JP2017513210A5 - - Google Patents
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- Publication number
- JP2017513210A5 JP2017513210A5 JP2016553552A JP2016553552A JP2017513210A5 JP 2017513210 A5 JP2017513210 A5 JP 2017513210A5 JP 2016553552 A JP2016553552 A JP 2016553552A JP 2016553552 A JP2016553552 A JP 2016553552A JP 2017513210 A5 JP2017513210 A5 JP 2017513210A5
- Authority
- JP
- Japan
- Prior art keywords
- brush
- hump
- diameter
- ratio
- height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006261 foam material Substances 0.000 claims 4
- 210000003229 CMP Anatomy 0.000 claims 3
- 238000004140 cleaning Methods 0.000 claims 3
- 241000512259 Ascophyllum nodosum Species 0.000 claims 1
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229920002635 polyurethane Polymers 0.000 claims 1
- 239000004814 polyurethane Substances 0.000 claims 1
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461942231P | 2014-02-20 | 2014-02-20 | |
US61/942,231 | 2014-02-20 | ||
PCT/US2015/016949 WO2015127301A1 (en) | 2014-02-20 | 2015-02-20 | Nodule ratios for targeted enhanced cleaning performance |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020165904A Division JP7097415B2 (ja) | 2014-02-20 | 2020-09-30 | 目標とする高い洗浄性能を得るためのこぶの比率 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017513210A JP2017513210A (ja) | 2017-05-25 |
JP2017513210A5 true JP2017513210A5 (pt) | 2018-04-05 |
JP6843621B2 JP6843621B2 (ja) | 2021-03-17 |
Family
ID=53879067
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016553552A Active JP6843621B2 (ja) | 2014-02-20 | 2015-02-20 | 目標とする高い洗浄性能を得るためのこぶの比率 |
JP2020165904A Active JP7097415B2 (ja) | 2014-02-20 | 2020-09-30 | 目標とする高い洗浄性能を得るためのこぶの比率 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020165904A Active JP7097415B2 (ja) | 2014-02-20 | 2020-09-30 | 目標とする高い洗浄性能を得るためのこぶの比率 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10790167B2 (pt) |
JP (2) | JP6843621B2 (pt) |
TW (1) | TWI670763B (pt) |
WO (1) | WO2015127301A1 (pt) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2552512A (en) * | 2016-07-26 | 2018-01-31 | Matchstick Monkey Ltd | An improved teething device |
US11766703B2 (en) * | 2018-08-15 | 2023-09-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for wafer cleaning |
US20200203192A1 (en) * | 2018-12-14 | 2020-06-25 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Backside brush for cleaning wafer and cleaning apparatus having the same |
US11109667B2 (en) * | 2019-10-16 | 2021-09-07 | Tung An Development Ltd. | Device of bi-spiral cleaning brush |
US20230064958A1 (en) * | 2021-08-30 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company Ltd. | Method for wafer backside polishing |
CN114227526B (zh) * | 2022-02-28 | 2022-06-07 | 西安奕斯伟材料科技有限公司 | 一种研磨载台、研磨装置、研磨方法及硅片 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US937509A (en) * | 1908-03-09 | 1909-10-19 | Donald A Carpenter | Lavatory-fixture. |
US4098728A (en) | 1976-01-02 | 1978-07-04 | Solomon Rosenblatt | Medical surgical sponge and method of making same |
JPS596974A (ja) | 1982-07-05 | 1984-01-14 | カネボウ株式会社 | 洗浄方法 |
JPH03155551A (ja) | 1989-11-14 | 1991-07-03 | Seiko Epson Corp | 洗浄用治具 |
US6080092A (en) * | 1994-10-06 | 2000-06-27 | Xomed Surgical Products, Inc. | Industrial cleaning sponge |
JP3680185B2 (ja) | 1996-07-19 | 2005-08-10 | アイオン株式会社 | 洗浄用ローラ |
JP3403108B2 (ja) | 1999-02-26 | 2003-05-06 | アイオン株式会社 | 洗浄用スポンジローラ |
EP0937509A4 (en) * | 1996-11-08 | 2005-01-19 | Aion Co Ltd | SPONGE ROLL FOR CLEANING |
US6502273B1 (en) * | 1996-11-08 | 2003-01-07 | Kanebo, Ltd. | Cleaning sponge roller |
US6299698B1 (en) * | 1998-07-10 | 2001-10-09 | Applied Materials, Inc. | Wafer edge scrubber and method |
JP2000270929A (ja) | 1999-03-26 | 2000-10-03 | Shibaura Mechatronics Corp | 洗浄用ブラシ |
JP2001358110A (ja) | 2000-06-13 | 2001-12-26 | Hitachi Ltd | スクラブ洗浄装置およびそれを用いた半導体装置の製造方法 |
JP2004298767A (ja) | 2003-03-31 | 2004-10-28 | Aion Kk | 洗浄用多孔質ロール体 |
CN1863645B (zh) * | 2003-08-08 | 2011-11-30 | 安格斯公司 | 用于制作浇注在可旋转基体上的整体式多孔垫的方法和材料 |
US20050109371A1 (en) * | 2003-10-27 | 2005-05-26 | Applied Materials, Inc. | Post CMP scrubbing of substrates |
KR101324870B1 (ko) | 2005-12-06 | 2013-11-01 | 엔테그리스, 아이엔씨. | 다공성 패드를 위한 성형된 회전가능 기부 |
JP2009066527A (ja) | 2007-09-13 | 2009-04-02 | Nec Electronics Corp | 洗浄用ローラおよび洗浄装置 |
JP2009117765A (ja) | 2007-11-09 | 2009-05-28 | Aion Kk | 洗浄用スポンジローラ |
JP5470746B2 (ja) | 2008-05-22 | 2014-04-16 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
US8555458B2 (en) * | 2008-06-30 | 2013-10-15 | Aion Co., Ltd | Cleaning sponge roller |
US9524886B2 (en) | 2009-05-15 | 2016-12-20 | Illinois Tool Works Inc. | Brush core and brush driving method |
JP5977175B2 (ja) * | 2010-02-22 | 2016-08-24 | インテグリス・インコーポレーテッド | Cmp後の洗浄ブラシ |
JP5535687B2 (ja) | 2010-03-01 | 2014-07-02 | 株式会社荏原製作所 | 基板洗浄方法及び基板洗浄装置 |
KR20140069043A (ko) | 2011-09-26 | 2014-06-09 | 인티그리스, 인코포레이티드 | 포스트-cmp 세정 장치 및 방법 |
US20130255721A1 (en) * | 2012-04-03 | 2013-10-03 | Illinois Tool Works Inc. | Concave nodule sponge brush |
-
2015
- 2015-02-20 WO PCT/US2015/016949 patent/WO2015127301A1/en active Application Filing
- 2015-02-20 US US15/120,553 patent/US10790167B2/en active Active
- 2015-02-20 JP JP2016553552A patent/JP6843621B2/ja active Active
- 2015-02-24 TW TW104105791A patent/TWI670763B/zh active
-
2020
- 2020-09-30 JP JP2020165904A patent/JP7097415B2/ja active Active
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