JP2018142405A5 - - Google Patents

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Publication number
JP2018142405A5
JP2018142405A5 JP2017034274A JP2017034274A JP2018142405A5 JP 2018142405 A5 JP2018142405 A5 JP 2018142405A5 JP 2017034274 A JP2017034274 A JP 2017034274A JP 2017034274 A JP2017034274 A JP 2017034274A JP 2018142405 A5 JP2018142405 A5 JP 2018142405A5
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JP
Japan
Prior art keywords
moving
moving mechanism
sample
driving force
moves
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JP2017034274A
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English (en)
Japanese (ja)
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JP2018142405A (ja
JP6735693B2 (ja
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Priority to JP2017034274A priority Critical patent/JP6735693B2/ja
Priority claimed from JP2017034274A external-priority patent/JP6735693B2/ja
Priority to US15/902,639 priority patent/US10366912B2/en
Priority to TW107105959A priority patent/TWI667682B/zh
Publication of JP2018142405A publication Critical patent/JP2018142405A/ja
Publication of JP2018142405A5 publication Critical patent/JP2018142405A5/ja
Application granted granted Critical
Publication of JP6735693B2 publication Critical patent/JP6735693B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017034274A 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置 Expired - Fee Related JP6735693B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017034274A JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置
US15/902,639 US10366912B2 (en) 2017-02-27 2018-02-22 Stage apparatus and charged particle beam apparatus
TW107105959A TWI667682B (zh) 2017-02-27 2018-02-22 Platform device and charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017034274A JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2018142405A JP2018142405A (ja) 2018-09-13
JP2018142405A5 true JP2018142405A5 (https=) 2019-08-22
JP6735693B2 JP6735693B2 (ja) 2020-08-05

Family

ID=63246502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017034274A Expired - Fee Related JP6735693B2 (ja) 2017-02-27 2017-02-27 ステージ装置、及び荷電粒子線装置

Country Status (3)

Country Link
US (1) US10366912B2 (https=)
JP (1) JP6735693B2 (https=)
TW (1) TWI667682B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10600614B2 (en) * 2017-09-29 2020-03-24 Hitachi High-Technologies Corporation Stage device and charged particle beam device
JP7114450B2 (ja) * 2018-12-04 2022-08-08 株式会社日立ハイテク ステージ装置、及び荷電粒子線装置
KR102409486B1 (ko) * 2020-04-21 2022-06-16 (주)하드램 마이크로 엘이디 제조 장치
JP7840203B2 (ja) * 2022-04-20 2026-04-03 株式会社日立ハイテク ステージ装置、荷電粒子線装置、及び光学式検査装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045785A (ja) 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4362862B2 (ja) 2003-04-01 2009-11-11 株式会社ニコン ステージ装置及び露光装置
JP2004356222A (ja) 2003-05-27 2004-12-16 Canon Inc ステージ装置及びその制御方法、露光装置、並びにデバイス製造方法
KR101119814B1 (ko) * 2004-06-07 2012-03-06 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 노광 방법
US7557529B2 (en) * 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US8355114B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
JP5849955B2 (ja) 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
US8988655B2 (en) 2010-09-07 2015-03-24 Nikon Corporation Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
JP2013214028A (ja) * 2012-04-04 2013-10-17 Nikon Corp 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP2013244691A (ja) * 2012-05-28 2013-12-09 Asahi Glass Co Ltd 防曇性物品
KR102676391B1 (ko) * 2015-09-30 2024-06-18 가부시키가이샤 니콘 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법

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