JP2017158090A - Bawデバイス及びbawデバイスの製造方法 - Google Patents
Bawデバイス及びbawデバイスの製造方法 Download PDFInfo
- Publication number
- JP2017158090A JP2017158090A JP2016041026A JP2016041026A JP2017158090A JP 2017158090 A JP2017158090 A JP 2017158090A JP 2016041026 A JP2016041026 A JP 2016041026A JP 2016041026 A JP2016041026 A JP 2016041026A JP 2017158090 A JP2017158090 A JP 2017158090A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- baw device
- elastic wave
- diffusion region
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 102
- 238000009792 diffusion process Methods 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 description 12
- 238000010897 surface acoustic wave method Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 5
- 230000001902 propagating effect Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
- H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0004—Impedance-matching networks
- H03H9/0014—Impedance-matching networks using bulk acoustic wave devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/0023—Balance-unbalance or balance-balance networks
- H03H9/0095—Balance-unbalance or balance-balance networks using bulk acoustic wave devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/175—Acoustic mirrors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
- H10N30/085—Shaping or machining of piezoelectric or electrostrictive bodies by machining
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/025—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks comprising an acoustic mirror
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
波長:532nm(YVO4パルスレーザー)
繰り返し周波数:200kHz
出力:0.2W
波長:1064nm(YVO4パルスレーザー)
繰り返し周波数:100kHz
出力:1W〜1.5W
移動速さ(加工送り速さ):100mm/s
13 基板
13a 第1面(表面)
13b 第2面(裏面)
15 共振ユニット
17 音響多層膜
19 第1の膜
21 第2の膜
23 共振器(圧電素子)
25 下部電極
27 圧電膜
29 上部電極
31 弾性波拡散領域
33 基板
33a 第1面(表面)
33b 第2面(裏面)
35 分割予定ライン(ストリート)
37 保護テープ
39 改質層
41 ダイシングテープ
43 フレーム
L1,L2 レーザー光線
2 レーザー加工装置
4 基台
6 チャックテーブル
6a 保持面
8 水平移動機構
10 X軸ガイドレール
12 X軸移動テーブル
14 X軸ボールネジ
16 X軸パルスモータ
18 X軸スケール
20 Y軸ガイドレール
22 Y軸移動テーブル
24 Y軸ボールネジ
26 Y軸パルスモータ
28 Y軸スケール
30 支持台
32 支持構造
34 支持アーム
36 レーザー照射ユニット
38 カメラ
62 エキスパンド装置
64 支持構造
66 拡張ドラム
68 フレーム支持テーブル
70 クランプ
72 昇降機構
74 シリンダケース
76 ピストンロッド
Claims (2)
- 基板と、該基板の表面に形成された圧電素子と、を備えるBAWデバイスであって、
該基板の裏面側には、該基板の裏面を部分的に溶融して形成される凹部を含む弾性波拡散領域が設けられていることを特徴とするBAWデバイス。 - 請求項1に記載のBAWデバイスを製造するBAWデバイスの製造方法であって、
該基板の裏面側から該基板に対して吸収性を有する波長のレーザー光線を照射し、該基板の裏面を部分的に溶融することで、凹部を含む弾性波拡散領域を形成する弾性波拡散領域形成工程を備えることを特徴とするBAWデバイスの製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016041026A JP6699927B2 (ja) | 2016-03-03 | 2016-03-03 | Bawデバイス及びbawデバイスの製造方法 |
TW106104624A TW201742377A (zh) | 2016-03-03 | 2017-02-13 | 體聲波(baw)器件及體聲波器件的製造方法 |
CN201710116128.8A CN107154456A (zh) | 2016-03-03 | 2017-03-01 | 体弹性波器件和体弹性波器件的制造方法 |
DE102017104222.9A DE102017104222A1 (de) | 2016-03-03 | 2017-03-01 | BAW-Bauelement und Herstellungsverfahren für ein BAW-Bauelement |
US15/447,534 US20170257075A1 (en) | 2016-03-03 | 2017-03-02 | Baw device and baw device manufacturing method |
KR1020170027027A KR20170103677A (ko) | 2016-03-03 | 2017-03-02 | Baw 디바이스 및 baw 디바이스의 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016041026A JP6699927B2 (ja) | 2016-03-03 | 2016-03-03 | Bawデバイス及びbawデバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017158090A true JP2017158090A (ja) | 2017-09-07 |
JP6699927B2 JP6699927B2 (ja) | 2020-05-27 |
Family
ID=59650868
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016041026A Active JP6699927B2 (ja) | 2016-03-03 | 2016-03-03 | Bawデバイス及びbawデバイスの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20170257075A1 (ja) |
JP (1) | JP6699927B2 (ja) |
KR (1) | KR20170103677A (ja) |
CN (1) | CN107154456A (ja) |
DE (1) | DE102017104222A1 (ja) |
TW (1) | TW201742377A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019054082A (ja) * | 2017-09-14 | 2019-04-04 | 株式会社ディスコ | ウェーハの加工方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10347534B2 (en) * | 2017-09-12 | 2019-07-09 | Nxp B.V. | Variable stealth laser dicing process |
JP7195758B2 (ja) * | 2018-04-19 | 2022-12-26 | 株式会社ディスコ | Sawデバイスの製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55147819A (en) * | 1979-05-09 | 1980-11-18 | Toshiba Corp | Working method of substrate for elastic surface wave filter |
JP2000278090A (ja) * | 1999-01-21 | 2000-10-06 | Hokuriku Electric Ind Co Ltd | 弾性表面波素子とその製造方法 |
JP2004336503A (ja) * | 2003-05-09 | 2004-11-25 | Fujitsu Media Device Kk | 弾性表面波素子及びその製造方法 |
JP2005509348A (ja) * | 2001-11-06 | 2005-04-07 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | フィルタ装置およびその製造方法 |
JP2005538643A (ja) * | 2002-09-12 | 2005-12-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | バルク弾性波フィルタにおける通過帯域リップルを抑制する手段を有するバルク弾性波共振器 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003008396A (ja) | 2001-06-22 | 2003-01-10 | Japan Radio Co Ltd | 弾性表面波素子及びその製造方法 |
US7982363B2 (en) * | 2007-05-14 | 2011-07-19 | Cree, Inc. | Bulk acoustic device and method for fabricating |
WO2010147772A1 (en) * | 2009-06-19 | 2010-12-23 | Georgia Tech Research Corporation | Methods of forming micromechanical resonators having high density trench arrays therein that provide passive temperature compensation |
US9571061B2 (en) * | 2014-06-06 | 2017-02-14 | Akoustis, Inc. | Integrated circuit configured with two or more single crystal acoustic resonator devices |
-
2016
- 2016-03-03 JP JP2016041026A patent/JP6699927B2/ja active Active
-
2017
- 2017-02-13 TW TW106104624A patent/TW201742377A/zh unknown
- 2017-03-01 CN CN201710116128.8A patent/CN107154456A/zh active Pending
- 2017-03-01 DE DE102017104222.9A patent/DE102017104222A1/de not_active Withdrawn
- 2017-03-02 KR KR1020170027027A patent/KR20170103677A/ko unknown
- 2017-03-02 US US15/447,534 patent/US20170257075A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55147819A (en) * | 1979-05-09 | 1980-11-18 | Toshiba Corp | Working method of substrate for elastic surface wave filter |
JP2000278090A (ja) * | 1999-01-21 | 2000-10-06 | Hokuriku Electric Ind Co Ltd | 弾性表面波素子とその製造方法 |
JP2005509348A (ja) * | 2001-11-06 | 2005-04-07 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | フィルタ装置およびその製造方法 |
JP2005538643A (ja) * | 2002-09-12 | 2005-12-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | バルク弾性波フィルタにおける通過帯域リップルを抑制する手段を有するバルク弾性波共振器 |
JP2004336503A (ja) * | 2003-05-09 | 2004-11-25 | Fujitsu Media Device Kk | 弾性表面波素子及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019054082A (ja) * | 2017-09-14 | 2019-04-04 | 株式会社ディスコ | ウェーハの加工方法 |
Also Published As
Publication number | Publication date |
---|---|
CN107154456A (zh) | 2017-09-12 |
DE102017104222A1 (de) | 2017-09-07 |
TW201742377A (zh) | 2017-12-01 |
US20170257075A1 (en) | 2017-09-07 |
JP6699927B2 (ja) | 2020-05-27 |
KR20170103677A (ko) | 2017-09-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110829997B (zh) | 薄膜体声波谐振器及其制造方法 | |
TWI681626B (zh) | Baw元件及baw元件之製造方法 | |
JP6699927B2 (ja) | Bawデバイス及びbawデバイスの製造方法 | |
JP6426089B2 (ja) | 弾性波デバイス | |
JP2019054082A (ja) | ウェーハの加工方法 | |
CN110391793B (zh) | 声表面波器件的制造方法 | |
TW201707078A (zh) | 表面聲波裝置之製造方法 | |
JP6991656B2 (ja) | チップの製造方法 | |
JP6985060B2 (ja) | ウエーハの加工方法 | |
JP2019218235A (ja) | チップの製造方法 | |
JP2019220581A (ja) | チップの製造方法 | |
TWI757482B (zh) | 被加工物的加工方法 | |
TW202040935A (zh) | Saw濾波器之製造方法以及saw濾波器 | |
JP2018042209A (ja) | 表面弾性波デバイスチップの製造方法 | |
JP2019186426A (ja) | チップの製造方法 | |
JP7191459B2 (ja) | チップの製造方法 | |
JP6973916B2 (ja) | チップの製造方法 | |
JP6976647B2 (ja) | チップの製造方法 | |
JP6987436B2 (ja) | チップの製造方法 | |
JP6973927B2 (ja) | チップの製造方法 | |
JP6976654B2 (ja) | チップの製造方法 | |
JP7013092B2 (ja) | チップの製造方法 | |
JP6987437B2 (ja) | チップの製造方法 | |
JP2004357049A (ja) | 圧電振動子の製造方法 | |
JP2019220583A (ja) | チップの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190117 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191023 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191223 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200428 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200428 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6699927 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |