JP2018124279A - Infrared sensor cover, infrared sensor module, and camera - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an infrared sensor cover having high infrared transmissivity, especially a high transmissivity of near infrared radiation, and to provide an infrared sensor module using the infrared sensor cover, and a camera using the infrared sensor cover.SOLUTION: An infrared sensor cover includes a substrate, and an antireflection layer disposed on at least one surface of the substrate. Preferably, one surface of the substrate includes an antireflection layer including a multilayer structure, and the other surface of the substrate includes an antireflection layer including a moth-eye structure. An infrared sensor module includes the infrared sensor cover and an infrared sensor body. A camera includes the infrared sensor cover and the infrared sensor body.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an infrared sensor cover, an infrared sensor module, and a camera.

  An infrared sensor is a technology that receives light in the infrared region, converts it into an electrical signal, extracts necessary information, and applies it, or a device that uses that technology. It can see things without stimulating human vision. The temperature of the object can be measured instantaneously without contact from a distance. Due to its characteristics, it is used in applications such as video devices such as cameras and non-contact temperature measuring devices.

  In general, an infrared sensor is provided with a cover around the body for the purpose of protecting the body of the infrared sensor. For example, Patent Document 1 discloses an infrared sensor in which a main body of an infrared sensor is covered with a polyethylene resin cover.

JP2013-088248A

However, since the infrared sensor disclosed in Patent Document 1 is made of a simple polyethylene resin, the infrared transmittance is not sufficient and the performance of the infrared sensor is inferior.
Glass or resin is often used as the cover of the infrared sensor. However, simply using glass or resin may not provide sufficient infrared transmittance and may cause inferior performance of the infrared sensor. In particular, in applications that require advanced infrared sensor performance, higher infrared transmittance is required.

  Therefore, the present invention is to solve these problems and to provide an infrared sensor cover excellent in infrared transmittance, in particular, near infrared transmittance. The present invention also provides an infrared sensor module using the infrared sensor cover and a camera using the infrared sensor cover.

The present invention has the following aspects.
[1] An infrared sensor cover having a substrate and an antireflection layer provided on at least one surface of the substrate.
[2] The infrared sensor cover according to [1], wherein the antireflection layer is an antireflection layer including a multilayer structure or an antireflection layer including a moth-eye structure.
[3] The infrared sensor cover according to [2], wherein the multilayer structure includes a plurality of layers having different refractive indexes.
[4] The infrared sensor cover according to [2], wherein an average interval between adjacent convex portions of the moth-eye structure is 400 nm or less.
[5] The infrared sensor cover according to any one of [1] to [4], wherein the substrate material is glass or resin.
[6] The infrared sensor cover according to [5], wherein the substrate material is glass.
[7] Any one of [1] to [6], wherein an antireflection layer including a multilayer structure is provided on one surface of the substrate, and an antireflection layer including a moth-eye structure is provided on the other surface of the substrate. Infrared sensor cover.
[8] The infrared sensor cover according to any one of [1] to [7], wherein the infrared rays are near infrared rays.
[9] The infrared sensor cover according to any one of [1] to [8], wherein the transmittance at a wavelength of 850 nm is 93% or more.
[10] The infrared sensor cover according to any one of [1] to [9], wherein the transmittance at a wavelength of 950 nm is 93% or more.
[11] An infrared sensor module including the infrared sensor cover and the infrared sensor main body according to any one of [1] to [10].
[12] A camera including the infrared sensor cover and the infrared sensor main body according to any one of [1] to [10].

The present invention is excellent in infrared transmittance, particularly near infrared transmittance.
Moreover, since the infrared sensor module of the present invention is excellent in infrared transmittance, particularly near infrared transmittance, the infrared sensor module is excellent in performance.
Furthermore, the camera of the present invention is excellent in the performance of the camera because it has excellent infrared transmittance, particularly near infrared transmittance.

It is typical sectional drawing which shows one Embodiment of the infrared sensor cover of this invention.

(Infrared sensor cover)
The infrared sensor cover of the present invention includes a substrate and an antireflection layer provided on at least one surface of the substrate.
FIG. 1 shows an embodiment of the infrared sensor cover of the present invention. An infrared sensor cover 10 shown in FIG. 1 has an antireflection layer 30 including a multilayer structure on one surface of a substrate 20 and an antireflection layer 40 including a moth-eye structure on the other surface of the substrate 20. The antireflection layer 30 including a multilayer structure includes a high refractive index layer 31 and a low refractive index layer 32. The antireflection layer 40 including a moth-eye structure has a base material 41 and a moth-eye structure layer 42.

(substrate)
The material of the substrate is not particularly limited as long as it is a material that transmits infrared rays, and examples thereof include resins such as acrylic resin, polycarbonate resin, styrene resin, cellulose resin, polyester resin, and polyolefin resin; glass and the like. Among these substrate materials, glass and resin are preferable, and glass is more preferable because of excellent infrared transmittance.

The surface of the substrate may be subjected to coating treatment, corona treatment or the like for the purpose of improving properties such as adhesion and scratch resistance.
The shape of the substrate can be appropriately selected according to the application of the infrared sensor.

(Antireflection layer)
Examples of the antireflection layer include an antireflection layer including a multilayer structure to which antireflection performance is imparted by interference of reflected waves, and an antireflection layer including a moth-eye structure to which antireflection performance is imparted by a micro uneven structure. . Among these antireflective layers, an antireflection layer including a multilayer structure and an antireflection layer including a moth-eye structure are preferable because of excellent infrared transmittance, and a reflection including a motheye structure is preferable because of excellent infrared transmittance. A prevention layer is more preferred.

  In the infrared sensor cover of the present invention, an antireflection layer is provided on at least one surface of the substrate, but since the infrared transmittance is excellent, it is preferable that an antireflection layer is provided on both surfaces of the substrate. More preferably, an antireflection layer including a multilayer structure is provided on the surface, and an antireflection layer including a moth-eye structure is provided on the other surface of the substrate.

(Antireflection layer including multilayer structure)
An antireflection layer including a multilayer structure is provided with antireflection performance due to interference of reflected waves. The antireflection layer including a multilayer structure is not particularly limited as long as the refractive index of the multilayer structure is adjusted so that antireflection performance is imparted by interference of reflected waves, and an antireflection layer including a known multilayer structure is used. be able to.

  The multilayer structure preferably includes a plurality of layers having different refractive indexes in order to provide antireflection performance due to interference of reflected waves.

  Between the antireflection layer containing a multilayer structure and the substrate, an adhesive layer for enhancing adhesion, a hard coat layer for enhancing scratch resistance, a base material for laminating the multilayer structure, etc. may be provided. .

(Antireflection layer including moth-eye structure)
The antireflection layer including the moth-eye structure is provided with antireflection performance due to the minute uneven structure.
The fine concavo-convex structure includes a plurality of convex portions and a concave portion formed between the plurality of convex portions.

The average interval between adjacent convex portions of the fine concavo-convex structure is preferably 20 nm to 400 nm, and more preferably 80 nm to 300 nm. When the average interval between adjacent convex portions of the fine concavo-convex structure is 20 nm or more, the convex portions are easily formed when the plurality of pores of the anodized porous alumina are transferred to form the convex portions. In addition, when the average interval between adjacent convex portions of the fine concavo-convex structure is 400 nm or less, when the convex portions are formed by transferring a plurality of pores of anodized porous alumina, the pore interval is increased. The voltage can be suppressed, and anodized porous alumina is easily produced industrially.
In this specification, the average interval between adjacent convex portions is determined by randomly determining the interval between adjacent convex portions (the distance from the center of the convex portion to the center of the adjacent convex portion) using electron microscope observation. Point measurement is performed, and these values are averaged.

The average height of the convex portions is preferably 60 nm to 400 nm, and more preferably 90 nm to 350 nm. When the average height of the convex portions is 60 nm or more, an increase in the minimum reflectance or the reflectance at a specific wavelength can be suppressed, and the antireflection performance is excellent. Further, when the average height of the convex portions is 400 nm or less, the convex portions are easily formed and the convex portions are excellent in scratch resistance.
In this specification, the average height of the convex portion is obtained by randomly measuring the vertical distance between the topmost portion of the convex portion and the bottommost portion of the adjacent concave portion using electron microscope observation. Is the average value.

  The aspect ratio of the protrusions (average height of protrusions / average interval between adjacent protrusions) is preferably 0.8 to 5.0, more preferably 1.2 to 4.0, and 1.5 to 3 0.0 is more preferable. When the aspect ratio of the convex portion is 0.8 or more, the antireflection performance is excellent. Further, when the aspect ratio of the convex portion is 5.0 or less, the convex portion is easily formed and the convex portion is excellent in scratch resistance.

Examples of the shape of the convex portion include a cone shape, a pyramid shape, a bell shape, and a columnar shape. These convex portions may be used singly or in combination of two or more. Among these convex shapes, it is possible to continuously increase the refractive index from the air to the surface of the material that forms the fine concavo-convex structure to develop antireflection performance that achieves both low reflectance and low wavelength dependency. Since it can do, the shape which the convex part cross-sectional area of the direction orthogonal to a height direction increases continuously from a top part to a depth direction is preferable, and a cone shape, a pyramid shape, and a bell shape are more preferable.
The convex portion may be one in which a plurality of fine convex portions are combined to form one convex portion.

As a manufacturing method of a fine concavo-convex structure, the following method 1, the following method 2, the following method 3, etc. are mentioned, for example.
Method 1: Method of forming a fine concavo-convex structure directly on the surface of a substrate by injection molding or press molding using a mold having a reverse structure of a fine concavo-convex structure on the surface Method 2: Mold having an inverted structure of a fine concavo-convex structure The active energy ray-curable composition is cured with the active energy ray-curable composition sandwiched between the substrate and the base material to form a cured resin layer, and then the cured resin layer and the mold are separated. Method Method 3: An active energy ray-curable composition is sandwiched between a mold having an inverted structure of a fine relief structure and a substrate, and the fine relief structure of the mold is transferred to the active energy ray-curable composition. After separating the mold, the active energy ray-curable composition is cured to form a cured resin layer. Among these fine concavo-convex structure manufacturing methods, the fine concavo-convex structure has excellent transferability, and Because of excellent flexibility of the composition, methods 2, preferably Method 3, Method 2 is more preferable.

  As the mold, for example, a mold provided with a reversal structure of fine concavo-convex structure on the surface by lithography, a mold provided with a reversal structure of fine concavo-convex structure on the surface by laser processing, an anodized porous alumina having a plurality of pores on the surface And a replica mold replicated by electroforming from a mother mold having a fine concavo-convex structure. Among these molds, a mold in which anodized porous alumina having a plurality of pores is formed on the surface is preferable because it is excellent in antireflection performance and can easily form a large-area fine concavo-convex structure at low cost.

Examples of the lithography method include an electron beam lithography method and a laser interference lithography method.
As a method for producing a mold having a surface with a reverse structure of a fine concavo-convex structure formed by lithography, for example, a photoresist film is applied to the surface of a substrate, exposed to ultraviolet laser, electron beam, X-ray or the like and developed. A method for obtaining a mold having a fine concavo-convex structure comprising a resist pattern on its surface; selectively etching the substrate by dry etching or the like through the resist pattern to remove the resist pattern, thereby Examples include a method of obtaining a mold directly formed on the surface of the material.

  Examples of a method for producing a mold having anodized porous alumina having a plurality of pores on the surface include a method in which aluminum is anodized at a predetermined voltage using oxalic acid, sulfuric acid, phosphoric acid or the like as an electrolyte. Can be mentioned.

Examples of a method for producing a mold having an anodized porous alumina formed on the surface include a method in which aluminum is anodized at a predetermined voltage using oxalic acid, sulfuric acid, phosphoric acid or the like as an electrolyte.
According to the method of anodizing aluminum at a predetermined voltage using oxalic acid, sulfuric acid, phosphoric acid or the like as an electrolyte, high-purity aluminum is anodized at a constant voltage for a long time, and then all or part of the oxide film is temporarily By removing and anodizing again, anodized porous alumina having very highly regular pores formed in a self-organized manner can be formed, which is preferable. Further, by combining the anodizing process and the pore diameter expanding process in the second anodizing step, it is possible to form pores having a triangular or bell-shaped cross section instead of a rectangular cross section. Furthermore, the angle of the innermost part of the pore can be sharpened by appropriately adjusting the time, number of times, conditions and the like of the anodizing treatment and the pore diameter enlargement treatment.
Specific examples of the method for producing a mold having an anodized porous alumina formed on the surface include, for example, the method described in JP-A-2015-129706.

  Examples of the shape of the mold include a flat plate shape, a belt shape, and a roll shape. Among these mold shapes, a belt-like shape and a roll-like shape are preferable because the fine concavo-convex structure can be transferred continuously and the productivity of the substrate is excellent.

The fine concavo-convex structure is preferably composed of a cured resin layer because the fine concavo-convex structure can be more easily formed.
The cured resin layer is a layer made of a cured product of the active energy ray curable composition.

The active energy ray-curable composition is a composition that cures by irradiating active energy rays to advance a polymerization reaction.
Examples of the active energy rays include visible light, ultraviolet rays, electron beams, plasma, heat rays (infrared rays, etc.) and the like. Among these active energy rays, ultraviolet rays and electron beams are preferable, and ultraviolet rays are more preferable because the active energy ray-curable composition is excellent in curability.

  The active energy ray-curable composition preferably contains a polymerizable compound, a polymerization initiator, and, if necessary, other additives.

  Examples of the polymerizable compound include monomers, oligomers, reactive polymers, and the like that include at least one of a radical polymerizable bond and a cationic polymerizable bond in the molecule. These polymerizable compounds may be used alone or in combination of two or more.

Examples of the monomer having a radical polymerizable bond include a monofunctional monomer having a (meth) acryloyl group and a vinyl group, and a polyfunctional monomer having a (meth) acryloyl group and a vinyl group. These monomers having a radical polymerizable bond may be used alone or in combination of two or more.
In this specification, (meth) acryl refers to acryl, methacryl or both.

  Examples of the monomer having a cationic polymerizable bond include monomers having an epoxy group, an oxetanyl group, an oxazolyl group, a vinyloxy group, and the like. These monomers having a cationic polymerizable bond may be used alone or in combination of two or more.

  Examples of the oligomer or reactive polymer containing at least one of radically polymerizable bond and cationically polymerizable bond in the molecule include unsaturated polyester compounds such as a condensate of unsaturated dicarboxylic acid and polyhydric alcohol; polyester (meta Polyether (meth) acrylate; Polyol (meth) acrylate; Epoxy (meth) acrylate; Urethane (meth) acrylate; Cationic polymerization type epoxy compound; Monomer or copolymer of the monomer having the radical polymerizable bond in the side chain Examples thereof include polymers. These oligomers or reactive polymers containing at least one of a radically polymerizable bond and a cationically polymerizable bond in these molecules may be used alone or in combination of two or more.

  Examples of the polymerization initiator include known photopolymerization initiators, known electron beam polymerization initiators, and known thermal polymerization initiators. These polymerization initiators may be used alone or in combination of two or more.

  Other additives include, for example, non-reactive polymers, antioxidants, mold release agents, lubricants, plasticizers, antistatic agents, light stabilizers, flame retardants, flame retardant aids, polymerization inhibitors, UV absorbers Agents, fillers, silane coupling agents, reinforcing agents, inorganic fillers, impact modifiers and the like. These other additives may be used alone or in combination of two or more.

  An active energy ray-curable composition capable of forming a hydrophobic material when water repellency is imparted to the surface of the fine uneven structure (specifically, when the contact angle between the fine uneven structure and water is 90 ° or more). It is preferable to use a fluorine-containing compound or a silicone compound.

  An active energy ray-curable composition capable of forming a hydrophilic material when hydrophilicity is imparted to the surface of the fine relief structure (specifically, when the contact angle between the fine relief structure and water is 25 ° or less). As above, it is preferable to use a tetrafunctional or higher polyfunctional (meth) acrylate and a bifunctional or higher hydrophilic (meth) acrylate in combination.

  Specific examples of the composition of the active energy ray-curable composition include the compositions described in JP2013-175733A and JP2015-129947A.

  As a method of sandwiching the active energy ray-curable composition between the mold and the base material, for example, the mold and the base material are placed in a state where the active energy ray-curable composition is disposed between the mold and the base material. Examples of the method include a method of injecting an active energy ray-curable composition into the fine uneven structure of the mold by pressing.

  Examples of the base material include acrylic resins such as polymethyl methacrylate; polycarbonate resins; styrene resins such as polystyrene and methyl methacrylate-styrene copolymers; cellulose resins such as cellulose diacetate, cellulose triacetate, and cellulose acetate butyrate; Polyester resin such as polyethylene terephthalate; Polyamide resin; Polyimide resin; Polyether sulfone resin; Polysulfone resin; Polyolefin resin such as polypropylene, polymethylpentene, and alicyclic polyolefin; Vinyl chloride resin such as polyvinyl chloride; Polyvinyl acetal resin; Polyetherketone resin; polyurethane resin; glass and the like. Among these materials for the base material, acrylic resin, polycarbonate resin, polyester resin, and cellulose resin are preferable, and polyester resin and cellulose resin are more preferable because of excellent external line transmittance.

  Examples of the form of the substrate include known forms such as a film and a sheet. Among these substrate forms, films and sheets are preferred because of excellent productivity and handling.

  As a manufacturing method of a base material, well-known manufacturing methods, such as an injection molding method, an extrusion molding method, a cast molding method, etc. are mentioned, for example. Among these methods for producing a substrate, an extrusion molding method and a cast molding method are preferable because of excellent productivity.

  The surface of the base material may be subjected to coating treatment, corona treatment, etc. for the purpose of improving properties such as adhesion, antistatic properties, scratch resistance, and weather resistance.

(Infrared sensor cover application)
Since the infrared rays targeted by the infrared sensor cover of the present invention are more excellent in transmittance, near infrared rays are preferred, 700 nm to 1500 nm are more preferred, and 800 to 1000 nm are even more preferred.

The transmittance at a wavelength of 850 nm of the infrared sensor cover of the present invention is preferably 93% or more, more preferably 95% or more, and still more preferably 97% or more, because of excellent infrared transmittance, particularly near infrared transmittance. .
The transmittance at a wavelength of 950 nm of the infrared sensor cover of the present invention is preferably 93% or more, more preferably 95% or more, and still more preferably 97% or more, because of excellent infrared transmittance, particularly near-infrared transmittance. .

  By including the infrared sensor cover and the infrared sensor main body of the present invention, it can be suitably used for an infrared sensor module and a camera, and since the infrared sensor cover is particularly excellent in the near infrared transmittance, it is particularly suitable for a near infrared camera. Can be used. The infrared sensor module and the camera can be used for a distance / image sensor, a biometric authentication system, a biometric monitoring system, a security system, and the like used for automatic driving and motion sensors.

  EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to these Examples.

(Transmittance measurement)
Using the spectrophotometer (model name “U-4000”, manufactured by Hitachi, Ltd.), the transmittances of the infrared sensor covers obtained in the examples and comparative examples were measured for transmittances at wavelengths of 850 nm and 950 nm.

[Production Example 1] Mold Production A blanket polishing treatment was performed on a cylindrical aluminum base material having an aluminum ingot having a purity of 99.99% and having an outer diameter of 200 mm, an inner diameter of 155 mm, and a length of 350 mm without any rolling marks. Thereafter, it was electropolished in a perchloric acid / ethanol mixed solution (volume ratio = 1/4) to form a mirror surface.
The obtained aluminum substrate was anodized in a 0.3 M oxalic acid aqueous solution for 10 minutes under the conditions of a direct current of 40 V and a temperature of 16 ° C. Thereafter, the aluminum substrate was immersed in a 6% by mass phosphoric acid / 1.8% by mass chromic acid mixed aqueous solution to remove the oxide film.
The obtained aluminum substrate was anodized in a 0.3 M oxalic acid aqueous solution for 30 seconds under the conditions of a direct current of 40 V and a temperature of 16 ° C.
The obtained aluminum base material on which the oxide film was formed was immersed in a 5% by mass phosphoric acid aqueous solution at 30 ° C. for 8 minutes to carry out pore size enlargement treatment (pore size enlargement treatment step). Thereafter, the aluminum substrate was anodized in a 0.3 M oxalic acid aqueous solution for 30 seconds under conditions of a direct current of 40 V and a temperature of 16 ° C. (oxide film growth step). The pore diameter expansion treatment step and the oxide film growth step are repeated a total of four times, and finally the pore diameter expansion treatment step is performed. As a result, anodized alumina having substantially conical pores with an average interval of 100 nm and a depth of 200 nm is designed. A roll-shaped mold formed on the surface was obtained.

[Production Example 2] Preparation of active energy ray-curable composition 25 parts by mass of dipentaerythritol hexaacrylate, 25 parts by mass of pentaerythritol triacrylate, 25 parts by mass of polyethylene glycol diacrylate, ethylene oxide-modified compound 25 of dipentaerythritol hexaacrylate 1 part by weight of a first photopolymerization initiator (trade name “Irgacure 184”, manufactured by BASF), and a second photopolymerization initiator (trade name “Irgacure 819”, manufactured by BASF) 0.5 parts by mass and 0.1 parts by mass of a release agent (trade name “TDP-2”, manufactured by Nikko Chemicals Co., Ltd.) were added and mixed to prepare an active energy ray-curable composition.

[Production Example 3] Production of antireflection layer containing moth-eye structure The roll-shaped mold obtained in Production Example 1 was rotated, and a polyethylene terephthalate base material (trade name “Cosmo” in the mold rotation direction along the outer peripheral surface of the mold. The active energy ray-curable composition obtained in Production Example 2 was moved between the outer peripheral surface of the mold and the running substrate while running Shine A4300 "(Toyobo Co., Ltd., thickness 75 μm). Then, the active energy ray-curable composition was cured by irradiation with ultraviolet rays. The obtained hardened | cured material was peeled from the mold and the antireflection layer containing a moth eye structure was manufactured.
[Production Example 4] Production of antireflection layer including moth-eye structure The roll-shaped mold obtained in Production Example 1 is rotated, and a triacetylcellulose base material (trade name "Product name" is formed in the mold rotation direction along the outer peripheral surface of the mold. TD80ULM ”(manufactured by Fuji Film Co., Ltd., thickness: 80 μm), and the active energy ray-curable composition obtained in Production Example 2 was placed between the outer peripheral surface of the mold and the running substrate. Then, the active energy ray-curable composition was cured by irradiation with ultraviolet rays. The obtained hardened | cured material was peeled from the mold and the antireflection layer containing a moth eye structure was manufactured.

[Example 1]
An antireflection film (trade name “FHC-ARAF”, manufactured by Higashiyama Film Co., Ltd.) having an antireflection layer including a multilayer structure is used as one of glass substrates (trade name “S9112”, manufactured by Matsunami Glass Industry Co., Ltd.). An infrared sensor cover was obtained by sticking to the surface via an adhesive layer.
The obtained evaluation results are shown in Table 1.

[Example 2]
The antireflection layer including the moth-eye structure obtained in Production Example 3 is attached to one surface of a glass substrate (trade name “S9112”, Matsunami Glass Industry Co., Ltd.) via an adhesive layer, and an infrared sensor cover is attached. Obtained.
The obtained evaluation results are shown in Table 1.

[Example 3]
An antireflection film (trade name “FHC-ARAF”, manufactured by Higashiyama Film Co., Ltd.) having an antireflection layer including a multilayer structure is used as one of glass substrates (trade name “S9112”, manufactured by Matsunami Glass Industry Co., Ltd.). The antireflection layer containing the moth eye structure obtained in Production Example 3 was attached to the other surface of the glass substrate via the adhesive layer to obtain an infrared sensor cover.
The obtained evaluation results are shown in Table 1.
[Example 4]
The antireflection layer including the moth-eye structure obtained in Production Example 4 is attached to one surface of a glass substrate (trade name “S9112”, manufactured by Matsunami Glass Industry Co., Ltd.) via an adhesive layer, and an infrared sensor cover is attached. Obtained.
The obtained evaluation results are shown in Table 1.

[Comparative Example 1]
An antireflection layer was not provided on any surface, and a glass substrate (trade name “S9112”, manufactured by Matsunami Glass Industry Co., Ltd.) itself was used as an infrared sensor cover.
The obtained evaluation results are shown in Table 1.

As can be seen from Table 1, the infrared sensor covers obtained in the examples were excellent in infrared transmittance, particularly near infrared transmittance.
On the other hand, the infrared sensor cover obtained in the comparative example was inferior in infrared transmittance, particularly near infrared transmittance.

DESCRIPTION OF SYMBOLS 10 Infrared sensor cover 20 Substrate 30 Antireflection layer containing multilayer structure 31 High refractive index layer 32 Low refractive index layer 40 Antireflection layer containing moth eye structure 41 Base material 42 Moss eye structure layer

Claims (12)

A substrate,
An antireflection layer provided on at least one surface of the substrate;
Having an infrared sensor cover.   The infrared sensor cover according to claim 1, wherein the antireflection layer is an antireflection layer including a multilayer structure or an antireflection layer including a moth-eye structure.   The infrared sensor cover according to claim 2, wherein the multilayer structure includes a plurality of layers having different refractive indexes.   The infrared sensor cover according to claim 2, wherein an average interval between adjacent convex portions of the moth-eye structure is 400 nm or less.   The infrared sensor cover according to any one of claims 1 to 4, wherein a material of the substrate is glass or resin.   The infrared sensor cover according to claim 5, wherein a material of the substrate is glass. An antireflection layer including a multilayer structure is provided on one surface of the substrate,
An antireflection layer including a moth-eye structure was provided on the other surface of the substrate;
The infrared sensor cover according to claim 1.   The infrared sensor cover according to claim 1, wherein the infrared rays are near infrared rays.   The infrared sensor cover according to claim 1, wherein the transmittance at a wavelength of 850 nm is 93% or more.   The infrared sensor cover according to any one of claims 1 to 9, wherein a transmittance at a wavelength of 950 nm is 93% or more.   An infrared sensor module comprising the infrared sensor cover and the infrared sensor main body according to claim 1.   The camera containing the infrared sensor cover and infrared sensor main body in any one of Claims 1-10.