JP2018009251A5 - - Google Patents

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JP2018009251A5
JP2018009251A5 JP2017179069A JP2017179069A JP2018009251A5 JP 2018009251 A5 JP2018009251 A5 JP 2018009251A5 JP 2017179069 A JP2017179069 A JP 2017179069A JP 2017179069 A JP2017179069 A JP 2017179069A JP 2018009251 A5 JP2018009251 A5 JP 2018009251A5
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Japan
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cylinder
cylindrical
metal oxide
sintered body
oxide sintered
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JP2017179069A
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Japanese (ja)
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JP7244989B2 (en
JP2018009251A (en
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Claims (5)

円筒軸方向の長さが948mm以上の円筒型酸化金属焼結体であって、
前記円筒軸方向における相対密度差が0.1%以内であり、
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部において少なくとも独立した5か所の視野1.176mm 2 当たりに観察される孔における面積の円相当径が平均1μm以下であることを特徴とする円筒型酸化金属焼結体。
A cylindrical metal oxide sintered body having a length in the cylindrical axis direction of 948 mm or more,
The relative density difference in the cylindrical axis direction is within 0.1% ;
The average equivalent circle diameter of the holes observed per field of view of 1.176 mm 2 in at least five independent areas at the center of the cylinder inner surface and the center of the cylinder outer surface in the cylinder axis direction is 1 μm or less on average Cylindrical metal oxide sintered body.
円筒軸方向の長さが948mm以上の円筒型酸化金属焼結体であって、  A cylindrical metal oxide sintered body having a length in the cylindrical axis direction of 948 mm or more,
前記円筒軸方向における相対密度差が0.1%以内であり、  The relative density difference in the cylindrical axis direction is within 0.1%;
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔の数が平均4.25×10  The average number of holes observed in the central part of the inner surface of the cylinder and the central part of the outer surface of the cylinder in the axial direction of the cylinder is 4.25 × 10. -5-Five 個/μmPiece / μm 22 以下であることを特徴とする円筒型酸化金属焼結体。A cylindrical metal oxide sintered body characterized by the following.
前記円筒内側面および前記円筒内外側面に観察される孔は、少なくとも独立した5か所の視野1.176mm  The holes observed in the inner surface of the cylinder and the outer surface of the cylinder are at least five independent fields of view 1.176 mm. 22 当たりに観察される孔であることを特徴とする請求項2に記載の円筒型酸化金属焼結体。The cylindrical metal oxide sintered body according to claim 2, wherein the hole is a hole observed upon hitting. 円筒軸方向の長さが948mm以上の円筒型酸化金属焼結体であって、  A cylindrical metal oxide sintered body having a length in the cylindrical axis direction of 948 mm or more,
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔における面積の円相当径が平均1μm以下であり、  The circle equivalent diameter of the area in the hole observed in the central part of the cylindrical inner surface and the central part of the cylindrical outer surface in the cylindrical axis direction is 1 μm or less on average
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔の数が平均4.25×10  The average number of holes observed in the central part of the inner surface of the cylinder and the central part of the outer surface of the cylinder in the axial direction of the cylinder is 4.25 × 10. -5-Five 個/μmPiece / μm 22 以下であり、And
前記円筒内側面中央部および円筒外側面中央部に観察される孔は、少なくとも独立した5か所の視野1.176mm  The holes observed in the central portion of the inner surface of the cylinder and the central portion of the outer surface of the cylinder have at least five independent fields of view of 1.176 mm. 22 当たりに観察される孔であることを特徴とする円筒型酸化金属焼結体。Cylindrical metal oxide sintered body, characterized in that it is a hole observed upon hitting.
請求項1乃至請求項4の何れか1項に記載された円筒型酸化金属焼結体と、円筒内側中空部に配置された基材と、を有するスパッタリングターゲット。
A sputtering target comprising: the cylindrical metal oxide sintered body according to any one of claims 1 to 4 ; and a base material disposed in a hollow portion inside the cylinder.
JP2017179069A 2016-03-28 2017-09-19 Cylindrical sputtering target and manufacturing method thereof Active JP7244989B2 (en)

Applications Claiming Priority (2)

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JP2016064132 2016-03-28
JP2016064132 2016-03-28

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JP2016214323A Division JP6397869B2 (en) 2016-03-28 2016-11-01 Cylindrical sputtering target and manufacturing method thereof

Publications (3)

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JP2018009251A JP2018009251A (en) 2018-01-18
JP2018009251A5 true JP2018009251A5 (en) 2019-10-10
JP7244989B2 JP7244989B2 (en) 2023-03-23

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JP2016214323A Active JP6397869B2 (en) 2016-03-28 2016-11-01 Cylindrical sputtering target and manufacturing method thereof
JP2017104785A Active JP6967372B2 (en) 2016-03-28 2017-05-26 Cylindrical sputtering target and its manufacturing method
JP2017179069A Active JP7244989B2 (en) 2016-03-28 2017-09-19 Cylindrical sputtering target and manufacturing method thereof

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JP2017104785A Active JP6967372B2 (en) 2016-03-28 2017-05-26 Cylindrical sputtering target and its manufacturing method

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JP (3) JP6397869B2 (en)
KR (1) KR102001363B1 (en)
TW (4) TWI698542B (en)

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Publication number Priority date Publication date Assignee Title
JP6523510B1 (en) * 2018-03-30 2019-06-05 Jx金属株式会社 Sputtering target
BE1028481B1 (en) 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv High Density Sputtering Target
BE1028482B1 (en) 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Manufacture and refill of sputtering targets

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JPH0776672B2 (en) * 1986-08-26 1995-08-16 川崎重工業株式会社 Dispersion plate nozzle for fluidized bed furnace
JPH08144056A (en) * 1994-11-22 1996-06-04 Mitsubishi Materials Corp Production of sputtering target material for forming thin ito film having high strength
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JP2005069668A (en) * 2003-08-01 2005-03-17 Asahi Glass Co Ltd Baking container for silicon nitride-based ceramic
TWI390062B (en) * 2004-03-05 2013-03-21 Tosoh Corp Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
JP5299415B2 (en) * 2010-12-13 2013-09-25 住友金属鉱山株式会社 Oxide sintered body for cylindrical sputtering target and method for producing the same
JP5750060B2 (en) * 2012-01-18 2015-07-15 三井金属鉱業株式会社 Ceramic cylindrical sputtering target material and manufacturing method thereof
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JP6186649B2 (en) * 2013-07-09 2017-08-30 株式会社大一商会 Game machine
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