JP2018081307A5 - - Google Patents

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Publication number
JP2018081307A5
JP2018081307A5 JP2017206450A JP2017206450A JP2018081307A5 JP 2018081307 A5 JP2018081307 A5 JP 2018081307A5 JP 2017206450 A JP2017206450 A JP 2017206450A JP 2017206450 A JP2017206450 A JP 2017206450A JP 2018081307 A5 JP2018081307 A5 JP 2018081307A5
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JP
Japan
Prior art keywords
acetate
forming method
liquid
pattern forming
formation method
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JP2017206450A
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English (en)
Japanese (ja)
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JP6759174B2 (ja
JP2018081307A (ja
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Priority to TW106137910A priority Critical patent/TWI749094B/zh
Publication of JP2018081307A publication Critical patent/JP2018081307A/ja
Publication of JP2018081307A5 publication Critical patent/JP2018081307A5/ja
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Publication of JP6759174B2 publication Critical patent/JP6759174B2/ja
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JP2017206450A 2016-11-07 2017-10-25 処理液及びパターン形成方法 Active JP6759174B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW106137910A TWI749094B (zh) 2016-11-07 2017-11-02 處理液及圖案形成方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016217600 2016-11-07
JP2016217600 2016-11-07

Publications (3)

Publication Number Publication Date
JP2018081307A JP2018081307A (ja) 2018-05-24
JP2018081307A5 true JP2018081307A5 (https=) 2019-04-11
JP6759174B2 JP6759174B2 (ja) 2020-09-23

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ID=62198025

Family Applications (1)

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JP2017206450A Active JP6759174B2 (ja) 2016-11-07 2017-10-25 処理液及びパターン形成方法

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JP (1) JP6759174B2 (https=)
TW (1) TWI749094B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020040034A1 (ja) * 2018-08-20 2020-02-27 富士フイルム株式会社 薬液収容体
CN112752746B (zh) * 2018-09-28 2023-07-28 株式会社德山 氢氧化季铵的有机溶剂溶液的制造方法
KR102837395B1 (ko) * 2018-10-03 2025-07-23 후지필름 가부시키가이샤 약액 및 약액 수용체
JP7221027B2 (ja) * 2018-11-12 2023-02-13 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
EP3997521B1 (en) * 2019-07-11 2023-08-30 Merck Patent GmbH Photoresist remover compositions
KR102724840B1 (ko) * 2019-08-29 2024-11-01 후지필름 가부시키가이샤 패턴 형성 방법, 전자 디바이스의 제조 방법
JP2021081545A (ja) * 2019-11-18 2021-05-27 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH レジストパターン間置換液、およびそれを用いたレジストパターンの製造方法
IL310053A (en) * 2021-07-14 2024-03-01 Fujifilm Corp A method for creating a template and a method for manufacturing an electronic device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8900802B2 (en) * 2013-02-23 2014-12-02 International Business Machines Corporation Positive tone organic solvent developed chemically amplified resist
JPWO2016104565A1 (ja) * 2014-12-26 2017-09-21 富士フイルム株式会社 有機系処理液およびパターン形成方法
JP2018072358A (ja) * 2015-03-02 2018-05-10 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物及び感活性光線性又は感放射線性膜

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