JP2018009251A5 - - Google Patents
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- JP2018009251A5 JP2018009251A5 JP2017179069A JP2017179069A JP2018009251A5 JP 2018009251 A5 JP2018009251 A5 JP 2018009251A5 JP 2017179069 A JP2017179069 A JP 2017179069A JP 2017179069 A JP2017179069 A JP 2017179069A JP 2018009251 A5 JP2018009251 A5 JP 2018009251A5
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- cylinder
- cylindrical
- metal oxide
- sintered body
- oxide sintered
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Claims (5)
前記円筒軸方向における相対密度差が０．１％以内であり、
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部において少なくとも独立した５か所の視野１．１７６ｍｍ 2 当たりに観察される孔における面積の円相当径が平均１μｍ以下であることを特徴とする円筒型酸化金属焼結体。 A cylindrical metal oxide sintered body having a length in the cylindrical axis direction of 948 mm or more,
The relative density difference in the cylindrical axis direction is within 0.1% ;
The average equivalent circle diameter of the holes observed per field of view of 1.176 mm 2 in at least five independent areas at the center of the cylinder inner surface and the center of the cylinder outer surface in the cylinder axis direction is 1 μm or less on average Cylindrical metal oxide sintered body.
前記円筒軸方向における相対密度差が０．１％以内であり、 The relative density difference in the cylindrical axis direction is within 0.1%;
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔の数が平均４．２５×１０ The average number of holes observed in the central part of the inner surface of the cylinder and the central part of the outer surface of the cylinder in the axial direction of the cylinder is 4.25 × 10. -5-Five 個／μｍPiece / μm 22 以下であることを特徴とする円筒型酸化金属焼結体。A cylindrical metal oxide sintered body characterized by the following.
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔における面積の円相当径が平均１μｍ以下であり、 The circle equivalent diameter of the area in the hole observed in the central part of the cylindrical inner surface and the central part of the cylindrical outer surface in the cylindrical axis direction is 1 μm or less on average
前記円筒軸方向の円筒内側面中央部および円筒外側面中央部に観察される孔の数が平均４．２５×１０ The average number of holes observed in the central part of the inner surface of the cylinder and the central part of the outer surface of the cylinder in the axial direction of the cylinder is 4.25 × 10. -5-Five 個／μｍPiece / μm 22 以下であり、And
前記円筒内側面中央部および円筒外側面中央部に観察される孔は、少なくとも独立した５か所の視野１．１７６ｍｍ The holes observed in the central portion of the inner surface of the cylinder and the central portion of the outer surface of the cylinder have at least five independent fields of view of 1.176 mm. 22 当たりに観察される孔であることを特徴とする円筒型酸化金属焼結体。Cylindrical metal oxide sintered body, characterized in that it is a hole observed upon hitting.
A sputtering target comprising: the cylindrical metal oxide sintered body according to any one of claims 1 to 4 ; and a base material disposed in a hollow portion inside the cylinder.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016064132 | 2016-03-28 | ||
| JP2016064132 | 2016-03-28 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016214323A Division JP6397869B2 (en) | 2016-03-28 | 2016-11-01 | Cylindrical sputtering target and manufacturing method thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018009251A JP2018009251A (en) | 2018-01-18 |
| JP2018009251A5 true JP2018009251A5 (en) | 2019-10-10 |
| JP7244989B2 JP7244989B2 (en) | 2023-03-23 |
Family
ID=60004925
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016214323A Active JP6397869B2 (en) | 2016-03-28 | 2016-11-01 | Cylindrical sputtering target and manufacturing method thereof |
| JP2017104785A Active JP6967372B2 (en) | 2016-03-28 | 2017-05-26 | Cylindrical sputtering target and its manufacturing method |
| JP2017179069A Active JP7244989B2 (en) | 2016-03-28 | 2017-09-19 | Cylindrical sputtering target and manufacturing method thereof |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016214323A Active JP6397869B2 (en) | 2016-03-28 | 2016-11-01 | Cylindrical sputtering target and manufacturing method thereof |
| JP2017104785A Active JP6967372B2 (en) | 2016-03-28 | 2017-05-26 | Cylindrical sputtering target and its manufacturing method |
Country Status (3)
| Country | Link |
|---|---|
| JP (3) | JP6397869B2 (en) |
| KR (1) | KR102001363B1 (en) |
| TW (4) | TWI698542B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6523510B1 (en) * | 2018-03-30 | 2019-06-05 | Ｊｘ金属株式会社 | Sputtering target |
| BE1028481B1 (en) | 2020-07-14 | 2022-02-14 | Soleras Advanced Coatings Bv | High Density Sputtering Target |
| BE1028482B1 (en) | 2020-07-14 | 2022-02-14 | Soleras Advanced Coatings Bv | Manufacture and refill of sputtering targets |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0776672B2 (en) * | 1986-08-26 | 1995-08-16 | 川崎重工業株式会社 | Dispersion plate nozzle for fluidized bed furnace |
| JPH08144056A (en) * | 1994-11-22 | 1996-06-04 | Mitsubishi Materials Corp | Production of sputtering target material for forming thin ito film having high strength |
| JP4227227B2 (en) * | 1998-10-30 | 2009-02-18 | Ｄｏｗａホールディングス株式会社 | Manufacturing method of ITO sputtering target |
| JP2005069668A (en) * | 2003-08-01 | 2005-03-17 | Asahi Glass Co Ltd | Baking container for silicon nitride-based ceramic |
| TWI390062B (en) * | 2004-03-05 | 2013-03-21 | Tosoh Corp | Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body |
| JP5299415B2 (en) * | 2010-12-13 | 2013-09-25 | 住友金属鉱山株式会社 | Oxide sintered body for cylindrical sputtering target and method for producing the same |
| JP5750060B2 (en) * | 2012-01-18 | 2015-07-15 | 三井金属鉱業株式会社 | Ceramic cylindrical sputtering target material and manufacturing method thereof |
| WO2014021334A1 (en) * | 2012-07-30 | 2014-02-06 | 東ソー株式会社 | Sintered oxide body and sputtering target |
| JP6186649B2 (en) * | 2013-07-09 | 2017-08-30 | 株式会社大一商会 | Game machine |
| JP5799154B2 (en) * | 2013-12-13 | 2015-10-21 | Jx日鉱日石金属株式会社 | Sputtering target and manufacturing method thereof |
| JP5887391B1 (en) * | 2014-08-22 | 2016-03-16 | 三井金属鉱業株式会社 | Method for producing target material for sputtering target and claw member |
| JP6464776B2 (en) * | 2014-10-29 | 2019-02-06 | 住友金属鉱山株式会社 | Cylindrical ceramic sintered body and manufacturing method thereof |
| JP2016117950A (en) * | 2014-12-22 | 2016-06-30 | 住友化学株式会社 | Production method of cylindrical target material, and cylindrical target material |
| JP5887625B1 (en) * | 2015-03-27 | 2016-03-16 | Ｊｘ金属株式会社 | Cylindrical sputtering target, cylindrical sintered body, cylindrical molded body, and manufacturing method thereof |
| JP6532287B2 (en) * | 2015-05-14 | 2019-06-19 | キヤノン株式会社 | Medical diagnostic support apparatus, information processing method and program |
| JP2016014191A (en) * | 2015-07-21 | 2016-01-28 | 三井金属鉱業株式会社 | Ceramic cylindrical type sputtering target material, and method of manufacturing the same |
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2016
- 2016-11-01 JP JP2016214323A patent/JP6397869B2/en active Active
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2017
- 2017-02-24 TW TW108132861A patent/TWI698542B/en active
- 2017-02-24 TW TW109119026A patent/TWI704243B/en active
- 2017-02-24 TW TW107109686A patent/TWI699444B/en active
- 2017-02-24 TW TW106106359A patent/TWI635194B/en active
- 2017-05-26 JP JP2017104785A patent/JP6967372B2/en active Active
- 2017-09-19 JP JP2017179069A patent/JP7244989B2/en active Active
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2019
- 2019-06-14 KR KR1020190070769A patent/KR102001363B1/en active IP Right Grant