JP2017537464A - Energy storage device and manufacturing method thereof - Google Patents

Energy storage device and manufacturing method thereof Download PDF

Info

Publication number
JP2017537464A
JP2017537464A JP2017519933A JP2017519933A JP2017537464A JP 2017537464 A JP2017537464 A JP 2017537464A JP 2017519933 A JP2017519933 A JP 2017519933A JP 2017519933 A JP2017519933 A JP 2017519933A JP 2017537464 A JP2017537464 A JP 2017537464A
Authority
JP
Japan
Prior art keywords
capacitor
layer
multilayer structure
electrode
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017519933A
Other languages
Japanese (ja)
Other versions
JP6668341B2 (en
Inventor
ラザレフ,パヴェル,イワン
Original Assignee
キャパシタ サイエンシス インコーポレイテッド
キャパシタ サイエンシス インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by キャパシタ サイエンシス インコーポレイテッド, キャパシタ サイエンシス インコーポレイテッド filed Critical キャパシタ サイエンシス インコーポレイテッド
Publication of JP2017537464A publication Critical patent/JP2017537464A/en
Application granted granted Critical
Publication of JP6668341B2 publication Critical patent/JP6668341B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/14Organic dielectrics
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/14Organic dielectrics
    • H01G4/18Organic dielectrics of synthetic material, e.g. derivatives of cellulose
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/20Dielectrics using combinations of dielectrics from more than one of groups H01G4/02 - H01G4/06
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/20Applications use in electrical or conductive gadgets

Abstract

本発明は、第1の電極と、第2の電極と、前記第1の電極と前記第2の電極との間に配置された固体多層構造を含むエネルギー蓄積デバイスを提供する。固体多層構造は、前記第1および第2の電極と接触してもよい。固体多層構造は、前記電極に平行に配置された層を含むことができ、前記層はシーケンス(A−B)m−Aを有し、ここで、Aは絶縁層であり、Bは絶縁体マトリックス中に導電性ナノ粒子の微小分散体を有するコロイド状複合体を含有する分極層であり、「m」は1以上の数である。層Aは、少なくとも約0.05ボルト/ナノメートル(nm)の破壊電圧を有し、層Bは少なくとも約100の誘電率を有することができる。【選択図】図1The present invention provides an energy storage device that includes a first electrode, a second electrode, and a solid multilayer structure disposed between the first electrode and the second electrode. The solid multilayer structure may be in contact with the first and second electrodes. The solid multilayer structure may include layers arranged parallel to the electrodes, the layers having the sequence (AB) mA, where A is an insulating layer and B is an insulator. It is a polarization layer containing a colloidal composite having a fine dispersion of conductive nanoparticles in a matrix, and “m” is a number of 1 or more. Layer A can have a breakdown voltage of at least about 0.05 volts / nanometer (nm), and layer B can have a dielectric constant of at least about 100. [Selection] Figure 1

Description

背景技術
コンデンサは、静電界の形でエネルギーを蓄積するために使用される受動電子部品であり、誘電体層によって分離された一対の電極を含む。2つの電極間に電位差が存在するとき、電界が誘電体層に存在する。この電界はエネルギーを蓄積し、理想的なコンデンサは、各電極上の電荷とそれらの間の電位差との比である単一の一定の静電容量値によって特徴付けられる。実際には、電極間の誘電体層は少量の漏れ電流を通過させる。電極およびリード線は等価直列抵抗を生成し、誘電体層は破壊電圧をもたらす電界強度に制限を有する。最も単なるコンデンサは、誘電率εの誘電体層によって分離された2つの平行な電極からなり、各電極は面積Sを有し、互いに距離dをおいて配置されている。電極は面積Sにわたって均一に延びていると考えられ、表面電荷密度は式:±ρ=±Q/Sで表すことができる。電極の幅が間隔(距離)dよりもはるかに大きいので、コンデンサの中心付近の電場は、大きさE=ρ/εで均一になる。電圧は、電極間の電界の線積分として定義される。理想的なコンデンサは、式(1)で定義される一定の静電容量Cで特徴付けられる。

Figure 2017537464
これは容量が面積と共に増加し、距離と共に減少することを示している。したがって、高誘電率の材料で作られたデバイスでは、容量は最大である。 A capacitor is a passive electronic component used to store energy in the form of an electrostatic field and includes a pair of electrodes separated by a dielectric layer. When a potential difference exists between the two electrodes, an electric field is present in the dielectric layer. This electric field stores energy and an ideal capacitor is characterized by a single constant capacitance value that is the ratio of the charge on each electrode and the potential difference between them. In practice, the dielectric layer between the electrodes passes a small amount of leakage current. The electrodes and leads create an equivalent series resistance, and the dielectric layer has a limitation on the electric field strength that results in a breakdown voltage. The simplest capacitor consists of two parallel electrodes separated by a dielectric layer having a dielectric constant ε, each electrode having an area S and arranged at a distance d from each other. The electrode is considered to extend uniformly over the area S, and the surface charge density can be expressed by the formula: ± ρ = ± Q / S. Since the electrode width is much larger than the spacing (distance) d, the electric field near the center of the capacitor is uniform with magnitude E = ρ / ε. The voltage is defined as the line integral of the electric field between the electrodes. An ideal capacitor is characterized by a constant capacitance C defined by equation (1).
Figure 2017537464
This indicates that the capacity increases with area and decreases with distance. Therefore, the capacity is highest in devices made of high dielectric constant materials.

破壊電界強度Ebdとして知られる特性電界は、コンデンサ内の誘電体層が導電性になる電界である。これが起こる電圧は、デバイスの絶縁破壊電圧と呼ばれ、絶縁耐力と電極間の間隔との積によって与えられ、

Figure 2017537464
The characteristic electric field, known as the breakdown electric field strength Ebd , is an electric field at which the dielectric layer in the capacitor becomes conductive. The voltage at which this occurs is called the breakdown voltage of the device and is given by the product of the dielectric strength and the spacing between the electrodes,
Figure 2017537464

コンデンサに蓄積される最大体積エネルギー密度は、〜ε・E bdに比例する値によって制限され、εは誘電率であり、Ebdは破壊強度である。したがって、コンデンサの蓄積エネルギーを増加させるためには、誘電体の透磁率εおよび誘電体の破壊強度Ebdを高める必要がある。 The maximum volumetric energy density stored in the capacitor is limited by a value proportional to ~ ε · E 2 bd , where ε is the dielectric constant and E bd is the breakdown strength. Therefore, in order to increase the stored energy of the capacitor, it is necessary to increase the magnetic permeability ε of the dielectric and the breakdown strength E bd of the dielectric.

高電圧用途では、はるかに大きなコンデンサを使用しなければならない。破壊電圧を劇的に下げる要因はいくつかある。導電性電極の形状はこれらの用途にとって重要である。特に、鋭いエッジまたは点は、電界強度を局所的に著しく増大させ、局所的な破壊を招く可能性がある。任意の位置でローカル破壊が開始されると、破壊は、誘電体層を通って対向電極に到達して短絡するまでに、速やかに“トレース”する。   For high voltage applications, much larger capacitors must be used. There are several factors that dramatically reduce the breakdown voltage. The shape of the conductive electrode is important for these applications. In particular, sharp edges or points can significantly increase the field strength locally, leading to local breakdown. When local breakdown is initiated at an arbitrary location, the breakdown “traces” quickly until it reaches the counter electrode through the dielectric layer and shorts.

誘電体層の破壊は、通常、以下のように起こる。電場の強さが十分に高くなると、誘電材料の原子からの自由電子が、一方の電極から他方の電極へ電流を伝導させる。誘電体における不純物の存在または結晶構造の不完全性によっては、半導体デバイスにおいて観察されるようなアバランシェブレークダウンをもたらし得る。   The breakdown of the dielectric layer usually occurs as follows. When the electric field strength is sufficiently high, free electrons from the atoms of the dielectric material conduct current from one electrode to the other. The presence of impurities in the dielectric or imperfections in the crystal structure can lead to avalanche breakdown as observed in semiconductor devices.

誘電体材料の他の重要な特性は、その誘電率である。コンデンサには様々な種類の誘電体が使用され、セラミックス、ポリマーフィルム、紙、電解コンデンサなどの各種のコンデンサがある。最も広く使用されるポリマーフィルム材料は、ポリプロピレンおよびポリエステルである。誘電率を増加するとともに体積エネルギー密度を増加するのが重要な技術課題となる。   Another important property of the dielectric material is its dielectric constant. Various types of dielectrics are used as capacitors, and there are various types of capacitors such as ceramics, polymer films, paper, and electrolytic capacitors. The most widely used polymer film materials are polypropylene and polyester. Increasing the dielectric constant and volume energy density is an important technical issue.

ドデシルベンゼンスルホネート(DBSA)の存在下でのポリアクリル酸(PAA)の水性分散液中のアニリンの現場重合を用いて、ポリアニリンの超高誘電率複合体PANI−DBSA/PAAを合成した(Chao−Hsien Hoaら、「in situ重合によって調製された高誘電率ポリアニリン/ポリ(アクリル酸)複合体」、Synthetic Metals 158(2008)、第630−637ページ)。水溶性PAAは高分子安定剤として働き、巨視的凝集からPANI粒子を保護した。重量で30%のPANIを含有する複合体について、ca.2.0×10(1kHzで)との非常に高い誘電率が得られた。PANI含有量によって複合材料の形態学的、誘電的および電気的特性に及ぼす影響が調べられた。誘電率、誘電損失、損失係数および電気係数の周波数依存性が、0.5kHz〜10MHzの周波数範囲で分析された。SEM顕微鏡写真では、高いPANI含有量(すなわち、20重量%)を有する複合材が、PAAマトリックス内に均一に分布した多数のナノスケールPANI粒子からなることを明らかにした。高誘電率は、PANI粒子の小さなコンデンサの合計に起因するものであった。この材料の欠点は、電場の増加に伴ってそのような事象が増加する確率で、電場の下でのパーコレーションおよび少なくとも1つの連続導電路の形成の可能性があることである。隣接する導電性PANI粒子を通る少なくとも1つの連続的な経路(トラック)がコンデンサの電極間に形成されると、そのコンデンサの破壊電圧を低下させる。 An in situ polymerization of aniline in an aqueous dispersion of polyacrylic acid (PAA) in the presence of dodecylbenzenesulfonate (DBSA) was used to synthesize a polyaniline ultrahigh dielectric constant complex PANI-DBSA / PAA (Chao- Hsien Hoa et al., “High Dielectric Polyaniline / Poly (Acrylic Acid) Composites Prepared by In Situ Polymerization”, Synthetic Metals 158 (2008), pages 630-637). Water-soluble PAA served as a polymeric stabilizer and protected the PANI particles from macroscopic aggregation. For complexes containing 30% PANI by weight, ca. A very high dielectric constant of 2.0 × 10 5 (at 1 kHz) was obtained. The effect of PANI content on the morphological, dielectric and electrical properties of the composite was investigated. The frequency dependence of dielectric constant, dielectric loss, loss factor and electrical coefficient was analyzed in the frequency range of 0.5 kHz to 10 MHz. SEM micrographs revealed that a composite with a high PANI content (ie 20% by weight) consists of a large number of nanoscale PANI particles evenly distributed within the PAA matrix. The high dielectric constant was attributed to the sum of small capacitors with PANI particles. The disadvantage of this material is the possibility of percolation under the electric field and the formation of at least one continuous conducting path with the probability that such events increase with increasing electric field. When at least one continuous path (track) through adjacent conductive PANI particles is formed between the electrodes of a capacitor, the breakdown voltage of that capacitor is reduced.

水溶性ポリマー、ポリ(N−ビニルピロリドン)[ポリ(1−ビニルピロリジン−2−オン)]で安定化されたコロイド状ポリアニリン粒子は、分散重合によって調製された。平均粒径241±50nmは、動的光散乱にて確定された(Jaroslav StejskalおよびIrina Sapurina、「ポリアニリン:薄膜およびコロイド分散(IUPAC Technical Report)」、Pure and Applied Chemistry、77巻、 No.5、第815−826ページ(2005)を参照)。   Colloidal polyaniline particles stabilized with a water-soluble polymer, poly (N-vinylpyrrolidone) [poly (1-vinylpyrrolidin-2-one)], were prepared by dispersion polymerization. The average particle size of 241 ± 50 nm was determined by dynamic light scattering (Jaroslav Stejskal and Irina Sapurina, “Polyaniline: Thin Film and Colloidal Dispersion”, Pure and Applied Chemistry, Vol. 77, No. 5). Pp. 815-826 (2005)).

ドープされたアニリンオリゴマーの単結晶は、単純な溶液に基づく自己組織化法を介して製造される(Yue Wangら、“ドーピングされたオリゴアニリン単結晶の階層的アセンブリを介した形態学的および次元的制御”、J.Am.Chem.Soc.、2012、134、第9251−9262ページ)。機械学についての詳細的な研究は、異なる形態および寸法の結晶を「ボトムアップ」階層アセンブリによって生成し、1次元(1−D)ナノファイバーような構造を高次構造に集約することができることを明らかにした。1−Dナノファイバーおよびナノワイヤ、2−Dナノリボンおよびナノシート、3−Dナノプレート、積み重ねシート、ナノフロア、多孔質ネットワーク、中空球およびねじれコイルを含む、多種多様な結晶ナノ構造を、結晶の制御およびドープされたオリゴマー間の非共有相互作用によって取得することができる。これらのナノスケールの結晶質は、その多量の対等物と比較して導電性が向上し、形状依存性の結晶性などの興味深い構造特性の関係も示される。さらに、吸収研究を介して、これらの構造の形態および寸法は、分子−溶媒相互作用を監視することによって、大幅に合理化および予測することができる。ドーピングされたテトラアニリンをモデルシステムとして用いて、この論文で提示された結果および戦略は、有機材料の形状およびサイズ制御の一般的なスキームについての示唆を提供する。   Single crystals of doped aniline oligomers are produced via a simple solution-based self-assembly method (Yue Wang et al., “Morphological and dimensionality via hierarchical assembly of doped oligoaniline single crystals. Control ", J. Am. Chem. Soc., 2012, 134, pages 9251-9262). Detailed studies on mechanics have shown that crystals of different forms and dimensions can be generated by “bottom-up” hierarchical assemblies, and structures like one-dimensional (1-D) nanofibers can be aggregated into higher order structures. Revealed. A wide variety of crystalline nanostructures, including 1-D nanofibers and nanowires, 2-D nanoribbons and nanosheets, 3-D nanoplates, stacked sheets, nanofloors, porous networks, hollow spheres and torsion coils, control crystals and It can be obtained by non-covalent interaction between the doped oligomers. These nanoscale crystals have improved electrical conductivity compared to their large counterparts and show interesting structural property relationships such as shape-dependent crystallinity. Furthermore, through absorption studies, the morphology and dimensions of these structures can be greatly rationalized and predicted by monitoring molecule-solvent interactions. Using doped tetraaniline as a model system, the results and strategies presented in this paper provide suggestions for a general scheme for organic material shape and size control.

多層構造に基づく公知のエネルギー蓄積装置(コンデンサ)が存在する。エネルギー蓄積デバイスは、第1および第2の電極と、遮断層および誘電体層を含む多層構造とを含む。第1遮断層は、第1電極と誘電体層との間に配置され、第2遮断層は、第2電極と誘電体層との間に配置される。第1および第2の阻止層の誘電率は、いずれも誘電体層の誘電率よりも独立して大きい。この装置の欠点は、電極と直接接触して位置する高誘電率の層を遮断することが、エネルギー蓄積装置の破壊を招く可能性があることである。複合材料をベースとし、分極粒子(PANI粒子など)を含む高誘電率の材料は、パーコレーション現象を示すことがある。形成された層の多結晶構造は、結晶間の境界に複数のもつれ化学結合を有する。高誘電率の材料が多結晶構造を有する場合には、結晶粒の境界に沿ってパーコレーションが生じることがある。公知の装置の別の欠点は、すべての層の真空蒸着である高価な製造手順である。   There are known energy storage devices (capacitors) based on multilayer structures. The energy storage device includes first and second electrodes and a multilayer structure including a barrier layer and a dielectric layer. The first blocking layer is disposed between the first electrode and the dielectric layer, and the second blocking layer is disposed between the second electrode and the dielectric layer. The dielectric constants of the first and second blocking layers are both independently greater than the dielectric constant of the dielectric layer. The disadvantage of this device is that blocking the high dielectric constant layer located in direct contact with the electrodes can lead to the destruction of the energy storage device. High dielectric constant materials based on composite materials and including polarized particles (such as PANI particles) may exhibit a percolation phenomenon. The polycrystalline structure of the formed layer has a plurality of entangled chemical bonds at the boundaries between the crystals. When a high dielectric constant material has a polycrystalline structure, percolation may occur along the boundaries of the crystal grains. Another disadvantage of the known apparatus is the expensive manufacturing procedure, which is the vacuum deposition of all layers.

エネルギー蓄積デバイスとしてのコンデンサは、電気化学的エネルギー蓄積に対して、周知の利点を有する。電池と比較して、コンデンサは、非常に高い電力密度、すなわち充電/再充電速度でエネルギーを蓄積することができ、劣化の少なく長い蓄積寿命を有し、数十万回または数百万回の充放電が可能である。しかし、コンデンサは、電池のように小さな体積または重量でエネルギーを貯蔵しないことが多く、エネルギー蓄積コストが低いので、電気自動車などの一部のアプリケーションではコンデンサが実用的ではない。したがって、体積および質量エネルギー蓄積密度が高く、コストが低いコンデンサを提供することは、エネルギー蓄積技術の進歩であり得る。   Capacitors as energy storage devices have well-known advantages over electrochemical energy storage. Compared to batteries, capacitors can store energy at a very high power density, i.e. charge / recharge rate, have a long storage life with little degradation, hundreds of thousands or millions of times Charging / discharging is possible. However, capacitors often do not store energy in a small volume or weight like batteries and have low energy storage costs, making capacitors impractical for some applications such as electric vehicles. Thus, providing capacitors with high volume and mass energy storage density and low cost can be an advance in energy storage technology.

本発明は、エネルギー蓄積デバイス(例えば、コンデンサ)およびその製造方法を提供する。本発明のエネルギー蓄積デバイスは、いくつかのエネルギー蓄積デバイスに関連する蓄積エネルギーの体積および質量密度のさらなる増加の問題を解決すると同時に、材料および製造プロセスのコストを削減することができる。   The present invention provides an energy storage device (eg, a capacitor) and a method of manufacturing the same. The energy storage device of the present invention can solve the problem of further increase in the volume and mass density of stored energy associated with some energy storage devices while simultaneously reducing the cost of materials and manufacturing processes.

一つの形態では、コンデンサは、第1の電極、第2の電極、および前記第1および第2の電極の間に配置された固体多層構造を含む。前記電極は平面であり、互いに平行に配置され、前記固体多層構造は、前記電極に平行に配置された層を含み、以下のシーケンスを有する:(A−B)−A。ここで、Aは絶縁層であり、Bは、絶縁体マトリックスにおける導電性ナノ粒子の微小分散を含む分極層であり、数m≧1である。ある場合では、mは、1、2、3、4、5、6、7、8、9、10、20、30、40、50、100、200、300、400、500、600またはそれ以上であり得る。いくつかの例において、mは、1〜1000、1〜100、または1〜50である。電極は、互いにほぼ平行であってもよく、または実質的に平行であってもよい。電極は、平行配置からオフセットすることができる。 In one form, the capacitor includes a first electrode, a second electrode, and a solid multilayer structure disposed between the first and second electrodes. The electrodes are planar and arranged parallel to each other, and the solid multilayer structure includes layers arranged parallel to the electrodes and has the following sequence: (AB) m -A. Here, A is an insulating layer, B is a polarization layer including fine dispersion of conductive nanoparticles in an insulator matrix, and several m ≧ 1. In some cases, m is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 20, 30, 40, 50, 100, 200, 300, 400, 500, 600 or more. possible. In some examples, m is 1-1000, 1-100, or 1-50. The electrodes may be substantially parallel to each other or substantially parallel. The electrodes can be offset from the parallel arrangement.

別の形態では、コンデンサの製造方法は、(a)電極の1つとして機能する導電性基板の準備、(b)固体多層構造の形成、および(c)多層構造上への第2の電極の形成を含み、多層構造の形成は、絶縁層および分極層の交互適用のステップまたは層の同時押出しのステップを含む。   In another form, a method of manufacturing a capacitor includes: (a) preparing a conductive substrate that functions as one of the electrodes; (b) forming a solid multilayer structure; and (c) forming a second electrode on the multilayer structure. Formation of the multi-layer structure, including formation, includes the step of alternating application of the insulating and polarization layers or the step of co-extrusion of the layers.

別の形態では、コンデンサの製造方法は、両方の電極上に絶縁層をコーティングするステップと、第2電極を多層構造に積層して電極の一方に多層構造をコーティングするステップとを含む。   In another form, a method of manufacturing a capacitor includes coating an insulating layer on both electrodes, and laminating a second electrode in a multilayer structure and coating one of the electrodes with the multilayer structure.

本発明のさらなる形態および利点は、本発明の例示的な実施形態のみが示され記載される以下の詳細な説明から、当業者に容易に明らかになるであろう。理解されるように、本発明は、他の異なる実施形態が可能であり、そのいくつかの詳細は、本発明から逸脱することなく様々な点で変更可能である。したがって、図面および説明は、本質的に例示的であり、限定的ではないとみなされるべきである。   Further aspects and advantages of the present invention will become readily apparent to those skilled in the art from the following detailed description, wherein only exemplary embodiments of the invention are shown and described. As will be realized, the invention is capable of other and different embodiments, and its several details are capable of modifications in various respects, without departing from the invention. Accordingly, the drawings and descriptions are to be regarded as illustrative in nature and not as restrictive.

参照による組み込み
個々の刊行物、特許、または特許出願が具体的かつ個別に参照により組み込まれると示されていると同様に、本明細書中に言及されるすべての刊行物、特許および特許出願は、参照により本明細書に援用される。
INCORPORATION BY REFERENCE All publications, patents and patent applications mentioned in this specification should be considered in the same manner as individual publications, patents or patent applications are specifically and individually indicated to be incorporated by reference. Which is incorporated herein by reference.

本発明の新規な特徴は、添付の特許請求の範囲に詳細に記載されている。本発明の特徴および利点のより良い理解は、本発明の原理が利用される例示的な実施形態を示す以下の詳細な説明および添付の図面を参照することによって得られるであろう。   The novel features of the invention are set forth with particularity in the appended claims. A better understanding of the features and advantages of the present invention will be obtained by reference to the following detailed description that sets forth illustrative embodiments, in which the principles of the invention are utilized, and the accompanying drawings of which:

本発明のいくつかの実施形態によるエネルギー蓄積デバイスを概略的に示す。1 schematically illustrates an energy storage device according to some embodiments of the invention. 本発明のいくつかの実施形態による別のエネルギー蓄積デバイスを概略的に示す。Fig. 3 schematically illustrates another energy storage device according to some embodiments of the invention.

本発明の様々な実施形態を本明細書に示し説明してきたが、当業者には、そのような実施形態は単なる例示として提供されていることが明らかであろう。本発明から逸脱することなく、多くの変形、変更、および置換が当業者に生じ得る。本明細書に記載された本発明の実施形態に対する様々な代替物を使用することができることを理解されたい。   While various embodiments of the invention have been shown and described herein, it will be apparent to those skilled in the art that such embodiments are provided by way of example only. Many variations, modifications and substitutions may occur to those skilled in the art without departing from the invention. It should be understood that various alternatives to the embodiments of the invention described herein can be used.

本発明は、コンデンサなどのエネルギー蓄積デバイスを提供する。本発明の一実施形態では、絶縁層は結晶質である。絶縁層は、単結晶材料、バッチ結晶材料、または非晶質材料を含む任意の適切な結晶材料から製造することができる。用途に応じて、絶縁誘電体材料の誘電率は広範囲にあり得る。絶縁層は、4eVより大きいバンドギャップ、および約0.001ボルト(V)/ナノメートル(nm)、0.01V/nm、0.05V/nm、0.1V/nm0.2V/nm、0.3V/nm、0.4V/nm、0.5V/nm、1V/nm、または10V/nmより大きい破壊電界強度によって特徴付けられる材料を含む。分極層の材料は、広範囲にあり得る誘電率εpolを有する。場合によっては、εpolは、少なくとも約100、200、300、400、500、1000、2000、3000、4000、5000、6000、7000、8000、9000、10000または100000である。 The present invention provides an energy storage device such as a capacitor. In one embodiment of the invention, the insulating layer is crystalline. The insulating layer can be made from any suitable crystalline material, including single crystal materials, batch crystal materials, or amorphous materials. Depending on the application, the dielectric constant of the insulating dielectric material can be in a wide range. The insulating layer has a band gap greater than 4 eV, and about 0.001 volts (V) / nanometer (nm), 0.01 V / nm, 0.05 V / nm, 0.1 V / nm 0.2 V / nm,. Includes materials characterized by breakdown field strengths greater than 3 V / nm, 0.4 V / nm, 0.5 V / nm, 1 V / nm, or 10 V / nm. The material of the polarization layer has a dielectric constant ε pol that can be in a wide range. In some cases, ε pol is at least about 100, 200, 300, 400, 500, 1000, 2000, 3000, 4000, 5000, 6000, 7000, 8000, 9000, 10,000 or 100,000.

本発明では、固体絶縁誘電体層は、使用される材料および製造手順に応じて、アモルファス層と結晶固体層との間の範囲において異なる構造を有することができる。開示されたコンデンサの一実施形態では、絶縁層は、酸化物、窒化物、酸窒化物およびフッ化物から選択される材料を含む。開示されたコンデンサの別の実施形態では、絶縁層は、SiO、HFO、AlまたはSiから選択される材料を含む。開示されるコンデンサの一実施形態では、絶縁層は、一般構造式I:

Figure 2017537464
式中、Corは共役π系を有する多環式有機化合物であり、Mは修飾官能基であり、nは修飾官能基の数で、1以上となる。本発明の別の実施形態では、多環式有機化合物は、オリゴフェニル、イミダゾール、ピラゾール、アセナフテン、トリアジン、インダントロン、およびそれらの混合物からなるリストから選択される。表1に示す構造1〜43から選択される一般構造式を有する。
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
In the present invention, the solid insulating dielectric layer can have a different structure in the range between the amorphous layer and the crystalline solid layer, depending on the materials used and the manufacturing procedure. In one embodiment of the disclosed capacitor, the insulating layer comprises a material selected from oxides, nitrides, oxynitrides and fluorides. In another embodiment of the disclosed capacitor, the insulating layer comprises a material selected from SiO 2 , HFO 2 , Al 2 O 3 or Si 3 N 4 . In one embodiment of the disclosed capacitor, the insulating layer has the general structural formula I:
Figure 2017537464
In the formula, Cor is a polycyclic organic compound having a conjugated π system, M is a modified functional group, and n is the number of modified functional groups, which is 1 or more. In another embodiment of the invention, the polycyclic organic compound is selected from the list consisting of oligophenyl, imidazole, pyrazole, acenaphthene, triazine, indanthrone, and mixtures thereof. It has a general structural formula selected from structures 1 to 43 shown in Table 1.
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464

本発明の別の実施形態において、修飾官能基は、アルキル、アリール、置換アルキル、置換アリール、およびそれらの任意の組み合わせを含むリストから選択される。修飾官能基は、製造段階での有機化合物の溶解性と、コンデンサの固体絶縁層のさらなる絶縁特性とを提供する。本発明のさらに別の実施形態では、絶縁層は、フッ素化アルキル、ポリエチレン、ケブラー、ポリ(フッ化ビニリデン−ヘキサフルオロプロピレン)、ポリプロピレン、フッ素化ポリプロピレン、ポリジメチルシロキサンを含むリストから選択されるポリマー材料を含む。本発明のさらに別の実施形態では、絶縁層は、表2に示す構造44〜49から選択される水溶性ポリマーに基づいて形成されたポリマー材料を含む。

Figure 2017537464
In another embodiment of the invention, the modified functional group is selected from a list comprising alkyl, aryl, substituted alkyl, substituted aryl, and any combination thereof. The modified functional group provides the solubility of the organic compound at the manufacturing stage and further insulating properties of the solid insulating layer of the capacitor. In yet another embodiment of the invention, the insulating layer is a polymer selected from the list comprising fluorinated alkyl, polyethylene, kevlar, poly (vinylidene fluoride-hexafluoropropylene), polypropylene, fluorinated polypropylene, polydimethylsiloxane. Contains materials. In yet another embodiment of the invention, the insulating layer comprises a polymeric material formed based on a water soluble polymer selected from structures 44-49 shown in Table 2.
Figure 2017537464

本発明の別の実施形態では、絶縁層は、表3に示す構造50〜55から選択される有機溶媒に可溶なポリマーに基づいて形成されたポリマー材料を含む。

Figure 2017537464
修飾官能基RおよびRは、アルキル、アリール、置換アルキル、置換アリール、およびそれらの任意の組み合わせを含むリストから独立して選択される。 In another embodiment of the invention, the insulating layer comprises a polymeric material formed based on a polymer soluble in an organic solvent selected from structures 50-55 shown in Table 3.
Figure 2017537464
The modified functional groups R 1 and R 2 are independently selected from the list comprising alkyl, aryl, substituted alkyl, substituted aryl, and any combination thereof.

本発明の一実施形態では、分極層は結晶質である。本発明の一実施形態では、分極層は、導電性オリゴマーのナノ粒子を含む。本発明の別の実施形態では、導電性オリゴマーの縦軸は、電極表面に対して主に垂直に向けられる。本発明の1つの実施形態において、導電性オリゴマーは、表4に示す構造式57〜63のうちの1つに対応する以下の構造式を含むリストから選択される。

Figure 2017537464
Figure 2017537464
ただし、X=2、3、4、5、6、7、8、9、10、11、12である。本発明のコンデンサの別の実施形態では、分極層は、低分子化合物の導電性ナノ粒子を含み、この導電性ナノ粒子は、分子量の導電性ポリマーである。本発明の別の実施形態において、低分子導電性ポリマーは、表4に与えられるような構造57〜63から選択される部分を含む。開示されるコンデンサの別の実施形態において、導電性オリゴマーは、置換基をさらに含み、一般構造式II:
Figure 2017537464
ここで、Rは置換基の集合であり、qは集合Rにおける置換基Rの数であり、qは0、1、2、3、4、5、6、7、8、9または10に等しいことができる。コンデンサの別の実施形態では、置換基Rは、アルキル、アリール、置換アルキル、置換アリール、およびそれらの任意の組み合わせを含むリストから独立して選択される。コンデンサのさらに別の実施形態では、絶縁体マトリックスの材料は、ポリ(アクリル酸)(PAA)、ポリ(N−ビニルピロリドン)(PVP)、ポリ(フッ化ビニリデン−ヘキサフルオロプロピレン)[P(VDF−HFP)]、エチレンプロピレンゴム(EPR)およびエチレンプロピレンジエンモノマー(EPDM)を含むエチレンプロピレンポリマー、およびジメチルジクロロシロキサン、ジメチルシランジオールおよびポリジメチルシロキサンなどのシリコーンゴム(PDMSO)を含む。これらの化合物は安定剤としても機能し、導電性ナノ粒子を巨視的凝集から保護する。開示されたエネルギー蓄積デバイスの電極は、Pt、Cu、Al、Ag、Au、Ti、W、Zn、Niまたは他の低融点合金を含むがこれらに限定されない任意の適切な材料から作製され得る。本発明の一形態では、絶縁層の厚さ(dins)と、分極層の厚さ(dpol)と、絶縁層の絶縁破壊電界強度Einsと、偏波層の絶縁破壊電界強度Epolとは、dins<dpol、およびEins>Epolという関係がある。 In one embodiment of the invention, the polarization layer is crystalline. In one embodiment of the present invention, the polarization layer comprises nanoparticles of conductive oligomers. In another embodiment of the invention, the longitudinal axis of the conductive oligomer is oriented primarily perpendicular to the electrode surface. In one embodiment of the invention, the conductive oligomer is selected from a list comprising the following structural formula corresponding to one of structural formulas 57-63 shown in Table 4.
Figure 2017537464
Figure 2017537464
However, X = 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12. In another embodiment of the capacitor of the present invention, the polarization layer comprises a low molecular weight compound conductive nanoparticle, which is a molecular weight conductive polymer. In another embodiment of the invention, the small molecule conductive polymer comprises a moiety selected from structures 57-63 as given in Table 4. In another embodiment of the disclosed capacitor, the conductive oligomer further comprises a substituent and has the general structure II:
Figure 2017537464
Where R q is a set of substituents, q is the number of substituents R in the set R q , and q is 0, 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10 Can be equal to In another embodiment of the capacitor, substituent R is independently selected from a list comprising alkyl, aryl, substituted alkyl, substituted aryl, and any combination thereof. In yet another embodiment of the capacitor, the insulator matrix material is poly (acrylic acid) (PAA), poly (N-vinylpyrrolidone) (PVP), poly (vinylidene fluoride-hexafluoropropylene) [P (VDF -HFP)], ethylene propylene polymers including ethylene propylene rubber (EPR) and ethylene propylene diene monomer (EPDM), and silicone rubbers (PDMSO) such as dimethyldichlorosiloxane, dimethylsilanediol and polydimethylsiloxane. These compounds also function as stabilizers and protect the conductive nanoparticles from macroscopic aggregation. The electrodes of the disclosed energy storage devices can be made from any suitable material including, but not limited to, Pt, Cu, Al, Ag, Au, Ti, W, Zn, Ni or other low melting point alloys. In one embodiment of the present invention, the thickness of the insulating layer (d ins ), the thickness of the polarization layer (d pol ), the dielectric breakdown field strength E ins of the insulation layer, and the dielectric breakdown field strength E pol of the polarization layer. And d ins <d pol and E ins > E pol .

本発明の別の実施形態では、電極は銅からなり、数mは1であり、絶縁層Aの誘電材料はポリエチレンであり、分極層Bの材料は微分散PANI−DBSA/PAAドデシルベンゼンスルホネート(DBSA)の存在下でのポリアクリル酸(PAA)の水性分散液中のアニリンの現場重合を用いて合成されたものであり、複合体中のPANI対PAAの比は20重量%絶縁層の厚さはdins=25nm、分極層の厚さdpol=10mmである。本発明のさらに別の実施形態では、電極は銅からなり、数mは1に等しく、絶縁層Aの誘電材料はポリエチレンであり、分極層Bの材料はポリ(N−ビニルピロリドン)(PVP)であり、絶縁層の厚さはdins=25nmであり、分極層の厚さdcond=50μmである。本発明の別の実施形態において、分極層は、ドデシルベンゼンスルホネート(DBSA)、ポリオキシエチレングリコールアルキルエーテル、ポリオキシプロピレングリコールアルキルエーテル、ポリオキシエチレングリコールオクチルフェノールエーテル、ポリオキシエチレングリコールソルビタンアルキルエステル、ソルビタンアルキルエステル、ドデシルジメチルアミンオキシドである。 In another embodiment of the present invention, the electrode is made of copper, the number m is 1, the dielectric material of the insulating layer A is polyethylene, and the material of the polarizing layer B is a finely dispersed PANI-DBSA / PAA dodecylbenzenesulfonate ( Synthesized using in situ polymerization of aniline in an aqueous dispersion of polyacrylic acid (PAA) in the presence of DBSA), the ratio of PANI to PAA in the composite was 20% by weight of insulating layer thickness The thickness is d ins = 25 nm, and the thickness of the polarization layer d pol = 10 mm. In yet another embodiment of the invention, the electrode is made of copper, the number m is equal to 1, the dielectric material of the insulating layer A is polyethylene, and the material of the polarizing layer B is poly (N-vinylpyrrolidone) (PVP). The thickness of the insulating layer is d ins = 25 nm, and the thickness of the polarization layer d cond = 50 μm. In another embodiment of the present invention, the polarizing layer comprises dodecylbenzene sulfonate (DBSA), polyoxyethylene glycol alkyl ether, polyoxypropylene glycol alkyl ether, polyoxyethylene glycol octyl phenol ether, polyoxyethylene glycol sorbitan alkyl ester, sorbitan. Alkyl ester, dodecyldimethylamine oxide.

また、本発明は、上記のコンデンサの製造方法を提供する。開示された方法の一実施形態では、多層構造の形成のステップ(b)は、絶縁材料の溶液の塗布と分極材料の溶液の塗布の交互のステップを含み、両方の塗布ステップの後には、乾燥させて固体絶縁層および分極層を形成するステップを有し、多層構造の形成が完了するまで前記の交互のステップが繰り返され、最初の層および最後の層が電極に直接接触するように絶縁層が形成される。開示された方法の別の実施形態では、多層構造の形成のステップ(b)は、絶縁材料の溶融物の塗布と分極材料の溶融物の塗布の交互のステップを含み、両方の塗布工程の後には、冷却して固体の絶縁層および分極層を形成するステップを有し、多層構造の形成が完了するまで前記の交互のステップが繰り返され、最初の層および最後の層が電極と直接接触するように絶縁層が形成される。開示された方法のさらに別の実施形態では、固体多層構造を形成するステップ(b)は、交互の分極材料および絶縁性誘電材料を連続して含む層のセットを基板上に共押出しするステップを含み、その後には、乾燥させて固体多層構造を形成するステップを有する。開示された方法のさらに別の実施形態では、前記の固体多層構造を形成するステップは、分極材料と絶縁性誘電材料との交互溶融物を連続的に含む層のセットを共押出するステップを含み、その後には、冷却して固体の多層構造を形成するステップを有する。また、本発明は、(d)両電極上に絶縁層を被覆するステップと、(e)一方の電極上に多層構造を被覆して第2の電極を多層構造に被覆するステップとを含む、上記のコンデンサの製造方法を提供する。   The present invention also provides a method for manufacturing the above capacitor. In one embodiment of the disclosed method, step (b) of forming the multilayer structure comprises alternating steps of applying a solution of insulating material and applying a solution of polarizing material, and after both application steps, drying Forming a solid insulating layer and a polarizing layer, and the alternating steps are repeated until the formation of the multilayer structure is completed, so that the first layer and the last layer are in direct contact with the electrode. Is formed. In another embodiment of the disclosed method, the step (b) of forming the multilayer structure comprises alternating steps of applying a melt of insulating material and applying a melt of polarizing material, after both application steps. Has a step of cooling to form a solid insulating layer and a polarizing layer, and the alternating steps described above are repeated until the formation of the multilayer structure is complete, with the first and last layers in direct contact with the electrode Thus, an insulating layer is formed. In yet another embodiment of the disclosed method, the step (b) of forming a solid multilayer structure comprises co-extruding onto the substrate a set of layers comprising successive alternating polarization materials and insulating dielectric materials. Including, and thereafter, drying to form a solid multilayer structure. In yet another embodiment of the disclosed method, forming the solid multilayer structure includes coextruding a set of layers that continuously comprise alternating melts of polarizing and insulating dielectric materials. Thereafter, it has a step of cooling to form a solid multilayer structure. Further, the present invention includes (d) a step of coating an insulating layer on both electrodes, and (e) a step of coating a multilayer structure on one electrode and coating a second electrode on the multilayer structure. A method for manufacturing the above capacitor is provided.

実施例1
図2は、電極1および2と、分極層(5)で分離された絶縁誘電体(3および4)の2つの絶縁層を含む固体多層構造を含む開示されたエネルギー蓄積デバイスの実施形態を示す。本発明のこの実施形態では、ドデシルベンゼンスルホネート(DBSA)の存在下でのポリアクリル酸(PAA)の水性分散液中のアニリンの現場重合を用いて合成された、ポリアニリンとPANI−DBSA/PAAとの複合体が分極層の材質、ポリエチレンなどが絶縁性誘電体材料としてそれぞれ用いられる。絶縁層の厚さdinsは2.5nmである。電極10および11は銅からなる。ポリエチレンの誘電率は2.2に等しい(すなわち、εins= 2.2)。ポリアニリンとPANI−DBSA/PAAとの複合体は、誘電率εpolが100000であり、分子伝導性を有する導電層の厚さがdpol=1.0mmである。
Example 1
FIG. 2 shows an embodiment of the disclosed energy storage device comprising a solid multilayer structure comprising electrodes 1 and 2 and two insulating layers of insulating dielectric (3 and 4) separated by a polarizing layer (5). . In this embodiment of the invention, polyaniline and PANI-DBSA / PAA synthesized using in situ polymerization of aniline in an aqueous dispersion of polyacrylic acid (PAA) in the presence of dodecylbenzenesulfonate (DBSA) These composites are used as the material for the polarization layer, and polyethylene is used as the insulating dielectric material. The thickness d ins of the insulating layer is 2.5 nm. The electrodes 10 and 11 are made of copper. The dielectric constant of polyethylene is equal to 2.2 (ie, ε ins = 2.2). The complex of polyaniline and PANI-DBSA / PAA has a dielectric constant ε pol of 100,000, and the thickness of the conductive layer having molecular conductivity is d pol = 1.0 mm.

実施例2
図3は、電極6および7と、交互の絶縁層および分極層を含む固体多層構造を含む開示されたエネルギー蓄積デバイスの実施形態を示し、絶縁誘電材料(11、12、13、14)の層は分極層(8、9、10)で分離される。本発明のこの実施形態では、分極層の材料としてPANI−DBSA/PAA複合材料を使用し、絶縁誘電材料としてポリエチレンを使用する。絶縁層の厚さ=2.5〜1000nm。電極6および7は銅で作られている。ポリエチレンの誘電率は2.2(すなわち、εins=2.2)であり、絶縁破壊電圧Vbd=1ミリメートルの厚さで40キロボルトである。一実施形態では、分極層の材料は、100000に等しい誘電率εpolを有するポリアニリン(PANI)/ポリ(アクリル酸)(PAA)複合材料である。この例では、分極層の厚さdpol=1.0〜5.0mmである。
Example 2
FIG. 3 shows an embodiment of the disclosed energy storage device comprising electrodes 6 and 7 and a solid multilayer structure comprising alternating insulating and polarizing layers, wherein the layers of insulating dielectric material (11, 12, 13, 14) Are separated by polarization layers (8, 9, 10). In this embodiment of the present invention, a PANI-DBSA / PAA composite material is used as the material of the polarization layer, and polyethylene is used as the insulating dielectric material. Insulating layer thickness = 2.5-1000 nm. Electrodes 6 and 7 are made of copper. The dielectric constant of polyethylene is 2.2 (ie, ε ins = 2.2), and the dielectric breakdown voltage V bd = 1 millimeter is 40 kilovolts thick. In one embodiment, the material of the polarization layer is a polyaniline (PANI) / poly (acrylic acid) (PAA) composite material having a dielectric constant ε pol equal to 100,000. In this example, the polarization layer thickness d pol = 1.0 to 5.0 mm.

本発明を特定の好ましい実施形態を参照して詳細に説明してきたが、当業者であれば、特許請求の範囲の趣旨および範囲から逸脱することなく、様々な修正および改良がなされることができる。   Although the present invention has been described in detail with reference to certain preferred embodiments, various modifications and improvements can be made by those skilled in the art without departing from the spirit and scope of the claims. .

本発明の好ましい実施形態が本明細書に示され説明されてきたが、そのような実施形態が単なる例示として提供されることは、当業者には明らかであろう。本発明から逸脱することなく、当業者には数多くの変形、変更、および置換が可能である。本明細書に記載された本発明の実施形態に対する様々な代替物が、本発明の実施において採用され得ることを理解されたい。以下の特許請求の範囲は、本発明の範囲を定義し、これらの特許請求の範囲内の方法および構造およびそれらの均等物がそれによってカバーされることが意図される。   While preferred embodiments of the present invention have been shown and described herein, it will be apparent to those skilled in the art that such embodiments are provided by way of example only. Numerous variations, changes, and substitutions can be made by those skilled in the art without departing from the invention. It should be understood that various alternatives to the embodiments of the invention described herein can be employed in the practice of the invention. The following claims define the scope of the invention and are intended to cover the methods and structures within these claims and their equivalents.

Figure 2017537464
Figure 2017537464

Figure 2017537464
Figure 2017537464

Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464

Claims (31)

第1の電極と、
第2の電極と、
前記第1の電極と前記第2の電極との間に配置された固体多層構造と、
を有し、
前記固体多層構造は、前記第1および第2の電極と接触しており、前記電極に平行に配置された層を含み、前記固体多層構造は、前記層(A−B)−Aのシーケンスを有し、ただし、Aは絶縁層であり、Bは絶縁体マトリックス中に導電性ナノ粒子の微小分散体を有するコロイド状複合体を含有する分極層であり、mは1以上の数であり、
Aは1ナノメートル(nm)当たり少なくとも約0.05ボルト(V)の破壊電圧を有し、
Bは少なくとも約100の誘電率を有する
ことを特徴とするコンデンサ。
A first electrode;
A second electrode;
A solid multilayer structure disposed between the first electrode and the second electrode;
Have
The solid multilayer structure is in contact with the first and second electrodes and includes a layer disposed parallel to the electrode, the solid multilayer structure comprising a sequence of the layers (AB) m -A Where A is an insulating layer, B is a polarization layer containing a colloidal composite having a fine dispersion of conductive nanoparticles in an insulator matrix, and m is a number of 1 or more. ,
A has a breakdown voltage of at least about 0.05 volts (V) per nanometer (nm);
A capacitor wherein B has a dielectric constant of at least about 100.
前記絶縁層の少なくとも一つが結晶質であることを特徴とする請求項1に記載のコンデンサ。   The capacitor according to claim 1, wherein at least one of the insulating layers is crystalline. Aが少なくとも約0.5V/nmの破壊電圧を有する、請求項1に記載のコンデンサ。   The capacitor of claim 1, wherein A has a breakdown voltage of at least about 0.5 V / nm. 前記絶縁層の少なくとも1つが、酸化物、窒化物、酸窒化物およびフッ化物から選択される材料を含む、請求項1に記載のコンデンサ。   The capacitor of claim 1, wherein at least one of the insulating layers comprises a material selected from oxides, nitrides, oxynitrides, and fluorides. 前記絶縁層の少なくとも1つは、SiO、HFO、Al、およびSiから選択される材料を含む、請求項4に記載のコンデンサ。 The capacitor of claim 4, wherein at least one of the insulating layers comprises a material selected from SiO 2 , HFO 2 , Al 2 O 3 , and Si 3 N 4 . 前記絶縁層の少なくとも1つが、一般構造式Iの改質有機化合物を含み、
Figure 2017537464
Corは多環式有機化合物であり、各Mは独立して修飾官能基であり、nは修飾官能基の数であり、0以上である請求項1に記載のコンデンサ。
At least one of the insulating layers comprises a modified organic compound of general structural formula I;
Figure 2017537464
The capacitor according to claim 1, wherein Cor is a polycyclic organic compound, each M is independently a modified functional group, n is the number of modified functional groups, and is 0 or more.
前記多環式有機化合物は、オリゴフェニル、イミダゾール、ピラゾール、アセナフテン、トリアジン、インダントロン、および構造1〜43から選択される、請求項6に記載のコンデンサ。
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
The capacitor of claim 6, wherein the polycyclic organic compound is selected from oligophenyl, imidazole, pyrazole, acenaphthene, triazine, indanthrone, and structures 1-43.
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
Figure 2017537464
前記修飾官能基が、アルキル、アリール、置換アルキル、および置換アリールから選択される、請求項6または7に記載のコンデンサ。   The capacitor of claim 6 or 7, wherein the modified functional group is selected from alkyl, aryl, substituted alkyl, and substituted aryl. 前記絶縁層の少なくとも1つが、フッ素化アルキル、ポリエチレン、ケブラー、ポリ(フッ化ビニリデン−ヘキサフルオロプロピレン)、ポリプロピレン、フッ素化ポリプロピレン、およびポリジメチルシロキサンから選択される化合物を含む、請求項1に記載のコンデンサ。   The at least one of the insulating layers comprises a compound selected from fluorinated alkyl, polyethylene, Kevlar, poly (vinylidene fluoride-hexafluoropropylene), polypropylene, fluorinated polypropylene, and polydimethylsiloxane. Capacitor. 前記絶縁層の少なくとも1つが、構造44〜49から選択される構造を有する材料を含む、請求項1に記載のコンデンサ。
Figure 2017537464
The capacitor of claim 1, wherein at least one of the insulating layers comprises a material having a structure selected from structures 44-49.
Figure 2017537464
前記絶縁層の少なくとも1つは、構造50〜55から選択される構造を有する材料を含み、
Figure 2017537464
各RおよびRは、アルキル、アリール、置換アルキル、および置換アリールから独立して選択される請求項1に記載のコンデンサ。
At least one of the insulating layers comprises a material having a structure selected from structures 50-55;
Figure 2017537464
The capacitor of claim 1, wherein each R 1 and R 2 is independently selected from alkyl, aryl, substituted alkyl, and substituted aryl.
前記分極層の少なくとも1つが結晶性である、請求項1に記載のコンデンサ。   The capacitor of claim 1, wherein at least one of the polarization layers is crystalline. 前記導電性ナノ粒子が、導電性オリゴマーを含む、請求項1に記載のコンデンサ。   The capacitor according to claim 1, wherein the conductive nanoparticles include a conductive oligomer. 前記導電性オリゴマーの長手方向軸が、電極表面に対して垂直に向けられている、請求項13に記載のコンデンサ。   The capacitor of claim 13, wherein the longitudinal axis of the conductive oligomer is oriented perpendicular to the electrode surface. 前記導電性オリゴマーは、構造式57〜63のいずれかであり、
Figure 2017537464
Figure 2017537464
X=2、3、4、5、6、7、8、9、10、11または12であることを特徴とする請求項13に記載のコンデンサ。
The conductive oligomer is any one of structural formulas 57 to 63,
Figure 2017537464
Figure 2017537464
The capacitor according to claim 13, wherein X = 2, 3, 4, 5, 6, 7, 8, 9, 10, 11 or 12.
前記導電性ナノ粒子が、低分子量導電性ポリマーを含む、請求項1に記載のコンデンサ。   The capacitor of claim 1, wherein the conductive nanoparticles comprise a low molecular weight conductive polymer. 前記低分子量導電性高分子が、構造式57〜63のいずれかに対応するモノマーを含み、
Figure 2017537464
Figure 2017537464
ここで、X=2、3、4、5、6、7、8、9、10、11または12であることを特徴とする請求項16に記載のコンデンサ。
The low molecular weight conductive polymer comprises a monomer corresponding to any one of structural formulas 57 to 63;
Figure 2017537464
Figure 2017537464
The capacitor according to claim 16, wherein X = 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12.
前記導電性オリゴマーが、次の式で表され、
Figure 2017537464
は置換基であり、qは0以上の数であることを特徴とする請求項13に記載のコンデンサ。
The conductive oligomer is represented by the following formula:
Figure 2017537464
The capacitor according to claim 13, wherein R q is a substituent, and q is a number of 0 or more.
各Rが、独立して、アルキル、アリール、置換アルキル、または置換アリールである、ことを特徴とする請求項18に記載のコンデンサ。   The capacitor of claim 18, wherein each R is independently alkyl, aryl, substituted alkyl, or substituted aryl. 前記絶縁体マトリックスの材料が、ポリ(アクリル酸)(PAA)、ポリ(N−ビニルピロリドン)(PVP)、ポリ(フッ化ビニリデン‐ヘキサフルオロプロピレン)[P(VDF−HFP)]、エチレンプロピレンゴム(EPR)およびエチレンプロピレンジエンモノマー(EPDM)を含むエチレンプロピレンポリマー、およびジメチルジクロロシロキサン、ジメチルシランジオールおよびポリジメチルシロキサンなどのシリコーンゴム(PDMSO)から選択されることを特徴とする請求項1に記載のコンデンサ。   The insulator matrix material is poly (acrylic acid) (PAA), poly (N-vinylpyrrolidone) (PVP), poly (vinylidene fluoride-hexafluoropropylene) [P (VDF-HFP)], ethylene propylene rubber 2. The ethylene propylene polymer comprising (EPR) and ethylene propylene diene monomer (EPDM), and silicone rubber (PDMSO) such as dimethyldichlorosiloxane, dimethylsilanediol and polydimethylsiloxane. Capacitor. 前記電極の少なくとも1つが、Pt、Cu、Al、Ag、Au、Ti、W、Zn、Niまたは低融点合金を含む、ことを特徴とする請求項1に記載のコンデンサ。   The capacitor according to claim 1, wherein at least one of the electrodes includes Pt, Cu, Al, Ag, Au, Ti, W, Zn, Ni, or a low melting point alloy. 前記絶縁層の厚み(dins)と前記分極層の厚み(dpol)と前記絶縁層の破壊電界強度Einsと前記分極層Epolの絶縁破壊電界強度との関係が、dins<dpol、およびEins>Epolであることを特徴とする請求項1に記載のコンデンサ。 The relationship among the thickness of the insulating layer (d ins ), the thickness of the polarizing layer (d pol ), the breakdown electric field strength E ins of the insulating layer, and the dielectric breakdown electric field strength of the polarizing layer E pol is expressed as d ins <d pol. And the capacitor of claim 1, wherein E ins > E pol . 電極が銅を含み、mが1以上であり、絶縁層Aの誘電材料がポリエチレンであり、分極層Bの材料が、微分散PANI−DBSA/PAAであり、前記複合層におけるPAAに対するPANIの比が約20重量%以上であり、前記絶縁層の厚さ(dins)が少なくとも約2.5nmであり、前記分極層の厚さ(dpol)が少なくとも約1.0mmであることを特徴とする請求項1に記載のコンデンサ。 The electrode contains copper, m is 1 or more, the dielectric material of the insulating layer A is polyethylene, the material of the polarization layer B is finely dispersed PANI-DBSA / PAA, and the ratio of PANI to PAA in the composite layer Is about 20% by weight or more, the insulating layer has a thickness (d ins ) of at least about 2.5 nm, and the polarizing layer has a thickness (d pol ) of at least about 1.0 mm. The capacitor according to claim 1. 前記電極が銅を含み、mが1以上であり、前記絶縁層Aの誘電材料がポリエチレンであり、前記分極層Bの材料が、ポリ(N−ビニルピロリドン)(PVP)で安定化されたコロイドPANI分散体であり、絶縁層の厚さ(dins)が2.5〜1000nm、分極層の厚さ(dcond)が10〜50μmである。 Colloid in which the electrode contains copper, m is 1 or more, the dielectric material of the insulating layer A is polyethylene, and the material of the polarizing layer B is stabilized by poly (N-vinylpyrrolidone) (PVP) It is a PANI dispersion, and the thickness (d ins ) of the insulating layer is 2.5 to 1000 nm, and the thickness (d cond ) of the polarization layer is 10 to 50 μm. 前記分極層が、ドデシルベンゼンスルホネート(DBSA)、ポリオキシエチレングリコールアルキルエーテル、ポリオキシプロピレングリコールアルキルエーテル、ポリオキシエチレングリコールオクチルフェノールエーテル、ポリオキシエチレングリコールソルビタンアルキルエステル、ソルビタンアルキルエステル、およびドデシルジメチルアミン酸化物から選択される界面活性剤を含む、ことを特徴とする請求項1に記載のコンデンサ。   The polarizing layer comprises dodecyl benzene sulfonate (DBSA), polyoxyethylene glycol alkyl ether, polyoxypropylene glycol alkyl ether, polyoxyethylene glycol octyl phenol ether, polyoxyethylene glycol sorbitan alkyl ester, sorbitan alkyl ester, and dodecyldimethylamine oxidation. The capacitor according to claim 1, further comprising a surfactant selected from an object. コンデンサの製造方法であって、
a)第1の電極として機能する導電性基板を準備するステップと、
b)前記第1の電極に隣接して固体多層構造を形成するステップと、
c)多層構造に隣接する第2の電極を形成するステップとを有し、
ただし、多層構造の形成ステップは、絶縁層および分極層の適用の交互操作または絶縁層および分極層の同時押出し操作を含み、個々の絶縁層は、ナノメートル(nm)当たり少なくとも約0.05ボルトの誘電率を有し、個々の分極層は、少なくとも約100の誘電率を有することを特徴とするコンデンサの製造方法。
A method for manufacturing a capacitor, comprising:
a) providing a conductive substrate that functions as a first electrode;
b) forming a solid multilayer structure adjacent to the first electrode;
c) forming a second electrode adjacent to the multilayer structure;
However, the step of forming the multilayer structure includes alternating operations of applying insulating layers and polarizing layers or co-extrusion operations of insulating layers and polarizing layers, wherein each insulating layer is at least about 0.05 volts per nanometer (nm) And the individual polarization layers have a dielectric constant of at least about 100.
前記固体多層構造を形成するステップが、絶縁材料の溶液の塗布と分極材料の溶液の塗布との交互の操作を含み、前記両方の塗布操作の後に乾燥させて固体絶縁層および分極層を形成するステップを含み、交互操作は、多層構造の形成が完了するまで繰り返され、絶縁層は、最初の層および最後の層が電極と直接接触するように形成されることを特徴とする請求項26に記載の方法。   The step of forming the solid multilayer structure includes an alternating operation of applying a solution of an insulating material and applying a solution of a polarizing material, and drying both of the applying operations to form a solid insulating layer and a polarizing layer. 27. The method of claim 26, comprising alternating steps, wherein the alternating operation is repeated until formation of the multilayer structure is complete, and the insulating layer is formed such that the first and last layers are in direct contact with the electrode. The method described. 前記固体多層構造を形成するステップが、絶縁材料の溶融物の塗布と分極材料の溶融物の塗布との交互の操作を含み、前記両方の塗布操作の後に、冷却させて固体絶縁層および分極層を形成するステップを含み、交互動作は、多層構造の形成が完了するまで繰り返され、絶縁層は、最初の層および最後の層が電極と直接接触するように形成されることを特徴とする請求項26に記載の方法。   The step of forming the solid multilayer structure includes alternating operations of applying a melt of insulating material and applying a melt of polarizing material, and after both applying operations, the solid insulating layer and the polarizing layer are cooled. The alternating operation is repeated until the formation of the multilayer structure is completed, and the insulating layer is formed such that the first layer and the last layer are in direct contact with the electrode. Item 27. The method according to Item 26. 前記固体多層構造を形成するステップが、交互の分極材料および絶縁誘電材料を連続的に含む前記層の少なくとも1つのセットを基板上に共押出しした後、乾燥させて前記固体多層構造を形成するステップを含む、ことを特徴とする請求項26に記載の方法。   Forming the solid multilayer structure comprises co-extruding onto the substrate at least one set of the layers sequentially comprising alternating polarization materials and insulating dielectric materials and then drying to form the solid multilayer structure 27. The method of claim 26, comprising: 前記固体多層構造を形成するステップが、分極材料と絶縁誘電材料との交互の溶融物を連続的に含む前記層のセットの共押出しした後に、冷却させて前記固体多層構造を形成するステップを含む、ことを特徴とする請求項26に記載の方法。   The step of forming the solid multilayer structure includes the step of coextruding the set of layers comprising an alternating melt of polarization material and insulating dielectric material, followed by cooling to form the solid multilayer structure. 27. The method of claim 26, wherein: コンデンサの製造方法であって、
a)第1および第2の電極上に絶縁層をコーティングするステップと、
b)第1および第2の電極の一方の絶縁層上に多層構造をコーティングし、第1および第2の電極の他方を多層構造に積層し、
個々の絶縁層は少なくとも約0.05ボルト/ナノメートル(nm)の破壊電圧を有し、多層構造は少なくとも約100の誘電率を有する分極層を含むことを特徴とするコンデンサの製造方法。
A method for manufacturing a capacitor, comprising:
a) coating an insulating layer on the first and second electrodes;
b) coating a multilayer structure on one insulating layer of the first and second electrodes, laminating the other of the first and second electrodes in the multilayer structure,
A method of manufacturing a capacitor, wherein each insulating layer has a breakdown voltage of at least about 0.05 volts / nanometer (nm) and the multilayer structure includes a polarizing layer having a dielectric constant of at least about 100.
JP2017519933A 2014-11-04 2015-11-03 Energy storage device and method of manufacturing the same Active JP6668341B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201462075145P 2014-11-04 2014-11-04
US62/075,145 2014-11-04
PCT/US2015/058890 WO2016073522A1 (en) 2014-11-04 2015-11-03 Energy storage devices and methods of production thereof

Publications (2)

Publication Number Publication Date
JP2017537464A true JP2017537464A (en) 2017-12-14
JP6668341B2 JP6668341B2 (en) 2020-03-18

Family

ID=55909720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017519933A Active JP6668341B2 (en) 2014-11-04 2015-11-03 Energy storage device and method of manufacturing the same

Country Status (12)

Country Link
US (1) US9916931B2 (en)
EP (1) EP3216037B1 (en)
JP (1) JP6668341B2 (en)
KR (1) KR102461254B1 (en)
CN (1) CN107592939B (en)
AU (1) AU2015343211A1 (en)
BR (1) BR112017008912A2 (en)
CA (1) CA2965870C (en)
MX (1) MX2017005427A (en)
RU (1) RU2017112074A (en)
SG (1) SG11201703441YA (en)
WO (1) WO2016073522A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018230222A1 (en) * 2017-06-12 2020-03-19 Jsr株式会社 Composition, liquid crystal alignment film, retardation plate, polarizing plate, method for manufacturing alignment film, and liquid crystal element

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10319523B2 (en) 2014-05-12 2019-06-11 Capacitor Sciences Incorporated Yanli dielectric materials and capacitor thereof
US10340082B2 (en) 2015-05-12 2019-07-02 Capacitor Sciences Incorporated Capacitor and method of production thereof
TW201618140A (en) 2014-05-12 2016-05-16 柯帕瑟特科學有限責任公司 Energy storage device and method of production thereof
US10347423B2 (en) 2014-05-12 2019-07-09 Capacitor Sciences Incorporated Solid multilayer structure as semiproduct for meta-capacitor
US20170301477A1 (en) 2016-04-04 2017-10-19 Capacitor Sciences Incorporated Electro-polarizable compound and capacitor
KR102461254B1 (en) 2014-11-04 2022-10-31 캐패시터 사이언시스 인코포레이티드 Energy storage devices and methods of production thereof
SG11201706689QA (en) 2015-02-26 2017-09-28 Capacitor Sciences Inc Self-healing capacitor and methods of production thereof
US9932358B2 (en) 2015-05-21 2018-04-03 Capacitor Science Incorporated Energy storage molecular material, crystal dielectric layer and capacitor
US9941051B2 (en) 2015-06-26 2018-04-10 Capactor Sciences Incorporated Coiled capacitor
US10026553B2 (en) 2015-10-21 2018-07-17 Capacitor Sciences Incorporated Organic compound, crystal dielectric layer and capacitor
US10600574B2 (en) 2015-10-21 2020-03-24 Capacitor Sciences Incorporated Organic compound, crystal dielectric layer and capacitor
US10305295B2 (en) 2016-02-12 2019-05-28 Capacitor Sciences Incorporated Energy storage cell, capacitive energy storage module, and capacitive energy storage system
US10636575B2 (en) 2016-02-12 2020-04-28 Capacitor Sciences Incorporated Furuta and para-Furuta polymer formulations and capacitors
US10153087B2 (en) 2016-04-04 2018-12-11 Capacitor Sciences Incorporated Electro-polarizable compound and capacitor
US9978517B2 (en) 2016-04-04 2018-05-22 Capacitor Sciences Incorporated Electro-polarizable compound and capacitor
US10566138B2 (en) 2016-04-04 2020-02-18 Capacitor Sciences Incorporated Hein electro-polarizable compound and capacitor thereof
US11092142B2 (en) * 2017-11-20 2021-08-17 Capacitor Sciences Incorporated Plasma electric propulsion device
CN106098271A (en) * 2016-06-20 2016-11-09 河南省亚安绝缘材料厂有限公司 A kind of insulant
FR3057100A1 (en) 2016-10-03 2018-04-06 Blue Solutions HIGH CAPACITY FILM CAPACITOR AND METHOD FOR MANUFACTURING THE SAME
US10395841B2 (en) 2016-12-02 2019-08-27 Capacitor Sciences Incorporated Multilayered electrode and film energy storage device
US10163575B1 (en) 2017-11-07 2018-12-25 Capacitor Sciences Incorporated Non-linear capacitor and energy storage device comprising thereof
US10403435B2 (en) * 2017-12-15 2019-09-03 Capacitor Sciences Incorporated Edder compound and capacitor thereof
JP6529675B1 (en) * 2018-01-19 2019-06-12 三菱電機株式会社 Thin layer capacitor and method of manufacturing thin layer capacitor
DE102020107286A1 (en) * 2019-03-28 2020-10-01 Taiyo Yuden Co., Ltd. Multi-layer ceramic capacitor and method for its manufacture

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5742471A (en) * 1996-11-25 1998-04-21 The Regents Of The University Of California Nanostructure multilayer dielectric materials for capacitors and insulators
JPH11297332A (en) * 1998-04-13 1999-10-29 Tdk Corp Current collector and sheet type electrochemical element using the same
JP2005509283A (en) * 2001-11-03 2005-04-07 ハー ツェー シュタルク インコーポレイテッド Thin film capacitor using conductive polymer
JP2006523384A (en) * 2003-03-05 2006-10-12 ダフ, ウィリアム ビー. ジュニア Charge storage device with enhanced power characteristics
US20110110015A1 (en) * 2007-04-11 2011-05-12 The Penn State Research Foundation Methods to improve the efficiency and reduce the energy losses in high energy density capacitor films and articles comprising the same

Family Cites Families (163)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB323148A (en) 1929-02-12 1929-12-24 Charles Yeomans Hopkins Improvements in hinges
GB547853A (en) 1941-03-12 1942-09-15 Norman Hulton Haddock New perylene derivatives
US3407394A (en) 1964-10-23 1968-10-22 Xerox Corp Selenium trapping memory
GB2084585B (en) 1980-09-25 1983-11-30 Dearborn Chemicals Ltd The preparation of high molecular weight hydrophilic polymer gels
DE3401338A1 (en) 1984-01-17 1985-07-25 Merck Patent Gmbh, 6100 Darmstadt LIQUID CRYSTAL PHASE
US4694377A (en) 1986-05-28 1987-09-15 Aerovox Incorporated Segmented capacitor
EP0268354A3 (en) 1986-10-07 1988-06-15 Imperial Chemical Industries Plc Substituted pyrazoline
DE3904797A1 (en) 1989-02-17 1990-08-30 Merck Patent Gmbh NONLINEAR OPTICAL MATERIALS WITH VICINAL DONOR AND ACCEPTANCE GROUPS
DE3926563A1 (en) 1989-08-11 1991-02-14 Hoechst Ag PERYLENE COMPOUNDS CONTAINING SULPHONIC ACID, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE
JP2786298B2 (en) 1990-03-02 1998-08-13 株式会社日立製作所 Film capacitor and method of manufacturing the same
US6294593B1 (en) 1990-12-07 2001-09-25 University Of Massachusetts Lowell Method and crosslinkable polymers for forming crosslinked second order nonlinear optical polymers
US5514799A (en) 1993-08-02 1996-05-07 Enichem S.P.A. 1,1-vinyl substituted nonlinear optical materials
US5395556A (en) 1990-12-12 1995-03-07 Enichem S.P.A. Tricyanovinyl substitution process for NLO polymers
ES2153357T3 (en) 1991-03-01 2001-03-01 Univ Florida USE OF NICOTINAL ANALOGS FOR THE TREATMENT OF DEGENERATIVE DISEASES OF THE NERVOUS SYSTEM.
JP3362865B2 (en) 1991-03-21 2003-01-07 クラリアント・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Internal salt of perylene compound, production method thereof and use thereof
JP2741804B2 (en) 1991-06-14 1998-04-22 松下電器産業株式会社 Capacitor and manufacturing method thereof
EP0585999A1 (en) 1992-08-14 1994-03-09 ENICHEM S.p.A. Functional heteroaromatics for NLO applications
US5384521A (en) 1992-09-25 1995-01-24 Coe; Carlos J. Power capacitor powertrain
US5312896A (en) 1992-10-09 1994-05-17 Sri International Metal ion porphyrin-containing poly(imide)
EP0602654A1 (en) 1992-12-18 1994-06-22 ENICHEM S.p.A. Efficient electron-donating groups for nonlinear optical applictions
FR2713387B1 (en) 1993-11-30 1996-01-12 Merlin Gerin Power condenser.
US6501093B1 (en) 1994-04-04 2002-12-31 Alvin M. Marks Quantum energy storage or retrieval device
US5679763A (en) 1995-02-24 1997-10-21 Enichem S.P.A. Polyquinoline-based nonlinear optical materials
US5583359A (en) 1995-03-03 1996-12-10 Northern Telecom Limited Capacitor structure for an integrated circuit
EP0791849A1 (en) 1996-02-26 1997-08-27 ENICHEM S.p.A. Non-linear optical compounds
JP3637163B2 (en) 1996-10-01 2005-04-13 本田技研工業株式会社 Energy storage power supply
FR2760911B1 (en) 1997-03-13 1999-05-07 Renault POWER SUPPLY DEVICE WITH ACCUMULATOR BATTERY AND SUPERCAPACITOR
US6555027B2 (en) 1998-07-27 2003-04-29 Pacific Wave Industries, Inc. Second-order nonlinear optical chromophores containing dioxine and/or bithiophene as conjugate bridge and devices incorporating the same
JP4103975B2 (en) 1998-09-10 2008-06-18 富士フイルム株式会社 Electrolyte, photoelectrochemical cell, and method for forming electrolyte layer
DE10006839A1 (en) 1999-02-17 2000-08-24 Hitachi Maxell Electrode used for capacitors in electric vehicles comprises a collector having a polarizable material layer consisting of activated charcoal, conducting auxiliary aid
US6426861B1 (en) 1999-06-22 2002-07-30 Lithium Power Technologies, Inc. High energy density metallized film capacitors and methods of manufacture thereof
US6426863B1 (en) 1999-11-25 2002-07-30 Lithium Power Technologies, Inc. Electrochemical capacitor
US6341056B1 (en) 2000-05-17 2002-01-22 Lsi Logic Corporation Capacitor with multiple-component dielectric and method of fabricating same
AU9631301A (en) 2000-09-27 2002-04-08 Procter & Gamble Melanocortin receptor ligands
EP1202299B1 (en) 2000-10-25 2006-08-16 Montena Components S.A. Electrical energy accumulating device consisting of wound strips and its manufacturing method
US6391104B1 (en) 2000-12-01 2002-05-21 Bayer Corporation Perylene pigment compositions
US7033406B2 (en) 2001-04-12 2006-04-25 Eestor, Inc. Electrical-energy-storage unit (EESU) utilizing ceramic and integrated-circuit technologies for replacement of electrochemical batteries
JP4633960B2 (en) 2001-05-10 2011-02-16 日清紡ホールディングス株式会社 Power storage system for automobiles
TWI266342B (en) 2001-12-03 2006-11-11 Tdk Corp Multilayer capacitor
RU2199450C1 (en) 2002-01-08 2003-02-27 Московский государственный авиационный институт (технический университет) Power supply source of mobile object
JP2005516387A (en) 2002-01-24 2005-06-02 トウレ プラスチックス (アメリカ) インコーポレイテッド Polymer coated capacitor film
DE10203918A1 (en) 2002-01-31 2003-08-21 Bayerische Motoren Werke Ag Electrical energy storage device for motor vehicle, especially for hybrid drive, has of capacitors with several individual capacitor cells of cylindrical or essentially rectangular section
US7371336B2 (en) * 2002-09-24 2008-05-13 E.I. Du Pont Nemours And Company Water dispersible polyanilines made with polymeric acid colloids for electronics applications
DE10248722A1 (en) 2002-10-18 2004-05-06 Infineon Technologies Ag Integrated circuit arrangement with capacitor and manufacturing process
JP4734823B2 (en) 2003-06-11 2011-07-27 富士通株式会社 Film multilayer structure and actuator element, capacitive element, and filter element using the same
US7025900B2 (en) 2003-06-25 2006-04-11 Nitto Denko Corporation Perylenetetracarboxylic acid dibenzimidazole sulfoderivatives containing oxo-groups in the perylene core which form part of a para-quinoid system of bonds, lyotropic liquid crystal systems and anisotropic films containing the same, and methods for making the same
JP4715079B2 (en) 2003-06-26 2011-07-06 パナソニック株式会社 Vehicle power supply
US20050118083A1 (en) 2003-09-05 2005-06-02 Japan Storage Battery Co., Ltd. Process for the production of lithium-containing material and non-aqueous electrolyte electrochemical cells using it
WO2005089094A2 (en) 2003-11-21 2005-09-29 The Board Of Regents Of The University And Community College System Of Nevada Materials and methods for the preparation of anisotropically-ordered solids
EP1719749B1 (en) 2004-02-25 2016-08-24 Asahi Kasei Kabushiki Kaisha Polyacene compound and organic semiconductor thin film
US7354532B2 (en) 2004-04-13 2008-04-08 E.I. Du Pont De Nemours And Company Compositions of electrically conductive polymers and non-polymeric fluorinated organic acids
US8344142B2 (en) 2004-06-14 2013-01-01 Georgia Tech Research Corporation Perylene charge-transport materials, methods of fabrication thereof, and methods of use thereof
US7466536B1 (en) 2004-08-13 2008-12-16 Eestor, Inc. Utilization of poly(ethylene terephthalate) plastic and composition-modified barium titanate powders in a matrix that allows polarization and the use of integrated-circuit technologies for the production of lightweight ultrahigh electrical energy storage units (EESU)
US7211824B2 (en) 2004-09-27 2007-05-01 Nitto Denko Corporation Organic semiconductor diode
JP2006147606A (en) 2004-11-16 2006-06-08 Nec Toppan Circuit Solutions Inc Sheet-like capacitor and its manufacturing method
US7428137B2 (en) 2004-12-03 2008-09-23 Dowgiallo Jr Edward J High performance capacitor with high dielectric constant material
DE102005010162B4 (en) 2005-03-02 2007-06-14 Ormecon Gmbh Conductive polymers of particles with anisotropic morphology
DE102005018172A1 (en) 2005-04-19 2006-10-26 Conti Temic Microelectronic Gmbh power capacitor
JP3841814B1 (en) 2005-04-28 2006-11-08 三井金属鉱業株式会社 Capacitor layer forming material and method for manufacturing the capacitor layer forming material
US7244999B2 (en) * 2005-07-01 2007-07-17 Alps Electric Co., Ltd. Capacitor applicable to a device requiring large capacitance
GB0520489D0 (en) 2005-10-07 2005-11-16 Kontrakt Technology Ltd Organic compound, optical crystal film and method of producing thereof
DE102005053995A1 (en) 2005-11-10 2007-05-24 Basf Ag Use of rylene derivatives as photosensitizers in solar cells
JP4241714B2 (en) 2005-11-17 2009-03-18 パナソニック電工株式会社 Battery pack for power tools
DE102005055075A1 (en) 2005-11-18 2007-05-24 Bayerische Motoren Werke Ag Motor vehicle with a capacitor device for storing electrical energy
JP2009522775A (en) 2005-12-28 2009-06-11 ザ・ペン・ステート・リサーチ・ファンデーション High electrical energy density polymer capacitor with high discharge rate and high efficiency with special polyvinylidene fluoride copolymer and terpolymer as dielectric
US7460352B2 (en) 2006-01-09 2008-12-02 Faradox Energy Storage, Inc. Flexible dielectric film and method for making
GB0600764D0 (en) 2006-01-13 2006-02-22 Crysoptix Ltd Organic compound, optical crystal film and method of production thereof
GB0600763D0 (en) 2006-01-13 2006-02-22 Crysoptix Ltd 6, 7-dihydrobenzimidazo[1,2-C]quininazolin-6-one carboxylic acid, its esters and method of synthesis thereof
GB0601283D0 (en) 2006-01-23 2006-03-01 Crysoptix Ltd Multilayer polarizer
JP2007287829A (en) 2006-04-14 2007-11-01 Matsushita Electric Ind Co Ltd Metallized film capacitor
JP4501893B2 (en) 2006-04-24 2010-07-14 トヨタ自動車株式会社 Power supply system and vehicle
KR101364873B1 (en) 2006-05-04 2014-02-19 바스프 에스이 Method for producing organic field-effect transistors
US20080002329A1 (en) 2006-07-02 2008-01-03 Pohm Arthur V High Dielectric, Non-Linear Capacitor
GB0616358D0 (en) 2006-08-16 2006-09-27 Crysoptix Ltd Anisotropic polymer film and method of production thereof
GB0616359D0 (en) 2006-08-16 2006-09-27 Crysoptix Ltd Organic compound,optical film and method of production thereof
GB0618955D0 (en) 2006-09-26 2006-11-08 Cryscade Solar Ltd Organic compound and organic photovoltaic device
GB0622150D0 (en) 2006-11-06 2006-12-20 Kontrakt Technology Ltd Anisotropic semiconductor film and method of production thereof
US7994657B2 (en) 2006-12-22 2011-08-09 Solarbridge Technologies, Inc. Modular system for unattended energy generation and storage
CN101622253B (en) 2007-01-08 2015-04-29 破立纪元有限公司 Methods for preparing arene-bis(dicarboximide)-based semiconducting materials and related intermediates for preparing same
FR2912265B1 (en) 2007-02-06 2009-04-24 Batscap Sa BATTERY WITH SERIES CELL MODULES, AND VEHICLE EQUIPPED WITH SAME
US7804678B2 (en) 2007-04-25 2010-09-28 Industrial Technology Research Institute Capacitor devices
US7745821B2 (en) 2007-05-15 2010-06-29 Eastman Kodak Company Aryl dicarboxylic acid diimidazole-based compounds as n-type semiconductor materials for thin film transistors
CN101855740A (en) 2007-09-12 2010-10-06 富士胶片株式会社 Process for production of desubstituted compounds, organic semiconductor film and process for production of the film
US20110056408A1 (en) 2007-11-12 2011-03-10 Cismi Aerogel compositions
EP2062944A1 (en) 2007-11-20 2009-05-27 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Water-soluble rylene dyes, methods for preparing the same and uses thereof as fluorescent labels for biomolecules
DE102008061452A1 (en) 2007-12-12 2010-07-08 Langhals, Heinz, Prof. Dr. Imidazoloperylenbisimide
FR2925790B1 (en) 2007-12-19 2010-01-15 Sagem Defense Securite ALTERNATIVE / CONTINUOUS CONVERTER WITH GALVANIC INSULATION
US8404844B2 (en) 2008-02-05 2013-03-26 Basf Se Perylene semiconductors and methods of preparation and use thereof
GB0802912D0 (en) 2008-02-15 2008-03-26 Carben Semicon Ltd Thin-film transistor, carbon-based layer and method of production thereof
GB0804083D0 (en) 2008-03-04 2008-04-09 Crysoptix Kk Polycyclic organic compounds, retardation layer and compensation panel on their base
GB0804082D0 (en) 2008-03-04 2008-04-09 Crysoptix Kk Polycyclic organic compounds, polarizing elements and method of production t hereof
EP2108673A1 (en) * 2008-04-11 2009-10-14 DuPont Teijin Films U.S. Limited Partnership Plastic film having a high breakdown voltage
US20100173134A1 (en) 2008-06-26 2010-07-08 Carben Semicon Limited Film and Device Using Layer Based on Ribtan Material
JP4868183B2 (en) 2008-09-30 2012-02-01 日産化学工業株式会社 Novel fluorinated tetracarboxylic dianhydride, polyimide precursor obtained therefrom, polyimide and its use
US8611068B2 (en) * 2008-10-16 2013-12-17 Case Western Reserve University Multilayer polymer dialectric film having a charge-delocalizing interface
CN102196940B (en) 2008-10-31 2013-09-25 丰田自动车株式会社 Power supply system for electric vehicle and control method for the same
WO2010064194A1 (en) 2008-12-04 2010-06-10 Crysoptix Kk Organic polymer compound, optical film and method of production thereof
US20100157527A1 (en) 2008-12-23 2010-06-24 Ise Corporation High-Power Ultracapacitor Energy Storage Pack and Method of Use
JP2010160989A (en) 2009-01-09 2010-07-22 Toyo Ink Mfg Co Ltd Method of manufacturing conductive film
JP2012515448A (en) 2009-01-16 2012-07-05 ボード オブ トラスティーズ オブ ザ レランド スタンフォード ジュニア ユニバーシティ Quantum dot type ultracapacitor and electronic battery
KR20100096625A (en) 2009-02-25 2010-09-02 삼성전기주식회사 Capacitor and method of manufacturing the same
TWI471424B (en) 2009-03-30 2015-02-01 Mitsubishi Materials Corp Method for manufacturing aluminum porous sintered body and aluminum porous sintered body
JP2012523117A (en) 2009-04-01 2012-09-27 ボード オブ トラスティーズ オブ ザ レランド スタンフォード ジュニア ユニバーシティ All-electron battery with electrodes of increased area
WO2010145230A1 (en) 2009-06-15 2010-12-23 Hak Hon Chau Fault tolerant modular battery management system
US7911029B2 (en) * 2009-07-11 2011-03-22 Ji Cui Multilayer electronic devices for imbedded capacitor
JP2011029442A (en) 2009-07-27 2011-02-10 Daikin Industries Ltd Film for film capacitor, film capacitor using the same and method of manufacturing the film and the film capacitor
US20110079773A1 (en) 2009-08-21 2011-04-07 Wasielewski Michael R Selectively Functionalized Rylene Imides and Diimides
WO2011056903A1 (en) 2009-11-03 2011-05-12 Henry Tran Compositions and methods for generating conductive films and coatings of oligomers
CN101786864B (en) 2009-12-22 2012-12-05 广东风华高新科技股份有限公司 Ceramic dielectric material matched with nickel inner electrode and production method of capacitor produced by ceramic dielectric material
AU2010338302B2 (en) 2009-12-28 2014-02-06 Akzo Nobel Chemicals International B.V. Functionalized polyvinyl alcohol films
US20110228442A1 (en) 2010-03-16 2011-09-22 Strategic Polymer Sciences, Inc. Capacitor having high temperature stability, high dielectric constant, low dielectric loss, and low leakage current
DE102010012949A1 (en) 2010-03-26 2011-09-29 Siemens Aktiengesellschaft Capacitor module, has control unit for controlling temperature of cells, where control unit includes phase change material, which is in contact with cells to absorb heat delivered by cells and located on surface of cooling body
KR20110122051A (en) 2010-05-03 2011-11-09 제일모직주식회사 Compound for organic photoelectric device and organic photoelectric device including the same
US20120008251A1 (en) 2010-07-12 2012-01-12 Wei-Ching Yu Film capacitors comprising melt-stretched films as dielectrics
US8929054B2 (en) 2010-07-21 2015-01-06 Cleanvolt Energy, Inc. Use of organic and organometallic high dielectric constant material for improved energy storage devices and associated methods
WO2012012672A2 (en) 2010-07-21 2012-01-26 Cleanvolt Energy, Inc. Use of organic and organometallic high dielectric constant material for improved energy storage devices and associated methods
JP5562169B2 (en) 2010-08-09 2014-07-30 小島プレス工業株式会社 Multilayer film capacitor and manufacturing method thereof
JP5257708B2 (en) 2010-08-25 2013-08-07 株式会社豊田中央研究所 Nanocomposite and dispersion containing the same
US20120056600A1 (en) 2010-09-03 2012-03-08 Nevin Donald M Capacitor vehicle having high speed charging ability and method of operating a capacitor vehicle
US8895118B2 (en) 2010-11-09 2014-11-25 Crysoptix K.K. Negative dispersion retardation plate and achromatic circular polarizer
DE102010063718A1 (en) 2010-12-21 2012-06-21 Siemens Aktiengesellschaft Dielectric layer for an electrical component, dielectric component with a dielectric layer and method for producing a dielectric component with a dielectric layer
JP6004450B2 (en) 2011-03-10 2016-10-05 クライスケード ソーラー リミテッドCryscade Solar Limited Organic compound and photovoltaic device comprising said organic compound
US9457496B2 (en) 2011-03-23 2016-10-04 Akron Polymer Systems, Inc. Aromatic polyamide films for transparent flexible substrates
US8922063B2 (en) 2011-04-27 2014-12-30 Green Charge Networks, Llc Circuit for rendering energy storage devices parallelable
DE102011101304A1 (en) 2011-05-12 2012-11-15 Hans-Josef Sterzel High energy density exhibiting electrical energy storage unit i.e. capacitor, for use in electrical vehicle, has electrodes separated from each other by semiconductor layers exhibiting type of conductivity different from that of electrodes
CN104271880A (en) 2011-05-24 2015-01-07 快帽系统公司 Power system for high temperature applications with rechargeable energy storage
DE102011106078A1 (en) 2011-06-30 2013-01-03 Continental Automotive Gmbh Vehicle unit and method for operating the vehicle unit
WO2013005468A1 (en) 2011-07-05 2013-01-10 株式会社村田製作所 Dielectric thin film, dielectric thin film element, and thin film capacitor
US10056609B2 (en) 2011-07-11 2018-08-21 Quantumscape Corporation Solid state energy storage devices
WO2013033954A1 (en) 2011-09-09 2013-03-14 深圳市大疆创新科技有限公司 Gyroscopic dynamic auto-balancing ball head
BR112014005381A2 (en) 2011-09-09 2017-03-28 Sz Dji Technology Co Ltd double axle platform for use in a small unmanned aerial vehicle and triple axis platform for use in a small unmanned aerial vehicle
US9508488B2 (en) 2012-01-10 2016-11-29 Samsung Electronics Co., Ltd. Resonant apparatus for wireless power transfer
WO2013110273A1 (en) 2012-01-27 2013-08-01 Kk-Electronic A/S Control system for power stacks in a power converter, power converter with such control system and wind turbine with such power converter
US9087645B2 (en) 2012-01-30 2015-07-21 QuantrumScape Corporation Solid state energy storage devices
FR2987180B1 (en) 2012-02-16 2014-12-05 Alstom Transport Sa ENERGY STORAGE CHAIN FOR VEHICLE, COMPRISING AT LEAST ONE MODULE OF SUPERCONDENSATORS, ENERGY STORAGE SYSTEM COMPRISING SUCH A CHAIN AND RAILWAY VEHICLE COMPRISING SUCH A SYSTEM
JP2013247206A (en) 2012-05-25 2013-12-09 Kojima Press Industry Co Ltd Film capacitor element and film capacitor and manufacturing method of film capacitor
US20130334657A1 (en) 2012-06-15 2013-12-19 Taiwan Semiconductor Manufacturing Co., Ltd. Planar interdigitated capacitor structures and methods of forming the same
TWI450907B (en) 2012-06-26 2014-09-01 Far Eastern New Century Corp Method for the preparation of conductive polymer dispersion, conductive polymer material made therefrom and solid electrolytic capacitor using the material
GB201212487D0 (en) 2012-07-13 2012-08-29 Secr Defence A device for measuring the hydration level of humans
RU2512880C2 (en) 2012-08-16 2014-04-10 Общество с ограниченной ответственностью "Системы Постоянного Тока" Electric energy accumulation system based on accumulator batteries and supercapacitor with network enhancement function
DE102012016438A1 (en) 2012-08-18 2014-02-20 Audi Ag Energy storage arrangement for motor vehicle, has rechargeable energy storage device with lithium-based storage element, and another rechargeable energy storage device in form of double layer capacitor
CN203118781U (en) 2012-08-21 2013-08-07 深圳圣融达科技有限公司 Multilayer composite dielectric film capacitor
TWI588188B (en) 2012-10-09 2017-06-21 沙烏地基礎工業公司 Graphene-based composite materials, method of manufacture and applications thereof
CN104937685A (en) 2012-11-21 2015-09-23 3M创新有限公司 Multilayer film including first and second dielectric layers
US20140158340A1 (en) 2012-12-11 2014-06-12 Caterpillar Inc. Active and passive cooling for an energy storage module
JP2014139296A (en) 2012-12-21 2014-07-31 Toray Ind Inc Aromatic polyamide, aromatic polyamide film and laminate
US9928966B2 (en) 2012-12-28 2018-03-27 Intel Corporation Nanostructured electrolytic energy storage devices
TWI478185B (en) 2013-03-12 2015-03-21 Univ Nat Taiwan Super capacitor and method for manufacturing the same
US8818601B1 (en) 2013-03-14 2014-08-26 GM Global Technology Operations LLC Extended-range electric vehicle with supercapacitor range extender
CN105283926B (en) 2013-03-15 2019-05-10 克林伏特能源有限公司 Utilize the electrode and electric current and its improved method in organic and organic metal high dielectric constant material improvement energy storage device
JP5867459B2 (en) 2013-07-08 2016-02-24 トヨタ自動車株式会社 Power system
SG11201600151XA (en) 2013-07-09 2016-02-26 Evonik Degussa Gmbh Electroactive polymers, manufacturing process thereof, electrode and use thereof
CN203377785U (en) 2013-07-15 2014-01-01 深圳桑达国际电源科技有限公司 Charging and discharging type DC-DC conversion circuit and new energy power generation system
US9592744B2 (en) 2013-12-06 2017-03-14 SZ DJI Technology Co., Ltd Battery and unmanned aerial vehicle with the battery
CN103986224A (en) 2014-03-14 2014-08-13 北京工业大学 Wind, solar and electricity complementary type portable power source
US9589727B2 (en) 2014-05-12 2017-03-07 Capacitor Sciences Incorporated Capacitor and method of production thereof
TW201618140A (en) 2014-05-12 2016-05-16 柯帕瑟特科學有限責任公司 Energy storage device and method of production thereof
EP2976687B1 (en) 2014-05-30 2017-09-06 SZ DJI Technology Co., Ltd. Systems and methods for uav docking
KR102461254B1 (en) 2014-11-04 2022-10-31 캐패시터 사이언시스 인코포레이티드 Energy storage devices and methods of production thereof
SG11201706689QA (en) 2015-02-26 2017-09-28 Capacitor Sciences Inc Self-healing capacitor and methods of production thereof
US9932358B2 (en) 2015-05-21 2018-04-03 Capacitor Science Incorporated Energy storage molecular material, crystal dielectric layer and capacitor
US9941051B2 (en) 2015-06-26 2018-04-10 Capactor Sciences Incorporated Coiled capacitor
WO2020130854A1 (en) 2018-12-21 2020-06-25 Ecolibrium Biologicals Holdings Limited Agricultural compositions and methods related thereto

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5742471A (en) * 1996-11-25 1998-04-21 The Regents Of The University Of California Nanostructure multilayer dielectric materials for capacitors and insulators
JPH11297332A (en) * 1998-04-13 1999-10-29 Tdk Corp Current collector and sheet type electrochemical element using the same
JP2005509283A (en) * 2001-11-03 2005-04-07 ハー ツェー シュタルク インコーポレイテッド Thin film capacitor using conductive polymer
JP2006523384A (en) * 2003-03-05 2006-10-12 ダフ, ウィリアム ビー. ジュニア Charge storage device with enhanced power characteristics
US20110110015A1 (en) * 2007-04-11 2011-05-12 The Penn State Research Foundation Methods to improve the efficiency and reduce the energy losses in high energy density capacitor films and articles comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018230222A1 (en) * 2017-06-12 2020-03-19 Jsr株式会社 Composition, liquid crystal alignment film, retardation plate, polarizing plate, method for manufacturing alignment film, and liquid crystal element
JP7067555B2 (en) 2017-06-12 2022-05-16 Jsr株式会社 Composition, liquid crystal alignment film, retardation plate, polarizing plate, method for manufacturing the alignment film, and liquid crystal element

Also Published As

Publication number Publication date
CA2965870C (en) 2023-01-17
KR20170102209A (en) 2017-09-08
US20160314901A1 (en) 2016-10-27
US9916931B2 (en) 2018-03-13
BR112017008912A2 (en) 2017-12-26
EP3216037B1 (en) 2024-01-03
JP6668341B2 (en) 2020-03-18
RU2017112074A (en) 2018-12-05
CN107592939B (en) 2020-05-05
EP3216037A1 (en) 2017-09-13
SG11201703441YA (en) 2017-05-30
EP3216037A4 (en) 2018-10-24
CN107592939A (en) 2018-01-16
KR102461254B1 (en) 2022-10-31
AU2015343211A1 (en) 2017-04-27
CA2965870A1 (en) 2016-05-12
WO2016073522A1 (en) 2016-05-12
MX2017005427A (en) 2017-06-21

Similar Documents

Publication Publication Date Title
JP6668341B2 (en) Energy storage device and method of manufacturing the same
US9589727B2 (en) Capacitor and method of production thereof
JP6953306B2 (en) Energy storage device and its manufacturing method
US10685782B2 (en) Capacitor and method of production thereof
US20170236642A1 (en) para-FURUTA POLYMER AND CAPACITOR
US20170236641A1 (en) Furuta co-polymer and capacitor

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170531

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170630

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20181101

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190708

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190723

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20191008

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20200128

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20200226

R150 Certificate of patent or registration of utility model

Ref document number: 6668341

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250