JP2017146616A - Transfer body for optical film, optical film, production method of transfer body for optical film, and production method of optical film - Google Patents

Transfer body for optical film, optical film, production method of transfer body for optical film, and production method of optical film Download PDF

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JP2017146616A
JP2017146616A JP2017089752A JP2017089752A JP2017146616A JP 2017146616 A JP2017146616 A JP 2017146616A JP 2017089752 A JP2017089752 A JP 2017089752A JP 2017089752 A JP2017089752 A JP 2017089752A JP 2017146616 A JP2017146616 A JP 2017146616A
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retardation layer
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JP6388053B2 (en
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章伸 牛山
Akinobu Ushiyama
章伸 牛山
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Dai Nippon Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To effectively avoid scratches in a retardation layer in a configuration of producing an optical film by bonding the retardation layers with an adhesive layer or the like.SOLUTION: The transfer body 71 for an optical film includes a support substrate 25 and a transfer layer 66. The transfer layer 66 includes a 1/4 wavelength retardation layer 18 for imparting a retardation of 1/4 wavelength to at least transmitted light, a 1/2 wavelength retardation layer 19 for imparting a retardation of 1/2 wavelength to the transmitted light, and an adhesive layer 20 for adhering the 1/4 wavelength retardation layer 18 and the 1/2 wavelength retardation layer 19. The 1/2 wavelength retardation layer 19, which is as an outermost layer of the transfer layer 66 on a side opposite to the support substrate 25, has greater hardness relative to the support substrate 25.SELECTED DRAWING: Figure 10

Description

本発明は、例えば1/4波長板を1/2波長位相差層及び1/4波長位相差層の積層により構成する光学フィルムに関する。   The present invention relates to an optical film in which, for example, a quarter wavelength plate is formed by stacking a half wavelength retardation layer and a quarter wavelength retardation layer.

従来、画像表示装置に関して、画像表示パネルのパネル面(視聴者側面)に円偏光板による光学フィルムを配置し、この光学フィルムにより外来光の反射を低減する方法が提案されている。ここでこの光学フィルムは、直線偏光板、1/4波長板の積層により構成され、画像表示パネルのパネル面に向かう外来光を直線偏光板により直線偏光に変換し、続く1/4波長板により円偏光に変換する。ここでこの円偏光による外来光は、画像表示パネルの表面等で反射するものの、この反射の際に偏光面の回転方向が逆転する。その結果、この反射光は、到来時とは逆に、1/4波長板により、直線偏光板で遮光される方向の直線偏光に変換された後、続く直線偏光板により遮光され、その結果、外部への出射が著しく抑制される。   Conventionally, regarding an image display device, a method has been proposed in which an optical film made of a circularly polarizing plate is arranged on the panel surface (viewer side surface) of an image display panel, and reflection of extraneous light is reduced by this optical film. Here, this optical film is composed of a laminate of a linear polarizing plate and a quarter-wave plate, and converts external light directed to the panel surface of the image display panel into linearly-polarized light by the linear polarizing plate, followed by a quarter-wave plate. Convert to circularly polarized light. Here, the extraneous light by the circularly polarized light is reflected by the surface of the image display panel or the like, but the rotation direction of the polarization plane is reversed during the reflection. As a result, contrary to the arrival time, this reflected light is converted into linearly polarized light in the direction shielded by the linear polarizing plate by the quarter wavelength plate, and then shielded by the subsequent linear polarizing plate. Outgoing emission is significantly suppressed.

この光学フィルムに関して、特許文献1等には、透過光に1/2波長分の位相差を付与する1/2波長位相差層、透過光に1/4波長分の位相差を付与する1/4波長位相差層を積層して1/4波長板を構成することにより、正の分散特性による液晶材料を使用して1/4波長板を逆分散特性により機能させる方法が提案されている。なおここで逆分散特性とは、短波長側ほど透過光における位相差が小さい波長分散特性である。   With regard to this optical film, Patent Document 1 and the like include a 1/2 wavelength phase difference layer that imparts a phase difference of ½ wavelength to transmitted light, and a 1 / wavelength that imparts a phase difference of ¼ wavelength to transmitted light. A method has been proposed in which a quarter-wave plate is formed by laminating four-wavelength retardation layers to use a liquid crystal material having a positive dispersion characteristic so that the quarter-wave plate functions with a reverse dispersion characteristic. Here, the reverse dispersion characteristic is a wavelength dispersion characteristic in which the phase difference in transmitted light is smaller as the wavelength is shorter.

1/2波長位相差層、1/4波長位相差層等は、配向膜の配向規制力により液晶材料を配向させた状態で、この液晶材料を固化(硬化)させることにより作成することができる。より具体的に、この種の位相差層は、重合性液晶モノマーを配向膜上に積層した後、相転移点まで昇温し、その後紫外線照射等より重合させて液晶の配向状態を固定することにより作製される。また配向膜は、例えば賦型用金型を使用した賦型処理により賦型用金型に作成された微細な凹凸形状を転写して作成することができ、またいわゆる光配向の手法によっても作成することができる。   The half-wave retardation layer, the quarter-wave retardation layer, and the like can be created by solidifying (curing) the liquid crystal material in a state where the liquid crystal material is aligned by the alignment regulating force of the alignment film. . More specifically, this type of retardation layer is formed by laminating a polymerizable liquid crystal monomer on an alignment film, raising the temperature to the phase transition point, and then polymerizing by ultraviolet irradiation or the like to fix the alignment state of the liquid crystal. It is produced by. In addition, the alignment film can be created by transferring the fine uneven shape created in the shaping mold by, for example, a shaping process using the shaping mold, or by a so-called photo-alignment technique. can do.

ところで1/2波長位相差層、1/4波長位相差層をそれぞれ個別に作成した後、接着層により貼り合わせることにより、1/2波長位相差層、1/4波長位相差層の積層体により1/4波長板を作製することができると考えられる。またこのとき1/2波長位相差層、1/4波長位相差層を接着剤による接着層により直接貼り合わせることにより、全体の厚みを薄くすることができると考えられる。   By the way, after the ½ wavelength phase difference layer and the ¼ wavelength phase difference layer are individually formed and then bonded together by an adhesive layer, a laminate of the ½ wavelength phase difference layer and the ¼ wavelength phase difference layer is obtained. Thus, it is considered that a quarter wavelength plate can be produced. At this time, it is considered that the entire thickness can be reduced by directly bonding the ½ wavelength retardation layer and the ¼ wavelength retardation layer with an adhesive layer made of an adhesive.

このようにして積層体を作製する場合、位相差層の傷付きを有効に回避することが求められる。   Thus, when producing a laminated body, it is calculated | required to avoid the damage | wound of a phase difference layer effectively.

特開平10−68816号公報JP-A-10-68816 特開2000−284126号公報JP 2000-284126 A

本発明はこのような状況に鑑みてなされたものであり、位相差層を接着層等により貼り合せて光学フィルムを作製する構成において、位相差層等の傷付きを有効に回避することができるようにする。   The present invention has been made in view of such circumstances, and in a configuration in which an optical film is produced by laminating a retardation layer with an adhesive layer or the like, scratches on the retardation layer or the like can be effectively avoided. Like that.

本発明者は、上記課題を解決するために鋭意研究を重ね、転写法により1/2波長位相差層及び1/4波長位相差層の積層体を直線偏光板に貼り合せるようにして、この転写法の適用により取り除かれる支持体基材が傷付くように設定して位相差層の傷つきを有効に回避するとの着想に至り、本発明を完成するに至った。   In order to solve the above-mentioned problems, the present inventor has made extensive studies, and by laminating a laminate of a ½ wavelength retardation layer and a ¼ wavelength retardation layer on a linear polarizing plate by a transfer method, The idea of effectively preventing the retardation layer from being damaged by setting the support substrate to be removed by application of the transfer method was reached, and the present invention was completed.

(1) 支持体基材と、転写層とを備えた光学フィルム用転写体であって、
前記転写層は、
少なくとも透過光に1/4波長分の位相差を付与する1/4波長位相差層と、透過光に1/2波長分の位相差を付与する1/2波長位相差層と、前記1/4波長位相差層及び前記1/2波長位相差層とを接着する接着層とを備え、
前記支持体基材に対して、最外層の硬度が大きい。
(1) A transfer body for an optical film comprising a support substrate and a transfer layer,
The transfer layer is
A quarter-wave retardation layer that imparts at least a quarter-wave phase difference to transmitted light; a half-wave retardation layer that imparts a half-wave phase difference to transmitted light; An adhesive layer that bonds the four-wavelength retardation layer and the ½-wavelength retardation layer;
The outermost layer has a higher hardness than the support substrate.

(1)によれば、積層による傷付きが支持体基材側で発生することになり、最外層の傷つきを防止することができ、その結果、位相差層等の傷付きを有効に回避することができる。   According to (1), damage due to lamination occurs on the support substrate side, and damage to the outermost layer can be prevented, and as a result, damage to the retardation layer and the like is effectively avoided. be able to.

(2) (1)において、
前記支持体基材を内側にしたロール体である。
(2) In (1),
It is a roll body which made the said support base material inside.

(2)によれば、ロールによる巻き取りおける積層に関して、最外層の傷つきを防止することができ、その結果、位相差層等の傷付きを有効に回避することができる。   According to (2), it is possible to prevent the outermost layer from being damaged with respect to the stacking that can be wound by the roll, and as a result, it is possible to effectively avoid the scratch of the retardation layer and the like.

(3) (1)又は(2)において、
前記転写層は、
前記支持体基材側より、前記1/4波長位相差層に係る1/4波長位相差層用配向膜、前記1/4波長位相差層、前記接着層、前記1/2波長位相差層、前記1/2波長位相差層に係る1/2波長位相差層用配向膜であり、
前記最外層が前記1/2波長位相差層用配向膜である。
(3) In (1) or (2),
The transfer layer is
From the support substrate side, an alignment film for a quarter wavelength retardation layer, the quarter wavelength retardation layer, the adhesive layer, and the half wavelength retardation layer according to the quarter wavelength retardation layer. , An alignment film for a ½ wavelength retardation layer according to the ½ wavelength retardation layer,
The outermost layer is the alignment film for a ½ wavelength retardation layer.

(3)によれば、1/4波長位相差層用配向膜、1/4波長位相差層、接着層、1/2波長位相差層、1/2波長位相差層用配向膜により転写層を構成する場合に、1/2波長位相差層用配向膜の傷付きを有効に回避することができる。   According to (3), the transfer layer includes the alignment film for 1/4 wavelength retardation layer, the 1/4 wavelength retardation layer, the adhesive layer, the 1/2 wavelength retardation layer, and the alignment film for 1/2 wavelength retardation layer. Can be effectively avoided from being scratched on the alignment film for a half-wave retardation layer.

(4) (1)又は(2)において、
前記転写層は、
前記支持体基材側より、前記1/4波長位相差層、前記接着層、前記1/2波長位相差層であり、
前記最外層が前記1/2波長位相差層である。
(4) In (1) or (2),
The transfer layer is
From the support substrate side, the 1/4 wavelength retardation layer, the adhesive layer, the 1/2 wavelength retardation layer,
The outermost layer is the half-wave retardation layer.

(4)によれば、1/4波長位相差層、接着層、1/2波長位相差層により転写層を構成する場合に、1/2波長位相差層の傷付きを有効に回避することができる。   According to (4), when the transfer layer is constituted by the quarter-wave retardation layer, the adhesive layer, and the half-wave retardation layer, the scratch of the half-wave retardation layer is effectively avoided. Can do.

(5) (1)、(2)、(3)、又は(4)において、
前記硬度が、鉛筆硬度Hである。
(5) In (1), (2), (3), or (4),
The hardness is a pencil hardness H.

(5)によれば、簡易な構成により位相差層等の傷付きを有効に回避することができる。   According to (5), scratches such as the retardation layer can be effectively avoided with a simple configuration.

(6) (1)、(2)、(3)、(4)、又は(5)に記載の光学フィルム用転写体の前記転写層を、直線偏光板と貼り合せて光学フィルムを構成する。   (6) The transfer layer of the transfer member for an optical film described in (1), (2), (3), (4), or (5) is bonded to a linear polarizing plate to constitute an optical film.

(6)によれば、傷付きを有効に回避してなる位相差層等により光学フィルムを構成することができる。   According to (6), an optical film can be comprised with the phase difference layer etc. which avoid a damage | wound effectively.

(7) 支持体基材と、転写層とを備えた光学フィルム用転写体の製造方法であって、
前記支持体基材上に、1/4波長位相差層用配向膜を作製して、前記支持体基材、1/4波長位相差層用配向膜の積層体を作製する1/4波長位相差層用配向膜作製工程と、
前記支持体基材、1/4波長位相差層用配向膜の積層体に、1/4波長位相差層を作製して、前記支持体基材、1/4波長位相差層用配向膜、1/4波長位相差層の積層体を作製する1/4波長位相差層作製工程と、
1/2波長位相差層用の基材の上に、1/2波長位相差層用配向膜を作製して、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜の積層体を作製する1/2波長位相差層用配向膜作製工程と、
前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜の積層体に、1/2波長位相差層を作製して、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜、1/2波長位相差層の積層体を作製する1/2波長位相差層作製工程と、
前記1/4波長位相差層及び1/2波長位相差層を貼り合せて、前記支持体基材、1/4波長位相差層用配向膜、1/4波長位相差層の積層体と、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜、1/2波長位相差層の積層体とを一体化する貼り合せ工程と、
前記貼り合せ工程により一体化した積層体から前記1/2波長位相差層用の基材、若しくは前記1/2波長位相差層用の基材及び前記1/2波長位相差層用配向膜の積層体を剥離する剥離工程とを備え、
前記1/2波長位相差層用配向膜作製工程又は前記1/2波長位相差層作製工程は、
前記支持体基材に対して、前記転写層の最外層の硬度が大きくなるように、前記1/2波長位相差層用配向膜又は前記1/2波長位相差層を作製する。
(7) A method for producing a transfer body for an optical film comprising a support substrate and a transfer layer,
1/4 wavelength retardation layer is prepared on the support substrate, and a laminate of the support substrate and 1/4 wavelength retardation layer alignment film is prepared. A step of preparing an alignment film for the phase difference layer;
A quarter-wave retardation layer is prepared in a laminate of the support substrate and the quarter-wave retardation layer alignment film, and the support substrate, the quarter-wave retardation layer alignment film, A quarter-wave retardation layer producing step of producing a laminate of quarter-wave retardation layers;
An alignment film for a ½ wavelength retardation layer is prepared on a substrate for a ½ wavelength retardation layer, and the substrate for the ½ wavelength retardation layer, the ½ wavelength retardation layer is formed. An alignment film preparation step for a half-wave retardation layer for preparing a laminate of alignment films for use;
A half-wave retardation layer was prepared on the laminate of the base material for the half-wave retardation layer and the alignment film for the half-wave retardation layer. A half-wave retardation layer producing step of producing a laminate of a substrate, a half-wave retardation layer alignment film, and a half-wave retardation layer;
Laminating the ¼ wavelength retardation layer and the ½ wavelength retardation layer, a laminate of the support substrate, the ¼ wavelength retardation layer alignment layer, and a ¼ wavelength retardation layer; A bonding step of integrating the base material for the half-wavelength retardation layer, the alignment film for the half-wavelength retardation layer, and the laminate of the half-wavelength retardation layer;
From the laminate integrated by the bonding step, the base material for the ½ wavelength retardation layer, or the base material for the ½ wavelength retardation layer and the alignment film for the ½ wavelength retardation layer A peeling process for peeling the laminate,
The ½ wavelength retardation layer preparation step or the ½ wavelength retardation layer preparation step includes:
The alignment film for 1/2 wavelength retardation layer or the 1/2 wavelength retardation layer is prepared so that the hardness of the outermost layer of the transfer layer is increased with respect to the support substrate.

(7)によれば、積層による傷付きが支持体基材側で発生することになり、最外層となる1/2波長位相差層用配向膜又は1/2波長位相差層の傷つきを防止することができる。   According to (7), damage due to lamination occurs on the support substrate side, and damage to the alignment film for 1/2 wavelength phase difference layer or 1/2 wavelength phase difference layer which is the outermost layer is prevented. can do.

(8)(7)に記載の光学フィルム用転写体から前記転写層を直線偏光版に貼り合せて一体化して光学フィルムを作製する。   (8) From the optical film transfer body described in (7), the transfer layer is bonded to a linearly polarizing plate and integrated to prepare an optical film.

(8)によれば、傷付きを有効に回避してなる位相差層等により光学フィルムを構成することができる。   According to (8), an optical film can be comprised with the phase difference layer etc. which avoid a damage | wound effectively.

本発明は、位相差層を接着層等により貼り合せて光学フィルムを作製する構成において、位相差層等の傷付きを有効に回避することができるようにすることができる。   The present invention can effectively prevent damage to the retardation layer or the like in a configuration in which the retardation layer is bonded with an adhesive layer or the like to produce an optical film.

本発明の第1実施形態に係る画像表示装置を示す断面図である。It is sectional drawing which shows the image display apparatus which concerns on 1st Embodiment of this invention. 図1の画像表示装置に適用される光学フィルムの説明に供する図である。It is a figure where it uses for description of the optical film applied to the image display apparatus of FIG. 図2の光学フィルムに係る転写フィルムを示す断面図である。It is sectional drawing which shows the transfer film which concerns on the optical film of FIG. 図3の転写フィルムの製造工程の説明に供する図である。It is a figure where it uses for description of the manufacturing process of the transfer film of FIG. 図4の転写フィルムによる光学フィルムの製造工程の説明に供する図である。It is a figure where it uses for description of the manufacturing process of the optical film by the transfer film of FIG. 図4の続きの工程の説明に供する図である。It is a figure where it uses for description of the process of the continuation of FIG. 図4の製造工程の説明に供する図である。It is a figure where it uses for description of the manufacturing process of FIG. 図7の続きの説明に供する図である。It is a figure with which it uses for description of the continuation of FIG. 本発明の第1実施形態に係る画像表示装置を示す断面図である。It is sectional drawing which shows the image display apparatus which concerns on 1st Embodiment of this invention. 図1の画像表示装置に係る転写フィルムを示す断面図である。It is sectional drawing which shows the transfer film which concerns on the image display apparatus of FIG.

〔第1実施形態〕
〔光学フィルム及び画像表示装置〕
図1は、本発明の第1実施形態に係る画像表示装置を示す図である。この画像表示装置11は、画像表示パネル12のパネル面(視聴者側面)に、光学フィルム13が配置される。ここで画像表示パネル12は、例えば有機ELパネルであり、所望のカラー画像を表示する。なお画像表示パネル12にあっては、有機ELパネルに限らず、液晶表示パネル等、種々の画像表示パネルを広く適用することができる。
[First Embodiment]
[Optical film and image display device]
FIG. 1 is a diagram showing an image display apparatus according to the first embodiment of the present invention. In the image display device 11, an optical film 13 is disposed on the panel surface (viewer side surface) of the image display panel 12. Here, the image display panel 12 is an organic EL panel, for example, and displays a desired color image. Note that the image display panel 12 is not limited to the organic EL panel, and various image display panels such as a liquid crystal display panel can be widely applied.

光学フィルム13は、円偏光板の機能により画像表示パネル12に到来する外来光の反射を抑圧する光学フィルムである。このため光学フィルム13は、直線偏光板15、1/4波長板16を積層して構成される。光学フィルム13は、図示しないセパレータフィルムを剥離して感圧接着剤による粘着層14を露出させた後、この粘着層14により、画像表示パネル12のパネル面に貼り付けられて保持される。なお感圧接着剤に代えて例えば紫外線硬化性樹脂等の各種の接着剤、粘着剤により光学フィルム13を配置してもよい。また直線偏光板15及び1/4波長板16は、接着層17を介して一体化される。ここで接着層17は、紫外線硬化性樹脂、熱硬化性樹脂、感圧接着剤等、各種の接着剤を広く適用することができるものの、全体の厚みを薄くする観点から、紫外線硬化性樹脂を適用することが好ましく、この場合は厚み1μm程度により作成することができる。   The optical film 13 is an optical film that suppresses reflection of extraneous light arriving at the image display panel 12 by the function of a circularly polarizing plate. For this reason, the optical film 13 is configured by laminating a linear polarizing plate 15 and a quarter-wave plate 16. The optical film 13 is peeled off a separator film (not shown) to expose the pressure-sensitive adhesive 14 with a pressure-sensitive adhesive, and is then attached and held on the panel surface of the image display panel 12 by the pressure-sensitive adhesive layer 14. Instead of the pressure-sensitive adhesive, the optical film 13 may be arranged by various adhesives such as an ultraviolet curable resin and an adhesive. The linear polarizing plate 15 and the quarter wavelength plate 16 are integrated with each other through the adhesive layer 17. Here, although various adhesives such as an ultraviolet curable resin, a thermosetting resin, and a pressure sensitive adhesive can be widely applied, the adhesive layer 17 is made of an ultraviolet curable resin from the viewpoint of reducing the overall thickness. In this case, it can be formed with a thickness of about 1 μm.

1/4波長板16は、透過光に1/4波長分の位相差を付与する1/4波長位相差層18と、透過光に1/2波長分の位相差を付与する1/2波長位相差層19とを接着層20により貼合した積層体により構成される。これにより光学フィルム13は、カラー画像の表示に供する広い波長帯域で十分に外来光の反射を抑圧する。   The quarter wavelength plate 16 includes a quarter wavelength retardation layer 18 that imparts a phase difference of ¼ wavelength to transmitted light, and a ½ wavelength that imparts a phase difference of ½ wavelength to the transmitted light. It is comprised by the laminated body which bonded together the phase difference layer 19 with the contact bonding layer 20. FIG. Thereby, the optical film 13 sufficiently suppresses reflection of extraneous light in a wide wavelength band used for displaying a color image.

また1/4波長板16は、1/4波長位相差層18、1/2波長位相差層19の作製に供する1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23が、それぞれ画像表示パネル12側、直線偏光板15側に設けられ、これにより転写法を適用して光学フィルム13を作製して全体の厚みを薄くすると共に、1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23を保護層として機能させて1/4波長位相差層18、1/2波長位相差層19の傷つきを低減する。   The quarter-wave plate 16 is used for the production of the quarter-wave retardation layer 18 and the half-wave retardation layer 19. An alignment film 23 is provided on each of the image display panel 12 side and the linearly polarizing plate 15 side, whereby a transfer method is applied to produce an optical film 13 to reduce the overall thickness, and a 1/4 wavelength phase difference. The layer alignment film 22 and the ½ wavelength retardation layer alignment film 23 function as a protective layer to reduce damage to the ¼ wavelength retardation layer 18 and the ½ wavelength retardation layer 19.

これらにより画像表示装置11では、画像表示パネル12の表示画面側より、順次、1/4波長位相差層18、1/2波長位相差層19、直線偏光板15が配置される。また図2に示すように、矢印により示す直線偏光板15の透過軸に対して、1/2波長位相差層19及び1/4波長位相差層18の遅相軸(それぞれ矢印により示す)が、それぞれ反時計回りに15度、73度の角度を成すように配置される。   Accordingly, in the image display device 11, the ¼ wavelength phase difference layer 18, the ½ wavelength phase difference layer 19, and the linear polarizing plate 15 are sequentially arranged from the display screen side of the image display panel 12. In addition, as shown in FIG. 2, the slow axes (indicated by arrows respectively) of the ½ wavelength phase difference layer 19 and the ¼ wavelength phase difference layer 18 with respect to the transmission axis of the linearly polarizing plate 15 indicated by arrows. Are arranged so as to form angles of 15 degrees and 73 degrees counterclockwise, respectively.

1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23は、表面に微細な凹凸形状を作成して形成され、この微細な凹凸形状による配向規制力により1/4波長位相差層18、1/2波長位相差層19に係る液晶材料を配向させる。なお1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23は、十点平均粗さ(Rz)が、10nm以上、45nm以下であり、またさらに平均面粗さ(Ra)が、1nm以上、4nm以下である。これにより1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23は、対応する1/4波長位相差層18、1/2波長位相差層19との間で十分な密着強度を確保して、いわゆる黒輝度に係る1/4波長位相差層18、1/2波長位相差層19のばらつきを十分に小さくすることができる。   The quarter-wave retardation layer alignment film 22 and the half-wave retardation layer alignment film 23 are formed by forming a fine uneven shape on the surface, and 1 / The liquid crystal material according to the four-wavelength phase difference layer 18 and the half-wavelength phase difference layer 19 is aligned. The quarter-wave retardation layer alignment film 22 and the half-wave retardation layer alignment film 23 have a 10-point average roughness (Rz) of 10 nm to 45 nm, and an average surface roughness. (Ra) is 1 nm or more and 4 nm or less. As a result, the quarter-wave retardation layer alignment film 22 and the half-wave retardation layer alignment film 23 are disposed between the corresponding quarter-wave retardation layer 18 and the half-wave retardation layer 19. Sufficient adhesion strength can be secured, and variations in the quarter-wave retardation layer 18 and the half-wave retardation layer 19 related to so-called black luminance can be sufficiently reduced.

この実施形態において、1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23は、微細な凹凸形状の賦型に供する賦型用樹脂層が形成された後、賦型処理によりこの賦型樹脂層の表面に微細な凹凸形状を作成して形成される。この実施形態ではこの賦型用樹脂に紫外線硬化性樹脂が適用されて、アクリル系の紫外線硬化性樹脂が使用されるものの、これに限らず賦型処理に供する各種の樹脂を広く適用することができる。   In this embodiment, the quarter-wave retardation layer alignment film 22 and the half-wave retardation layer alignment film 23 are formed after the forming resin layer for forming a fine concavo-convex shape is formed. A fine concavo-convex shape is created and formed on the surface of this shaping resin layer by a shaping treatment. In this embodiment, an ultraviolet curable resin is applied to the shaping resin, and an acrylic ultraviolet curable resin is used. However, the present invention is not limited to this, and various resins used for the shaping process can be widely applied. it can.

また、これら1/2波長位相差層用配向膜23及び1/4波長位相差層用配向膜22に係る微細な凹凸形状は、一方向に延長するライン状(線)の凹凸形状により形成され、この一方向に延長する方向が直線偏光板15の透過軸に対して、それぞれ反時計回りに15度、73度の角度を成す方向となるように作成される。   In addition, the fine uneven shape relating to the alignment film 23 for 1/2 wavelength retardation layer and the alignment film 22 for 1/4 wavelength retardation layer is formed by a line (line) uneven shape extending in one direction. The direction extending in one direction is formed so as to form an angle of 15 degrees and 73 degrees counterclockwise with respect to the transmission axis of the linear polarizing plate 15, respectively.

1/4波長位相差層18及び1/2波長位相差層19は、対応する配向膜22、23の配向規制力により屈折率異方性を保持した状態で固化(硬化)された液晶材料により形成される。より具体的に1/4波長位相差層18及び1/2波長位相差層19は、重合性液晶モノマーを配向膜22、23上に積層した後、相転移点まで昇温し、その後、紫外線照射より重合性液晶モノマーを重合させて液晶の配向状態を固定することにより作製される。1/4波長位相差層18及び1/2波長位相差層19は、この種の光学フィルムに適用可能な各種の液晶材料を広く適用することができるものの、この実施形態では、同一の材料が適用される。より具体的に、1/4波長位相差層18及び1/2波長位相差層19は、例えば、下記化学式(1)〜(13)に表される化合物等が用いられる。   The quarter-wave retardation layer 18 and the half-wave retardation layer 19 are made of a liquid crystal material that is solidified (cured) while maintaining refractive index anisotropy by the orientation regulating force of the corresponding orientation films 22 and 23. It is formed. More specifically, the quarter-wave retardation layer 18 and the half-wave retardation layer 19 are formed by laminating a polymerizable liquid crystal monomer on the alignment films 22 and 23, and then raising the temperature to the phase transition point. It is produced by polymerizing a polymerizable liquid crystal monomer by irradiation to fix the alignment state of the liquid crystal. Although the ¼ wavelength retardation layer 18 and the ½ wavelength retardation layer 19 can widely apply various liquid crystal materials applicable to this type of optical film, in this embodiment, the same material is used. Applied. More specifically, for example, the compounds represented by the following chemical formulas (1) to (13) are used for the quarter-wave retardation layer 18 and the half-wave retardation layer 19.

Figure 2017146616
Figure 2017146616

接着層20は、紫外線硬化性樹脂、熱硬化性樹脂、感圧接着剤等、各種の接着剤を広く適用することができるものの、全体の厚みを薄くする観点から、紫外線硬化性樹脂を適用することが好ましく、この場合は厚み1μm程度により作成することができる。この実施形態では、配向膜の作製に適用した紫外線硬化性樹脂を適用する。なお接着層20には粘着層を適用してもよい。   Although various adhesives such as an ultraviolet curable resin, a thermosetting resin, and a pressure sensitive adhesive can be widely applied to the adhesive layer 20, an ultraviolet curable resin is applied from the viewpoint of reducing the overall thickness. In this case, it can be formed with a thickness of about 1 μm. In this embodiment, an ultraviolet curable resin applied to the preparation of the alignment film is applied. An adhesive layer may be applied to the adhesive layer 20.

直線偏光板15は、TAC(トリアセチルセルロース)等の透明フィルムからなる基材15Aの下面側が鹸化処理された後、光学機能層15Bが配置される。なお基材15Aは、これに代えてポリ(メタ)アクリル酸メチル、ポリ(メタ)アクリル酸ブチル、(メタ)アクリル酸メチル−(メタ)アクリル酸ブチル共重合体、(メタ)アクリル酸メチル−スチレン共重合体等のアクリル樹脂等の樹脂、ソーダ硝子、カリ硝子、鉛硝子、石英硝子等の硝子等を適用することができる。   The linearly polarizing plate 15 is provided with the optical functional layer 15B after the lower surface side of the base material 15A made of a transparent film such as TAC (triacetylcellulose) is saponified. In addition, 15 A of base materials replace with this, poly (meth) methyl acrylate, poly (meth) butyl acrylate, methyl (meth) acrylate- (meth) butyl acrylate copolymer, (meth) acrylate methyl- A resin such as an acrylic resin such as a styrene copolymer, a glass such as soda glass, potash glass, lead glass, or quartz glass can be used.

光学機能層15Bは、直線偏光板としての光学的機能を担う部位であり、例えばポリビニルアルコール(PVA)によるフィルム材に、ヨウ素化合物分子を吸着配向させて作製される。   The optical functional layer 15B is a part that bears an optical function as a linearly polarizing plate, and is produced, for example, by adsorbing and orienting iodine compound molecules on a film material made of polyvinyl alcohol (PVA).

しかして光学フィルム13においては、1/4波長位相差層18と1/2波長位相差層19とを接着層20により貼合した積層体により1/4波長板16を構成することにより、それぞれ別工程により作成された1/4波長位相差層18と1/2波長位相差層19とを使用して作成することができ、これにより順次、配向膜、位相差層を積層して作成する場合のはじき、密着力不足を有効に回避して作成することができ、その結果、安定かつ高い信頼性により作成することができる。   Thus, in the optical film 13, by configuring the quarter wavelength plate 16 with a laminate in which the quarter wavelength retardation layer 18 and the half wavelength retardation layer 19 are bonded by the adhesive layer 20, respectively. The ¼ wavelength phase difference layer 18 and the ½ wavelength phase difference layer 19 created by separate processes can be used, and thereby an alignment film and a phase difference layer are sequentially laminated. In this case, it can be created by effectively avoiding shortage of adhesion and insufficient adhesion, and as a result, it can be created with high stability and reliability.

またこれら1/4波長位相差層18、1/2波長位相差層19の作製に供する1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23を、それぞれ画像表示パネル12側、直線偏光板15側に設け、これにより転写法を適用して光学フィルム13を作製して全体の厚みを薄くすると共に、1/4波長位相差層用配向膜22、1/2波長位相差層用配向膜23を保護層として機能させ、1/4波長位相差層18、1/2波長位相差層19の傷つきを低減することができる。なお転写法とは、例えば基材の上に所望の層を形成する場合に、この層を直接当該基材上に形成するのでは無く、一旦、離型性の支持体上に剥離可能に該層を積層形成して転写体を作製した後、工程、需要等に応じて、該支持体上に形成した層を、最終的に該層を積層すべき基材(被転写基材)上に接着、積層し、その後、該支持体を剥離除去することにより、該基材上に所望の層を形成する方法である。   Further, the quarter-wave retardation layer alignment film 22 and the half-wave retardation layer alignment film 23 used for the production of the quarter-wave retardation layer 18 and the half-wave retardation layer 19 are respectively images. It is provided on the display panel 12 side and the linearly polarizing plate 15 side, whereby the transfer film is applied to produce the optical film 13 to reduce the overall thickness, and the quarter wavelength retardation layer alignment film 22, 1 / The alignment film 23 for the two-wavelength phase difference layer can function as a protective layer, and damage to the ¼ wavelength phase difference layer 18 and the ½ wavelength phase difference layer 19 can be reduced. The transfer method refers to, for example, when a desired layer is formed on a base material, the layer is not directly formed on the base material, but can be peeled once on a releasable support. After forming the transfer body by laminating the layers, the layer formed on the support is finally placed on the substrate (transfer base material) on which the layer is to be laminated according to the process, demand, etc. In this method, a desired layer is formed on the substrate by bonding and laminating, and then peeling and removing the support.

なお光学フィルム13においては、直線偏光板15に設けられる基材15Aの光学機能層15Bとは逆側面に、必要に応じて反射防止コート層、ハードコート層等の各種機能層10が設けられる。   In the optical film 13, various functional layers 10 such as an antireflection coating layer and a hard coating layer are provided on the side surface opposite to the optical functional layer 15 </ b> B of the base material 15 </ b> A provided on the linear polarizing plate 15 as necessary.

〔転写体〕
光学フィルム13は、接着層17により1/4波長板16、直線偏光板15が一体化され、この一体化に係る一連の処理に転写法が適用される。これによりこの実施形態では、被転写基材は、直線偏光板15であり、転写に供する層(転写層)は、1/4波長位相差層用配向膜22、1/4波長位相差層18、接着層20、1/2波長位相差層19、1/2波長位相差層用配向膜23の積層体である。
[Transcript]
In the optical film 13, the quarter-wave plate 16 and the linear polarizing plate 15 are integrated by the adhesive layer 17, and the transfer method is applied to a series of processes related to this integration. Thereby, in this embodiment, the substrate to be transferred is the linear polarizing plate 15, and the layers (transfer layers) used for transfer are the quarter-wave retardation layer alignment film 22 and the quarter-wave retardation layer 18. , An adhesive layer 20, a ½ wavelength phase difference layer 19, and a ½ wavelength phase difference layer alignment film 23.

図3は、この転写体である転写フィルム21の構成を示す図である。転写フィルム21は、支持体基材25上に、1/4波長位相差層用配向膜22、1/4波長位相差層18、接着層20、1/2波長位相差層19、1/2波長位相差層用配向膜23、基材24が設けられる。   FIG. 3 is a diagram showing a configuration of a transfer film 21 which is this transfer body. The transfer film 21 is formed on the support base material 25, the quarter-wave retardation layer alignment film 22, the quarter-wave retardation layer 18, the adhesive layer 20, and the half-wave retardation layers 19, 1/2. A wavelength retardation layer alignment film 23 and a substrate 24 are provided.

ここで支持体基材25は、転写層を剥離可能に担持し、転写層を被転写基材上に接着、積層した後は、適宜時機に剥離、除去に供される基材である。この実施形態では、透明フィルム材であるPET(Polyethylene terephthalate)フィルムが適用される。なおPETフィルムは、必要に応じてコロナ処理され、これにより密着力が適切に設定される。なお支持体基材25は、ポリブチレンテレフタレート、ポリエチレンアフタレート等のポリエステル樹脂、ポリプロピレン、ポリメチルペンテン等のポリオレフィン樹脂等の樹脂からなる樹脂性フィルム材を適用してもよい。   Here, the support base material 25 is a base material that is detachably supported after the transfer layer is detachably supported and the transfer layer is bonded and laminated on the transfer target substrate. In this embodiment, a PET (Polyethylene terephthalate) film, which is a transparent film material, is applied. The PET film is subjected to corona treatment as necessary, whereby the adhesion force is appropriately set. The support substrate 25 may be a resinous film material made of a resin such as a polyester resin such as polybutylene terephthalate or polyethylene aphthalate, or a polyolefin resin such as polypropylene or polymethylpentene.

なお転写層との剥離性が不十分な場合は、支持体基材25には、転写層側に、剥離を促進する離型層を設ける。ここで離型層は、相対的に、支持体基材25との密着性は高く(剥離性は低く)、転写層との密着性は低い(剥離性は高い)材料を適用することができる。この実施形態では、転写層の最下層が紫外線硬化性樹脂による1/4波長位相差層用配向膜22であることにより、上述の支持体基材25に対して、例えばシリコン樹脂(有機珪素系高分子化合物)、弗素系樹脂、メラミン樹脂、エポキシ樹脂、又はこれら樹脂と適宜の他の樹脂(アクリル樹脂、セルロース系樹脂、ポリエステル樹脂等)との混合物が用いられる。   When the peelability from the transfer layer is insufficient, the support base material 25 is provided with a release layer that promotes peeling on the transfer layer side. Here, the release layer can be applied with a material having relatively high adhesion to the support substrate 25 (low peelability) and low adhesion to the transfer layer (high peelability). . In this embodiment, the lowermost layer of the transfer layer is an alignment film 22 for a quarter wavelength retardation layer made of an ultraviolet curable resin. Polymer compound), fluorine-based resin, melamine resin, epoxy resin, or a mixture of these resins and other resins (acrylic resin, cellulose-based resin, polyester resin, etc.) as appropriate.

因みに、離型層による剥離性が不十分な場合、支持体基材25と離型層との間に、剥離層を設け、この剥離層により離型層による剥離性を補うようにしてもよい。なお剥離層は、相対的に、支持体フィルムとの密着性が低く(剥離性は高く)、剥離層との密着性が高い(剥離性は低い)材料を適用することができる。より具体的には、この実施形態において、剥離層には、アクリル樹脂、セルロース系樹脂、ポリエステル樹脂、ウレタン樹脂、塩化ビニル−酢酸ビニル共重合体、又は以上の中から選択した2種以上の混合物、或いは以上のなかから選択した1種以上とその他の樹脂との混合物を適用することができる。   Incidentally, when the peelability by the release layer is insufficient, a release layer may be provided between the support substrate 25 and the release layer, and this release layer may be used to supplement the peelability by the release layer. . Note that a material having relatively low adhesion to the support film (high peelability) and high adhesion to the release layer (low peelability) can be applied to the release layer. More specifically, in this embodiment, the release layer includes an acrylic resin, a cellulose resin, a polyester resin, a urethane resin, a vinyl chloride-vinyl acetate copolymer, or a mixture of two or more selected from the above. Alternatively, a mixture of one or more selected from the above and other resins can be applied.

基材24は、転写層を剥離可能に担持し、転写時等の適宜時機に剥離、除去に供される基材である。この実施形態では、支持体基材25と同一に構成される。また基材24においても、下層の1/2波長位相差層用配向膜23との間の密着力を適切に設定するために、必要に応じてコロナ処理して密着力が向上される。   The base material 24 is a base material that carries the transfer layer in a peelable manner and is used for peeling and removing as appropriate at the time of transfer or the like. In this embodiment, it is configured the same as the support base material 25. Moreover, also in the base material 24, in order to set appropriately the contact | adhesion power with the alignment film 23 for lower layer 1/2 wavelength phase difference layers, a corona process is performed as needed, and contact | adhesion power is improved.

〔製造工程〕
図4は、転写フィルム21の製造工程の説明に供する図である。この製造工程は、基材24に1/2波長位相差層用配向膜23、1/2波長位相差層19を作成する(図4(A))。また基材25に、1/4波長位相差層用配向膜22、1/4波長位相差層18を作成する(図4(B))。製造工程は、透過光によりそれぞれ1/2波長位相差層19、1/4波長位相差層18の光学特性を検査した後、接着層20により1/2波長位相差層19、1/4波長位相差層18を貼合わせ、これにより転写フィルム21を作成する(図4(C))。
〔Manufacturing process〕
FIG. 4 is a diagram for explaining the manufacturing process of the transfer film 21. In this manufacturing process, the half-wave retardation layer alignment film 23 and the half-wave retardation layer 19 are formed on the substrate 24 (FIG. 4A). In addition, the quarter-wave retardation layer alignment film 22 and the quarter-wave retardation layer 18 are formed on the substrate 25 (FIG. 4B). In the manufacturing process, the optical characteristics of the ½ wavelength phase difference layer 19 and the ¼ wavelength phase difference layer 18 are inspected by transmitted light, respectively, and then the ½ wavelength phase difference layer 19 and ¼ wavelength are obtained by the adhesive layer 20. The phase difference layer 18 is bonded together, thereby creating the transfer film 21 (FIG. 4C).

なおこの実施形態のように、1/2波長位相差層19、1/4波長位相差層18をそれぞれ個別に作成して一体化する場合には、1/2波長位相差層19、1/4波長位相差層18の光学特性をそれぞれ検査することができる。これにより品質を向上し、これによっても安定に光学フィルム13を生産することができる。   In the case where the ½ wavelength phase difference layer 19 and the ¼ wavelength phase difference layer 18 are individually formed and integrated as in this embodiment, the ½ wavelength phase difference layer 19, 1 / The optical characteristics of the four-wavelength retardation layer 18 can be inspected. As a result, the quality can be improved and the optical film 13 can be produced stably.

図5は、続く光学フィルム13の製造工程の説明に供する図である。この製造工程は、転写フィルム21から基材24のみを剥離させた後(図5(A))、接着層17を介して直線偏光板15に貼り付け(図5(B))、これにより支持体基材25、1/4波長位相差層用配向膜22と一体に、また1/2波長位相差層用配向膜23を取り残して光学フィルム13を作成する。なお基材24を剥離する工程は、この実施形態では転写フィルム21の製造工程に設けられるものの、光学フィルム13の製造工程に設けるようにしてもよい。   FIG. 5 is a diagram for explaining the manufacturing process of the optical film 13 that follows. In this manufacturing process, only the base material 24 is peeled from the transfer film 21 (FIG. 5A), and then attached to the linear polarizing plate 15 via the adhesive layer 17 (FIG. 5B), thereby supporting the manufacturing process. The optical film 13 is formed integrally with the body substrate 25 and the quarter-wave retardation layer alignment film 22 and with the half-wave retardation layer alignment film 23 left behind. In addition, although the process of peeling the base material 24 is provided in the manufacturing process of the transfer film 21 in this embodiment, it may be provided in the manufacturing process of the optical film 13.

これらにより1/2波長位相差層用配向膜23は、基材24を剥離した後、直線偏光板15と貼り合わせるまでの間、その下層の1/2波長位相差層19を保護する。   Thus, the alignment film 23 for a half-wave retardation layer protects the underlying half-wave retardation layer 19 until the substrate 24 is peeled off and bonded to the linearly polarizing plate 15.

続いてこの工程は、図6に示すように、光学フィルム13から支持体基材25を剥離させた後(図6(A))、粘着層14、セパレータフィルムを配置し、所望の大きさに切断して光学フィルム13を作製する。続く画像表示装置11の製造工程では、最終工程において、セパレータフィルムを剥離して粘着層14を露出させ、粘着層14を介して画像表示パネル12のパネル面に光学フィルム13を貼り付ける(図6(B))。なお支持体基材25を剥離する処理等を画像表示装置の製造工程で実行してもよい。   Subsequently, as shown in FIG. 6, in this step, after the support base material 25 is peeled from the optical film 13 (FIG. 6A), the adhesive layer 14 and the separator film are arranged to have a desired size. The optical film 13 is produced by cutting. In the subsequent manufacturing process of the image display device 11, in the final process, the separator film is peeled to expose the adhesive layer 14, and the optical film 13 is attached to the panel surface of the image display panel 12 through the adhesive layer 14 (FIG. 6). (B)). In addition, you may perform the process etc. which peel the support body base material 25 in the manufacturing process of an image display apparatus.

これらにより1/4波長位相差層用配向膜22は、基材25を剥離した後、画像表示パネル12と貼り合わせるまでの間、その上層の1/4波長位相差層18を保護する。   As a result, the quarter-wave retardation layer alignment film 22 protects the upper quarter-wave retardation layer 18 after the substrate 25 is peeled off until it is bonded to the image display panel 12.

図7は、図4(A)及び図4(B)について上述した製造工程を示す図である。なおこの図7においては、図4(B)に係る基材25に1/4波長位相差層用配向膜22、1/4波長位相差層18を作成する構成は、括弧書により記号を付して示す。   FIG. 7 is a diagram showing the manufacturing process described above with reference to FIGS. 4 (A) and 4 (B). In FIG. 7, the structure in which the quarter-wave retardation layer alignment film 22 and the quarter-wave retardation layer 18 are formed on the base material 25 according to FIG. Show.

この製造工程は、基材24を供給リール31から引き出し、ダイ32により紫外線硬化性樹脂の塗工液を塗工した後、乾燥炉33により乾燥させる。なおこの塗工液の塗工にあっては、ダイによる場合に限らず、種々の手法を適用することができる。この製造工程において、ロール版34は、1/2波長位相差層用配向膜23に係る微細凹凸形状が周側面に形成された賦型用金型である。この製造工程は、紫外線硬化性樹脂が塗工された基材24を加圧ローラ35によりロール版34に押圧し、高圧水銀燈からなる紫外線照射装置36による紫外線の照射により紫外線硬化性樹脂を硬化させる。これにより製造工程は、ロール版34の周側面に形成された凹凸形状を基材24に転写する。その後、剥離ローラ37によりロール版34から硬化した紫外線硬化性樹脂と共に基材24を剥離し、ダイ39により液晶材料の塗工液を塗工する。またその後、乾燥炉40により乾燥させた後、紫外線照射装置41による紫外線の照射により液晶材料を硬化させ、巻き取りリール42に巻き取る。この一連の処理により基材24の上に、1/2波長位相差層用配向膜23、1/2波長位相差層19が形成される。   In this manufacturing process, the base material 24 is pulled out from the supply reel 31, coated with a coating solution of an ultraviolet curable resin with a die 32, and then dried with a drying furnace 33. Note that the coating of the coating liquid is not limited to using a die, and various methods can be applied. In this manufacturing process, the roll plate 34 is a mold for molding in which the fine irregularities related to the alignment film 23 for the ½ wavelength retardation layer are formed on the peripheral side surface. In this manufacturing process, the base material 24 coated with an ultraviolet curable resin is pressed against a roll plate 34 by a pressure roller 35, and the ultraviolet curable resin is cured by irradiation with ultraviolet rays by an ultraviolet irradiation device 36 made of high-pressure mercury vapor. . Thus, in the manufacturing process, the uneven shape formed on the peripheral side surface of the roll plate 34 is transferred to the substrate 24. Thereafter, the substrate 24 is peeled off together with the ultraviolet curable resin cured from the roll plate 34 by the peeling roller 37, and a coating liquid of a liquid crystal material is applied by the die 39. Then, after drying in the drying furnace 40, the liquid crystal material is cured by irradiating ultraviolet rays from the ultraviolet irradiating device 41, and taken up on the take-up reel 42. By this series of treatments, the half-wave retardation layer alignment film 23 and the half-wave retardation layer 19 are formed on the substrate 24.

またこの製造工程は、ロール版34に代えて、1/4波長位相差層用配向膜22の作製に供するロール版44を配置して、同様に、基材25を供給リール31から引き出し、ダイ32により紫外線硬化性樹脂の塗工液を塗工した後、乾燥炉33により乾燥させ、ロール版44により1/4波長位相差層用配向膜22を作成する。またその後、液晶材料を塗工して乾燥させた後、液晶材料を硬化させて、巻き取りリール52に巻き取り、これにより基材25の上に、1/4波長位相差層用配向膜22、1/4波長位相差層18を形成する。   Further, in this manufacturing process, instead of the roll plate 34, a roll plate 44 used for the production of the alignment film 22 for the quarter wavelength retardation layer is arranged, and similarly, the base material 25 is pulled out from the supply reel 31, After coating the coating solution of the ultraviolet curable resin by 32, the coating liquid is dried by the drying furnace 33, and the quarter wavelength retardation layer alignment film 22 is formed by the roll plate 44. Further, after the liquid crystal material is applied and dried, the liquid crystal material is cured and wound on the take-up reel 52, whereby the quarter-wave retardation layer alignment film 22 is formed on the substrate 25. The quarter wavelength retardation layer 18 is formed.

図8は、1/4波長位相差層18及び1/2波長位相差層19の貼り合わせ工程(図4(C))の説明に供する図である。この製造工程は、巻き取りリール42から、基材24、1/2波長位相差層用配向膜23、1/2波長位相差層19の積層体を引き出し、ダイ55により接着剤である紫外線硬化性樹脂を塗工した後、乾燥炉56により乾燥させ、巻き取りリール52から引き出した基材25、1/4波長位相差層用配向膜22、1/4波長位相差層18の積層体と積層する。その後、紫外線照射装置57により紫外線を照射して塗工した紫外線硬化性樹脂を硬化させた後、基材24を剥離し、巻き取りリール58に巻き取る。なおこのような紫外線硬化性樹脂による一体化に代えて、熱硬化性樹脂を使用したドライラミネート等により一体化してもよく、さらにPSA(Pressure Sensitive Adhesive)粘着剤により一体化してもよい。   FIG. 8 is a diagram for explaining the bonding process of the quarter wavelength retardation layer 18 and the half wavelength retardation layer 19 (FIG. 4C). In this manufacturing process, the laminate of the base material 24, the ½ wavelength retardation layer alignment film 23, and the ½ wavelength retardation layer 19 is drawn out from the take-up reel 42, and the ultraviolet curing as an adhesive is performed by the die 55. After the application of the conductive resin, the laminate of the substrate 25, the quarter-wave retardation layer alignment film 22 and the quarter-wave retardation layer 18 which are dried by the drying furnace 56 and pulled out from the take-up reel 52, Laminate. Thereafter, the ultraviolet curable resin applied by irradiating the ultraviolet rays with the ultraviolet irradiation device 57 is cured, and then the substrate 24 is peeled off and taken up on the take-up reel 58. Instead of integration with such an ultraviolet curable resin, it may be integrated with a dry laminate using a thermosetting resin, or may be further integrated with a PSA (Pressure Sensitive Adhesive) adhesive.

〔傷付き対策〕
ところでこのように基材24を剥離してロールに巻き取る場合、支持体基材25と転写層最外層との接触により転写層最外層が傷付き、この傷が光学フィルムの歩留まりを劣化させる恐れがある。そこでこの実施形態では、転写層最外層の硬度が支持体基材25の硬度より大きくなるように設定する。このようにすれば、ロール状に積層する場合の傷つきを支持体基材25側とすることができ、最外層の傷付きを有効に回避することができる。
[Measures against scratches]
By the way, when the base material 24 is peeled and wound on a roll in this way, the outermost layer of the transfer layer is damaged due to the contact between the support base material 25 and the outermost layer of the transfer layer, and this scratch may deteriorate the yield of the optical film. There is. Therefore, in this embodiment, the hardness of the outermost layer of the transfer layer is set to be larger than the hardness of the support base material 25. If it does in this way, the damage in the case of laminating | stacking in roll shape can be made into the support body base material 25 side, and the damage of the outermost layer can be avoided effectively.

具体的に、この実施形態では、最外層が1/2位相差層用配向膜23であることにより、この配向膜23の作製に係る条件の設定により、支持体基材25より1/2位相差層用配向膜23の硬度を大きくする。なおこの条件は、紫外線照射量の増大、塗工液に添加する反応開始剤等の増量による反応度の増大等である。   Specifically, in this embodiment, since the outermost layer is the alignment film 23 for 1/2 phase difference layer, it is about 1/2 of the support base material 25 by setting the conditions relating to the production of the alignment film 23. The hardness of the alignment layer 23 for the retardation layer is increased. This condition includes an increase in the amount of ultraviolet irradiation, an increase in reactivity due to an increase in the amount of reaction initiator added to the coating solution, and the like.

またこの硬度にあっては、鉛筆硬度であり、支持体基材25の鉛筆硬度F対して、1/2位相差層用配向膜23を鉛筆硬度Hに設定して傷付きを防止することができた。なお鉛筆硬度の評価にあたっては、東洋精機製作所社製鉛筆引掻塗膜硬さ試験機(電動型)(型式:NP)を用いて、各硬度の鉛筆にて荷重500g、スピード0.5mm/secにより、距離10mm以上場所を変えて5回評価を繰り返し、5回評価中3回傷が発生した場合は該当鉛筆硬度以下と判定とした。   Further, this hardness is the pencil hardness, and against the pencil hardness F of the support substrate 25, the ½ retardation layer alignment film 23 is set to the pencil hardness H to prevent scratches. did it. In the evaluation of pencil hardness, a pencil scratch coating film hardness tester (electric type) (model: NP) manufactured by Toyo Seiki Seisakusho Co., Ltd. was used, and the load was 500 g and the speed was 0.5 mm / sec. Thus, the evaluation was repeated 5 times while changing the place at a distance of 10 mm or more.

〔第2実施形態〕
図9は、図1との対比により本発明の第2実施形態に係る画像表示装置を示す図である。この画像表示装置61では、光学フィルム13に代えて光学フィルム63が適用される点を除いて第1実施形態と同一に構成される。また光学フィルム63は、転写層66が、1/2波長位相差層19、接着層20、1/4波長位相差層18により構成される点を除いて光学フィルム13と同一に構成される。
[Second Embodiment]
FIG. 9 is a diagram showing an image display apparatus according to the second embodiment of the present invention in comparison with FIG. This image display device 61 is configured in the same manner as in the first embodiment except that an optical film 63 is applied instead of the optical film 13. The optical film 63 is configured in the same manner as the optical film 13 except that the transfer layer 66 includes the ½ wavelength retardation layer 19, the adhesive layer 20, and the ¼ wavelength retardation layer 18.

図10は、この光学フィルム61に係る転写フィルムを示す断面図である。光学フィルム63は、この転写フィルム71を適用して作製され、この転写フィルム71では、各層間の密着力の設定により、転写層66が、1/2波長位相差層19、接着層20、1/4波長位相差層18により構成され、これにより基材24及び支持体基材25を剥離する際に、それぞれ1/2波長位相差層用配向膜23、1/4波長位相差層用配向膜2が一体に剥離される。   FIG. 10 is a cross-sectional view showing a transfer film according to the optical film 61. The optical film 63 is produced by applying the transfer film 71. In the transfer film 71, the transfer layer 66 is formed of the half-wave retardation layer 19, the adhesive layers 20, 1, by setting the adhesion between the layers. When the substrate 24 and the support substrate 25 are peeled off by the ¼ wavelength phase difference layer 18, the ½ wavelength phase difference layer alignment film 23 and the ¼ wavelength phase difference layer alignment respectively. The membrane 2 is peeled together.

この実施形態では、このように転写層66を、1/2波長位相差層19、接着層20、1/4波長位相差層18により構成して、最外層である1/2波長位相差層19の硬度が支持体基材25の硬度より大きくなるように設定され、これにより1/2波長位相差層19の傷付きが有効に回避される。   In this embodiment, the transfer layer 66 is thus constituted by the ½ wavelength retardation layer 19, the adhesive layer 20, and the ¼ wavelength retardation layer 18, and the ½ wavelength retardation layer which is the outermost layer. The hardness of 19 is set to be larger than the hardness of the support base material 25, thereby effectively avoiding scratching of the half-wave retardation layer 19.

〔他の実施形態〕
以上、本発明の実施に好適な具体的な構成を詳述したが、本発明は、本発明の趣旨を逸脱しない範囲で、上述の実施形態の構成を種々に組み合わせたり、変更したりすることができる。
[Other Embodiments]
The specific configuration suitable for the implementation of the present invention has been described in detail above. However, the present invention can be variously combined or modified with the configuration of the above-described embodiment without departing from the spirit of the present invention. Can do.

すなわち上述の実施形態では、賦型処理により配向膜を作製する場合について述べたが、本発明はこれに限らず、いわゆる光配向により配向膜を作製する場合にも広く適用することができる。   That is, in the above-described embodiment, the case where the alignment film is formed by the shaping process has been described. However, the present invention is not limited to this, and can be widely applied to the case where the alignment film is formed by so-called photo-alignment.

2、15A、24、25 基材
3、23 1/2波長位相差層用配向膜(配向膜)
4、19 1/2波長位相差層
5、22 1/4波長位相差層用配向膜(配向膜)
6、18 1/4波長位相差層
7、16 1/4波長板
11、61 画像表示装置
12 画像表示パネル
13、63 光学フィルム
14 粘着層
15 直線偏光板
15B 光学機能層
16、66 1/4波長板(転写層)
17、20 接着層
21、61 転写フィルム
31 供給リール
32、39 ダイ
33、40 乾燥炉
34、44 ロール版
35、37 ローラ
36、41、57 紫外線照射装置
42、52、58 巻き取りリール
55 ダイ
56 乾燥炉
2, 15A, 24, 25 Base material 3, 23 Alignment film for 1/2 wavelength retardation layer (alignment film)
4, 19 1/2 wavelength retardation layer 5, 22 Alignment film for 1/4 wavelength retardation layer (alignment film)
6, 18 1/4 wavelength retardation layer 7, 16 1/4 wavelength plate 11, 61 Image display device 12 Image display panel 13, 63 Optical film 14 Adhesive layer 15 Linearly polarizing plate 15B Optical functional layer 16, 66 1/4 Wave plate (transfer layer)
17, 20 Adhesive layer 21, 61 Transfer film 31 Supply reel 32, 39 Die 33, 40 Drying furnace 34, 44 Roll plate 35, 37 Roller 36, 41, 57 Ultraviolet irradiation device 42, 52, 58 Take-up reel 55 Die 56 drying furnace

Claims (6)

支持体基材と、転写層とを備えた光学フィルム用転写体であって、
前記転写層は、
透過光に1/4波長分の位相差を付与する1/4波長位相差層と、透過光に1/2波長分の位相差を付与する1/2波長位相差層と、前記1/4波長位相差層及び前記1/2波長位相差層とを接着する接着層とを備え、
前記支持体基材側より、前記1/4波長位相差層、前記接着層、前記1/2波長位相差層の順に積層され、
前記支持体基材に対して、前記転写層の支持体基材側とは反対側の最外層となる前記1/2波長位相差層の硬度が大きい
光学フィルム用転写体。
A transfer body for an optical film comprising a support substrate and a transfer layer,
The transfer layer is
A quarter-wave retardation layer that imparts a phase difference of ¼ wavelength to transmitted light, a ½ wavelength retardation layer that imparts a phase difference of ½ wavelength to transmitted light, and the ¼ An adhesive layer for adhering the wavelength retardation layer and the ½ wavelength retardation layer,
From the support substrate side, the 1/4 wavelength retardation layer, the adhesive layer, and the 1/2 wavelength retardation layer are laminated in this order.
The transfer body for an optical film, wherein the half-wave retardation layer serving as the outermost layer on the side opposite to the support substrate side of the transfer layer is greater in hardness than the support substrate.
前記支持体基材を内側にしたロール体である
請求項1に記載の光学フィルム用転写体。
The transfer body for optical films according to claim 1, wherein the transfer body is a roll body with the support base material inside.
前記硬度が、鉛筆硬度Hである
請求項1又は請求項2に記載の光学フィルム用転写体。
The optical film transfer body according to claim 1, wherein the hardness is pencil hardness H. 4.
請求項1、請求項2、請求項3の何れかに記載の光学フィルム用転写体の前記転写層を、直線偏光板と貼り合せた
光学フィルム。
The optical film which bonded together the said transfer layer of the transfer body for optical films in any one of Claim 1, Claim 2, and 3 with the linearly-polarizing plate.
支持体基材と、転写層とを備えた光学フィルム用転写体の製造方法であって、
前記支持体基材上に、1/4波長位相差層用配向膜を作製して、前記支持体基材、1/4波長位相差層用配向膜の積層体を作製する1/4波長位相差層用配向膜作製工程と、
前記支持体基材、1/4波長位相差層用配向膜の積層体に、1/4波長位相差層を作製して、前記支持体基材、1/4波長位相差層用配向膜、1/4波長位相差層の積層体を作製する1/4波長位相差層作製工程と、
1/2波長位相差層用の基材の上に、1/2波長位相差層用配向膜を作製して、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜の積層体を作製する1/2波長位相差層用配向膜作製工程と、
前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜の積層体に、1/2波長位相差層を作製して、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜、1/2波長位相差層の積層体を作製する1/2波長位相差層作製工程と、
前記1/4波長位相差層及び1/2波長位相差層を貼り合せて、前記支持体基材、1/4波長位相差層用配向膜、1/4波長位相差層の積層体と、前記1/2波長位相差層用の基材、1/2波長位相差層用配向膜、1/2波長位相差層の積層体とを一体化する貼り合せ工程と、
前記貼り合せ工程により一体化した積層体から前記1/2波長位相差層用の基材及び前記1/2波長位相差層用配向膜の積層体を剥離する剥離工程とを備え、
前記1/2波長位相差層作製工程では、
前記支持体基材に対して、前記転写層の前記支持体基材側とは反対側の最外層となる前記1/2波長位相差層の硬度が大きくなるように、前記1/2波長位相差層を作製する
光学フィルム用転写体の製造方法。
A method for producing a transfer body for an optical film comprising a support substrate and a transfer layer,
1/4 wavelength retardation layer is prepared on the support substrate, and a laminate of the support substrate and 1/4 wavelength retardation layer alignment film is prepared. A step of preparing an alignment film for the phase difference layer;
A quarter-wave retardation layer is prepared in a laminate of the support substrate and the quarter-wave retardation layer alignment film, and the support substrate, the quarter-wave retardation layer alignment film, A quarter-wave retardation layer producing step of producing a laminate of quarter-wave retardation layers;
An alignment film for a ½ wavelength retardation layer is prepared on a substrate for a ½ wavelength retardation layer, and the substrate for the ½ wavelength retardation layer, the ½ wavelength retardation layer is formed. An alignment film preparation step for a half-wave retardation layer for preparing a laminate of alignment films for use;
A half-wave retardation layer was prepared on the laminate of the base material for the half-wave retardation layer and the alignment film for the half-wave retardation layer. A half-wave retardation layer producing step of producing a laminate of a substrate, a half-wave retardation layer alignment film, and a half-wave retardation layer;
Laminating the ¼ wavelength retardation layer and the ½ wavelength retardation layer, a laminate of the support substrate, the ¼ wavelength retardation layer alignment layer, and a ¼ wavelength retardation layer; A bonding step of integrating the base material for the half-wavelength retardation layer, the alignment film for the half-wavelength retardation layer, and the laminate of the half-wavelength retardation layer;
A peeling step of peeling the laminate of the half-wave retardation layer and the alignment layer for the half-wave retardation layer from the laminate integrated by the bonding step,
In the half wavelength retardation layer manufacturing step,
The half-wavelength level is set so that the hardness of the half-wavelength retardation layer, which is the outermost layer on the side opposite to the support substrate side of the transfer layer, is increased with respect to the support substrate. The manufacturing method of the transfer body for optical films which produces a phase difference layer.
請求項5に記載の光学フィルム用転写体から前記転写層を直線偏光版に貼り合せて一体化する
光学フィルムの製造方法。
The method for producing an optical film, wherein the transfer layer is bonded to and integrated with a linearly polarizing plate from the optical film transfer body according to claim 5.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109765651A (en) * 2017-11-10 2019-05-17 住友化学株式会社 Composite phase difference board, optical laminate and image display device
WO2020085308A1 (en) * 2018-10-26 2020-04-30 東洋紡株式会社 Alignment film for transferring liquid crystal compound alignment layer
KR20220155987A (en) 2020-03-26 2022-11-24 도요보 가부시키가이샤 Laminate for thin film layer transfer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7332779B2 (en) 2017-12-26 2023-08-23 株式会社ツインバード Mill blades and mill equipment

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004226752A (en) * 2003-01-23 2004-08-12 Nippon Oil Corp Method for manufacturing optical layered body, and elliptically polarizing plate, circularly polarizing plate and liquid crystal display comprising the layered body
US20040209006A1 (en) * 2003-04-18 2004-10-21 Takuya Matsumoto Liquid crystal film and liquid crystal display device equipped with same
JP2005060373A (en) * 2003-07-30 2005-03-10 Chisso Corp Photo-curable fluorene derivative and composition containing the same
JP2005206579A (en) * 2003-12-25 2005-08-04 Chisso Corp Liquid crystalline (meth)acrylate derivative and composition containing the same
JP2005338215A (en) * 2004-05-25 2005-12-08 Sumitomo Chemical Co Ltd Composite retardation film and method for manufacturing composite optical member
JP2006091825A (en) * 2004-09-27 2006-04-06 Far Eastern Textile Ltd Method for orienting rod-like liquid crystal molecule and optical device manufactured thereby
JP2006193596A (en) * 2005-01-13 2006-07-27 Nippon Synthetic Chem Ind Co Ltd:The Resin molding, method for producing the same and its use
JP2009244356A (en) * 2008-03-28 2009-10-22 Dainippon Printing Co Ltd Optical device, and transflective and half-reflection type liquid crystal display device including the same
JP2009244452A (en) * 2008-03-31 2009-10-22 Dainippon Printing Co Ltd Optical element manufacturing method, optical element, and semi-transmissive and semi-reflective liquid crystal display including the optical element

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004226752A (en) * 2003-01-23 2004-08-12 Nippon Oil Corp Method for manufacturing optical layered body, and elliptically polarizing plate, circularly polarizing plate and liquid crystal display comprising the layered body
US20040209006A1 (en) * 2003-04-18 2004-10-21 Takuya Matsumoto Liquid crystal film and liquid crystal display device equipped with same
JP2005060373A (en) * 2003-07-30 2005-03-10 Chisso Corp Photo-curable fluorene derivative and composition containing the same
JP2005206579A (en) * 2003-12-25 2005-08-04 Chisso Corp Liquid crystalline (meth)acrylate derivative and composition containing the same
JP2005338215A (en) * 2004-05-25 2005-12-08 Sumitomo Chemical Co Ltd Composite retardation film and method for manufacturing composite optical member
JP2006091825A (en) * 2004-09-27 2006-04-06 Far Eastern Textile Ltd Method for orienting rod-like liquid crystal molecule and optical device manufactured thereby
JP2006193596A (en) * 2005-01-13 2006-07-27 Nippon Synthetic Chem Ind Co Ltd:The Resin molding, method for producing the same and its use
JP2009244356A (en) * 2008-03-28 2009-10-22 Dainippon Printing Co Ltd Optical device, and transflective and half-reflection type liquid crystal display device including the same
JP2009244452A (en) * 2008-03-31 2009-10-22 Dainippon Printing Co Ltd Optical element manufacturing method, optical element, and semi-transmissive and semi-reflective liquid crystal display including the optical element

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109765651A (en) * 2017-11-10 2019-05-17 住友化学株式会社 Composite phase difference board, optical laminate and image display device
JP2019091029A (en) * 2017-11-10 2019-06-13 住友化学株式会社 Composite retardation plate, optical laminate, and image display device
TWI791067B (en) * 2017-11-10 2023-02-01 日商住友化學股份有限公司 Composite retardation plate, optical laminate, and image display device
CN109765651B (en) * 2017-11-10 2022-05-03 住友化学株式会社 Composite retardation plate, optical laminate, and image display device
CN112789531A (en) * 2018-10-26 2021-05-11 东洋纺株式会社 Alignment film for transfer printing of liquid crystal compound alignment layer
JPWO2020085309A1 (en) * 2018-10-26 2021-09-24 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
KR20210079272A (en) 2018-10-26 2021-06-29 도요보 가부시키가이샤 Alignment film for liquid crystal compound alignment layer transfer
KR20210079273A (en) 2018-10-26 2021-06-29 도요보 가부시키가이샤 Liquid crystal compound alignment layer transfer film
KR20210082159A (en) 2018-10-26 2021-07-02 도요보 가부시키가이샤 Alignment film for liquid crystal compound alignment layer transfer
KR20210082163A (en) 2018-10-26 2021-07-02 도요보 가부시키가이샤 Liquid crystal compound alignment layer transfer film
JPWO2020085308A1 (en) * 2018-10-26 2021-09-24 東洋紡株式会社 Orientation film for transfer of liquid crystal compound alignment layer
WO2020085309A1 (en) * 2018-10-26 2020-04-30 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
JPWO2020085310A1 (en) * 2018-10-26 2021-10-07 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
WO2020085310A1 (en) * 2018-10-26 2020-04-30 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
JP7539038B2 (en) 2018-10-26 2024-08-23 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
WO2020085308A1 (en) * 2018-10-26 2020-04-30 東洋紡株式会社 Alignment film for transferring liquid crystal compound alignment layer
CN112789531B (en) * 2018-10-26 2023-10-27 东洋纺株式会社 Alignment film for transfer of alignment layer of liquid crystal compound
JP7539037B2 (en) 2018-10-26 2024-08-23 東洋紡株式会社 Liquid crystal compound alignment layer transfer film
JP7539036B2 (en) 2018-10-26 2024-08-23 東洋紡株式会社 Alignment film for liquid crystal compound alignment layer transfer
KR20220155987A (en) 2020-03-26 2022-11-24 도요보 가부시키가이샤 Laminate for thin film layer transfer

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