JP2018006093A - プラズマ照射処理装置、その制御方法、凝固物の評価装置、及び、膜の製造方法 - Google Patents

プラズマ照射処理装置、その制御方法、凝固物の評価装置、及び、膜の製造方法 Download PDF

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JP2018006093A
JP2018006093A JP2016129295A JP2016129295A JP2018006093A JP 2018006093 A JP2018006093 A JP 2018006093A JP 2016129295 A JP2016129295 A JP 2016129295A JP 2016129295 A JP2016129295 A JP 2016129295A JP 2018006093 A JP2018006093 A JP 2018006093A
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plasma
current value
voltage
processing apparatus
evaluation
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JP2016129295A
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Japanese (ja)
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JP2018006093A5 (OSRAM
Inventor
譲 池原
Yuzuru Ikehara
譲 池原
早苗 池原
Sanae Ikehara
早苗 池原
宮本　健司
Kenji Miyamoto
健司 宮本
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Nikon Corp
National Institute of Advanced Industrial Science and Technology AIST
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Nikon Corp
National Institute of Advanced Industrial Science and Technology AIST
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Publication of JP2018006093A publication Critical patent/JP2018006093A/ja
Publication of JP2018006093A5 publication Critical patent/JP2018006093A5/ja
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  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Plasma Technology (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
JP2016129295A 2016-06-29 2016-06-29 プラズマ照射処理装置、その制御方法、凝固物の評価装置、及び、膜の製造方法 Pending JP2018006093A (ja)

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JP2016129295A JP2018006093A (ja) 2016-06-29 2016-06-29 プラズマ照射処理装置、その制御方法、凝固物の評価装置、及び、膜の製造方法

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JP2016129295A JP2018006093A (ja) 2016-06-29 2016-06-29 プラズマ照射処理装置、その制御方法、凝固物の評価装置、及び、膜の製造方法

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JP2018006093A true JP2018006093A (ja) 2018-01-11
JP2018006093A5 JP2018006093A5 (OSRAM) 2019-05-09

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