JP2017502331A5 - - Google Patents

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Publication number
JP2017502331A5
JP2017502331A5 JP2016536814A JP2016536814A JP2017502331A5 JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5 JP 2016536814 A JP2016536814 A JP 2016536814A JP 2016536814 A JP2016536814 A JP 2016536814A JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5
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JP
Japan
Prior art keywords
liquid composition
photoreactive liquid
photon
free radical
component
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JP2016536814A
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English (en)
Japanese (ja)
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JP2017502331A (ja
JP6566952B2 (ja
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Priority claimed from PCT/US2014/067955 external-priority patent/WO2015084735A2/en
Publication of JP2017502331A publication Critical patent/JP2017502331A/ja
Publication of JP2017502331A5 publication Critical patent/JP2017502331A5/ja
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Publication of JP6566952B2 publication Critical patent/JP6566952B2/ja
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JP2016536814A 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法 Active JP6566952B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361912754P 2013-12-06 2013-12-06
US61/912,754 2013-12-06
PCT/US2014/067955 WO2015084735A2 (en) 2013-12-06 2014-12-01 Liquid photoreactive composition and method of fabricating structures

Publications (3)

Publication Number Publication Date
JP2017502331A JP2017502331A (ja) 2017-01-19
JP2017502331A5 true JP2017502331A5 (cg-RX-API-DMAC7.html) 2017-11-09
JP6566952B2 JP6566952B2 (ja) 2019-08-28

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JP2016536814A Active JP6566952B2 (ja) 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法

Country Status (5)

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US (1) US10133174B2 (cg-RX-API-DMAC7.html)
EP (1) EP3077421B1 (cg-RX-API-DMAC7.html)
JP (1) JP6566952B2 (cg-RX-API-DMAC7.html)
CN (1) CN105917275B (cg-RX-API-DMAC7.html)
WO (1) WO2015084735A2 (cg-RX-API-DMAC7.html)

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CN107322927A (zh) * 2017-08-22 2017-11-07 瑞安市麦田网络科技有限公司 一种光固化3d打印机
US11809161B2 (en) * 2020-07-13 2023-11-07 Lawrence Livermore National Security, Llc Computed axial lithography optimization system
US20220035251A1 (en) * 2020-07-31 2022-02-03 Applied Materials, Inc. Methods to fabricate 2d wedge and localized encapsulation for diffractive optics
CN119789913A (zh) 2022-06-23 2025-04-08 舒万诺知识产权公司 用于从流体中去除颗粒的方法和装置
CN120202065A (zh) 2022-11-15 2025-06-24 舒万诺知识产权公司 用于从流体中去除颗粒的方法和套件
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