JPS55147819A - Working method of substrate for elastic surface wave filter - Google Patents

Working method of substrate for elastic surface wave filter

Info

Publication number
JPS55147819A
JPS55147819A JP5568479A JP5568479A JPS55147819A JP S55147819 A JPS55147819 A JP S55147819A JP 5568479 A JP5568479 A JP 5568479A JP 5568479 A JP5568479 A JP 5568479A JP S55147819 A JPS55147819 A JP S55147819A
Authority
JP
Japan
Prior art keywords
main face
substrate
wave filter
surface wave
elastic surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5568479A
Other languages
Japanese (ja)
Inventor
Teruo Kurokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5568479A priority Critical patent/JPS55147819A/en
Publication of JPS55147819A publication Critical patent/JPS55147819A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To eliminate the influence of the bulk wave by subjecting the main face to a processing using grain to make the main face rough after working the main face by irradiation of a laser light to form a groove when the second main face opposite to the first main face of the piezoelectric substrate for elastic surface wave filter is made rough. CONSTITUTION:The main face of a substrate for elastic surface wave filter is made rough by laser processing machine 10. That is, laser working machine 10 consists of laser oscillator 11 and beam scanning unit 13 which receives the laser light reflected by mirror 12. The laser light is irradiated to the main face, which should be made rough, of substrate 15 to form a groove by this processing machine 10, and further, grain is used to polish it, thus achieving a desired roughing.
JP5568479A 1979-05-09 1979-05-09 Working method of substrate for elastic surface wave filter Pending JPS55147819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5568479A JPS55147819A (en) 1979-05-09 1979-05-09 Working method of substrate for elastic surface wave filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5568479A JPS55147819A (en) 1979-05-09 1979-05-09 Working method of substrate for elastic surface wave filter

Publications (1)

Publication Number Publication Date
JPS55147819A true JPS55147819A (en) 1980-11-18

Family

ID=13005719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5568479A Pending JPS55147819A (en) 1979-05-09 1979-05-09 Working method of substrate for elastic surface wave filter

Country Status (1)

Country Link
JP (1) JPS55147819A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017158090A (en) * 2016-03-03 2017-09-07 株式会社ディスコ Baw device and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017158090A (en) * 2016-03-03 2017-09-07 株式会社ディスコ Baw device and method of manufacturing the same

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