JP2017535943A - オプトエレクトロニクス半導体デバイスおよびオプトエレクトロニクス半導体デバイスを有する装置 - Google Patents
オプトエレクトロニクス半導体デバイスおよびオプトエレクトロニクス半導体デバイスを有する装置 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 218
- 230000005693 optoelectronics Effects 0.000 title claims abstract description 26
- 230000001681 protective effect Effects 0.000 claims abstract description 27
- 230000005855 radiation Effects 0.000 claims abstract description 21
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 115
- 239000002800 charge carrier Substances 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
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- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
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- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/387—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
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- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
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- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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Abstract
Description
Claims (15)
- 第1の半導体層(21)、第2の半導体層(22)、および前記第1の半導体層と前記第2の半導体層との間に配置された、放射を発生させるために設けられた活性領域(20)を有する半導体積層体(2)を含む出射領域(3)と、
保護ダイオード領域(4)と、を有するオプトエレクトロニクス半導体デバイス(1)であって、
− 前記半導体デバイスは、前記半導体デバイス(1)の外部からの電気的接触のための接点(6)を備え、
− 前記接点は、前記出射領域に電気接続された第1の接点領域(61)を備え、
− 前記接点は、前記第1の接点領域から離間しかつ前記保護ダイオード領域に電気接続された第2の接点領域(62)を備え、
− 前記第1の接点領域および前記第2の接点領域には、1本の接続リード線(9)の共通端部(95)によって外部から電気的に接触可能であり、
− 前記第1の接点領域には、前記第2の接点領域から独立して1本の接続リード線(9)の共通端部(95)によって外部から電気的に接触可能である、
オプトエレクトロニクス半導体デバイス(1)。 - 前記接続リード線は、ワイヤボンディング接続である、
請求項1に記載のオプトエレクトロニクス半導体デバイス。 - 前記保護ダイオード領域は、前記出射領域と同じ多層構造を有する半導体ボディである、
請求項1または2に記載のオプトエレクトロニクス半導体デバイス。 - 前記第1の接点領域および前記第2の接点領域は、前記出射領域の横方向および前記保護ダイオード領域の横方向に配置されている、
請求項1〜3のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記半導体デバイスの平面視において、前記第1の接点領域および前記第2の接点領域は、前記保護ダイオード領域と重なり合っている、
請求項1〜3のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記半導体デバイスは、外部からの電気的接触のためのさらなる接点(65)を備え、前記さらなる接点は、前記出射領域および前記保護ダイオード領域に電気接続されている、
請求項1〜5のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記半導体積層体は、キャリア(7)に配置されている、
請求項1〜6のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記接点は、前記キャリアの前記半導体積層体に対向する面に配置されている、
請求項7に記載の半導体デバイス。 - 前記半導体積層体は、キャリア(7)に配置され、前記接点は、前記キャリアの前記半導体積層体に対向する面に配置され、かつ前記さらなる接点は、前記キャリアの前記半導体積層体とは反対側の面に配置されている、
請求項6に記載のオプトエレクトロニクス半導体デバイス。 - 前記第1の半導体層は、前記出射領域において第1の接続層(51)に電気接続され、前記第1の接続層は、前記キャリアと前記出射領域との間の所々で伸長している、
請求項7〜9のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記出射領域は、前記第1の半導体層および前記活性領域を通って前記第2の半導体層内まで伸長している少なくとも1つの凹部(25)を備え、前記第2の半導体層は、前記少なくとも1つの凹部内で第2の接続層(52)に電気接続されており、前記第2の接続層は、前記出射領域と前記キャリアとの間の所々で伸長している、
請求項7〜10のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記第2の接続層は、前記保護ダイオード領域の前記キャリアに対向する後面(42)に電気接続されている、
請求項11に記載のオプトエレクトロニクス半導体デバイス。 - 前記第1の接点領域の前記キャリアとは反対側の表面(610)は、前記第2の接点領域の前記キャリアとは反対側の表面(620)と、前記キャリアからの距離が同一または実質的に同一である、
請求項7〜12のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 前記第1の接点領域および前記第2の接点領域は、互いに2μm〜5μm(両端値を含む)離間して配置されている、
請求項1〜13のいずれか一項に記載のオプトエレクトロニクス半導体デバイス。 - 請求項1〜14のいずれか一項に記載のオプトエレクトロニクス半導体デバイスと、ランド部と、を有し、前記第1の接点領域は、接続リード線によって前記ランド部に電気的に接触している、装置。
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Application Number | Priority Date | Filing Date | Title |
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DE102014116512.8 | 2014-11-12 | ||
DE102014116512.8A DE102014116512A1 (de) | 2014-11-12 | 2014-11-12 | Optoelektronisches Halbleiterbauelement und Vorrichtung mit einem optoelektronischen Halbleiterbauelement |
PCT/EP2015/074353 WO2016074891A1 (de) | 2014-11-12 | 2015-10-21 | Optoelektronisches halbleiterbauelement und vorrichtung mit einem optoelektronischen halbleiterbauelement |
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US (1) | US10483256B2 (ja) |
JP (1) | JP2017535943A (ja) |
KR (1) | KR20170085055A (ja) |
CN (1) | CN107112343A (ja) |
DE (2) | DE102014116512A1 (ja) |
WO (1) | WO2016074891A1 (ja) |
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KR20160037060A (ko) * | 2014-09-26 | 2016-04-05 | 서울바이오시스 주식회사 | 발광소자 및 그 제조 방법 |
DE102017123755B4 (de) * | 2017-10-12 | 2020-12-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines Laserdiodenbarrens und Laserdiodenbarren |
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DE102012110909A1 (de) * | 2012-11-13 | 2014-05-15 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip und Verfahren zum Betreiben eines Halbleiterchips |
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- 2014-11-12 DE DE102014116512.8A patent/DE102014116512A1/de not_active Withdrawn
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- 2015-10-21 CN CN201580061728.8A patent/CN107112343A/zh active Pending
- 2015-10-21 KR KR1020177014464A patent/KR20170085055A/ko unknown
- 2015-10-21 DE DE112015005128.7T patent/DE112015005128A5/de active Pending
- 2015-10-21 WO PCT/EP2015/074353 patent/WO2016074891A1/de active Application Filing
- 2015-10-21 US US15/520,666 patent/US10483256B2/en active Active
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JP2013069802A (ja) * | 2011-09-21 | 2013-04-18 | Samsung Electronics Co Ltd | 半導体発光装置 |
DE102012110909A1 (de) * | 2012-11-13 | 2014-05-15 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip und Verfahren zum Betreiben eines Halbleiterchips |
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US10483256B2 (en) | 2019-11-19 |
DE112015005128A5 (de) | 2017-08-03 |
DE102014116512A1 (de) | 2016-05-12 |
US20170317067A1 (en) | 2017-11-02 |
WO2016074891A1 (de) | 2016-05-19 |
CN107112343A (zh) | 2017-08-29 |
KR20170085055A (ko) | 2017-07-21 |
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