JP2017033939A5 - - Google Patents
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- JP2017033939A5 JP2017033939A5 JP2016179020A JP2016179020A JP2017033939A5 JP 2017033939 A5 JP2017033939 A5 JP 2017033939A5 JP 2016179020 A JP2016179020 A JP 2016179020A JP 2016179020 A JP2016179020 A JP 2016179020A JP 2017033939 A5 JP2017033939 A5 JP 2017033939A5
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- JP
- Japan
- Prior art keywords
- line
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- forming method
- substrate
- pattern forming
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- 239000007788 liquid Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 20
- 239000004020 conductor Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000004581 coalescence Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016179020A JP6418210B2 (ja) | 2016-09-13 | 2016-09-13 | 平行線パターン形成方法、透明導電膜付き基材、デバイス及び電子機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016179020A JP6418210B2 (ja) | 2016-09-13 | 2016-09-13 | 平行線パターン形成方法、透明導電膜付き基材、デバイス及び電子機器 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012275128A Division JP6007776B2 (ja) | 2012-08-20 | 2012-12-17 | 平行線パターン形成方法、透明導電膜付き基材の製造方法、デバイス及び電子機器の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017033939A JP2017033939A (ja) | 2017-02-09 |
| JP2017033939A5 true JP2017033939A5 (enExample) | 2017-03-30 |
| JP6418210B2 JP6418210B2 (ja) | 2018-11-07 |
Family
ID=57986325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016179020A Active JP6418210B2 (ja) | 2016-09-13 | 2016-09-13 | 平行線パターン形成方法、透明導電膜付き基材、デバイス及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6418210B2 (enExample) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4096868B2 (ja) * | 2003-11-25 | 2008-06-04 | セイコーエプソン株式会社 | 膜形成方法、デバイス製造方法および電気光学装置 |
| JP4051631B2 (ja) * | 2004-08-20 | 2008-02-27 | セイコーエプソン株式会社 | エッチング方法、微細構造体の製造方法、導電線の形成方法、薄膜トランジスタの製造方法及び電子機器の製造方法 |
-
2016
- 2016-09-13 JP JP2016179020A patent/JP6418210B2/ja active Active
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