JP2017171995A - Plating device - Google Patents

Plating device Download PDF

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JP2017171995A
JP2017171995A JP2016059544A JP2016059544A JP2017171995A JP 2017171995 A JP2017171995 A JP 2017171995A JP 2016059544 A JP2016059544 A JP 2016059544A JP 2016059544 A JP2016059544 A JP 2016059544A JP 2017171995 A JP2017171995 A JP 2017171995A
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plated
plating
anode electrode
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JP6715049B2 (en
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淳 平山
Atsushi Hirayama
淳 平山
薫 竪谷
Kaoru Tatsutani
薫 竪谷
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Faltec Co Ltd
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Faltec Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a plating device capable of forming a plating layer as uniform as possible even in a case of a plating-target article having a plurality of surfaces facing different directions.SOLUTION: Provided is a plating device 10 which includes: a plating tank 11 with a plating solution 12 stored therein; a plating-target article 1 soaked in the plating solution 12; and an anode electrode 14 which is soaked in the plating solution 12 and capable of being placed with a space provided from the plating-target article 1. The anode 14 is divided into a plurality of partial anode electrodes 14a, and each of the partial anode electrodes 14a is provided to be able to change its facing direction with respect to surfaces of the plating-target article 1.SELECTED DRAWING: Figure 5

Description

本発明は、めっき装置に関する。   The present invention relates to a plating apparatus.

めっき装置には、めっき液にアノード電極とカソード電極としての被めっき品を浸漬し、アノード電極と被めっき品間に通電して、被めっき品の表面に金属を析出させるものがある。   In some plating apparatuses, a product to be plated as an anode electrode and a cathode electrode is immersed in a plating solution, and a current is applied between the anode electrode and the product to be plated to deposit a metal on the surface of the product to be plated.

この種のめっき装置では、被めっき品の表面に均一にめっき層を形成するため、従来より種々の手段が提案されている。   In this type of plating apparatus, various means have been proposed in the past in order to uniformly form a plating layer on the surface of the product to be plated.

例えば、被めっき品から所定距離だけ離間して被めっき品と平行にアノード電極をめっき液に浸漬して配置し、被めっき品に対しアノード電極の離間距離を徐々に離間方向に移動させながら通電する手段が提案されている(特許文献1参照)。   For example, the anode electrode is immersed in the plating solution in parallel with the product to be plated, separated from the product to be plated, and energized while gradually moving the distance of the anode electrode away from the product to be plated. Means to do this has been proposed (see Patent Document 1).

また、アノード電極のほかに、被めっき品とほぼ同じ電位となるように配置される補助カソード電極と共に電流遮蔽板を設け、補助カソード電極及び電流遮蔽板を被めっき品のエッジ部の表面段差付近に配置して被めっき品のエッジ部付近の電流集中若しくは電流遮断を緩和する手段が提案されている(特許文献2参照)。   In addition to the anode electrode, a current shielding plate is provided together with an auxiliary cathode electrode arranged so as to have substantially the same potential as the product to be plated, and the auxiliary cathode electrode and the current shielding plate are provided near the surface step at the edge of the product to be plated. A means for relaxing current concentration or current interruption in the vicinity of an edge portion of a product to be plated has been proposed (see Patent Document 2).

特開平11−209889号公報JP 11-209889 A 特開平8−296087号公報JP-A-8-296087

しかしながら、前者の従来例では、被めっき品の表面に凹凸がある場合には、アノード電極との距離が被めっき品の位置によって異なるため、均一なめっき層を形成することができない。   However, in the former conventional example, when the surface of the product to be plated is uneven, the distance from the anode electrode varies depending on the position of the product to be plated, and thus a uniform plating layer cannot be formed.

後者の従来例では、被めっき品のエッジ部に表面段差がある場合には、対応可能であるが、それ以外の被めっき品の形態では均一なめっき層を形成することができない。   In the latter conventional example, it is possible to cope with the case where there is a surface step at the edge portion of the product to be plated, but a uniform plating layer cannot be formed in other forms of the product to be plated.

つまり、従来のめっき装置では、被めっき品の表面が平面であったり、被めっき品のエッジに表面段差があるものには対応できるが、表面が複数の異なる向きの面より形成される被めっき品にあっては、均一なめっき層を形成することができない。   In other words, in the conventional plating apparatus, the surface of the product to be plated is flat or the surface of the product to be plated has a level difference, but the surface to be plated is formed from a plurality of differently oriented surfaces. In a product, a uniform plating layer cannot be formed.

そこで、本発明は、前記した課題を解決すべくなされたものであり、複数の異なる向きの表面を有する被めっき品でも、極力均一なめっき層を形成できるめっき装置を提供することを目的とする。   Therefore, the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a plating apparatus capable of forming a uniform plating layer as much as possible even for a product to be plated having a plurality of differently oriented surfaces. .

本発明は、めっき液が入れられためっき槽と、前記めっき液に浸漬された被めっき品と、前記めっき液に浸漬され、前記被めっき品に間隔を置いて配置可能なアノード電極とを備えためっき装置において、前記アノード電極は、複数の部分アノード電極に分割されており、前記各部分アノード電極が前記被めっき品の表面に対向する面の向きをそれぞれ可変自在に設けられていることを特徴とするめっき装置である。   The present invention includes a plating tank in which a plating solution is placed, a product to be plated that is immersed in the plating solution, and an anode electrode that is immersed in the plating solution and that can be disposed at an interval from the product to be plated. In the plating apparatus, the anode electrode is divided into a plurality of partial anode electrodes, and each of the partial anode electrodes is provided so that the direction of the surface facing the surface of the product to be plated can be varied. This is a characteristic plating apparatus.

本発明によれば、各部分アノード電極の向きを変更可能であるため、各部分アノード電極の向きを被めっき品の異なる向きの表面に対してそれぞれできるだけ平行に対向配置できるため、各部分アノード電極と被めっき品の異なる向きの表面との距離をできるだけ均一にできる。従って、複数の異なる向きの表面を有する被めっき品でも、極力均一なめっき層を形成できる。   According to the present invention, since the orientation of each partial anode electrode can be changed, the orientation of each partial anode electrode can be arranged opposite to each other in parallel as much as possible with respect to the surface of the product to be plated. And the surface of the object to be plated in different directions can be made as uniform as possible. Therefore, a uniform plating layer can be formed as much as possible even with a product to be plated having a plurality of surfaces in different directions.

本発明の一実施形態を示し、被めっき品の斜視図である。1 is a perspective view of a product to be plated, showing an embodiment of the present invention. 本発明の一実施形態を示し、被めっき品をハンガーに取付けた状態の正面図である。It is a front view of the state which showed one Embodiment of this invention and attached the to-be-plated goods to the hanger. 本発明の一実施形態を示し、めっき装置の断面図である。1 is a cross-sectional view of a plating apparatus according to an embodiment of the present invention. 本発明の一実施形態を示し、複数の部分アノード電極が原点位置に位置するめっき装置の上方から見た概略図である。It is the schematic which showed one Embodiment of this invention and was seen from the upper part of the plating apparatus in which several partial anode electrodes are located in an origin position. 本発明の一実施形態を示し、複数のアノード電極がめっき位置に位置するめっき装置の上方かた見た概略図である。It is the schematic which showed one Embodiment of this invention and looked from the upper direction of the plating apparatus in which several anode electrodes are located in a plating position. 本発明の一実施形態を示し、部分アノード電極の駆動機構の平面図である。1 is a plan view of a drive mechanism for a partial anode electrode according to an embodiment of the present invention.

以下、本発明の一実施形態を図面に基づいて説明する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

図1〜図6は本発明の一実施形態を示す。図1に示すように、被めっき品1は、合成樹脂材の車両外装品である。被めっき品1は、長尺状であり、長手方向の直交方向(幅方向)のほぼ中央を頂点とし、頂点を境として左右の表面が異なる向きの傾斜面1a,1bに形成され、各傾斜面1a,1bの長手方向がほぼフラットな面に形成されている。   1 to 6 show an embodiment of the present invention. As shown in FIG. 1, the article to be plated 1 is a vehicle exterior product made of a synthetic resin material. The article to be plated 1 has a long shape, and is formed on inclined surfaces 1a and 1b having different directions on the left and right surfaces with the apex at substantially the center in the orthogonal direction (width direction) in the longitudinal direction. The longitudinal directions of the surfaces 1a and 1b are formed into flat surfaces.

図2に示すように、被めっき品1は、ハンガー13に取り付けされる。この実施形態では、ハンガー13には、その両面で4つの被めっき品1が取り付けされる。   As shown in FIG. 2, the article to be plated 1 is attached to a hanger 13. In this embodiment, the four articles 1 to be plated are attached to the hanger 13 on both sides thereof.

図3〜図5に示すように、めっき装置10は、めっき液(電解液)12が入れられためっき槽11と、被めっき品1を取付けたハンガー13と、複数のアノード電極14とを備えている。ハンガー13は、めっき槽11の上方位置と前工程の作業位置及び次工程の作業位置(例えば次工程のめっき槽)に移動できるよう水平移動可能であると共に、めっき槽11のめっき液12に浸漬したり、引き揚げたりできるよう上下方向に移動可能に構成されている。   As shown in FIGS. 3 to 5, the plating apparatus 10 includes a plating tank 11 in which a plating solution (electrolytic solution) 12 is placed, a hanger 13 to which the article to be plated 1 is attached, and a plurality of anode electrodes 14. ing. The hanger 13 can be moved horizontally so that it can move to the upper position of the plating tank 11, the work position of the previous process, and the work position of the next process (for example, the plating tank of the next process), and is immersed in the plating solution 12 of the plating tank 11. It can be moved up and down so that it can be lifted and pulled up.

各アノード電極14は、複数(この実施形態では4つ)の部分アノード電極14aに分割されている。複数の部分アノード電極14aは、各支持ロッド15によって電極台座16にそれぞれ支持されている。電極台座16は、ハンガー13に取り付けされた被めっき品1に対して遠近方向(離間・近接方向)Aに移動自在に設けられている。   Each anode electrode 14 is divided into a plurality (four in this embodiment) of partial anode electrodes 14a. The plurality of partial anode electrodes 14 a are supported on the electrode base 16 by the respective support rods 15. The electrode base 16 is provided so as to be movable in the perspective direction (separation / proximity direction) A with respect to the article 1 to be plated attached to the hanger 13.

各支持ロッド15の先端は、各部分アノード電極14aの回転軸15aを中心に回転自在(図5のB矢印方向)に支持されている。回転軸15aは、部分アノード電極14aの中心に設けられている。各部分アノード電極14aは、被めっき品1に対向する面の向きを変更できるようになっている。   The tip of each support rod 15 is supported so as to be rotatable (in the direction of arrow B in FIG. 5) about the rotation shaft 15a of each partial anode 14a. The rotating shaft 15a is provided at the center of the partial anode electrode 14a. Each partial anode electrode 14a can change the direction of the surface facing the article 1 to be plated.

具体的には、図6に示すように、電極台座16には、部分アノード電極14a毎にアクチュエータ17と、各アクチュエータ17で回転され、突出するストローク量を可変可能なボールねじ18とが設けられている。各ボールねじ18の先端は、各部分アノード電極14aに回転フローの状態で支持されている。ボールねじ18のストローク量を可変することで部分アノード電極14aの向きを可変できる。   Specifically, as shown in FIG. 6, the electrode base 16 is provided with an actuator 17 for each partial anode electrode 14 a and a ball screw 18 that is rotated by each actuator 17 and can change a protruding stroke amount. ing. The tip of each ball screw 18 is supported by each partial anode electrode 14a in a rotational flow state. By changing the stroke amount of the ball screw 18, the direction of the partial anode electrode 14a can be changed.

次に、めっき装置1によるめっき工程を説明する。先ず、図4に示すように、複数の部分アノード電極14aは、一列に並んだ状態で、被めっき品1の位置より十分に遠いアノード原点位置に位置する。ハンガー13がハンガー浸漬位置で降下され、ハンガー13に取り付けられた被めっき品1がめっき液12に浸漬される。次に、図5に示すように、複数の部分アノード電極14aは、被めっき品1に近接する位置まで直線移動され、その後、各部分アノード電極14aは、被めっき品1の各対向する傾斜面1a,1bに対してほぼ平行に対向配置されるように、被めっき品1に対向する面の向きがそれぞれ調整される。   Next, the plating process by the plating apparatus 1 will be described. First, as shown in FIG. 4, the plurality of partial anode electrodes 14 a are positioned in an anode origin position sufficiently far from the position of the article to be plated 1 in a state where they are arranged in a line. The hanger 13 is lowered at the hanger immersion position, and the article to be plated 1 attached to the hanger 13 is immersed in the plating solution 12. Next, as shown in FIG. 5, the plurality of partial anode electrodes 14 a are linearly moved to a position close to the product to be plated 1, and then each partial anode electrode 14 a is inclined to each of the opposed inclined surfaces of the product 1 to be plated. The orientations of the surfaces facing the article to be plated 1 are adjusted so as to face each other substantially parallel to 1a and 1b.

次に、被めっき品1と複数の部分アノード電極14aとの間に電圧を印加し、所定時間だけ通電する。これにより、被めっき品1の表面(傾斜面1a,1bを含む)に金属が析出し、被めっき品1の表面(傾斜面1a,1bを含む)にめっき層(図示せず)が形成される。所定時間の通電が終了すると、ハンガー13を引き上げ、被めっき品1がめっき槽11より引き上げられる。これで、当該めっき工程が完了する。   Next, a voltage is applied between the article to be plated 1 and the plurality of partial anode electrodes 14a, and electricity is applied for a predetermined time. Thereby, a metal deposits on the surface (including the inclined surfaces 1a and 1b) of the product 1 to be plated, and a plating layer (not shown) is formed on the surface (including the inclined surfaces 1a and 1b) of the product 1 to be plated. The When energization for a predetermined time is completed, the hanger 13 is pulled up, and the article to be plated 1 is pulled up from the plating tank 11. This completes the plating step.

以上説明したように、各部分アノード電極14aの向きを変更可能であるため、各部分アノード電極14aの向きを被めっき品1の異なる向きの各傾斜面1a,1bに対してそれぞれできるだけ平行に対向配置できるため、各部分アノード電極14aと被めっき品1の異なる向きの各傾斜面1a,1bとの距離をできるだけ均一にできる。従って、複数の異なる向きの表面を有する被めっき品1において、極力均一なめっき層(図示せず)を形成できる。   As described above, since the orientation of each partial anode electrode 14a can be changed, the orientation of each partial anode electrode 14a is opposed to each inclined surface 1a, 1b in a different direction of the article 1 as parallel as possible. Since it can arrange | position, the distance of each partial anode electrode 14a and each inclined surface 1a, 1b of the different direction of the to-be-plated goods 1 can be made as uniform as possible. Therefore, a uniform plating layer (not shown) can be formed as much as possible in the article to be plated 1 having a plurality of differently oriented surfaces.

各部分アノード電極14aは、回転自在に設けられ、回転によって被めっき品1の表面の傾斜面1a,1bに平行に対向するよう向きをそれぞれ可変自在である。従って、部分アノード電極14aに回転機構を適用すれば良いため、簡単な構造によって部分アノード電極14aの向きを可変できる。   Each partial anode electrode 14a is rotatably provided, and its direction can be changed by rotation so as to face the inclined surfaces 1a and 1b of the surface of the article 1 to be plated in parallel. Therefore, since a rotation mechanism may be applied to the partial anode electrode 14a, the orientation of the partial anode electrode 14a can be changed with a simple structure.

各部分アノード電極14aは、被めっき品1の表面に対する向きを二次元で可変可能に設けられている。従って、被めっき品1の表面が二次元で異なる向きを有する場合に、ほぼ平行配置できる。各部分アノード電極14aは、被めっき品1の表面に対する向きを三次元で可変可能に設けても良い。このように構成すれば、被めっき品1の表面が三次元で異なる向きを有する場合にも、ほぼ平行配置できる。   Each partial anode electrode 14a is provided so that the direction with respect to the surface of the article to be plated 1 can be varied in two dimensions. Therefore, when the surface of the article to be plated 1 has two different directions in two dimensions, it can be arranged substantially in parallel. Each partial anode electrode 14a may be provided so that its orientation relative to the surface of the article to be plated 1 can be varied in three dimensions. If comprised in this way, even when the surface of the to-be-plated goods 1 has a different direction in three dimensions, it can arrange substantially in parallel.

この実施形態では、複数の部分アノード電極14aは、被めっき品1との間隔を一律に可変できるため、単一の駆動機構によって複数の部分アノード電極14aを移動できる。各部分アノード電極14aは、被めっき品1との間隔を可変する方向にそれぞれ個々に移動可能に設けても良い。このようにすれば、各部分アノード電極14a毎に被めっき品1の対向表面との間隔を自由に調整できる。   In this embodiment, since the space | interval with the to-be-plated goods 1 can change uniformly the some partial anode electrode 14a, the some partial anode electrode 14a can be moved with a single drive mechanism. Each partial anode electrode 14a may be provided so as to be individually movable in a direction in which the distance from the article to be plated 1 is varied. If it does in this way, the space | interval with the opposing surface of the to-be-plated goods 1 can be freely adjusted for every partial anode electrode 14a.

この実施形態では、アノード電極14は、4つの部分アノード電極14aに分割されているが、分割個数を問わない。アノード電極14aの分割数が多ければ多いほど、被めっき品1の異なる向きの表面が複雑なものに対応でき、ほぼ均一厚みでめっき処理が可能である。   In this embodiment, the anode electrode 14 is divided into four partial anode electrodes 14a, but the number of divisions is not limited. The greater the number of divisions of the anode electrode 14a, the more the surface of the article to be plated 1 can be dealt with in a more complicated manner, and the plating process can be performed with a substantially uniform thickness.

この実施形態では、複数の部分アノード電極14aに同一電圧を印加するよう構成されているが、各部分アノード電極14a毎に異なる電圧を印加できるよう構成しても良い。このように構成すれば、被めっき品1の対向する表面の状況等によって、均一なめっき厚形成のために、更にきめ細かい制御が可能である。   In this embodiment, the same voltage is applied to the plurality of partial anodes 14a. However, a different voltage may be applied to each partial anode 14a. If comprised in this way, according to the condition of the surface which the to-be-plated goods 1 oppose, etc., finer control is possible for uniform plating thickness formation.

この実施形態では、従来のように補助カソード電極を用いないため、めっき液12の組成が徐々に悪化したり、めっき液12の管理が面倒になったり、コストが高くなったりという不具合が生じない。   In this embodiment, since the auxiliary cathode electrode is not used as in the prior art, there is no problem that the composition of the plating solution 12 gradually deteriorates, the management of the plating solution 12 becomes troublesome, and the cost increases. .

1 被めっき品
1a,1b 傾斜面
10 めっき装置
11 めっき槽
12 めっき液
14 アノード電極
14a 部分アノード電極
DESCRIPTION OF SYMBOLS 1 Product to be plated 1a, 1b Inclined surface 10 Plating apparatus 11 Plating tank 12 Plating solution 14 Anode electrode 14a Partial anode electrode

Claims (5)

めっき液が入れられためっき槽と、前記めっき液に浸漬された被めっき品と、前記めっき液に浸漬され、前記被めっき品に間隔を置いて配置可能なアノード電極とを備えためっき装置において、
前記アノード電極は、複数の部分アノード電極に分割されており、前記各部分アノード電極が前記被めっき品の表面に対する向きをそれぞれ可変自在に設けられていることを特徴とするめっき装置。
In a plating apparatus comprising: a plating tank in which a plating solution is placed; a product to be plated immersed in the plating solution; and an anode electrode which is immersed in the plating solution and can be arranged at intervals on the product to be plated ,
2. The plating apparatus according to claim 1, wherein the anode electrode is divided into a plurality of partial anode electrodes, and each of the partial anode electrodes is provided so that its direction relative to the surface of the article to be plated can be varied.
請求項1記載のめっき装置であって、
前記各部分アノード電極は、回転自在に設けられ、回転によって前記被めっき品の表面に対する向きをそれぞれ可変自在であることを特徴とするめっき装置。
The plating apparatus according to claim 1,
Each said partial anode electrode is provided rotatably, The direction with respect to the surface of the said to-be-plated goods can be each changed by rotation, The plating apparatus characterized by the above-mentioned.
請求項1又は請求項2記載のめっき装置であって、
前記各部分アノード電極は、前記被めっき品の表面に対する向きを二次元で可変可能に設けられていることを特徴とするめっき装置。
The plating apparatus according to claim 1 or 2,
Each said partial anode electrode is provided with the direction with respect to the surface of the said to-be-plated goods so that variable in two dimensions is possible.
請求項1又は請求項2記載のめっき装置であって、
前記各部分アノード電極は、前記被めっき品の表面に対する向きを三次元で可変可能に設けられていることを特徴とするめっき装置。
The plating apparatus according to claim 1 or 2,
Each said partial anode electrode is provided with the direction with respect to the surface of the said to-be-plated goods so that variable in three dimensions is possible.
請求項1〜請求項4のいずれかに記載のめっき装置であって、
前記各部分アノード電極は、前記被めっき品との間隔を可変する方向にそれぞれ移動可能に設けられていることを特徴とするめっき装置。
The plating apparatus according to any one of claims 1 to 4, wherein
Each of the partial anode electrodes is provided so as to be movable in a direction in which the distance from the article to be plated is variable.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910828A (en) * 1972-06-01 1974-01-30
JPS52139632A (en) * 1976-05-18 1977-11-21 Suzuki Motor Co Plating anode
JPH03285097A (en) * 1990-03-30 1991-12-16 Mitsubishi Materials Corp Anode for electroplating and electroplating method
JP2000045093A (en) * 1998-07-27 2000-02-15 Mitsubishi Heavy Ind Ltd Electrode die of rotor for rubber kneading machine and plating method
WO2012043514A1 (en) * 2010-09-30 2012-04-05 株式会社シンク・ラボラトリー Cylinder plating method and device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910828A (en) * 1972-06-01 1974-01-30
JPS52139632A (en) * 1976-05-18 1977-11-21 Suzuki Motor Co Plating anode
JPH03285097A (en) * 1990-03-30 1991-12-16 Mitsubishi Materials Corp Anode for electroplating and electroplating method
JP2000045093A (en) * 1998-07-27 2000-02-15 Mitsubishi Heavy Ind Ltd Electrode die of rotor for rubber kneading machine and plating method
WO2012043514A1 (en) * 2010-09-30 2012-04-05 株式会社シンク・ラボラトリー Cylinder plating method and device

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