres to the recording surface and is contaminated, but these foreign matter can be easily removed by washing. There is no problem in reading information.

  Regardless of which reading method is used, the information recording surface can be read in a non-contact state (even if an atomic force microscope is used, the non-contact mode is used for reading in a non-contact state. However, the recording surface is not physically damaged during the reading process, and even if the reading process is repeatedly executed, there is no possibility that the information recording surface is worn.

  When the information reading device shown in FIG. 6 is combined with the information storage device shown in FIG. 1, information is read from a part of the recorded area of the information recording medium M, and the unrecorded area adjacent to the recorded area is read. It is also possible to store new information. Therefore, it becomes possible to realize a write-once type information storage apparatus that sequentially records new information on one information recording medium. Of course, if a device that combines an information storage device and an information reading device is used, after performing a storage process for writing information on a medium using the information storage device, verification of the information stored using the information reading device is performed. It can be done, and can be modified as needed.

<<< §4. Variation of alignment mark >>>
In §3, the basic embodiment of the information reading device has been described. Therefore, here, in consideration of the convenience at the time of reading information, variations of the alignment mark to be recorded when information is stored will be described. The bit mark F plays a role of indicating original information to be stored, whereas the alignment mark Q is meta information used for positioning at the time of information reading.

  In the embodiments described so far, the unit recording graphic pattern generation unit 150 has cross-shaped alignment marks Q1 on the outside of the four corners of the rectangular bit recording area Ab, for example, as illustrated in FIG. Processing for generating a unit recording graphic pattern is performed by adding .about.Q4. These alignment marks Q1 to Q4 are used for alignment for the bit recording area recognition unit 520 in the information reading apparatus shown in FIG. 6 to recognize the bit recording area Ab.

  However, the shape, arrangement position, and number of the alignment marks Q are not limited to the above-described embodiment. That is, the shape of the alignment mark Q may be any shape as long as it can be distinguished from the bit graphic F. Further, the positions to be arranged are not necessarily arranged outside the four corners of the bit recording area Ab. For example, they may be arranged at the center positions of the four sides of the bit recording area Ab. Further, the number of alignment marks Q is not necessarily four sets.

  FIG. 7 is a plan view showing a variation of the alignment mark Q used in the present invention. In both cases, the broken-line square indicates the bit recording area Ab (for convenience, a hatched line is provided instead of drawing a bit figure), and the dashed-dotted square indicates the unit recording area Au. The circular mark arranged at the position is the alignment mark Q.

  FIG. 7A shows an example in which alignment marks Q11 and Q12 are arranged in the vicinity of the upper left corner and the upper right corner of the rectangular bit recording area Ab. If the direction connecting the center points of the two sets of alignment marks Q11 and Q12 is defined as the horizontal coordinate axis X, it is possible to indicate one coordinate axis direction related to the arrangement of the bit recording area Ab. At the time of reading, the horizontal coordinate axis X can be recognized based on the two sets of alignment marks Q11 and Q12, and the vertical coordinate axis Y can be defined as an axis orthogonal to the horizontal coordinate axis X. If the bit recording area Ab has a correct rectangle, no trouble occurs in the reading process of each bit. From this point of view, if two sets of alignment marks are added to one bit recording area Ab, there is no practical problem in reading processing.

  Of course, the vertical coordinate axis Y may be defined by arranging alignment marks near the upper left corner and the lower left corner of the bit recording area Ab. In short, the unit recording graphic pattern generation unit 150 adds a total of two sets of alignment marks arranged in the vicinity of the outer corners of two corners that are not diagonal of the four corners of the rectangular bit recording area Ab. A unit recording figure pattern may be generated.

  On the other hand, FIG. 7B shows a unit by adding a total of three sets of alignment marks Q21, Q22, Q23 arranged near the outside of the three corners of the rectangular bit recording area Ab. This is an example of generating a graphic pattern for recording. If three sets of alignment marks Q21, Q22, and Q23 are used in this way, both the horizontal coordinate axis X and the vertical coordinate axis Y can be defined as shown in the figure, and the accuracy of reading processing of each bit can be further improved. It is possible to increase.

  When three sets of alignment marks are used as described above, the arrangement mode of the three sets of alignment marks is made different for unit recording graphic patterns adjacent to each other as in the example shown in FIG. Is preferred. FIG. 8 shows a state in which a plurality of unit recording areas Au are arranged in a two-dimensional matrix. Here, the unit recording areas Au (11), Au (13), Au (22), Au (31), and Au (33) are omitted in the arrangement mode shown in FIG. In FIG. 7B, the unit recording areas Au (12), Au (21), Au (23), and Au (32) are shown in FIG. Three sets of alignment marks are arranged in an arrangement manner that is reversed left and right with respect to the arrangement manner (that is, an arrangement manner in which only the lower left corner is missing).

  In short, for the arrangement of unit recording areas Au, row numbers i (i = 1, 2, 3,...) And column numbers j (j = 1, 2, 3,. When the unit recording area is expressed as Au (ij) as shown in the figure, the first group in which (i + j) is an even number lacks an alignment mark only at the lower right corner as shown in FIG. For the second group in which (i + j) is an odd number, an arrangement mode in which the alignment mark is missing only at the lower left corner as shown in FIG. 7 (b) is reversed. ing.

  In this way, if two modes are defined as the arrangement modes of the three sets of alignment marks, and the unit recording graphic patterns adjacent to each other in the vertical and horizontal directions adopt different arrangement modes, the scanning control unit When the 540 scans the shooting target area, it is possible to prevent an error that skips shooting for the adjacent unit recording area.

  For example, in the example illustrated in FIG. 8, the scanning control unit 540 first captures the unit recording area Au (11) as an imaging target area, and then moves the imaging target area to the right in the drawing and is adjacent to the right. Assume that control is performed so that the unit recording area Au (12) to be photographed is an imaging target area. Normally, if the control is performed to move the distance corresponding to the pitch of the unit recording area Au, the next shooting target area can be moved to the position of the unit recording area Au (12). However, if an error occurs in the moving distance for some reason and the photographing target area has moved to the position of the unit recording area Au (13), the reading process for the unit recording area Au (12) is skipped. Become.

  If an arrangement mode as shown in FIG. 8 is employed, it is possible to detect an error even if such a situation occurs. That is, if the unit recording area Au (11) is imaged after the unit recording area Au (11) is imaged and the unit recording area Au (13) is imaged, the alignment marks are arranged in the same manner. Therefore, it can be recognized that the unit recording area Au (12) has been skipped. Therefore, it is possible to perform a process for returning the shooting target area to the left in the drawing so that the unit recording area Au (12) is shot. The same correction is possible when a vertical skip occurs.

  As a method for recognizing that such a skip has occurred, it is possible to adopt a method of changing the shape of the alignment mark in addition to a method of preparing two arrangement modes. For example, FIGS. 9A and 9B show an example of a variation in which the shape of the alignment mark is changed. In the case of the example shown in FIG. 9 (a), the cross-shaped mark Q31, the triangular mark Q32, and the square mark Q33 are arranged at the positions shown in the figure, whereas in the example shown in FIG. 9 (b). In this case, a circular mark Q41, a rhombus mark Q42, and a mark Q43 with a cross mark are arranged at the illustrated positions. If such two kinds of alignment marks are used alternately in the vertical and horizontal directions, it is possible to recognize that a skip has occurred as in the example shown in FIG.

  FIG. 10 is a plan view showing still another variation of the arrangement form of the alignment marks in the present invention. In this variation, the alignment mark for the unit recording area Au (11) in the example shown in FIG. 8 is changed to the alignment mark shown in FIG. 9 (a). That is, only the unit recording area Au (11) arranged in the first row and the first column among the plurality of unit recording areas Au arranged in a two-dimensional matrix has a different alignment mark shape. . This is because the unit recording area Au (11) arranged in the first row and the first column is set as a reference unit recording area to be read out first, and this reference unit recording area can be easily set during the reading process. This is a consideration to enable identification.

  When the variation shown in FIG. 10 is adopted, the unit recording graphic pattern generation unit 150 sets a specific unit recording area as a reference unit recording area, and the reference unit recording area is different from other unit recording areas. A unit recording figure pattern using different reference alignment marks may be generated. In the example shown in the figure, the reference alignment mark shown in FIG. 9A is used for the reference unit recording area Au (11), and the normal alignment mark shown in FIG. 8 is used for the other unit recording areas. Therefore, at the time of the reading process, the reference unit recording area Au (11) to be read first can be specified by first searching for the reference alignment mark shown in FIG. 9A. .

  That is, if the image photographing device 400 in the information reading device shown in FIG. 6 has a function of photographing a region to be photographed having a size that can include at least one unit recording region Au, it is shown in FIG. Since the reference alignment mark can be searched, the scanning control unit 540 first captures an area including the reference unit recording area Au (11) based on the reference alignment mark shown in FIG. In order to obtain an image, the image capturing apparatus 400 may be controlled to adjust the capturing target area. Thus, when the correct bit information is read from the bit recording area Ab (11) in the reference unit recording area Au (11), the scanning control unit 540 sets the imaging target area according to the arrangement pitch of the unit recording areas Au. Control to move sequentially may be performed.

  Of course, in this case as well, as described with reference to FIG. 8, even if an error occurs in which the unit recording area Au (13) is skipped for some reason, the error can be recognized and corrected. Further, fine adjustment can be performed even when a fine positional deviation occurs.

  Further, as a method of indicating the reference unit recording area Au (11), instead of adopting a method of using a reference alignment mark different from the other unit recording areas, a bit recording area Ab (in the reference unit recording area Au (11) is used. 11) It is also possible to adopt a method of arranging a specific identification mark without arranging the bit figure F. The bit recording area Ab is originally an area used for recording the data to be stored by arranging the bit figure F. However, if a specific identification mark is arranged only for the reference unit recording area, By confirming the unique identification mark, the reference unit recording area can be easily recognized.

  For example, if a large star is drawn in the area Au (11) shown in FIG. 8, it can be easily recognized that the area Au (11) is a reference unit recording area. In this case, the original information is not recorded in the area Au (11). First, after the position adjustment with the reference unit recording area Au (11) as the first imaging target area is performed, the imaging target area is set. It is sufficient to perform scanning that sequentially moves. If the size of the reference unit recording area Au is a size that can be visually observed, in the above example, it is possible to visually check the star mark, and the position where the reference unit recording area Au (11) is the first imaging target area. The alignment can also be performed manually by an operator's visual inspection.

<<< §5. Information storage method and information reading method according to the present invention >>>
Finally, a basic processing procedure when the present invention is grasped as a method invention of an information storing method and an information reading method will be described.

  FIG. 11 is a flowchart showing the basic processing procedure of the information storage method according to the present invention. This procedure is an execution procedure of an information storage method in which digital data is written and stored on an information recording medium. Steps S11 to S16 are steps executed by the storage processing computer 100 shown in FIG. 1 is a procedure executed by the beam exposure apparatus 200 shown in FIG. 1, and step S18 is a procedure executed by the patterning apparatus 300 shown in FIG.

  First, in step S11, a data input stage is executed in which the storage processing computer 100 inputs digital data D to be stored. In subsequent step S12, the storage processing computer 100 divides the digital data D by a predetermined bit length unit, thereby executing a unit data generation stage for generating a plurality of unit data Ui. In step S13, a unit bit matrix generation stage in which the storage processing computer 100 generates a unit bit matrix B (Ui) by arranging data bits constituting each unit data Ui in a two-dimensional matrix form. In step S14, the storage processing computer 100 converts the unit bit matrix B (Ui) into a geometric pattern arranged in a predetermined bit recording area Ab, thereby converting the unit bit figure pattern P ( A unit bit figure pattern generation step for generating Ui) is executed.

  Subsequently, in step S15, the storage processing computer 100 adds the alignment mark Q to the unit bit graphic pattern P (Ui) to generate the unit recording graphic pattern R (Ui). A generation phase is performed. In step S16, a drawing data generation stage is executed in which the storage processing computer 100 generates drawing data E for drawing the unit recording graphic pattern R (Ui).

  Finally, in step S17, based on the drawing data E, a beam exposure stage is performed in which beam exposure using an electron beam or laser light is performed on the substrate S serving as an information recording medium. In step S18, exposure is performed. By performing a patterning process on the received substrate, a patterning step for generating an information recording medium M on which a physical structure pattern corresponding to the drawing data E is formed is executed.

  On the other hand, FIG. 12 is a flowchart showing the basic processing procedure of the information reading method according to the present invention. This procedure is an execution procedure of an information reading method for reading digital data stored in the information recording medium M according to the procedure shown in FIG. 11, and step S21 is a procedure executed by the image photographing apparatus 400 shown in FIG. Steps S22 to S27 are procedures executed by the read processing computer 500 shown in FIG.

  First, in step S21, an image capturing stage is performed in which the image capturing apparatus 400 is used to magnify and capture a region to be captured that forms part of the recording surface of the information recording medium M, and the captured image obtained is captured as image data. Executed. In step S22, the readout processing computer 500 executes a captured image storage stage in which the captured image is stored. In step S23, the readout processing computer 500 performs registration from the captured image stored in the captured image storage stage. By detecting the mark, a bit recording area recognition stage for recognizing each bit recording area Ab is executed.

  In this bit recording area recognition stage, if the bit recording area Ab is successfully recognized, the process proceeds to step S25 through step S24, but if the bit recording area Ab is not recognized, that is, the position at the time of photographing. If there is a deviation and the complete bit recording area Ab is not included in the captured image, the process returns to step S21, and the image capturing stage is executed again. At this time, a process of changing the shooting target area by the image shooting apparatus is performed so that a correct shot image can be obtained.

  In step S25, the unit bit matrix recognition stage in which the reading processing computer 500 recognizes the unit bit matrix B (Ui) based on the pattern in the bit recording area Ab is executed. Such processing is repeatedly executed through step S26 until the recognition of all necessary areas is completed. In other words, the image capturing stage of step S21 is performed while controlling the change of the shooting target area by the image shooting apparatus so that the read processing computer 500 can obtain the shot images of all the bit recording areas Ab to be read. A series of processes from is repeated.

  Finally, in step S27, the read processing computer 500 generates unit data Ui from the individual unit bit matrix B (Ui) recognized in the unit bit matrix recognition stage in step S25, and synthesizes the individual unit data Ui. As a result, a data restoration step for restoring the digital data D to be stored is executed.

10: Molded layer (before processing)
11: Molded layer (after processing)
12: network structure 20: resist layer 21: exposure part 22: non-exposure part 23: remaining part 31: additional layer (formed on the entire surface)
32: Additional layer (formed on the protrusion)
33: Additional layer (formed in the recess)
40: Support layer 51: Molded layer 100: Storage processing computer 110: Data input unit 120: Unit data generation unit 130: Unit bit matrix generation unit 140: Unit bit figure pattern generation Light rain 150: Unit recording figure pattern generation Unit 160: Drawing data generation unit 200: Beam exposure device 300: Patterning device 310: Development processing unit 320: Etching processing unit 400: Image capturing device 410: Image sensor 420: Magnifying optical system 430: Scanning mechanism 500: Reading processing computer 510: Captured image storage section 520: Bit recording area recognition section 530: Unit bit matrix recognition section 540: Scan control section 550: Data restoration section Ab, Ab (i): Bit recording areas Au, Au (11) to Au (33 ): Unit recording area B (U1), B (Ui): Unit bit matrix C: Recess D: Storage object Digital data E: Drawing data F: Bit figure H: Through hole L: Lattice point M: Information recording medium N: Non-hole portion P (E): Drawing pattern P (U1), P (Ui): Unit bit figure Patterns Q, Q1 to Q43: Alignment marks R (U1) to R (U4), R (Ui): Unit recording graphic patterns S: Exposure target substrates S11 to S27: Steps U1 to U4 and Ui of units in the flowchart Data u: predetermined bit length V: convex portion X: horizontal coordinate axes X1 to X7: horizontal grid line Y: vertical coordinate axes Y1 to Y7: vertical grid line

Claims (14)

An information storage device for writing and storing digital data in an information recording medium,
A data input unit for inputting digital data to be stored;
A unit data generation unit that generates a plurality of unit data by dividing the digital data by a predetermined bit length unit;
A unit bit matrix generation unit that generates a unit bit matrix by arranging data bits constituting individual unit data in a two-dimensional matrix;
A unit bit graphic pattern generation unit that generates a unit bit graphic pattern by converting the unit bit matrix into a geometric pattern arranged in a predetermined bit recording area;
A unit recording graphic pattern generation unit that generates a unit recording graphic pattern by adding an alignment mark to the unit bit graphic pattern;
A drawing data generation unit for generating drawing data for drawing the unit recording graphic pattern;
A beam exposure apparatus that performs beam exposure using an electron beam or laser light on a substrate serving as an information recording medium based on the drawing data;
A patterning apparatus for generating an information recording medium on which a physical structure pattern corresponding to the drawing data is formed by performing a patterning process on the exposed substrate;
With
The unit bit graphic pattern generation unit arranges a bit graphic consisting of a closed region at a position corresponding to bit “1” and does not arrange anything at a position corresponding to bit “0”, or bit “0” A unit bit figure pattern including bit figures arranged at a predetermined interval by arranging a bit figure consisting of a closed region at a position corresponding to "" and nothing at a position corresponding to bit "1" Produces
The beam exposure apparatus performs beam exposure on the inner part of the contour line of each bit figure and alignment mark;
The information storage device, wherein the patterning device forms a physical structure pattern having a concavo-convex structure including a concave portion indicating one of the bits “1” and a bit “0” and a convex portion indicating the other. The information storage device according to claim 1,
An information storage device, wherein the patterning device forms a physical structure pattern having an additional layer made of a light-reflective or light-absorbing material on the surface of one or both of the concave portion and the convex portion. An information storage device for writing and storing digital data in an information recording medium,
A data input unit for inputting digital data to be stored;
A unit data generation unit that generates a plurality of unit data by dividing the digital data by a predetermined bit length unit;
A unit bit matrix generation unit that generates a unit bit matrix by arranging data bits constituting individual unit data in a two-dimensional matrix;
A unit bit graphic pattern generation unit that generates a unit bit graphic pattern by converting the unit bit matrix into a geometric pattern arranged in a predetermined bit recording area;
A unit recording graphic pattern generation unit that generates a unit recording graphic pattern by adding an alignment mark to the unit bit graphic pattern;
A drawing data generation unit for generating drawing data for drawing the unit recording graphic pattern;
A beam exposure apparatus that performs beam exposure using an electron beam or laser light on a substrate serving as an information recording medium based on the drawing data;
A patterning apparatus for generating an information recording medium on which a physical structure pattern corresponding to the drawing data is formed by performing a patterning process on the exposed substrate;
With
The unit bit graphic pattern generation unit arranges a bit graphic consisting of a closed region at a position corresponding to bit “1” and does not arrange anything at a position corresponding to bit “0”, or bit “0” A unit bit figure pattern including bit figures arranged at a predetermined interval by arranging a bit figure consisting of a closed region at a position corresponding to "" and nothing at a position corresponding to bit "1" Produces
The beam exposure apparatus performs beam exposure on the inner part of the contour line of each bit figure and alignment mark;
The patterning apparatus forms a physical structure pattern having a network structure composed of through holes indicating one of the bits "1" and bit "0" and a non-hole portion indicating the other. apparatus. The information storage device according to any one of claims 1 to 3,
The unit data generation unit divides the digital data into unit data composed of (m × n) bits,
The unit bit matrix generation unit generates a unit bit matrix consisting of m rows and n columns,
The unit bit figure pattern generation unit associates individual bits constituting the unit bit matrix with lattice points arranged in a matrix of m rows and n columns, and on the lattice point corresponding to the bit “1” or the bit “0”. A unit bit figure pattern is generated by arranging a bit figure of a predetermined shape on an information storage device. The information storage device according to claim 4,
The unit bit graphic pattern generation unit generates a unit bit graphic pattern arranged in a rectangular bit recording area,
A unit recording graphic pattern generation unit is arranged in a rectangular unit recording area including the bit recording area and the alignment mark by adding an alignment mark outside the rectangular bit recording area. Generate unit pattern graphic pattern
A drawing data generation unit generates a drawing pattern including a plurality of unit recording graphic patterns by arranging the rectangular unit recording areas in a two-dimensional matrix, and draws the drawing pattern. An information storage device that generates drawing data. The information storage device according to claim 5,
The unit recording graphic pattern generation unit adds a total of two sets of alignment marks arranged near the outside of the two diagonal corners of the four corners of the rectangular bit recording area. An information storage device characterized by generating a graphic pattern. The information storage device according to claim 5,
The unit recording graphic pattern generation unit generates a unit recording graphic pattern by adding a total of three sets of alignment marks arranged near the outside of the four corners of the rectangular bit recording area. In addition, the information storage device is characterized in that the arrangement pattern of the three sets of alignment marks is made different for the unit recording graphic patterns adjacent to each other. The information storage device according to claim 6 or 7,
The unit recording graphic pattern generation unit sets a specific unit recording area as a reference unit recording area, and for the reference unit recording area, a unit recording graphic using a reference alignment mark different from other unit recording areas An information storage device characterized by generating a pattern. In the information storage device according to any one of claims 1 to 8,
A data input unit, unit data generation unit, unit bit matrix generation unit, unit bit graphic pattern generation unit, unit recording graphic pattern generation unit, and drawing data generation unit are configured by incorporating a program into a computer. An information storage device characterized by that.   9. A data input unit, a unit data generation unit, a unit bit matrix generation unit, a unit bit graphic pattern generation unit, a unit recording graphic pattern generation unit, and a drawing data generation unit in the information storage device according to claim 1 As a program that allows the computer to function. An information reading device for reading digital data stored in an information recording medium using the information storage device according to claim 1,
An image capturing device that captures an image of an image capturing area that forms part of the recording surface of the information recording medium and captures the obtained captured image as image data;
A captured image storage unit for storing the captured image;
A bit recording area recognition unit for recognizing individual bit recording areas by detecting an alignment mark from the captured image stored in the captured image storage unit;
A unit bit matrix recognition unit for recognizing a unit bit matrix by determining whether or not bit figures arranged at a predetermined interval are present at predetermined positions based on the pattern in the bit recording area;
A scanning control unit that performs control to change a shooting target area by the image shooting device so that shot images of all bit recording areas to be read are obtained;
A unit for generating unit data from each unit bit matrix recognized by the unit bit matrix recognition unit, and by synthesizing the individual unit data, a data restoration unit for restoring the digital data to be stored;
An information reading device comprising: An information reading device for reading digital data stored in an information recording medium using the information storage device according to claim 8,
An image capturing device that captures an image of an image capturing area that forms part of the recording surface of the information recording medium and captures the obtained captured image as image data;
A captured image storage unit for storing the captured image;
A bit recording area recognition unit for recognizing individual bit recording areas by detecting an alignment mark from the captured image stored in the captured image storage unit;
A unit bit matrix recognition unit for recognizing a unit bit matrix based on a pattern in the bit recording area;
A scanning control unit that performs control to change a shooting target area by the image shooting device so that shot images of all bit recording areas to be read are obtained;
A unit for generating unit data from each unit bit matrix recognized by the unit bit matrix recognition unit, and by synthesizing the individual unit data, a data restoration unit for restoring the digital data to be stored;
With
The image photographing apparatus has a function of photographing a photographing target area having a size that can include at least one unit recording area,
The scanning control unit controls the image photographing apparatus to adjust a photographing target region so that a photographed image of a region including a reference unit recording region is obtained based on a reference alignment mark. An information reading apparatus characterized by performing control for sequentially moving an imaging target area in accordance with an arrangement pitch of recording areas. The information reading device according to claim 11 or 12,
An information reading apparatus comprising: a captured image storage unit; a bit recording area recognition unit; a unit bit matrix recognition unit; a scan control unit; and a data restoration unit.   The program which makes a computer function as a picked-up image storage part, a bit recording area recognition part, a unit bit matrix recognition part, a scanning control part, and a data decompression | restoration part in the information reading device of Claim 11 or 12.

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