JP2017508640A5 - - Google Patents
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- JP2017508640A5 JP2017508640A5 JP2016547038A JP2016547038A JP2017508640A5 JP 2017508640 A5 JP2017508640 A5 JP 2017508640A5 JP 2016547038 A JP2016547038 A JP 2016547038A JP 2016547038 A JP2016547038 A JP 2016547038A JP 2017508640 A5 JP2017508640 A5 JP 2017508640A5
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- JP
- Japan
- Prior art keywords
- layer
- forming portion
- template
- item
- thermally stable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002086 nanomaterial Substances 0.000 claims description 17
- 230000003667 anti-reflective effect Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000001020 plasma etching Methods 0.000 claims description 5
- 229910052594 sapphire Inorganic materials 0.000 claims description 5
- 239000010980 sapphire Substances 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 229910052580 B4C Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229920001558 organosilicon polymer Polymers 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/159,253 US20150202834A1 (en) | 2014-01-20 | 2014-01-20 | Lamination transfer films for forming antireflective structures |
| US14/159,253 | 2014-01-20 | ||
| PCT/US2015/010730 WO2015122975A2 (en) | 2014-01-20 | 2015-01-09 | Lamination transfer films for forming antireflective structures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017508640A JP2017508640A (ja) | 2017-03-30 |
| JP2017508640A5 true JP2017508640A5 (cg-RX-API-DMAC7.html) | 2018-02-22 |
Family
ID=53544016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016547038A Withdrawn JP2017508640A (ja) | 2014-01-20 | 2015-01-09 | 反射防止構造を形成する積層転写フィルム |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US20150202834A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP3097441B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2017508640A (cg-RX-API-DMAC7.html) |
| KR (1) | KR102352466B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN105917253B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2015122975A2 (cg-RX-API-DMAC7.html) |
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| US9708713B2 (en) * | 2013-05-24 | 2017-07-18 | Applied Materials, Inc. | Aerosol deposition coating for semiconductor chamber components |
| EP3096945B1 (en) * | 2014-01-20 | 2019-08-14 | 3M Innovative Properties Company | Lamination transfer films for forming reentrant structures |
| JP2017511755A (ja) | 2014-01-22 | 2017-04-27 | スリーエム イノベイティブ プロパティズ カンパニー | ガラス用微小光学要素 |
| TW201539736A (zh) | 2014-03-19 | 2015-10-16 | 3M Innovative Properties Co | 用於藉白光成色之 oled 裝置的奈米結構 |
| KR102279239B1 (ko) * | 2014-07-25 | 2021-07-19 | 삼성전자주식회사 | 임프린트 공정을 이용한 역상 패턴 전사방법 |
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| US9844906B2 (en) | 2015-12-10 | 2017-12-19 | S.D. Warren Company | Release webs and textured products |
| JP7040864B2 (ja) | 2016-10-28 | 2022-03-23 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化物品 |
| CN110462127B (zh) | 2017-02-14 | 2021-03-26 | 耐克创新有限合伙公司 | 防味组合物、具有防味特性的结构、制备防味组合物和结构的方法 |
| KR102187719B1 (ko) | 2017-09-29 | 2020-12-08 | 나이키 이노베이트 씨.브이. | 구조색을 갖는 물품 및 구조색을 갖는 물품을 제조하고 사용하기 위한 방법 |
| WO2019130198A1 (en) * | 2017-12-29 | 2019-07-04 | 3M Innovative Properties Company | Anti-reflective surface structures |
| JP7660372B2 (ja) * | 2018-01-05 | 2025-04-11 | スリーエム イノベイティブ プロパティズ カンパニー | 迷光吸収フィルム |
| CN108710164B (zh) * | 2018-05-25 | 2019-08-13 | 中国科学院上海光学精密机械研究所 | 红外宽带减反射微结构及其制备方法 |
| WO2020247483A1 (en) * | 2019-06-03 | 2020-12-10 | Rutgers, The State University Of New Jersey | Sacrificial nanotransfer lithography for the metalization of plastics |
| CN110194436A (zh) * | 2019-06-12 | 2019-09-03 | 中国工程物理研究院激光聚变研究中心 | 一种在有机材料表面制备抗反射微纳结构的方法 |
| CN114008493A (zh) | 2019-06-26 | 2022-02-01 | 耐克创新有限合伙公司 | 结构着色的物品以及用于制造和使用结构着色的物品的方法 |
| CN114206149A (zh) | 2019-07-26 | 2022-03-18 | 耐克创新有限合伙公司 | 结构着色的物品以及用于制造和使用结构着色的物品的方法 |
| CN114599247A (zh) | 2019-10-21 | 2022-06-07 | 耐克创新有限合伙公司 | 结构着色的物品 |
| WO2021152479A1 (en) * | 2020-01-29 | 2021-08-05 | 3M Innovative Properties Company | Nanostructured article |
| IL298377A (en) * | 2020-05-18 | 2023-01-01 | Sds Nano Inc | High precision nanoscale thin film fabrication processes |
| CN115666965A (zh) | 2020-05-29 | 2023-01-31 | 耐克创新有限合伙公司 | 结构着色的物品及用于制造和使用结构着色的物品的方法 |
| CN116134346A (zh) * | 2020-07-22 | 2023-05-16 | 佳能株式会社 | 吸光性隔热膜、吸光性隔热构件、制品及其制造方法 |
| US11889894B2 (en) | 2020-08-07 | 2024-02-06 | Nike, Inc. | Footwear article having concealing layer |
| US11241062B1 (en) | 2020-08-07 | 2022-02-08 | Nike, Inc. | Footwear article having repurposed material with structural-color concealing layer |
| US11129444B1 (en) | 2020-08-07 | 2021-09-28 | Nike, Inc. | Footwear article having repurposed material with concealing layer |
| JP2024502733A (ja) | 2020-12-18 | 2024-01-23 | スリーエム イノベイティブ プロパティズ カンパニー | 構造化フィルム及び構造化フィルムを含む光学物品 |
| JP2023553691A (ja) * | 2020-12-18 | 2023-12-25 | スリーエム イノベイティブ プロパティズ カンパニー | 構造化フィルム、及びそれを用いて基材上にパターンを形成する方法 |
| WO2025238460A1 (en) * | 2024-05-15 | 2025-11-20 | Solventum Intellectual Properties Company | Patterned article and method of manufacturing thereof |
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| IT610737A (cg-RX-API-DMAC7.html) | 1955-11-18 | 1900-01-01 | ||
| CA1254238A (en) | 1985-04-30 | 1989-05-16 | Alvin P. Gerk | Process for durable sol-gel produced alumina-based ceramics, abrasive grain and abrasive products |
| US5039561A (en) | 1986-08-25 | 1991-08-13 | Minnesota Mining And Manufacturing Company | Method for preparing an article having surface layer of uniformly oriented, crystalline, organic microstructures |
| US5234740A (en) | 1991-08-28 | 1993-08-10 | Minnesota Mining And Manufacturing Company | Slip control sheeting and articles covered with same |
| JP3444053B2 (ja) | 1995-10-13 | 2003-09-08 | ソニー株式会社 | 薄膜半導体装置 |
| US6329058B1 (en) | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
| US6376590B2 (en) | 1999-10-28 | 2002-04-23 | 3M Innovative Properties Company | Zirconia sol, process of making and composite material |
| US6521324B1 (en) * | 1999-11-30 | 2003-02-18 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
| US6858253B2 (en) | 2001-05-31 | 2005-02-22 | 3M Innovative Properties Company | Method of making dimensionally stable composite article |
| US6849558B2 (en) | 2002-05-22 | 2005-02-01 | The Board Of Trustees Of The Leland Stanford Junior University | Replication and transfer of microstructures and nanostructures |
| US20050126766A1 (en) * | 2003-09-16 | 2005-06-16 | Koila,Inc. | Nanostructure augmentation of surfaces for enhanced thermal transfer with improved contact |
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| DE102005017170B4 (de) * | 2005-04-13 | 2010-07-01 | Ovd Kinegram Ag | Transferfolie, Verfahren zu deren Herstellung sowie Mehrschichtkörper und dessen Verwendung |
| US20060270806A1 (en) | 2005-05-26 | 2006-11-30 | Hale Wesley R | Miscible high Tg polyester/polymer blend compositions and films formed therefrom |
| MX2007016039A (es) | 2005-06-17 | 2008-10-27 | Univ North Carolina | Metodos, sistemas y materiales de fabricacion de nanoparticulas. |
| US7569254B2 (en) | 2005-08-22 | 2009-08-04 | Eastman Kodak Company | Nanocomposite materials comprising high loadings of filler materials and an in-situ method of making such materials |
| US20070116934A1 (en) * | 2005-11-22 | 2007-05-24 | Miller Scott M | Antireflective surfaces, methods of manufacture thereof and articles comprising the same |
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| US20090015142A1 (en) | 2007-07-13 | 2009-01-15 | 3M Innovative Properties Company | Light extraction film for organic light emitting diode display devices |
| KR101531053B1 (ko) * | 2007-08-10 | 2015-06-25 | 한국전자통신연구원 | 다중 안테나 선택 기법을 이용한 적응 변조 장치 및 방법 |
| JP5161310B2 (ja) | 2007-09-06 | 2013-03-13 | スリーエム イノベイティブ プロパティズ カンパニー | 成形型を形成する方法及び前記成形型を使用して物品を形成する方法 |
| US8236668B2 (en) | 2007-10-10 | 2012-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing SOI substrate |
| US20090263668A1 (en) | 2008-04-21 | 2009-10-22 | 3M Innovative Properties Company | Durable coating of an oligomer and methods of applying |
| TWI365812B (en) * | 2008-10-23 | 2012-06-11 | Compal Electronics Inc | Transfer film, method of manufacturing the same, transfer method and object surface structure |
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| EP2379442A4 (en) * | 2008-12-30 | 2014-02-26 | 3M Innovative Properties Co | METHOD FOR PRODUCING NANOSTRUCTURED SURFACES |
| JP6174300B2 (ja) * | 2008-12-30 | 2017-08-02 | スリーエム イノベイティブ プロパティズ カンパニー | 反射防止物品及びこれを作製する方法 |
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| US20130011608A1 (en) * | 2010-01-13 | 2013-01-10 | Wolk Martin B | Optical films with microstructured low refractive index nanovoided layers and methods therefor |
| CN102822253B (zh) | 2010-03-03 | 2014-06-25 | 3M创新有限公司 | 具有纳米结构化层的复合材料 |
| JP2011221470A (ja) * | 2010-04-14 | 2011-11-04 | Sony Corp | 光学素子、およびその製造方法、表示装置、ならびに太陽電池 |
| CN102883870B (zh) | 2010-05-03 | 2015-09-16 | 3M创新有限公司 | 制备纳米结构的方法 |
| JPWO2011155582A1 (ja) | 2010-06-11 | 2013-08-15 | 株式会社日立ハイテクノロジーズ | 微細構造転写用スタンパ及び微細構造転写装置 |
| KR101140051B1 (ko) * | 2010-07-01 | 2012-05-02 | 에스케이하이닉스 주식회사 | 반도체 소자 및 그 형성 방법 |
| US8469551B2 (en) | 2010-10-20 | 2013-06-25 | 3M Innovative Properties Company | Light extraction films for increasing pixelated OLED output with reduced blur |
| US20140004304A1 (en) | 2011-03-14 | 2014-01-02 | 3M Innovative Properties Company | Multilayer nanostructured articles |
| BR112013023128A2 (pt) | 2011-03-14 | 2019-09-24 | 3M Innovative Properties Co | artigos nanoestruturados |
| EP2744857B1 (en) | 2011-08-17 | 2016-04-27 | 3M Innovative Properties Company | Nanostructured articles and methods to make the same |
| SG11201405941QA (en) * | 2012-03-26 | 2014-10-30 | 3M Innovative Properties Co | Article and method of making the same |
| CN104335078B (zh) | 2012-03-26 | 2017-08-08 | 3M创新有限公司 | 纳米结构化材料及其制造方法 |
| CN104487873B (zh) * | 2012-05-15 | 2016-08-24 | 欧海燕 | 纳米结构减反射层及其在led的应用 |
| CN103764385B (zh) * | 2012-06-13 | 2016-02-17 | 旭化成电子材料株式会社 | 功能转印体、功能层的转印方法、封装物以及功能转印膜辊 |
| US9780335B2 (en) | 2012-07-20 | 2017-10-03 | 3M Innovative Properties Company | Structured lamination transfer films and methods |
| US9711744B2 (en) | 2012-12-21 | 2017-07-18 | 3M Innovative Properties Company | Patterned structured transfer tape |
| US20140175707A1 (en) | 2012-12-21 | 2014-06-26 | 3M Innovative Properties Company | Methods of using nanostructured transfer tape and articles made therefrom |
| US20140242343A1 (en) | 2013-02-27 | 2014-08-28 | 3M Innovative Properties Company | Lamination transfer films for forming embedded nanostructures |
| EP3096945B1 (en) | 2014-01-20 | 2019-08-14 | 3M Innovative Properties Company | Lamination transfer films for forming reentrant structures |
| US9472788B2 (en) * | 2014-08-27 | 2016-10-18 | 3M Innovative Properties Company | Thermally-assisted self-assembly method of nanoparticles and nanowires within engineered periodic structures |
-
2014
- 2014-01-20 US US14/159,253 patent/US20150202834A1/en not_active Abandoned
-
2015
- 2015-01-09 CN CN201580004713.8A patent/CN105917253B/zh active Active
- 2015-01-09 JP JP2016547038A patent/JP2017508640A/ja not_active Withdrawn
- 2015-01-09 EP EP15749155.6A patent/EP3097441B1/en active Active
- 2015-01-09 KR KR1020167022387A patent/KR102352466B1/ko active Active
- 2015-01-09 WO PCT/US2015/010730 patent/WO2015122975A2/en not_active Ceased
-
2016
- 2016-03-29 US US15/084,025 patent/US20160208385A1/en not_active Abandoned
-
2017
- 2017-04-21 US US15/493,871 patent/US10436946B2/en active Active
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