JP2018038970A - Cleaning device and cleaning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning device and a cleaning method which can remove a contamination component remaining in a cleaning tank after immersion cleaning.SOLUTION: A cleaning device 1 is provided with a cleaning tank 2 for housing a workpiece W, a cleaning fluid tank 3 for supplying a cleaning fluid to the cleaning tank 2, and an evaporator 41 for generating cleaning steam by vaporizing the cleaning fluid. The device carries out an immersion cleaning process of immersing and cleaning the workpiece W with the cleaning fluid supplied in the cleaning tank 2, a fluid discharge process of discharging the cleaning fluid in the cleaning tank 2 after execution of the immersion cleaning process; and a steam cleaning process of introducing the cleaning steam into the cleaning tank 2 after execution of the fluid discharge process and cleaning the workpiece W by steam. A steam introduction passage 56 for introducing the cleaning steam to the cleaning tank 2 is provided between the cleaning tank 2 and the evaporator 41. The cleaning steam is condensed in the steam introduction passage 56 to store the cleaning fluid, and the cleaning fluid stored in the steam introduction passage 56 is delivered into the cleaning tank 2 in the steam cleaning process.SELECTED DRAWING: Figure 10

Description

  The present invention relates to a cleaning apparatus and a cleaning method for cleaning an object to be processed such as a machine part or a plated part to which an oil-based dirt component or the like is attached.

  Various types of dirt components such as machining oil such as cutting oil, flux, dust, and the like adhere to various parts such as metal machine parts, plated parts, and electronic parts in the manufacturing process and assembly process. The cleaning of the processing object such as mechanical parts and electronic parts to which such a dirt component is attached is, for example, by immersing the processing object in a cleaning tank supplied with a hydrocarbon-based or chlorine-based cleaning liquid. After the immersion cleaning, the cleaning liquid is discharged from the cleaning tank, and further, the cleaning liquid generated by vaporizing the cleaning liquid is sprayed onto the object to be processed in the cleaning tank to perform the steam cleaning. And the to-be-processed object after vapor | steam washing | cleaning is dried by performing a vacuum drying process (for example, refer patent document 1).

Japanese Patent No. 4912229

  By the way, even if the cleaning liquid is discharged from the cleaning tank after the immersion cleaning, the dirt component adhering to the object to be processed may remain in the cleaning tank as a residue, or may adhere to the object to be processed again. Depending on the size of the residue, etc., there is a possibility that it cannot be sufficiently removed by steam cleaning after immersion cleaning.

  The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a cleaning apparatus and a cleaning method capable of removing dirt components remaining in the cleaning tank after immersion cleaning. It is.

The present invention has been proposed in order to achieve the above object. According to the present invention, a cleaning tank for storing an object to be processed, a cleaning liquid tank for supplying a cleaning liquid to the cleaning tank, and a cleaning liquid are provided. An evaporator that generates a cleaning vapor by vaporizing the substrate, an immersion cleaning step of immersing and cleaning an object to be processed in a cleaning liquid supplied in the cleaning bath, and an inside of the cleaning bath after the immersion cleaning step A cleaning apparatus that performs a draining process for discharging a cleaning liquid, and a steam cleaning process for introducing a cleaning steam into the cleaning tank and performing a steam cleaning on an object to be processed after the draining process is performed,
Between the cleaning tank and the evaporator, a steam introduction path for introducing cleaning steam into the cleaning tank is provided, the cleaning steam can be condensed in the steam introduction path, and the cleaning liquid can be stored.
In the steam cleaning step, the cleaning apparatus stores the cleaning liquid stored in the steam introduction path into a cleaning tank.

According to a second aspect of the present invention, the evaporator, the condenser that condenses the cleaning steam generated by the evaporator and regenerates the cleaning liquid, and the steam supply that supplies the cleaning steam from the evaporator to the condenser And a cleaning liquid distillation apparatus comprising:
The cleaning apparatus according to claim 1, wherein the steam introduction path is branched from the steam supply path.

According to a third aspect of the present invention, the object to be processed is accommodated in a cleaning tank, the immersion cleaning step of immersing the object to be processed in the cleaning liquid and cleaning, and the cleaning vapor generated by vaporizing the cleaning liquid being cleaned. A cleaning method for introducing into a tank and performing a steam cleaning process for steam cleaning a workpiece,
Before execution of the steam cleaning step, the cleaning steam is condensed in the steam introduction path for supplying the cleaning steam to the cleaning tank, and the cleaning liquid is stored.
In the steam cleaning step, the cleaning liquid stored in the steam introduction path is sent into a cleaning tank.

According to the present invention, the following excellent effects can be obtained.
According to the invention described in claim 1 and claim 3, even if the dirt component remains in the cleaning tank or the object to be treated after the immersion cleaning process, the cleaning liquid storing the dirt component in the steam introduction path is removed. Use to wash away.

  According to invention of Claim 2, a vapor | steam washing | cleaning process can be performed using the washing | cleaning vapor | steam produced | generated in the process of distilling a washing | cleaning liquid. Therefore, the distillation of the cleaning liquid and the steam cleaning of the object to be processed can be performed efficiently.

It is the schematic explaining the structure of a washing | cleaning apparatus. It is a block diagram explaining the control system of a washing | cleaning apparatus. It is the schematic of a washing | cleaning liquid distillation apparatus. It is a timing chart of operation | movement of a washing | cleaning apparatus. It is explanatory drawing which shows the flow of a distillation process and a washing process. It is the partial schematic diagram of the washing | cleaning apparatus which performs a distillation process. It is the schematic of the washing | cleaning apparatus which supplies a washing | cleaning liquid to a washing tank in an immersion washing process. It is the schematic of the washing | cleaning apparatus which performs immersion cleaning in an immersion cleaning process. It is the schematic of the washing | cleaning apparatus which performs a drainage process. It is the schematic of the washing | cleaning apparatus which performs a vapor | steam washing process. It is the schematic of the washing | cleaning apparatus which performs a reduced pressure drying process. It is the schematic of the washing | cleaning liquid distillation apparatus provided with the supply path cooling means which cools a vapor | steam supply path. It is the schematic of the washing | cleaning liquid distillation apparatus which has arrange | positioned the vapor | steam acceptance port of a condenser above the vapor | steam delivery port of an evaporator.

Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
The cleaning apparatus 1 uses a cleaning liquid and cleaning steam (specifically, cleaning steam generated by vaporizing the cleaning liquid) to clean the workpiece W such as machine parts and electronic parts to which dirt components such as machine oil and fat are attached. As shown in FIGS. 1 and 2, the cleaning tank 2 that can store the workpiece W, the cleaning liquid tank 3 that stores the cleaning liquid, the cleaning liquid distillation apparatus 4 that distills the cleaning liquid, and the cleaning apparatus 1 A vacuum pump 5 capable of reducing the pressure inside, a control device 6 for controlling the cleaning device 1, and an operation panel 7 for operating the cleaning device 1 are configured. The cleaning liquid (cleaning solvent) includes hydrocarbon solvents (4th class 2nd petroleums and 4th class 3rd petroleums; paraffinic and naphthenic), chlorinated solvents (trichloroethylene, tetrachloroethylene), brominated solvents. (Normal propyl bromide), fluorinated solvents (HFC, HFE, HCFC) and the like can be mentioned. From the viewpoint of environmental protection, hydrocarbons are preferred.

  The cleaning tank 2 is a hollow box-shaped pressure-resistant container whose upper part can be opened and closed. The upper opening of the cleaning tank 2 is opened and closed by an opening / closing lid 11, and the object to be processed W (specifically, the object to be processed W is put in). The basket 10) is configured to be stored in and removed from the cleaning tank 2. In addition, a lid open / close detection switch 12 (see FIG. 2) capable of detecting the closed state of the open / close lid 11 is provided at the top of the cleaning tank 2, and is stored in the cleaning tank 2 at the side of the cleaning tank 2. The cleaning tank level sensor 13 capable of detecting the level of the cleaning liquid and the cleaning liquid supply port 14 for receiving the cleaning liquid supplied from the cleaning liquid tank 3 are provided. The cleaning liquid supply port 14 and the cleaning liquid tank 3 can communicate with each other through a cleaning liquid supply path 15, and a cleaning liquid supply valve 16 is provided in the middle of the cleaning liquid supply path 15.

  In addition, an ultrasonic generator 18 that inclines the bottom of the cleaning tank 2 downward from one side toward the other and applies ultrasonic vibrations to the cleaning liquid and the workpiece W in the cleaning tank 2 is provided. Yes. Furthermore, a cleaning liquid discharge port 19 is opened at the lower inclined side of the bottom so that the cleaning liquid discharge port 19 and the cleaning liquid tank 3 can communicate with each other through a cleaning liquid discharge path 20. A cleaning liquid discharge valve 21 is provided in the middle of the cleaning liquid discharge path 20. It has.

  The cleaning liquid tank 3 is a tank that stores the cleaning liquid used for the cleaning process and collects the cleaning liquid used for the cleaning process. A cleaning liquid tank level sensor 25 capable of detecting the liquid level of the cleaning liquid stored in the cleaning liquid tank 3 is provided on the side of the cleaning liquid tank 3. Is opened to the cleaning liquid distillation apparatus 4, and the cleaning liquid supply outlet 26 and the cleaning liquid distillation apparatus 4 are communicated with each other through a distillation introduction path 27.

  Further, in the cleaning liquid discharge path 20 capable of communicating with the cleaning liquid tank 3 and the cleaning tank 2, the branch discharge path 30 is branched from the upstream side (cleaning tank 2 side) of the cleaning liquid discharge valve 21, and the branch discharge path 30. A buffer tank 31 capable of storing the cleaning liquid separately from the cleaning liquid tank 3 is provided in the middle of the branch discharge path 30, and the liquid of the cleaning liquid stored in the buffer tank 31 is connected to the cleaning liquid tank 3. The surface can be detected by the buffer tank level sensor 32. A buffer introduction valve 33 is provided on the upstream side of the buffer tank 31 in the branch discharge path 30, and the buffer discharge is provided on the downstream side of the buffer tank 31 (in other words, between the buffer tank 31 and the cleaning liquid tank 3). A valve 34 is provided.

  The cleaning liquid distillation apparatus 4 includes an evaporator (distilling kettle) 41 that vaporizes the cleaning liquid to generate cleaning steam, a condenser 42 that condenses the cleaning steam generated by the evaporator 41 to regenerate the cleaning liquid, and the cleaning steam. And a steam supply path 43 for supplying the gas from the evaporator 41 to the condenser 42. The evaporator 41 includes an evaporator main body 45 that has heat resistance and pressure resistance and can introduce a cleaning liquid therein, and a heating unit 46 that heats the evaporator main body 45. Then, the downstream end of the distillation introduction path 27 is connected to the lower part of the evaporator main body 45 so that the cleaning liquid can be introduced from the cleaning liquid tank 3, and a vapor outlet 47 is opened at the upper part of the evaporator main body 45 (see FIG. 3). Of the cleaning vapor generated by heating the cleaning liquid by the heating unit 46, the vapor rising to the upper part in the evaporator main body 45 (in other words, the specific gravity is not contained in the evaporator main body 45 without containing impurities such as dirt components). Relatively light steam) can be delivered from the steam outlet 47. Further, the heating unit 46 includes a circulation path (not shown) through which the heat transfer oil (heat transfer fluid) circulates, a heat transfer oil circulation pump 49 (see FIG. 2) connected to the circulation path, and a heat transfer medium. A heating medium oil heater 50 (see FIG. 2) that heats the oil, and heats the evaporator body 45 by circulating the heated heating medium oil in the circulation path by driving the heating medium oil circulation pump 49; The cleaning liquid in the evaporator main body 45 is configured to vaporize (evaporate).

  The condenser 42 is a heat exchanger in which a cooling pipe for passing cooling water is inserted, and the cleaning vapor received from the evaporator 41 into the condenser 42 is cooled by the cooling pipe and condensed, thereby cleaning liquid. Is configured to play. Further, a steam receiving port 52 is opened at the upper part of the condenser 42 (see FIG. 3), and the steam receiving port 52 and the vapor delivery port 47 of the evaporator 41 are communicated with each other through a steam supply path 43. The cleaning steam sent out from the air can flow into the condenser 42 through the steam receiving port 52. The steam supply path 43 is provided with a cleaning steam supply valve 53, and is configured to allow or stop the supply of cleaning steam to the condenser 42 by opening and closing the cleaning steam supply valve 53. Yes. Further, as shown in FIG. 1, the lower part of the condenser 42 and the buffer tank 31 are communicated with each other through a cleaning liquid recovery path 54, and the cleaning liquid condensed and regenerated in the condenser 42 is passed through the cleaning liquid recovery path 54. The buffer tank 31 is configured to collect.

  And the washing | cleaning liquid distillation apparatus 4 comprises the vapor | steam supply path 43 by metal piping with comparatively favorable heat conductivity, and exposes the outer periphery of this vapor | steam supply path 43, without coat | covering with a heat insulating material etc. It is comprised so that heat exchange with the atmosphere in 1 can be performed. Further, as shown in FIG. 3, the downstream portion of the steam supply path 43 on the steam receiving port 52 side is set to a posture extending in the vertical direction (in other words, a posture descending toward the condenser 42 side). Yes. Further, the diameter of the steam supply passage 43 is larger than that of the steam outlet 47, so that the opening cross-sectional area of the steam supply passage 43 is set wider than the opening cross-sectional area of the steam outlet 47, and the cleaning steam supply passage 43 is provided. The internal flow rate is configured to be slower than the flow rate when passing through the steam outlet 47. Further, on the upstream side of the steam supply path 43 (on the evaporator 41 side), a steam introduction path 56 is branched from between the steam outlet 47 and the cleaning steam supply valve 53 and extends downward. The downstream end of 56 communicates with the cleaning tank 2, and the cleaning steam in the evaporator 41 can be introduced into the cleaning tank 2 through the steam introduction path 56. Further, the steam introduction path 56 is provided with a cleaning steam introduction valve 57, and is configured to permit or stop the introduction of the cleaning steam into the cleaning tank 2 by opening and closing the cleaning steam introduction valve 57. Yes. In the state where the cleaning steam introduction valve 57 is closed, when the cleaning steam flows into the steam introduction path 56 from the branch point of the steam supply path 43, the cleaning steam is cooled and condensed in the steam introduction path 56 to become a cleaning liquid. The cleaning liquid flows down in the steam introduction path 56 and is stored in a portion upstream of the cleaning steam introduction valve 57. The operation of the cleaning liquid distillation apparatus 4 having such a configuration will be described later in detail.

  The vacuum pump 5 is a pump capable of depressurizing (degassing) the inside of the cleaning tank 2, the cleaning liquid tank 3, and the buffer tank 31, and as shown in FIG. Connected, the downstream end of the intake passage 60 is branched, and a cleaning tank decompression passage 61, a cleaning liquid tank decompression passage 62, and a buffer tank decompression passage 63 are provided. The cleaning tank decompression path 61 communicates with the cleaning tank 2, and the cleaning tank decompression path 61 is provided with a cleaning tank decompression valve 66. By opening and closing the cleaning tank decompression valve 66, the decompression of the cleaning tank 2 is allowed. It is configured to stop and stop. Further, the cleaning liquid tank decompression path 62 is communicated with the cleaning liquid tank 3, and the cleaning liquid tank decompression path 62 is provided with a cleaning liquid tank decompression valve 67, and the decompression of the cleaning liquid tank 3 is allowed by opening and closing the cleaning liquid tank decompression valve 67. It is configured to stop and stop. The buffer tank decompression path 63 communicates with the buffer tank 31, and the buffer tank decompression path 63 is provided with a buffer tank decompression valve 68. By opening and closing the buffer tank decompression valve 68, decompression in the buffer tank 31 is allowed. It is configured to stop and stop.

  The intake passage 60 includes a cleaning liquid recovery trap 70 for recovering cleaning liquid or cleaning vapor from the gas sucked from the cleaning tank 2, the cleaning liquid tank 3, and the buffer tank 31, and the cleaning liquid recovery trap 70 and the cleaning liquid tank 3 is connected to the cleaning liquid delivery path 71 so that the cleaning liquid recovered by the cleaning liquid recovery trap 70 (or the cleaning liquid condensed with the cleaning vapor) can be sent to the cleaning liquid tank 3 via the recovery liquid transmission path 71. Further, the recovery liquid delivery path 71 is provided with a recovery liquid delivery valve 72, and is configured to allow or stop delivery of the cleaning liquid from the cleaning liquid collection trap 70 by opening and closing the recovery liquid delivery valve 72. ing.

  As shown in FIG. 2, the control device 6 is a device composed of a CPU, a ROM, a RAM, a timer, and the like, and includes various sensors (a cleaning bath thermometer 75 that detects the temperature in the cleaning bath 2, the cleaning bath 2 A cleaning tank vacuum gauge 76 for detecting a negative pressure in the buffer tank 31, a buffer tank vacuum gauge 77 for detecting a negative pressure in the buffer tank 31, a cleaning liquid tank vacuum gauge 78 for detecting a negative pressure in the cleaning liquid tank 3, a cleaning tank level sensor 13, In response to signals from the cleaning liquid tank level sensor 25, the buffer tank level sensor 32, etc.) and the operation panel 7, the operation processing of the cleaning apparatus 1 is performed. Furthermore, each valve 16, 21, 33, 34, 53, 57, 66, 67, 68, 72, vacuum pump 5, operation panel 7, heat medium oil circulation pump 49, heat medium oil heater 50, ultrasonic generator 18 The cleaning apparatus 1 is controlled in an integrated manner by transmitting or stopping the operation signal.

Next, the operation of the cleaning device 1 will be described.
When the cleaning apparatus 1 starts operation, the cleaning liquid distillation process in the cleaning liquid distillation apparatus 4 and the cleaning process of the workpiece W in the cleaning tank 2 are executed as shown in FIGS. 4 and 5. First, the distillation process will be described. When an operator turns on the power of the cleaning device 1 and operates the start of operation preparation from the operation panel 7, the control device 6 controls the distillation process based on the signal of this operation. The heating medium oil heater 50 is energized to start heating the heating medium oil, and the heating medium oil circulation pump 49 is driven to start circulation of the heating medium oil. When the temperature of the heat transfer oil reaches a preset temperature (a temperature at which heating is possible until the cleaning liquid is evaporated) and the controller 6 determines that preparation for distillation is complete, the controller 6 Distillation control is started, the vacuum pump 5 is driven, and the buffer tank pressure reducing valve 68 is opened to depressurize the buffer tank 31. The vacuum pump 5 is always driven until the operation of the cleaning device 1 is completed (see FIG. 4). Further, the cleaning steam supply valve 53 is opened, and the buffer tank 31, the cleaning liquid recovery path 54, the condenser 42, the steam supply path 43, the evaporator 41, the distillation introduction path 27, and the cleaning liquid tank 3 are communicated. Then, as shown in FIG. 6, the cleaning liquid in the cleaning liquid tank 3 is introduced into the evaporator main body 45 through the distillation introduction path 27 based on the pressure difference between the buffer tank 31 in the reduced pressure state and the cleaning liquid tank 3. The

  The cleaning liquid introduced into the evaporator main body 45 is heated by the heating unit 46 that has been heated by the heat transfer oil, and is evaporated to become cleaning vapor. When impurities such as dirt components are contained in the cleaning liquid, the impurities are separated from the cleaning vapor and remain in the evaporator main body 45, and are appropriately removed from the lower portion of the evaporator main body 45. Then, the cleaning steam generated in the evaporator main body 45 is transferred from the steam outlet 47 to the condenser 42 via the steam supply path 43 based on the pressure difference between the buffer tank 31 and the evaporator 41 in the decompressed state. The cleaning liquid is sent out and condensed by being cooled in the condenser 42 to remove the dirt component (in other words, the cleaning liquid having higher purity than that stored in the cleaning liquid tank 3). At this time, as shown in FIG. 3, since the opening cross-sectional area of the steam supply passage 43 is set wider than the opening cross-sectional area of the steam outlet 47, the flow rate of the cleaning steam in the steam supply passage 43 is set to the steam feed passage 43. It can be made slower than the flow velocity at the time of passing through the outlet 47, and the inner peripheral area of the steam supply path 43 (that is, the contact area with the cleaning steam) can be increased. Accordingly, it is possible to promote the cooling of the cleaning steam at the time of passing through the steam supply path 43 and to improve the regeneration efficiency of the cleaning liquid. In addition, since the vapor receiving port 52 of the condenser 42 is disposed below the vapor delivery port 47 of the evaporator 41, the cleaning liquid in which the cleaning vapor has condensed in the vapor supply path 43 before reaching the condenser 42 is obtained. It is possible to flow down to the steam receiving port 52 of the condenser 42 without any delay.

  Further, the cleaning liquid liquefied (condensed) in the condenser 42 is discharged from the condenser 42 based on the pressure difference between the buffer tank 31 and the condenser 42 in the decompressed state, and passes through the cleaning liquid recovery path 54. As it is, it is stored in the buffer tank 31. Thereafter, the buffer discharge valve 34 is appropriately opened to supply the cleaning liquid tank 3 from the buffer tank 31.

  During the execution of the distillation process, a part of the cleaning steam in the evaporator 41 enters the steam introduction path 56 from the branch point of the steam supply path 43. Further, when the temperature decreases in the steam introduction path 56, it is condensed and becomes a cleaning liquid, and is stored upstream of the cleaning steam introduction valve 57 in the closed state. Further, when a prescribed condition (pause condition) such that the liquid level of the cleaning liquid in the buffer tank 31 reaches a preset upper limit position, a preset distillation execution time elapses, or the like is satisfied, or In the cleaning process, when the timing for introducing the cleaning steam into the cleaning tank 2 has come, the control device 6 performs control to temporarily stop the distillation process, and the cleaning steam supply valve 53 and the buffer tank pressure reducing valve 68 in the open state are opened. Close and temporarily stop delivery of cleaning vapor to condenser 42. Then, when a prescribed condition (restart condition) such that the liquid level of the cleaning liquid in the buffer tank 31 becomes lower than the upper limit position, a preset distillation pause time elapses, or the like is satisfied, or the cleaning process When the timing for ending the introduction of the cleaning steam into the cleaning tank 2 comes, the control device 6 performs control to restart the distillation process, and opens the cleaning steam supply valve 53 and the buffer tank pressure reducing valve 68 in the closed state. Then, the delivery of the cleaning vapor to the condenser 42 is resumed.

  Next, the cleaning process will be described. When the operator operates the start of operation preparation from the operation panel 7, the control device 6 receives signals from various sensors (thermometer 75, vacuum gauges 76, 77, 78, etc.), and numerical values such as each temperature and pressure are operated. It is determined whether or not the conditions for starting can be satisfied. Further, the worker opens the opening / closing lid 11 and stores the workpiece W in the basket 10 in the cleaning tank 2, and closes the opening / closing lid 11. Then, the control device 6 recognizes that the open / close lid 11 is in a closed state by a signal from the lid open / close detection switch 12, and further confirms that the temperature and pressure of each part satisfy the operation start conditions by signals from various sensors. When recognized, the open / close lid 11 is locked in the closed state, and the immersion cleaning process is executed.

  In the immersion cleaning step, first, a cleaning liquid is introduced (supplied) into the cleaning tank 2. Specifically, as shown in FIG. 7, the control device 6 opens the cleaning liquid supply valve 16 to connect the cleaning tank 2, the cleaning liquid supply path 15, and the cleaning liquid tank 3, and further opens the cleaning tank decompression valve 66. Then, the inside of the cleaning tank 2 is depressurized by the vacuum pump 5 that is continuously driven, and the cleaning liquid in the cleaning liquid tank 3 passes through the cleaning liquid supply path 15 based on the pressure difference between the reduced pressure in the cleaning tank 2 and the cleaning liquid tank 3. To be supplied into the cleaning tank 2. When the cleaning tank level sensor 13 detects that the cleaning liquid storage amount has reached a preset cleaning storage amount, the control device 6 closes the cleaning liquid supply valve 16 and the cleaning tank pressure reducing valve 66 based on this detection signal. Then, the introduction of the cleaning liquid into the cleaning tank 2 is stopped (see FIG. 8). Furthermore, the ultrasonic generator 18 is driven, and ultrasonic cleaning is applied to the cleaning liquid in the cleaning tank 2 in a reduced pressure state and the workpiece W to perform immersion cleaning (ultrasonic cleaning). By this immersion cleaning, the dirt component is desorbed from the surface of the workpiece W in the cleaning tank 2 into the cleaning liquid. During immersion cleaning, the opening and closing of the air release valve (not shown) of the cleaning tank 2 and the cleaning tank decompression valve 66 are adjusted to vary the pressure in the cleaning tank 2 and repeat the decompression cleaning and the return pressure cleaning. May be executed.

  When a preset execution time (immersion cleaning execution time) has elapsed since the start of the immersion cleaning process, the control device 6 executes control to shift from the immersion cleaning process to the draining process, and the cleaning liquid in the cleaning tank 2 Is discharged. Specifically, as shown in FIG. 9, the control device 6 opens the cleaning liquid discharge valve 21 to connect the cleaning tank 2, the cleaning liquid discharge path 20, and the cleaning liquid tank 3, and further opens the cleaning liquid tank pressure reducing valve 67. Then, the inside of the cleaning liquid tank 3 is depressurized by the vacuum pump 5 that is continuously driven, and the cleaning liquid in the cleaning tank 2 is contaminated with the contamination component (in detail, based on the pressure difference between the reduced cleaning liquid tank 3 and the cleaning tank 2. It is discharged into the cleaning liquid tank 3 through the cleaning liquid discharge path 20 in a state including the dirt component desorbed from the workpiece W.

  In this way, the drainage process is executed, and the end condition of the drainage process (for example, the completion of drainage of the cleaning liquid is determined based on the passage of a preset drainage execution time or the signal from the cleaning tank level sensor 13). Is established, the control device 6 executes control to shift from the draining process to the steam cleaning process. In the steam cleaning process, as shown in FIG. 10, the control device 6 closes the cleaning liquid discharge valve 21 and the cleaning liquid tank pressure reducing valve 67 that were open during the draining process. Further, when the distillation process is being performed in the cleaning liquid distillation apparatus 4, the distillation process is temporarily stopped, the cleaning steam supply valve 53 is closed, and the buffer tank pressure reducing valve 68 is kept open. On the other hand, when the distillation process is temporarily stopped in the cleaning liquid distillation apparatus 4, the cleaning steam supply valve 53 is kept closed and the buffer tank pressure reducing valve 68 is opened. Then, the cleaning steam introduction valve 57 is opened, and the evaporator 41, the steam introduction path 56, the cleaning tank 2, the branch discharge path 30, and the buffer tank 31 are communicated. Then, the cleaning steam in the evaporator 41 is introduced into the cleaning tank 2 through the steam introduction path 56 based on the pressure difference between the buffer tank 31 and the evaporator 41 that has been decompressed by the vacuum pump 5 in the continuous driving state. Is done.

  At this time, the cleaning liquid condensed and stored in the steam introduction path 56 during the distillation process is pushed out by the cleaning steam and jetted into the cleaning tank 2. Due to the ejection of the cleaning liquid, the dirt component remaining in the cleaning tank 2 or on the workpiece W without being discharged together with the cleaning liquid in the draining process is roughly washed away and discharged from the cleaning tank 2. Therefore, even if the soil component remains in the cleaning tank 2 or the workpiece W after the immersion cleaning process, the soil component can be washed away using the cleaning liquid stored in the vapor introduction path 56.

  When the cleaning steam is introduced into the cleaning tank 2 after the cleaning liquid in the steam introduction path 56 is pushed out, the workpiece W is exposed to the cleaning steam (cleaning steam introduced from the evaporator 41) and steam cleaning is performed. Is called. Therefore, the steam cleaning process can be performed using the cleaning steam generated in the process of distilling the cleaning liquid (distillation process), and the cleaning liquid distillation and the steam cleaning of the workpiece W can be performed efficiently. And when the preset execution time (steam cleaning execution time) passes after starting a steam cleaning process, the control apparatus 6 will perform control which transfers to a pressure reduction drying process from a steam cleaning process. Specifically, as shown in FIG. 11, the control device 6 closes the cleaning steam introduction valve 57 and the buffer introduction valve 33 and opens the cleaning tank decompression valve 66. Then, the inside of the cleaning tank 2 is depressurized by the vacuum pump 5 that is continuously driven, and the cleaning liquid on the workpiece W evaporates and the surface of the workpiece W is dried. The evaporated cleaning liquid (cleaning vapor) is sucked into the cleaning tank decompression path 61 and recovered in the cleaning liquid recovery trap 70.

  When a preset execution time (decompression drying execution time) has elapsed since the start of the vacuum drying process, the control device 6 executes control to end the cleaning process and the distillation process. Specifically, the driving of the vacuum pump 5, the heat medium oil circulation pump 49, and the heat medium oil heater 50 is stopped, and all the valves 16, 21, 33, 34, 53, 57, 66, 67, 68, 72 are turned on. close up. In addition, the atmosphere release valve of the cleaning tank 2 is opened to release the atmosphere in the cleaning tank 2, the lock of the closed state of the open / close lid 11 is released, and an operation end notification signal is transmitted to the operation panel 7 to inform the operator. Notify the end of driving. Then, the worker opens the opening / closing lid 11 of the cleaning tank 2 and takes out the workpiece W that has been cleaned and dried together with the basket 10.

  By the way, although the cleaning liquid distillation apparatus 4 of the above embodiment does not include a configuration for promoting the condensation of the cleaning steam in the steam supply path 43, the present invention is not limited to this. For example, as shown in FIG. 12, a blower 80 that functions as supply path cooling means may be provided on the side of the steam supply path 43. And if wind is sent from the air blower 80 and the vapor | steam supply path 43 is cooled, cooling of the washing | cleaning vapor | steam at the time of the passage in the vapor | steam supply path 43 can be accelerated | stimulated further, and the reproduction | regeneration efficiency of washing | cleaning liquid will be improved further. Can do. The supply path cooling means is not limited to the blower 80 and may have any configuration as long as the steam supply path 43 can be cooled. For example, a supply path cooling pipe wound around the outer periphery of the steam supply path 43 and through which cooling water flows may be used. Alternatively, a cooling fan for cooling the heat medium oil circulation pump 49 of the heating unit 46 also functions as a supply path cooling means, and air blown from the cooling fan is sent not only to the heat medium oil circulation pump 49 but also to the steam supply path 43. Alternatively, the steam supply path 43 may be cooled.

  Furthermore, in the above embodiment, the diameter of the steam supply passage 43 is larger than that of the steam outlet 47, so that the opening cross-sectional area of the steam supply passage 43 is set wider than the opening cross-sectional area of the steam outlet 47. Is not limited to this. In short, any configuration may be adopted as long as the opening cross-sectional area of the steam supply passage 43 can be set wider than the opening cross-sectional area of the steam outlet 47. For example, the steam supply path 43 may be configured by a plurality of parallel paths to increase the opening cross-sectional area. Further, the contact area between the steam supply path 43 and the cleaning steam (in other words, the heat exchange area) is adjusted by adjusting the length of the steam supply path 43 or providing a heat exchange fin in the steam supply path 43. It may be increased to promote condensation of the cleaning vapor. Furthermore, condensation of the cleaning steam may be promoted by projecting heat radiation fins outside the steam supply path 43 to promote heat radiation of the steam supply path 43.

  By the way, in the cleaning liquid distillation apparatus 4 of the above-described embodiment, the vapor receiving port 52 of the condenser 42 is disposed below the vapor delivery port 47 of the evaporator 41, but the present invention is not limited to this. For example, as shown in FIG. 13, if the vapor inlet / outlet 52 of the condenser 42 is disposed above the vapor outlet / outlet 47 of the evaporator 41, the vapor supply path 43 goes down from the condenser 42 side to the evaporator 41 side. Set to posture. Accordingly, the cleaning liquid condensed in the vapor supply path 43 can be returned to the evaporator 41 by its own weight, re-vaporized in the evaporator 41, and sent out to the condenser 42 again. Therefore, the cleaning liquid can be prevented from staying in the vapor supply path 43, and the regeneration efficiency of the cleaning liquid can be improved.

  And in the said embodiment, although the washing | cleaning liquid distillation apparatus 4 was provided as a part of the washing | cleaning apparatus 1, this invention is not limited to this. For example, the cleaning liquid distillation apparatus may be configured as a separate apparatus from the cleaning apparatus. In the cleaning apparatus 1 in the above embodiment, the cleaning liquid and the cleaning steam are supplied to the cleaning tank 2 to clean the workpiece W (immersion cleaning and steam cleaning), but the present invention is not limited to this. In short, as long as the object to be processed in the cleaning tank can be cleaned, either the cleaning liquid or the cleaning vapor may be supplied into the cleaning tank to clean the object to be processed.

  It should be understood that the above-described embodiment is illustrative in all respects and not restrictive. The present invention is not limited to the above description, but is defined by the scope of the claims, and includes all modifications within the scope and meaning equivalent to the scope of the claims.

DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 2 Cleaning tank 3 Cleaning liquid tank 4 Cleaning liquid distillation apparatus 5 Vacuum pump 6 Control apparatus 7 Operation panel 10 Basket 11 Opening lid 12 Lid opening / closing detection switch 13 Cleaning tank level sensor 14 Cleaning liquid supply port 15 Cleaning liquid supply path 16 Cleaning liquid supply valve 18 Ultrasonic generator 19 Cleaning liquid outlet 20 Cleaning liquid discharge path 21 Cleaning liquid discharge valve 25 Cleaning liquid tank level sensor 26 Cleaning liquid outlet 27 Distillation introduction path 30 Branch discharge path 31 Buffer tank 32 Buffer tank level sensor 33 Buffer introduction valve 34 Buffer discharge valve 41 Evaporator 42 Condenser 43 Steam supply path 45 Evaporator main body 46 Heating unit 47 Steam outlet 49 Heat medium oil circulation pump 50 Heat medium oil heater 52 Steam inlet 53 Cleaning steam supply valve 54 Cleaning liquid recovery path 56 Steam introduction path 57 Cleaning Steam introduction bar 60 Intake path 61 Cleaning tank pressure reducing path 62 Cleaning tank pressure reducing path 63 Buffer tank pressure reducing path 66 Cleaning tank pressure reducing valve 67 Cleaning liquid tank pressure reducing valve 68 Buffer tank pressure reducing valve 70 Cleaning liquid recovery trap 71 Recovery liquid sending path 72 Recovery liquid sending valve 75 Cleaning Tank thermometer 76 Cleaning tank vacuum gauge 77 Buffer tank vacuum gauge 78 Cleaning liquid tank vacuum gauge 80 Blower

Claims (3)

A cleaning tank for storing an object to be processed; a cleaning liquid tank for supplying a cleaning liquid to the cleaning tank; and an evaporator for generating a cleaning vapor by evaporating the cleaning liquid, and processing the cleaning liquid supplied into the cleaning tank An immersion cleaning process for immersing and cleaning an object, a draining process for discharging the cleaning liquid in the cleaning tank after the execution of the immersion cleaning process, and introducing a cleaning vapor into the cleaning tank after the draining process is performed. A cleaning apparatus for performing a steam cleaning process for steam-cleaning a workpiece,
Between the cleaning tank and the evaporator, a steam introduction path for introducing cleaning steam into the cleaning tank is provided, the cleaning steam can be condensed in the steam introduction path, and the cleaning liquid can be stored.
In the steam cleaning step, the cleaning device stored in the steam introduction path is sent into a cleaning tank. A cleaning liquid distillation apparatus comprising: the evaporator; a condenser that condenses the cleaning steam generated by the evaporator to regenerate the cleaning liquid; and a steam supply path that supplies the cleaning steam from the evaporator to the condenser. Configure
The cleaning apparatus according to claim 1, wherein the steam introduction path is branched from the steam supply path. An immersion cleaning process for storing an object to be processed in a cleaning tank and immersing the object in a cleaning liquid for cleaning; and a cleaning vapor generated by vaporizing the cleaning liquid is introduced into the cleaning tank. A steam cleaning process for steam cleaning,
Before execution of the steam cleaning step, the cleaning steam is condensed in the steam introduction path for supplying the cleaning steam to the cleaning tank, and the cleaning liquid is stored.
In the steam cleaning step, the cleaning liquid stored in the steam introduction path is sent into a cleaning tank.

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