JP2018104804A - 製造装置 - Google Patents

製造装置 Download PDF

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Publication number
JP2018104804A
JP2018104804A JP2016255719A JP2016255719A JP2018104804A JP 2018104804 A JP2018104804 A JP 2018104804A JP 2016255719 A JP2016255719 A JP 2016255719A JP 2016255719 A JP2016255719 A JP 2016255719A JP 2018104804 A JP2018104804 A JP 2018104804A
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Japan
Prior art keywords
abbreviation
vapor deposition
crucible
light
phenyl
Prior art date
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Withdrawn
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JP2016255719A
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English (en)
Japanese (ja)
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JP2018104804A5 (https=
Inventor
山崎　舜平
Shunpei Yamazaki
舜平 山崎
江口　晋吾
Shingo Eguchi
晋吾 江口
智哉 青山
Tomoya Aoyama
智哉 青山
由衣 末松
Yui Suematsu
由衣 末松
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2016255719A priority Critical patent/JP2018104804A/ja
Publication of JP2018104804A publication Critical patent/JP2018104804A/ja
Publication of JP2018104804A5 publication Critical patent/JP2018104804A5/ja
Withdrawn legal-status Critical Current

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  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2016255719A 2016-12-28 2016-12-28 製造装置 Withdrawn JP2018104804A (ja)

Priority Applications (1)

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JP2016255719A JP2018104804A (ja) 2016-12-28 2016-12-28 製造装置

Applications Claiming Priority (1)

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JP2016255719A JP2018104804A (ja) 2016-12-28 2016-12-28 製造装置

Publications (2)

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JP2018104804A true JP2018104804A (ja) 2018-07-05
JP2018104804A5 JP2018104804A5 (https=) 2020-02-06

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ID=62786765

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JP2016255719A Withdrawn JP2018104804A (ja) 2016-12-28 2016-12-28 製造装置

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JP (1) JP2018104804A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116219368A (zh) * 2021-12-02 2023-06-06 佳能特机株式会社 蒸镀用坩埚及蒸镀装置
WO2024201548A1 (ja) * 2023-03-24 2024-10-03 シャープディスプレイテクノロジー株式会社 蒸着装置、表示装置の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247374A (ja) * 1989-03-20 1990-10-03 Hitachi Ltd 蒸発源用るつぼ及びそれを用いた薄膜成膜方法
JPH11222667A (ja) * 1998-02-06 1999-08-17 Ulvac Corp 蒸着源用るつぼ、及び蒸着装置
JP2004263299A (ja) * 2003-02-14 2004-09-24 Semiconductor Energy Lab Co Ltd 製造装置
JP2012172185A (ja) * 2011-02-21 2012-09-10 Mitsubishi Heavy Ind Ltd 蒸着用容器、及びこれを備えた蒸着装置
JP2014031547A (ja) * 2012-08-03 2014-02-20 Canon Tokki Corp 蒸着装置及び蒸着方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247374A (ja) * 1989-03-20 1990-10-03 Hitachi Ltd 蒸発源用るつぼ及びそれを用いた薄膜成膜方法
JPH11222667A (ja) * 1998-02-06 1999-08-17 Ulvac Corp 蒸着源用るつぼ、及び蒸着装置
JP2004263299A (ja) * 2003-02-14 2004-09-24 Semiconductor Energy Lab Co Ltd 製造装置
JP2012172185A (ja) * 2011-02-21 2012-09-10 Mitsubishi Heavy Ind Ltd 蒸着用容器、及びこれを備えた蒸着装置
JP2014031547A (ja) * 2012-08-03 2014-02-20 Canon Tokki Corp 蒸着装置及び蒸着方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116219368A (zh) * 2021-12-02 2023-06-06 佳能特机株式会社 蒸镀用坩埚及蒸镀装置
KR20230083234A (ko) 2021-12-02 2023-06-09 캐논 톡키 가부시키가이샤 증착용 도가니 및 증착 장치
JP2023082513A (ja) * 2021-12-02 2023-06-14 キヤノントッキ株式会社 蒸着用坩堝及び蒸着装置
JP7444843B2 (ja) 2021-12-02 2024-03-06 キヤノントッキ株式会社 蒸着用坩堝及び蒸着装置
WO2024201548A1 (ja) * 2023-03-24 2024-10-03 シャープディスプレイテクノロジー株式会社 蒸着装置、表示装置の製造方法

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