JP2017520936A - ゲルマニウム・オン・インシュレータ基板の製造方法 - Google Patents
ゲルマニウム・オン・インシュレータ基板の製造方法 Download PDFInfo
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Abstract
Description
をさらに含むことができる。
好ましくは、前記溶液を、約80℃の温度へと加熱することができる。
本発明の実施形態が、以下で添付の図面を参照しつつ開示される。
Claims (26)
- ゲルマニウム・オン・インシュレータ基板を製造する方法であって、
(i)第1の半導体基板と、ゲルマニウム層を備えて形成された第2の半導体基板とを用意することと、
(ii)前記ゲルマニウム層を前記第1および第2の半導体基板の中間に配置しつつ、前記第1の半導体基板を前記第2の半導体基板へと少なくとも1つの誘電材料を使用して接合し、結合基板を形成することと、
(iii)前記結合基板から前記第2の半導体基板を除去し、ミスフィット転位を有する前記ゲルマニウム層の少なくとも一部分を露出させることと、
(iv)前記ゲルマニウム層の前記一部分からの前記ミスフィット転位の除去を可能にするように前記結合基板をアニーリングすることと、
を含む方法。 - 前記接合に先立って前記第1および第2の半導体基板のそれぞれに前記誘電材料を堆積させること、をさらに含み、前記誘電材料は、前記第2の半導体基板については前記ゲルマニウム層上に堆積させられる、請求項1に記載の方法。
- 前記堆積は、原子層堆積を使用して実行される、請求項2に記載の方法。
- 前記接合に先立って、
・前記第1および第2の半導体基板についてプラズマ活性化を実行することと、
・前記清浄化された第1および第2の半導体基板を脱イオン化された流体で洗浄することと、
・前記洗浄された第1および第2の半導体基板を乾燥させることと
をさらに含む、請求項1〜3のいずれか一項に記載の方法。 - 前記脱イオン化された流体は、脱イオン水である、請求項4に記載の方法。
- 前記洗浄された第1および第2の半導体基板の乾燥は、スピン乾燥の使用を含む、請求項4または5に記載の方法。
- 前記結合基板からの前記第2の半導体基板の除去に先立って、前記結合基板をアニーリングすることによって前記第1および第2の半導体基板の間の接合を強めること、をさらに含む請求項1〜6のいずれか一項に記載の方法。
- 前記接合を強めるための前記結合基板のアニーリングは、約300℃の温度および大気圧でチッ素を使用してアニーリングを実行することを含む、請求項7に記載の方法。
- 前記誘電材料は、酸化アルミニウム、硝酸アルミニウム、二酸化ケイ素、人工ダイアモンド、およびチッ化ホウ素で構成されるグループから選択される、請求項1〜8のいずれか一項に記載の方法。
- 前記第1および第2の半導体基板は、シリコンベースの材料でそれぞれ形成される、請求項1〜9のいずれか一項に記載の方法。
- 前記アニーリングは、約500℃〜850℃の間の温度で実行される、請求項1に記載の方法。
- 前記アニーリングは、酸素、水素、チッ素、およびアルゴンで構成されるグループから選択されるガスを使用して実行される、請求項1に記載の方法。
- 前記結合基板からの前記第2の半導体基板の除去に先立って、前記第1の半導体基板上に保護材料の層を堆積させること
をさらに含む、請求項1〜12のいずれか一項に記載の方法。 - 前記保護材料は、ProTEK(登録商標)B3-25、二酸化ケイ素、またはチッ化ケイ素を含む、請求項13に記載の方法。
- 前記結合基板のアニーリングに続いて、
前記ゲルマニウム層の前記一部分からの前記ミスフィット転位の除去を可能にするための前記アニーリングの結果として前記ゲルマニウム層の前記一部分に形成された材料の層を除去するように、前記結合基板をエッチングすること
をさらに含み、
前記材料の層は、前記ミスフィット転位を実質的に含む、請求項1〜14のいずれか一項に記載の方法。 - 前記結合基板のエッチングは、湿式エッチングまたは乾式エッチングの使用を含む、請求項15に記載の方法。
- 湿式エッチングは、前記ゲルマニウム層の前記一部分に形成された前記材料の層を除去するためのエッチング剤の使用を含み、前記エッチング剤は、フッ化水素酸を含む、請求項16に記載の方法。
- 前記結合基板からの前記第2の半導体基板の除去は、
・前記結合基板を水酸化テトラメチルアンモニウムの溶液中に配置し、前記第2の半導体基板を除去することと、
・前記ゲルマニウム層の前記露出した一部分についてエッチング停止を実行することと
を含む、請求項1〜17のいずれか一項に記載の方法。 - 前記溶液は、約80℃の温度へと加熱される、請求項18に記載の方法。
- 約800Wの電力に構成された酸素プラズマを使用して前記第1の半導体基板から前記保護材料を除去すること、をさらに含む、請求項14または15に従属するときの請求項18または19に記載の方法。
- 前記結合基板からの前記第2の半導体基板の除去は、機械的な研削と湿式エッチングとの組み合わせを使用して前記第2の半導体基板を除去することを含む、請求項1〜17のいずれか一項に記載の方法。
- 前記接合に先立ち、前記第2の半導体基板上に前記ゲルマニウム層を堆積させること、をさらに含む請求項1〜21のいずれか一項に記載の方法。
- 前記少なくとも1つの誘電材料は、少なくとも第1および第2の誘電材料を含み、前記第1の誘電材料は、前記第1の半導体基板上に堆積させられ、前記第2の誘電材料は、前記第2の半導体基板の前記ゲルマニウム層上に堆積させられ、前記第1の誘電材料は、前記第2の誘電材料と異なる、請求項2に記載の方法。
- 前記第2の半導体基板の除去後かつ前記結合基板のアニーリング前に、前記ゲルマニウム層の前記一部分の上にさらなる誘電材料を形成すること、をさらに含む、請求項1〜23のいずれか一項に記載の方法。
- ゲルマニウムベースの基板を製造する方法であって、
(i)第1の半導体基板と、ゲルマニウム層を備えて形成された第2の半導体基板とを用意することと、
(ii)前記ゲルマニウム層を前記第1および第2の半導体基板の中間に配置しつつ、前記第1の半導体基板を前記第2の半導体基板へと少なくとも1つの接合材料を使用して接合し、結合基板を形成することと、
(iii)前記結合基板から前記第2の半導体基板を除去し、ミスフィット転位を有する前記ゲルマニウム層の少なくとも一部分を露出させることと、
(iv)前記ゲルマニウム層の前記一部分からの前記ミスフィット転位の除去を可能にするように前記結合基板をアニーリングすることと、
を含む方法。 - 前記接合材料は、誘電材料、非誘電材料、複数の異なる非誘電材料、または複数の異なる誘電材料を含む、請求項25に記載の方法。
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