JP2018002595A - Organosilicon compound and resin composition - Google Patents
Organosilicon compound and resin composition Download PDFInfo
- Publication number
- JP2018002595A JP2018002595A JP2016126219A JP2016126219A JP2018002595A JP 2018002595 A JP2018002595 A JP 2018002595A JP 2016126219 A JP2016126219 A JP 2016126219A JP 2016126219 A JP2016126219 A JP 2016126219A JP 2018002595 A JP2018002595 A JP 2018002595A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silane coupling
- coupling agent
- organosilicon compound
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000003961 organosilicon compounds Chemical class 0.000 title claims abstract description 19
- 239000011342 resin composition Substances 0.000 title claims description 11
- 239000011256 inorganic filler Substances 0.000 claims abstract description 30
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 30
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 8
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims abstract description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims abstract description 7
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 5
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 239000006087 Silane Coupling Agent Substances 0.000 abstract description 28
- 229920005989 resin Polymers 0.000 abstract description 23
- 239000011347 resin Substances 0.000 abstract description 23
- 230000007062 hydrolysis Effects 0.000 abstract description 17
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 17
- 238000004381 surface treatment Methods 0.000 abstract description 5
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 22
- -1 trimethoxysilylpropyl Chemical group 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000010410 layer Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000009833 condensation Methods 0.000 description 10
- 230000005494 condensation Effects 0.000 description 10
- 230000018044 dehydration Effects 0.000 description 10
- 238000006297 dehydration reaction Methods 0.000 description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 230000000670 limiting effect Effects 0.000 description 7
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- QLDQDFWBAODVPN-UHFFFAOYSA-N 2-(3-methylbut-3-enoxymethyl)oxirane Chemical compound CC(=C)CCOCC1CO1 QLDQDFWBAODVPN-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229960001701 chloroform Drugs 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003444 phase transfer catalyst Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- CPJRRXSHAYUTGL-UHFFFAOYSA-N isopentenyl alcohol Chemical compound CC(=C)CCO CPJRRXSHAYUTGL-UHFFFAOYSA-N 0.000 description 2
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 2
- PYLWMHQQBFSUBP-UHFFFAOYSA-N monofluorobenzene Chemical compound FC1=CC=CC=C1 PYLWMHQQBFSUBP-UHFFFAOYSA-N 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000006551 perfluoro alkylene group Chemical group 0.000 description 2
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- QVCUKHQDEZNNOC-UHFFFAOYSA-N 1,2-diazabicyclo[2.2.2]octane Chemical compound C1CC2CCN1NC2 QVCUKHQDEZNNOC-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
- 150000008046 alkali metal hydrides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- HXWGXXDEYMNGCT-UHFFFAOYSA-M decyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)C HXWGXXDEYMNGCT-UHFFFAOYSA-M 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 239000013615 primer Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Abstract
Description
本発明は、新規な有機ケイ素化合物および樹脂組成物に関する。さらに詳しくは、シリル基のβ位にアルキル基を有する有機ケイ素化合物、該有機ケイ素化合物により表面処理された無機充填材を含有する樹脂組成物に関する。 The present invention relates to a novel organosilicon compound and a resin composition. More specifically, the present invention relates to a resin composition containing an organosilicon compound having an alkyl group at the β-position of a silyl group, and an inorganic filler surface-treated with the organosilicon compound.
樹脂成形体の寸法安定性や機械的強度、耐熱性等を改善するため、ガラス繊維をはじめとする無機充填材の樹脂への添加が広く行われている。しかし、無機充填材は樹脂との接着性が必ずしも十分とは言えず、シランカップリング剤による無機充填材の表面処理が提案されている。 In order to improve the dimensional stability, mechanical strength, heat resistance, and the like of the resin molded body, inorganic fillers such as glass fibers are widely added to the resin. However, the inorganic filler does not necessarily have sufficient adhesion to the resin, and surface treatment of the inorganic filler with a silane coupling agent has been proposed.
シランカップリング剤は典型的にはケイ素原子にメトキシ基やエトキシ基などの加水分解基とアミノ基やエポキシ基などの有機官能基が結合した化合物で、例えばビニルトリメトキシシラン、ビニルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−アクリロキシプロピルトリメトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−ウレイドプロピルトリメトキシシラン、ビス(トリエトキシシリルプロピル)テトラスルフィド、γ−イソシアネートプロピルトリメトキシシラン、トリス−(トリメトキシシリルプロピル)イソシアヌレートなどが挙げられる。 A silane coupling agent is typically a compound in which a hydrolytic group such as a methoxy group or an ethoxy group and an organic functional group such as an amino group or an epoxy group are bonded to a silicon atom, such as vinyltrimethoxysilane, vinyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-ureidopropyltrimethoxy Examples thereof include silane, bis (triethoxysilylpropyl) tetrasulfide, γ-isocyanatopropyltrimethoxysilane, and tris- (trimethoxysilylpropyl) isocyanurate.
シランカップリング剤の加水分解基は溶液中や空気中の水分、無機充填材表面の吸着水分等によって加水分解されて水酸基に変化し、分子間脱水縮合によりオリゴマーが生成される。オリゴマーの余剰の水酸基は無機材料表面の水酸基と水素結合を形成し、オリゴマーが無機材料と結合する。その後、熱乾燥処理等により脱水・縮合が生じ、表面にシランカップリング剤オリゴマーが強固に化学結合した無機充填材が得られる。こうして表面処理された無機充填材は、エポキシ樹脂等の熱硬化性樹脂や、ポリアミド樹脂やポリエステル樹脂、ポリプロピレン樹脂等の熱可塑性樹脂の強化材として広く用いられている。 The hydrolyzable group of the silane coupling agent is hydrolyzed by water in the solution or in the air, adsorbed water on the surface of the inorganic filler, etc. to be converted into a hydroxyl group, and an oligomer is produced by intermolecular dehydration condensation. Excess hydroxyl groups in the oligomer form hydrogen bonds with hydroxyl groups on the surface of the inorganic material, and the oligomer bonds with the inorganic material. Thereafter, dehydration / condensation occurs by heat drying treatment or the like, and an inorganic filler in which the silane coupling agent oligomer is strongly chemically bonded to the surface is obtained. The inorganic filler thus surface-treated is widely used as a reinforcing material for thermosetting resins such as epoxy resins, and thermoplastic resins such as polyamide resins, polyester resins, and polypropylene resins.
しかしながら、高温多湿な使用条件下においてはシランカップリング剤層の加水分解により無機充填材と樹脂が剥離し、成形体の強度が低下することが問題視されており、耐加水分解性に優れたシランカップリング剤が提案されている。例としては、長鎖スペーサー型シランカップリング剤(特許文献1〜3)、ペルフルオロアルキレン基含有シランカップリング剤(特許文献4)、芳香環型シランカップリング剤(特許文献5)が挙げられる。 However, under high-temperature and high-humidity conditions, the inorganic filler and resin are peeled off due to hydrolysis of the silane coupling agent layer, and the strength of the molded product is lowered. Silane coupling agents have been proposed. Examples include a long-chain spacer type silane coupling agent (Patent Literatures 1 to 3), a perfluoroalkylene group-containing silane coupling agent (Patent Literature 4), and an aromatic ring type silane coupling agent (Patent Literature 5).
特許文献1〜3に記載の直鎖アルキル長鎖スペーサー型シランカップリング剤や特許文献4に記載のペルフルオロアルキレン基含有型シランカップリング剤を用いた場合、シランカップリング剤層の耐加水分解性は向上するが、原料である末端オレフィンアルコールやペルフルオロジイオドアルカン等が高価で入手困難であるという課題があった。また、特許文献5に記載の芳香環型シランカップリング剤では、シランカップリング剤層の耐加水分解性や成形体の機械的強度は向上するが、シリル基近傍の嵩高さにより無機充填材表面への円滑な導入が妨げられるという課題があった。 When the linear alkyl long-chain spacer type silane coupling agent described in Patent Documents 1 to 3 and the perfluoroalkylene group-containing type silane coupling agent described in Patent Document 4 are used, the hydrolysis resistance of the silane coupling agent layer However, there is a problem that the terminal olefin alcohols and perfluorodiiodoalkanes that are raw materials are expensive and difficult to obtain. In addition, in the aromatic ring type silane coupling agent described in Patent Document 5, the hydrolysis resistance of the silane coupling agent layer and the mechanical strength of the molded body are improved. There was a problem that smooth introduction to the system was hindered.
しかして本発明の目的は、形成するシランカップリング剤層の耐加水分解性に優れる有機ケイ素化合物を提供することにある。 Accordingly, an object of the present invention is to provide an organosilicon compound which is excellent in hydrolysis resistance of a silane coupling agent layer to be formed.
本発明者らは鋭意検討した結果、シリル基のβ位にアルキル基を有する有機ケイ素化合物により上記課題を解決できることを見出し、本発明を完成した。 As a result of intensive studies, the present inventors have found that the above problems can be solved by an organosilicon compound having an alkyl group at the β-position of the silyl group, and have completed the present invention.
すなわち本発明は、下記[1]〜[2]を提供する。
[1]下記一般式(I)で表される有機ケイ素化合物。
That is, the present invention provides the following [1] to [2].
[1] An organosilicon compound represented by the following general formula (I).
(式中、R1〜R3はそれぞれ独立して塩素原子、メトキシ基またはエトキシ基を表し、R4は炭素数1〜10のアルキル基を表し、R5は炭素数1〜10のアルキレン基を表す。)
[2][1]の有機ケイ素化合物により表面処理された無機充填材を含有する樹脂組成物。
(In the formula, R 1 to R 3 each independently represents a chlorine atom, a methoxy group or an ethoxy group, R 4 represents an alkyl group having 1 to 10 carbon atoms, and R 5 represents an alkylene group having 1 to 10 carbon atoms. Represents.)
[2] A resin composition comprising an inorganic filler surface-treated with the organosilicon compound of [1].
本発明の有機ケイ素化合物を用いて表面処理された無機充填材を樹脂に添加して成形することで、シランカップリング剤層の耐加水分解性に優れる成形体を提供できる。 By adding an inorganic filler surface-treated with the organosilicon compound of the present invention to the resin and molding it, a molded article having excellent hydrolysis resistance of the silane coupling agent layer can be provided.
[有機ケイ素化合物]
以下、本発明の一般式(I)で表される有機ケイ素化合物(以下、化合物(I)と称する)について説明する。
[Organic silicon compound]
Hereinafter, the organosilicon compound represented by the general formula (I) of the present invention (hereinafter referred to as compound (I)) will be described.
R1〜R3は、それぞれ独立して塩素原子、メトキシ基またはエトキシ基を表す。これらのうち、メトキシ基またはエトキシ基であることが好ましい。 R 1 to R 3 each independently represents a chlorine atom, a methoxy group or an ethoxy group. Of these, a methoxy group or an ethoxy group is preferable.
R4は炭素数1〜10のアルキル基を表す。R4が表すアルキル基は直鎖状に限定されず、分岐状または環状であってもよく、直鎖および/または分岐構造と環状構造が結合した構造であってもよい。 R 4 represents an alkyl group having 1 to 10 carbon atoms. The alkyl group represented by R 4 is not limited to a straight chain, and may be branched or cyclic, or may be a structure in which a linear and / or branched structure and a cyclic structure are bonded.
R4が表す炭素数1〜10のアルキル基の例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプタニル基、シクロオクタニル基などが挙げられる。中でも、炭素数1〜6のアルキル基が好ましく、炭素数1〜3のアルキル基がより好ましく、メチル基またはエチル基がさらに好ましく、メチル基が最も好ましい。 Examples of the alkyl group having 1 to 10 carbon atoms represented by R 4 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n -Pentyl group, isopentyl group, neopentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptanyl group, cyclooctanyl group Etc. Among these, an alkyl group having 1 to 6 carbon atoms is preferable, an alkyl group having 1 to 3 carbon atoms is more preferable, a methyl group or an ethyl group is further preferable, and a methyl group is most preferable.
R5は炭素数1〜10のアルキレン基を表す。R5が表すアルキレン基は直鎖状に限定されず、分岐状または環状であってもよく、直鎖および/または分岐構造と環状構造が結合した構造であってもよい。 R 5 represents an alkylene group having 1 to 10 carbon atoms. The alkylene group represented by R 5 is not limited to a straight chain, and may be branched or cyclic, or may be a structure in which a linear and / or branched structure and a cyclic structure are bonded.
R5が表す炭素数1〜10のアルキレン基の例としては、メチレン基、エタン−1,1−ジイル基、エタン−1,2−ジイル基、プロパン−1,1−ジイル基、プロパン−1,2−ジイル基、プロパン−1,3−ジイル基、ペンタン−1,5−ジイル基、ヘキサン−1,6−ジイル基、シクロヘキサン−1,4−ジイル基などが挙げられる。成形体の機械的強度向上の観点から、炭素数1〜5のアルキレン基が好ましく、炭素数1〜3のアルキレン基がより好ましく、メチレン基またはエチレン基がさらに好ましく、メチレン基が最も好ましい。 Examples of the alkylene group having 1 to 10 carbon atoms represented by R 5 include a methylene group, an ethane-1,1-diyl group, an ethane-1,2-diyl group, a propane-1,1-diyl group, and a propane-1 2, 2-diyl group, propane-1,3-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, cyclohexane-1,4-diyl group and the like. From the viewpoint of improving the mechanical strength of the molded article, an alkylene group having 1 to 5 carbon atoms is preferable, an alkylene group having 1 to 3 carbon atoms is more preferable, a methylene group or an ethylene group is further preferable, and a methylene group is most preferable.
R5は、化合物(I)において、無機充填材との結合に伴う脱水縮合に関わる部位と、樹脂との反応に関わる部位であるエポキシ基との間のスペーサーとしての役割を有する。スペーサーとしてR5が存在することにより、脱水縮合に関わる部位と、樹脂と反応するエポキシ基とが適切な距離を保ち、円滑な脱水縮合が行われる。 In compound (I), R 5 has a role as a spacer between a site related to dehydration condensation accompanying the bond with the inorganic filler and an epoxy group which is a site related to the reaction with the resin. By the presence of R 5 as a spacer, the site involved in dehydration condensation and the epoxy group that reacts with the resin are kept at an appropriate distance, and smooth dehydration condensation is performed.
化合物(I)において、シリル基のα位の炭素は2つの水素原子を有し、β位の炭素はアルキル基R4を有する。化合物(I)がシランカップリング剤として作用する場合、R1〜R3は加水分解により水酸基となり、該水酸基のうち少なくともひとつが無機材料表面の水酸基と脱水縮合する。
この際、シリル基の近傍にアルキル基が存在すると、当該アルキル基は脱水縮合部への水の接近の障害となり、シランカップリング剤層の加水分解が抑制される。
一方で、そのようなアルキル基は、R1〜R3の加水分解による水酸基の発生をも抑制しうるため、無機充填材表面への円滑な結合の妨げとなる恐れがある。
In the compound (I), the α-position carbon of the silyl group has two hydrogen atoms, and the β-position carbon has an alkyl group R 4 . When compound (I) acts as a silane coupling agent, R 1 to R 3 become hydroxyl groups by hydrolysis, and at least one of the hydroxyl groups undergoes dehydration condensation with a hydroxyl group on the surface of the inorganic material.
At this time, if an alkyl group is present in the vicinity of the silyl group, the alkyl group becomes an obstacle to the access of water to the dehydration condensation part, and hydrolysis of the silane coupling agent layer is suppressed.
On the other hand, such alkyl groups, for which can also suppress the generation of hydroxyl by hydrolysis R 1 to R 3, which may hinder smooth coupling to the inorganic filler surface.
本発明者らの詳細な検討により、シリル基のα位の炭素がアルキル基を有する場合には、R1〜R3への水の接近を過剰に妨げ、R1〜R3の加水分解を抑制し、無機充填材表面への円滑な結合を妨げることが判明した。一方、シリル基のα位、β位の炭素がそれぞれ水素原子を2つずつ有し、γ位の炭素がアルキル基を有する場合には、脱水縮合部への水の接近を妨げる効果が小さく、シランカップリング剤層の加水分解の抑制効果が小さいことが判明した。 Detailed investigation of the present inventors, if the carbon of the α-position of the silyl group having an alkyl group, interfere excess access of water to the R 1 to R 3, the hydrolysis of the R 1 to R 3 It was found to suppress and prevent smooth bonding to the inorganic filler surface. On the other hand, when the α-position and β-position carbon of the silyl group each have two hydrogen atoms and the γ-position carbon has an alkyl group, the effect of preventing the water from approaching the dehydration condensation portion is small. It was found that the effect of suppressing hydrolysis of the silane coupling agent layer was small.
しかし、シリル基に対し、α位の炭素が2つの水素原子を有し、β位の炭素がアルキル基を有する場合には、R1〜R3の加水分解による水酸基の発生を妨げずに無機充填材表面に円滑にシランカップリング剤層を導入することができ、かつ、シランカップリング剤層形成後においては脱水縮合部への水の接近が適度に妨げられ、加水分解が効果的に抑制されることを見出した。 However, when the α-position carbon has two hydrogen atoms and the β-position carbon has an alkyl group with respect to the silyl group, it is inorganic without inhibiting the generation of hydroxyl groups by hydrolysis of R 1 to R 3. The silane coupling agent layer can be smoothly introduced to the surface of the filler, and after the silane coupling agent layer is formed, water access to the dehydration condensation part is appropriately prevented and hydrolysis is effectively suppressed. I found out that
化合物(I)の具体例として下記の化合物が挙げられるが、これらに限定されない。 Specific examples of compound (I) include, but are not limited to, the following compounds.
化合物(I)の製造方法に特に制限はなく、公知方法を組み合わせることにより製造できる。例としては、まず塩基の存在下、アルコール(II)と、エピハロヒドリン(III)とよりエポキシ化合物(IV)を得(本工程を工程1と称する)、次いで白金系触媒の存在下、ヒドロシラン類(V)を用いてヒドロシリル化することにより有機ケイ素化合物(I)を製造する(本工程を工程2と称する)方法がある。 There is no restriction | limiting in particular in the manufacturing method of compound (I), It can manufacture by combining a well-known method. As an example, first, an epoxy compound (IV) is obtained from alcohol (II) and epihalohydrin (III) in the presence of a base (this step is referred to as Step 1), and then hydrosilanes ( There is a method of producing organosilicon compound (I) by hydrosilylation using V) (this step is referred to as step 2).
(式中、R1〜R5は前記定義の通りである。Xは塩素原子、臭素原子またはヨウ素原子を表す。)
以下、化合物(I)の製造方法について詳細に説明する。
(In the formula, R 1 to R 5 are as defined above. X represents a chlorine atom, a bromine atom or an iodine atom.)
Hereafter, the manufacturing method of compound (I) is demonstrated in detail.
(工程1)
エピハロヒドリン(III)の使用量に特に制限はないが、原料のアルコール(II)1モルに対して0.8〜10モルであることが好ましく、収率及び容積効率の観点からは1〜5モルであることがより好ましい。
(Process 1)
Although there is no restriction | limiting in particular in the usage-amount of epihalohydrin (III), it is preferable that it is 0.8-10 mol with respect to 1 mol of alcohol (II) of a raw material, and 1-5 mol from a viewpoint of a yield and volumetric efficiency. It is more preferable that
工程1は、溶媒の存在下または非存在下に実施することができる。
かかる溶媒としては反応に悪影響を及ぼさない限り特に制限はなく、例えばベンゼン、トルエン、キシレンなどの芳香族炭化水素類;ヘキサン、へプタン、オクタン、シクロヘキサン、メチルシクロヘキサンなどの脂肪族炭化水素類;クロロベンゼン、フルオロベンゼンなどのハロゲン化芳香族炭化水素類;ジクロロメタン、クロロホルム、1,2−ジクロロエタンなどのハロゲン化脂肪族炭化水素類;ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフランなどのエーテル類などが挙げられる。これらは一種類を単独で使用してもよいし、二種以上を併用してもよい。
Step 1 can be performed in the presence or absence of a solvent.
Such a solvent is not particularly limited as long as it does not adversely influence the reaction. For example, aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as hexane, heptane, octane, cyclohexane and methylcyclohexane; chlorobenzene And halogenated aromatic hydrocarbons such as fluorobenzene; halogenated aliphatic hydrocarbons such as dichloromethane, chloroform and 1,2-dichloroethane; ethers such as diethyl ether, diisopropyl ether and tetrahydrofuran. These may be used alone or in combination of two or more.
溶媒を使用する場合の使用量に特に制限はないが、原料のアルコール(II)1質量部に対して0.5〜20質量部であることが好ましく、容積効率の観点からは1〜5質量部であることが好ましい。 Although there is no restriction | limiting in particular in the usage-amount in the case of using a solvent, it is preferable that it is 0.5-20 mass parts with respect to 1 mass part of alcohol (II) of a raw material, and 1-5 mass from a viewpoint of volume efficiency. Part.
工程1で使用する塩基としては、例えば水素化ナトリウム、水素化カリウムなどのアルカリ金属水素化物;水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物;炭酸ナトリウム、炭酸カリウムなどのアルカリ金属炭酸塩;トリエチルアミン、トリブチルアミン、ジアザビシクロ[2.2.2]オクタンなどの第三級アミン;ピリジンなどの含窒素複素環式芳香族化合物などが挙げられる。これらの中でも、経済性、反応性の観点からアルカリ金属水酸化物が好ましい。 Examples of the base used in Step 1 include alkali metal hydrides such as sodium hydride and potassium hydride; alkali metal hydroxides such as sodium hydroxide and potassium hydroxide; alkali metal carbonates such as sodium carbonate and potassium carbonate. Tertiary amines such as triethylamine, tributylamine and diazabicyclo [2.2.2] octane; nitrogen-containing heterocyclic aromatic compounds such as pyridine; Among these, alkali metal hydroxides are preferable from the viewpoints of economy and reactivity.
塩基の使用量に特に制限は無いが、経済性および後処理の容易さの観点から、アルコール(II)1モルに対して0.8〜5モルであることが好ましく、0.8〜3モルであることがより好ましい。 Although there is no restriction | limiting in particular in the usage-amount of a base, From a viewpoint of economical efficiency and ease of post-processing, it is preferable that it is 0.8-5 mol with respect to 1 mol of alcohol (II), and 0.8-3 mol It is more preferable that
工程1は相間移動触媒の存在下または非存在下に実施することができるが、存在下で実施するのが好ましい。
かかる相間移動触媒としては特に制限はなく、例えば、ベンジルトリメチルアンモニウムクロリド、トリオクチルメチルアンモニウムクロリド、ラウリルピリジウムブロミド、デシルトリメチルアンモニウムクロリド、ラウリルトリメチルアンモニウムクロリド、セチルトリメチルアンモニウムクロリド、セチルトリメチルアンモニウムブロミドなどが挙げられる。これらは単独で又は二種以上組み合せて用いることができる。
Step 1 can be carried out in the presence or absence of a phase transfer catalyst, but is preferably carried out in the presence.
The phase transfer catalyst is not particularly limited, and examples thereof include benzyltrimethylammonium chloride, trioctylmethylammonium chloride, laurylpyridium bromide, decyltrimethylammonium chloride, lauryltrimethylammonium chloride, cetyltrimethylammonium chloride, cetyltrimethylammonium bromide and the like. Can be mentioned. These may be used alone or in combination of two or more.
相間移動触媒の使用量はアルコール(II)に対し 0.1〜10.0質量%、好ましくは 0.3〜3.0質量%である。0.1質量%未満では反応に長時間を要し、10.0質量%以上使用しても効果の向上は期待されない。 The amount of the phase transfer catalyst used is 0.1 to 10.0% by mass, preferably 0.3 to 3.0% by mass, based on the alcohol (II). If it is less than 0.1% by mass, the reaction takes a long time, and even if it is used in an amount of 10.0% by mass or more, no improvement in the effect is expected.
工程1における反応温度は−20℃〜200℃の範囲であることが好ましく、0℃〜150℃の範囲であることがより好ましい。また、反応は、空気雰囲気下でも、窒素、アルゴンなどの不活性ガス雰囲気下でも実施することができる。さらに、反応は大気圧下で行ってもよく、減圧下で行ってもよい。 The reaction temperature in step 1 is preferably in the range of −20 ° C. to 200 ° C., more preferably in the range of 0 ° C. to 150 ° C. In addition, the reaction can be carried out in an air atmosphere or an inert gas atmosphere such as nitrogen or argon. Furthermore, the reaction may be carried out under atmospheric pressure or under reduced pressure.
反応終了後、使用した塩基に応じ、適宜、反応混合物を水、または塩酸水溶液などの酸性水溶液で洗浄して塩基を除去した後、濃縮し、再結晶、蒸留、カラムクロマトグラフィーなどの通常の精製手段で精製することによって、目的とするエポキシ化合物(IV)を分離取得することができる。 After completion of the reaction, depending on the base used, the reaction mixture is appropriately washed with water or an acidic aqueous solution such as aqueous hydrochloric acid to remove the base and then concentrated, followed by normal purification such as recrystallization, distillation, column chromatography, etc. By purifying by means, the target epoxy compound (IV) can be separated and obtained.
(工程2)
工程2で用いられるヒドロシラン類(V)としては例えば、トリクロロシラン、トリメトキシシラン、トリエトキシシランなどが挙げられる。
(Process 2)
Examples of the hydrosilanes (V) used in step 2 include trichlorosilane, trimethoxysilane, triethoxysilane, and the like.
工程2で用いられる白金系触媒としては、好ましくは塩化白金系触媒を用いることができ、具体的にはヘキサクロリド白金(IV)酸(H2PtCl6)、塩化白金・不飽和ケトン錯体、塩化白金・β−ジケトン錯体、塩化白金オレフィン錯体などが挙げられる。白金系触媒の使用量に特に制限はないが、原料のエポキシ化合物(IV)1モルに対し10−7〜10−3モルが好ましく、10−6〜10−3モルがより好ましい。 As the platinum-based catalyst used in Step 2, a platinum chloride-based catalyst can be preferably used. Specifically, hexachloride platinum (IV) acid (H 2 PtCl 6 ), platinum chloride / unsaturated ketone complex, chloride Examples thereof include platinum / β-diketone complexes and platinum chloride olefin complexes. Although there is no restriction | limiting in particular in the usage-amount of a platinum type catalyst, 10 <-7 > -10 <-3> mol is preferable with respect to 1 mol of raw material epoxy compounds (IV), and 10 <-6 > -10 <-3> mol is more preferable.
工程2は、溶媒の存在下または非存在下に実施することができる。
かかる溶媒としては反応に悪影響を及ぼさない限り特に制限はなく、例えばメタノール、エタノール、n−プロパノール、イソプロパノールなどのアルコール類;ベンゼン、トルエン、キシレンなどの芳香族炭化水素類、ヘキサン、へプタン、オクタン、シクロヘキサン、メチルシクロヘキサンなどの脂肪族炭化水素類;ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフランなどのエーテル類;クロロベンゼン、フルオロベンゼンなどのハロゲン化芳香族炭化水素類;ジクロロメタン、クロロホルム、1,2−ジクロロエタンなどのハロゲン化脂肪族炭化水素類などが挙げられる。これらは一種を単独で使用してもよいし、二種以上を併用してもよい。溶媒を使用する場合、その使用量に特に制限はないが、原料のエポキシ化合物(IV)1質量部に対して0.5〜100質量部であることが好ましく、容積効率の観点からは1〜10質量部であることがより好ましい。
Step 2 can be performed in the presence or absence of a solvent.
Such a solvent is not particularly limited as long as it does not adversely influence the reaction. For example, alcohols such as methanol, ethanol, n-propanol and isopropanol; aromatic hydrocarbons such as benzene, toluene and xylene, hexane, heptane and octane Aliphatic hydrocarbons such as cyclohexane and methylcyclohexane; ethers such as diethyl ether, diisopropyl ether and tetrahydrofuran; halogenated aromatic hydrocarbons such as chlorobenzene and fluorobenzene; dichloromethane, chloroform, 1,2-dichloroethane and the like And halogenated aliphatic hydrocarbons. These may be used individually by 1 type, and may use 2 or more types together. When the solvent is used, the amount used is not particularly limited, but is preferably 0.5 to 100 parts by mass with respect to 1 part by mass of the raw material epoxy compound (IV). It is more preferable that it is 10 mass parts.
反応温度は−10〜100℃の範囲であることが好ましく、20〜80℃の範囲であることがより好ましい。反応時間は、通常、0.5時間〜48時間である。 The reaction temperature is preferably in the range of −10 to 100 ° C., more preferably in the range of 20 to 80 ° C. The reaction time is usually 0.5 hours to 48 hours.
R1〜R3がメトキシ基またはエトキシ基である化合物(I)を得たい場合は、ヒドロシラン類(V)としてトリメトキシシランまたはトリエトキシシランを用いて直接合成する方法や、トリクロロシランと反応させたのちに、メタノールまたはエタノール中で所望のアルコキシ体を得る方法でも取得できる。トリクロロ体経由の場合、アルコキシ化の際に発生する塩化水素を捕捉する為に、塩基としてトリエチルアミン、ピリジン、炭酸ナトリウム、炭酸カリウム、ナトリウムメトキシド、ナトリウムエトキシドなどを共存させることもできる。塩基の使用量に特に制限はないが、ヒドロシラン類(V)1モルに対して0.8〜20モルであることが好ましく、1.0〜10モルであることがより好ましい。 When it is desired to obtain the compound (I) in which R 1 to R 3 are a methoxy group or an ethoxy group, a method of directly synthesizing using trimethoxysilane or triethoxysilane as a hydrosilane (V), or a reaction with trichlorosilane. Later, it can also be obtained by a method of obtaining a desired alkoxy compound in methanol or ethanol. In the case of via a trichloro form, triethylamine, pyridine, sodium carbonate, potassium carbonate, sodium methoxide, sodium ethoxide and the like can be present together as a base in order to capture hydrogen chloride generated during alkoxylation. Although there is no restriction | limiting in particular in the usage-amount of a base, It is preferable that it is 0.8-20 mol with respect to 1 mol of hydrosilanes (V), and it is more preferable that it is 1.0-10 mol.
反応は、常圧下または加圧下で実施できるが、通常は常圧下で行われる。 The reaction can be carried out under normal pressure or under pressure, but is usually carried out under normal pressure.
反応終了後に得られる化合物(I)は、有機化合物の単離・精製において通常用いられる方法により単離することができる。例えば、反応混合物をろ過後、濃縮し、減圧蒸留などにより精製することで、目的とする有機ケイ素化合物(I)を得ることができる。また、反応混合物をそのまま濃縮することでシランカップリング剤として使用することもできる。 Compound (I) obtained after completion of the reaction can be isolated by a method usually used in the isolation and purification of organic compounds. For example, the target organic silicon compound (I) can be obtained by filtering the reaction mixture, concentrating it, and purifying it by distillation under reduced pressure. Moreover, it can also be used as a silane coupling agent by concentrating a reaction mixture as it is.
このようにして製造される化合物(I)はシランカップリング剤としての機能を有し、無機フィラーの表面改質、接着剤の接着性の向上、被膜の耐久性向上、有機ポリマーの架橋化等を目的として、接着剤、プライマー、シーラント、シーリング材、塗料、コーティング材、ガラス繊維強化樹脂、無機フィラー配合樹脂、複合強化樹脂、印刷用インク、エラストマー材料、熱可塑性樹脂材料、複合材料、電気絶縁体等に広く使用可能である。 The compound (I) thus produced has a function as a silane coupling agent, such as surface modification of an inorganic filler, improvement in adhesive adhesion, improvement in coating durability, cross-linking of an organic polymer, etc. For the purpose of adhesive, primer, sealant, sealant, paint, coating material, glass fiber reinforced resin, inorganic filler compounded resin, composite reinforced resin, printing ink, elastomer material, thermoplastic resin material, composite material, electrical insulation Can be widely used on the body.
[樹脂組成物]
本発明の樹脂組成物は化合物(I)により表面処理された無機充填材を含有する。なお、本明細書中において、「樹脂」とはエラストマーも含む概念である。
[Resin composition]
The resin composition of the present invention contains an inorganic filler surface-treated with compound (I). In the present specification, “resin” is a concept including an elastomer.
化合物(I)により表面処理される無機充填材としては、一般にシラノール基と反応し、結合を形成する無機材料からなるものであれば特に限定はなく、無機充填材の形状も特に限定されない。そのような無機充填材としては、例えばケイ素、チタン、ジルコニウム、マグネシウム、アルミニウム、インジウム、スズ及びそれらの単独又は複合酸化物からなるフィラー;ガラス繊維、ガラスクロス、ガラステープ、ガラスマット、ガラスペーパー等のガラスフィラー;シリカ系充填材;クレー、マイカ、タルク、ワラストナイト等の鉱物系充填材;鉄、アルミニウム等の金属基材等が挙げられる。 The inorganic filler surface-treated with the compound (I) is not particularly limited as long as it is made of an inorganic material that generally reacts with a silanol group to form a bond, and the shape of the inorganic filler is not particularly limited. Examples of such inorganic fillers include fillers made of silicon, titanium, zirconium, magnesium, aluminum, indium, tin, and single or composite oxides thereof; glass fiber, glass cloth, glass tape, glass mat, glass paper, etc. Glass fillers; silica-based fillers; mineral-based fillers such as clay, mica, talc and wollastonite; metal substrates such as iron and aluminum.
無機充填材の表面処理方法に特に制限はない。例えば、無機充填材を樹脂に添加した後に原液あるいは有機溶剤や水等で希釈した化合物(I)を添加し混合する方法や、無機充填材を樹脂に添加する前に予め乾式法や湿式法により化合物(I)により処理する方法や、有機溶剤や水等で希釈した化合物(I)を無機充填材に直接塗布するプライマー法などが挙げられる。 There is no restriction | limiting in particular in the surface treatment method of an inorganic filler. For example, after adding the inorganic filler to the resin, a method of adding and mixing the compound (I) diluted with a stock solution or an organic solvent or water, or by adding a dry method or a wet method in advance before adding the inorganic filler to the resin. Examples thereof include a method of treating with compound (I) and a primer method in which compound (I) diluted with an organic solvent or water is directly applied to an inorganic filler.
無機充填材の表面処理においては、熱による乾燥処理を伴うことが好ましい。熱による乾燥処理を行うことにより、化合物(I)の水酸基と無機充填材表面の水酸基との間における脱水縮合が進行し、強固な結合を形成できる。 The surface treatment of the inorganic filler is preferably accompanied by a heat drying treatment. By performing a drying treatment with heat, dehydration condensation proceeds between the hydroxyl group of compound (I) and the hydroxyl group on the surface of the inorganic filler, and a strong bond can be formed.
乾燥処理における温度は、通常60〜180℃であり、好ましくは80〜150℃である。また、乾燥時間は5分〜4時間が好ましい。 The temperature in the drying treatment is usually 60 to 180 ° C, preferably 80 to 150 ° C. The drying time is preferably 5 minutes to 4 hours.
本発明の樹脂組成物を構成する樹脂としては、例えば不飽和ポリエステル、シリコーン樹脂、メラミン樹脂、ポリスチレン、ポリエチレン、ポリプロピレン、ポリエーテル、アクリル樹脂、ジアリルフタレート、ブチルゴム、エポキシ樹脂等が挙げられる。
これらの樹脂は1種を単独で使用してもよく、2種類以上を併用してもよい。
Examples of the resin constituting the resin composition of the present invention include unsaturated polyester, silicone resin, melamine resin, polystyrene, polyethylene, polypropylene, polyether, acrylic resin, diallyl phthalate, butyl rubber, and epoxy resin.
These resins may be used alone or in combination of two or more.
本発明の樹脂組成物は、上記表面処理された無機充填材および樹脂の他、用途に応じて溶剤、界面活性剤、防腐剤、変色防止剤、酸化防止剤、難燃剤、光安定剤、表面処理されていない無機充填材等の他の添加剤を、本発明の趣旨を損なわない範囲で含有してもよい。 The resin composition of the present invention includes the above-described inorganic filler and resin subjected to surface treatment, a solvent, a surfactant, a preservative, a discoloration inhibitor, an antioxidant, a flame retardant, a light stabilizer, a surface depending on the application. You may contain other additives, such as an untreated inorganic filler, in the range which does not impair the meaning of this invention.
本発明の樹脂組成物は、上記の各構成成分を、公知の方法に従って混合することにより調製できる。例えば、樹脂とその他の成分をドライブレンドする方法、押出機を用いて各構成成分を溶融混練する方法などが挙げられる。 The resin composition of this invention can be prepared by mixing each said structural component according to a well-known method. For example, a method of dry blending a resin and other components, a method of melt-kneading each component using an extruder, and the like can be mentioned.
本発明の樹脂組成物を成形することにより、シランカップリング剤層の耐加水分解性に優れる成形体を得ることができる。 By molding the resin composition of the present invention, a molded product having excellent hydrolysis resistance of the silane coupling agent layer can be obtained.
以下、実施例により本発明を具体的に説明するが、本発明はこれらの実施例に限定されない。 EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to these Examples.
<実施例1>
(工程1)3−メチル−3−ブテニルグリシジルエーテルの合成
<Example 1>
(Step 1) Synthesis of 3-methyl-3-butenyl glycidyl ether
攪拌機、温度計、滴下ロートを備えた1L反応器に、窒素気流下、50%水酸化ナトリウム水溶液280g(3.5mol)、3−メチル−3−ブテン−1−オール200g(2.32mol)、ベンジルトリメチルアンモニウムクロリド4.4g(0.024mol)を仕込み、40℃に加熱した。エピクロロヒドリン430g(4.65mol)を30分かけて滴下し、40℃で4時間撹拌を行った。反応液に蒸留水400gを加えて有機層と水層を分離した。有機層を蒸留水400gで洗浄後、減圧下に濃縮して残留物をさらに減圧蒸留し、3−メチル−3−ブテニルグリシジルエーテル175.2g(1.23mol;収率53%)を得た。 In a 1 L reactor equipped with a stirrer, a thermometer, and a dropping funnel, 280 g (3.5 mol) of 50% aqueous sodium hydroxide solution, 200 g (2.32 mol) of 3-methyl-3-buten-1-ol under a nitrogen stream, 4.4 g (0.024 mol) of benzyltrimethylammonium chloride was charged and heated to 40 ° C. Epichlorohydrin 430g (4.65mol) was dripped over 30 minutes, and it stirred at 40 degreeC for 4 hours. 400 g of distilled water was added to the reaction solution to separate the organic layer and the aqueous layer. The organic layer was washed with 400 g of distilled water and then concentrated under reduced pressure, and the residue was further distilled under reduced pressure to obtain 175.2 g (1.23 mol; yield 53%) of 3-methyl-3-butenyl glycidyl ether. .
1H−NMR(400MHz,CDCl3,TMS)δ:4.75(m,1H)、4.73(m,1H)、3.73(dd,J=11.6,3.0Hz,1H)、3.62(m,2H)、3.39(dd,J=11.6,5.8Hz,1H)、3.13(m,1H)、2.77(dd,J=5.1,4.2Hz,1H)、2.59(dd,J=5.1,2.7Hz,1H)、2.31(m,2H)、1.76(s,3H). 1 H-NMR (400 MHz, CDCl 3 , TMS) δ: 4.75 (m, 1H), 4.73 (m, 1H), 3.73 (dd, J = 11.6, 3.0 Hz, 1H) 3.62 (m, 2H), 3.39 (dd, J = 11.6, 5.8 Hz, 1H), 3.13 (m, 1H), 2.77 (dd, J = 5.1) 4.2 Hz, 1H), 2.59 (dd, J = 5.1, 2.7 Hz, 1H), 2.31 (m, 2H), 1.76 (s, 3H).
(工程2)4−グリシジルオキシ−2−メチルトリメトキシシランの合成
攪拌機、温度計を備えた25mL反応器に、窒素気流下、3−メチル−3−ブテニルグリシジルエーテル1.0g(7.0mmol)を仕込み、H2PtCl6・6H2O5.0mg(9.7μmol)のテトラヒドロフラン溶液0.3mlを加えた後、トリメトキシシラン1.22g(10.0mmol)を滴下し、25℃で20時間撹拌した。得られた反応液を減圧下に濃縮し、4−グリシジルオキシ−2−メチルトリメトキシシラン1.22g(4.61mmol;収率66%)を得た。 Stirrer, 25mL reactor equipped with a thermometer, under a nitrogen stream, 3-methyl-3-butenyl glycidyl ether 1.0 g (7.0 mmol) were charged, H 2 PtCl 6 · 6H 2 O5.0mg (9. After adding 0.3 ml of a 7 μmol) tetrahydrofuran solution, 1.22 g (10.0 mmol) of trimethoxysilane was added dropwise, followed by stirring at 25 ° C. for 20 hours. The obtained reaction solution was concentrated under reduced pressure to obtain 1.22 g (4.61 mmol; yield 66%) of 4-glycidyloxy-2-methyltrimethoxysilane.
1H−NMR(400MHz,CDCl3,TMS)δ:3.74(m,1H)、3.63(m,2H)、3.55(s,9H)、3.40(m,1H)、3.10(m,1H)、2.78(m,1H)、2.60(m,1H)、1.72(m,2H)、1.48(m,1H)、1.01(d,J=6.4Hz,3H)、0.73(m,2H). 1 H-NMR (400 MHz, CDCl 3 , TMS) δ: 3.74 (m, 1H), 3.63 (m, 2H), 3.55 (s, 9H), 3.40 (m, 1H), 3.10 (m, 1H), 2.78 (m, 1H), 2.60 (m, 1H), 1.72 (m, 2H), 1.48 (m, 1H), 1.01 (d , J = 6.4 Hz, 3H), 0.73 (m, 2H).
<実施例2>
実施例1で得た4−グリシジルオキシ−2−メチルトリメトキシシランの2mol/Lエタノール−水(95/5(v/v))溶液にガラス板を25℃で2時間浸漬した後、110℃、3時間の加熱処理を行った。この板にビスフェノールA型エポキシ樹脂(三菱化学社製「エピコート828」)とジエチレントリアミンを等モル混合した樹脂を100μmの膜厚で塗布し、硬化させ、2枚の試験片を作成した。
まず、JIS K 5600.5.6に準拠して一方の試験片に対し碁盤目付着性試験を行った。具体的には、試験片に対し、3mmの隙間間隔でガラス板に達するまでナイフで切れ込みを入れることにより25マスの碁盤目を作成し、当該碁盤目上に粘着テープを貼りあわせて、塗膜面に対して45度の角度をなす方向に粘着テープを引き剥がした。その後、樹脂が剥離したマス目をカウントし、全マス目に対する剥離したマス目の割合(%)を算出した。下記の基準で評点化した数値を表1の「初期」欄に示す。
評価点数5:碁盤のマス目の剥離率0%
評価点数4:碁盤のマス目の剥離率0%超5%以下
評価点数3:碁盤のマス目の剥離率5%超15%以下
評価点数2:碁盤のマス目の剥離率15%超25%以下
評価点数1:碁盤のマス目の剥離率25%超
次に、もう一方の試験片について、沸騰水に24時間浸漬後に、上記と同様の条件で碁盤目付着試験を行った。上記と同様の方法で評点化した数値を表1の「沸騰水処理後」欄に示す。
<Example 2>
The glass plate was immersed in a 2 mol / L ethanol-water (95/5 (v / v)) solution of 4-glycidyloxy-2-methyltrimethoxysilane obtained in Example 1 at 25 ° C. for 2 hours, and then 110 ° C. Heat treatment was performed for 3 hours. A resin obtained by mixing equimolar amounts of bisphenol A type epoxy resin (“Epicoat 828” manufactured by Mitsubishi Chemical Corporation) and diethylenetriamine was applied to this plate at a film thickness of 100 μm and cured to prepare two test pieces.
First, a cross-cut adhesion test was performed on one of the test pieces in accordance with JIS K 5600.5.6. Specifically, a 25 square grid is created by cutting a test piece with a knife until it reaches the glass plate with a gap of 3 mm, and an adhesive tape is pasted on the grid, The adhesive tape was peeled off in a direction forming an angle of 45 degrees with respect to the surface. Thereafter, the squares from which the resin was peeled were counted, and the ratio (%) of the squares that were peeled to the whole square was calculated. The numerical values scored according to the following criteria are shown in the “Initial” column of Table 1.
Evaluation score 5: 0% peeling rate of grid on grid
Evaluation score 4: Stripping rate of grid on grid is 0% more than 5% or less Evaluation score 3: Stripping rate on grid is more than 5% but not more than 15% Evaluation score 2: Stripping rate of grid on grid is more than 15% and 25% Hereinafter, evaluation score 1: peeling rate of grid of grid exceeds 25% Next, after the other test piece was immersed in boiling water for 24 hours, a grid adhesion test was performed under the same conditions as described above. The numerical values scored by the same method as above are shown in the “After boiling water treatment” column of Table 1.
<比較例>
実施例2において、4−グリシジルオキシ−2−メチルトリメトキシシランの代わりに3−グリシドキシプロピルトリメトキシシラン(信越化学社製)を使用した以外は実施例2と同様の操作を行った。結果を表1に示す。
In Example 2, the same operation as in Example 2 was performed except that 3-glycidoxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of 4-glycidyloxy-2-methyltrimethoxysilane. The results are shown in Table 1.
表1に示されるように、本発明の有機ケイ素化合物を用いた場合には、類似の構造を有する比較例の有機ケイ素化合物を用いた場合に比べて加水分解による性能低下が少ない。すなわち、本発明の有機ケイ素化合物を用いることで、シランカップリング剤層の耐加水分解性に優れる成形体を提供できることがわかる。 As shown in Table 1, when the organosilicon compound of the present invention is used, performance degradation due to hydrolysis is less than when the organosilicon compound of a comparative example having a similar structure is used. That is, it turns out that the molded object which is excellent in the hydrolysis resistance of a silane coupling agent layer can be provided by using the organosilicon compound of this invention.
本発明の有機ケイ素化合物を用いて表面処理した無機充填材を樹脂に添加して成形することで、シランカップリング剤層の耐加水分解性に優れる成形体を提供できる。 By adding an inorganic filler surface-treated with the organosilicon compound of the present invention to a resin and molding it, a molded article having excellent hydrolysis resistance of the silane coupling agent layer can be provided.
Claims (2)
The resin composition containing the inorganic filler surface-treated with the organosilicon compound of Claim 1.
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