JP2017538036A5 - - Google Patents
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- Publication number
- JP2017538036A5 JP2017538036A5 JP2017527320A JP2017527320A JP2017538036A5 JP 2017538036 A5 JP2017538036 A5 JP 2017538036A5 JP 2017527320 A JP2017527320 A JP 2017527320A JP 2017527320 A JP2017527320 A JP 2017527320A JP 2017538036 A5 JP2017538036 A5 JP 2017538036A5
- Authority
- JP
- Japan
- Prior art keywords
- holding device
- cvd
- pvd coating
- gas inlet
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims 13
- 238000000576 coating method Methods 0.000 claims 13
- 230000004888 barrier function Effects 0.000 claims 3
- 210000004027 cell Anatomy 0.000 claims 2
- 210000002421 cell wall Anatomy 0.000 claims 1
- 210000002287 horizontal cell Anatomy 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000000087 stabilizing effect Effects 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014116991.3 | 2014-11-20 | ||
| DE102014116991.3A DE102014116991A1 (de) | 2014-11-20 | 2014-11-20 | CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate |
| PCT/EP2015/076972 WO2016079184A1 (de) | 2014-11-20 | 2015-11-18 | Cvd- oder pvd-reaktor zum beschichten grossflächiger substrate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017538036A JP2017538036A (ja) | 2017-12-21 |
| JP2017538036A5 true JP2017538036A5 (cg-RX-API-DMAC7.html) | 2018-03-29 |
| JP6647301B2 JP6647301B2 (ja) | 2020-02-14 |
Family
ID=54703945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017527320A Active JP6647301B2 (ja) | 2014-11-20 | 2015-11-18 | 大面積基板コーティング用ｃｖｄ又はｐｖｄ反応炉 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10822701B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP3221490B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6647301B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20170084278A (cg-RX-API-DMAC7.html) |
| CN (1) | CN107109649B (cg-RX-API-DMAC7.html) |
| DE (1) | DE102014116991A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI684482B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2016079184A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015118765A1 (de) | 2014-11-20 | 2016-06-09 | Aixtron Se | Vorrichtung zum Beschichten eines großflächigen Substrats |
| DE102015101461A1 (de) | 2015-02-02 | 2016-08-04 | Aixtron Se | Vorrichtung zum Beschichten eines großflächigen Substrats |
| GB201513339D0 (en) * | 2015-07-29 | 2015-09-09 | Pilkington Group Ltd | Coating apparatus |
| DE102017105374A1 (de) | 2017-03-14 | 2018-09-20 | Aixtron Se | Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung |
| DE102017105379A1 (de) | 2017-03-14 | 2018-09-20 | Aixtron Se | Substrathalteranordnung mit Maskenträger |
| DE102017120529A1 (de) | 2017-09-06 | 2019-03-07 | Aixtron Se | Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat unter Verwendung einer Maske |
| US12012654B2 (en) | 2018-04-30 | 2024-06-18 | Aixtron Se | Device for coating a substrate with a carbon-containing coating |
| CN112342529B (zh) * | 2020-09-24 | 2022-12-06 | 杭州盾源聚芯半导体科技有限公司 | 一种具有连接头的喷射管 |
| CN116288232B (zh) * | 2023-03-09 | 2025-04-11 | 株洲三一硅能技术有限公司 | 泵盖组件及其pvd真空设备 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3970037A (en) * | 1972-12-15 | 1976-07-20 | Ppg Industries, Inc. | Coating composition vaporizer |
| ZA735383B (en) * | 1972-12-15 | 1975-03-26 | Ppg Industries Inc | Coating composition vaporizer |
| JP3729939B2 (ja) * | 1996-07-12 | 2005-12-21 | 松下電器産業株式会社 | プラズマ処理方法及び装置 |
| DE60028034T2 (de) * | 1999-04-06 | 2006-10-05 | Tokyo Electron Ltd. | Elektrode und herstellungsmethode für eine elektrode |
| DE602005005851T2 (de) * | 2004-11-24 | 2009-04-09 | Oc Oerlikon Balzers Ag | Vakuumbehandlungskammer für sehr grossflächige substrate |
| JP4749785B2 (ja) * | 2005-07-19 | 2011-08-17 | 東京エレクトロン株式会社 | ガス処理装置 |
| US20080317973A1 (en) | 2007-06-22 | 2008-12-25 | White John M | Diffuser support |
| US20090098220A1 (en) * | 2007-10-12 | 2009-04-16 | Lance Ashworth | Liquid pharmaceutical preparation comprising forskolin for promoting lean body mass |
| US8673080B2 (en) * | 2007-10-16 | 2014-03-18 | Novellus Systems, Inc. | Temperature controlled showerhead |
| JP2010182729A (ja) * | 2009-02-03 | 2010-08-19 | Fuji Electric Holdings Co Ltd | プラズマｃｖｄ装置 |
| CN102953050B (zh) * | 2011-08-26 | 2014-06-18 | 杭州士兰明芯科技有限公司 | 大直径mocvd反应器的喷淋头 |
| DE102013101534A1 (de) | 2013-02-15 | 2014-08-21 | Aixtron Se | Gasverteiler für einen CVD-Reaktor |
-
2014
- 2014-11-20 DE DE102014116991.3A patent/DE102014116991A1/de not_active Withdrawn
-
2015
- 2015-11-18 US US15/528,476 patent/US10822701B2/en active Active
- 2015-11-18 EP EP15800749.2A patent/EP3221490B1/de active Active
- 2015-11-18 CN CN201580069344.0A patent/CN107109649B/zh active Active
- 2015-11-18 KR KR1020177016394A patent/KR20170084278A/ko not_active Ceased
- 2015-11-18 JP JP2017527320A patent/JP6647301B2/ja active Active
- 2015-11-18 WO PCT/EP2015/076972 patent/WO2016079184A1/de not_active Ceased
- 2015-11-20 TW TW104138544A patent/TWI684482B/zh active