JP2017524946A5 - - Google Patents

Download PDF

Info

Publication number
JP2017524946A5
JP2017524946A5 JP2017512438A JP2017512438A JP2017524946A5 JP 2017524946 A5 JP2017524946 A5 JP 2017524946A5 JP 2017512438 A JP2017512438 A JP 2017512438A JP 2017512438 A JP2017512438 A JP 2017512438A JP 2017524946 A5 JP2017524946 A5 JP 2017524946A5
Authority
JP
Japan
Prior art keywords
function
optical
correction
matrix
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017512438A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017524946A (ja
JP6751079B2 (ja
Filing date
Publication date
Priority claimed from DE102014209348.1A external-priority patent/DE102014209348A1/de
Application filed filed Critical
Publication of JP2017524946A publication Critical patent/JP2017524946A/ja
Publication of JP2017524946A5 publication Critical patent/JP2017524946A5/ja
Application granted granted Critical
Publication of JP6751079B2 publication Critical patent/JP6751079B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2017512438A 2014-05-16 2015-05-15 補正光学変数を求める方法及び装置 Active JP6751079B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014209348.1 2014-05-16
DE102014209348.1A DE102014209348A1 (de) 2014-05-16 2014-05-16 Ermittlung einer korrigierten Größe
PCT/EP2015/060770 WO2015173397A1 (de) 2014-05-16 2015-05-15 Ermittlung einer korrigierten grösse

Publications (3)

Publication Number Publication Date
JP2017524946A JP2017524946A (ja) 2017-08-31
JP2017524946A5 true JP2017524946A5 (OSRAM) 2018-06-28
JP6751079B2 JP6751079B2 (ja) 2020-09-02

Family

ID=53276840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017512438A Active JP6751079B2 (ja) 2014-05-16 2015-05-15 補正光学変数を求める方法及び装置

Country Status (4)

Country Link
US (1) US9841685B2 (OSRAM)
JP (1) JP6751079B2 (OSRAM)
DE (1) DE102014209348A1 (OSRAM)
WO (1) WO2015173397A1 (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3570110A1 (en) * 2018-05-16 2019-11-20 ASML Netherlands B.V. Estimating a parameter of a substrate
EP3696605A1 (en) * 2019-02-13 2020-08-19 ASML Netherlands B.V. Method and lithograph apparatus for measuring a radiation beam
WO2022156875A1 (en) * 2021-01-19 2022-07-28 Carl Zeiss Smt Gmbh A method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography
US11609506B2 (en) * 2021-04-21 2023-03-21 Kla Corporation System and method for lateral shearing interferometry in an inspection tool
DE102023120807A1 (de) * 2023-08-04 2025-02-06 Asml Netherlands B.V. Verfahren und System zur Bestimmung feldabhängiger Aberrationen

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550377B (en) * 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
US7088458B1 (en) * 2002-12-23 2006-08-08 Carl Zeiss Smt Ag Apparatus and method for measuring an optical imaging system, and detector unit
JP4753009B2 (ja) * 2005-05-24 2011-08-17 株式会社ニコン 計測方法、露光方法、及び露光装置
US7580113B2 (en) * 2006-06-23 2009-08-25 Asml Netherlands B.V. Method of reducing a wave front aberration, and computer program product
JP2008186912A (ja) * 2007-01-29 2008-08-14 Nikon Corp 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法
JP5503193B2 (ja) * 2009-06-08 2014-05-28 キヤノン株式会社 波面収差の測定装置、露光装置及びデバイス製造方法
DE102009038558A1 (de) * 2009-08-24 2011-03-10 Carl Zeiss Sms Gmbh Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens
DE112009005390B4 (de) * 2009-11-19 2017-05-18 Canon Kabushiki Kaisha Vorrichtung, bearbeitungsverfahren und programm zum berechnen der form einer testoberfläche
DE102010062763A1 (de) 2010-12-09 2012-06-14 Carl Zeiss Smt Gmbh Verfahren zum Vermessen eines optischen Systems
WO2012097833A1 (en) * 2011-01-20 2012-07-26 Carl Zeiss Smt Gmbh Method of operating a projection exposure tool
WO2013078638A1 (zh) * 2011-11-30 2013-06-06 中国科学院长春光学精密机械与物理研究所 检测光刻机投影物镜系统的波像差的装置及方法
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
DE102012111008B4 (de) * 2012-11-15 2014-05-22 Precitec Optronik Gmbh Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie
DE102013218991A1 (de) * 2013-09-20 2015-03-26 Carl Zeiss Smt Gmbh Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems

Similar Documents

Publication Publication Date Title
JP2017524946A5 (OSRAM)
CN105403172B (zh) 一种大视场结构光视觉测量中分区域Gamma预校正相位误差补偿方法
IL225971B (en) Metrological method and system and method for producing a standard
JP2016109630A5 (OSRAM)
JPWO2020240720A5 (OSRAM)
JP2015219603A5 (OSRAM)
WO2015010850A3 (en) Wide-band acoustic holography
JP2015036632A5 (OSRAM)
EP3903232A4 (en) REALISTIC SENSOR SIMULATION AND PROBABILISTIC MEASUREMENT CORRECTION
JP2017198477A (ja) 距離画像生成装置
JP2016016234A5 (OSRAM)
JP2020038073A5 (OSRAM)
JP2011095061A5 (OSRAM)
JP2013070117A5 (OSRAM)
WO2016024796A3 (en) Imaging apparatus and imaging method thereof
JP2022166688A5 (OSRAM)
JP6751079B2 (ja) 補正光学変数を求める方法及び装置
JP2013026994A5 (OSRAM)
JP2007281003A5 (OSRAM)
JP2016008924A5 (OSRAM)
JP2018022114A5 (OSRAM)
JP6047764B2 (ja) 白色干渉計、画像処理方法及び画像処理プログラム
JP2014153494A5 (OSRAM)
JP2016080475A5 (OSRAM)
JP2014159103A5 (OSRAM)