JP2017092104A5 - - Google Patents

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Publication number
JP2017092104A5
JP2017092104A5 JP2015216551A JP2015216551A JP2017092104A5 JP 2017092104 A5 JP2017092104 A5 JP 2017092104A5 JP 2015216551 A JP2015216551 A JP 2015216551A JP 2015216551 A JP2015216551 A JP 2015216551A JP 2017092104 A5 JP2017092104 A5 JP 2017092104A5
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JP
Japan
Prior art keywords
young
modulus
mpa
mounting table
table according
Prior art date
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Application number
JP2015216551A
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English (en)
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JP2017092104A (ja
JP6584289B2 (ja
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Publication date
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Priority to JP2015216551A priority Critical patent/JP6584289B2/ja
Priority claimed from JP2015216551A external-priority patent/JP6584289B2/ja
Priority to TW105134301A priority patent/TWI705495B/zh
Priority to KR1020160144410A priority patent/KR101928626B1/ko
Priority to CN201610963595.XA priority patent/CN107026102B/zh
Publication of JP2017092104A publication Critical patent/JP2017092104A/ja
Publication of JP2017092104A5 publication Critical patent/JP2017092104A5/ja
Application granted granted Critical
Publication of JP6584289B2 publication Critical patent/JP6584289B2/ja
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Claims (1)

  1. 前記弾性体シートは、ヤング率が１〜４０ＭＰａであることを特徴とする請求項１から請求項５のいずれか１項に記載の基板載置台。
JP2015216551A 2015-11-04 2015-11-04 基板載置台および基板処理装置 Active JP6584289B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015216551A JP6584289B2 (ja) 2015-11-04 2015-11-04 基板載置台および基板処理装置
TW105134301A TWI705495B (zh) 2015-11-04 2016-10-24 基板載置台及基板處理裝置
KR1020160144410A KR101928626B1 (ko) 2015-11-04 2016-11-01 기판 탑재대 및 기판 처리 장치
CN201610963595.XA CN107026102B (zh) 2015-11-04 2016-11-04 基板载置台和基板处理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015216551A JP6584289B2 (ja) 2015-11-04 2015-11-04 基板載置台および基板処理装置

Publications (3)

Publication Number Publication Date
JP2017092104A JP2017092104A (ja) 2017-05-25
JP2017092104A5 true JP2017092104A5 (ja) 2018-10-18
JP6584289B2 JP6584289B2 (ja) 2019-10-02

Family

ID=58740285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015216551A Active JP6584289B2 (ja) 2015-11-04 2015-11-04 基板載置台および基板処理装置

Country Status (4)

Country Link
JP (1) JP6584289B2 (ja)
KR (1) KR101928626B1 (ja)
CN (1) CN107026102B (ja)
TW (1) TWI705495B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7090465B2 (ja) * 2018-05-10 2022-06-24 東京エレクトロン株式会社 載置台及びプラズマ処理装置
JP7133992B2 (ja) * 2018-06-07 2022-09-09 東京エレクトロン株式会社 基板載置台及び基板処理装置
JP7079718B2 (ja) * 2018-11-27 2022-06-02 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP7478903B1 (ja) * 2022-06-28 2024-05-07 日本碍子株式会社 ウエハ載置台

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237222A (ja) * 2000-02-22 2001-08-31 Shibaura Mechatronics Corp 真空処理装置
US7232591B2 (en) * 2002-04-09 2007-06-19 Matsushita Electric Industrial Co., Ltd. Method of using an adhesive for temperature control during plasma processing
JP4082924B2 (ja) * 2002-04-16 2008-04-30 キヤノンアネルバ株式会社 静電吸着ホルダー及び基板処理装置
US7431788B2 (en) * 2005-07-19 2008-10-07 Lam Research Corporation Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system
JP2007311613A (ja) * 2006-05-19 2007-11-29 Hitachi High-Technologies Corp 試料台及びそれを備えたプラズマ処理装置
CN101770971B (zh) * 2008-12-31 2012-06-20 中芯国际集成电路制造(上海)有限公司 晶圆承载装置
KR101219054B1 (ko) * 2009-05-27 2013-01-18 도쿄엘렉트론가부시키가이샤 정전 흡착 전극 및 그 제조 방법, 그리고 기판 처리 장치
US20120037068A1 (en) * 2010-08-11 2012-02-16 Applied Materials, Inc. Composite substrates for direct heating and increased temperature uniformity
JP6010433B2 (ja) * 2012-11-15 2016-10-19 東京エレクトロン株式会社 基板載置台および基板処理装置
JP6296770B2 (ja) * 2013-11-29 2018-03-20 日本特殊陶業株式会社 基板載置装置
JP2017001899A (ja) * 2015-06-05 2017-01-05 旭硝子株式会社 フロートガラス製造方法、及びフロートガラス製造装置

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