JP2018046136A5 - - Google Patents
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- JP2018046136A5 JP2018046136A5 JP2016179331A JP2016179331A JP2018046136A5 JP 2018046136 A5 JP2018046136 A5 JP 2018046136A5 JP 2016179331 A JP2016179331 A JP 2016179331A JP 2016179331 A JP2016179331 A JP 2016179331A JP 2018046136 A5 JP2018046136 A5 JP 2018046136A5
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- JP
- Japan
- Prior art keywords
- semiconductor region
- region
- epitaxial layer
- bsr
- layer epi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 description 45
- 239000010410 layer Substances 0.000 description 20
- 238000002955 isolation Methods 0.000 description 16
- 230000015556 catabolic process Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003071 parasitic Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000875 corresponding Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016179331A JP6705726B2 (ja) | 2016-09-14 | 2016-09-14 | 半導体装置 |
US15/635,441 US10229903B2 (en) | 2016-09-14 | 2017-06-28 | Semiconductor device with a resistance element and an electrostatic protection element |
CN201710784798.7A CN107818976B (zh) | 2016-09-14 | 2017-09-04 | 半导体器件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016179331A JP6705726B2 (ja) | 2016-09-14 | 2016-09-14 | 半導体装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018046136A JP2018046136A (ja) | 2018-03-22 |
JP2018046136A5 true JP2018046136A5 (fr) | 2019-04-04 |
JP6705726B2 JP6705726B2 (ja) | 2020-06-03 |
Family
ID=61560784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016179331A Active JP6705726B2 (ja) | 2016-09-14 | 2016-09-14 | 半導体装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10229903B2 (fr) |
JP (1) | JP6705726B2 (fr) |
CN (1) | CN107818976B (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109887912B (zh) * | 2019-03-06 | 2021-07-13 | 西安微电子技术研究所 | 一种面向冷备份系统双极型集成电路应用的静电保护电路 |
JP7086018B2 (ja) | 2019-03-12 | 2022-06-17 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0109996B1 (fr) * | 1982-11-26 | 1987-06-03 | International Business Machines Corporation | Structure de résistance autopolarisée et application à la réalisation de circuits d'interface |
GB2204445B (en) * | 1987-03-06 | 1991-04-24 | Texas Instruments Ltd | Semiconductor switch |
EP0429686B1 (fr) * | 1989-10-30 | 1994-12-28 | Siemens Aktiengesellschaft | Structure de protection d'entrée pour circuits intégrés |
US5521783A (en) * | 1993-09-17 | 1996-05-28 | Analog Devices, Inc. | Electrostatic discharge protection circuit |
JPH07211510A (ja) * | 1994-01-27 | 1995-08-11 | Nippondenso Co Ltd | 半導体装置 |
JPH1079472A (ja) * | 1996-09-05 | 1998-03-24 | Mitsubishi Electric Corp | 半導体集積回路 |
JP4067346B2 (ja) * | 2002-06-25 | 2008-03-26 | 三洋電機株式会社 | 半導体集積回路装置 |
JP3760945B2 (ja) * | 2004-04-01 | 2006-03-29 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
US20070173026A1 (en) * | 2006-01-23 | 2007-07-26 | Bcd Semiconductor Manufacturing Limited | Method for fabricating bipolar integrated circuits |
JP4209432B2 (ja) * | 2006-06-12 | 2009-01-14 | Necエレクトロニクス株式会社 | 静電破壊保護装置 |
JP5749616B2 (ja) * | 2011-09-27 | 2015-07-15 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 半導体装置 |
-
2016
- 2016-09-14 JP JP2016179331A patent/JP6705726B2/ja active Active
-
2017
- 2017-06-28 US US15/635,441 patent/US10229903B2/en active Active
- 2017-09-04 CN CN201710784798.7A patent/CN107818976B/zh active Active
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