JP2017073375A - Plasma processing device and plasma torch - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma processing device capable of improving the efficiency of plasma irradiation on a processing object, and a plasma torch.SOLUTION: In a plasma torch 25, first and second plasma generation electrodes 25A, 25B facing to each other while sandwiching cylindrical insulating pipe 25P therebetween, the cylindrical insulating pipe corresponding to a hollow insulating member, are attached. Thus, when voltage is applied on the first and second plasma generation electrodes 25A, 25B during plasma generating gas is supplied, plasma is generated between the first and second plasma generation electrodes 25A, 25B, so that a processing object W passing through the insulating pipe 25P can be irradiated with plasma.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a plasma processing apparatus for processing a processing target with plasma and a plasma torch for irradiating the processing target with plasma.

  2. Description of the Related Art Conventionally, as a plasma processing apparatus, an apparatus that irradiates a plasma frame so that the tip is located on the surface of a particle group to be processed is known (for example, see Patent Document 1).

Japanese Patent Laying-Open No. 2014-083510 (paragraph [0007], FIG. 11)

  In the conventional plasma processing apparatus or plasma torch, improvement in the efficiency of plasma irradiation to the processing target has been demanded.

  The present invention has been made in view of the above circumstances, and an object thereof is to provide a plasma processing apparatus and a plasma torch capable of improving the efficiency of plasma irradiation to a processing target.

  In order to achieve the above object, the invention according to claim 1 includes a hollow insulating member having a processing space in which a processing target is accommodated or passed, and a first plasma disposed outside the hollow insulating member. A voltage for generating plasma in the processing space is disposed between the generation electrode and the first plasma generation electrode outside or inside the processing space with at least a part of the processing space interposed therebetween. And a second plasma generation electrode applied between the plasma generation electrodes.

  The invention of claim 2 includes an insulating pipe as the hollow insulating member, and the first and second plasma generating electrodes are both formed in a strip shape and are wound around the outer surface of the insulating pipe in a spiral shape parallel to each other. The plasma processing apparatus according to claim 1.

  The invention of claim 3 includes an insulating pipe as the hollow insulating member, the first plasma generating electrode has a strip shape, and is wound spirally around the outer surface of the insulating pipe, and the second plasma generating electrode is The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus has a rod shape and is accommodated in the insulating pipe.

  According to a fourth aspect of the present invention, the first plasma generation electrode includes a first spiral electrode and a second spiral electrode obtained by winding two strip-shaped metal sheets in parallel to each other, and the first and second spiral electrodes. The plasma processing apparatus according to claim 3, wherein a voltage is alternately applied between the second plasma generation electrode.

  The invention according to claim 5 includes an insulating pipe as the hollow insulating member, and the first and second plasma generation electrodes are both in a ring shape, and are wound alternately around the outer surface of the insulating pipe. The plasma processing apparatus according to claim 1.

  The invention of claim 6 includes an insulating pipe as the hollow insulating member, wherein the first plasma generating electrode has a ring shape, and is wound around the outer surface of the insulating pipe, and the second plasma generating electrode has a rod shape. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus is housed inside the insulating pipe.

  According to a seventh aspect of the invention, the first plasma generation electrode and the second plasma generation electrode have a flat plate shape facing each other, and the processing space includes the first plasma generation electrode, the second plasma generation electrode, and the like. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus is spirally wound or meandering in a flat space between the two.

  The invention of claim 8 includes an insulating pipe as the hollow insulating member, and the second plasma generation electrode has a spiral blade housed in the insulating pipe and driven to rotate. It is a plasma processing apparatus of description.

  In a ninth aspect of the present invention, the insulating pipe extends in a horizontal direction or an oblique direction with respect to the horizontal direction, and the first plasma generation electrode is unevenly distributed on the lower side in the circumferential direction of the insulating pipe. It is a plasma processing apparatus of description.

  According to a tenth aspect of the present invention, the insulating pipe extends in a horizontal direction or an oblique direction with respect to the horizontal direction, and has a gap between the outer end surface of the spiral blade of the second plasma generation electrode and the inner surface of the insulating pipe. 10. The plasma processing apparatus according to claim 8, wherein the processing target that is a granular material accommodated in the gap is moved by an impact when plasma is generated.

  According to an eleventh aspect of the present invention, the insulating pipe extends in an oblique direction with respect to a horizontal direction, and the spiral blade rotates so as to feed the processing object from the bottom to the top, and is accommodated inside the insulating pipe. Provided on the side of the insulation pipe, a treatment medium that moves together with the treatment object, crushes the treatment object, a separation part that separates the treatment object and the treatment medium discharged from the upper end of the insulation pipe, The plasma processing apparatus according to claim 10, further comprising: a medium return chute that sends the processing medium separated by the separation unit to a lower end portion of the insulating pipe.

  The invention of claim 12 includes an insulating pipe as the hollow insulating member, and the second plasma generation electrode arranged inside the insulating pipe and capable of linearly moving in the axial direction of the insulating pipe, A voltage is applied to the first and second plasma generation electrodes when the second plasma generation electrode moves in one of the axial directions of the insulating pipe, while the second plasma generation electrode is in the axial direction of the insulating pipe. The plasma processing apparatus according to claim 1, wherein no voltage is applied when moving to the other side.

  According to a thirteenth aspect of the present invention, the first plasma generating electrode covers at least a part of the outer surface of the hollow insulating member, the second plasma generating electrode is accommodated in the hollow insulating member, and the hollow insulating member It is a plasma processing apparatus of Claim 1 which has the protrusion part which protruded toward the inner surface of the part covered with the said 1st plasma production electrode among these.

  The invention according to claim 14 is disposed between the first plasma generation electrode and the second plasma generation electrode in a state of being insulated from the first and second plasma generation electrodes, The plasma processing apparatus according to claim 1, further comprising a start electrode that induces plasma generation between the second plasma generation electrode.

  A fifteenth aspect of the present invention is the plasma processing apparatus according to the fourteenth aspect, wherein the starting electrode is a processing medium for pulverizing the processing target that is a granular material.

  The invention according to claim 16 has a relay electrode disposed between the first plasma generation electrode and the second plasma generation electrode in a state of being insulated from the first and second plasma generation electrodes, The plasma processing apparatus according to claim 1, wherein plasma is generated between the first plasma generation electrode and the second plasma generation electrode via the relay electrode.

  The invention according to claim 17 is an insulating pipe as the hollow insulating member, the first and second plasma generating electrodes facing each other across the insulating pipe, and a plurality of relay electrodes embedded in the insulating pipe. The plasma processing apparatus according to claim 17, wherein plasma is generated along an inner surface of the insulating pipe via the relay electrode.

  According to an eighteenth aspect of the present invention, the first and second plasma generation electrodes face each other in a parallel state, and the hollow insulating member closes the depression to a first flat plate having a depression on a part of a flat surface. The second flat plate is overlapped and the whole forms a plate shape inserted and removed from the side between the first plasma generation electrode and the second plasma generation electrode, and the recess is closed to The plasma processing apparatus according to claim 1, which is a processing space.

  A nineteenth aspect of the present invention is the plasma processing apparatus according to the first aspect, wherein the hollow insulating member includes a cylindrical rotary container that is formed in a cylindrical shape and is driven to rotate about a central axis.

  The invention according to claim 20 is provided with a conductive roller that contacts the outer peripheral surface of the cylindrical rotating container and rotatably supports the cylindrical rotating container, and the conductive roller serves as the first plasma generation electrode. The plasma processing apparatus according to claim 19.

  The invention of claim 21 includes a plurality of metal plates fixed to the outer peripheral surface of the cylindrical rotary container, extending along the axial direction of the cylindrical rotary container, and arranged in the circumferential direction of the cylindrical rotary container. And at least two power supply devices arranged to be in contact with different metal plates among the plurality of metal plates, wherein the metal plate in contact with the power supply device is the first or second. The plasma processing apparatus according to claim 19, which functions as a plasma generation electrode.

  According to a twenty-second aspect of the present invention, there is provided a first plasma generation electrode having a processing space in which a processing target is accommodated or passed, and at least a part of the processing space sandwiched between the first plasma generation electrode. A plasma processing apparatus, comprising: a second plasma generation electrode disposed opposite to the first plasma generation electrode, wherein a voltage for generating plasma in the processing space is applied between the first plasma generation electrode and the first plasma generation electrode It is.

  According to a twenty-third aspect of the present invention, a cylindrical rotary container as a first plasma generating electrode that is driven to rotate around a central axis in a cylindrical shape, and supplies power to the cylindrical rotary container in contact with the cylindrical rotary container The plasma processing apparatus according to claim 22, further comprising a power supply device.

  In a twenty-fourth aspect of the invention, the power feeding device includes a conductive roller that contacts an outer peripheral surface of the cylindrical rotating container and rotatably supports the cylindrical rotating container. The plasma processing apparatus.

  According to a twenty-fifth aspect of the present invention, a processing medium for pulverizing or diffusing the processing target is accommodated in the cylindrical rotary container, and the processing is performed between the first plasma generation electrode and the second plasma generation electrode. The plasma processing apparatus according to any one of claims 19, 20, 21, 23, and 24, wherein plasma is generated via a medium.

  A twenty-sixth aspect of the present invention is directed to a cylindrical container having a bottom in which a processing target that is a liquid, a granular material, or a mixture thereof, and a stirrer for stirring the processing target are accommodated, and the cylinder A first plasma generating electrode disposed above the stirrer in the cylindrical container and having a facing surface facing the bottom wall of the cylindrical container; and disposed between the bottom wall and the first plasma generating electrode. And a cylindrical shape extending along the central axis of the cylindrical container, and a tip surface of the cylindrical container is composed of a second plasma generating electrode facing the facing surface of the first plasma generating electrode, and the cylindrical container And a pair of plasma generation electrodes to which a voltage for generating plasma is applied.

  According to a twenty-seventh aspect of the present invention, the first plasma generation electrode has a disk shape having the opposing surface on the lower surface, and the second plasma generation electrode is positioned below a position below an outer edge of the first plasma generation electrode. 27. The plasma processing apparatus according to claim 26, wherein the plasma processing apparatus has a cylindrical shape depending on the surface.

  According to a twenty-eighth aspect of the invention, the first plasma generation electrode is disposed below the disk portion having a disk portion having the opposing surface on the lower surface, and tapers downward from a circle having a smaller diameter than the disk portion. The second plasma generating electrode extends downward from a position below the outer edge of the disk portion of the first plasma generating electrode, and the conical portion of the first plasma generating electrode. 27. The plasma processing apparatus according to claim 26, wherein the plasma processing apparatus has a truncated cone shape surrounding the shape.

  According to a twenty-ninth aspect of the present invention, the first plasma generation electrode is disposed such that the facing surface is located above the liquid surface or powder surface of the processing target, and the second plasma generation electrode is the processing target. 29. The plasma processing apparatus according to any one of claims 26 to 28, wherein the plasma processing apparatus is disposed below a liquid level or a powder level.

  The invention of claim 30 is the plasma processing apparatus according to any one of claims 26 to 29, wherein the stirrer is rotationally driven by a magnetic stirrer.

  A thirty-first aspect of the invention is the plasma processing apparatus according to any one of the twenty-sixth to twenty-ninth aspects, wherein the stirrer is rotationally driven by a motor.

  According to a thirty-second aspect of the present invention, there is provided a hollow insulating member having a gas passage through which plasma generated gas passes, and an outer side of the hollow insulating member, facing each other with the gas passage interposed therebetween, and plasma in the gas passage. A plasma torch comprising a first plasma generation electrode and a second plasma generation electrode to which a voltage for generating is applied.

  According to a thirty-third aspect of the present invention, the gas passage is also used as a target flow path through which a processing target passes, and the processing target can pass through the gas passage sandwiched between the first and second plasma generation electrodes. A plasma torch according to claim 32.

  The invention according to claim 34 is a straight pipe having a target flow passage on the inside for allowing the processing target to pass from one end side to the other end side, and extends obliquely laterally toward the one end side from a position near the one end of the straight pipe. A branch pipe as the hollow insulating member, a gas supply port provided at a tip of the branch pipe, to which a plasma generating gas is supplied, and from the gas supply port to the inside of the branch pipe 33. The plasma according to claim 32, further comprising: the gas passage extending in the straight pipe toward the other end side, and the first and second plasma generation electrodes facing each other with the branch pipe interposed therebetween. It is a torch.

  The invention of claim 35 includes a straight pipe, and a branch pipe extending obliquely from the position near one end of the straight pipe toward the one end, and the branch pipe as the hollow insulating member, An inner pipe as a part of the hollow insulating member disposed inside the straight pipe among the branch pipes, and an outer peripheral surface of a portion of the straight pipe in the branch pipe on the other end side of the branch pipe. A cylindrical electrode as the first plasma generation electrode covering the metal rod, and a rod-shaped covering electrode as the second plasma generation electrode, which is formed by covering a metal rod with the inner pipe and accommodated inside the straight pipe, The plasma torch according to claim 32, further comprising: a gas supply port that is provided at a distal end portion of the branch pipe and to which a plasma generation gas is supplied.

  The invention of claim 36 is characterized in that the insulating pipe as the hollow insulating member, the inner pipe as a part of the hollow insulating member disposed inside the insulating pipe, and the outer pipe covering the outer peripheral surface of the insulating pipe. A cylindrical electrode as one plasma generating electrode, a rod covered with a metal rod covered with the inner pipe, and the rod-shaped covering electrode as the second plasma generating electrode housed in the straight pipe, and one end of the insulating pipe A closing member that closes an opening at one end thereof, and a through-hole that is formed in the closing member and to which one end of the rod-shaped covering electrode is fixed. The plasma torch according to claim 32, wherein a gas flow path is formed in communication with the gas passage and through which the plasma generation gas can pass.

  The invention according to claim 37 is an insulating case as the hollow insulating member, comprising a box-shaped case having a box shape with an opening on the lower surface, and a plurality of inner pipes arranged inside the box-shaped case, and a metal rod The inner pipe and the fixed electrode as the first plasma generation electrode fixed inside the box-shaped case, and the metal rod covered with the other inner pipe, and the box A plasma torch according to claim 32, further comprising: a movable electrode as the second plasma generating electrode accommodated in a shape case so as to be movable up and down, wherein a plasma processing range can be changed by a position of the movable electrode. is there.

  A thirty-eighth aspect of the present invention is the plasma torch according to any one of the thirty-second to thirty-seventh aspects, wherein a plasma jet is ejected from an end of the hollow insulating member by the flow pressure of the plasma generating gas.

  The invention of claim 39 is performed by mixing, crushing, and granulating the plasma torch according to any one of claims 32 to 38 and the processing target such as powder, liquid, solid, and gas. An additional processing unit that performs additional processing such as drying, and performs plasma processing on the processing target together with the additional processing.

  The invention of claim 40 is a configuration for additional processing for performing additional processing such as mixing, crushing, granulation, drying, etc., on a processing target such as powder, liquid, solid, gas, etc. in the processing space. A first plasma generating electrode and a second plasma generating electrode, which are attached to a body and the additional processing component, face each other across the processing space, and are supplied with a voltage for generating plasma in the processing space And a plasma processing apparatus that performs plasma processing on the processing target together with the additional processing.

[Invention of Claim 1]
According to the first aspect of the present invention, when a voltage is applied between the first and second plasma generation electrodes, the object to be processed located between the first and second plasma generation electrodes in the processing space. Since the plasma is irradiated, it is possible to improve the reliability of the plasma irradiation to the processing target, and it is possible to improve the efficiency of the plasma irradiation to the processing target.

In addition, the process enumerated below and the process shown in the Example can be efficiently performed using the plasma processing apparatus and the plasma torch of the present invention.
A. Waste treatment / environmental purification: (1) Decomposition treatment of toxic gas, liquid, solid and granular material. (2) Deodorizing treatment of gas, liquid, solid and granular material.
B. Oxidation and reduction treatment: (1) Reduction treatment of the oxidation product by adding hydrogen and activating to generate hydrogen radicals. (2) Oxidation treatment of the target treatment object by adding oxygen and activating to generate oxygen radicals or ozone.
C. Surface treatment: (1) In the cleaning effect, the moisture contained in the air adsorbed on the surface of the substance, mold fungus floating in the air, virus, miscellaneous bacteria, dust, dust, pollen, mite dying / fun, etc. are organic matter As a cause of contamination, the attractive force between atoms and static electricity also cause the contamination. By subjecting them to decomposition and vaporization removal at the molecular level, the surface of the substance is cleaned. Furthermore, the surface of the clean substance is made hydrophilic, and wettability, adhesion and solubility are improved. (2) In the coating effect, a coating process including CVD, a water repellent process, a surface hardening process, a surface modification process, and the like can be performed under the process.
D. Functional group provision: Functional group such as hydroxyl group and amino group is imparted to various treated surfaces.
E. Sterilization, sterilization, cleaning treatment: (1) For food, pharmaceuticals, hygiene products, medical supplies, etc., the plasma-generated particles collide with mold fungi, viruses, bacteria, bacteria, mold spores, and the cell walls are destroyed. Sterilization and sterilization. Sterilization and sterilization with plasma-generated ozone. (2) Cleaning of organic matter such as dust, dust, pollen, mites, etc. by decomposing and vaporizing and removing them at the molecular level.
F. Material decomposition: Chemical bond breaking material decomposition by collision of high-energy particles such as radicals and excited atoms. Or thermal decomposition of fine particles by collision of high energy particles.
G. New material creation: Development of new functional organic materials for a wide range of materials ranging from organic and inorganic to biomolecules, which are being studied in material creation engineering. Production of high-functional ceramics from the atomic and molecular level. Manufacture of highly functional catalysts and optical / electronic functional molecular materials that have never existed before. Assembly of molecules at the nano level and production of fine particles. Manufacture of nano-thin films as film materials.
H. Plasma cleaning: The plasma processing unit 4 is an airtight chamber (not shown), a robot is installed inside the chamber, and the robot arm is equipped with a plasma torch. The processing object placed in the chamber is cleaned with a plasma jet. Processing may be performed. Since the plasma cleaning is a dry process, no waste liquid is produced, and a drying process is not required.
I. Firing and sintering treatment: An apparatus configuration capable of firing and sintering treatment may be used, and the firing and sintering treatment may be performed.
(Reference: In the resin industry, it is fired at 220 degrees and sintered in the glass transition temperature zone.)
In addition, van der Waals force, electrostatic force, liquid cross-linking force, etc. act on the granular material in a general granular material processing apparatus, and the granular material adheres and aggregates to form an aggregate. It is possible. On the other hand, the surface of the granular material is modified by plasma processing of the granular material by the plasma treatment of this embodiment, and the above phenomenon can be eliminated or reduced.

1 is a side sectional view of a jet mill according to a first embodiment of the present invention. Cross section of jet mill (A) Cross section of plasma torch 25, (B) Cross section of plasma torch 25 Cross section of plasma torch 23 (A) Enlarged sectional view of the plasma torch 23, (B) Enlarged sectional view of the plasma torch 23 Sectional drawing of the plasma torch 26 which concerns on a modification Sectional drawing of the plasma torch 27 which concerns on a modification Sectional drawing of the plasma torch 28 which concerns on a modification Sectional drawing of the plasma torch 29 which concerns on a modification Sectional drawing of the plasma torch 30 which concerns on a modification Sectional drawing of the plasma torch 21 which concerns on a modification Sectional drawing of the plasma torch 24 which concerns on a modification Side sectional view of a jet mill according to a modification Sectional drawing of the plasma torch 22 which concerns on a modification Side sectional view of a jet mill according to a second embodiment The perspective view of the grinding | pulverization apparatus which concerns on 3rd Embodiment. Side sectional view of a dispersion apparatus according to a fourth embodiment The expanded sectional side view of the dispersion apparatus which concerns on 5th Embodiment The perspective view of the mixing apparatus which concerns on 6th Embodiment Enlarged view around the plasma torch in the mixing device Front view of a vertical rotary mixer according to a seventh embodiment Conceptual diagram of a rotating vertical rotating mixer A perspective view of a ribbon blade mixer according to an eighth embodiment. Top view of ribbon blade Front view of vibration sieve machine according to ninth embodiment Front sectional view of the upper part of the vibrating screen Expanded cross section around the upper discharge passage The expanded sectional view of the upper discharge passage circumference of the vibration sieve machine concerning a 10th embodiment Front view of the dust collector according to the eleventh embodiment Front view of a gas transport device according to a twelfth embodiment (A) Cross-sectional view of plasma torch 24 attached to transport pipe according to modified example, (B) Cross-sectional view of plasma torch 27 attached to transport pipe according to modified example Conceptual diagram of transport piping with multiple plasma torches 24 attached (A) Cross-sectional view of plasma torch 22 attached to transport pipe according to modification, (B) Cross-sectional view of plasma torch 26 attached to transport pipe according to modification Side cross-sectional view of transportation piping according to modification Sectional view of transportation piping according to modification Sectional view of transportation piping according to modification The top view of the loop part of the transportation piping concerning a 13th embodiment Cross section of the loop Side view of the loop Sectional drawing of the loop part which concerns on a modification Sectional drawing of the loop part which concerns on a modification Sectional drawing of the loop part which concerns on a modification Side sectional view of a loop portion according to a modified example Plan sectional view of a loop portion according to a modification Cross-sectional view of a flow path case according to a fourteenth embodiment Front sectional view of flow path case Side sectional view of flow path case according to modification Side sectional view of flow path case according to modification Side sectional view of flow path case according to modification A perspective view of a lattice channel according to a fifteenth embodiment. Cross section of lattice channel Cross-sectional side view of lattice flow path Side sectional view of the plasma torch according to the sixteenth embodiment Side sectional view of a plasma torch according to a modified example Side sectional view of the tube processing apparatus according to the seventeenth embodiment. (A) Side sectional view of transportation piping according to modification, (B) A-B-C-D line combined sectional view Schematic diagram of plasma processing chamber according to the eighteenth embodiment. Side cross-sectional view of plasma processing chamber Side sectional view of plasma processing chamber according to modification The perspective view of the vibration conveyor which concerns on 19th Embodiment Front sectional view of vibration conveyor Side sectional view of belt conveyor Perspective view of rotary table conveyor (A) Side sectional view of screw conveyor according to twentieth embodiment, (B) Front sectional view of screw conveyor (A) Side sectional view of the screw conveyor according to the twenty-first embodiment, (B) Front sectional view of the screw conveyor Side view of screw conveyor according to modification Enlarged sectional view of a screw conveyor according to a modification Conceptual diagram of a screw conveyor according to a modification Conceptual diagram of a blade according to a modification A side sectional view of a channel using plasma torch 29 concerning a 22nd embodiment. Enlarged sectional view of the flow path using the plasma torch 29 Enlarged sectional view of the flow path using the plasma torch 29 Enlarged sectional view of the flow path using the plasma torch 29 Side sectional view of flow path according to modification Side sectional view of the plasma moving apparatus according to the twenty-third embodiment. Conceptual diagram of plasma processing system according to twenty-fourth embodiment Sectional view of the processing target supply unit Enlarged view of the pipe Conceptual diagram of the first processing target recovery unit and the second processing target recovery unit Conceptual diagram of the gas cleaning section Conceptual diagram of the gas buffer tank Conceptual diagram of temperature control in plasma processing section Conceptual diagram of plasma processing mechanism using no discharge according to 25th embodiment Conceptual diagram of particle size comparison Conceptual diagram of particle size comparison Side sectional view of a large-diameter pipe having no starting electrode according to the 27th embodiment Side sectional view of a large-diameter pipe with a starting electrode Side sectional view of a large-diameter pipe with a starting electrode Side sectional view of a large-diameter pipe having a starting electrode according to a modification. Side sectional view of large-diameter piping according to modification A perspective view of a surface treatment plasma torch according to a twenty-eighth embodiment. Side sectional view of surface treatment plasma torch Plan view of pore plate Front view of surface treatment plasma torch (A) Front sectional view of the surface treatment plasma torch when the movable electrode is located at the lower end, (B) Front sectional view of the surface treatment plasma torch when the movable electrode is located at the upper end Side sectional view of the cylindrical rotation processing apparatus according to the twenty-ninth embodiment. Front sectional view of cylindrical rotation processing device Explanatory drawing of the flow path in a cylindrical rotation processing device (A) Side view of internal electrode (B) Cross section of grinding media Explanatory drawing of plasma processing in cylindrical rotation processing equipment Explanatory drawing of plasma treatment between internal electrode and external electrode (A) Enlarged view of a cylindrical rotating container according to a modification (B) Enlarged sectional view of an internal electrode Front sectional view of cylindrical rotation processing apparatus according to modification The perspective view of the conductor roller electrode which concerns on a modification (A) Sectional view of conductor roller electrode according to modification (B) Sectional view of support shaft Side sectional view of a cylindrical rotation processing apparatus according to a modified example Front sectional view of cylindrical rotation processing apparatus according to modification Side sectional view of a cylindrical rotation processing apparatus according to a modified example Front sectional view of cylindrical rotation processing apparatus according to modification (A) Enlarged sectional view of divided electrode according to modification (B) Explanatory drawing of divided electrode and conductor roller electrode (A) Front sectional view of cylindrical rotation processing device according to modification (B) Explanatory drawing of divided electrode (A) Explanatory drawing of the conductor roller electrode which concerns on a modification (B) Front view of a conductor roller electrode Sectional drawing of the conductor roller electrode which concerns on a modification Sectional drawing of the conductor roller electrode which concerns on a modification Sectional drawing of the conductor roller electrode which concerns on a modification Sectional drawing of the conductor roller electrode which concerns on a modification Explanatory drawing of the conductor roller electrode and external electrode which concern on a modification Cross-sectional enlarged view of a conductive roller electrode according to a modification Explanatory drawing of the division | segmentation electrode which concerns on a modification Side view of cylindrical rotation processing apparatus according to modification Side view of cylindrical rotation processing apparatus according to modification Side sectional view of the vertical rotation processing apparatus according to the thirtieth embodiment. Side sectional view of a vertical rotation processing apparatus according to a modification. Side sectional view of a vertical rotation processing apparatus according to a modification. Side sectional view of a vertical rotation processing apparatus according to a modification. Front sectional view of the stirring treatment apparatus according to the thirty-first embodiment Top view of the stirrer Cross section of first and second plasma generating electrodes Front sectional view of a stirring apparatus according to a modification (A) Cross-sectional view of first plasma generating electrode according to modified example (B) Cross-sectional view of second plasma generating electrode Front sectional view of a stirring apparatus according to a modification Front sectional view of a stirring apparatus according to a modification Explanatory drawing in arrangement | positioning of the container which concerns on a modification Explanatory drawing of the eddy current in the stirring processing apparatus which concerns on a modification Side view of concentric parallel plate electrodes according to thirty-second embodiment Perspective view of concentric parallel plate electrodes The perspective view of the concentric parallel plate electrode which concerns on a modification The perspective view of the concentric parallel plate electrode which concerns on a modification

[First Embodiment]
The jet mill 10 corresponding to the “plasma processing apparatus” of the present invention will be described below with reference to FIGS. As shown in FIGS. 1 and 2, the jet mill 10 includes a hollow disk-shaped casing 10 </ b> A having a processing chamber 11 on the inner side, and an outer portion connected to the outer side of the casing 10 </ b> A. And a venturi nozzle 12 opened in the circumferential portion. As shown in FIG. 1, the casing 10 </ b> A includes a discharge cylinder 14 that passes through the upper wall 10 </ b> J and communicates the processing chamber 11 with the outside, and a discharge cylinder 14 from the lower wall 10 </ b> U. A center pole 13 protruding to the vicinity of the lower end portion is provided.

  As shown in FIG. 2, the venturi nozzle 12 is fixed such that its central axis 12J is inclined by 20 to 70 ° with respect to a straight line P1 passing through the opening center of the venturi nozzle 12 and the central portion of the processing chamber 11. (Θ in FIG. 2 is 20 to 70 °).

  A plasma torch 25 is attached to the venturi nozzle 12. As shown in FIG. 3, the plasma torch 25 has a cylindrical shape and an insulating pipe 25P made of an insulating member (corresponding to the “hollow insulating member” of the present invention). The second plasma generation electrodes 25A and 25B are attached. The first and second plasma generation electrodes 25A and 25B are connected to different polarities of the plasma power supply unit 15, respectively.

  The opening at one end of the insulating pipe 25P is a supply port 25S to which a plasma generation gas such as argon and the processing target W that is a granular material are supplied, and the opening at the other end is taken in from the supply port 25S. The plasma generating gas and the processing target W are jetted out 25F. Note that the first and second plasma generation electrodes 25A and 25B are arranged near the ejection port 25F in the insulating pipe 25P. Moreover, the process target W in this embodiment is a granular material.

  When a voltage is applied to the first and second plasma generation electrodes 25A and 25B with the plasma generation gas being supplied, plasma is generated between the first and second plasma generation electrodes 25A and 25B. The processing target W passing through the insulating pipe 25P is irradiated with plasma. Further, depending on the flow rate of the plasma generation gas, the plasma generated between the first and second plasma generation electrodes 25A and 25B jumps out of the jet outlet 25F due to the flow pressure of the plasma generation gas, thereby forming a plasma flame. The interior of the insulating pipe 25P corresponds to the “processing space”, “gas passage”, and “target passage” of the present invention.

  As shown in FIG. 2, a plurality of through holes 10 </ b> B communicating the processing chamber 11 and the outside are formed in the outer portion of the housing 10 </ b> A, and a plasma torch 23 is attached to each through hole 10 </ b> B. Yes. In the jet mill 10 of the present embodiment, the seven plasma torches 23 and the above-described venturi nozzles 12 are arranged at 45 ° intervals. Each plasma torch 23 has a center line 23J of 20 to 70 ° with respect to a straight line P2 passing through the center of the outlet 23F of the plasma torch 23 and the center of the processing chamber 11 in the same manner as the venturi nozzle 12. It is fixed to tilt.

  As shown in FIG. 4, the plasma torch 23 has a cylindrical insulating pipe 23P made of an insulating member and a base block 23K made of an insulating member connected to one end of the insulating pipe 23P (the “blocking member of the present invention”). For example). The insulating pipe 23P has a cylindrical first plasma generation electrode 23A (corresponding to the “cylindrical electrode” of the present invention) covering the outer surface of the insulating pipe 23P at a position near the end opposite to the base end block 23K. Is provided.

  The proximal block 23K is formed with a through hole 23L at the center of a cylinder having the same diameter as the insulating pipe 23P. A second plasma generation electrode 23B is attached to the through hole 23L. The second plasma generation electrode 23B is formed by covering a metal rod 23C having a circular cross section with an insulating inner pipe 23D (hereinafter referred to as “bar-shaped covering electrode” as appropriate), one end is fitted into the through hole 23L, and the other end Extends to a position overlapping with the first plasma generation electrode 23A. The first plasma generation electrode 23A and the second plasma generation electrode 23B are connected to different polarities of the plasma power supply unit 15, respectively. An electrode protrusion 23E that protrudes to the outside of the base end block 23K is formed in a portion of the metal rod 23C that is covered with the base end block 23K, and this electrode protrusion 23E is formed in the plasma power source section 15. It is connected. The insulating pipe 23P and the inner pipe 23D correspond to the “hollow insulating member” of the present invention, and the space between the insulating pipe 23P and the inner pipe 23D corresponds to the “gas passage” of the present invention.

  The second plasma generation electrode 23B is formed with a gas flow path 23T that communicates the inside of the through hole 23L of the base end block 23K and the inside of the insulating pipe 23P. Specifically, the gas flow path 23T extends from one end of the metal rod 23C toward the other end side on the central axis of the metal rod 23C, and extends from the front end of the first passage 23V to the side. It consists of the second passage 23U. Furthermore, a gas supply pipe 23G is attached to the end of the through hole 23L of the base end block 23K opposite to the insulating pipe 23P, and the plasma generation gas is supplied from the gas supply pipe 23G, and the through hole 23L passes through the gas flow path 23T and flows into the insulating pipe 23P. Then, when a voltage is applied to the first plasma generation electrode 23A and the second plasma generation electrode 23B while the plasma generation gas is supplied, the first plasma generation electrode 23A and the second plasma generation electrode 23B Plasma is generated in the meantime, and the plasma is ejected from the ejection port 23F as a plasma flame by the flow pressure of the plasma generation gas.

  The configuration of the jet mill 10 of the present embodiment is as described above. Next, the effect of the jet mill 10 will be described. In the jet mill 10 according to the present embodiment, the processing target W released from the plasma torch 25 moves along the outer peripheral portion of the processing chamber 11 and swirls by the jet flow of the plasma generation gas from the plasma torch 23 to be processed. W collides with each other and is crushed. The large coarse powder remains on the outer periphery of the processing chamber 11 due to centrifugal force and continues to be pulverized, while the sufficiently small fine powder is discharged from the discharge cylinder 14.

  Here, in the jet mill 10 of the present embodiment, the processing object W is supplied to the plasma torch 25 together with the plasma generation gas, passes between the first and second plasma generation electrodes 25A and 25B, and the venturi nozzle together with the plasma flame. Therefore, the reliability of the plasma irradiation to the processing target W is improved, and the efficiency of the plasma irradiation to the processing target W is improved.

  Further, since the plasma torch 23 injects a plasma flame toward the flow path of the processing target W, this also improves the reliability of the plasma irradiation to the processing target W, and the efficiency of the plasma irradiation to the processing target W is improved. Be improved.

  Further, since the plasma torch 23 is formed with a flow path for flowing the plasma generation gas into the second plasma generation electrode 23B, for example, a branch pipe is provided in the insulating pipe 23P, and the plasma generation gas flows from there. Rather than having a configuration, the plasma torch 23 can be made compact. Note that when the plasma torch 23 is used alone as a hand, since it is compact, handling becomes easy and the efficiency of plasma irradiation to the processing object W is improved.

  Moreover, according to this embodiment, plasma vapor phase chemical reaction processing can be performed simultaneously with high-speed airflow crushing. If plasma gas phase chemical reaction treatment is performed, the ability of the high-speed airflow crusher will be reduced and the performance range of the crushing function, even for processing objects that have been provided as fine powder and agglomerated powder due to recent nano-sized particles And can be circulated in a high-speed air-flow pulverizer to obtain particles subjected to a desired plasma gas phase chemical reaction treatment.

  The jet mill 10 of this embodiment may be modified as follows.

(1) As a plasma torch attached to the venturi nozzle 12, instead of the plasma torch 25, plasma torches 26 to 30 shown in FIGS. As shown in FIG. 6, the plasma torch 26 is formed by winding the first and second plasma generating electrodes 26A and 26B made of a strip-shaped metal sheet in parallel and spirally around an insulating pipe 26P. The insulating pipe 26P corresponds to the “hollow insulating member” of the present invention, and the inside of the insulating pipe 26P corresponds to the “processing space”, “gas passage”, and “target channel” of the present invention.

  A convex spiral dielectric tool 26R (integrated with the insulating pipe 26P or attached by bonding or the like) is provided between the adjacent first and second plasma generation electrodes 26A and 26B. A short circuit between the matching first and second plasma generation electrodes 26A and 26B is prevented. As a result, the distance between the adjacent first and second plasma generation electrodes 26A and 26B can be shortened, and energy saving of the power capacity used for discharge can be achieved. Further, if the same power source and the same flow path are used, the range in which plasma can be generated can be lengthened.

  The plasma torch 27 shown in FIG. 7 includes a branch pipe 27P having a straight pipe 27T extending in a straight line and a branch pipe 27U extending obliquely from one position closer to one end toward the one end. ing. The first plasma generation electrode 27A has a ring shape and is wound around the straight pipe 27T in the branch pipe 27P. The second plasma generation electrode 27B is a rod-shaped covering electrode and is accommodated inside the straight pipe 27T. ing. Note that one end of the second plasma generation electrode 27B is fixed to a closing member 27H that closes one end of the straight pipe 27T. Further, a gas supply port 27G to which a plasma generation gas is supplied is provided at one end of the straight pipe 27T. Further, the tip of the branch pipe 27U serves as a supply port 27S for supplying the processing object W. The branch pipe 27P corresponds to the “insulation pipe” of the present invention, the branch pipe 27P and the inner pipe of the rod-shaped covering electrode correspond to the “hollow insulation member” of the present invention, and the inside of the branch pipe 27P is This corresponds to the “processing space”, “gas passage”, and “target channel” of the present invention.

  The plasma torch 28 shown in FIG. 8 is different from the plasma torch 27 described above in the configuration of the first plasma generation electrode 28A. That is, in the plasma torch 28, the first plasma generation electrode 28A is formed of a metal sheet wound around substantially the entire straight pipe 28T in the branch pipe 28P. The branch pipe 28P corresponds to the “insulation pipe” of the present invention, the branch pipe 28P and the inner pipe of the rod-shaped covering electrode correspond to the “hollow insulation member” of the present invention, and the inside of the branch pipe 28P is This corresponds to the “processing space”, “gas passage”, and “target channel” of the present invention.

  The plasma torch 29 shown in FIG. 9 differs from the plasma torch 27 described above in the configuration of the first plasma generation electrode 29A. That is, in the plasma torch 29, the first plasma generating electrode 29A has a configuration in which two strip-shaped metal sheets are wound in parallel and spirally with the straight pipe 28T in the branch pipe 29P. The branched pipe 29P corresponds to the “insulated pipe” of the present invention, the branched pipe 29P and the inner pipe of the rod-shaped covering electrode correspond to the “hollow insulating member” of the present invention, and the inside of the branched pipe 29P is This corresponds to the “processing space”, “gas passage”, and “target channel” of the present invention.

  The plasma torch 30 shown in FIG. 10 includes a cylindrical insulating pipe 30P, a ring-shaped first plasma generation electrode 30A connected to one electrode of the plasma power supply unit 15, and a ring-shaped connection connected to the other electrode. The second plasma generation electrodes 30B are alternately wound.

  A convex dielectric tool 30R (integrated with the insulating pipe 30P or attached by bonding or the like) is provided between the adjacent first and second plasma generating electrodes 30A and 30B, and the adjacent first And the short circuit between the 2nd plasma production electrodes 30A and 30B is prevented. As a result, the distance between the adjacent first and second plasma generation electrodes 30A and 30B can be shortened, and energy saving of the power capacity used for discharge can be achieved. Alternatively, if the same power source and the same flow path are used, the range in which plasma can be generated can be lengthened.

  Note that the first and second plasma generation electrodes 30A and 30B provided in the plasma torch 30 may be plural or one by one. The insulating pipe 30P corresponds to the “hollow insulating member” of the present invention, and the inside of the insulating pipe 30P corresponds to the “processing space”, “gas passage”, and “target channel” of the present invention.

(2) As a plasma torch attached to the venturi nozzle 12, plasma torches 21 and 24 shown in FIGS. 11 and 12 may be used instead of the plasma torch 25. As shown in FIG. 11, the plasma torch 21 includes first and second plasma generation electrodes 21A and 21B facing each other on the branch pipe 21U in the branch pipe 21P, and the tip of the branch pipe 21U generates plasma. The gas supply port 21G is supplied with gas. Then, when a plasma generating gas is supplied in a state where a voltage is applied to the first and second plasma generating electrodes 21A and 21B, a plasma flame is generated, and this plasma flame is a base end portion of the branch pipe 21U. Then, it proceeds to the other end side of the straight pipe 21T. One end of the straight pipe 21T in the branch pipe 21P is a supply port 21S to which the processing target W is supplied, and the processing target W supplied from here passes through the plasma frame on the way to the other end side. Plasma treatment. The branch pipe 21P corresponds to the “insulating pipe” and “hollow insulating member” of the present invention, the inside of the straight pipe 21T corresponds to the “target flow path” of the present invention, and the branch pipe 21U and the straight pipe 21T. The inside corresponds to the “gas passage” of the present invention.

  The plasma torch 24 shown in FIG. 12 is different from the plasma torch 21 described above in the configuration of the first and second plasma generation electrodes 24A and 24B. That is, in the plasma torch 24, the first plasma generation electrode 24A has a cylindrical shape covering the outer surface of the branch pipe 24U in the branch pipe 24P, and the second plasma generation electrode 24B is a rod-shaped covering electrode. The distal end of the branch pipe 24U is provided with a closing block 24K in which a through hole 24L is formed, and the second plasma generation electrode 24B is fitted into the through hole 24L of the closing block 24K. In addition, the second plasma generation electrode 24B is provided with a gas passage 24T that connects the inside of the branch pipe 24P and the through hole 24L, and an electrode protrusion 24E. The branch pipe 24P corresponds to the “insulation pipe” of the present invention, the branch pipe 24P and the inner pipe of the rod-shaped covering electrode correspond to the “hollow insulation member” of the present invention, and the inside of the straight pipe 24T is the main pipe. It corresponds to the “target channel” of the invention, and the inside of the branch pipe 24U and the straight pipe 24T corresponds to the “gas passage” of the invention.

(3) As shown in FIG. 13, the plasma torch 23 is provided as the plasma torch provided with the inlet 16 for introducing the processing target W into the venturi nozzle 12 and attached to the venturi nozzle 12, as shown in FIG. The plasma torch 22 may be used to irradiate the venturi nozzle 12 with a plasma flame. Even in this configuration, when the processing object W input from the input port 16 passes through the venturi nozzle 12, the plasma flame is irradiated by the plasma torch 23 or the plasma torch 22, and the plasma processing is performed.

  The plasma torch 22 shown in FIG. 14 includes a first plasma generating electrode 22A in which a metal sheet is wound around at least a part of the straight pipe 22T in the branch pipe 22P, and a rod-shaped covering electrode accommodated in the straight pipe 22T. The tip of the branch pipe 22U of the branch pipe 22P is a gas supply port 22G through which plasma generation gas is supplied. According to this configuration, since the flow rate of the plasma generating gas can be increased, the flow pressure when the plasma generating gas flows into the straight pipe 22 is increased, and the plasma flame can be increased. The branch pipe 22P and the inner pipe of the rod-shaped covering electrode correspond to the “hollow insulating member” of the present invention, the first plasma generation electrode 22A corresponds to the “cylindrical electrode” of the present invention, and the branch pipe 22U and The inside of the straight pipe 22T corresponds to the “gas passage” of the present invention.

(4) As a plasma torch attached to the through hole 10B, a plasma torch 22 may be used instead of the plasma torch 23.

(5) Instead of the plasma torch 23, plasma torches 26 to 30 may be used as the plasma torch attached to the through hole 10B. In this case, various additives may be added from the supply ports 26S to 30S. When various additives are added, the additive is retained in the plasma target W for a long time in the plasma atmosphere, and the treatment with the additive is performed. The effect can be improved.

(6) The jet mill 10 of the present embodiment has a configuration in which the processing target W swirls in the horizontal direction, but the vertical swirling high-speed airflow crusher and all particles collide with the collision plate or the collision block. The present invention may be applied to a horizontal collision plate type high-speed airflow crusher or a vertical collision plate type high-speed airflow crusher that performs crushing with a large impact force. The collision plate type high-speed airflow crusher is arranged by placing any of the plasma torches of FIGS. 5 to 11 in the crushing nozzle, passing the processing target W through the plasma torch, and colliding the processing target W with the collision block for pulverization. do. Alternatively, a ring electrode is provided at the tip of the crushing nozzle (or gas injection nozzle) and the collision block is configured as an electrode, both of which are covered with an insulator or one of them covered with an insulator to collide with the crushing nozzle tip electrode. A block electrode (not shown) is connected to the plasma power supply unit 15 to provide a mechanism capable of generating plasma. Plasma is generated between the pulverizing nozzle tip electrode and the collision block electrode, and the processing object W is ejected from the pulverizing nozzle electrode. The processing object W may collide with the collision block electrode and used for pulverization. In addition, in an apparatus having a mechanism for classifying pulverized material with a rotating impeller, the above mechanism may be provided on the rotating blade and the stationary cover (Japanese Patent Laid-Open No. 5-337394, FIG. 1, FIG. 2). Alternatively, a mechanism may be provided in which a part of the path is narrowed and all particles pass, and plasma is generated in the part to perform plasma treatment. In addition, the first and second plasma generation electrodes 22A and 22B in FIG. 14 are arranged so as to face each other in the vertical direction on the path in which the processing target W rotates in the horizontal direction, and the first and second plasmas facing each other. A configuration may be adopted in which plasma is generated between the generation electrodes 22A and 22B, or plasma treatment is performed using a linear electrode or a planar electrode. Further, this mechanism may be used for a wet vertical type or horizontal type impact plate type high-speed airflow crusher.

(7) The various plasma torches 5 to 10 can be used as plasma torches for generating a plasma jet when the flow rate of the plasma generation gas is high. Further, even when the flow rate of the plasma generation gas is low, it is possible to pass the processing target through various plasma torches 5 to 10 and use it as a plasma processing path for performing plasma processing on the passing processing target.

(8) Various plasma torches 22, 23, 27, 28, and 29 are introduced together with the plasma generation gas with the steam or mist generated by the heating device, the ultrasonic atomizer, and the mist generator, and the plasma torches 22, 23 are introduced. , 27, 28, 29 may be converted into plasma and used as a water vapor plasma torch or a water plasma torch. Further, these may be incorporated into a handy gun to form a handy gun type plasma torch, or may be used or attached to a robot arm or the like to be used as an automatic plasma processing robot.

  The plasma torches 25 to 30 themselves also function as the “plasma processing apparatus” of the present invention.

[Second Embodiment]
A second embodiment of the present invention will be described based on FIG. The jet mill 40 of this embodiment (corresponding to the “plasma processing apparatus” of the present invention) is a jet mill described in JP2013-163162A that incorporates a configuration for generating plasma. Yes. Specifically, the jet mill 40 includes a main body case 40K made of an insulating member, and a pair of jet devices 41 and 41 that are attached to the main body case 40K and arranged to face each other in the horizontal direction. The main body case 40K is formed with a processing passage 42 between the pair of jet devices 41 and 41 and a discharge passage 43 extending downward from the processing passage 42.

  Each jet device 41 includes an injection unit (not shown) that injects slurry containing the processing target W at a high speed, and a triple orifice nozzle 45 having three metal blocks 44 in which orifices are formed. Is sent to the processing passage 42 through the triple orifice nozzle 45. Further, to the pair of triple orifice nozzles 45, 45, electric wires 40A, 40B extending from the pair of electrodes 15A, 15B of the plasma power supply unit 15 are connected to the upstream metal blocks 44, 44, respectively. .

  The configuration of the present embodiment is as described above. Next, the operation of this embodiment will be described. In the jet mill 40 of the present embodiment, the slurry injected from the injection unit passes through the triple orifice nozzle 45 and is injected at high speed into the processing passage 42. Then, the slurry sprayed at high speed from the opposed triple orifice nozzles 45, 45 collide with each other, the processing target W is crushed and discharged from the discharge passage 43.

  Here, the triple orifice nozzles 45, 45 are connected to the plasma power supply unit 15, and the triple orifice nozzles 45, 45 act as a “first plasma generation electrode” and a “second plasma generation electrode” to form a pair of Plasma is generated between the triple orifice nozzles 45, that is, in the processing passage 42 (corresponding to the “processing space” of the present invention), and the slurry injected from the orifice is subjected to plasma processing. As described above, according to the present embodiment, the “first plasma generation electrode” and the “second plasma generation electrode” are arranged so as to sandwich the processing passage 42 through which pulverization passes, so The certainty of the plasma irradiation is improved, and the efficiency of the plasma irradiation to the processing object W is improved. Further, if various additives are added to the slurry in advance, a pulverized product to which the additive subjected to the plasma reaction is applied by the plasma generation reaction by the plasma irradiation can be obtained.

  In the jet mill 40 shown in FIG. 15, the jet device 41 is a pair, but a configuration in which a plurality of jet devices are directed to one point may be used. Even in this case, since there is only one liquid collision point, the number of electrodes to be attached may be one or more. Further, the processing targets W and L may be processed by airflow collision pulverization.

[Third Embodiment]
Based on FIG. 16, the grinding | pulverization apparatus 50 which is the "plasma processing apparatus" of 2nd Embodiment of this invention is demonstrated. The pulverizing apparatus 50 of the present embodiment has a configuration in which the plasma torch 23 and the plasma torch 25 are attached to the pulverizing apparatus described in JP-A-2004-351325.

  The crushing device 50 has a hopper 50B in the upper part of the main body case 50A that accommodates the cylindrical screen 51 and a discharge port 50C in the lower part, and is a process that is a granular material supplied from the hopper 50B. The target W is pulverized, passes through the screen 51, and is discharged from the discharge port 50C.

  The plasma torch 23 described above is provided in the through hole 50D provided at a position facing the outer peripheral surface of the screen 51 in the lower end portion of the main body case 50A, and the plasma torch 25 is provided in the discharge port 50C.

  According to the above-described configuration, the processing space in which the processing target W is pulverized is irradiated with the plasma flame by the plasma torch 23, and the plasma is generated when the processing target W discharged from the discharge port 50C passes through the plasma torch 25. It is processed.

  The crushing device 50 of the present embodiment may be changed as follows.

(1) Instead of the plasma torch 23, the plasma torch 22 may be used as the plasma torch attached to the through hole 50D.

(2) Instead of the plasma torch 25, plasma torches 26 to 30 may be used as the plasma torch attached to the discharge port 50C.

(3) A cylindrical screen 51 and a rotor (rotary body) 51R pivotally attached to the rotary shaft 51J are rotatably provided in the main body case 50A of the grinding device 50. The impact piece 51S at the outermost peripheral portion of the rotor 51R rotates in the main body case 50A in such a manner as to maintain a clearance with the cylindrical screen 51. The rotor 51R, the impact piece 51S and the cylindrical screen 51 are subjected to dielectric treatment, and the rotary connector and the screen 51 are connected to the plasma power supply unit 15 with a rotary connector provided at the pulley 51P side end of the rotating shaft 51R. The pulverizer 50 may be provided with a plasma generation mechanism (not shown), and plasma processing may be performed by generating plasma between the impact piece 51S and the screen 51 via the rotary connector, the rotation shaft 51J, and the rotor 51R. Further, in an apparatus in which a cylinder provided with fixed grinding protrusions is arranged on the screen 51, a fixed grinding protrusion cylinder may be used as an electrode.

(4) In addition, there is a crushing method as a crushing device with different crushing means, which rotates two special grooved roll teeth facing each other and is crushed radially when the raw material passes through the gap. With the mechanism that flows to the next stage, the raw material is crushed with cracks, with the peaks and peaks provided on the surface of the two rotating rolls as the main point (see Nippon Granulator Co., Ltd.). The crushed raw material is further transferred to the next roll, and finely sized in order. The target particle size is adjusted by the roll pitch, the number of steps, and the gap. A plasma generation mechanism may be incorporated in this crushing type crusher. Specifically, since there is no contact between the roll teeth, each roll tooth is composed of a metal, an insulator, and an electrode from the outside, and a rotary connector connected to the plasma power supply unit 15 is provided at the end of the rotating shaft, Adjacent roll teeth are respectively connected to different polarities of the plasma power supply unit 15. Thereby, plasma can be generated by generating plasma between the two grooved roll teeth facing each other.

[Fourth Embodiment]
Based on FIG. 17, a dispersion apparatus 60 which is a “plasma processing apparatus” according to a fourth embodiment of the present invention will be described. The dispersing device 60 of the present embodiment has a configuration in which the plasma torch 24 is attached to the dispersing device described in JP-A-8-99046. Moreover, in this embodiment, the process target W which is a granular material, and the process target L which is liquids, such as a slurry and a slurry, are processed.

  More specifically, the dispersing device 60 includes a cylindrical main body case 60A, a stirring bar 61 that passes through the main body case 60A and has a projecting portion 61A that protrudes to the side, and a pulverization accommodated in the main body case 60A. The plasma torches 24 and 24 are attached to the upper end portion of the start end wall 60B at one end of the main body case 60A and the lower end portion of the end wall 60C at the other end.

  Then, the processing objects W and L pass through the plasma torch 24 attached to the starting end wall 60B, are taken into the main body case 60A, and are pulverized by the pulverizing media 62 that is agitated by the rotation of the agitating rod 61. It passes through the plasma torch 24 attached to the wall 60C and is discharged.

  The distribution device 60 of the present embodiment may be changed as follows.

(1) Instead of the plasma torch 24, a plasma torch 25 may be used as the plasma torch. Further, the pulverization may be performed by using an extremely small (1 mm or less) pulverization medium 62.

[Fifth Embodiment]
A dispersion apparatus 60W (corresponding to the “plasma processing apparatus” of the present invention) of the fifth embodiment will be described with reference to FIG. The dispersion device 60W of the present embodiment has a point that the plasma torch 24 is not attached, a point that the first plasma generation electrode 63A of the present invention is incorporated in the main body case 60A, and a second plasma of the present invention that is applied to the stirring rod 61W. It differs from the dispersion device 60 of the fourth embodiment in that the generation electrode 63B is incorporated.

  Specifically, in the dispersion device 60W of the present embodiment, the stirring rod 61W includes a metal rod 61K inserted in the center thereof and a plurality of metal discs 61L attached to the metal rod 61K at regular intervals. doing. The metal rod 61K and the metal disc 61L are covered with an insulating member 63Z. Further, the outer edge portion of the metal disc 61L is the above-described overhang portion 61A.

  A metal ring 60R covered with an insulating member 60Z is fixed to a portion of the main body case 60A that faces the outer peripheral surface of the metal disc 61L. Further, in the main body case 60A, a supply port (not shown) is formed at the upper end portion of the start end wall 60B, and a discharge port (not shown) is formed at the lower end portion of the end wall 60C.

  According to this configuration, the processing target W supplied from the supply port is pulverized by the pulverization medium, and is plasma-treated when passing between the outer peripheral surface of the metal disc 61L and the inner peripheral surface of the metal ring 60R. The

[Sixth Embodiment]
A mixer 70 that is a “plasma processing apparatus” according to a sixth embodiment of the present invention will be described with reference to FIGS. 19 and 20. The mixer 70 of this embodiment has a configuration in which the plasma torch 23 is attached to the mixer described in Japanese Patent Application Laid-Open No. 2005-28283. Moreover, in this embodiment, the process target W which is a granular material, and the process target L which is liquids, such as a slurry and a slurry, are processed.

  The mixer 70 includes a cylindrical container 71 that accommodates the processing targets W and L, a rotating shaft 72 that extends on the central axis of the cylindrical container 71, and a pair of horizontal arms 73 that extend from the upper end of the rotating shaft 72. 73, and mixing plates 74 and 74 attached to the ends of the horizontal arms 73 and 73. When the rotary shaft 72 rotates counterclockwise, for example, the processing target W becomes the mixing plate 74, It is agitated by being guided by 74 and moving counterclockwise. The rotation direction of the rotation shaft 72 may be clockwise.

  Of the pair of facing portions 71B and 71B facing each other across the rotating shaft 72 in the peripheral wall 71A of the cylindrical container 71, there is a penetration between the position near the upper end of one facing portion 71B and the position near the lower end of the other facing portion 71B. Holes 71K and 71K are formed, and plasma torches 23 and 23 are attached to these through holes 71K and 71K. Each plasma torch 23 is fixed obliquely so as to go from the rear to the front in the rotation direction of the rotary shaft 72 as it goes from the rear end to the front end. Instead of the plasma torch 23, a plasma torch 22 may be used.

  According to this configuration, the plasma flame is irradiated obliquely from behind in the moving direction of the processing targets W and L, that is, the flow paths of the processing targets W and L. The plasma torch 23 attached to the through hole 71K near the lower end irradiates the plasma frame while being buried in the processing object, and the plasma torch 23 attached to the through hole 71K near the upper end Plasma processing is performed by irradiating a plasma flame above L. Further, a bypass channel (hereinafter referred to as a bypass channel) provided with the plasma torch 25, the plasma torch 26, and the plasma torch 30 is provided in the through hole 71K near the lower end of the cylindrical container 71 (not shown) and moved by stirring. The processing object may be guided to the bypass flow path with a force to perform plasma processing. Further, a plasma torch 21 may be provided, and a processing target may be introduced at a flow rate of plasma generation gas and extruded.

  Note that the mixing plate 74 of the mixer 70 is rotated by the vertical axis rotation shaft 72 in the cylindrical container 71 in such a manner that the clearance is maintained with the inner wall of the peripheral wall 71A of the cylindrical container 71. A structure in which the cylindrical container 71 is a dielectric, or a dielectric treatment is applied to the inner wall 71A of the cylindrical container 71, and an insulating treatment (insertion of insulating packing) is performed between the bottom of the cylindrical container 71 and the lower end of the peripheral wall 71A, and a rotating shaft. The rotary connector and the peripheral wall 71A are connected to the plasma power supply unit 15 and the mixer 70 is provided with a plasma generation mechanism. The rotary connector 72, the rotary shaft 72, and the horizontal arm 73 are used. Plasma treatment may be performed by generating plasma between the mixed plate 74 and the inner wall of the peripheral wall 71A. When dielectric treatment is performed on the inner wall of the peripheral wall 71A of the cylindrical container 71, the peripheral wall 71A functions as an external electrode.

[Seventh Embodiment]
A vertical rotary mixer 85 that is a “plasma processing apparatus” according to a seventh embodiment of the present invention will be described with reference to FIGS. 21 and 22. As shown in FIGS. 21 and 22, the vertical rotary mixer 85 has a cylindrical tumbler 86 extending in the vertical direction and having a narrowed bottom end, and passes through an intermediate position in the axial direction of the tumbler 86. A rotating shaft 87 integrated with a plasma torch 22 for irradiating a plasma flame is provided in the inside 86. Moreover, in this embodiment, the process target W which is a granular material, and the process target L which is liquids, such as a slurry and a slurry, are processed. Further, the bypass channel of the sixth embodiment may be provided and used near the center of the side surface outside where the processing object of the vertical rotary mixer 85 flows down by gravity. At this time, plasma may be generated and used only when passing down due to gravity. Other vertical rotary mixers include V-type mixers, CV-type mixers, W-type mixers, and infinite mixers (see Tokuju Kogyo Co., Ltd.). You may apply.

  According to this vertical rotary mixer 85, the processing targets W and L are inserted so that the rotating shaft 87 is hidden by the tumbler 86 (about 70% of the capacity of the tumbler 86), and the tumbler 86 is rotated to rotate the processing target W. , L are mixed and plasma treatment is performed.

  Further, if air is added as a support gas to the plasma torch 22 or a support chemical is added, ozone generated by the plasma or plasma-converted chemical is released together with the plasma flame and mixed with the processing objects W and L. Therefore, even if the amount of the processing targets W and L is less than the rotation shaft 87 of the tumbler 86, it can be handled.

  When the processing objects W and L are used with the amount of the rotating shaft 87 or less, the processing objects W and L are scooped up in the tumbler 86 in accordance with the rotation of the tumbler 86 and dropped toward the rotating shaft. A lifter may be provided. In addition, the plasma torch 25 may be attached to the narrowed lower end portion of the tumbler 86.

  The vertical rotary mixer 85 shown in FIG. 21 and FIG. 22 is configured to perform only rotation, but is a container rotating three-dimensional motion stirrer that continuously performs three different operations of rotation, twist, and inversion. May be.

[Eighth Embodiment]
A ribbon blade mixer 90 that is a “plasma processing apparatus” according to an eighth embodiment of the present invention will be described with reference to FIGS. 23 and 24. As shown in FIG. 23, the ribbon blade mixer 90 has a cross-sectional shape inside a box-shaped container 90A (which may be cylindrical) having a shape in which a semicircle is combined below a quadrangle, as shown in FIG. The plasma torches 23 and 23 are fixed to through-holes 90C and 90C that are provided side by side on the side wall 90B of the container 90A. According to this configuration, the plasma flame from the plasma torch 23 is irradiated to the processing targets W and L mixed by the rotation of the ribbon blade 91. Moreover, you may use another plasma torch similarly to the said 6th Embodiment. Furthermore, in the ribbon blade mixer 90, the bypass flow path of the sixth embodiment is provided at the position near the center of the outer side of the side surface where the processing object moves by the rotation of the ribbon blade 91 or the position near the center of the outer surface of the bottom surface. Also good.

  The ribbon blade 91 of the ribbon blade mixer 90 is horizontally rotated by the ribbon blade shaft 92 in the container 90A while maintaining a clearance from the inner wall of the side wall 90B of the container 90A. A structure in which the container 90A is used as a dielectric or a dielectric treatment is applied to the inner wall of the side wall 90B of the container 90A, and an insulating process (insertion of insulating packing) is performed between the side wall 90B of the container 90A and the shaft end of the ribbon blade 91 The rotary connector and the side wall 90B are connected to the plasma power supply unit 15 to provide a mechanism having a plasma generation mechanism, and the ribbon blades 91 and 90B side bottom surfaces via the rotary connector / ribbon blade shaft 92. Plasma treatment may be performed by generating plasma between the walls. When dielectric treatment is applied to the inner wall of the side wall 90B, the side wall 90B functions as an external electrode.

[Ninth Embodiment]
Based on FIGS. 25-27, the vibration sieve 75 which is the “plasma processing apparatus” of the ninth embodiment of the present invention will be described. The vibration sieving machine 75 of the present embodiment has a configuration in which the plasma torch 22 is attached to the vibration sieving machine described in JP-A-2002-355611.

  As shown in FIG. 26, the vibration sieve machine 75 has an upper chamber 77 and a lower chamber 78 partitioned by a net body 76, and the vibration sieve machine 75 is vibrated by the vibration body 75S. The processing object W, which is a granular material supplied to 77, is classified into a relatively small diameter processing object W that has passed through the net body 76 and a relatively large diameter processing object W that has not passed through the net body 76. The processing target W that has not passed through the mesh body 76 is discharged through the upper discharge passage 77A connected to the upper chamber 77, while the processing target W that has passed through the network body 76 is connected to the lower chamber 78. It is discharged through the discharge passage 78A.

  The plasma torch 22 is attached to the upper discharge passage 77A and the lower discharge passage 78A, respectively. Thereby, the plasma processing is performed on the processing target W which is classified and discharged from the upper discharge passage 77A or the lower discharge passage 78A (see FIG. 27). In place of the plasma torch 22, a plasma torch 23 may be used.

  In addition, as a classification device of the granular material, a cyclone classification device that classifies the granular material into heavy particles and light particles by the force of wind force, an airflow classification device that creates an air current and classifies it with the wind force in the air current There is also a classifier device using a combination of a net and wind power, which has a structure in which powder particles are dispersed in a wind flow and a stationary net is passed through. Plasma classification may be performed by attaching a plasma torch or the like to these classifiers. Moreover, the structure which processes not the process target W but the process target L which is liquids, such as a slurry and a slurry, may be sufficient.

[Tenth embodiment]
The vibration sieve machine 75W (corresponding to the “plasma processing apparatus” of the present invention) of the tenth embodiment has a pair of plate-like shapes instead of the plasma torches 22 and 22 in the upper discharge passage 77A and the lower discharge passage 78A. The plasma generating electrodes 75A and 75B are different from the vibration sieving machine 75 of the ninth embodiment. Hereinafter, the upper discharge passage 77A shown in FIG. 28 will be described as an example. As shown in the drawing, an insulating plate 75L made of an insulating member and a plate-shaped first plasma generation electrode 75A are arranged on the lower wall near the base end portion of the upper discharge passage 77A, An insulating block 75M in which a plate-like second plasma generation electrode 75B facing the first plasma generation electrode 75A is embedded is provided above. The insulating block 75M is formed with a through hole 75G from which a plasma generating gas is supplied. Thereby, the processing object W passing through the upper discharge passage 77A is processed by the plasma generated between the pair of plasma generation electrodes 75A and 75B. Moreover, the structure which processes not the process target W but the process target L which is liquids, such as a slurry and a slurry, may be sufficient.

[Eleventh embodiment]
Based on FIG. 29, the dust collector 80 which is the "plasma processing apparatus" of 11th Embodiment of this invention is demonstrated. The dust collector 80 includes a dust collector 81 in which an exhaust fan (not shown) is attached to a hopper 81A, a plasma processing passage 82 extending from the lower end of the dust collector 81 (hopper 81A), and a lower portion of the lower end of the plasma processing passage 82. And a recovery container 84 positioned therein, and valves 83 and 83 for maintaining airtightness are provided between the dust collector 81 and the plasma processing passage 82 and at the lower end portion of the plasma processing passage 82. Here, the plasma torch 25 described above is used as the plasma processing passage 82.

  According to this configuration, the collected material collected by the dust collector 81 (corresponding to the “processing object” of the present invention) is always plasma-treated while being discharged to the collection container 84.

  As the plasma processing passage 82, any of the plasma torches 21, 22, 24, and 26 to 30 described above may be used instead of the plasma torch 25. Moreover, the structure which attaches the plasma torches 22,23 etc. to the dust collector 81, for example, and performs a plasma processing may be sufficient. Moreover, you may use the piping (refer FIG. 35, 36) which embed | buried the non-grounding electrode 103 mentioned later.

[Twelfth embodiment]
Based on FIG. 30, the gas transport apparatus 100 of this embodiment is demonstrated. The gas transport device 100 has a first chamber 100A, a second chamber 100B, and a third chamber 100C arranged in the vertical direction. The first chamber 100A is provided with a supply port (not shown) through which the processing target W is supplied from the processing target supply unit 102 that stores and supplies the processing target W that is a granular material, and the third chamber 100C. In the side, a transport gas supply port 100G is provided on the side, and a transport pipe 101 (corresponding to the “plasma processing apparatus” of the present invention) through which the processing target W is transported is connected to the lower end. . Valves 100V are provided between the first chamber 100A and the second chamber 100B, between the second chamber 100B and the third chamber 100C, and between the third chamber 100C and the transport pipe 101, respectively.

  As shown in FIG. 30, the transport pipe 101 includes a vertical portion 101A extending vertically downward from the lower end of the third chamber 100C, a bent portion 101B positioned below the vertical portion 101A and bent by 90 °, and a bent portion. A horizontal portion 101C extending in the horizontal direction from 101B. A plasma torch 23 is attached to the bent portion 101K. The plasma torch 23 is inserted coaxially with the horizontal portion 101C from the opposite side of the bent portion 101K to the side where the horizontal portion 101C extends, and is horizontally aligned with the portion of the bent portion 101B that extends coaxially with the horizontal portion 101C. The plasma frame is irradiated to the base end of the part 101C.

  The configuration of the present embodiment is as described above. Next, the operation of this embodiment will be described. In the gas transport apparatus 100 of the present embodiment, the processing target W supplied to the first chamber 100A is sent to the third chamber 100C while the transport amount is adjusted by the valve 100V, and transported from the supply port 100G therefrom. The inside of the transportation pipe 101 is transported by the gas flow pressure. At this time, the processing target W passing through the transport pipe 101 is irradiated with the plasma flame when passing through the bent portion 101B.

  The gas transport device 100 of the present embodiment may be modified as follows.

(1) Various plasma torches 21, 24, 27, 28, and 29 may be attached to a part of the transport pipe 101. FIG. 31A shows an example in which the plasma torch 24 is attached, and FIG. 31B shows an example in which the plasma torch 27 is attached. In this case, the plasma torch 23 may or may not be provided in the bent portion 101B. Further, only one plasma torch 21, 24, 27, 28, 29 may be attached to the transport pipe 101 or a plurality of plasma torches 21, as shown in FIG.

(2) A configuration in which various plasma torches 22, 25, 26, and 30 are attached to a part of the transport pipe 101 and a plasma generation gas is used as a transport gas supplied from the supply port 100G may be used. FIG. 33A shows an example in which the plasma torch 22 is attached, and FIG. 33B shows an example in which the plasma torch 25 is attached. In this case, the plasma torch 23 may or may not be provided in the bent portion 101B. Further, only one plasma torch 22, 25, 26, 30 may be attached to the transport pipe 101, or a plurality of plasma torches 22, 25, 26, 30 may be attached.

(3) As shown in FIG. 34, the transport pipe 101 is made of an insulating member and includes the first and second plasma generation electrodes 101A and 101B facing the transport pipe 101 and supplied from the supply port 100G. Alternatively, a plasma generation gas may be used as the transport gas.

  In this case, as shown in FIG. 35, a distance between the first and second plasma generation electrodes 101A and 101B is increased, and a rod-shaped non-ground electrode 103 made of a conductor is used as an insulating member constituting the transport pipe 101 (the present invention When a plurality of (corresponding to “relay electrodes”) are embedded, plasma that connects the first and second plasma generation electrodes 101A and 101B at the shortest distance (in a straight line) is not generated, and is along the inner surface of the transport pipe 101. Thus, while the plasma barrier is generated and the plasma processing is performed, the processing target W can pass through without touching the inner surface of the transport pipe 101. Even when the transport pipe 101 has a square cross section, the same effect can be obtained by embedding the non-grounded electrode 103 as shown in FIG.

  Further, as shown in FIG. 56, the insulating member constituting the transport pipe 101 is provided with a ring-shaped first plasma generation electrode 101A connected to one electrode of the plasma power supply unit 15 and a ring-shaped connection connected to the other electrode. Similar effects can be obtained even when the second plasma generation electrodes 101B are alternately wound and the ring-shaped non-grounded electrode 103 is embedded in the insulating member constituting the transport pipe 101. In addition, a convex dielectric tool 101R (integrated with an insulating member constituting the transport pipe 101) is provided between the adjacent first and second plasma generation electrodes 101A and 101B. Short circuit between the first and second plasma generation electrodes 101A and 101B is prevented.

[Thirteenth embodiment]
The gas transport device 105 of the thirteenth embodiment is different from the gas transport device 100 of the twelfth embodiment in the configuration of transport piping. As shown in FIGS. 37 and 38, in the gas transport apparatus 105 of this embodiment, the transport pipe 106 (corresponding to the “plasma processing apparatus” of the present invention) is swirled from the outside to the inside in the same plane. A loop portion 106L wound in a shape is provided. The loop portion 106L of the transport pipe 106 is formed of an insulating member, and is provided with first and second plasma generation electrodes 106A and 106B that are looped along the loop portion 106L above and below the loop portion 106L. As shown in FIG. 39, the downstream side of the loop portion 106L in the transport pipe 106 is bent downward and extends. Even with this configuration, it is possible to irradiate the processing target W passing therethrough with plasma. Moreover, since the part which has the plasma processing function in the transport piping 106 is looping, it can be made compact rather than the case where it extends on a straight line. The pipe body of the transport pipe 106 corresponds to the “hollow insulating member” of the present invention, and the inside of the loop portion 106L corresponds to the “processing space” and the “target channel” of the present invention.

  The gas transport device 105 of the present embodiment may be modified as follows.

(1) In the thirteenth embodiment, the first and second plasma generation electrodes 106A and 106B are wound along the loop portion 106L of the transport pipe 106. However, as shown in FIG. The first and second plasma generation electrodes 106A and 106B may be configured by two metal plates that cover substantially the entire loop portion 106L and face each other in the vertical direction. In this case, the gap between the transport pipes 106 in the loop portion 106L may be filled with an insulating member as shown in FIG. 40, or may be a cavity. The space between the two metal plates corresponds to the “flat space” of the present invention.

  Etching is performed on the discharge sides of the plate-like first and second plasma generation electrodes 106A and 106B to form fine irregularities on the surface to increase the surface area and to fill with a dielectric (eg, barium titanate). The plasma generation efficiency may be increased using the above-described one.

(2) In the thirteenth embodiment, the first and second plasma generation electrodes 106A and 106B sandwich the loop portion 106L from above and below, but as shown in FIG. 41, the first plasma generation electrode 106A. However, the second plasma generation electrode 106B may be configured to cover the lower half of the outer surface of the loop portion 106L. Alternatively, as shown in FIG. A body hose (commercial product: hose with ground wire) is used as the transport pipe 106 with the second plasma generation electrode 106B built in, and an electrode supported by a coil spring as the first plasma generation electrode 106A is inserted therein. There may be. By using the first plasma generation electrode 106A as an electrode supported by a coil spring, it is possible to follow the bending of the dielectric hose containing the external electrode conductive wire.

  By offsetting the first plasma generation electrode 106A downward from the center of the transport pipe 106, plasma generation can be performed only at the lower portion of the dielectric hose with external electrode conductive lines.

(3) In the thirteenth embodiment, the loop portion 106L of the transport pipe 106 is configured to loop in the same plane. However, as illustrated in FIGS. 43 and 44, the loop portion is coaxially looped. Also good. In this case, the configuration can be simplified if the first and second plasma generation electrodes 106A and 106B are composed of a cylindrical electrode in contact with the inside of the loop portion 106L and a cylindrical electrode in contact with the outside.

(4) The transport pipe 106 may be provided with a plurality of stages of loop portions 106L. In this case, space saving can be achieved. In addition, the configuration of the plurality of stages of loop portions 106L may be different for each stage, and plasma processing may be performed for different processing purposes. At the time of discharge from the multi-stage loop flow path device having the multi-stage loop portion 106L, a configuration and a system that can take out the compound obtained by combining the processed materials may be constructed. The configuration may be selected so that polymerization can be performed and used. Further, instead of the gas transport device 100, a liquid / gas supply unit 149 (see FIG. 58) of an eighteenth embodiment described later is connected to the transport pipe 106, and the processing object L or the processing object G is used alone or as the processing object L. It may be used for the purpose of hybrid processing target G, and also hybrid processing of processing target W and processing target L / processing target G.

[Fourteenth embodiment]
In the fourteenth embodiment, the transport pipe 106 in the gas transport apparatus 105 of the thirteenth embodiment is not provided with the loop portion 106L. Instead, the transport pipe 106 is replaced with the flow path case 110 shown in FIGS. 45 and 46. (It corresponds to the “plasma processing apparatus” of the present invention).

  As shown in FIGS. 45 and 46, the flow path case 110 has a flat rectangular parallelepiped shape having a first main surface 110A and a second main surface 110B, and the interior thereof includes the first main surface 110A and the second main surface 110A. A plurality of partition walls 110C that are passed between the surfaces 110B and extend in the longitudinal direction are partitioned into a plurality of straight flow paths 110T. The plurality of linear flow paths 110T are sequentially connected at one end or the other end in the longitudinal direction, and a single flow path 110R is formed as a whole inside the flow path case 110 (the flow paths 110R meander). ing). An inflow portion 110D that protrudes upward and is connected to the transport pipe 106 is formed at one end of the flow path 110R, and a discharge portion 110E that protrudes downward and discharges the contents is formed at the other end.

  In the flow path case 110, the first parallel electrode 110X and the second parallel electrode 110Y (the “first plasma generation electrode” and the “first plasma generation electrode” of the present invention) are provided on the outer surfaces of the first main surface 110A and the second main surface 110B. Corresponding to “2 plasma generating electrodes”). As a result, the processing target W that passes through the flow path 110R is plasma-processed by the plasma generated between the first parallel electrode 110X and the second parallel electrode 110Y. The case body of the flow path case 110 corresponds to the “hollow insulating member” of the present invention, and the inside corresponds to the “processing space” and the “target flow path” of the present invention.

  The present embodiment may be modified as follows.

(1) In the above embodiment, the flow path case 110 is incorporated in the gas transport device 105 that transports the processing target W, which is powder, by gas, but is not limited thereto, and is, for example, a liquid. You may use as the flow path which moves the process target G which is the process target L and gas.

(2) As shown in FIG. 47, a plurality of weir portions 110S may be provided in the straight flow path 110T. Thereby, a turbulent flow is generated in the movement of the processing object W in the dam portion 110S, and the time required for the movement of the flow path is increased, so that the time for plasma processing is increased.

(3) Further, as shown in FIG. 48, without attaching the first and second parallel electrodes 110X and 110Y to the flow path case 110, a pair of protruding electrodes 110V and 110W protruding into the straight flow path 110T are provided. The structure provided may be sufficient. Even in this configuration, the plasma processing is performed when the processing target W passes between the pair of protruding electrodes 110V and 110W. In addition, according to this configuration, the pair of protruding electrodes 110V and 110W also serves as the above-described weir portion.

(4) As shown in FIG. 49, a charging part 110H for charging the additive may be provided. This insertion part 110H can be moved up and down. It is also possible to supply liquid and gas / powder from the input unit 110H and perform plasma treatment of the powder and gas or liquid or generation of a compound during plasma generation.

(5) In the flow path case 110 shown in FIG. 45 and FIG. 46, the “first plasma generation electrode” and the “second plasma generation electrode” of the present invention correspond to the first main surface 110A and the second main surface 110A of the flow path case 110. The first parallel electrode 110X and the second parallel electrode 110Y provided on the outer surface of the main surface 110B are configured as “first plasma generation electrode” on the side wall of the flow path case 110 and the plurality of partition walls 110C. And “second plasma generation electrode” may be provided alternately.

(6) A configuration in which a plurality of flow path cases 110 are connected may be used. In this case, space saving can be achieved. In addition, the configuration of the plurality of flow path cases 110 may be different for each stage, and plasma processing may be performed for different processing purposes. In addition, at the time of discharging from a flow path device having a plurality of flow path cases 110, a configuration and a system that can extract a compound in which processed materials are combined may be constructed. It may be selected and used so that a process such as a polymerization process can be performed.

[Fifteenth embodiment]
In the fifteenth embodiment, the transport pipe 106 in the gas transport apparatus 105 of the thirteenth embodiment is not provided with the loop portion 106L, and a part of the transport pipe 106 is a lattice flow path 120 (this book) shown in FIGS. It corresponds to the “plasma processing apparatus” of the invention.

  As shown in FIG. 50, the lattice channel 120 includes a plurality of straight channels 120R (“processing space”, “invention” of the present invention) arranged in a square shape in a square tube 121 having a square cross section by a vertical wall 122A and a horizontal wall 122B. Corresponding to the “target channel”. These square cylinder 121, vertical wall 122A, and horizontal wall 122B are made of insulating members. 51 and 52, a conductor plate 123 connected to the plasma power supply unit 15 is embedded in the upper wall 121A and the lower wall 121B and the lateral wall 122B of the square tube 121. Among these conductor plates 123, the one connected to one pole of the plasma power source 15 corresponds to the first plasma generating electrode 123A of the present invention, and the one connected to the other pole is the second plasma generating electrode 123B of the present invention. It corresponds to. The first plasma generation electrodes 123A and the second plasma generation electrodes 123B are alternately arranged.

  According to this configuration, for example, when the processing target G, which is a gas, is passed through each straight flow path 120R and a voltage is applied to the first plasma generation electrode 123A and the second plasma generation electrode 123B, the layers are alternately stacked. Plasma is generated between the first plasma generation electrode 123A and the second plasma generation electrode 123B, and the processing target G is subjected to plasma processing. The processing target may be dust, mist-containing gas, smoke gas, organic gas, harmful gas, or the like. Moreover, you may change and use the length (code | symbol L in FIG. 52) of the lattice flow path 120 according to the desired effect.

[Sixteenth Embodiment]
The sixteenth embodiment is a plasma torch 130 using the configuration of the lattice channel 120 of the fifteenth embodiment. As shown in FIG. 53, the plasma torch 130 extends the inflow side of the square tube 131 in which the first plasma generation electrodes 133A and the second plasma generation electrodes 133B are alternately stacked, and the plasma generation gas is supplied to the end thereof. A rectangular tube case 131C provided with a closing wall 131H having an inlet 131G is provided. When a plasma generating gas is injected from the inlet 131G and a voltage is applied to the first plasma generating electrode 133A and the second plasma generating electrode 133B, a plasma jet is emitted from the entire cross section of the rectangular tube 131, and plasma processing is performed. Can be performed in a wide range.

  The plasma torch 130 of the present embodiment may be modified as follows.

(1) As shown in FIG. 54, the grid-shaped first plasma generation electrode 133A embedded in the entire rectangular tube 131, the vertical wall 132A and the horizontal wall 132B is opposed to the end surface of the rectangular tube 131, and the conductor plate is insulated. The configuration may also include the second plasma generation electrode 133B formed by covering with a member. In the case of this configuration, plasma processing can be performed by inserting or passing a processing target between the end face of the square tube 131 and the second plasma generation electrode 133B. Further, two plasma torches 130 shown in FIG. 54 may be arranged opposite to each other and connected to different polarities. As a result, the front and back surfaces to be processed can be simultaneously plasma processed. Moreover, it is good also as a structure which irradiates different plasma from the front and back using a different gas seed | species by a 1st plasma production electrode and a 2nd plasma production electrode, or using a different additive.

  When the object to be processed is an insulating solid, plate, film, or the like, the second plasma generation electrode 133B may be composed of a conductor plate that is not covered with an insulating member. When the processing target is a conductive solid, plate, film, or the like, the plasma processing may be performed by directly connecting the conductive processing target to the plasma power supply unit 15. For example, when processing a metric class metal plate, a cubic metal mold, etc., rather than moving the processing target between the end face of the square tube 131 and the second plasma generation electrode 133B, the processing target is moved to the plasma power supply unit. It is considered that the operation is easier if the plasma torch 130 is moved while being directly connected to 15. In addition, since there is no insulating member, the discharge current becomes larger and the plasma discharge becomes stronger than when processing is performed using the second plasma generating electrode 133B formed by covering the conductor plate with the insulating member, so that a stronger plasma is generated. Processing can be performed.

[Seventeenth embodiment]
The present embodiment is a tube processing apparatus 140 (corresponding to the “plasma processing apparatus” of the present invention) that processes the tube T as a processing target using the plasma torch 30 described above. As shown in FIG. 55, in the tube processing apparatus 140, the tube T is inserted into the plasma torch 30. When a plasma generating gas is injected into both the plasma torch 30 and the tube T and inside the tube T and the first and second plasma generating electrodes 30A and 30B are applied, the outside and inside of the tube T are applied. Can be simultaneously plasma-treated. When processing only the outside of the tube T, it is only necessary to flow a plasma generating gas only between the plasma torch 30 and the tube T. When processing only the inside of the tube T, the plasma is applied only to the inside of the tube T. The product gas may be flowed.

  In addition, the tube T is wound in a hoop shape at the time of manufacture. By arranging the tube processing device 140 between the winding side and the feeding side, plasma processing of the tube T can be performed by a roll-to-roll method. As the tube T, a tube used in medicine such as a catheter tube, a dialysis tube, an infusion tube, a blood circuit tube, and a tracheal tube is assumed.

  In addition, an etching process, a surface hardening process, and a hydrophilization process for performing secondary processing on the inner and outer surfaces of the tube T may be performed to improve wettability, adhesiveness, printability, and paintability. In addition, weather resistance, durability, and barrier property may be improved by water repellency treatment, DLC film treatment, flame retardancy treatment, and the like on the inner and outer surfaces of the tube T.

  Further, instead of the tube T, a fiber plasma treatment may be performed. For example, fiber shrinkage prevention by hair burning treatment, improvement of touch, absorption by hydrophilic treatment, dyeability may be improved, water repellency treatment, antibacterial treatment, flame retardant treatment, DLC treatment, etc. May be used. Since these treatments do not use chemicals, the influence on the environment can be reduced.

[Eighteenth embodiment]
As shown in FIG. 57, the eighteenth embodiment has, for example, a configuration in which five plasma processing chambers 145A to 145E (corresponding to the “plasma processing apparatus” of the present invention) are vertically connected. Since these plasma processing chambers 145A to 145E have substantially the same configuration, the plasma processing chamber 145A shown in FIG. 58 will be described as an example. As shown in the figure, the plasma processing chamber 145A includes a first plasma generating electrode 147A on the outer side and the inner side of a cylindrical insulating pipe 145P (corresponding to the “hollow insulating member” of the present invention) extending in the vertical direction. The second plasma generation electrode 147B is provided.

  Further, supply chambers 146A and 146B are connected to the upper end and the lower end of the plasma processing chamber 145A. The supply chambers 146A and 146B have a box shape, and the lower wall 146U is inserted into the insulating pipe 145P of the plasma processing chambers 145A and 145B. A processing target supply unit 148 and a liquid / gas supply unit 149 are connected to the supply chamber 146A. The supply chamber 146B and the supply chambers 146C to E connected to the upper ends of the plasma processing chambers 145C to 145E are connected to the processing target supply unit 148, but are connected to the liquid / gas supply unit 149. Absent.

  In the present embodiment, for example, water is injected from the liquid / gas supply unit 149 of the supply chamber 146A, and water enters the supply chambers 146A to 146E as shown in FIG. In each of the supply chambers 146A to 146E, when the upper supply chamber (for example, the supply chamber 146A) is filled with water up to the height of the upper end portion of the insulating pipe 145P, the inner surface of the plasma processing chamber (for example, the plasma processing chamber 145A) is dripped down. Water flows out into the supply chamber (for example, the supply chamber 146B). In this state, when carbon powder C such as carbon fine powder or carbon nanotube is supplied from the processing object supply unit 148 of the supply chamber 146A, the carbon powder C drifts on the water surface and reaches the plasma processing chamber 145A, and the plasma processing chamber It passes through 145A while being plasma-treated, and falls into the supply chamber 146B. At this time, since the inner surface of the plasma processing chamber 145A is covered with water, the carbon powder C is prevented from adhering to the inner surface of the plasma processing chamber 145A.

  In addition to the processing target such as carbon powder C, a processing support additive or the like may be supplied from the processing target supply unit 148. In addition, plasma processing having a different processing purpose may be performed in each of the supply chambers 146A to 146E by supplying a different processing support additive to each of the supply chambers 146A to 146E.

  The present embodiment may be configured as shown in FIG. Further, by replacing the plasma processing chamber 145A with the plasma processing chamber 145A in which the non-grounded electrode 103 of FIG. 35 or FIG. 36 is embedded, the same effect can be obtained even if the second plasma generation electrode 147B is used. be able to.

[Nineteenth Embodiment]
60 and 61 show a vibrating conveyor 150 (corresponding to the “plasma processing apparatus” of the present invention) that moves the processing target W, which is a granular material, while performing plasma processing. The vibration conveyor 150 has a flat surface, a transfer path 151 (corresponding to the “processing space” of the present invention) that moves the processing target W placed above the flat surface by vibration, and the transfer path 151. The first and second plasma generation electrodes 150A and 150B are arranged so as to sandwich the electrode from above and below. The first and second plasma generation electrodes 150A and 150B are covered with an insulating member, and an insulating member that covers the lower second plasma generation electrode 150B among the first and second plasma generation electrodes 150A and 150B. A transfer path 151 is formed on the upper surface.

  In the vibration conveyor 150 of the present embodiment, the processing target W supplied from the processing target supply unit 152 and dropped to one end of the transfer path 151 is subjected to plasma processing between the first and second plasma generation electrodes 150A and 150B. It moves to the other end side of the transfer path 151 and reaches the processing object recovery unit 153 located at the other end of the transfer path 151.

  The configuration of this embodiment may be applied to a belt conveyor 150V (corresponding to the “plasma processing apparatus” of the present invention) as shown in FIG. 62, or a rotary table conveyor 150W (invention of the present invention). It may be applied to the “plasma processing apparatus”.

  In the belt conveyor 150V of FIG. 62, an insulating belt (polyurethane, rubber, plastic chain, etc.) 154 is used, and moves by rotation of a pulley 154P (drive unit not shown). Then, between the insulator below the first plasma generating electrode 150A (upper electrode) and the insulator above the second plasma generating electrode 150B (lower electrode) with the insulating belt 154 sandwiched between the upper and lower sides (“ The plasma is generated in the “processing space”. When the insulating belt 154 is used, the insulator above the second plasma generation electrode 150B may be omitted. When a conductive belt (stainless steel or the like) is used instead of the insulating belt 154, power is supplied to the conductive belt instead of the second plasma generating electrode 150B from the rotary pulley provided on the conductive pulley and shaft. A configuration may be adopted in which plasma is generated between the upper surface of the belt and the insulator below the first plasma generation electrode 150A. The processing target W supplied from the processing target supply unit 152 passes through the range in which plasma is generated, is subjected to plasma processing, and is recovered by the processing target recovery unit 153. A plasma supply processing unit may be provided with a gas supply unit.

  In the rotary table conveyor 150W of FIG. 63, an insulating disk (polyurethane, rubber, plastic, etc.) 155 is used, and rotates around the axis by rotation of the central axis (the central axis and the drive unit are not shown). Then, an insulator below the first plasma generating electrode 150A (upper semicircular electrode) and an insulator above the second plasma generating electrode 150B (lower semicircular electrode) sandwiching the insulating disk 155 vertically. Plasma is generated in the interval (corresponding to the “processing space” of the present invention). When the insulating disk 155 is used, the insulator above the second plasma generation electrode 150B may be omitted. When a conductive disk (such as stainless steel) is used in place of the insulating disk 155, power is supplied directly from the fixed brush or current collecting electrode to the conductive disk instead of the second plasma generating electrode 150B, or from a rotary connector provided on the shaft. And it is good also as a structure by which a plasma is produced | generated between the upper surface of a conductive disk, and the insulator under the 1st plasma production electrode 150A. The processing target W supplied from the processing target supply unit 152 passes through the range in which plasma is generated, is subjected to plasma processing, and is recovered by the processing target recovery unit 153. A plasma supply processing unit may be provided with a gas supply unit.

[20th embodiment]
This embodiment is a screw conveyor 160 (corresponding to the “plasma processing apparatus” of the present invention) capable of performing plasma processing on a processing target W that is a granular material. As shown in FIG. 64, the screw conveyor 160 has a screw 160B in which a spiral blade 160E (corresponding to the “spiral blade” of the present invention) is wound around a shaft 160D inside a cylindrical insulating pipe 160P. doing. The screw 160B is made of a conductive member and is rotationally driven by a motor (not shown). A gap 160K is provided between the tip surface of the blade 160E in the screw 160B and the inner surface of the insulating pipe 160P. Further, the shaft 160D may not be provided.

  As shown in FIG. 64 (B), an external electrode 160A is provided on the lower outer surface of the insulating pipe 160P at a position closer to the front in the rotational direction of the screw 160B. The external electrode 160A and the screw 160B correspond to the “first plasma generation electrode” and the “second plasma generation electrode” of the present invention, and are connected to the plasma power supply unit 15.

  As shown in FIG. 64A, the insulating pipe 160P of the screw conveyor 160 includes a processing target supply unit 162, a processing target recovery unit 163, an additive charging unit 164, and a plasma torch 22.

  According to the present embodiment, the processing target W supplied to a height of the gap 160K or more moves from the processing target supply unit 162 side to the processing target recovery unit 163 side in accordance with the rotation of the screw 160B. In the screw conveyor 160, the processing target W is pushed and moved by the surface of the spiral blade 160E on the processing target recovery unit 163 side. The surface of the spiral blade 160E on the processing target supply unit 162 side has a gap, and the processing target W is plasma-processed by plasma generated between the screw 160B and the external electrode 160A in the gap. In the present embodiment, since the screw 160B that moves the powder processing object W plays the role of an electrode, the number of parts can be reduced as compared with the configuration in which the screw 160B and the electrode are provided separately.

  In addition, the spiral blade 160E is used as a ribbon blade only on the outside of the inner and outer ribbon blades held by the holder extending from the axis of the ribbon blade 91 of the ribbon blade mixer 90 shown in FIG. , Expanded metal, punching metal, slits, etc. (not shown) are used, and if these are used, the processing object is the ribbon blade 91, the processing object sent on the ribbon blade feed surface, and the ribbon blade 91 shaft side blade It is divided into the processing object that gets over the end, and the processing object that gets over is sent by the next ribbon blade 91. The ribbon blade mixer 90 has a division, inversion, and conversion action to efficiently agitate the object to be processed, and the object to be processed that has been plasma-treated and the object to be processed that has not been plasma-processed are made uniform, and the number of times of contact with the plasma To increase the uniformity of plasma processing. The same effect can be obtained even with a lattice mesh, expanded metal, punched metal, slit, or the like (hereinafter, this internal electrode is referred to as a ribbon blade electrode 160E). The ribbon blade electrode 160E may be used in a plasma torch in which an internal electrode is arranged, a transport pipe, a flow path, or the cylindrical rotation processing apparatus 300 of the 29th embodiment. In the plasma torch, the number of discharge points is larger than that in the rod shape, the number of times of contact with the plasma is increased due to the stirring effect in the transport pipe or flow path, and the increase in the discharge point and the efficiency of stirring are obtained in the cylindrical rotation processing apparatus 300.

[Twenty-first embodiment]
In the present embodiment, the processing object W is transferred by plasma generated between the external electrode 160A and the screw 160B using the screw conveyor 160 of the twentieth embodiment. Specifically, when the processing target W is supplied to the screw conveyor 160 in an amount that fits in the gap 160K (see FIG. 65), the processing target W is charged particles generated by the discharge energy of plasma generated from the tip of the blade 160E in the screw 160B. Or it is bounced and moved by shock waves (the temperature of the generated discharge is around 1,000 ° C., and the plasma gas expands at once). When the screw 160B rotates, the processing target W moves to the processing target recovery unit 163 side while being pushed by the plasma. In addition, since the discharge of plasma is not uniform and the manner in which it is bounced is not uniform, the transfer described above is a transfer having a stirring action.

  You may change the screw conveyor 160 of this embodiment as follows.

(1) The additive may be introduced from the additive introduction unit 164 and transferred while mixing or reacting. Further, if necessary, different active species may be supplied from the plasma torch 22. For example, water (steam or mist fog) may be added to the plasma torch 22 to generate OH radicals, and surface sterilization treatment using the OH radicals may be performed together.

(2) A configuration may be adopted in which a medium (corresponding to the “processing medium” of the present invention) is introduced into the screw conveyor 160 as a supporting member, and the crushing process is performed together with the plasma processing of the processing target W. In this case, it is preferable that the medium is separated from the processing target W by the processing target recovery unit, and re-input for use.

  For example, as shown in FIG. 66, the screw conveyor 160V is disposed so as to be inclined such that the end on the processing target collection unit 163 side is positioned higher than the end on the processing target supply unit 162 side, and the processing target collection unit 163 is provided with a net 166 (which may be a slit body) through which the medium 167 cannot pass, and a media return chute 165 (side of the present invention) that extends to the vicinity of the end of the screw conveyor 160V on the supply target 162 side. Equivalent to “medium return chute”). The media return chute 165 is slightly inclined so that the processing target supply unit 162 side is lowered, and the medium 167 bounced by the mesh body 166 is reintroduced to the processing target supply unit 162 side end of the screw conveyor 160V. . Thereby, the media 167 automatically circulates in the screw conveyor 160V. Note that a configuration may be adopted in which a gate is provided at the outlet of the media return chute 165, the media 167 is temporarily stored therein, the gate is opened in accordance with the rotation timing of the screw 160B, and the media 167 is re-input.

(3) In the screw conveyor 160V shown in FIG. 66, when a plurality of gates are provided on the medium return chute 165 and a mechanism capable of grasping the number of return media is provided, the screw conveyor 160V is re-inserted into the screw conveyor 160V. The number of media 167 for each pitch of the spiral in 160V can be made uniform, and the delay of media return that occurs by increasing the machine length of the screw conveyor 160V can be prevented.

(4) Further, the screw conveyor 160 is used in a horizontal state, and a side screw conveyor inclined to the side thereof is provided separately, and the medium 167 is returned by the side screw conveyor and used with a mechanism that can be reintroduced into the screw conveyor 160. May be.

(5) The medium 167 used for crushing is made of a dielectric material, and after being crushed by the preceding medium 167, the processing object is treated by plasma generated between the external electrode 160A and the tip of the blade 160E in the screw 160B. It is also possible to use a method in which media movement, plasma treatment and movement can be performed simultaneously.

  Further, by using a dielectric-coated conductor medium or conductor medium as the medium 167 used for crushing, plasma is generated between the external electrode 160A, the dielectric-coated medium or conductor medium, and the tip of the blade 160E in the screw 160B. Generated. Thereby, the media crushing, the plasma treatment between the media, the plasma treatment between the screw 160B and the external electrode 160A, and the movement can be performed simultaneously.

  Furthermore, by performing plasma treatment using appropriate amounts of dielectric media, dielectric-coated conductor media, and conductor media, media crushing and plasma treatment between the media can be performed efficiently. The ratio of each of the dielectric media, dielectric-coated conductor media, and conductor media to be combined determines the desired plasma treatment effect, the generated plasma range and generation amount, the crushing effect, etc. Good.

(6) When the screw conveyor 160 becomes longer, the screw conveyor 160 is separated for each power supply capacity, and as shown in FIG. 67, a roller electrode 161 is provided above the blade 160E in the screw 160B, and plasma is generated for each separation. Mechanism. Alternatively, the screw conveyor 160 is divided for each power supply capacity, the screw conveyor 160 is provided in a plurality of stages, the processing target supply unit 162 is matched with the processing target recovery unit 163, and is linearly arranged or folded by 180 ° or arranged in a polygonal shape. By disposing, there is no limitation on the length of the plasma processing unit, and as many plasma processes as desired can be performed.

  The blade 160E of the screw 160B, the shaft 160D, and the external electrode 160A are configured to be one unit for each power supply capacity, and the shaft 160D is a dielectric or a dielectric at the shaft end so as not to cause a short circuit between adjacent power supplies. The blade 160E may sandwich a spiral blade made of a dielectric material by about 90 ° for each unit, and the external electrode 160A may have a length that does not discharge between the blades 160E of adjacent units. In this case, an elastic material (rubber or the like) may be used at the tip of the dielectric spiral blade sandwiched between the insulating pipe 160P and the processing object W may be moved.

  As shown in FIG. 68, the external electrodes 160A adjacent to each other may be provided with external electrodes divided in the circumferential direction with the periphery sandwiched by dielectrics, and may be used as point electrodes. Adjacent spiral blades passing over the point electrode are electrodes having one pitch of the spiral blade. Therefore, after passing over the point electrode, it is necessary to make one round to pass over the point electrode next time. . The external electrodes divided in the circumferential direction are sequentially switched to the front power source and the rear power source in accordance with the rotation speed, thereby producing continuous discharge.

  If the divided point electrode has a length that does not discharge between adjacent spiral blades, and the divided point electrode through which the adjacent spiral blades pass uses a circuit that is not connected to either the front power supply or the rear power supply. Good. Application is performed between the front electrode and the front spiral blade from the front power source and between the rear electrode and the rear spiral blade from the rear power source, and plasma processing can be performed.

(7) In the above embodiment, the spiral blade 160E of the screw 160B is one, but it may be a plurality.

(8) Further, the blade 160E is configured such that the conductive member is coated with the insulating member, and the insulating member coating on the tip portion is partially removed within one lead or one lead, or The blade 160E may be mainly composed of a conductive member, and a part of the tip may be covered with an insulating member to generate and use plasma with differences in plasma type and strength.

(9) Although the cylindrical insulating pipe 160P is used in the above embodiment, a U-shaped insulating container having a U-shaped cross section may be used.

(10) Two wings 160E may be provided, and the tip may have an uneven shape as shown in FIG. According to this configuration, the discharge area can be doubled by providing two blades 160E, and the tip of the blade 160E has a wave-shaped uneven shape, or a fine module tooth shape such as a gear, or a comb-like cut. If the concave and convex shape is a circular comb blade extending to the vicinity of the shaft, the peripheral length of the tip of the blade 160E can be increased with respect to the blade 160E having the same diameter, and the discharge region can be further increased. As a result, the number of discharges during one turn of the blade 160E increases, the amount of movement of the processing target W by the plasma and the plasma processing capability (the number of times of contact between the processing target W and the plasma) can be increased, and the plasma processing capability is improved. Is obtained.

  Further, as a screw, a shaftless drive spiral blade without a shaft 160D may be used and provided with the above shape. Further, the processing target L that is liquid or the processing target G that is gas may be processed.

[Twenty-second embodiment]
In the present embodiment, a plasma torch 29 is used to move the processing target W, which is a granular material, by plasma. As shown in FIG. 70, in the present embodiment, the two strip-shaped metal sheets constituting the first plasma generation electrode 29A are the first spiral electrode 170A and the second spiral electrode 170B. The voltage from one pole of the plasma power supply unit 15 is alternately applied to the two spiral electrodes 170A and 170B. As a result, the processing target W is divided into plasma generated between the first spiral electrode 170A and the second plasma generation electrode 29B, and plasma generated between the second spiral electrode 170B and the second plasma generation electrode 29B. They are alternately pushed and moved while being plasma-treated (see FIGS. 71 to 73). Note that a plasma torch 27 may be used instead of the plasma torch 29.

  Further, as shown in FIG. 74, a configuration in which three spiral electrodes are provided and the central second plasma generation electrode 29B is removed may be employed. In this case, by repeating the first application for applying a voltage to the first and second spiral electrodes 170A and 170B and the second application for applying a voltage to the second and third spiral electrodes 170B and 170C, The processing target W can be moved while being plasma-treated by the plasma generated between the first and second spiral electrodes 170A and 170B and the plasma generated between the second and third spiral electrodes 170B and 170C. it can. In this case, the first and third spiral electrodes 170A and 170C correspond to the “first plasma generation electrode” of the present invention, and the second spiral electrode 170B corresponds to the “second plasma generation electrode” of the present invention. .

  Further, like the plasma torch 26, a convex spiral dielectric tool may be provided between adjacent spiral electrodes. Furthermore, it has a rotation drive mechanism for rotating the flow path composed of dielectric tubes or dielectric pipes, and the plasma discharge has the function of spiral blades like the screw conveyor 160 of the twenty-first embodiment. It may be used as a screw conveyor that has no spiral blades. When the rotational drive mechanism is provided, the same plasma treatment object moving process can be performed even if two parallel spiral electrodes are provided and used.

[Twenty-third embodiment]
A plasma transfer apparatus 180 (corresponding to the “plasma processing apparatus” of the present invention) according to a twenty-third embodiment of the present invention will be described with reference to FIG. As shown in FIG. 75, in the plasma moving device 180, an electrode shaft 181 in which a plurality of protruding portions 181T are provided on a shaft portion 181S is accommodated in a cylindrical insulating pipe 180P. The electrode shaft 181 has a configuration in which an insulating member is covered with a conductive member, and can move linearly in the axial direction. The insulating pipe 180P is provided with a plurality of semicircular electrode sheets 180D at the same intervals as the arrangement intervals of the protrusions 181T on the electrode shaft 181. The electrode sheet 180D and the electrode shaft 181 are respectively connected to different polarities of the plasma power supply unit 15, and correspond to the “first plasma generation electrode” and the “second plasma generation electrode” of the present invention. .

  The electrode sheet 180D and the electrode shaft 181 are applied with a voltage when the electrode shaft 181 is linearly moved in one of the axial directions (rightward in FIG. 75), and are linearly moved in the other direction (leftward in FIG. 75). No voltage is applied during the process. As a result, the electrode shaft 181 is linearly moved in one of the axial directions (rightward in FIG. 75), the processing target W is moved forward by the plasma, and the position of the processing target W is maintained, and the electrode shaft 181 is axially moved. Since it can be returned to the other direction (left side in FIG. 75), the processing object W can be moved forward while performing plasma processing by the reciprocating motion of the electrode shaft 181. In addition, since the discharge of plasma is not uniform and the manner in which it is bounced is not uniform, the transfer of the processing object W is a transfer having a stirring action. Further, the additive may be supplied from the additive supply port 184 (see FIG. 75) and transferred while mixing. Moreover, you may supply the plasma gas of a different active species from the plasma torch 22 if desired.

[Twenty-fourth embodiment]
As in the twenty-fourth embodiment, the configurations of the above embodiment and the following embodiment may be incorporated into the plasma processing system 200 shown in FIG. The plasma processing unit 201 in FIG. 76 corresponds to the “plasma processing apparatus” of the present invention described in the above embodiment and the following embodiment, and is contained in the container, in the apparatus, or moved in the flow path. , Liquids, solids, and granular materials, by highly active particles such as radicals generated in plasma, or by the strong oxidizing action of ozone, and various gases and liquids in plasma Then, the plasma treatment can be easily performed by mixing or adding solids and powders and activating them.
By subjecting the object to be treated directly or indirectly, it is possible to perform the plasma treatment while staying until a desired plasma treatment effect is obtained. In addition, the plasma processing system 200 is a system that can perform various plasma processing while circulating the plasma generation gas in the hermetic circuit (the broken line in FIG. 76) and suppressing the consumption of the plasma generation gas. is there.

  As shown in FIG. 76, the plasma processing system 200 is provided with a processing object charging unit 202, a liquid charging unit 203, a gas supply source 204, and a processing support additive charging unit 205.

  The processing target input from the processing target input unit 202 is stored in the processing target supply unit 206 and appropriately supplied to the plasma processing unit 201. As shown in FIG. 77, a first valve 208, a gas connection port 209, and a second valve 210 are provided in this order on a pipe 207 that connects between the processing target input unit 202 and the processing target supply unit 206. The processing target supply unit 206 includes a discharge pipe 206B on the lower wall of the container 206A, and a supply plate 206P that covers the inlet of the discharge pipe 206B. This is supplied to the processing unit 201. Note that in FIG. 77, a granular material is imitated as a processing target, but a solid, a liquid, or a gas can also be a processing target.

  Similarly, the liquid input from the liquid input unit 203 is also stored in the liquid supply unit 220 and supplied to the plasma processing unit 201 as appropriate. Two valves are provided between the liquid supply unit 203 and the liquid supply unit 220 in the same manner as between the process target input unit 202 and the process target supply unit 206. Then, by alternately opening and closing the upper and lower valves (the first valve 208 and the second valve 210, etc.), the processing target and liquid are supplied into the closed circuit without releasing the gas in the closed circuit. can do. In the case of the liquid supply unit 220, a pump may be used to circulate the liquid in a closed circuit or collect and use it in one pass.

  The gas supplied from the gas supply source 204 is stored in the gas buffer tank unit 230 and then sent to the gas supply unit 231, and then sent to the processing target supply unit 206, the liquid supply unit 220, the plasma processing unit 201, and the like. . The gas supply device may be selected from a fan, a compressor, or the like according to the purpose, effect, amount, time, flow path distance, etc. of the plasma processing in the plasma processing unit 201. The main combinations of substances supplied in the closed circuit include (1) granular material (solid) and granular material (solid), (2) liquid and liquid, (3) gas and gas, (4 ) Granular material (solid) and liquid, (5) granular material (solid) and gas, (6) granular material (solid) and liquid / gas, (7) liquid and liquid / particle (solid), (8) liquid and liquid / gas; (8) gas and gas / powder (solid); (9) gas and gas / liquid; Further, if the composition of the powder (solid), liquid, and gas is changed, the combination becomes infinite, but it may be selected and used according to the desired purpose.

  Further, a rare gas such as helium gas or argon gas is mainly supplied from the gas supply source 204 as a plasma generation gas. The purpose, effect, amount, time, and flow path of the plasma processing in the plasma processing unit 201 are supplied. A gas type may be selected and supplied from air, oxygen, nitrogen, carbon dioxide, or the like in accordance with the device configuration such as distance.

  The processing target subjected to the plasma processing in the plasma processing unit 201 is recovered by the first processing target recovery unit 240 and the second processing target recovery unit 241 shown in FIG. The first processing target collection unit 240 is a cyclone, and an airtight holding / discharging unit 242 including a rotary valve or the like is provided at a lower end portion thereof. The processing target collected by the first processing target recovery unit 240 is received in the recovery container 243 below the processing target. The collection container is selected and used in a timely manner according to the processing target.

  In the case of a combination of gas and powder, or a combination of gas and gas, the above-described configuration may be used. However, in the case of a combination of gas and liquid, liquid and liquid / gas, or solid / particle and gas / liquid, the first treatment The target recovery unit 240 may be replaced with a liquid cyclone, and the liquid may be circulated in a closed circuit via the liquid supply unit 220, or may be recovered and used in a recovery container in one pass.

  The second processing target collection unit 241 is an electric dust collector, collects fine powder that could not be collected by the first processing target collection unit 240, and is sent to the collection container 243 via the first processing target collection unit 240.

  In the case of a combination of gas and powder, or a combination of gas and gas, the above configuration may be used. However, in the case of a combination of gas and liquid, liquid and liquid / gas, or solid / particle and gas / liquid, the second treatment The target recovery unit 241 may be replaced with a precision liquid cyclone, a filter, or a thickener. In particular, in the case of gas collection, the target recovery unit 241 may be replaced with a scrubber. In the replacement with the scrubber, a mechanism may be used in which plasma is generated inside the scrubber, droplet particles generated inside the scrubber are charged, and fine particles in the gas are collected with high efficiency by charged water droplets.

  The gas exhausted from the plasma processing unit 201 passes through the first processing target recovery unit 240 and the second processing target recovery unit 241, is purified by the gas cleaning unit 250, and is stored again in the gas buffer tank unit 230. The Thereby, the plasma generation gas can be circulated in the closed circuit. In addition, you may replace and use the apparatus which can respond by each site | part according to a process target.

  FIG. 80 shows a conceptual diagram of the gas cleaning unit 250. The gas cleaning unit 250 removes oxygen adsorbent / catalyst 250A, nitrogen adsorbent / catalyst 250B, hydrogen adsorbent / catalyst 250C, and impurities (not shown) such as hydrocarbon, carbon monoxide, carbon dioxide, and moisture. In order to remove impurities such as moisture from the passing gas. The gas cleaning unit 250 is constituted by a reaction cylinder (not shown) heated by a heater, and the adsorbent or the catalyst is incorporated in the reaction cylinder. The gas cleaning unit 250 is managed by gas sensors 250L, 250M, 250N, and the like, and is configured to obtain a high-purity purified gas.

  FIG. 81 shows the gas buffer tank unit 230. The gas buffer tank section 230 has a fixed shape portion 230A made of metal or resin and an elastic shape portion 230B below it, and is filled with 50 to 75% gas to maintain a closed circuit. The elastic shape portion 230B is made of an elastic member such as rubber, silicon rubber, vinyl, etc., and expands and contracts according to the amount of gas, thereby operating the pump, fan, compressor, etc. used in the gas supply portion 231. The gas balance in the closed circuit is maintained.

  Further, the inside of the gas buffer tank 230 is always kept in a negative pressure state by the weight of the lower elastic shape portion 230B. As a result, the plasma processing unit 201 also has a negative pressure, and the pumps, fans, compressors, and the like used in the gas supply unit 231 are always operated without applying a load higher than the original load.

  The plasma power supply unit 15 in FIG. 76 is a power supply for generating plasma in the plasma processing unit 201, and is connected to the “first plasma generation electrode” and the “second plasma generation electrode” of the present invention. The plasma power source unit 15 is preferably an AC high voltage plasma power source having a frequency of about several Hz to about MHz and a voltage of about several kV to about 20 kV, which is necessary for dielectric barrier discharge. Alternatively, it may be a 13.56 MHz high frequency plasma power source using RF, an inductively coupled (coil) power source, a microwave power source, a pulse glow power source, a DC high voltage power source, a VHF / UHF electric field excitation power source, A power supply system that can generate plasma at a desired location or part, such as a pulse power supply, a laser, or an electron beam, may be used. In addition, you may select according to apparatus structures, such as the objective of the plasma processing in the plasma processing part 201, an effect, quantity, time, and flow path distance. It should be noted that the glow and discharge poles may be used as the power source and operated alternately. The processing may be performed by combining other plasma generation power sources and combining the generated plasma species. Depending on the type of the power source, the negative electrode side may be connected to the power source and grounded to the ground, or may be directly grounded to the ground without being connected to the power source and used for plasma generation.

  The processing support additive part 205 in FIG. 76 makes the physical and chemical characteristics of the plasma obvious according to the support gas for stably generating plasma in a wide space and the plasma processing performed in the plasma processing unit 201. The gas, liquid, solid and powder are supplied as support additives. Thereby, the plasma processing unit 201 can perform a desired plasma processing.

  The types of gas, liquid, solid, and granular material used as the support additive are selected according to the plasma processing in the plasma processing unit 201. Also, the desired plasma treatment is performed, the surface treatment and coating of the treatment object, the chemical reaction to the treatment object and the application of chemical reactants, the generation of ultrafine particles, the generation of thin film materials, the aerosol solid If it is a product that can be generated and the effect can be obtained, all available materials are supported, including mist plasma jets (plasma jets generated by adding a liquid to the plasma), etc. It can be used as an agent. Further, if necessary, a desired compound may be produced and used in this system.

  When the gas supply source 204 supplies a gas other than a rare gas such as air, nitrogen, or carbon dioxide, the processing support additive unit 205 may supply a rare gas such as helium gas or argon gas. .

  The processing support apparatus unit 255 in FIG. 76 indicates means necessary for generating desired plasma. Means necessary for generating the desired plasma are, for example, means for stably generating plasma in a wide space, means for forming an environment as a chemical reaction apparatus, and the like. Specifically, 1) temperature management means and equipment by cooling and heating of the entire plasma generation unit or plasma processing unit 201, 2) temperature management means and equipment by cooling and heating of plasma generation gas, and 3) using air 4) Plasma processing unit 201 and plasma generation unit pressure (decompression degree, high pressure level) management unit and equipment 5) Plasma processing unit 201 and temperature of plasma generation unit Management means and equipment 6) Plasma processing unit 201 and plasma of plasma generation unit (applied voltage between electrodes, spatial voltage, circuit current waveform, plasma emission (ultraviolet light, etc.), plasma electron density measurement, etc. Maintenance, maintenance) management means and equipment, 7) equipment for applying a magnetic field to the plasma generator, 8) laser for the plasma generator 9) A device for applying an electron beam to the plasma generation unit, 10) A decompression device or a heating device for vaporizing and volatilizing the liquid support additive at room temperature in the processing support additive unit 205, Examples thereof include an ultrasonic atomizing device, a mist generating device, 11) temperature management means and equipment for cooling and heating the gas of the processing support additive part 205, and the like. By carrying these, desired plasma can be generated efficiently.

  Note that the plasma processing system 200 described above may be controlled automatically by the control unit 260 in FIG. 76, and the plasma processing may be automatically operated or manually operated.

  Further, as shown in FIG. 82, if the plasma generation gas, the plasma processing support gas supplied from the processing support device unit 255, and the temperature control of the plasma processing unit 201 are configured, the plasma processing capability is improved and the plasma is improved. High accuracy of processing can be achieved. If the cost of the plasma generation gas is not significant, the atmosphere may be released without providing the gas buffer tank 230, or the atmosphere may be opened by treating the contained harmful gas.

[25th Embodiment]
FIG. 83 shows the configuration of an apparatus for performing plasma processing using no discharge (corresponding to the “plasma processing apparatus” of the present invention). This configuration can be applied to the above embodiment and the following embodiment.

  In general, when a plasma discharge reaches a discharge start voltage by application of a voltage, ionization occurs together with gas breakdown, and discharge occurs. In plasma discharge, a sharp current waveform of several μsec or less is observed at the time of rising when a high voltage of about several kHz is applied due to the influence of electric charges.

  Further, in plasma discharge, characteristics specific to the waveform of the applied voltage between electrodes and the spatial voltage and circuit current at the start of the discharge are developed depending on the usage situation. Then, the start of discharge can be grasped by monitoring the applied voltage between electrodes at the start of plasma discharge, the spatial voltage, and the circuit current waveform with the monitor 265 under the usage environment.

  The usage example of this embodiment is as follows. That is, (1) when a characteristic specific to the usage condition is expressed in the waveform from the monitored data, the power supply of the plasma power supply unit 15 is turned off. (2) strong in electron-ion recombination emitted during discharge Detects ultraviolet light and turns off the plasma power supply 15 with the first pulse discharge. (3) Applying a rising pulse of several nanoseconds to several microseconds to control the discharge, and the discharge rises to the spark start voltage. Do not suppress the discharge with short pulse control. This is because the rising voltage is several nanoseconds to 1 μsec, which is faster than the ion frequency and slower than the electron frequency, so that the heavy ions are not accelerated and only the light electrons whose temperature does not rise are effectively moved. Thereby, the plasma processing which suppressed generation | occurrence | production of the damage of the process target by the production | generation of plasma can be performed.

[Twenty-sixth embodiment]
In the present embodiment, a classifying means for performing plasma classification processing is incorporated into the configuration of the “plasma processing apparatus” in the above-described embodiment and the following embodiment. The classification configurations are the above-described sixth embodiment, eighth embodiment, ninth embodiment, eleventh embodiment, twelfth embodiment, nineteenth embodiment, twentieth embodiment, twenty-first embodiment, and twenty-second embodiment. It is particularly preferable to incorporate the embodiment, the twenty-third embodiment, the twenty-ninth embodiment, and the thirty-second embodiment.

  In the classification means of the present embodiment, fine particles are sublimated or burned from the granular particles during plasma generation to obtain granular particles of a desired size. 84 and 85 show a comparison of powder particles having different sizes. For example, at a relatively low temperature A, Φ1 nm particles and Φ10 nm particles sublimate or burn, and at a relatively high temperature B, Φ100 nm particles sublime or burn, and Φ1 μm particles do not sublime or burn. In addition, by setting the temperatures A and B, particles having a desired size (here, Φ1 μm) can be obtained.

  This classification uses the control system of the plasma processing configuration using no discharge of the twenty-fifth embodiment, and the temperature management means and equipment of the plasma processing unit 201 and the plasma generation unit, the plasma processing unit 201 and the plasma generation unit Using plasma management means and equipment for plasma (applied voltage between electrodes, spatial voltage, circuit current waveform, plasma emission (ultraviolet light, etc.), plasma electron density measurement, etc., maintaining and maintaining appropriate plasma) This can be performed by controlling the temperature of the generation unit, the voltage application time, and the plasma generation gas temperature, and performing the fine particle sublimation plasma process in which the plasma generation unit is managed.

[Twenty-seventh embodiment]
In the plasma torches 22-24, 27-29, the twelfth embodiment, the twenty-second embodiment, the twenty-third embodiment, etc., if the diameter of the flow path is increased, the plasma processing amount increases and the processing capability is improved. Conceivable. However, it is conceivable that plasma is not generated simply by increasing the diameter (see FIG. 86). On the other hand, like the plasma torch 23Y illustrated in FIG. 87, the tip of the rod-shaped second plasma generation electrode 23B is formed in a T shape so as to protrude toward the cylindrical first plasma generation electrode 23A. Thus, the T-shaped tip can act as the starting electrode 270, and plasma can be generated in the large-diameter channel using the same plasma power source 15. Since the starting electrode 270 is not necessary after the plasma is generated, the starting electrode 270 may be provided with a rotating means or a extracting means to reduce electrode consumption.

  Also in the plasma torches 21, 25, 26, 30, and the twelfth embodiment described above, it is conceivable to increase the processing diameter by increasing the diameter of the flow path. In this case, unlike the plasma torch 21 illustrated in FIG. 88, it is conceivable to provide a starter electrode 271 that is not connected to the plasma power supply unit 15 and functions as a starter electrode due to a bypass effect due to electrode conduction.

  Further, the starting electrode 271 may be provided as shown in FIG. Specifically, the starting electrode 271 is formed by covering a strip-shaped conductor with a dielectric, and is not connected to the plasma power supply unit 15. The current applied between the first and second plasma generating electrodes arranged above and below the flow path is conducted through the strip-shaped conductor of the starting electrode 271 and plasma is generated by dielectric barrier discharge.

  The principle that plasma is generated by using the starting electrodes 270 and 270 is as follows. That is, the generated plasma gas is caused by the phenomenon that “the plasma gas generated as a result of dielectric breakdown due to the discharge current behaves as a conductor”. Behave as. Then, the plasma generated by the starting electrodes 270 and 271 propagates in the flow path, so that plasma is generated between the external electrodes in the entire flow path of the large-diameter pipe.

  Further, by providing these starting electrodes, if the power source (electric power) is the same, the cross-sectional area of the flow path for generating plasma can be increased, the efficiency can be improved, and the flow path for generating plasma can be improved. If the cross-sectional areas are the same, the required power can be reduced and the cost can be reduced.

  35 and 36 show a configuration in which the non-grounded electrode 103 is embedded in the insulating member of the transport pipe 101 and a plasma barrier is generated along the inner surface of the transport pipe 101. As shown in FIG. The large-diameter pipe 276 having the first and second plasma generation electrodes 276A and 276B is provided with a start-up pipe 275 in which the non-grounded electrode 103 is embedded at an intermediate position or an end thereof, and discharge generated in the start-up pipe 275 is generated. You may use as a structure propagated in the large diameter piping 276. FIG. In this configuration, it can be used in a shape having nothing to be a resistance. The length of the starting pipe 275 is preferably about the same as or twice the length of Y1 in FIGS.

  In addition, the structure using the grinding | pulverization media (The thing which coat | covered the conductor with the dielectric material or the surface which consists of a conductor) as a starting electrode may be sufficient. Alternatively, if the object to be processed S may contain metal contamination due to electric discharge, the conductor (wire or plate) is bent in a U shape and held in the channel by the elasticity of the conductor. The configuration may be such that this is used as a starting electrode. It should be noted that the starting electrode can be formed by coating the conductor with a dielectric.

[Twenty-eighth embodiment]
This embodiment is a surface treatment plasma torch 280 (corresponding to the “plasma torch” of the present invention) that can make the width of the plasma jet an arbitrary width. As shown in FIGS. 91 and 92, the surface treatment plasma torch 280 is connected to a bottom-opened box-shaped main body case 280K (corresponding to the “box-shaped case” of the present invention) from the gas inlet 280G and the gas inlet 280G. A baffle 281 for dispersing the injected plasma generation gas, and a pore plate 282 (see FIG. 93) in which pores are formed in a matrix on a flat plate arranged parallel to the upper wall of the main body case 280K are provided in order from the top. Yes. The inside of the main body case 280K is partitioned into an upper gas isobaric chamber 283 and a lower electrode chamber 284 by a pore plate 282.

  The electrode chamber 284 includes two fixed electrodes 280A and 280A (corresponding to the “first plasma generating electrode” of the present invention) and one movable electrode 280B (corresponding to the “second plasma generating electrode” of the present invention). And) are provided. As shown in FIG. 91, FIG. 94 and FIG. 95, the fixed electrode 280A has a cylindrical conductive bar 285 (corresponding to the “metal bar” of the present invention) and an insulating member 286 (the “inner pipe” of the present invention). ), And both ends thereof are fixed at positions closer to both ends in the width direction of the main body case 280K. The movable electrode 280B is disposed between the two fixed electrodes 280A and 280A, and has a structure in which the conductive rod 285 is coated with the insulating member 286 in the same manner as the fixed electrode 280A. It is inserted through a long hole 280N formed in the case 280K and can move up and down. The fixed electrodes 280A and 280A and the movable electrode 280B are connected to different polarities of the plasma power supply unit 15, respectively. The long hole 280N is covered from the inside by the electrode lid 280F provided at the end of the movable electrode 280B, and the cavity is prevented. The movable electrode 280B can be fixed with a screw (not shown). 94 and 95, a restricting plate 287 is provided above the fixed electrodes 280A and 280A to direct the gas flow path toward the center. The main body case 280K and the insulating member 286 correspond to the “hollow insulating member” and “insulating case” of the present invention.

  The configuration of the surface treatment plasma torch 280 of this embodiment is as described above. Next, the function and effect of the surface treatment plasma torch 280 will be described. First, the plasma generation gas injected from the gas injection port 280G is laterally dispersed by the baffle 281 and flows into the gas isobaric chamber 283. In the gas isobaric chamber 283, the gas pressure and the gas amount are made uniform. The plasma generation gas uniformized in the gas isobaric chamber is uniformly ejected from the pores of the pore plate 282 to the electrode chamber 284, passes between the fixed electrodes 280A and 280A and the movable electrode 280B, and passes through the electrode chamber 284. It is ejected from the lower end part. At this time, the plasma generation gas becomes a plasma jet in a plasma state by plasma discharge between the fixed electrodes 280A and 280A and the movable electrode 280B. Since the plasma jet is ejected for the length of the fixed electrodes 280A and 280A and the movable electrode 280B, it is possible to perform plasma processing over a wide range at a time. Alternatively, if the surface treatment plasma torch 280 is moved in the axial direction of the fixed electrode 280A and the movable electrode 280B, the plasma processing can be performed by overlapping the portion on the movement start point by the length of the fixed electrode 280A and the movable electrode 280B.

  Here, as shown in FIG. 95A, when the movable electrode 280B is arranged at the lower end of the long hole 280N, the plasma jet that has passed between the fixed electrodes 280A and 280A and the movable electrode 280B Due to the shape and the cylindrical twin vortex generated below the movable electrode 280B due to the positional relationship between the movable electrode 280B and the fixed electrodes 280A and 280A, the surface treatment plasma torch 280 is concentrated at the center. Thereby, the surface treatment by a thin and long linear plasma jet can be performed.

  As shown in FIG. 95 (B), when the movable electrode 280B is arranged at the upper end of the long hole 280N, the plasma jet that has passed between the fixed electrodes 280A and 280A and the movable electrode 280B is fixed to the fixed electrodes 280A and 280A. And the single cylinder twin vortex generated below the fixed electrodes 280A and 280A due to the shape of the fixed electrodes 280A and 280A and the movable electrode 280B, and diffuses to the outer periphery of the surface treatment plasma torch 280. As a result, surface treatment by a plasma jet having a width equal to or larger than the width of the surface treatment plasma torch 280 can be performed.

  As described above, according to the present embodiment, by sliding the movable electrode 280B up and down, a wide and long planar plasma jet can be generated from the generation of a thin and long linear plasma jet. The width can be set arbitrarily, and the generation area of the plasma jet can be adjusted.

[Twenty-ninth embodiment]
Hereinafter, a cylindrical rotary processing apparatus 300 corresponding to the “plasma processing apparatus” of the present invention will be described with reference to FIGS. A cylindrical rotating container 310 shown in FIG. 96 has a processing target W that is a granular material, a processing target L that is a liquid such as slurry and slurry, and a processing target S that is a processing target having fluidity inside. And the central axis J1 is arranged so as to be substantially horizontal (in this figure, inclined at an elevation angle of about 2 ° with respect to the connecting pipe 334 side), and rotates around the central axis J1. Driven. 96 has a tilting mechanism (not shown) that can be adjusted to an arbitrary angle.

  The cylindrical rotary container 310 has a cylindrical wall 311 with one axial end (right end in FIG. 96, hereinafter referred to as “terminal portion”) open, and the other end (left end in FIG. 96) of the cylindrical wall 311. Hereinafter, the “starting end portion” is closed by the first starting end wall 312. In addition, a disk-shaped first end wall 314 protrudes from an axial intermediate portion on the inner peripheral surface of the cylindrical wall 311, and the inside of the cylindrical rotary container 310 is adjacent in the axial direction by the first end wall 314. The first rotation chamber 315 (corresponding to the “processing space” of the present invention) and the second rotation chamber 316 are partitioned. That is, the first rotation chamber 315 is formed between the first end wall 314 and the first start end wall 312, and the second rotation chamber 316 is formed closer to the end portion than the first end wall 314. A vent hole 314A is formed through the center of the first end wall 314, and the first rotating chamber 315 and the second rotating chamber 316 are communicated with each other through the vent hole 314A.

  As shown in FIGS. 96 and 97, the cylindrical rotary container 310 is rotatably supported by a plurality of dielectric rollers 330. The cylindrical rotating container 310 is rotationally driven by a motor 331 connected to the dielectric roller 330 on the terminal end side in a predetermined forward rotation direction X1 and its reverse rotation direction X2.

  As shown in FIG. 96, a temperature adjusting device 333 that heats or cools the cylindrical rotary container 310 is provided outside the cylindrical rotary container 310 so as to be directed to the outer surface of the cylindrical wall 311. The temperature adjusting device 333 can heat or cool the object S accommodated in the first rotating chamber 315.

  A center hole 312A is formed through the center of the first starting end wall 312 of the cylindrical rotary container 310, and the center hole 312A is covered from the outside by a fixing flange 312F. A sliding seal 312 </ b> S is provided between the fixed flange 312 </ b> F and the first start end wall 312 to maintain airtightness, and the fixed flange 312 </ b> F is constant without being interlocked with the rotation of the cylindrical rotary container 310. . A connection pipe 334, a pipe pipe 337, and a suction pipe 338 are connected to the fixed flange 312F.

  A feeder 339 for supplying an object to be processed S is connected to the connection pipe 334 via a processed product supply pipe 335. The pipe 337 is connected to an atmosphere generating device that generates gas, liquid, and other processing atmospheres. The suction pipe 338 sucks and collects the floating dust generated in the first rotation chamber 315 by the pulverization process as a floating particulate material. Note that the pipe pipe 337 and the suction pipe 338 may be omitted.

  In the second rotation chamber 316, a classification mechanism unit 340 that rotates integrally with the cylindrical rotary container 310 is provided. As shown in FIG. 96, the classifying mechanism 340 includes an outer cone 341, a trommel 342 disposed inside the outer cone 341, and a central cylinder 343 disposed inside the outer cone 341.

  Specifically, the outer cone 341 has a truncated cone shape extending along the central axis of the second rotation chamber 316, and the small-diameter side end thereof is fixed to the first termination wall 314 and the first termination wall 314. While rotating integrally, the opening at the end portion on the large diameter side is a large discharge opening 341A for discharging the object to be processed S out of the second rotation chamber 316.

  The trommel 342 has a truncated cone shape extending along the central axis of the second rotation chamber 316, is arranged coaxially with the outer cone 341, and has a large-diameter side end fixed to the first end wall 314 to have a cylindrical shape. It can rotate integrally with the rotating container 310. Both ends of the trommel 342 are open, and the end on the large diameter side is connected to the opening edge of the vent hole 314A formed in the first end wall 314, so that the inside of the trommel 342, the first rotation chamber 315, Are communicating.

  The central cylindrical portion 343 has a cylindrical shape extending along the central axis of the second rotation chamber 316, is arranged coaxially with the outer cone 341 and the trommel 342, and has one end connected to a sub-transfer duct 367 described later. The first end wall 314 and the first end wall 314 can be rotated together. A central spiral guide 344 is provided inside the central cylinder portion 343. The central spiral guide 344 protrudes from the inner peripheral surface of the central cylindrical portion 343, and separates the workpiece S in the central cylindrical portion 343 from the first terminal wall 314 when the cylindrical rotary container 310 is rotated forward. It turns so that it may feed to the side (end port 313 side of the cylindrical rotary container 310). The outer cone 341 and the trommel 342, and the trommel 342 and the central cylindrical portion 343 are connected by a connecting rod 345, respectively.

  The inside of the central cylinder part 343 communicates with a sub transfer duct 367 described later, and when the cylindrical rotary container 310 is rotated forward, a part of the object to be processed S deposited in the lower part of the first rotation chamber 315 is sub It moves in the transfer duct 367 and is fed into the central tube portion 343. The object to be processed S fed into the central cylindrical portion 343 is fed to the terminal end 313 side of the cylindrical rotary container 310 by the central spiral guide 344 and dropped from the central cylindrical portion 343 to the end on the small diameter side of the trommel 342. To do. (See Figure 98)

  The object to be processed S is classified in the process of moving inside the trommel 342 toward the first end wall 314. That is, the object to be processed S that has been pulverized relatively finely passes through the mesh of the trommel 342 and falls into the outer cone 341. On the other hand, the object to be processed S that is not sufficiently pulverized reaches the large-diameter end without passing through the mesh of the trommel 342, and is returned to the first rotation chamber 315 from the vent hole 314A.

  The relatively fine workpiece S that has passed through the mesh of the trommel 342 and dropped into the outer cone 341 moves inside the outer cone 341 toward the discharge large opening 331A and is discharged out of the second rotating chamber 316. The That is, while the object to be processed S is being pulverized, classification can be performed at the same time, and only the object to be processed S finely pulverized can be discharged from the cylindrical rotary container 310.

  As shown in FIGS. 96 and 98, a transfer duct 323 extends in an arc shape on the outer edge portion of the surface of the first terminal wall 314 on the second rotating chamber 316 side. The transfer duct 323 has a groove-like structure as a whole, and forms a closed end in which the rear end portion in the forward rotation direction X1 is closed, while an open end port 323A is formed in the front end portion in the forward rotation direction X1. Thereby, when the cylindrical rotating container 310 is stopped and rotated forward, the movement of the object S to be processed from the first rotating chamber 315 to the second rotating chamber 316 is prohibited, while the cylindrical rotating container 310 is rotated in the reverse direction. In this case, the workpiece S and the grinding media 336 can be transferred from the first rotation chamber 315 to the second rotation chamber 316.

  In addition to the transfer duct 323 communicating between the first rotating chamber 315 and the second rotating chamber 316, the first end wall 314 is connected to the first rotating chamber 315 and the inside of the central cylindrical portion 343. A duct 367 is provided. The sub transfer duct 367 passes through the first end wall 314 and opens into the first rotating chamber 315, and the end of the sub transfer duct 367 opposite to the first end sub opening 367A. And a second starting end sub-opening 367 </ b> B communicating with the central cylinder portion 343. Thus, the workpiece S that has entered the sub-transfer path 367R from the first terminal sub-opening 367A moves in the sub-transfer path 367R along with the normal rotation of the cylindrical rotary container 310, and the second start-end sub-opening 367B. Is fed into the central cylindrical portion 343. Note that a finer mesh or slit than the grinding media 336 described later is fixed to the first terminal sub-opening 367A.

  As described above, while the cylindrical rotary container 310 is rotated forward, the processing object S that is not completely pulverized can be retained in the first rotation chamber 315 and the processing described later can be performed, and the pulverization can be sufficiently performed. The processed object S can be discharged. Further, by rotating the cylindrical rotary container 310 in the reverse direction, the grinding media 336 larger than the mesh or slit of the first end wall 314 and the workpiece S that is not completely ground can be discharged from the first rotation chamber 315. Therefore, the contents of the cylindrical rotating container 310 can be taken out by a mechanical operation, and can be performed more easily than in the past.

  Here, as shown in FIG. 96 or 97, in the cylindrical rotation processing apparatus 300, the external electrode 350 (corresponding to the “first plasma generation electrode” of the present invention) connected to the plasma power supply unit 15 is used. The first rotating chamber 315 is in contact from below. The external electrode 350 extends parallel to the central axis J1 of the first rotation chamber 315 and is fixedly disposed at an intermediate position between the pair of dielectric rollers 330. Note that the upper surface of the external electrode 350 is recessed on an arc so as to be along the lower surface of the cylindrical rotary container 310. The external electrode 350 may be a brush electrode or a current collecting electrode.

  Also, as shown in FIG. 96, the first rotation chamber 315 is provided with an internal electrode 355 (corresponding to the “second plasma generation electrode” of the present invention). The internal electrode 355 includes a support bar 355S extending on the central axis J1 of the cylindrical rotary container 310, and a plurality of electrode disks 355D projecting laterally from the support bar 355S. The support rod 355 </ b> S penetrates the inside of the dielectric pipe 346 provided in the central cylindrical portion 343 of the second rotation chamber 316 and is connected to the plasma power supply unit 15. As shown in FIG. 100, the dielectric pipe 346 is fixed to the central cylindrical portion 343 by the flanges 346F provided at both ends of the dielectric pipe 346, and the support rod 355S is fixed to the dielectric pipe 346. The internal electrode 355 is formed of a conductive metal substrate as shown in FIG. 99A when the object S is a dielectric.

  Furthermore, the cylindrical wall 311 of the cylindrical rotating container 310 is formed of a conductive member such as metal or carbon, or a dielectric, and is formed in the first rotating chamber 315 in a ball shape shown in FIG. 99 (B). A spherical pulverizing medium 336 (corresponding to “processing medium” of the present invention) in which the conductive ball 336B is coated with a dielectric 336M is filled.

  Thus, as shown in FIG. 100, when a certain level of power is applied to the external electrode 350 and the internal electrode 355 through the plasma power supply unit 15, the grinding media 336 passes between the internal electrode 355 and the external electrode 350. As a result, plasma is generated. Further, by injecting a rare gas such as helium gas or argon gas or other plasma generation gas from the piping pipe 337 and filling the first rotation chamber 315 with the plasma generation gas, it is more stable. Thus, plasma can be generated. In addition, if a plasma generation gas is introduced from the piping pipe 337, the intended plasma processing can be performed.

  As described above, the plasma processing apparatus 300 according to the present embodiment pulverizes the workpiece S supplied to the first rotating chamber 315 by the connecting pipe 334 with a plurality of pulverization media 336 as shown in FIG. Plasma generated between the electrode 355 and the external electrode 350 via the grinding media 336 can be irradiated. That is, it is possible to perform the plasma irradiation while pulverizing the object to be processed S, and it is possible to improve the efficiency of the plasma irradiation to the object to be processed S. Note that the quality of the generated plasma can be selected by combining and filling the grinding media 336 in which the conductor balls 336B are coated with the dielectric 336M and the grinding media made of only the dielectric. Specifically, in the pulverized media 336 in which the conductor balls 336B are coated with the dielectric 336M, the soft planar discharge plasma is generated between the internal electrodes, and the pulverized media formed of the dielectric is the thick linear discharge plasma from the internal electrodes. Therefore, these ratios may be selected and used according to the desired plasma effect.

  Further, when the cylindrical rotating container 310 is rotated forward, as shown in FIG. 98, the plasma-treated object S is scooped by the first terminal sub-opening 367A, and the cylindrical rotating container 310 is rotated forward. Then, it moves in the sub-transfer path 67R and is fed into the central cylindrical portion 343 from the second starting end sub-opening 367B. Then, only the object to be processed S crushed to a predetermined size or less is discharged from the cylindrical rotary container 310, and the object to be processed S having a predetermined size or more is returned to the first rotation chamber 315, and again. Grinding and plasma treatment are performed.

  And the quantity of the to-be-processed object S discharged | emitted is measured, and the continuous process of the grinding | pulverization of the to-be-processed object S and plasma irradiation can be performed by supplying the to-be-processed object S from the feeder 339 sequentially. .

  Further, when the cylindrical rotating container 310 is rotated in the reverse direction, the grinding media 336 can be discharged from the cylindrical rotating container 310. Thus, washing with water in the cylindrical rotating container 310 or internal cleaning such as dividing the first terminal wall 314 and wiping the inside of the cylindrical rotating container 310 with air blow can be performed.

  The cylindrical rotation processing apparatus 300 of this embodiment may be modified as follows.

(1) When the object to be processed S is a conductor such as metal, carbon, or short carbon fiber, as shown in FIG. 102, the inside of the cylindrical rotating container 310Z, that is, the inside of the cylindrical wall 311Z, and the first starting end wall 312. The same effect can be obtained by coating the inside of the first end wall 314 and the first end wall 314 with the insulator layers 311Z and 312Z and filling the crushed media 336Z of the dielectric ball without the coating. At this time, as shown in FIG. 102B, the electrode disk 355DZ of the internal electrode 355Z is configured to cover the conductor 355DX with a dielectric 355DY.

(2) In the above embodiment, only the fixed brush electrode or the collector electrode is used as the external electrode 350. However, as shown in FIG. 103, in addition to the external electrode 350, the conductive roller electrode 351 (the “conductive roller” of the present invention). May be used. The conductive roller electrode 351 is arranged at the upper end position of an extendable holder such as a pantograph 351P or a contact probe (not shown), or by using a hinge support collector current mechanism, accompanying the rotation of the cylindrical rotary container 310. It is possible to keep energization following the surface runout. Thereby, the cylindrical rotary container 310 can be manufactured without obtaining the processing accuracy of the cylindrical rotary container 310, and the cylindrical rotary processing apparatus 300 can be manufactured at a low cost. Further, the length and diameter of the conductor roller electrode 351 can be selected according to the desired plasma generation position. In addition, it is good also as a structure which replaces with the external electrode 350 and uses the conductive roller electrode 351. FIG.

  At this time, as shown in FIG. 104 and FIG. 105 (A), the conductive roller electrode 351 is positioned at an intermediate position of a support column 351C having a pair of disk-shaped conductive electrode plates 351A and 351A at both ends by a ball joint 351B. If fixed, the conductor electrode plates 351A and 351A can follow not only horizontal movement but also movement in the X, Y, and Z directions such as vertical movement and tilt movement. Thereby, since the conductive roller electrode 351 can follow in the state closely_contact | adhered to the cylindrical rotation container 310, it becomes possible to supply electric power stably to an electrode on the side surface of the cylindrical rotation container 310. In addition, the electrode holding portions 351D and 351D suspended from the ball joints 351B and 351B are fixed to the fixed support portions 352 and 352 that support the pair of conductor roller electrodes 351 and 351, and are provided below the center of the fixed support portion 352. If the connecting portion 352A is connected to the above-described pantograph 351P or the like, it is possible to follow up and down movement.

  Furthermore, as shown in FIG. 105 (B), if the support shaft 353, which is partially bulged outwardly into the connection portion 352A, is inserted and fixed to the pantograph 351P or the like, the conductive roller electrode 351 is obtained. However, it can move with the R bulging portion of the support shaft 353 as a fulcrum. Thereby, the movable range of the conductive roller electrode 351 can be increased, and the electrode can be brought into close contact with the side surface of the cylindrical rotary container 310 with a pressure.

  In FIG. 104, the pair of conductor roller electrodes 351 and 351 are fixed to the fixed support portion 352. However, the conductor roller electrode 351 is a line contact power supply, and the electric capacity that can be supplied by one conductor roller electrode 351 is fixed. By increasing the number of conductor roller electrodes 351 corresponding to the required electric capacity, it is possible to feed the electric capacity necessary for generating plasma.

  The conductive roller electrode 351 may be electrically connected to the plasma power supply unit 15 via the external electrode 350, or the conductive roller electrode 351 may be directly connected to the plasma power supply unit 15. Alternatively, the dielectric roller 330 may function as the conductor roller electrode 351.

(3) As shown in FIGS. 106 and 107, the internal electrode 355Z (corresponding to the “second plasma generation electrode” of the present invention) is electrically connected to the flexible support bar 355S and the flexible support bar 355S. And a cylindrical electrode 355E that can be rotated in accordance with the cylindrical rotary container 310. The cylindrical electrode 355E is decentered so as to approach the gravity direction and the rotation direction, and the cylindrical electrode 355E and the external electrode 350 are close to each other, that is, in the gravity direction and the rotation direction in which the workpiece S and the grinding media 336 are likely to stay. A plasma can be generated between the external electrode 350 and the external electrode 350. At this time, as shown in FIG. 107, the external electrode 350Z may be constituted by a cylindrical conductor embedded in a cylindrical wall made of an insulator, or using the above-described fixed brush electrode, flexible electrode, or the like. Also good. Further, instead of the cylindrical rotary container 310, the difference in diameter of the cylindrical hose made of a conductor embedded in the cylindrical wall 311 made of an insulator is configured as described above, and both ends of the internal electrode 355 side are closed. By using it, plasma can be generated between hoses with no restriction in length. In this embodiment, the cylindrical rotary container 310 is described as a cylinder. However, the cylindrical rotary container 310 has a polygonal shape, and the first start wall 312 and the first end wall 314 are circular flanges. Then, it may be used by being rotated by the dielectric roller 330 around the flange. Further, both ends or one end of the cylindrical electrode 355E may be connected to the cylindrical rotating container 310 with an elastic material that can allow a degree of eccentricity, thereby synchronizing the rotation of the cylindrical rotating container 310 and the cylindrical electrode 355E. Alternatively, the internal electrode 355Z may be fixed to the first end wall 314 so as to be concentric with the cylindrical rotary container 310.

  The cylindrical rotating container 310 may be inclined from the input side to the discharge side of the object to be processed S, and only the object to be processed S or a mixture of the object to be processed S and the grinding media 336 may be used. Also, the trommel 342 portion including the outer cone 341 and the vent hole 314A is eliminated, or an arc-shaped transfer duct 323 is provided, and instead of the internal electrode 355 disposed in the first rotating chamber 315 in FIG. 96, FIG. The inside / outside reverse spiral ribbon blades 91 are provided as internal electrodes, and the target object S is stirred by the inside / outside reverse spiral ribbon blades 91 as internal electrodes in the first rotating chamber 315 to perform plasma processing. It may be used as a mixer. At this time, since the inner and outer reverse spiral ribbon blades 91 are provided with a gap therebetween with respect to the inner wall of the cylindrical wall 311, plasma is generated between the inner wall of the cylindrical wall 311 and the inner and outer reverse spiral ribbon blades 91. Can be generated. Since the cylindrical rotation processing device 300 is inclined at an elevation angle of about 2 °, the entire object to be processed S in the first rotation chamber 315 can be discharged.

(4) As shown in FIGS. 108 and 109, as a first plasma generation electrode and a second plasma generation electrode, a pair of split electrodes 359 and 359 (on the “power supply device” of the present invention) outside the cylindrical rotary container 310. Corresponding) is arranged. Specifically, as shown in FIG. 109, the pair of split electrodes 359 and 359 is composed of a pair of brush electrodes or current collecting electrodes, covers the cylindrical rotary container 310 and has a conductor portion 358A (“ (Corresponding to a “metal plate”) and the dielectric portions 358B are arranged so as to abut on a cylindrical divided cylindrical electrode 358 formed alternately. Further, the pair of dividing electrodes 359 and 359 are arranged at positions separated by about 90 degrees around the central axis J1 of the cylindrical rotary container 310 with the lower end portion of the cylindrical rotary container 310 interposed therebetween. When applied to the dividing electrodes 359 and 359, between the divided cylindrical electrode 358, the conductor portion 358A in contact with one dividing electrode 359 and the conductor portion 358A in contact with the other dividing electrode 359. Thus, plasma is generated through the grinding media 336, and the object to be processed S in the cylindrical rotary container 310 is subjected to plasma processing. In FIG. 109, the divided cylindrical electrode 358 is divided into eight. However, by changing the number of divided cylindrical electrodes 358 and the arrangement of the brush electrodes or current collecting electrodes, the desired plasma generation range can be adjusted. it can. Note that the conductor portion 358A in contact with one of the dividing electrodes 359 and the conductor portion 358A in contact with the other dividing electrode 359 are the “first plasma generating electrode” and “second plasma” of the present invention. It functions as a “generation electrode”.

  At this time, as shown in FIG. 110 (A), convex portions 358T are provided at both ends of the conductor portion 358A in the divided cylindrical electrode 358, and the convex portions 358T of the adjacent conductor portions 358A and 358A are staggered. An arrangement may be adopted. According to this configuration, even when the dividing electrode 359 passes through the dielectric portion 358B, it comes into contact with at least one convex portion 358T of the adjacent conductor portions 358A and 358A. Plasma can be generated, and a stable plasma treatment can be performed on the workpiece S. Further, even when the conductor roller electrode 351 described in the modification example (2) is used as the dividing electrode 359, as shown in FIG. 110B, the conductor roller electrode 351 is always connected to any one of the conductor portions 358A. It becomes possible to make it contact.

  Further, as shown in FIG. 111, as the divided cylindrical electrode 358Z, a roller contact portion 358ZD extending in the circumferential direction of the cylindrical rotating container 310, and extending parallel to the central axis of the cylindrical rotating container 310 from the roller contact portion 358ZD. A first divided electrode 358ZA made of a conductor formed from a plurality of crosspieces 358ZE, and a second divided electrode 358ZB that has the same shape and size as the first divided electrode 358ZA and is disposed opposite to the first divided electrode 358ZA. May be. At this time, the conductive roller 351Z (see FIG. 112) provided at the tip of the seesaw portion 351S extending in a T shape with the support shaft 351J as the center is disposed below the roller contact portion 358ZD. In conjunction with the movement, a pair of conductive rollers 351Z provided at both ends around the support shaft 351J move up and down to contact one or both of the first divided electrode 358ZA and the second divided electrode 358ZB. Thus, when an application is made to the divided cylindrical electrode 358Z, a discharge is generated between the adjacent first divided electrode 358ZA and the second divided electrode 358ZB, and plasma can be generated. That is, since the plasma can be generated in the cylindrical rotary container 310 only by the divided cylindrical electrode 358Z, the structure in the plasma generation can be simplified, and the cleaning property and the cleaning property are improved. In addition, you may provide the convex dielectric tool (integrated with a rotation container, or attached by adhesion | attachment etc.) for short circuit prevention between adjacent 1st divisional electrode 358ZA and 2nd divisional electrode 358ZB.

  In addition, as shown in FIGS. 113 and 114, instead of the conductive roller electrode 351, a first divided electrode 357A and a second divided electrode 357B obtained by dividing the power receiving portion of the rotary connector, and a bipolar dielectric that can supply power to them. A rotary connector 357 having fixed electrodes 357C and 357D covered with a body may be provided. Further, a discharge chamber 357E is provided between the fixed electrode 357C and the first divided electrode 357A, and the fixed electrode 357D and the second divided electrode 357B, and a plasma generation gas is sealed in the discharge chamber 357E or plasma is supplied by a gas supply machine. Filled with product gas. When application is made to the fixed electrodes 357C and 357D, a dielectric barrier discharge is generated between the fixed electrode 357C and the first divided electrode 357A, and between the fixed electrode 357D and the second divided electrode 357B, and the fixed electrodes 357C and 357D. And the first and second divided electrodes 357A and 357B can perform non-contact power feeding. Thereby, plasma generation at a desired position can be performed. The desired plasma generation site is selected by a structure (not shown) having a mechanism capable of rotating the fixed power supply electrode terminal and a mechanism capable of fixing, and fixing it in accordance with the desired plasma generation site terminal position. The plasma is generated at a desired position by using it, and plasma processing can be performed. 114 shows a cross section of the first divided electrode 357A, but the second divided electrode 357B is arranged inside the first divided electrode 357A shown in FIG.

  In addition, the fixed electrode 357D is smaller than the fixed electrode 357C of the first divided electrode 357A, and has a configuration protruding substantially in the opposite direction to the fixed electrode 357C. Alternatively, the fixed electrode 357D capable of supplying power to the second divided electrode 357B may be arranged around the entire circumference so that plasma can be generated along the entire circumference of the internal electrode 355 in the cylindrical rotary container 310. Further, the fixed electrodes 357C and 357D may be replaced with brush electrodes and may have a structure (not shown) in direct contact with the first and second divided electrodes 357A and 357B. In addition, in FIGS. 113 and 114, the fixed electrodes 357C and 357D are arranged at the center, but the fixed electrodes may be arranged on the outer periphery of the rotary connector. The split cylindrical electrode 358 of the cylindrical rotary container 310 is a conductor in which the power receiving split electrode terminal of the rotary connector 357 and the inner conductor of the rotary power supply shaft of the rotary connector 357 are opposed to the rotary container split outer electrode. , Connected inside the rotating container. The rotary connector 357 is used not only for the conductive roller electrode 351 but also for the internal electrode 355 (in the case where the conductive roller electrode 351 and the rotary connector alone are insufficient in power supply capacity) and used together with the conductive roller electrode 351. May be. One or more flow paths are provided in the center of the second divided electrode 357B, connected to a rotary joint at the end (not shown), and gas, liquid, or granular material is introduced into the first rotation chamber 315 from the outside. May be used for the desired reaction.

  In place of the dielectric barrier discharge power feeding mechanism of the rotary connector 357 described above, as shown in FIG. 115, a liquid (or gel) conductor (including mercury, silver powder, copper powder, ionic liquid, etc.) or a paste conductor ( The first and second divided electrodes 357AZ and 357BZ may include a conductive fluid such as silver powder, copper powder, or ionic liquid.

  In FIG. 114, power is supplied to the lower fixed electrode 2 poles. However, the fixed electrode 357C has the same number of poles as the divided electrodes 357A (8 poles in FIG. 114) for power supply or signal transmission of a sensor or the like. It may be used. Moreover, you may use the number of poles according to a use and desired number.

  Further, instead of the conductive fluid, as shown in FIG. 116, the brush electrode may be provided to supply power. In this configuration, a method may be used in which a discharge is generated by non-contact dielectric barrier discharge between the fixed power supply electrode terminal and the power reception electrode terminal, and power can be supplied to the two electrodes of the power reception electrode terminal. Instead of the rotary connector 357, a brush electrode, a collecting electrode, or the like may be used.

  As shown in FIG. 117, as the divided cylindrical electrode 358Y, a roller contact portion 358YD extending in the circumferential direction of the cylindrical rotating container 310, and an angle from the roller contact portion 358YD to the central axis of the cylindrical rotating container 310, for example, A first divided electrode 358YA made of a conductor formed of a plurality of crosspieces 358YE extending obliquely downward by 45 degrees, and having the same shape and size as the first divided electrode 358YA, is disposed opposite to the first divided electrode 358YA. You may comprise with the 2nd division | segmentation electrode 358YB. As described above, when the crosspiece 358YE is inclined with respect to the central axis of the cylindrical rotary container 310, the plasma generated between the first split electrode 358YA and the second split electrode 358YB is also generated by the cylindrical rotary container 310. Plasma having an angle with respect to the central axis J1 is generated. At this time, the workpiece S moves to the front of the generated plasma due to the impact of the generated plasma. That is, spiral plasma is continuously generated by the rotation of the cylindrical rotary container 310 and the plasma having an angle. Due to the action of the spiral plasma, the object to be processed S moves to the front of the cylindrical rotating container 310 and stays to some extent forward. When the object to be processed S has an angle of repose, it is averaged in the cylindrical rotating container 310. The force works and moves backward to circulate in the first rotation chamber 315. Accordingly, the object to be processed S can be stirred with the spiral plasma and the plasma can be processed at the same time without providing a component such as a stirring spiral blade in the first rotating chamber 315, and the structure can be simplified and cleaned. Improvement of cleaning property and cleaning property and cost reduction can be achieved. In addition, a convex dielectric tool (integrated with a rotating container or attached by bonding or the like) for preventing a short circuit may be provided between the adjacent first divided electrode 358YA and second divided electrode 358YB. In addition, you may apply this structure to the structure of the plasma torch 26, the plasma torch 29, and 22nd Embodiment which were mentioned above.

  In addition, as shown in FIG. 118, a configuration may be provided that includes a low-elasticity coating layer 351M in which the outer edge portion of the conductive roller electrode 351 is covered with a low-elasticity dielectric. By covering the conductive roller electrode 351 with the low elastic coating layer 351M, the low elastic coating layer 351M can function as a dielectric to form a dielectric barrier discharge path. Further, since the conductive roller electrode 351 is covered with the low-elasticity coating layer 351M, the low-elasticity coating layer 351M is elastically deformed according to the outer surface of the cylindrical wall 311 of the cylindrical rotary container 310 as shown in FIG. In close contact with the dielectric layer that covers the outer surface of the rotary container 310. As a result, the dielectric barrier discharge generated by the contact between the conductive roller electrode 351 and the dielectric layer covering the outer surface of the cylindrical rotary container 310 is reduced to the dielectric barrier discharge only in the atmosphere in the flatly adhered portion. Therefore, power can be supplied to the cylindrical rotary container 310 while suppressing the amount of ozone generated by the dielectric barrier discharge. The power supply path is supplied by dielectric barrier discharge from the conductive roller electrode 351 to the divided cylindrical electrode 358 provided on the outer surface of the cylindrical rotary container 310 via the low-elasticity coating layer 351M. Electric power is supplied from the divided cylindrical electrode 358 of the cylindrical rotary container 310 to the internal electrode 355 by dielectric barrier discharge via the grinding media 336 in the cylindrical rotary container 310. By this power supply path, plasma is generated in the cylindrical rotary container 310 and plasma processing can be performed.

  The low-elasticity coating layer 351M may be a single-bubble low-elasticity material as shown in FIG. 119 (A), or a low-elasticity material containing a conductor as shown in FIG. 119 (B). It may be. If the low-elasticity coating layer 351M is composed of a single-bubble low-elasticity material, the single-bubble low-elasticity material is filled with a rare gas (neon gas, argon gas, etc.) in the production of the single-bubble low-elasticity material. A discharge is generated in the bubble, and a dielectric barrier discharge discharge path is formed between adjacent single bubbles. As a result, power is supplied from the conductive roller electrode 351 to the divided cylindrical electrode 358 in the cylindrical rotary container 310 through the single-bubble low-elasticity coating, and the pulverized media 336 is moved between the divided cylindrical electrode 358 and the internal electrode 355. Thus, a dielectric barrier discharge is generated, and plasma can be generated in the cylindrical rotary container 310. In addition, if the low-elasticity coating layer 351M is made of a low-elasticity material containing a conductor, power is supplied from the outer electrode of the conductive roller to the divided cylindrical electrode 358 in the cylindrical rotary container 310 via the conductor containing the low-elasticity material coating. Then, a dielectric barrier discharge is generated between the divided cylindrical electrode 358 and the internal electrode 355 via the pulverization medium 336, and plasma can be generated in the cylindrical rotary container 310.

  In addition, a conductor roller 351Z attached to both sides of the seesaw portion 351S shown in FIG. 111 is provided with a ladder-shaped holder (not shown) on a support shaft 351J, and a ladder bar is used as an axis, and conductors are provided before and after the support shaft 351J. It may be attached to a movable base provided with a roller 351Z, and may be brought into contact with the external electrode of the cylindrical rotary container 310 in a seesaw state around the support shaft 351J. Thereby, without providing a convex part in the division | segmentation cylindrical electrode 358Y, it can use as an external division | segmentation electrode of an adjacent square longer than the length between front-back roller cores in the circumferential direction.

(5) In the above embodiment, the grinding media 336 is spherical, but may be a cylindrical, quadrangular, triangular, or polygonal cube. Further, only media having the same diameter may be used, media having a plurality of diameters may be mixed, or spherical and cylindrical media may be mixed and used. By mixing media with a plurality of diameters, the gap between the media is reduced and the grinding efficiency is increased. Also, by mixing spherical and cylindrical media, some media are oriented 90 degrees in the direction of the central axis with respect to the flow direction. Get higher.

(6) As shown in FIG. 120, a rocking machine 372 capable of rocking in the vertical direction with respect to the central axis J1 of the cylindrical rotary container 310 is provided on the housing 370 holding the dielectric roller 330, and the rocking shaft 371 is The processing may be performed by swinging up and down from the base point, combining the rotation and swinging of the cylindrical rotary container 310, and having a structure capable of performing three-dimensional convection by the container rotational swing system. (Refer to Aichi Electric Co., Ltd., container rotating rocking type powder mixer rocking mixer)

(7) As shown in FIG. 121, the first rotating end wall 312 of the cylindrical rotating container 310 may be sealed and a rotating shaft 375 may be provided. At this time, if the supply portion of the object to be processed S is connected to the second rotation chamber 316, the object to be processed S is rotated forward by the central spiral guide 344 (see FIG. 96) provided in the second rotation chamber 316. The first rotation chamber 315 can be introduced. The rotary shaft 375 is driven to rotate by a rotary holder 376 having a motor. Further, the rotation holder 376 may be configured to be able to hold the cylindrical rotary container 310 in a cantilever shape via the rotation shaft 375. Alternatively, a fulcrum hinge and a mechanism capable of tilting up and down are provided under the rotary holder 376 motor, and the spiral shape in the second rotation chamber 316 is eliminated (not shown), and the workpiece S is supplied upward. Supply may be performed, and when the object to be processed S is discharged, it may be discharged downward and used.

(8) The cylindrical rotating container 310 may be provided with a structure capable of performing container rotating three-dimensional motion agitation that continuously performs three different operations of rotation, twisting, and reversal.

(9) In the cylindrical rotation processing apparatus 300 of the above embodiment, the internal electrode 355 is embedded in the pulverization media 336. However, the internal electrode 355 is made smaller or the amount of the pulverization media 336 is reduced to reduce the internal electrode 355. Further, a configuration may be adopted in which a distance (a distance at which plasma is generated) is provided between the pulverization medium and the pulverization medium 336. Thereby, since the to-be-processed object S can be grind | pulverized or stirred without the internal electrode 355 and the grinding | pulverization media 336 contacting, abrasion of the internal electrode 355 by the grinding | pulverization media 336 can be suppressed. In addition, when the grinding media 336 made of a dielectric is used, the dielectric coated grinding media can be obtained by introducing an appropriate amount of the dielectric coated grinding media in which the conductor is coated with the dielectric or the conductor grinding media formed of the conductor. Alternatively, since the conductor grinding medium serves as a starting electrode, the internal electrode 355 can be made smaller or the diameter of the cylindrical rotating container 310 can be increased, and the amount of the object S that can be irradiated with plasma in the cylindrical rotating container 310 can be reduced. Can be increased.

(10) As the cylindrical rotation processing apparatus 300, as in the container rotation apparatus described in paragraph [0070] of Japanese Patent Application Laid-Open No. 2014-083510, the first spiral guide and the first sub-spiral guide are provided inside the first rotation chamber. The cylindrical rotation processing apparatus may be provided with the external electrode 350 and the internal electrode 355 of the above embodiment to generate dielectric barrier discharge plasma and perform plasma processing. Note that the devices, devices, mechanisms, and the like described in Japanese Patent Application Laid-Open No. 2014-083510 may be provided with the plasma torch or the plasma generation mechanism of the present invention, or may be incorporated and used in a form in which these are applied and developed.

[Thirty Embodiment]
A vertical rotation processing apparatus 380 corresponding to the “plasma processing apparatus” of the present invention will be described below with reference to FIG. The vertical rotating container 381 shown in FIG. 122 has a cylindrical shape with both ends closed that can accommodate the processing object W and the pulverization medium 336, which are powder particles, and the central axis J3 is substantially vertical. It is arranged and is driven to rotate around its central axis J3.

  The vertical rotary container 381 includes a cylindrical vertical rotary container part 382 whose upper end is open, and a lid part 383 that closes the upper part of the vertical rotary container part 382. The vertical rotary container 382 is formed of an external electrode 382A (corresponding to the “first plasma generation electrode” of the present invention) made of a conductor or a conductor covered with a dielectric, and at least a part of the side wall is formed. The lid portion 383 includes an outer lid portion 383A and an inner lid portion 383B, and the lower end portion of the outer lid portion 383A is fixed so as to cover the upper edge portion of the vertical rotary container portion 382. In addition, an entrance / exit mechanism 383T capable of injecting gas and liquid into the inside of the vertical rotary container 382 is provided at the center of the lid 383. A cylindrical external electrode cylinder 384 is provided on the lower surface of the vertical rotary container 381 downward, and one brush electrode or current collecting electrode 391 is connected to the external electrode cylinder 384.

  An internal electrode 390 (corresponding to the “second plasma generation electrode” of the present invention) is provided at a substantially central portion of the vertical rotary container 381, and a disc portion 390A formed in a disc shape and a disc portion 390A upward. A conical protrusion 390B that narrows toward the bottom and a shaft portion 390C that hangs down from the disc portion 390A and penetrates the bottom of the vertical rotary container 381 are provided. The shaft portion 390 </ b> C is screwed and fixed to the bottom portion of the vertical rotary container 381 and penetrates the external electrode cylinder 384. Further, the other brush electrode or current collecting electrode 391 is connected to the shaft portion 390C. Note that the pair of brush electrodes or current collecting electrodes 391 are electrically connected to different polarities of the plasma power supply unit 15, respectively.

  When a certain amount of electric power is applied to the external electrode 382A and the internal electrode 390 through the plasma power supply unit 15, plasma is generated between the internal electrode 390 and the external electrode 382A via the grinding media 336. Note that plasma can be generated more stably by filling the vertical rotary container 381 with a rare gas such as helium gas or argon gas or other plasma generation gas.

  A rotation drive mechanism 386 that rotatably supports the vertical rotary container 381 is provided below the vertical rotary container 381. The rotation drive mechanism 386 includes a drive unit 386B and a support shaft 386A, and supports the external electrode cylinder 384 rotatably from the outside by a bearing support unit 385 having a cylindrical shape. The support shaft 386A, the external electrode cylinder 384, and the shaft portion 390C are each formed in a cylindrical shape, and are arranged coaxially in this order from the outside in the order of the support shaft 386A, the external electrode cylinder 384, and the shaft portion 390C.

  Here, in the vertical rotating container 381 of the present embodiment, as the vertical rotating container 381 rotates, the grinding media 336 is lifted upward by centrifugal force and collides with the inner lid portion 383B. Thereafter, when the rotation of the vertical rotating container 381 is suddenly stopped, the grinding media 336 returns to the bottom of the vertical rotating container 381 due to the inertia of centrifugal force. Thereby, while being irradiated with plasma to the process target W, the to-be-processed object S can be crushed or grind | pulverized.

  Further, the vertical rotation container 381 has a desired high-speed start-up time, sudden stop timing, and rotation and stop tact time by controlling the supply of additive and supply of additive gas with a desired program. The object S can be pulverized and plasma-treated. Note that the program may be controlled so that processing is performed at a constant speed and at a constant time.

  The vertical rotation processing device 380 of the present embodiment may be modified as follows.

(1) In the vertical rotation processing apparatus 380, the object to be processed S may be not only the processing target W made of powder and particles but also gas, liquid, solid, or a mixture thereof. Other than the above-mentioned pulverization, the stirring for the purpose of processing is mixing to homogenize several kinds of materials, dispersing to make the dispersoid uniform in the dispersion medium, kneading to make the paste or high-viscosity material uniform, and removing to remove the gas of the material It may be used for air removal, defoaming for removing bubbles in the solution, emulsification for uniformly dispersing liquids (water and oil, etc.) that do not mix with each other.

(2) The position of the internal electrode 390 may be used in accordance with a desired plasma treatment. The plasma generation gas may be stopped after replacement, and the object to be processed S may be subjected to plasma irradiation and pulverization. Although not belonging to the technical scope of the present invention, the plasma processing of the object S may be performed in the vertical rotary container 381 without using the grinding media 336. Furthermore, the processing chamber S may be subjected to plasma processing under vacuum or high pressure while the apparatus chamber is vacuum depressurized or pressurized and the container only is vacuum depressurized or pressurized. The rotary joint imitates one system, but the internal electrode gas supply has a double cylindrical structure (not shown), a gas supply port and an exhaust port are provided, a dual system rotary joint is provided, and processing is performed. Good.

(3) As shown in FIG. 123, as the vertical rotary container 381Z, a truncated cone-shaped cylindrical vertical rotary container part 382Z extending upward, and the upper part of the vertical rotary container part 382Z are closed and the inner lid You may comprise by the vertical rotation container 381Z provided with the cover part 383Z which the inner surface of part 383BZ made the round shape. The grinding media 336 accumulated on the bottom of the vertical rotating container part 382Z is accelerated by the rotational speed of the rotating container by forming the truncated cone-shaped vertical rotating container part 382Z extending upward. Reach position. When the rotational speed at the lower position of A is “rotational speed Xrpm + α0”, if this rotational speed is increased, the rotational speed is further increased to the position of “rotational speed Xrpm + α1”, and if the rotational speed is further increased, “rotational speed Xrpm + α2”. ”And the media rotates with the container as it sticks to the inner wall of the container. When the rotational speed is increased from “rotational speed X rpm + α0” and is increased to “rotational speed X rpm + α 2”, the medium rolls on the inner wall of the container and moves upward. When the rotational speed is decelerated from “rotational speed Xrpm + α2” and decelerated to “rotational speed Xrpm + α0”, the grinding media 336 rolls on the inner wall of the vertical rotary container 382Z and moves downward. At this time, when the grinding media 336 itself rolls and moves upward and downward, when the media A reaches the position of the media A, a centrifugal force xg is applied to the grinding media 336, and the space between the inner wall of the container and the media The object to be processed S is stepped on by the centrifugal force × g force of the grinding media 336, so that the grinding process can be performed with higher efficiency.

  Further, the rotational speed of the vertical rotary container 381Z is set to a rotational speed at which the workpiece S and the grinding media 336 can move to the rounded apex of the inner lid portion 383BZ of the vertical rotary container 381Z. Collision at the corner of R of 383BZ. The object to be processed S moved together with the grinding media 336 is crushed by the collision of the grinding media 336. The media B that has collided with the radius apex of the inner lid portion 383BZ shown in FIG. 123 attenuates “the centrifugal force of the medium × g force” due to the collision, the structure that can only move downward due to the collision, and the apex of the container inner lid radius Then, since centrifugal force cannot be obtained, the behavior of the dropped media C after the collision shown in FIG. As a result, the object to be processed S and the grinding media 336 are operated at a rotational speed at which the workpiece S and the grinding media 336 can move to the top of the inner lid 383BZ, thereby forming a circulation of the material to be processed S and the grinding media 336 in the vertical rotary container 381Z A high-efficiency pulverization treatment of the workpiece S and a plasma treatment by plasma generation can be used in combination.

(4) As shown in FIG. 124, the vertical rotary container 381X is configured such that the internal shape of the vertical rotary container part 382X and the lid part 383X is spherical. As described above in the modified example (3), it is stepped by the centrifugal force × g force of the grinding media 336, and the grinding process can be performed with higher efficiency. 124, the position D of the grinding media 336 corresponds to the position A of the grinding media 336 in FIG. 123, and the position E of the grinding media 336 corresponds to the position B of the grinding media 336. The position F of 336 corresponds to the position C of the grinding media 336.

  Further, since the vertical rotary container 381X has a circular cross-sectional shape, the load for moving the inner wall of the vertical rotary container 381X of the grinding media 336 only needs to be contact resistance. Compared to other types of vertical rotary containers, the grinding media 336 The inner wall of the vertical rotating container 381X can be moved smoothly, and the efficiency of the container circulation is good. Moreover, the responsiveness of the movement of the grinding media 336 with respect to the rotational speed is good. The side surface of the internal electrode 390X is configured to be as parallel as possible with the external electrode 382X. In the drawing, the hemispherical fastening portion of the vertical rotating container portion 382X simulates flange screw joining, but a screw that can be screwed may be used. Further, as the current collecting electrode 391, a brush connector, a current collecting electrode, a rotary connector or the like may be used.

(5) As shown in FIG. 125, the vertical rotation processing device 380Y can rotate around the central axis J3 as described above in a state where the vertical rotary container 381 is inclined at an inclination θ (approximately 45 °). ing. Alternatively, the vertical rotary container 381 may be a mechanism having a swivel structure that swivels around another swivel axis J4, for example, with the inclination θ maintained. Thereby, the vertical rotation processing device 380Y is lifted to the upper part of the vertical rotary container 381 by the centrifugal force generated by the rotation about the central axis J3, and is forcibly dropped by the centrifugal force generated by the rotation about the rotation axis J4. And it will fall by inertia. In this way, in addition to the rotation about the central axis J3 of the vertical rotating container 381 described above, the pulverization media 336 causes the object S to be processed by the collision energy of forced fall and inertial fall caused by turning about the turning axis J4. Since the particles can be pulverized into fine particles, the efficiency of the pulverization process can be increased. Moreover, the plasma treatment by plasma generation can be used together. Note that a method using a rotating structure and a turning structure centered on J3 is a well-known technique, and various driving mechanisms are conceivable, and therefore not shown here.

  Although not included in the technical scope of the present invention, the vertical rotation processing devices 380, 380X, 380Y, and 380Z have a strong centrifugal force, and therefore, the processing may be performed without using the grinding media 336.

[Thirty-first embodiment]
Hereinafter, based on FIG. 126 and FIG. 127, the stirring processing apparatus 400 which concerns on 31st Embodiment of this invention is demonstrated. The agitation processing apparatus 400 shown in FIG. 126 includes an object to be processed S and a stirrer that are a processing object W that is a granular material, a processing object L that is a liquid such as slurry and slurry, and other processing objects that have fluidity. A container 410 having a cylindrical shape with a bottom and containing 412 (corresponding to the “tubular container” of the present invention), and a magnetic stirrer 420 disposed below the container 410. As the stirrer 420 is driven, the stirrer 412 rotates to stir the workpiece S.

  A lid 430 is attached to the upper end opening of the container 410 to seal the inside of the container 410. The lid 430 is received in a plate-like electrode base plate 431B formed of a dielectric material having a diameter larger than that of the upper end opening of the container 410, and an upper end opening of the container 410 fixed to the lower side of the electrode base plate 431B. And an inner fixing plate 431A.

  As shown in FIGS. 126 and 127, the processing object supply port 432, the gas supply port 433, and the gas exhaust port 434 are connected to the lid 430. A processing target supply unit 440 for supplying the object to be processed S through a pipe (not shown) is connected to the processing target supply port 432. A rare gas or other plasma generation gas is supplied from the gas supply port 433. The gas exhaust port 434 can discharge the gas in the container 410 to the outside. The gas discharged from the gas exhaust port 434 may be circulated to the gas supply port 433 through a filtration device such as a gas intake processing unit (not shown).

  As shown in FIG. 126, a pair of first plasma generation electrode 450 and second plasma generation electrode 460 are inserted toward the container 410 in the pair of electrode piping portions 435 and 436 provided on the electrode base plate 431B. Has been. The first plasma generation electrode 450 and the second plasma generation electrode 460 are fixed by screws 437 and 437 provided in the electrode pipe portions 435 and 436, respectively. The first plasma generation electrode 450 and the second plasma generation electrode 460 are electrically connected to different polarities of the plasma power supply unit 15.

  As shown in FIG. 126, the first plasma generation electrode 450 inserted through the first electrode piping portion 435 provided at the approximate center of the electrode base plate 431B among the pair of electrode piping portions 435 and 436 has a cylindrical straight line. A pole portion 450A and a disc-shaped disc electrode 450B provided at the lower end of the pole portion are provided. The disc electrode 450B is substantially parallel to the lower surface of the disc electrode 450B and the powder surface or liquid surface of the object to be processed S, and the disc electrode 450B is slightly above the powder surface or liquid surface of the object to be processed S. Is arranged. The first plasma generation electrode 450 has a configuration in which a conductor is covered with a dielectric.

  The second plasma generation electrode 460 inserted through the second electrode piping portion 436 provided near the outer edge of the electrode base plate 431B among the pair of electrode piping portions 435 and 436 has an L-shaped lower end as shown in FIG. And an L-shaped pole portion 460A that is refracted like a cylinder, and a cylindrical cylindrical electrode 460B provided at the tip of the L-shaped pole 460A. The cylindrical electrode 460B is arranged such that the central axis J2 of the cylindrical electrode 460B is substantially perpendicular to the disc electrode 450B, and the upper surface of the cylindrical electrode 460B is slightly below the powder surface or liquid surface of the workpiece S. Yes. That is, the second plasma generation electrode 460 is disposed so as to sandwich the powder surface or liquid surface of the workpiece S between the first plasma generation electrode 450. Note that the second plasma generation electrode 460 also has a configuration in which a conductor is covered with a dielectric, similarly to the first plasma generation electrode 450.

  As a result, as shown in FIG. 126, when a certain level of power is applied to the first plasma generation electrode 450 and the second plasma generation electrode 460 through the plasma power supply unit 15, the first plasma generation electrode 450 and the second plasma generation are performed. Plasma is generated circumferentially between the electrodes 460, that is, on the powder surface or liquid surface of the workpiece S. Further, a rare gas such as helium gas or argon gas or other plasma generation gas is injected from the gas supply port 433, and the inside of the container 410 is filled with the plasma generation gas, thereby generating plasma more stably. be able to.

  In the agitation processing apparatus 400 of the present embodiment, as shown in FIG. 126, when the agitation element 412 rotates as the magnetic stirrer 420 is driven, a vortex is generated above the agitation element 412 and the object to be processed in the container 410. S causes vertical convection (see arrow in FIG. 126). Then, the object to be processed S is stirred while passing between the plasmas generated between the first plasma generation electrode 450 and the second plasma generation electrode 460. That is, since the object to be processed S can be irradiated with plasma while stirring, the efficiency of the plasma irradiation to the object to be processed S can be improved.

  The agitation processing apparatus 400 of the present embodiment may be modified as follows.

(1) As shown in FIG. 128, the first plasma generating electrode 450Z includes a pole portion 450A, a disc electrode 450B, and a conical conical electrode 450C suspended from the center of the disc electrode 450B. The plasma generation electrode 460 </ b> Z may be configured by a truncated cone electrode 460 </ b> D having a larger diameter than the cone electrode 450. As a result, as shown in FIG. 129, plasma can also be generated between the conical electrode 450C and the truncated cone electrode 460D. Therefore, the workpiece S is moved by the stirrer 412 to the conical electrode 450C and the truncated cone electrode 460D. Stirring while passing between. That is, since the time or distance for which the object to be processed S is irradiated with plasma becomes longer, the object to be processed S can be irradiated with plasma more efficiently. The cone electrode 450C and the truncated cone electrode 460D have a size relationship as shown in FIG. As shown in FIG. 130 (A), the first plasma generation electrode 450Z has a configuration in which a conical electrode 450C is provided at the tip of the pole portion 450A, and a disc electrode 450B having a hole at the center is inserted. It is good also as a possible structure. As shown in FIG. 130 (B), the second plasma generation electrode 460Z is provided with a holder 460C at the tip of the L-shaped pole portion 460A, and the L-shaped pole portion 460A and the truncated cone electrode 60D are separated. You may comprise as follows.

(2) In the agitation processing apparatus 400X shown in FIG. 131, the configuration of the second plasma generation electrode 460X is different from the above embodiment. A conductor plate 461X is provided between the magnetic stirrer 420 and a container 410X made of a dielectric. The second plasma generation electrode 460X includes a cylindrical electrode 460BX having a cylindrical shape and a plurality of legs 460EX made of a conductor that hangs down from the cylindrical electrode 460BX. Thereby, when electric power is applied to the conductor plate 461X, the cylindrical electrode 460BX is also applied via the leg portion 460EX, and plasma is generated between the cylindrical electrode 460BX and the disc electrode 450B in a circumferential shape. it can. At this time, as shown in FIG. 131, the cylindrical electrode 460BX is fixed by a fixing piece 460GX made of an elastic member. Further, if the base 460FX is provided on the lower surface of the leg portion 460EX, power can be supplied from the conductor plate 460X over a larger area. In this modification, the container 410X is made of a dielectric, but the container 410X may be made of a conductor, and the conductor plate 461X may be made of a dielectric.

(3) The stirrer 400Y shown in FIG. 132 has a configuration in which the stirrer 412X is rotationally driven by a motor 412M. Specifically, the stirring support shaft 412J is provided on the stirring bar 412X, and the stirring support shaft 412J is fixed to the first plasma generation electrode 450. The first plasma generation electrode 450 is connected to the motor 412M, and when the motor 412M is driven, the stirrer 412X fixed to the first plasma generation electrode 450 is rotated together with the first plasma generation electrode 450. In this modification, the stirring support shaft 412J is fixed to the first plasma generation electrode 450. However, when the stirring support shaft 412J protrudes from the lid 430 and the stirring support shaft 412J is connected to the motor 412M, The position of the pole portion of the first plasma generation electrode 450 may be shifted from the center, and an opening through which the stirring support shaft 412J can be inserted may be provided in the center portion of the disc electrode 450B. The stirrer 412X and the stirring support shaft 412J may be a conductor or may be used with a dielectric coating. Further, without using the second plasma generation electrode 460X, a conductor portion was provided in the stirring support shaft 412J and extended, and the stirring bar 412X was provided near the bottom of the container 410 having a bottomed cylindrical shape. Alternatively, the stirrer 412X may be left as a conductor, or a dielectric coating may be applied to generate plasma between the stirrer 412X and the conductor plate 461X. Furthermore, the motor 412M of the stirrer 412X is replaced with a shaft-through hollow motor motor, a flow path to the lower end of the stirrer 412X is provided in the shaft, and a plasma generation gas is supplied to the stirrer 412X and the conductor plate 461X. Plasma may be generated between them.

(4) In the above-described stirring treatment apparatuses 400, 400X, 00Y, the disk electrodes 450B, 450BX are disposed above the liquid surface or powder surface of the workpiece S, but the disk electrodes of the first plasma generation electrode 450 are disposed. You may arrange | position 450B and 450BX below the liquid level or powder surface of the to-be-processed object S. FIG. Thereby, plasma can be generated in the liquid or powder of the workpiece S. At this time, the plasma generation gas may be introduced into the liquid or powder as the plasma generation gas for generating plasma.

(5) Further, as shown in FIG. 133, when the container 410 is tilted, the liquid surface or powder surface of the object to be processed S in the container 410 is inclined, and the object to be processed S is in relation to the center line 410J of the container 410. The shape is asymmetric and the volume is different. Since the volumes of the objects to be processed S are different, the flow of the objects to be processed S in the container 410 does not form a uniform vortex, and the stirring efficiency can be improved. Note that the tilt angle is preferably changed as appropriate in the range of 2 to 5 ° depending on the viscosity of the liquid. Further, the stirring bar 412 may be arranged in parallel to the container 410 or may be arranged to be inclined with respect to the container 410.

(6) As shown in FIG. 134, a container 410Z having a polygon with one end bottom (square in FIG. 133) may be used instead of a cylinder with one end bottom. Thereby, as shown in FIG. 134, the vortex flow R is generated at the central portion and the corner portion in accordance with the rotation of the stirrer 412. Therefore, the rotation direction of the vortex flow R generated at the corner portion is the vortex flow generated at the central portion. By reversing R, it becomes resistance and the flow of the fluid in the container becomes irregular, so that the stirring efficiency can be improved.

(7) Moreover, it is good also as a structure which accommodates the grinding | pulverization media 336 in the container 410,410X, 410Y, and supports the plasma irradiation of the to-be-processed object S, and grinding | pulverization and stirring.

[Thirty-second embodiment]
A concentric parallel plate electrode 470 corresponding to a “plasma processing apparatus” according to a thirty-second embodiment of the present invention will be described with reference to FIGS. 135 and 136. As shown in FIG. 135, the concentric parallel plate electrode 470 has a first plasma generating electrode 471 and a second plasma generating electrode 472 formed vertically from a conductive metal substrate or a conductive metal substrate coated with a dielectric. Opposed. Between the first plasma generation electrode 471 and the second plasma generation electrode 472, a processing target W that is a granular material, a processing target L that is a liquid such as slurry or slurry, and an object to be processed that includes other processing targets. A pair of slide glasses 473A and 473B (corresponding to the “hollow insulating member” of the present invention) made of an insulating member that accommodates S can be inserted and removed from the side. As shown in FIG. 135, a support base 475 on which slide glasses 473A and 473B can be placed during plasma irradiation is provided.

  As shown in FIG. 136, the pair of slide glasses 473A and 473B has a rectangular flat plate shape, and the slide glass 473B (corresponding to the “first flat plate” of the present invention) disposed on the lower side has a flat surface. A recess 473C on which the object to be processed S is placed is provided in part. A flat slide glass 473A (corresponding to the “second flat plate” of the present invention) is stacked from above to close the recess 473C.

  The first plasma generation electrode 471 includes a columnar portion 471A and a disc portion 471B projecting laterally from the lower end of the columnar portion 471A, and an outer edge portion 471G on the lower surface of the disc portion 471B is formed in a round shape. Yes. Similar to the first plasma generation electrode 471, the second plasma generation electrode 472 includes a cylindrical portion 472A and a disc portion 472B that protrudes laterally from the upper end of the cylindrical portion 471A. The first plasma generation electrode 471 and the second plasma generation electrode 472 are respectively connected to different polarities of the plasma power supply unit 15.

  The configuration of the present embodiment is as described above. Next, the operation of this embodiment will be described. When a voltage is applied to the first plasma generation electrode 471 and the second plasma generation electrode 472, plasma is generated between the first plasma generation electrode 471 and the second plasma generation electrode 472. The object to be processed S is irradiated with the plasma by arranging the object to be processed S sandwiched between the slide glasses 473 and 473 in the space where the plasma is generated.

  As described above, by using the concentric parallel plate electrode 470 of this embodiment, it is possible to reliably generate plasma in the space between the first plasma generation electrode 471 and the second plasma generation electrode 472. Since a plurality of glass slides 473A and 473B in which the object to be processed S is held in the space where the plasma is generated can be inserted and removed, even if there are a plurality of types of objects to be processed S, the object can be efficiently covered. The processing object S can be irradiated with plasma.

  Moreover, if the concentric parallel plate electrode 470 of this embodiment is used, the length of a plasma production | generation flow path and a plasma processing means can be confirmed with a small amount of samples. By comparing the results of the plasma processing test results with the actual plasma processing means and converting them into data, the plasma processing means in actual processing can be grasped from the plasma processing test results.

  Furthermore, when the discharge side of the concentric parallel plate electrode 470 is a flat surface, the electric potential concentrates on the edges on the circumference and discharge occurs between the edges, but the electric potential is reduced by adding a radius to the edge 471G on the circumference. Uniform surface discharge can be performed without concentration.

  The concentric parallel plate electrode 470 of the present embodiment may be modified as follows.

(1) In the above embodiment, the slide glass 473A, 473B having a recess 473C in a rectangular glass plate is used as the “hollow insulating member”, but when the processing target W that is a granular material is irradiated with plasma, As shown in FIG. 137, the slide glass 473 </ b> E disposed on the lower side may have a configuration in which an adhesive portion 473 </ b> F is provided at the tip. The processing target W that is a granular material can be placed on the adhesive portion 473F of the lower slide glass 473E, and a flat slide glass 473D can be covered and fixed from above.

(2) When the plate-like processing object B is irradiated with plasma, flat rectangular glass plates 473H and 473J may be used as shown in FIG. The plate-shaped processing target B can be sandwiched and fixed between the slide glass 473H and the slide glass 473J.

(3) As the “hollow insulating member”, a circular plate, a square plate, a circular container (round petri dish) or a square container (square petri dish or microplate) may be used. At this time, the plasma-processed parallel plate electrode has a separation distance and a size between the first plasma generation electrode 450 and the second plasma generation electrode 460 and a magnitude of the applied voltage in accordance with the size of each hollow insulating member. Can be adjusted. Furthermore, a desired gas may be introduced between parallel plate electrodes, an additive may be applied to a circular plate, a square plate, a circular container, or a rectangular container, and the same processing may be performed to obtain a desired plasma processing effect.

(4) Further, the upper first plasma generation electrode 471 is coated with a dielectric, and the lower second plasma generation electrode 472 is replaced with a conductor flat plate. Or a mechanism for sequentially moving the first plasma generation electrode 471 coated with a plurality of upper-side dielectrics, or a mechanism for sequentially moving the second plasma generation electrode 472 formed of the lower conductor flat plate. A higher rate may be achieved. The parallel plate electrodes may be used while being held horizontally or obliquely.

(5) The second plasma generating electrode 22B shown in FIG. 14 is used as the round bar electrode on the concentric parallel plate electrode 470, and the point plasma is generated by facing the end of the shaft, or the round bar electrode is parallel. The linear plasma may be generated between the parallel round bar electrodes. In addition to round bar electrodes, square (including polygonal) square bar electrodes with a length are used, the surfaces are arranged in parallel, and the width between the square bar electrodes arranged in parallel is A certain linear plasma may be generated. In the square bar electrode, the width of the line can be changed by selecting the width arbitrarily. Also, the tip of the square bar electrode is sharpened so that it is opposed to each other to generate a plasma of points. By arranging the corners in parallel, a linear plasma can be generated, and several plasmas can be generated in one set.

[Other Embodiments]
The present invention is not limited to the above-described embodiment. For example, the embodiments described below are also included in the technical scope of the present invention, and various other than the following can be made without departing from the scope of the invention. It can be changed and implemented.

(1) The ribbon blade mixer 90 of the eighth embodiment is a horizontal axis mixer, and the screw conveyor 160 of the twentieth embodiment is a horizontal transporter, both of which are the container inner surface, the ribbon blade, and the cylindrical pipe inner surface. A gap is provided between the screws. On the other hand, there is a mixer that mixes with a vertical axis single ribbon in a casing (container) (see Okawara Manufacturing Co., Ltd., reverse cone type single ribbon mixing / drying device). There is also a mixer that mixes by rotating and revolving along the inner wall surface of the casing (container) with an inclined shaft screw (refer to Hosokawa Micron Corporation inverted cone screw mixing device). In any case, the stirring mechanism portion rotates in the container in a form that maintains a gap with the inner wall surface of the casing (container). In equipment and devices for the purpose of stirring and mixing, the casing (container) is used as a dielectric, or the inner wall of the casing (container) is subjected to dielectric treatment, and the equipment section (spiral blade, scraper, etc.) that performs stirring The outer wall of the casing (container) is connected to the outer electrode as a configuration in which the dielectric treatment is applied to the container, or it is used without being subjected to the dielectric treatment and is subjected to an insulation treatment that does not cause a short circuit from the container side wall and the stirring equipment part. As described above, a device part that performs stirring is used as an internal electrode, and a rotary connector is provided at the shaft end of the device part that performs stirring, and the rotary connector and the external electrode are connected to the plasma power supply unit 15 so that plasma can be generated. A mechanism is provided to generate plasma between the rotary connector and the equipment section for stirring, and the inner wall of the casing (container) for plasma treatment It may be. You may use this for another mixer.

  Further, a grid network, expanded metal, or punching metal may be used for the external electrode to increase the discharge density.

(2) For the rod electrodes inside various plasma torches, the density of the plasma may be increased by using ribbon blade electrode 160E, coil shape, lattice network, expanded metal, and punching metal.

(3) In the said embodiment, although the process target is mainly described by solid, a granular material, and the liquid, if it is the range which can be used, you may use the main process target as gas. Add other component gases, add liquids or powders, or introduce these blends to form and grow solids, solutions, gases, or add different additives sequentially You may use the system which repeats a process and obtains a product.

(4) The screw conveyor 160 of the twentieth embodiment is a horizontal transporter, but a gap is provided between the inner surface of the cylindrical pipe and the screw. Similarly, there is a flow conveyor (such as Sugihara Engineering Co., Ltd.) that transports transported goods by endless running chain flights (blades, bars, scrapers, etc.) mounted on the casing in the casing (container). . Also in this flow conveyor, a gap is provided between the casing and the chain flight. In equipment and devices intended for transportation, the casing (container) is used as a dielectric, or the inner wall of the casing (container) is subjected to dielectric treatment, and the chain flight equipment section that is transported is subjected to dielectric treatment. Or, as it is used as it is without being subjected to dielectric treatment, and the insulation processing is performed so as not to short-circuit the container side wall and the equipment part that carries it, the casing bottom surface and the outside of the side surface are used as external electrodes, and chain flight Is used as an internal electrode, and a rotary connector is provided at the shaft end of the equipment part to be transported. The external connector is connected to the plasma power supply unit 15 and the rotary connector is provided with a mechanism capable of generating plasma.・ Plasma is generated between the chain flight of the equipment section to be transported and the inner wall of the casing (container). Plasma treatment may be performed. This may be used for other transport devices.

(5) Furthermore, the plasma torch or the plasma generation mechanism of the present invention is provided in the device, apparatus, mechanism or the like disclosed in Japanese Patent Application Laid-Open No. 2014-083510, or these are incorporated in an application developed form. It may be used.

(6) In the plasma processing apparatus of the present invention, the apparatus and apparatus of the above embodiment are covered with a dielectric cover that is an insulator to enhance safety in both the research field and the industrial field. It shall be used in The material, shape, and the like of the dielectric cover may be used in consideration of the safety of the operator using the present embodiment in accordance with the equipment and the device configuration. Further, in order to cover the outside with a dielectric cover, which is an insulator, and to increase the safety, integration may be achieved using machining molding or injection molding.

(7) According to the configuration of the above-described embodiment, each configuration can be easily obtained by incorporating the plasma torch or the configuration for generating plasma of the present invention into an existing device (which is already commercialized and sold). Plasma processing can be added to the processing of the apparatus (see especially the first to thirteenth and nineteenth to twenty-second embodiments). That is, conventional industrial equipment and industrial equipment can be used as plasma processing equipment and plasma processing equipment. Further, the cost can be reduced and the plasma processing can be performed efficiently as compared with the configuration in which the existing device and the device that performs only the plasma processing are separately provided. Further, by selecting a plasma generation power source according to the desired plasma processing, it is possible to generate a wide range from a low temperature plasma to a high temperature plasma, and to impart a desired plasma processing effect to the processing target. In addition, the present invention can be applied to industrial equipment and industrial devices other than the above-described embodiment as long as it is an industrial device and industrial device that can use the plasma generating means and mechanism and function of the present invention, or plasma generating means and mechanism to which they are applied. The plasma processing means, mechanism and function of the invention may be incorporated, and plasma processing may be added to the processing of liquid, solid, gas, powder and the like.

  In addition, in the JPO standard technology collection (agrochemical formulation technology) database, the mixing device described in “Mixing and kneading technology”, the grinding device described in “Crushing technology”, and the granulation described in “Granulation and molding technology” Device, coating device described in “Coating Technology”, drying device described in “Drying Technology”, screening device described in “Sieving Technology”, and Powder Engineering Handbook (1998, edited by Powder Engineering Society, Nikkan Kogyo Shimbun Co., Ltd.), which is used for the operation of the powder and granular materials, and for the following processing, "system (mixing, stirring, dispersing, crushing, crushing, crushing, crushing, Fine grinding, sieving, sizing, dry classification, wet classification, drying, cooling, humidification, humidity conditioning, solid-liquid separation, filtration, dehydration, concentration, sterilization, sterilization) equipment, equipment (mixing, stirring, dispersion, kneading, koji) Sum, granulation, molding, tableting, baking, storage, cross-linking measures, supply, discharge, collection Air transportation, gas transportation, mechanical transportation, quantitative supply, filling, weighing, bag opening, packaging, foreign matter removal, surface modification, coating, crystallization, emulsification, dissolution, filtering, anti-adhesion, cleaning, analysis, Chemical reaction, etc.) ", treatment equipment for liquids, solids, gases, granular materials, etc., and chemical equipment may be used with the functions and mechanisms of the present invention, or plasma treatment means applying them. .

(8) The dielectric barrier discharge may be performed in a form in which a dielectric is provided on both or one of the pair of electrodes. Electrode dielectric coating is made by applying dielectric material, inserting electrodes into the dielectric, ceramic spraying, fluororesin coating, glass lining, and coating that allows quartz glass coating by drying. A coating material, a glass paint that does not require heat (for example, manufactured by Turtle, FLUID GLASS liquid glass) or the like is used as a dielectric. Furthermore, a dielectric material may be selected and used.

(9) A ball mill that separates raw materials and media in a sealed tank by a tilting discharge mechanism (automatic discharge ball mill AXB-100 manufactured by Seiwa Giken Co., Ltd.), or a dispersion, mixing, and pulverizer (three-dimensional composite vibration) Using the rocking mill RM-10 manufactured by Seiwa Giken Co., Ltd. or the pot mill (AZN-51S manufactured by Nissho Science Co., Ltd.), etc. You may perform the processed material process of a process combined use.

(10) The inside of the apparatus, the container, the flow path, and the chamber are based on the atmospheric pressure. However, these can be vacuum-depressurized or pressurized, and plasma can be generated under vacuum-depressurized or pressurized. It may be generated and plasma treatment of the processed material may be performed.

(11) In a configuration in which plasma is generated in a flow path and plasma processing is performed, a power source capable of generating plasma is set as one unit, a structure for preventing a short circuit between adjacent power sources is provided, and this is arranged in series to generate plasma. However, plasma treatment may be performed.

  Note that in the step of bonding the atoms or atomic groups constituting the plasma generating gas, the reactive gas can be bonded to the atoms or atomic groups constituting the reactive gas by exposing the powdered particles to the reactive gas. It becomes possible to process a large amount of powder particles at once. Furthermore, the density of atoms or atomic groups that modify the surface of the granular particles can be controlled by controlling the reaction time with the plasma generation gas and the concentration of the plasma generation gas until a desired effect is exhibited. As described above, according to the present invention, it is possible to control the density of atoms or atomic groups that modify the surface, and it is possible to produce granular particles with excellent productivity.

  Moreover, the arrow of the rotation direction is shown as one form in the figure described in description of each embodiment, For example, you may comprise so that it may act in the reverse rotation direction.

  The present invention is mainly in the industrial field, but these may be used in other fields such as consumer products such as home appliances, fishery and agriculture, aviation, space, and the like.

10 Jet mill (plasma processing equipment)
DESCRIPTION OF SYMBOLS 15 Plasma power supply part 21-30 Plasma torch 21A-30A 1st plasma production electrode 21B-30B 2nd plasma production electrode 21P-30P Pipe (hollow insulation member)
40 Jet mill (plasma processing equipment)
40K body case (hollow insulation member)
45,45 triple orifice nozzle (first plasma generating electrode, second plasma generating electrode)
50 Crusher (Plasma treatment device)
50A Main unit case 60, 60W Dispersing device (plasma processing device)
60A body case 61, 61W stirring rod 63A first plasma generating electrode 63B second plasma generating electrode 70 mixer (plasma processing apparatus)
71 Cylindrical container 75, 75W Vibrating sieve (plasma processing equipment)
75A First plasma generating electrode 75B Second plasma generating electrode 80 Dust collector (plasma processing apparatus)
85 Vertical rotary mixer (plasma processing equipment)
90 Ribbon blade mixer (plasma processing equipment)
90A Container 91 Ribbon blade 100, 105 Gas transport device 101, 106 Transport piping (plasma processing device)
101A, 106A First plasma generation electrode 101B, 106B Second plasma generation electrode 110 Channel case (plasma processing apparatus)
110X first parallel electrode (first plasma generating electrode)
110Y second parallel electrode (second plasma generation electrode)
110C Partition wall (first and second plasma generation electrodes)
120 lattice flow path (plasma processing equipment)
123A First plasma generating electrode 123B Second plasma generating electrode 130 Plasma torch 133A First plasma generating electrode 133B Second plasma generating electrode 140 Tube processing apparatus (plasma processing apparatus)
145A to 145E Plasma processing chamber (plasma processing apparatus)
145P Insulation pipe (hollow insulation member)
147A First plasma generating electrode 147B Second plasma generating electrode 150 Vibrating conveyor (plasma processing apparatus)
150A First plasma generating electrode 150B Second plasma generating electrode 150V Belt conveyor (plasma processing apparatus)
150W rotary table conveyor (plasma processing equipment)
160,160V screw conveyor (plasma processing equipment)
160A External electrode (first plasma generation electrode)
160B screw (second plasma generating electrode)
160P Insulated pipe (hollow insulation member)
161 Roller electrode 167 Media 170A First spiral electrode 170B Second spiral electrode 170C Third spiral electrode 180 Plasma transfer device (plasma processing device)
180D electrode sheet (first plasma generation electrode)
180P Insulated pipe (hollow insulation member)
181 Electrode shaft (second plasma generation electrode)
200 Plasma Processing System 201 Plasma Processing Unit (Plasma Processing Apparatus)
270, 271 Start electrode 276A, 276B Plasma generation electrode 280 Surface treatment plasma torch 280A Fixed electrode (first plasma generation electrode)
280B Movable electrode (second plasma generation electrode)
300 Cylindrical rotation processing equipment (plasma processing equipment)
310, 310Z Cylindrical rotating containers 336, 336Z Grinding media 350, 350Z External electrode (first plasma generating electrode)
355, 355Z Internal electrode (second plasma generation electrode)
357 Rotary connectors 358, 358Y, 358Z Split cylindrical electrodes 380, 380X, 380Y, 380Z Vertical rotary processing devices 381, 381X, 381Z Vertical rotary containers 382A, 382X External electrodes (first plasma generating electrodes)
390, 390X Internal electrode (second plasma generation electrode)
400, 400X, 400Y Stir processing equipment (plasma processing equipment)
410, 410X, 410Y Container (tubular container)
412, 412X Stirrer 420 Magnetic stirrer 450, 450X, 450Z First plasma generating electrode 460, 460X, 460Z Second plasma generating electrode 470 Concentric parallel plate electrode 471 First plasma generating electrode 472 Second plasma generating electrode 473 Slide glass (Hollow insulation member)
S Object B, W, L, G Process target

Claims (40)

A hollow insulating member having a processing space in which a processing target is accommodated or passed;
A first plasma generating electrode disposed outside the hollow insulating member;
A voltage for generating plasma in the processing space is disposed outside or inside the processing space so as to face the first plasma generating electrode with at least a part of the processing space interposed therebetween. A plasma processing apparatus, comprising: a second plasma generation electrode applied between the two. Insulating pipe as the hollow insulating member,
2. The plasma processing apparatus according to claim 1, wherein each of the first and second plasma generation electrodes has a strip shape and is wound around the outer surface of the insulating pipe in a spiral shape parallel to each other. Insulating pipe as the hollow insulating member,
The first plasma generation electrode has a band shape and is wound spirally around the outer surface of the insulating pipe,
The plasma processing apparatus according to claim 1, wherein the second plasma generation electrode has a rod shape and is accommodated in the insulating pipe. The first plasma generating electrode has a first spiral electrode and a second spiral electrode in which two strip-shaped metal sheets are wound in parallel to each other;
The plasma processing apparatus according to claim 3, wherein a voltage is alternately applied to the first and second spiral electrodes between the second plasma generation electrode. Insulating pipe as the hollow insulating member,
2. The plasma processing apparatus according to claim 1, wherein the first and second plasma generation electrodes are both in a ring shape, and are wound alternately around the outer surface of the insulating pipe. Insulating pipe as the hollow insulating member,
The first plasma generating electrode has a ring shape and is wound around the outer surface of the insulating pipe.
The plasma processing apparatus according to claim 1, wherein the second plasma generation electrode has a rod shape and is accommodated in the insulating pipe. The first plasma generation electrode and the second plasma generation electrode have a flat plate shape facing each other,
The plasma processing apparatus according to claim 1, wherein the processing space is spirally wound or meandering in a flat space between the first plasma generation electrode and the second plasma generation electrode. Insulating pipe as the hollow insulating member,
The plasma processing apparatus according to claim 1, wherein the second plasma generation electrode has a spiral blade that is housed in the insulating pipe and is driven to rotate. The insulating pipe extends in a horizontal direction or an oblique direction with respect to the horizontal direction,
The plasma processing apparatus according to claim 8, wherein the first plasma generation electrode is unevenly distributed on a lower side in a circumferential direction of the insulating pipe. The insulating pipe extends in a horizontal direction or an oblique direction with respect to the horizontal direction,
There is a gap between the outer end surface of the spiral blade of the second plasma generation electrode and the inner surface of the insulating pipe,
The plasma processing apparatus of Claim 8 or 9 which moves the said process target which is the granular material accommodated in the said clearance gap by the impact at the time of plasma generation. The insulating pipe extends in an oblique direction with respect to a horizontal direction;
The spiral blade rotates to feed the processing target from the bottom to the top,
A processing medium accommodated in the insulating pipe and moved together with the processing object, and crushing the processing object;
A separation unit that separates the processing target and the processing medium discharged from the upper end of the insulating pipe;
The plasma processing apparatus of Claim 10 provided with the medium return chute which is provided in the side of the said insulation pipe and sends the said processing medium sorted by the said classification part to the lower end part of the said insulation pipe. An insulating pipe as the hollow insulating member;
The second plasma generation electrode, which is arranged inside the insulating pipe and is capable of linear movement in the axial direction of the insulating pipe,
A voltage is applied to the first and second plasma generation electrodes when the second plasma generation electrode moves in one of the axial directions of the insulating pipe, while the second plasma generation electrode is connected to the axis of the insulating pipe. The plasma processing apparatus according to claim 1, wherein no voltage is applied when moving in the other direction. The first plasma generation electrode covers at least a part of the outer surface of the hollow insulating member,
The second plasma generating electrode is housed inside the hollow insulating member, and has a protruding portion that protrudes toward an inner surface of a portion of the hollow insulating member that is covered with the first plasma generating electrode. The plasma processing apparatus according to claim 1.   The first plasma generation electrode and the second plasma generation electrode are disposed between the first plasma generation electrode and the second plasma generation electrode in a state of being insulated from the first and second plasma generation electrodes, The plasma processing apparatus according to claim 1, further comprising a starting electrode for inducing plasma generation during the period.   The plasma processing apparatus according to claim 14, wherein the starting electrode is a processing medium for pulverizing the processing target that is a granular material. A relay electrode disposed between the first plasma generation electrode and the second plasma generation electrode in a state of being insulated from the first and second plasma generation electrodes;
The plasma processing apparatus according to claim 1, wherein plasma is generated via the relay electrode between the first plasma generation electrode and the second plasma generation electrode. An insulating pipe as the hollow insulating member;
The first and second plasma generating electrodes facing each other across the insulating pipe;
A plurality of the relay electrodes embedded in the insulating pipe,
The plasma processing apparatus according to claim 17, wherein plasma is generated along the inner surface of the insulating pipe via the relay electrode. The first and second plasma generation electrodes face each other in a parallel state,
The hollow insulating member is formed by superimposing a second flat plate on a first flat plate having a depression in a part of a flat surface so as to close the depression, and the whole is formed by the first plasma generation electrode and the second plasma generation. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus has a plate shape that is inserted and removed from a side with respect to the electrode, and the recess is closed to form the processing space.   The plasma processing apparatus according to claim 1, wherein the hollow insulating member includes a cylindrical rotating container that is formed in a cylindrical shape and is driven to rotate about a central axis. A conductive roller that rotatably contacts the cylindrical rotating container in contact with the outer peripheral surface of the cylindrical rotating container;
The plasma processing apparatus according to claim 19, wherein the conductive roller is the first plasma generation electrode. A plurality of metal plates fixed to the outer peripheral surface of the cylindrical rotating container, extending along the axial direction of the cylindrical rotating container, and arranged in the circumferential direction of the cylindrical rotating container;
And at least two power supply devices arranged so as to be able to contact each of the different metal plates among the plurality of the metal plates,
The plasma processing apparatus according to claim 19, wherein the metal plate in contact with the power supply apparatus functions as the first or second plasma generation electrode. A first plasma generation electrode having a processing space in which a processing target is accommodated or passed;
A voltage for generating plasma in the processing space is disposed inside the first plasma generating electrode so as to face the first plasma generating electrode with at least a part of the processing space interposed therebetween. And a second plasma generation electrode applied between the two. A cylindrical rotating container as a first plasma generating electrode which is cylindrically rotated around a central axis;
The plasma processing apparatus according to claim 22, further comprising: a power supply device that contacts the cylindrical rotating container and supplies power to the cylindrical rotating container.   The plasma processing apparatus according to claim 21 or 23, wherein the power feeding device includes a conductive roller that contacts an outer peripheral surface of the cylindrical rotating container and rotatably supports the cylindrical rotating container. A processing medium for pulverizing or diffusing the processing target is contained in the cylindrical rotating container,
The plasma processing according to any one of claims 19, 20, 21, 23, and 24, wherein plasma is generated between the first plasma generation electrode and the second plasma generation electrode via the processing medium. apparatus. A cylindrical container with a bottom in which a processing target that is a liquid, a granular material, or a mixture thereof, and a stirrer for stirring the processing target are accommodated,
A first plasma generating electrode disposed above the stirrer in the cylindrical container and having a facing surface facing the bottom wall of the cylindrical container, and between the bottom wall and the first plasma generating electrode A cylindrical shape extending along the central axis of the cylindrical container, and a tip surface of the second plasma generating electrode facing the opposing surface of the first plasma generating electrode. A plasma processing apparatus, comprising: a pair of plasma generation electrodes to which a voltage for generating plasma is applied in a shaped container. The first plasma generation electrode has a disk shape having the opposing surface on a lower surface,
27. The plasma processing apparatus according to claim 26, wherein the second plasma generation electrode has a cylindrical shape that hangs downward from a position below an outer edge portion of the first plasma generation electrode. The first plasma generation electrode includes a disk portion having the opposing surface on a lower surface, and a conical portion that is disposed below the disk portion and tapers downward from a circle having a smaller diameter than the disk portion. ,
The second plasma generation electrode extends downward from a position below the outer edge of the disk portion of the first plasma generation electrode, and has a truncated cone shape surrounding the conical portion of the first plasma generation electrode. 27. The plasma processing apparatus according to claim 26.   The first plasma generation electrode is disposed such that the opposing surface is positioned above the liquid surface or powder surface of the processing target, and the second plasma generation electrode is positioned above the liquid surface or powder surface of the processing target. 29. The plasma processing apparatus according to any one of claims 26 to 28, which is also disposed below.   30. The plasma processing apparatus according to claim 26, wherein the stirrer is rotationally driven by a magnetic stirrer.   30. The plasma processing apparatus according to claim 26, wherein the stirrer is rotationally driven by a motor. A hollow insulating member having a gas passage through which a plasma generating gas passes;
A first plasma generation electrode and a second plasma generation electrode, which are arranged outside the hollow insulating member, face each other with the gas passage interposed therebetween, and to which a voltage for generating plasma is applied in the gas passage; Plasma torch.   The plasma according to claim 32, wherein the gas passage is also used as a target flow path for allowing a processing target to pass through, and the processing target can pass through the gas passage sandwiched between the first and second plasma generation electrodes. torch. A straight pipe having a target flow path for passing a processing target from one end side to the other end side; and a branch pipe extending obliquely from the position near the one end of the straight pipe toward the one end side. A branch pipe as the hollow insulating member;
A gas supply port provided at a tip of the branch pipe and to which a plasma generation gas is supplied;
The gas passage extending from the gas supply port in the branch pipe and extending in the straight pipe to the other end side;
The plasma torch according to claim 32, further comprising: the first and second plasma generation electrodes facing each other across the branch pipe. A branch pipe as the hollow insulating member, comprising: a straight pipe; and a branch pipe extending obliquely toward the one end side from a position near one end of the straight pipe;
An inner pipe as a part of the hollow insulating member, arranged inside the straight pipe among the branch pipes,
A cylindrical electrode as the first plasma generation electrode that covers an outer peripheral surface of a portion on the other end side of the branch pipe of the straight pipe in the branch pipe;
A rod-shaped coating electrode as the second plasma generation electrode, which is formed by coating a metal rod with the inner pipe and is accommodated inside the straight pipe;
The plasma torch according to claim 32, further comprising: a gas supply port that is provided at a distal end portion of the branch pipe and to which a plasma generation gas is supplied. An insulating pipe as the hollow insulating member;
An inner pipe as a part of the hollow insulating member disposed inside the insulating pipe;
A cylindrical electrode as the first plasma generating electrode covering the outer peripheral surface of the insulating pipe;
A rod-shaped coating electrode as the second plasma generation electrode, which is formed by coating a metal rod with the inner pipe and is accommodated inside the straight pipe;
A closing member provided at one end of the insulating pipe and closing an opening at the one end;
A through hole formed in the closing member and to which one end of the rod-shaped coated electrode is fixed,
The plasma torch according to claim 32, wherein the rod-shaped covering electrode is formed with a gas flow path through which the through hole and the gas passage are communicated and through which the plasma generating gas can pass. An insulating case as the hollow insulating member, comprising: a box-shaped case having a box shape with a bottom opening; and a plurality of inner pipes arranged inside the box-shaped case;
A fixed electrode as the first plasma generating electrode, which is formed by covering a metal rod with one inner pipe and fixed inside the box-shaped case;
A metal electrode covered with the other inner pipe, and a movable electrode as the second plasma generation electrode accommodated in the box-shaped case so as to be movable up and down,
The plasma torch according to claim 32, wherein a plasma processing range can be changed depending on a position of the movable electrode.   The plasma torch according to any one of claims 32 to 37, wherein a plasma jet is ejected from an end portion of the hollow insulating member by a flow pressure of the plasma generation gas. A plasma torch according to any one of claims 32 to 38;
An additional processing unit that performs additional processing such as mixing, crushing, granulation, drying, etc. on the processing target such as powder, liquid, solid, and gas,
The plasma processing apparatus which performs a plasma process with the said additional process with respect to the said process target. An additional processing component for performing additional processing such as mixing, crushing, granulation, drying, etc. on the processing target such as powder, liquid, solid, and gas in the processing space;
A first plasma generating electrode and a second plasma generating electrode, which are attached to the additional processing component, face each other across the processing space, and to which a voltage for generating plasma is applied in the processing space; Have
The plasma processing apparatus which performs a plasma process with the said additional process with respect to the said process target.