JP2017174504A - 複合荷電粒子ビーム装置 - Google Patents
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Abstract
【解決手段】試料を載置する試料台と、前記試料に集束イオンビームを照射する集束イオンビーム鏡筒と、前記試料に電子ビームを照射する電子ビーム鏡筒と、前記試料台、前記集束イオンビーム鏡筒、および電子ビーム鏡筒を収容する試料室と、前記電子ビーム鏡筒の出射面と前記試料台との間に挿入された挿入位置、および前記出射面と前記試料台との間から退出した開放位置の間で変位可能に形成された防汚板と、前記防汚板を前記挿入位置および前記開放位置の間で変位させる操作手段と、を備えた。
【選択図】図1
Description
すなわち、本発明の複合荷電粒子ビーム装置は、試料を載置する試料台と、前記試料に集束イオンビームを照射する集束イオンビーム鏡筒と、前記試料に電子ビームを照射する電子ビーム鏡筒と、前記試料台、前記集束イオンビーム鏡筒、および電子ビーム鏡筒を収容する試料室と、前記電子ビーム鏡筒の出射面と前記試料台との間に挿入された挿入位置、および前記出射面と前記試料台との間から退出した開放位置の間で変位可能に形成された防汚板と、前記防汚板を前記挿入位置および前記開放位置の間で変位させる操作手段と、を備えたことを特徴とする。
本実施形態のFIB−SEM装置(複合荷電粒子ビーム装置)10は、集束イオンビーム(FIB)鏡筒11と、電子ビーム(EB)鏡筒12と、試料Sを載置するターンテーブルを有する試料台15と、これらを収容する試料室14とを備えている。
また、二次電子検出器17や反射電子検出器を電子ビーム鏡筒の内部に配置してSEM鏡筒とすることもできる。
防汚板22は、非磁性材料であり、かつ弾性に富んだ帯状の細長いバネ板から構成されている。バネ板としては、非磁性鋼製の薄板、りん青銅製の薄板、あるいは樹脂製の薄板などが挙げられる。本実施形態では、防汚板22としてりん青銅製の薄板からなるバネ板を用いている。こうした防汚板22は、例えば、長手方向に対して直角な断面が弧状を成す形状のものを用いている。こうした弧状のバネ板を用いることによって、防汚板22は一定の長さまでは支え無しに湾曲せずに直線を保って延びることができる。
本実施形態のFIB−SEM装置10を用いて、試料Sの断面加工および断面観察を行う際には、例えば、試料Sのうち、観察対象が存在する位置の周辺に向けて集束イオンビーム鏡筒11から集束イオンビームを照射して、断面をエッチング加工によって形成する。
以上、本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれると同様に、特許請求の範囲に記載された発明とその均等の範囲に含まれるものである。
11 集束イオンビーム(FIB)鏡筒
12 電子ビーム(EB)鏡筒
14 試料室
15 試料台
21 鏡筒防汚装置
22 防汚板
24 操作手段
Claims (7)
- 試料を載置する試料台と、
前記試料に集束イオンビームを照射する集束イオンビーム鏡筒と、
前記試料に電子ビームを照射する電子ビーム鏡筒と、
前記試料台、前記集束イオンビーム鏡筒、および電子ビーム鏡筒を収容する試料室と、
前記電子ビーム鏡筒の出射面と前記試料台との間に挿入された挿入位置、および前記出射面と前記試料台との間から退出した開放位置の間で変位可能に形成された防汚板と、
前記防汚板を前記挿入位置および前記開放位置の間で変位させる操作手段と、を備えたことを特徴とする複合荷電粒子ビーム装置。 - 前記防汚板は、前記挿入位置において前記電子ビーム鏡筒の出射面の近傍を覆うことを特徴とする請求項1記載の複合荷電粒子ビーム装置。
- 前記操作手段は、前記試料室の外部に形成されていることを特徴とする請求項1または2記載の複合荷電粒子ビーム装置。
- 前記防汚板は、非磁性材料から形成されていることを特徴とする請求項1ないし3いずれか一項記載の複合荷電粒子ビーム装置。
- 前記防汚板は、帯状の板バネ材料からなることを特徴とする請求項1ないし4いずれか一項記載の複合荷電粒子ビーム装置。
- 前記防汚板は、長手方向に沿った両側面とその近傍を支持する支持部材によって、長手方向に沿って摺動自在に支持され、該支持部材は、前記電子ビーム鏡筒の出射面と重なる位置以外に配されていることを特徴とする請求項5記載の複合荷電粒子ビーム装置。
- 前記防汚板は、長手方向に対して直角な断面が弧状を成し、前記挿入位置において両側端が中心部よりも前記電子ビーム鏡筒の出射面側に突出するように配されていることを特徴とする請求項5または6記載の複合荷電粒子ビーム装置。
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Application Number | Priority Date | Filing Date | Title |
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JP2016055758A JP2017174504A (ja) | 2016-03-18 | 2016-03-18 | 複合荷電粒子ビーム装置 |
TW106100732A TW201734443A (zh) | 2016-03-18 | 2017-01-10 | 複合帶電粒子束裝置 |
KR1020170009732A KR20170108804A (ko) | 2016-03-18 | 2017-01-20 | 복합 하전 입자 빔 장치 |
EP17161381.3A EP3223297A1 (en) | 2016-03-18 | 2017-03-16 | Dual-beam charged particle apparatus with anti-contamination shield |
US15/461,408 US20170271119A1 (en) | 2016-03-18 | 2017-03-16 | Composite charged particle beam apparatus |
CN201710160447.9A CN107204269A (zh) | 2016-03-18 | 2017-03-17 | 复合带电粒子束装置 |
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JP2016055758A JP2017174504A (ja) | 2016-03-18 | 2016-03-18 | 複合荷電粒子ビーム装置 |
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EP (1) | EP3223297A1 (ja) |
JP (1) | JP2017174504A (ja) |
KR (1) | KR20170108804A (ja) |
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JP7031859B2 (ja) * | 2018-02-20 | 2022-03-08 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、試料加工観察方法 |
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JP5237728B2 (ja) * | 2008-08-29 | 2013-07-17 | 日本電子株式会社 | 粒子線装置 |
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- 2017-01-20 KR KR1020170009732A patent/KR20170108804A/ko unknown
- 2017-03-16 US US15/461,408 patent/US20170271119A1/en not_active Abandoned
- 2017-03-16 EP EP17161381.3A patent/EP3223297A1/en not_active Withdrawn
- 2017-03-17 CN CN201710160447.9A patent/CN107204269A/zh active Pending
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Also Published As
Publication number | Publication date |
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TW201734443A (zh) | 2017-10-01 |
CN107204269A (zh) | 2017-09-26 |
US20170271119A1 (en) | 2017-09-21 |
KR20170108804A (ko) | 2017-09-27 |
EP3223297A1 (en) | 2017-09-27 |
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