JP2017209744A5 - - Google Patents

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Publication number
JP2017209744A5
JP2017209744A5 JP2016103410A JP2016103410A JP2017209744A5 JP 2017209744 A5 JP2017209744 A5 JP 2017209744A5 JP 2016103410 A JP2016103410 A JP 2016103410A JP 2016103410 A JP2016103410 A JP 2016103410A JP 2017209744 A5 JP2017209744 A5 JP 2017209744A5
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JP
Japan
Prior art keywords
workpiece
window structure
plate
window
thickness
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Application number
JP2016103410A
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English (en)
Japanese (ja)
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JP2017209744A (ja
JP6602725B2 (ja
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Application filed filed Critical
Priority to JP2016103410A priority Critical patent/JP6602725B2/ja
Priority claimed from JP2016103410A external-priority patent/JP6602725B2/ja
Priority to KR1020170060433A priority patent/KR102318327B1/ko
Priority to CN201710352370.5A priority patent/CN107414666B/zh
Priority to TW106117069A priority patent/TWI707742B/zh
Publication of JP2017209744A publication Critical patent/JP2017209744A/ja
Publication of JP2017209744A5 publication Critical patent/JP2017209744A5/ja
Application granted granted Critical
Publication of JP6602725B2 publication Critical patent/JP6602725B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016103410A 2016-05-24 2016-05-24 ワークの板厚計測用窓構造 Active JP6602725B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016103410A JP6602725B2 (ja) 2016-05-24 2016-05-24 ワークの板厚計測用窓構造
KR1020170060433A KR102318327B1 (ko) 2016-05-24 2017-05-16 워크의 판 두께 계측용 창 구조
CN201710352370.5A CN107414666B (zh) 2016-05-24 2017-05-18 工件的板厚计测用窗结构
TW106117069A TWI707742B (zh) 2016-05-24 2017-05-23 工件之板厚測量用窗結構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016103410A JP6602725B2 (ja) 2016-05-24 2016-05-24 ワークの板厚計測用窓構造

Publications (3)

Publication Number Publication Date
JP2017209744A JP2017209744A (ja) 2017-11-30
JP2017209744A5 true JP2017209744A5 (https=) 2019-01-10
JP6602725B2 JP6602725B2 (ja) 2019-11-06

Family

ID=60425135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016103410A Active JP6602725B2 (ja) 2016-05-24 2016-05-24 ワークの板厚計測用窓構造

Country Status (4)

Country Link
JP (1) JP6602725B2 (https=)
KR (1) KR102318327B1 (https=)
CN (1) CN107414666B (https=)
TW (1) TWI707742B (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7034785B2 (ja) * 2018-03-20 2022-03-14 株式会社東京精密 研磨装置
JP7435113B2 (ja) * 2020-03-23 2024-02-21 株式会社Sumco ワークの両面研磨装置
JP7466964B1 (ja) 2023-07-03 2024-04-15 株式会社多聞 基板厚測定装置及び基板厚測定方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10160420A (ja) * 1996-12-03 1998-06-19 Tokyo Seimitsu Co Ltd ウェーハの厚さ及び厚さ変化量測定装置
JPH10199951A (ja) * 1997-01-14 1998-07-31 Tokyo Seimitsu Co Ltd ウェーハの研磨面位置測定装置
TW372483U (en) * 1998-04-13 1999-10-21 Taiwan Semiconductor Mfg Light penetrative grinding system
WO2000060650A1 (en) * 1999-03-31 2000-10-12 Nikon Corporation Polishing body, polisher, method for adjusting polisher, method for measuring thickness of polished film or end point of polishing, method for producing semiconductor device
JP2002170800A (ja) * 2000-12-01 2002-06-14 Nikon Corp 研磨装置、これを用いた半導体デバイス製造方法およびこの方法により製造される半導体デバイス
US20030114076A1 (en) * 2001-12-14 2003-06-19 Hui-Chun Chang Apparatus for chemical mechanical polishing
US6991514B1 (en) * 2003-02-21 2006-01-31 Verity Instruments, Inc. Optical closed-loop control system for a CMP apparatus and method of manufacture thereof
JP4202841B2 (ja) * 2003-06-30 2008-12-24 株式会社Ｓｕｍｃｏ 表面研磨装置
KR100716935B1 (ko) * 2005-11-25 2007-05-14 두산디앤디 주식회사 반도체 웨이퍼의 화학기계적 연마장치용 로딩디바이스
KR100889084B1 (ko) * 2007-07-06 2009-03-17 두산메카텍 주식회사 반도체 웨이퍼 표면연마공정을 위한 연마 종말점 검출 장치
US8834230B2 (en) * 2008-07-31 2014-09-16 Shin-Etsu Handotai Co., Ltd. Wafer polishing method and double-side polishing apparatus
JP5917994B2 (ja) * 2012-04-23 2016-05-18 スピードファム株式会社 研磨装置の計測用窓構造
JP6255991B2 (ja) * 2013-12-26 2018-01-10 株式会社Sumco ワークの両面研磨装置
TWI583495B (zh) * 2014-01-10 2017-05-21 Ｓｕｍｃｏ股份有限公司 工件厚度的測定裝置、測定方法及工件的硏磨裝置
JP6230921B2 (ja) * 2014-01-16 2017-11-15 株式会社ディスコ 研磨装置

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