JP2017039079A - Two-fluid spray apparatus and control method for same - Google Patents

Two-fluid spray apparatus and control method for same Download PDF

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JP2017039079A
JP2017039079A JP2015161876A JP2015161876A JP2017039079A JP 2017039079 A JP2017039079 A JP 2017039079A JP 2015161876 A JP2015161876 A JP 2015161876A JP 2015161876 A JP2015161876 A JP 2015161876A JP 2017039079 A JP2017039079 A JP 2017039079A
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寧 森園
Yasushi Morisono
寧 森園
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Abstract

PROBLEM TO BE SOLVED: To prevent liquid dripping that occurs when a two-fluid nozzle stops operating.SOLUTION: A two-fluid spray apparatus comprises: a liquid pipe 5 which includes a liquid separation part 2 separating a pressurized liquid into a liquid supply side liquid and a liquid discharge side liquid, and includes a liquid rising part 4 formed between the liquid separation part and a connection part of a liquid drain pipe 3 and extending to a location where a height of an end portion of the connection part is larger than a height in a direction perpendicular to the liquid separation part; and a liquid drain valve 7 provided between the liquid rising part and the liquid separation part, turned into an open state when the liquid within the liquid drain pipe is discharged, and turned into the open state until a next spray operation of a two-fluid nozzle 9 starts, and further comprises a liquid storage mechanism 8 causing the pressurized liquid to naturally remain in a pipe passage when a liquid supply stop valve 10 and the liquid drain valve are turned into open states to supply the pressurized liquid, the two-fluid spray apparatus being configured such that the two-fluid nozzle is disposed in a location where a height in the perpendicular direction is larger than a highest portion of the liquid rising part in the liquid storage mechanism, and liquid dripping from the two-fluid nozzle is prevented when the spray operation of the two-fluid nozzle stops.SELECTED DRAWING: Figure 2

Description

本発明の実施形態は、二流体噴霧装置及びその制御方法に関する。   Embodiments described herein relate generally to a two-fluid spray device and a control method thereof.

例えばクリーンルームに適用される二流体噴霧装置が種々開発されている。   For example, various two-fluid spraying apparatuses applied to a clean room have been developed.

特開2007−154733号公報JP 2007-154733 A 特開平8−278047号公報JP-A-8-278047 特開2010−63960号公報JP 2010-63960 A

しかしながら、従来の二流体噴霧装置では、以下のような問題点がある。例えば特許文献1では、配管に残った液体を、別の流路からエアを吹き込んで、噴ききることにより液だれを防止していたが、この方法では、以下に述べるような問題点がある。   However, the conventional two-fluid spray device has the following problems. For example, in Patent Document 1, the liquid remaining in the pipe is blown in by blowing air from another flow path to prevent dripping. However, this method has the following problems.

(1)噴ききる量を少なくした場合、配管の残圧により、停止した後に液体が噴出してきたり、配管中の液体が何かの拍子に垂れだす危険性がある。 (1) When the amount to be sprayed is reduced, there is a risk that the liquid will be ejected after stopping due to the residual pressure of the pipe, or that the liquid in the pipe will droop.

(2)噴ききる量を多くした場合、吹ききるまでにかなりの時間を要すため、きめ細かく噴霧量を制御する必要がある制御装置には使用できない。 (2) When the amount to be sprayed is increased, it takes a considerable time to blow, and thus cannot be used for a control device that requires finely controlling the spray amount.

(3)大規模な噴霧システムで使用する場合(例えば20mの長さに直線的に等間隔で20個のノズルを配置した場合等)は、全てのノズルの液だれを効果的且つ低コストで液だれ防止することは困難であった。 (3) When used in a large-scale spray system (for example, when 20 nozzles are arranged at equal intervals in a 20 m length), dripping of all the nozzles is effective and low cost. It was difficult to prevent dripping.

特許文献2では、一つの玉に取付けることの出来るノズルは4個までである上に、集中的にしか配置できず、玉のコストや、設置性が困難な点等に問題があった。   In Patent Document 2, there are up to four nozzles that can be attached to one ball, and the nozzles can be arranged only in a concentrated manner, and there are problems with the cost of the balls and the difficulty of installation.

特許文献3では、液体配管に大量にエアが入るため、水系配管中の殆ど全ての水をバッファタンクに戻さなくては、ノズルへのエアの供給を停止した時に、水系配管内の圧縮空気が膨張する事で、システム内の様々な場所で僅かに残った水が押出され、液だれが発生してしまうと言う問題があった。   In Patent Document 3, since a large amount of air enters the liquid pipe, the compressed air in the water pipe is not supplied when the supply of air to the nozzle is stopped unless almost all the water in the water pipe is returned to the buffer tank. Due to the expansion, there is a problem in that a little water remaining in various places in the system is pushed out and dripping occurs.

本実施形態は、上記のような課題を解決するためになされたものであり、二流体ノズルの噴霧動作を停止した際に生ずる、液だれを手軽に防止できる二流体噴霧装置及びその制御方法を提供することを目的とする。   The present embodiment has been made to solve the above-described problems, and provides a two-fluid spraying device that can easily prevent dripping that occurs when the spraying operation of the two-fluid nozzle is stopped, and a control method therefor. The purpose is to provide.

実施形態は、以下のように構成されている。   The embodiment is configured as follows.

すなわち、加圧液体を供給する液体供給手段と、前記液体供給手段からの加圧液体を、液体供給側と液体排出側に分液する分液部を有し、前記液体排出側に分液された加圧液体を排液配管の排液部に排出可能で、かつ前記分液部と前記排液配管の接続部との間に形成され前記接続部の端部の高さが、前記分液部より垂直方向の高さより高い位置に延びる液体立ち上がり部を有する液体配管と、圧縮気体を供給停止可能な気体供給手段と、
前記気体供給手段からの圧縮気体及び前記分液部からの加圧液体を供給して得られる霧化流体を、所望の位置に噴霧する二流体ノズルと、前記液体配管であって前記分液部と前記液体供給手段との間に設けられ、加圧液体を供給停止する液体供給停止弁と、前記液体配管であって前記液体立ち上がり部と前記分液部の間に設けられ、前記排液配管内の液体を排液する際に開放状態とし、前記二流体ノズルの次回の噴霧動作が開始されるまで開放状態とする排液弁と、前記液体配管であって前記分液部と前記二流体ノズルが接続される部分と、前記分液部と、前記排液弁と、前記液体立ち上がり部とを含む配管経路の総称であって、前記液体供給停止弁及び前記排液弁を開放状態として前記液体供給手段からの加圧液体を供給したとき、前記配管経路に自然に前記加圧液体が残る貯液機構とを具備し、前記二流体ノズルは前記貯液機構のうちの垂直方向の高さが前記液体立ち上がり部の最上部より高い位置に配置され、前記二流体ノズルの噴霧動作が停止した際に前記二流体ノズルからの液だれが生じないようにした二流体噴霧装置である。
That is, a liquid supply unit that supplies pressurized liquid, and a liquid separation unit that separates the pressurized liquid from the liquid supply unit into a liquid supply side and a liquid discharge side, and are separated into the liquid discharge side. The pressurized liquid can be discharged to the drainage part of the drainage pipe, and the height of the end of the connection part formed between the liquid separation part and the connection part of the drainage pipe is the liquid separation. A liquid pipe having a liquid rising part extending to a position higher than the vertical height from the part, and a gas supply means capable of stopping the supply of compressed gas,
A two-fluid nozzle for spraying an atomized fluid obtained by supplying a compressed gas from the gas supply means and a pressurized liquid from the liquid separation unit to a desired position; and the liquid pipe and the liquid separation unit And a liquid supply stop valve for stopping the supply of pressurized liquid, the liquid pipe, provided between the liquid rising part and the liquid separation part, and the drain pipe. A drain valve that is opened when the liquid inside is drained, and is opened until the next spraying operation of the two-fluid nozzle is started, the liquid pipe, the liquid separation unit, and the two-fluid A general term for a piping path including a portion to which a nozzle is connected, the liquid separation unit, the drainage valve, and the liquid rising portion, and the liquid supply stop valve and the drainage valve are opened. When the pressurized liquid is supplied from the liquid supply means, A liquid storage mechanism in which the pressurized liquid remains in the path naturally, and the two-fluid nozzle is disposed at a position where the vertical height of the liquid storage mechanism is higher than the uppermost part of the liquid rising portion, The two-fluid spraying device is configured to prevent dripping from the two-fluid nozzle when the spraying operation of the two-fluid nozzle is stopped.

本実施形態によれば、二流体ノズルの噴霧動作を停止した際に生ずる、液だれを手軽に防止できる。   According to this embodiment, it is possible to easily prevent dripping that occurs when the spraying operation of the two-fluid nozzle is stopped.

本実施形態が適用されるシステムの概要を説明するための図。The figure for demonstrating the outline | summary of the system to which this embodiment is applied. 本実施形態の二流体噴霧装置を説明するための概略構成図。The schematic block diagram for demonstrating the two fluid spraying apparatus of this embodiment. 本実施形態の二流体噴霧装置の制御方法を説明するためのタイムチャート。The time chart for demonstrating the control method of the two fluid spraying apparatus of this embodiment.

以下、実施の形態について、図面を参照して説明する。   Hereinafter, embodiments will be described with reference to the drawings.

始めに、図1を参照して、以下に述べる本実施形態の二流体噴霧装置100が適用されるシステムの概略について説明する。   First, an outline of a system to which a two-fluid spray device 100 of the present embodiment described below is applied will be described with reference to FIG.

例えば、クリーンルーム01内には半導体製造装置02が設置され、この内部の温度、湿度が所定値になるように、空調機03との間で給気、還気が行われるようになったり、クリーンルーム01内の温度と湿度を検出器で検出し、これを空調制御盤09に取り込み、これらと目標値との差に応じて、空調機03内に有する冷却コイル04に供給する冷水供給系の比例制御弁011の指令を変更したり、さらには空調機03内に有する加熱コイル05に供給する温水供給系の比例制御弁012の指令を変更したりするようになっている。   For example, the semiconductor manufacturing apparatus 02 is installed in the clean room 01, and air is supplied to and returned from the air conditioner 03 so that the temperature and humidity inside the clean room 01 become predetermined values. The temperature and humidity in 01 are detected by a detector, and this is taken into the air conditioning control panel 09 and proportional to the chilled water supply system supplied to the cooling coil 04 in the air conditioner 03 according to the difference between these and the target value. The command of the control valve 011 is changed, and further, the command of the proportional control valve 012 of the hot water supply system supplied to the heating coil 05 provided in the air conditioner 03 is changed.

これ以外の構成として、空調機03の内部には、複数の二流体ノズル9を備えた二流体噴霧ヘッダーユニット06と、二流体噴霧ヘッダーユニット06から噴霧される雰囲気を、クリーンルーム01内に強制的に送るためのファン07と、後述する蒸気加湿ユニット08とを備えている。蒸気加湿ユニット08には、空調機03の外部に設置された蒸気系に設けられた比例制御弁013の二次側の蒸気が供給され、比例制御弁013の指令は後述するノズル制御盤010から与えられるようになっている。   As a configuration other than this, in the air conditioner 03, the two-fluid spray header unit 06 having a plurality of two-fluid nozzles 9 and the atmosphere sprayed from the two-fluid spray header unit 06 are forced into the clean room 01. And a steam humidifying unit 08 to be described later. The steam humidification unit 08 is supplied with the steam on the secondary side of the proportional control valve 013 provided in the steam system installed outside the air conditioner 03, and the command of the proportional control valve 013 is from a nozzle control panel 010 described later. It has come to be given.

ノズル制御盤010は、空調制御盤09からの既設蒸気加湿指令が与えられ、これに基づいて比例制御弁013に対して指令が与えられ、またノズル制御盤010には後述する
ノズルユニット06と接続される加圧液体供給系例えば加圧純水供給系W及び圧縮気体供給系例えば圧縮空気(圧空)供給系Aが接続され、これらの系W、Aの途中には本実施形態の二流体噴霧装置100が設けられている。加圧純水供給系Wからの純水w及び圧縮空気供給系Aからの圧縮空気aは、それぞれノズルユニット06を介しての複数の二流体ノズル9に供給されるように配管が設けられている。
The nozzle control panel 010 is given an existing steam humidification command from the air conditioning control panel 09, and based on this, a command is given to the proportional control valve 013. The nozzle control panel 010 is connected to a nozzle unit 06 described later. A pressurized liquid supply system such as a pressurized pure water supply system W and a compressed gas supply system such as a compressed air (compressed air) supply system A are connected, and the two-fluid spray of this embodiment is placed in the middle of these systems W and A. An apparatus 100 is provided. Pipes are provided so that the pure water w from the pressurized pure water supply system W and the compressed air a from the compressed air supply system A are supplied to the plurality of two-fluid nozzles 9 via the nozzle unit 06, respectively. Yes.

複数の二流体ノズル9は、圧縮空気aと純水wを混合して得られる霧化流体を、所望の箇所に噴霧するものであって、例えば圧縮空気aの圧力が純水供給系Wに影響し、純水供給系Wの純水wを加圧しないと、純水供給系Wに圧縮空気aが逆流する特性を持っている。   The plurality of two-fluid nozzles 9 spray the atomized fluid obtained by mixing the compressed air a and the pure water w onto a desired location. For example, the pressure of the compressed air a is applied to the pure water supply system W. If there is an influence and the pure water w of the pure water supply system W is not pressurized, the compressed air a has a characteristic of flowing backward to the pure water supply system W.

図2は本実施形態の二流体噴霧装置の概略構成を説明するための図であり、これは以下に述べる加圧液体供給系Wと、圧縮気体供給系Aと、二流体ノズル9を備えている。   FIG. 2 is a diagram for explaining a schematic configuration of the two-fluid spraying apparatus of the present embodiment, which includes a pressurized liquid supply system W, a compressed gas supply system A, and a two-fluid nozzle 9 described below. Yes.

加圧液体供給系Wは、加圧液体を供給する液体供給手段例えば液体供給源1と、液体供給源1からの加圧液体を、液体供給側と液体排出側に分液する分液部2を有し、液体排出側に分液された加圧液体を排液配管3の排液部に排出可能で、かつ分液部2と排液配管3の接続部11との間に形成され接続部11の端部の高さが、分液部2より垂直方向の高さより高い位置に延びる液体立ち上がり部4を有する液体配管5を備えている。そして、液体配管5であって分液部2と液体供給源1との間に設けられ、加圧液体を供給停止する液体供給停止弁10と、液体配管5であって液体立ち上がり部4と分液部2の間に設けられ、排液配管3内の液体を排液する際に開放状態とし、後述する二流体ノズル9の次回の噴霧動作が開始されるまで開放状態とする排液弁7と、液体配管5であって分液部2と二流体ノズル9が接続される接続部12と、分液部2と、排液弁7と、液体立ち上がり部4とを含む配管経路の総称であって、液体供給停止弁10及び排液弁7を開放状態として液体供給源1からの加圧液体を供給したとき、配管経路に自然に加圧液体が残る貯液機構8とを具備している。   The pressurized liquid supply system W includes a liquid supply means for supplying a pressurized liquid, for example, a liquid supply source 1, and a liquid separation unit 2 that separates the pressurized liquid from the liquid supply source 1 into a liquid supply side and a liquid discharge side. The pressurized liquid separated on the liquid discharge side can be discharged to the drainage part of the drainage pipe 3 and is formed and connected between the liquid separation part 2 and the connection part 11 of the drainage pipe 3. A liquid pipe 5 having a liquid rising portion 4 extending to a position where the height of the end portion of the portion 11 is higher than the height in the vertical direction from the liquid separation portion 2 is provided. The liquid pipe 5 is provided between the liquid separation unit 2 and the liquid supply source 1, and the liquid supply stop valve 10 for stopping the supply of pressurized liquid, and the liquid pipe 5 and the liquid rising part 4 are separated from the liquid supply source 1. A drainage valve 7 provided between the liquid parts 2 and opened when the liquid in the drainage pipe 3 is drained and opened until the next spraying operation of the two-fluid nozzle 9 described later is started. And a pipe line including the liquid pipe 5 and the connection part 12 to which the liquid separation part 2 and the two-fluid nozzle 9 are connected, the liquid separation part 2, the drainage valve 7, and the liquid rising part 4. And a liquid storage mechanism 8 in which the pressurized liquid naturally remains in the piping path when the pressurized liquid from the liquid supply source 1 is supplied with the liquid supply stop valve 10 and the drain valve 7 opened. Yes.

圧縮気体供給系Aは、圧縮気体を供給停止可能な気体供給手段例えば気体供給源6と、気体供給源6からの圧縮気体を気体配管12を介し、気体配管12に圧縮機CPと、圧縮気体を供給停止する気体供給停止弁021を備えている。   The compressed gas supply system A is a gas supply means capable of stopping supply of compressed gas, for example, a gas supply source 6, and a compressed gas from the gas supply source 6 via the gas pipe 12. The gas supply stop valve 021 for stopping the supply is provided.

二流体ノズル9は、気体配管12からの圧縮気体及び液体配管5からの加圧液体を供給して得られる噴霧流体を所望の空間に噴霧するものである。   The two-fluid nozzle 9 sprays the spray fluid obtained by supplying the compressed gas from the gas pipe 12 and the pressurized liquid from the liquid pipe 5 in a desired space.

このような構成のものにおいて、二流体ノズル9は貯液機構8のうちの垂直方向の高さが液体立ち上がり部の最上部より高い位置に配置され、二流体ノズル9の噴霧動作が停止した際に二流体ノズル9からの液だれが生じないようになっている。   In such a configuration, the two-fluid nozzle 9 is disposed at a position where the vertical height of the liquid storage mechanism 8 is higher than the uppermost part of the liquid rising portion, and the spraying operation of the two-fluid nozzle 9 is stopped. In addition, no dripping from the two-fluid nozzle 9 occurs.

具体的には、その制御方法は、以下のように行う。二流体ノズル9は貯液機構8のうちの垂直方向の高さが液体立ち上がり部4の最上部より高い位置に配置され、図3に示すように排液弁7は二流体ノズル9の噴霧動作停止時に開放状態とし、これを二流体ノズル9の次回の噴霧動作が開始されるまで開放状態とするようにした二流体噴霧装置の制御方法である。   Specifically, the control method is performed as follows. The two-fluid nozzle 9 is arranged at a position where the vertical height of the liquid storage mechanism 8 is higher than the uppermost part of the liquid rising portion 4, and the drain valve 7 is sprayed by the two-fluid nozzle 9 as shown in FIG. 3. This is a control method for a two-fluid spraying device that is in an open state when it is stopped, and is in an open state until the next spray operation of the two-fluid nozzle 9 is started.

以上述べた実施形態によれば、特に逆圧を有する二流体ノズル9を複数用いた噴霧装置に於いて、二流体ノズル9の噴霧動作を停止した際に生ずる、液だれを手軽に防止できる二流体噴霧装置及び二流体噴霧装置の制御方法を提供できる。   According to the embodiment described above, it is possible to easily prevent the dripping that occurs when the spraying operation of the two-fluid nozzle 9 is stopped, particularly in the spraying apparatus using a plurality of two-fluid nozzles 9 having a counter pressure. A control method for a fluid spraying device and a two-fluid spraying device can be provided.

以上述べた実施形態によれば、本出願人が先に出願したE10696JP01を実用化する上で問題となる点を改善できる。その問題点は具体的には、排水弁を開放していると、水ヘッダ内の水が全て排水されてしまう為、必要以上に水を消費してしまう為、排水弁を閉める必要が有った。この際、排水弁を閉めた時、長さの異なる立下り配管が有り、どこかに水が残っていると、水がノズルから流れ出す事が有るため、立上り配管を作らない様な配管構造にするか、水ヘッダ内の水がほぼ全量排出されるまで排水弁を開放する必要が有った。このため、長い距離にノズルを配置する場合、ノズルからある程度の距離の範囲内に液体マニホールドを配置する必要が有った。   According to the embodiment described above, it is possible to improve a point that becomes a problem when the E10696JP01 filed earlier by the present applicant is put into practical use. Specifically, the problem is that if the drain valve is open, all the water in the water header will be drained, and more water will be consumed than necessary, so it is necessary to close the drain valve. It was. At this time, when the drain valve is closed, there are falling pipes with different lengths, and if water remains somewhere, water may flow out of the nozzle, so the piping structure does not create a rising pipe. Or, it was necessary to open the drain valve until almost all of the water in the water header was discharged. For this reason, when the nozzles are arranged at a long distance, it is necessary to arrange the liquid manifold within a certain distance from the nozzles.

以上述べた実施形態は、以下のように変形して実施できる。すなわち、貯液機構8の少なくとも液体立ち上がり部4の内部容積を可変できるように構成してもよい。また、貯液機構8の液体立ち上がり部4は、可撓性を有する材料で構成してもよい。さらに、二流体ノズル9は、加圧液体を供給せずに圧縮気体だけを供給すると、液体供給源1の液体経路に圧縮気体の圧力が影響して伝わると共に、圧縮気体が液体供給源1に本来加圧液体が流れる方向と逆方向に流れ込む特性を持ったものを使用してもよい。   The embodiment described above can be implemented with the following modifications. In other words, at least the internal volume of the liquid rising portion 4 of the liquid storage mechanism 8 may be variable. Further, the liquid rising portion 4 of the liquid storage mechanism 8 may be made of a flexible material. Further, when the two-fluid nozzle 9 supplies only the compressed gas without supplying the pressurized liquid, the pressure of the compressed gas is transmitted to the liquid path of the liquid supply source 1 and the compressed gas is transmitted to the liquid supply source 1. Those having the characteristic of flowing in the direction opposite to the direction in which the pressurized liquid originally flows may be used.

また、貯液機構8の液体立ち上がり部4の直径を25mm以下にすることが望ましい。   Moreover, it is desirable that the diameter of the liquid rising portion 4 of the liquid storage mechanism 8 is 25 mm or less.

貯液機構8の液体立ち上がり部4は、貯液機構8内の加圧液体を排出する際に表面張力が作用するようにしてもよい。   The liquid rising portion 4 of the liquid storage mechanism 8 may be subjected to surface tension when the pressurized liquid in the liquid storage mechanism 8 is discharged.

前述の二流体噴霧装置の制御方法において、貯液機構8の排液が十分に行われたとき、液体配管5内で液位が均衡状態になった後は、排液弁7を閉止状態にしてもよい。   In the control method of the above-described two-fluid spraying device, when the liquid storage mechanism 8 is sufficiently drained, the drainage valve 7 is closed after the liquid level in the liquid pipe 5 becomes balanced. May be.

本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。   Although several embodiments of the present invention have been described, these embodiments are presented by way of example and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

1…液体供給源、2…分液部、3…排液配管、4…液体立ち上がり部、5…液体配管、6…気体供給源、7…排液弁、8…貯液機構、9…二流体ノズル、10…液体供給停止弁、11、12…接続部。   DESCRIPTION OF SYMBOLS 1 ... Liquid supply source, 2 ... Separation part, 3 ... Drainage piping, 4 ... Liquid rise part, 5 ... Liquid piping, 6 ... Gas supply source, 7 ... Drainage valve, 8 ... Liquid storage mechanism, 9 ... Two Fluid nozzle, 10... Liquid supply stop valve, 11, 12.

Claims (8)

加圧液体を供給する液体供給手段と、
前記液体供給手段からの加圧液体を、液体供給側と液体排出側に分液する分液部を有し、前記液体排出側に分液された加圧液体を排液配管の排液部に排出可能で、かつ前記分液部と前記排液配管の接続部との間に形成され前記接続部の端部の高さが、前記分液部より垂直方向の高さより高い位置に延びる液体立ち上がり部を有する液体配管と、
圧縮気体を供給停止可能な気体供給手段と、
前記気体供給手段からの圧縮気体及び前記分液部からの加圧液体を供給して得られる霧化流体を、所望の位置に噴霧する二流体ノズルと、
前記液体配管であって前記分液部と前記液体供給手段との間に設けられ、加圧液体を供給停止する液体供給停止弁と、
前記液体配管であって前記液体立ち上がり部と前記分液部の間に設けられ、前記排液配管内の液体を排液する際に開放状態とし、前記二流体ノズルの次回の噴霧動作が開始されるまで開放状態とする排液弁と、
前記液体配管であって前記分液部と前記二流体ノズルが接続される部分と、前記分液部と、前記排液弁と、前記液体立ち上がり部とを含む配管経路の総称であって、前記液体供給停止弁及び前記排液弁を開放状態として前記液体供給手段からの加圧液体を供給したとき、前記配管経路に自然に前記加圧液体が残る貯液機構とを具備し、
前記二流体ノズルは前記貯液機構のうちの垂直方向の高さが前記液体立ち上がり部の最上部より高い位置に配置され、前記二流体ノズルの噴霧動作が停止した際に前記二流体ノズルからの液だれが生じないようにしたことを特徴とする二流体噴霧装置。
Liquid supply means for supplying pressurized liquid;
A liquid separation unit that separates the pressurized liquid from the liquid supply means into a liquid supply side and a liquid discharge side; and the pressurized liquid separated into the liquid discharge side is supplied to a drainage part of a drainage pipe. Liquid rising that can be discharged and extends to a position where the height of the end of the connecting portion is higher than the height in the vertical direction from the separating portion, formed between the separating portion and the connecting portion of the draining pipe. A liquid pipe having a section;
Gas supply means capable of stopping supply of compressed gas;
A two-fluid nozzle for spraying the atomized fluid obtained by supplying the compressed gas from the gas supply means and the pressurized liquid from the liquid separation unit to a desired position;
A liquid supply stop valve that is provided between the liquid separation unit and the liquid supply means in the liquid pipe and stops supplying pressurized liquid;
The liquid pipe, which is provided between the liquid rising part and the liquid separation part, is opened when the liquid in the drain pipe is drained, and the next spraying operation of the two-fluid nozzle is started. A drain valve that remains open until
The liquid pipe is a general term for a pipe path including a portion where the liquid separation portion and the two-fluid nozzle are connected, the liquid separation portion, the drainage valve, and the liquid rising portion, A liquid storage mechanism in which when the liquid supply stop valve and the drainage valve are opened to supply the pressurized liquid from the liquid supply means, the pressurized liquid naturally remains in the piping path;
The two-fluid nozzle is arranged at a position where the vertical height of the liquid storage mechanism is higher than the uppermost part of the liquid rising portion, and when the spraying operation of the two-fluid nozzle is stopped, A two-fluid spraying device characterized by preventing dripping.
前記貯液機構の少なくとも前記液体立ち上がり部の内部容積を可変できるように構成したことを特徴とする請求項1記載の二流体噴霧装置。   2. The two-fluid spraying device according to claim 1, wherein at least the internal volume of the liquid rising portion of the liquid storage mechanism is variable. 前記貯液機構の前記液体立ち上がり部は、可撓性を有する材料で構成したことを特徴とする請求項1記載の二流体噴霧装置。   The two-fluid spray device according to claim 1, wherein the liquid rising portion of the liquid storage mechanism is made of a flexible material. 前記二流体ノズルは、前記加圧液体を供給せずに前記圧縮気体だけを供給すると、前記液体供給手段の液体経路に前記圧縮気体の圧力が影響して伝わると共に、前記圧縮気体が前記液体供給手段に本来前記加圧液体が流れる方向と逆方向に流れ込む特性を持ったものであることを特徴とする請求項1に記載の二流体噴霧装置。   When the two-fluid nozzle supplies only the compressed gas without supplying the pressurized liquid, the pressure of the compressed gas is transmitted to the liquid path of the liquid supply means, and the compressed gas is supplied to the liquid. The two-fluid spraying device according to claim 1, wherein the device has a characteristic of flowing in the direction opposite to the direction in which the pressurized liquid flows. 加圧液体を供給する液体供給手段と、
前記液体供給手段からの加圧液体を、液体供給側と液体排出側に分液する分液部を有し、前記液体排出側に分液された加圧液体を排液配管の排液部に排出可能で、かつ前記分液部と前記排液配管の接続部との間に形成され前記接続部の端部の高さが、前記分液部より垂直方向の高さより高い位置に延びる液体立ち上がり部を有する液体配管と、
圧縮気体を供給停止可能な気体供給手段と、
前記気体供給手段からの圧縮気体及び前記分液部からの加圧液体を供給して得られる霧化流体を、所望の位置に噴霧する二流体ノズルと、
前記液体配管であって前記分液部と前記液体供給手段との間に設けられ、加圧液体を供給停止する液体供給停止弁と、
前記液体配管であって前記液体立ち上がり部と前記分液部の間に設けられ、前記排液配管内の液体を排液する際に開放状態とする排液弁と、
前記液体配管であって前記分液部と前記二流体ノズルが接続される部分と、前記分液部と、前記排液弁と、前記液体立ち上がり部とを含む配管経路の総称であって、前記液体供給停止弁及び前記排液弁を開放状態として前記液体供給手段からの加圧液体を供給したとき、前記配管経路に自然に前記加圧液体が残る貯液機構とを具備した二流体噴霧装置において、
前記二流体ノズルは前記貯液機構のうちの垂直方向の高さが前記液体立ち上がり部の最上部より高い位置に配置され、前記排液弁は前記二流体ノズルの噴霧動作停止時に開放状態とし、これを前記二流体ノズルの次回の噴霧動作が開始されるまで開放状態とするようにした二流体噴霧装置の制御方法。
Liquid supply means for supplying pressurized liquid;
A liquid separation unit that separates the pressurized liquid from the liquid supply means into a liquid supply side and a liquid discharge side; and the pressurized liquid separated into the liquid discharge side is supplied to a drainage part of a drainage pipe. Liquid rising that can be discharged and extends to a position where the height of the end of the connecting portion is higher than the height in the vertical direction from the separating portion, formed between the separating portion and the connecting portion of the draining pipe. A liquid pipe having a section;
Gas supply means capable of stopping supply of compressed gas;
A two-fluid nozzle for spraying the atomized fluid obtained by supplying the compressed gas from the gas supply means and the pressurized liquid from the liquid separation unit to a desired position;
A liquid supply stop valve that is provided between the liquid separation unit and the liquid supply means in the liquid pipe and stops supplying pressurized liquid;
A drainage valve that is provided between the liquid rising portion and the liquid separation portion in the liquid pipe and is opened when draining the liquid in the drainage pipe;
The liquid pipe is a general term for a pipe path including a portion where the liquid separation portion and the two-fluid nozzle are connected, the liquid separation portion, the drainage valve, and the liquid rising portion, A two-fluid spraying device comprising: a liquid storage mechanism in which the pressurized liquid naturally remains in the pipe path when the pressurized liquid from the liquid supply means is supplied with the liquid supply stop valve and the drain valve opened. In
The two-fluid nozzle is disposed at a position where the vertical height of the liquid storage mechanism is higher than the uppermost part of the liquid rising portion, and the drain valve is opened when the spray operation of the two-fluid nozzle is stopped, A control method for a two-fluid spraying device in which the two-fluid nozzle is opened until the next spraying operation of the two-fluid nozzle is started.
前記貯液機構の排液が十分に行われたとき、前記液体配管内で液位が均衡状態になった後は、前記排液弁を閉止状態にすることを特徴とする請求項5に記載の二流体噴霧装置の制御方法。   6. The drain valve according to claim 5, wherein when the liquid storage mechanism is sufficiently drained, the drain valve is closed after the liquid level is balanced in the liquid pipe. Control method for two-fluid spraying device. 前記貯液機構の液体立ち上がり部の直径を25mm以下にすることを特徴とする請求項1記載の二流体噴霧装置。   The two-fluid spray device according to claim 1, wherein a diameter of a liquid rising portion of the liquid storage mechanism is 25 mm or less. 前記貯液機構の液体立ち上がり部は、前記貯液機構内の加圧液体を排出する際に表面張力が作用するようにしたことを特徴とする請求項1記載の二流体噴霧装置。   The two-fluid spray device according to claim 1, wherein a surface tension acts on the liquid rising portion of the liquid storage mechanism when the pressurized liquid in the liquid storage mechanism is discharged.
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Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2003045413A (en) * 2001-07-27 2003-02-14 Shibaura Mechatronics Corp Liquid pouring device and method
JP2005277211A (en) * 2004-03-25 2005-10-06 Dainippon Screen Mfg Co Ltd Substrate processor
JP2014034027A (en) * 2012-08-10 2014-02-24 Toshiba Mitsubishi-Electric Industrial System Corp Two-fluid sprayer
JP2016178109A (en) * 2015-03-18 2016-10-06 株式会社東芝 Nozzle and liquid supply device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045413A (en) * 2001-07-27 2003-02-14 Shibaura Mechatronics Corp Liquid pouring device and method
JP2005277211A (en) * 2004-03-25 2005-10-06 Dainippon Screen Mfg Co Ltd Substrate processor
JP2014034027A (en) * 2012-08-10 2014-02-24 Toshiba Mitsubishi-Electric Industrial System Corp Two-fluid sprayer
JP2016178109A (en) * 2015-03-18 2016-10-06 株式会社東芝 Nozzle and liquid supply device

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